CN113842755A - Plasma water cleaning chemical equipment - Google Patents
Plasma water cleaning chemical equipment Download PDFInfo
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- CN113842755A CN113842755A CN202111124997.8A CN202111124997A CN113842755A CN 113842755 A CN113842755 A CN 113842755A CN 202111124997 A CN202111124997 A CN 202111124997A CN 113842755 A CN113842755 A CN 113842755A
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- washing
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 245
- 238000004140 cleaning Methods 0.000 title claims abstract description 21
- 239000000126 substance Substances 0.000 title description 2
- 238000005406 washing Methods 0.000 claims abstract description 163
- 238000006243 chemical reaction Methods 0.000 claims abstract description 117
- 239000002912 waste gas Substances 0.000 claims abstract description 91
- 239000007789 gas Substances 0.000 claims abstract description 72
- 238000000746 purification Methods 0.000 claims abstract description 16
- 238000001816 cooling Methods 0.000 claims description 59
- 239000007921 spray Substances 0.000 claims description 51
- 235000017166 Bambusa arundinacea Nutrition 0.000 claims description 38
- 235000017491 Bambusa tulda Nutrition 0.000 claims description 38
- 241001330002 Bambuseae Species 0.000 claims description 38
- 235000015334 Phyllostachys viridis Nutrition 0.000 claims description 38
- 239000011425 bamboo Substances 0.000 claims description 38
- 238000002347 injection Methods 0.000 claims description 9
- 239000007924 injection Substances 0.000 claims description 9
- 230000000694 effects Effects 0.000 abstract description 33
- 239000000428 dust Substances 0.000 abstract description 21
- 238000000354 decomposition reaction Methods 0.000 abstract description 9
- 239000008187 granular material Substances 0.000 abstract description 6
- 230000003749 cleanliness Effects 0.000 abstract description 4
- 238000005507 spraying Methods 0.000 description 46
- 239000010865 sewage Substances 0.000 description 21
- 230000005587 bubbling Effects 0.000 description 12
- 239000002245 particle Substances 0.000 description 11
- 238000000197 pyrolysis Methods 0.000 description 8
- 238000007789 sealing Methods 0.000 description 6
- 238000009987 spinning Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000009434 installation Methods 0.000 description 4
- 239000003595 mist Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 238000010891 electric arc Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 241000196324 Embryophyta Species 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 238000005352 clarification Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/30—Controlling by gas-analysis apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treating Waste Gases (AREA)
Abstract
The utility model relates to a plasma water cleaning ization equipment relates to exhaust-gas treatment's field, and it includes the frame and sets up the plasma reaction unit in the frame, plasma reaction unit includes plasma generator, reaction storehouse and a plurality of gas supply line, plasma generator sets up on the reaction storehouse, the gas supply line is connected with the reaction storehouse, the gas supply line is used for letting in the waste gas of treating the purification in to the reaction storehouse, be provided with the guide plate in the reaction storehouse, set up the water conservancy diversion hole that the plasma arc that supplies plasma generator to produce passed on the guide plate. This application effectively improves the decomposition effect to waste gas, and the dust granule in the waste gas is difficult for piling up in the pipeline, and is high to the washing purification degree of waste gas, and the cleanliness factor of guarantee exhaust gas reduces the pollution to the environment.
Description
Technical Field
The application relates to the field of waste gas treatment, in particular to plasma water cleaning equipment.
Background
In the semiconductor manufacturing process, harmful waste gases such as sulfur dioxide, nitrogen oxide, fluorine-containing gas and the like are discharged outside, and a large amount of dust is discharged to the environment along with the waste gases, so that environmental air pollution is caused. Further, since the fluoride gas directly discharged into the atmosphere causes environmental pollution, even greenhouse effect, and thus has a serious influence on global warming, the waste gas needs to be treated into harmless gas or products before being discharged.
The relevant Chinese utility model patent with publication number CN212339288U discloses a plasma waste gas treatment system, which belongs to the technical field of waste gas treatment and comprises a reaction cavity, wherein a plasma generator is arranged in the reaction cavity in a matching way, a process air inlet is arranged on the plasma generator, an outlet at the bottom of the reaction cavity is connected with a primary washing system in a matching way, and an outlet of the primary washing system is respectively connected with a secondary washing cooling system and a filtering system in a matching way; the reaction chamber is characterized by also comprising a water curtain system, wherein a water curtain flange of the water curtain system is fixedly arranged at the top of the reaction chamber, and a water curtain wall formed below the water curtain flange is positioned in the reaction chamber; the water curtain system, the plasma generator, the primary water washing system, the secondary water washing cooling system and the filtering system are in electric control fit with the electric controller.
In view of the above-mentioned related art, the inventors believe that when the exhaust gas passes through the reaction chamber, the exhaust gas at the periphery of the reaction chamber is difficult to keep sufficient reaction contact with the high-temperature plasma arc generated by the plasma generator, so