CN113842755B - Plasma washing purifying equipment - Google Patents
Plasma washing purifying equipment Download PDFInfo
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- CN113842755B CN113842755B CN202111124997.8A CN202111124997A CN113842755B CN 113842755 B CN113842755 B CN 113842755B CN 202111124997 A CN202111124997 A CN 202111124997A CN 113842755 B CN113842755 B CN 113842755B
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- water
- water washing
- pipe
- exhaust pipe
- guide plate
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- 238000005406 washing Methods 0.000 title claims abstract description 176
- 238000006243 chemical reaction Methods 0.000 claims abstract description 116
- 239000002912 waste gas Substances 0.000 claims abstract description 81
- 238000000746 purification Methods 0.000 claims abstract description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 298
- 238000001816 cooling Methods 0.000 claims description 60
- 239000007921 spray Substances 0.000 claims description 59
- 238000005507 spraying Methods 0.000 claims description 50
- 230000000149 penetrating effect Effects 0.000 claims description 7
- 238000009434 installation Methods 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 27
- 239000000428 dust Substances 0.000 abstract description 21
- 239000002245 particle Substances 0.000 abstract description 16
- 238000000354 decomposition reaction Methods 0.000 abstract description 11
- 230000003749 cleanliness Effects 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 64
- 239000010865 sewage Substances 0.000 description 18
- 238000007789 sealing Methods 0.000 description 8
- 238000000197 pyrolysis Methods 0.000 description 7
- 230000005587 bubbling Effects 0.000 description 6
- 239000008213 purified water Substances 0.000 description 6
- 239000003595 mist Substances 0.000 description 5
- 238000001914 filtration Methods 0.000 description 4
- 238000012856 packing Methods 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 239000002351 wastewater Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000009991 scouring Methods 0.000 description 1
- 210000003437 trachea Anatomy 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/30—Controlling by gas-analysis apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treating Waste Gases (AREA)
Abstract
The utility model relates to plasma washing and purifying equipment, and relates to the field of waste gas treatment, which comprises a frame and a plasma reaction device arranged on the frame, wherein the plasma reaction device comprises a plasma generator, a reaction bin and a plurality of air supply pipelines, the plasma generator is arranged on the reaction bin, the air supply pipelines are connected with the reaction bin, the air supply pipelines are used for introducing waste gas to be purified into the reaction bin, a guide plate is arranged in the reaction bin, and a guide hole for allowing plasma arc generated by the plasma generator to pass through is formed in the guide plate. The utility model effectively improves the decomposition effect on the waste gas, dust particles in the waste gas are not easy to accumulate in the pipeline, the washing purification degree of the waste gas is high, the cleanliness of the discharged waste gas is ensured, and the pollution to the environment is reduced.
Description
Technical Field
The utility model relates to the field of waste gas treatment, in particular to plasma water washing purification equipment.
Background
In the semiconductor manufacturing process, harmful waste gases such as sulfur dioxide, nitrogen oxides, fluorine-containing gas and the like are exhausted, and a large amount of dust is discharged into the environment along with the waste gases, so that the environmental air is polluted. In addition, if the fluoride gas is directly discharged into the atmosphere, the fluoride gas not only causes environmental pollution, but also causes a greenhouse effect and has serious influence on global warming, so that the waste gas needs to be treated into harmless gas or products before being discharged.
The related Chinese patent with publication number of CN212339288U discloses a plasma waste gas treatment system, which belongs to the technical field of waste gas treatment and comprises a reaction cavity, wherein a plasma generator is arranged in the reaction cavity in a matched manner, a process air inlet is arranged on the plasma generator, an outlet at the bottom of the reaction cavity is connected with a primary water washing system in a matched manner, and an outlet of the primary water washing system is respectively connected with a secondary water washing cooling system and a filtering system in a matched manner; the water curtain system is characterized by further comprising a water curtain flange which is fixedly arranged at the top of the reaction cavity, and a water curtain wall formed below the water curtain flange is positioned in the reaction cavity; the water curtain system, the plasma generator, the primary water washing system, the secondary water washing cooling system and the filtering system are electrically matched with the electric controller.
With respect to the related art described above, the inventors consider that the exhaust gas passes through the inside of the reaction chamber, and that the exhaust gas at the inner periphery of the reaction chamber is difficult to maintain sufficient reaction contact with the high-temperature plasma arc generated by the plasma generator, so that the efficiency of plasma pyrolysis is low.
Disclosure of Invention
In order to solve the problem that waste gas at the inner periphery of a reaction cavity is difficult to keep sufficient reaction contact with high-temperature plasma arc generated by a plasma generator, so that the efficiency of plasma pyrolysis is low, the utility model provides plasma water washing and purifying equipment.
The utility model provides plasma water washing purification equipment which adopts the following technical scheme:
the utility model provides a plasma washing clarification plant, includes the frame and sets up the plasma reaction unit in the frame, plasma reaction unit includes plasma generator, reaction chamber and a plurality of air feed pipeline, plasma generator sets up on the reaction chamber, air feed pipeline is connected with the reaction chamber, air feed pipeline is used for letting in the waste gas of waiting to purify to the reaction chamber, be provided with the guide plate in the reaction chamber, set up the water conservancy diversion hole that the plasma arc that supplies plasma generator to produce passed on the guide plate.
Through adopting above-mentioned technical scheme, with the semiconductor waste gas that treats purification treatment lets in the reaction storehouse through the air feed pipeline, plasma generator produces plasma arc in the reaction storehouse, carries out high temperature ionization decomposition to waste gas, plasma generator's plasma arc passes from the water conservancy diversion hole of water conservancy diversion crown plate, the water conservancy diversion crown plate plays the water conservancy diversion effect to the waste gas through in the reaction storehouse, waste gas flows outside the reaction storehouse through the water conservancy diversion hole for waste gas can with the abundant contact of keeping of plasma arc, improves the ionization decomposition effect to waste gas then.
Preferably, one end of the air supply pipeline, which is close to the reaction bin, is connected with a corrugated pipe, and the air supply pipeline is communicated with the reaction bin through the corrugated pipe.
Through adopting above-mentioned technical scheme, the one end of air feed pipeline is connected with the bellows, utilizes the characteristics of telescopic, the easy bending of bellows to make things convenient for the erection joint between air feed pipeline and the reaction storehouse.
Preferably, the reaction bin comprises a reaction ring seat and an end cover arranged at one end of the reaction bin, the guide plate is arranged in the reaction ring seat, a first water cooling cavity is formed in the end cover, a first water cooling inlet pipe and a first water cooling outlet pipe are connected to the end cover, and the first water cooling inlet pipe and the first water cooling outlet pipe are communicated with the first water cooling cavity.
Through adopting above-mentioned technical scheme, can flow through the comdenstion water in to first water-cooling chamber through first water-cooling advance pipe and first water-cooling exit tube, cool down end cover and reaction ring seat to plasma generator's effect of playing the cooling protection makes plasma generator be difficult for appearing the condition of high temperature damage when lasting high temperature operation, ensures plasma generator's life.
Preferably, the water washing purification device further comprises a water washing purification device, the water washing purification device comprises a primary water washing assembly, the primary water washing assembly comprises a first water washing barrel and a first exhaust pipe, the first water washing barrel is connected to one end of the reaction ring seat, which is far away from the end cover, the first exhaust pipe is arranged in the first water washing barrel in a penetrating mode, the first exhaust pipe is fixedly connected with the first water washing barrel, a first water washing annular cavity is formed between the first exhaust pipe and the first water washing barrel, a first water washing inlet pipe is connected to the first water washing barrel, and the first water washing inlet pipe is communicated with the first water washing annular cavity.
By adopting the technical scheme, the waste gas is introduced into the reaction bin, the reaction device carries out high-temperature decomposition treatment on the waste gas, the decomposed waste gas enters the first exhaust pipe, and dust particles in the waste gas are easy to be attached in the first exhaust pipe when the waste gas flows in the first exhaust pipe; the water is introduced into the first washing annular cavity through the first washing inlet pipe, and enters the first exhaust pipe through the first washing annular cavity, so that the cooling effect is achieved on the waste gas after pyrolysis, the water-soluble gas in the waste gas is dissolved in the water, the dust particles on the inner wall of the first exhaust pipe are scoured, and the good running state of the washing purification equipment is guaranteed.
Preferably, the primary washing assembly further comprises a second washing barrel and a second exhaust pipe penetrating through the second washing barrel, the second exhaust pipe is fixedly connected with the second washing barrel, the second washing barrel is arranged at one end of the first washing barrel far away from the reaction ring seat, a second washing ring cavity is formed between the second exhaust pipe and the second washing barrel, a second washing inlet pipe is connected to the second washing barrel, the second exhaust pipe and the first exhaust pipe are coaxial, and a first water inlet gap is formed between the second exhaust pipe and the first exhaust pipe.
Through adopting above-mentioned technical scheme, when waste gas flows into the second blast pipe from first blast pipe, advance the pipe through the second washing and lead to water to the second washing ring intracavity, water piles up in the second washing ring intracavity and rises gradually to first water gap department to in the second blast pipe is flowed into through first water gap, thereby further play the cooling effect to high temperature waste gas, make dust granule be difficult for piling up on the inner wall of second blast pipe, and make the gas that is soluble in water in the waste gas after the processing dissolve in water.
Preferably, one end of the first water washing cylinder, which is close to the reaction ring seat, is fixed with a flange seat, the water washing cylinder is connected with the reaction ring seat through the flange seat, a second water cooling cavity is formed in the flange seat and is communicated with the first water washing ring cavity, a second water cooling inlet pipe is connected to the flange seat, and the second water cooling inlet pipe is communicated with the second water cooling cavity.
Through adopting above-mentioned technical scheme, let in the comdenstion water through the second water-cooling into the pipe to the second water-cooling intracavity, cool down flange seat and reaction storehouse, further play the cooling guard action to plasma generator, ensure the continuous stable operation of plasma generator.
Preferably, the washing purification device further comprises a secondary washing assembly, the secondary washing assembly comprises a third washing cylinder and a third exhaust pipe penetrating through the third washing cylinder, the third exhaust pipe is fixedly connected with the third washing cylinder, a third washing annular cavity is formed between the third exhaust pipe and the third washing cylinder, a third washing inlet pipe is connected in the third washing cylinder, the third exhaust pipe and the second exhaust pipe are coaxial, and a second water inlet gap is formed between the third exhaust pipe and the second exhaust pipe.
Through adopting above-mentioned technical scheme, when waste gas enters into the third blast pipe from the second blast pipe, advance pipe through the third washing and pass through water to the third washing ring intracavity, in the water flows into the third blast pipe through the second water gap, further cools down high temperature waste gas for in the waste gas can fully dissolve in water in the gas of soluble in water, and make dust particle be difficult for piling up on the inner wall of third blast pipe.
Preferably, the washing purification device further comprises a water spraying and washing assembly, the water spraying and washing assembly comprises a spraying pipeline, the third exhaust pipe is connected with the spraying pipeline, one end of the spraying pipeline is connected with a first spraying pipe, the other end of the spraying pipeline is connected with a second spraying pipe, the first spraying pipe and the second spraying pipe are both used for introducing water into the spraying pipeline, and the water inlet directions of the first spraying pipe and the second spraying pipe are opposite.
Through adopting above-mentioned technical scheme, waste gas enters into to the spray pipe way through the third blast pipe, through first to spouting into pipe and second to spouting into the pipe to spouting in the pipeline to spouting, and the water spray direction of both is opposite for the rivers form the torrent to spouting in the pipeline, can the intensive mixing between waste gas and the rivers, effectively cool down waste gas, and make the gas of the water-soluble in waste gas can fully dissolve in water, and under the effect to spouting the rapid current, dust particle is difficult for piling up in to the spray pipe say.
Preferably, the first diversion rotary vane is fixed on the inner wall of the opposite spray pipeline, which is close to the first opposite spray pipe, the second diversion rotary vane is fixed on the inner wall of the opposite spray pipeline, which is close to the second opposite spray pipe, the first diversion rotary vane and the second diversion rotary vane are all in spiral shapes along the length direction of the first diversion rotary vane and the second diversion rotary vane, and the spiral directions between the first diversion rotary vane and the second diversion rotary vane are opposite.
Through adopting above-mentioned technical scheme, first water conservancy diversion rotary vane and second water conservancy diversion rotary vane play the water conservancy diversion effect to letting in to the rivers in the pipeline that spouts to the mouth for let in to the rivers in the pipeline that spouts to the mouth be the whirl state when moving along the inner wall to the pipeline that spouts, and the spiral of first water conservancy diversion rotary vane and second water conservancy diversion rotary vane revolve to opposite, thereby improve the effect of further hedging to the rivers in the pipeline that spouts, make and get into can intensive mixing between waste gas and the rivers to the pipeline, the gas of soluble water in the waste gas can fully dissolve in the water, and under the effect to spouting the torrent, dust particle is difficult for piling up in the pipeline to the spout.
In summary, the present utility model includes at least one of the following beneficial technical effects:
1. through the arrangement of the guide plate, the exhaust gas passing through the reaction bin is guided to flow out of the reaction bin through the guide hole, so that the exhaust gas can be fully contacted with the plasma arc, and the ionization decomposition effect of the exhaust gas is improved;
2. by arranging the primary water washing component, the cooling effect is achieved on the waste gas after pyrolysis, so that water-soluble gas in the waste gas is dissolved in water, the scouring effect is achieved on dust particles on the inner wall of the exhaust pipe, and the good running state of the waste gas treatment equipment is ensured;
3. through setting up to spraying water and washing the subassembly, the rivers are to forming the torrent in spraying the pipeline, can the intensive mixing between waste gas and the rivers, effectively cool down waste gas to make in the waste gas the gas of soluble water can fully dissolve in water, and under the effect to spraying the torrent, dust particle is difficult for piling up in spraying the pipeline.
Drawings
Fig. 1 is a schematic diagram of the overall structure of a plasma water-washing purification device according to an embodiment of the present utility model.
Fig. 2 is a schematic structural view showing a plasma reaction apparatus and a water washing purification apparatus according to an embodiment of the present utility model.
FIG. 3 is a schematic view showing a partial structure of an apparatus for embodying a plasma reaction according to an embodiment of the present utility model.
Fig. 4 is a partial structural cross-sectional view of an embodiment of the present utility model for embodying a plasma reaction apparatus.
Fig. 5 is a partial enlarged view of the portion a in fig. 4.
Fig. 6 is an exploded view of an embodiment of the present utility model for embodying a flow channel adjustment structure.
Fig. 7 is a diagram of a guarantee for embodying the first return spring and the second return spring according to the embodiment of the present utility model.
Fig. 8 is a partial structural cross-sectional view of an embodiment of the present utility model for embodying a primary water wash assembly and a secondary water wash assembly.
Fig. 9 is a schematic view showing a partial structure of a connection between a water-washing purification apparatus and a rack according to an embodiment of the present utility model.
Fig. 10 is a partial enlarged view of the portion B in fig. 9.
FIG. 11 is a partial cross-sectional view of an embodiment of the present utility model for embodying and spraying a water jet assembly.
Fig. 12 is a partial structural sectional view showing an internal structure of a water tank according to an embodiment of the present utility model.
Reference numerals illustrate: 1. a frame; 11. a slide rail; 111. a slip groove; 12. a mounting plate; 121. a slip bar; 122. a mounting hole; 2. an air supply duct; 21. a main air supply pipe; 22. protecting the trachea; 23. a bellows; 24. a bypass pipe; 3. a plasma generator; 4. a reaction bin; 41. an end cap; 411. an air inlet pipe orifice; 412. a first gasket; 413. a first water cooling cavity; 414. a first water cooling inlet pipe; 415. a first water-cooled outlet pipe; 42. a reaction ring seat; 421. a support ring table; 422. a deflector; 4221. a deflector aperture; 423. a reaction chamber; 5. a primary water washing assembly; 51. a first water washing drum; 511. a first water washing inlet pipe; 512. a first water-washing ring cavity; 513. a flange seat; 5131. a second water cooling cavity; 5132. a water outlet; 5133. a second water cooling inlet pipe; 5134. a second gasket; 52. a first exhaust pipe; 53. a second water washing drum; 531. a second water washing inlet pipe; 532. a second water-washing ring cavity; 54. a second exhaust pipe; 541. a first water inlet gap; 6. a secondary water wash assembly; 61. a third water washing drum; 611. a third water washing inlet pipe; 612. a third water-washing ring cavity; 62. a third exhaust pipe; 621. a second water inlet gap; 7. the water spraying and washing assembly is used for spraying water; 71. a jet pipe way; 711. a first flow directing vane; 712. a second flow directing vane; 72. a first pair of injection tubes; 73. a second pair of injection tubes; 74. a drain pipe; 75. a water tank; 751. a filter plate; 752. a sewage area; 753. a water purification area; 754. a circulation pump; 755. a sewage pump; 756. a bubbling pipe; 7561. a bubbling main pipe; 7562. a bubbling branch pipe; 8. a spray assembly; 71. a spray cylinder; 72. tail gas cylinder; 73. a shower pipe; 731. an atomizing nozzle; 74. installing a screen plate; 75. a packing rosette; 9. a flow passage adjusting structure; 91. a first baffle; 911. a first slider; 92. a second baffle; 921. a second slider; 93. an adjusting ring; 94. a first mounting groove; 941. a first return spring; 95. a second mounting groove; 951. a second return spring; 96. a first adjustment guide block; 97. a second adjustment guide block.
Detailed Description
The utility model is described in further detail below with reference to fig. 1-10.
The embodiment of the utility model discloses plasma water washing and purifying equipment. Referring to fig. 1, a plasma water-washing purification apparatus includes a frame 1, and a plasma reaction device and a water-washing purification device mounted on the frame 1. The plasma reaction device is used for carrying out plasma ionization decomposition on the waste gas and decomposing harmful waste gas into harmless gas. The water washing purification device is connected with the plasma reaction device, waste gas after plasma ionization decomposition is introduced into the water washing purification device, the water washing purification device cools and removes dust on high-temperature waste gas, water-soluble gas in the waste gas is absorbed, and the cleanliness of the discharged waste gas is guaranteed.
Referring to fig. 2 and 3, the plasma reaction apparatus includes a reaction chamber 4 and a plasma generator 3, the plasma generator 3 is installed on the reaction chamber 4, the top of the reaction chamber 4 is connected with four air supply pipes 2, the air supply pipes 2 are communicated with the inside of the reaction chamber 4, waste gas is introduced into the reaction chamber 4 through the air supply pipes 2, the plasma generator 3 is electrified and generates a high-temperature plasma arc, the waste gas is ionized and decomposed at a high temperature, the waste gas is combusted without using extra fuel, the energy is saved, the center temperature of the plasma arc is up to 8000 ℃ or higher, the peripheral temperature of the plasma arc is up to 1500 ℃ or higher, and the decomposition rate of the waste gas is high.
Referring to fig. 3, the gas supply pipe 2 includes a gas supply main pipe 21 and a protection gas pipe 22, the gas supply main pipe 21 communicates with the inside of the reaction chamber 4, and exhaust gas is introduced into the inside of the reaction chamber 4 through the gas supply main pipe 21. The protection air pipe 22 is communicated with the main air supply pipe 21, in this embodimentThrough the protection air pipe 22 into the reaction chamber 4 through N 2 And N 2 The plasma reaction device is easier to ionize compared with air, so that the decomposition rate of the plasma reaction device to the waste gas is improved. One end of the air supply main pipe 21, which is close to the reaction bin 4, is connected with a corrugated pipe 23 through a quick-connection hoop, and the air supply main pipe 21 is communicated with the reaction bin 4 through the corrugated pipe 23. The characteristics of the bellows 23, such as scalability and easy bending, are utilized to facilitate the connection of the gas supply pipeline 2 and the reaction chamber 4. The gas supply main pipe 21 is communicated with the bypass pipe 24, the bypass pipe 24 is in a normally closed state, and when the gas supply main pipe 21 is damaged and needs to be replaced and maintained, waste gas is introduced into the reaction bin 4 through the bypass pipe 24 without stopping, so that the continuous operation of the waste gas treatment equipment is ensured.
Referring to fig. 3 and 4, the reaction chamber 4 includes an end cover 41 and a reaction ring seat 42, the end cover 41 is disposed at one end of the reaction ring seat 42, and the end cover 41 and the reaction ring seat 42 are fixedly connected by KF hook type flange clamp, so that the tightness between the end cover 41 and the reaction ring seat 42 is better. A reaction chamber 423 is formed inside the reaction ring holder 42, the plasma generator 3 is fixed on a top wall of the end cover 41 far from the reaction ring holder 42, and an electrode tip of the plasma generator 3 passes through the end cover 41 and is positioned in the reaction chamber 423. Four air inlet pipe orifices 411 are formed on the end cover 41, the air inlet pipe orifices 411 are communicated with the inside of the reaction cavity 423, the air inlet pipe orifices 411 are in one-to-one correspondence with the air supply pipelines 2, and one end, far away from the air supply pipelines 2, of the corrugated pipe 23 is connected with the air inlet pipe orifices 411 through a quick-connection anchor ear.
Referring to fig. 4 and 5, a support ring table 421 is welded and fixed on the inner wall of the reaction ring seat 42, the support ring table 421 is coaxial with the reaction ring seat 42, a deflector 422 is disposed on the support ring table 421, and a deflector hole 4221 through which a plasma arc generated by the plasma generator 3 passes is formed in the center of the deflector 422. The deflector 422 plays a role in guiding the exhaust gas introduced into the reaction chamber 423, and the exhaust gas flows through the deflector hole 4221, so that the exhaust gas can be fully contacted with the plasma arc, and the ionization decomposition effect of the exhaust gas is ensured.
Referring to fig. 5 and 6, the bottom of the deflector 422 is provided with a flow channel adjusting structure 9, the flow channel adjusting structure 9 includes a first baffle 91, a second baffle 92 and an adjusting ring 93, the first baffle 91 and the second baffle 92 are all provided with four, the four first baffles 91 are attached to the bottom surface of the deflector 422 and uniformly distributed along the circumference of the deflector hole 4221, the four second baffles 92 are attached to the outer wall of the first baffle 91 far away from the deflector 422, and the second baffles 92 are also uniformly distributed along the axial direction of the deflector hole 4221. The first guide plate 422 and the second guide plate 422 are fan-shaped, the angles of the first guide plate 422 and the second guide plate 422 are 60 degrees, and the first guide plate 422 and the second guide plate 422 are arranged in a staggered mode in the circumferential direction.
Referring to fig. 5 and 6, four first mounting grooves 94 are formed in the bottom surface of the guide plate 422, the first mounting grooves 94 are in one-to-one correspondence with the first baffles 91, first sliding blocks 911 are fixed on the outer wall of the first baffles 91, which is close to the guide plate 422, the first sliding blocks 911 are located in the first mounting grooves 94, and each first baffle 91 is slidably connected with the guide plate 422 through the first sliding blocks 911. Four second mounting grooves 95 are formed in the bottom surface of the guide plate 422, the second mounting grooves 95 are in one-to-one correspondence with the second baffle plates 92, second sliding blocks 921 are fixed on the outer wall, close to the guide plate 422, of the second baffle plates 92, the second sliding blocks 921 are located in the second mounting grooves 95, and each second baffle plate 92 is connected with the guide plate 422 in a sliding mode through the second sliding blocks 921.
Referring to fig. 5 and 6, an adjusting ring 93 is sleeved on the outer sides of the first baffle 91 and the second baffle 92, the adjusting ring 93 is coaxial with the flow guide hole 4221, the adjusting ring 93 is slidably connected with the first baffle 91, four first adjusting guide blocks 96 are fixed on the inner wall of the adjusting ring 93, the first adjusting guide blocks 96 are in one-to-one correspondence with the first baffle 91, the first adjusting guide blocks 96 are abutted with the outer wall of the first baffle 91 away from the flow guide hole 4221, and the thickness of the first adjusting guide blocks 96 is gradually increased along the circumferential direction of the adjusting ring 93. Four second adjusting guide blocks 97 are fixed on the inner wall of the adjusting ring 93, the second adjusting guide blocks 97 are in one-to-one correspondence with the second baffle plates 92, the second adjusting guide blocks 97 are abutted with the outer wall of the second baffle plates 92 away from the guide holes 4221, the thickness of the second adjusting guide blocks 97 is gradually increased along the axial direction of the adjusting ring 93, and the increasing directions of the thicknesses of the first adjusting guide blocks 96 and the second adjusting guide blocks 97 are the same. Thereby when rotating adjusting ring 93 along the decreasing direction of first adjusting guide 96 thickness, first baffle 91 and second baffle 92 are under the interference effect of corresponding first adjusting guide 96 and second adjusting guide 97, move towards the direction that is close to guiding hole 4221 to indirectly realize the adjustment to guiding hole 4221 aperture, can then adjust guiding hole 4221's aperture through runner adjustment mechanism according to actual processing reaction effect, improve the purification treatment effect.
Referring to fig. 6 and 7, a first return spring 941 is disposed in the first mounting groove 94, the first return spring 941 is located on a side of the first slider 911 away from the adjustment ring 93, the first return spring 941 is in a compressed state, one end of the first return spring 941 abuts against an inner wall of the first mounting groove 94, and the other end abuts against the first slider 911. The second mounting groove 95 is internally provided with a second reset spring 951, the second reset spring 951 is positioned on one side of the second slide block 921 away from the adjusting ring 93, the second reset spring 951 is in a compressed state, one end of the second reset spring 951 is abutted with the inner wall of the second mounting groove 95, the other end of the second reset spring is abutted with the second slide block 921, and accordingly the first baffle 91 and the second baffle 92 are kept in an abutting state with the corresponding first adjusting guide block 96 and second adjusting guide block 97, and reset of the first baffle 91 and the second baffle 92 is facilitated.
Referring to fig. 4 and 5, a first sealing pad 412 is attached to a surface of the reaction ring seat 42, which is close to the end cover 41, and the first sealing pad 412 is clamped between the end cover 41 and the reaction ring seat 42, so as to ensure tightness between the reaction ring seat 42 and the end cover 41. The end cover 41 is internally provided with a first water cooling cavity 413, the end cover 41 is connected with a first water cooling inlet pipe 414 and a first water cooling outlet pipe 415, and the first water cooling inlet pipe 414 and the first water cooling outlet pipe 415 are communicated with the first water cooling cavity 413. When waste gas carries out ionization decomposition in reaction chamber 423, let in circulating cold water in to first water-cooling chamber 413 through first water-cooling inlet tube 414 and first water-cooling outlet tube 415, cool down end cover 41 and reaction ring seat 42 for plasma generator 3 is difficult for appearing the overtemperature damage when continuously operating, and plays the effect of cooling protection to first sealing pad 412.
Referring to fig. 4 and 8, the water washing purification apparatus includes a primary water washing assembly 5, the primary water washing assembly 5 includes a first water washing drum 51 and a second water washing drum 53, the first water washing drum 51 is located at one end of the reaction ring seat 42 far from the end cover 41, the second water washing drum 53 is welded and fixed at one end of the first water washing drum 51 far from the reaction ring seat 42, and the second water washing drum 53 is coaxial with the first water washing drum 51. One end of the washing drum, which is close to the reaction ring seat 42, is fixedly welded with a flange seat 513, and the flange seat 513 is fixedly clamped with the reaction ring seat 42 through a KF hook-shaped flange clamp.
Referring to fig. 4 and 5, a second gasket 5134 is provided between the flange seat 513 and the reaction ring seat 42 to improve the sealing of the connection between the reaction ring seat 42 and the water washing drum. The inside of the flange seat 513 is formed with a second water cooling cavity 5131, the circumferential side wall of the flange seat 513 is connected with a second water cooling inlet pipe 5133, the second water cooling inlet pipe 5133 is communicated with the second water cooling cavity 5131, the inner wall of the flange seat 513 close to the first water washing annular cavity 512 is provided with a water outlet 5132 along the circumferential direction of the inner wall, and the second water cooling cavity 5131 is communicated with the first water washing annular cavity 512 through the water outlet 5132. Condensed water is introduced into the second water cooling cavity 5131 through the second water cooling inlet pipe 5133, the flange seat 513 and the reaction ring seat 42 are cooled, the plasma generator 3 is cooled and protected, long-term stable operation of the plasma generator 3 is ensured, and the second sealing gasket 5134 is cooled and protected, so that the second sealing gasket 5134 is not easy to burn at high temperature.
Referring to fig. 8, a first exhaust pipe 52 is arranged in the first washing barrel 51 in a penetrating way, the first exhaust pipe 52 is fixedly connected with the first washing barrel 51, one end of the first exhaust pipe 52 away from the first washing barrel 51 is positioned in the second washing barrel 53, and the first exhaust pipe 52 is coaxial with the diversion hole 4221; the second water washing barrel 53 is internally penetrated with a second exhaust pipe 54, the second exhaust pipe 54 is fixedly connected with the second water washing barrel 53, the second exhaust pipe 54 is coaxial with the first exhaust pipe 52, a first water inlet gap 541 is formed between the first exhaust pipe 52 and the second exhaust pipe 54, and the width of the first water inlet gap 541 is 5mm. The exhaust gas is ionized and decomposed by the plasma arc at high temperature in the reaction chamber 4, and then enters the first exhaust pipe 52 through the flow guiding hole 4221, and then enters the second exhaust pipe 54 from the first exhaust pipe 52.
Referring to fig. 8, a first washing ring chamber 512 is formed between the first exhaust pipe 52 and the first washing cylinder 51, a first washing inlet pipe 511 is connected to the first washing cylinder 51, a second washing ring chamber 532 is formed between the second exhaust pipe 54 and the second washing cylinder 53, and a second washing inlet pipe 531 is connected to the second washing cylinder 53. When the exhaust gas flows through the first exhaust pipe 52 and the second exhaust pipe 54, water is introduced into the first water washing annular cavity 512 through the first water washing inlet pipe 511, and the water enters the first exhaust pipe 52 through the first water washing annular cavity 512, so that not only is the temperature of the exhaust gas after pyrolysis reduced, but also water-soluble gas in the exhaust gas is dissolved in the water, and dust particles on the inner wall of the first exhaust pipe 52 are scoured. And water is introduced into the second water washing annular cavity 532 through the second water washing inlet pipe 531, and the water is accumulated in the second water washing annular cavity 532 and gradually rises to the first water inlet gap 541, flows into the second exhaust pipe 54 through the first water inlet gap 541, further has a cooling effect on high-temperature exhaust gas, so that dust particles are not easy to accumulate on the inner wall of the second exhaust pipe 54, and water-soluble gas in the treated exhaust gas is dissolved in water.
Referring to fig. 9 and 10, the frame 1 is slidably connected with a horizontally arranged mounting plate 12, the mounting plate 12 is provided with a mounting hole 122, the second washing drum 53 is inserted into the mounting hole 122, and the first washing drum 51 is fixed on the mounting plate 12 by bolts. The opposite two sides of the mounting plate 12 are provided with sliding rails 11, the sliding rails 11 are fixedly connected with the rack 1, sliding grooves 111 are formed in the sliding rails 11 along the length direction of the mounting plate 12, sliding strips 121 matched with the sliding grooves 111 are fixed on the mounting plate 12, the sliding strips 121 are located in the sliding grooves 111, and the mounting plate 12 is in sliding connection with the sliding rails 11 through the sliding strips 121. When the water washing purification equipment needs to be maintained, the plasma reaction device and the main water washing component are conveniently moved to the outer side of the frame 1, the operation space of staff is increased, and the convenience of maintenance is improved.
Referring to fig. 8, the water washing purification apparatus further includes a secondary water washing assembly 6, the secondary water washing assembly 6 includes a third water washing drum 61 and a third exhaust pipe 62 penetrating into the third water washing drum 61, the third exhaust pipe 62 is fixedly connected with the third water washing drum 61, one end of the second exhaust pipe 54, which is far away from the first exhaust pipe 52, is located in the third water washing drum 61, the third exhaust pipe 62 is coaxial with the second exhaust pipe 54, a second water inlet gap 621 is formed between the third exhaust pipe 62 and the second exhaust pipe 54, and the width of the second water inlet gap 621 is 5mm. When the exhaust gas flows into the third exhaust pipe 62 from the second exhaust pipe 54, water is introduced into the third water washing annular cavity 612 through the third water washing inlet pipe 611, and the water flows into the third exhaust pipe 62 through the second water inlet gap 621, so that the temperature of the high-temperature exhaust gas is further reduced, the water-soluble gas in the exhaust gas can be fully dissolved in the water, and dust particles are not easy to accumulate on the inner wall of the third exhaust pipe 62.
Referring to fig. 9 and 11, the water washing purification apparatus further includes a water spray counter assembly 7, and the water spray counter assembly 7 includes a water spray counter pipe 71, a water drain pipe 74, and a water tank 75. An air inlet is formed in the side wall of one end of the opposite spray pipe channel 71, one end of the third exhaust pipe 62 is connected with the air inlet of the opposite spray pipe channel 71 through a quick-connection hoop, one end, close to the third exhaust pipe 62, of the opposite spray pipe channel 71 is connected with a first pair of spray pipes 72, the other end of the opposite spray pipe channel 71 is connected with a second pair of spray pipes 73, the first pair of spray pipes 72 and the second pair of spray pipes 73 are used for introducing water into the opposite spray pipe channel 71, and the water inlet direction of the first pair of spray pipes 72 is opposite to the water inlet direction of the second pair of spray pipes 73. A water tank 75 is fixed to the frame 1, and the counter flow channel 71 is located at the top of the water tank 75, and a drain pipe 74 is connected to a side wall of the counter flow channel 71 near one end of the second pair of injection pipes 73, the counter flow channel 71 being in communication with the water tank 75 through the drain pipe 74.
Referring to fig. 9 and 11, the exhaust gas enters the counter flow channel 71 through the third exhaust pipe 62, water is sprayed into the counter flow channel 71 through the first and second pairs of spray pipes 72 and 73, the water flows convect in the counter flow channel 71, the exhaust gas and the water flow can be fully mixed, the exhaust gas is effectively cooled, the water-soluble gas in the exhaust gas can be fully dissolved in water, dust particles in the exhaust gas are not easy to accumulate in the counter flow channel 71 under the action of the counter flow, and the water in the counter flow channel 71 flows into the water tank 75 through the water drain pipe 74 for storage.
Referring to fig. 9 and 11, in order to further improve the effect of washing the exhaust gas by the water spray washing assembly 7, a first diversion spiral vane 711 is welded and fixed on the inner wall of the spray pipe channel 71 close to the first pair of spray pipes 72, a second diversion spiral vane 712 is welded and fixed on the inner wall of the spray pipe channel 71 close to the second pair of spray pipes 73, the first diversion spiral vane 711 and the second diversion spiral vane 712 are spiral along the length direction of the first diversion spiral vane 711 and the second diversion spiral vane 712, and the spiral directions between the first diversion spiral vane 711 and the second diversion spiral vane 712 are opposite. When the water flow is introduced into the opposite spraying pipeline 71 through the first opposite spraying pipe 72 and the second opposite spraying pipe 73, the first guide rotary vane 711 and the second guide rotary vane 712 play a role in guiding the flow of the water flow, and the water flow is in a cyclone state when moving along the inner wall of the opposite spraying pipeline 71, so that the opposite flushing effect of the water flow in the opposite spraying pipeline 71 is better, the waste gas and the water flow can be fully contacted, dust particles on the inner wall of the opposite spraying pipeline 71 can be effectively flushed, and the opposite spraying pipeline 71 is not easy to be blocked.
Referring to fig. 9 and 11, a spray assembly 8 is connected to a spray pipe 71, the spray assembly 8 comprises a spray cylinder 71, a tail gas cylinder 72 and a spray pipe 73, the spray cylinder 71 is vertically arranged, the bottom end of the spray cylinder 71 is connected with the spray pipe 71, the other end of the spray cylinder 71 is connected with the tail gas cylinder 72, the spray cylinder 71 is coaxial with a drain pipe 74, two installation screen plates 74 are fixed in the spray cylinder 71, a plurality of packing rosettes 75 are placed on each installation screen plate 74, and in the embodiment, the packing rosettes 75 adopt PVC pall rings. The two spraying pipes 73 are arranged, the two spraying pipes 73 are connected with the spraying cylinder 71, one end of each spraying pipe 73 penetrates through the spraying cylinder 71 and is connected with an atomizing nozzle 731, the atomizing nozzles 731 are in one-to-one correspondence with the mounting screen 74, and each atomizing nozzle 731 is located at the top of the corresponding mounting screen 74. The waste gas flows into the spray cylinder 71 through the spray pipe channel 71, the spray pipe 73 sprays water mist into the spray cylinder 71 through the atomizing nozzle 731, the water mist captures residual dust and soluble gas in the waste gas and flows back into the water tank 75, the packing garland 75 increases the contact time between the liquid sprayed by the spray pipe 73 and the waste gas, the cleanliness of the waste gas discharged from the tail gas cylinder 72 is guaranteed, and the pollution to the environment is reduced.
Referring to fig. 11 and 12, a filter plate 751 is installed in the water tank 75, the filter plate 751 divides the inner cavity of the water tank 75 into a sewage area 752 and a purified water area 753, a drain pipe 74 is in tank communication with the sewage area 752 of the water tank 75, a circulation pump 754 is installed at a position of the top wall of the water tank 75 near the purified water area 753, and one end of each spray pipe 73 far from the spray cylinder 71 is in communication with the purified water area 753 through the circulation pump 754. The sewage generated by washing the waste gas is discharged into the sewage area 752 through the drain pipe 74, part of sewage flows into the purified water area 753 under the filtering action of the filtering plate 751, purified water in the purified water area 753 is discharged into the spray cylinder 71 through the circulating pump 754, the waste gas of the spray cylinder 71 is sprayed and purified, and the sprayed water flows back into the sewage area 752 through the drain pipe 74 again, so that the full utilization of the water in the water tank 75 is realized.
Referring to fig. 11 and 12, a sewage pump 755 is provided at one side of the water tank 75, and the sewage pump 755 communicates with a sewage area 752 of the water tank 75 through a pipe for discharging sewage in the water tank 75. The waste water zone 752 of the water tank 75 is connected with a bubbling pipe 756, and the bubbling pipe 756 is used for passing gas into the waste water zone 752, and in this embodiment, N is introduced into the waste water zone 752 through the bubbling pipe 756 2 On the one hand, the device has a cooling effect on water in the sewage area 752, and on the other hand, the device has a pneumatic stirring effect on sewage in the sewage area 752, so that dust particles in the sewage are not easy to deposit, the sewage is discharged conveniently, and the pipeline is not easy to be blocked. The bubble pipe 756 includes a bubble main pipe 7561 and a plurality of bubble branch pipes 7562, each bubble branch pipe 7562 is communicated with the bubble main pipe 7561, and a plurality of bubble branch pipes 7562 are arranged along the height direction of the water tank 75 to ensure the pneumatic stirring effect on the sewage in the water tank 75.
The implementation principle of the plasma water washing and purifying equipment provided by the embodiment of the utility model is as follows: the waste gas is introduced into the reaction bin 4 through the gas supply pipeline 2, and the plasma generator 3 is electrified and generates high-temperature plasma arc to ionize and decompose the waste gas. The waste gas is ionized and decomposed by the plasma arc at high temperature in the reaction bin 4, so that the waste gas is ionized and decomposed. The central temperature of the plasma arc is up to more than 8000 ℃, and the peripheral temperature of the plasma arc can be up to more than 1500 ℃, so that the waste gas can be effectively subjected to pyrolysis treatment. In the process of ionizing and decomposing PFC waste gas, condensed water is introduced into the end cover 41 and the flange seat 513 through the first water cooling inlet pipe 414 and the second water cooling inlet pipe 5133 to cool down, so that the plasma generator 3 is not easy to damage due to continuous high-temperature operation, and meanwhile, the first sealing gasket 412 and the second sealing gasket 5134 also play a role in cooling down protection.
The decomposed and purified exhaust gas sequentially enters the first exhaust pipe 52, the second exhaust pipe 54 and the third exhaust pipe 62, and water is introduced into the first water washing cylinder 51, the second water washing cylinder 53 and the third water washing cylinder 61, so that not only is the exhaust gas subjected to pyrolysis cooled, but also water-soluble gas in the exhaust gas is dissolved in water, and dust particles on the inner wall of each exhaust pipe are scoured. The waste gas enters the opposite-spraying pipeline 71 through the third exhaust pipe 62, water is sprayed into the opposite-spraying pipeline 71 through the first opposite-spraying pipeline 72 and the second opposite-spraying pipeline 73, water flows convect in the opposite-spraying pipeline 71, the waste gas and the water flow can be fully mixed, the waste gas is effectively cooled, the water-soluble gas in the waste gas can be fully dissolved in the water, and dust particles in the waste gas are not easy to accumulate in the opposite-spraying pipeline 71 under the action of opposite-spraying rapid flow. The waste gas flows into the spray cylinder 71 through the opposite spray pipe 71, the circulating pump 754 sprays water mist into the spray cylinder 71 through the spray pipe 73, the water mist captures residual dust and soluble gas in the waste gas, and the water mist flows into the water return tank 75, so that the cleanliness of the waste gas discharged from the tail gas cylinder 72 is ensured, and the pollution to the environment is reduced.
The above embodiments are not intended to limit the scope of the present utility model, so: all equivalent changes in structure, shape and principle of the utility model should be covered in the scope of protection of the utility model.
Claims (2)
1. A plasma water washing purification device is characterized in that: the plasma reaction device comprises a frame (1) and a plasma reaction device arranged on the frame (1), the plasma reaction device comprises a plasma generator (3), a reaction bin (4) and a plurality of air supply pipelines (2), the plasma generator (3) is arranged on the reaction bin (4), the air supply pipelines (2) are connected with the reaction bin (4), the air supply pipelines (2) are used for introducing waste gas to be purified into the reaction bin (4), a guide plate (422) is arranged in the reaction bin (4), a guide hole (4221) through which a plasma arc generated by the plasma generator (3) passes is formed in the guide plate (422), a flow passage adjusting structure (9) is arranged at the bottom of the guide plate (422), the flow passage adjusting structure (9) comprises four first baffle plates (91), second baffle plates (92) and adjusting rings (93), the first baffle plates (91) and the second baffle plates (92) are respectively provided with four first baffle plates (91) and the bottom surfaces of the guide plate (422) to be attached to the guide plate (422) and uniformly distributed along the guide plate (21) and the second baffle plates (4221) are uniformly distributed along the circumferential direction of the guide plate (4221) and are also uniformly distributed along the guide plate (4221) and the second baffle plates, the angles of the first guide plate and the second guide plate are 60 degrees, the first guide plate and the second guide plate are arranged in a staggered manner in the circumferential direction, four first mounting grooves (94) are formed in the bottom surface of the guide plate (422), the first mounting grooves (94) are in one-to-one correspondence with the first baffle plates (91), first sliding blocks (911) are fixed on the outer wall of the first baffle plates (91) close to the guide plate (422), the first sliding blocks (911) are positioned in the first mounting grooves (94), each first baffle plate (91) is connected with the guide plate (422) in a sliding manner through the first sliding blocks (911), four second mounting grooves (95) are formed in the bottom surface of the guide plate (422), the second mounting grooves (95) are in one-to-one correspondence with the second baffle plates (92), second sliding blocks (921) are fixed on the outer wall of the second baffle plates (92) close to the guide plate (422), the second sliding blocks (921) are positioned in the second mounting grooves (95), each second baffle plate (92) is connected with the guide plate (422) in a sliding manner through the second sliding blocks (921), the inner wall of the first baffle plates (93) is sleeved with the second baffle plates (93) in a sliding manner, the inner wall of the first baffle plates (93) is connected with the fourth baffle plates (93) in a sliding manner, the inner wall of the second baffle plates (93) is fixedly connected with the fourth baffle plates (4293), the first adjusting guide blocks (96) are in one-to-one correspondence with the first baffle plates (91), the first adjusting guide blocks (96) are in abutting joint with the outer wall of the first baffle plates (91) far away from the guide holes (4221), the thickness of the first adjusting guide blocks (96) is gradually increased along the circumferential direction of the adjusting ring (93), four second adjusting guide blocks (97) are fixed on the inner wall of the adjusting ring (93), the second adjusting guide blocks (97) are in one-to-one correspondence with the second baffle plates (92), the second adjusting guide blocks (97) are in abutting joint with the outer wall of the second baffle plates (92) far away from the guide holes (4221), the thickness of the second adjusting guide blocks (97) is gradually increased along the axial direction of the adjusting ring (93), a first reset spring (941) is arranged in the first installation groove (94), the first reset spring (941) is located on one side of the first slider (911) far away from the adjusting ring (93), the first reset spring (941) is in a compressed state, the thickness of the second adjusting guide blocks (97) is gradually increased along the axial direction of the adjusting ring (93), the thickness of the first reset spring (951) is equal to the thickness of the second reset spring (951) is located on the other side of the first slider (951) far away from the first slider (951), one end of a second reset spring (951) is abutted with the inner wall of a second mounting groove (95), the other end of the second reset spring is abutted with a second sliding block (921), the reaction bin (4) comprises a reaction ring seat (42) and an end cover (41) arranged at one end of the reaction bin (4), a guide plate (422) is arranged in the reaction ring seat (42), a first water cooling cavity (413) is formed in the end cover (41), a first water cooling inlet pipe (414) and a first water cooling outlet pipe (415) are connected to the end cover (41), the first water cooling inlet pipe (414) and the first water cooling outlet pipe (415) are communicated with the first water cooling cavity (413), the water washing and purifying device comprises a primary water washing assembly (5), the primary water washing assembly (5) comprises a first water washing barrel (51) and a first exhaust pipe (52), the first water washing barrel (51) is connected to one end of the reaction ring seat (42) far away from the end cover (41), the first exhaust pipe (52) is provided with a first water cooling inlet pipe (414) and a first exhaust pipe (52), the first water washing barrel (51) is connected to the first water washing barrel (51) and the first exhaust pipe (52) in the first water washing barrel (51), the first water washing inlet pipe (511) is communicated with the first water washing annular cavity (512), the primary water washing assembly (5) further comprises a second water washing barrel (53) and a second exhaust pipe (54) penetrating through the second water washing barrel (53), the second exhaust pipe (54) is fixedly connected with the second water washing barrel (53), the second water washing barrel (53) is arranged at one end, far away from the reaction annular seat (42), of the first water washing barrel (51), a second water washing annular cavity (532) is formed between the second exhaust pipe (54) and the second water washing barrel (53), a second water washing inlet pipe (531) is connected to the second water washing barrel (53), a first water inlet gap (541) is formed between the second exhaust pipe (54) and the first exhaust pipe (52), one end, close to the reaction annular seat (42), of the first water washing barrel (51) is fixedly provided with a flange seat (513), the second water washing barrel (53) is connected with the second water cooling annular cavity (5131) through the flange seat (5133), the second water cooling barrel (53) is connected with the second water cooling annular cavity (5131), the second water cooling barrel (5131) is connected with the second water cooling annular cavity (5131), the water washing purification device further comprises a secondary water washing assembly (6), the secondary water washing assembly (6) comprises a third water washing barrel (61) and a third exhaust pipe (62) penetrating through the third water washing barrel (61), the third exhaust pipe (62) is fixedly connected with the third water washing barrel (61), a third water washing annular cavity (612) is formed between the third exhaust pipe (62) and the third water washing barrel (61), a third water washing inlet pipe (611) is connected in the third water washing barrel (61), the third exhaust pipe (62) and the second exhaust pipe (54) are coaxial, a second water inlet gap (621) is formed between the third exhaust pipe (62) and the second exhaust pipe (54), the water washing purification device further comprises a water washing assembly (7), the water washing assembly (7) comprises a water spraying pipeline (71), the third exhaust pipe (62) is connected with the water spraying pipeline (71), one end of the water spraying pipeline (71) is connected with a first pair of spraying pipes (72), the other end of the water spraying pipeline (71) is connected with a second pair of spraying pipes (73), the first pair of spraying pipes (72) and the second pair of spraying pipes (73) are both used for introducing water into the water spraying pipeline (71), the water inlet directions of the first pair of spraying pipes (72) and the second pair of spraying pipes (73) are opposite, a first diversion rotary vane (711) is fixed on the inner wall of the pair of spray pipes (71) close to the first pair of spray pipes (72), a second diversion rotary vane (712) is fixed on the inner wall of the pair of spray pipes (71) close to the second pair of spray pipes (73), the first diversion spiral sheet (711) and the second diversion spiral sheet (712) are in spiral shapes along the length direction of the first diversion spiral sheet (711) and the second diversion spiral sheet (712), and the spiral directions between the first diversion spiral sheet (711) and the second diversion spiral sheet (712) are opposite.
2. A plasma water cleaning apparatus as claimed in claim 1, wherein: one end of the air supply pipeline (2) close to the reaction bin (4) is connected with a corrugated pipe (23), and the air supply pipeline (2) is communicated with the reaction bin (4) through the corrugated pipe (23).
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| CN210332214U (en) * | 2019-08-02 | 2020-04-17 | 佛山市柏然环保科技有限公司 | Waste gas purification composite set |
| CN214182502U (en) * | 2020-11-19 | 2021-09-14 | 武汉乾宸环保工程有限公司 | Exhaust gas purification system with self-checking device |
| CN112495120A (en) * | 2020-12-01 | 2021-03-16 | 夏建设 | Waste gas purification device of sewage treatment system of metal smelting plant |
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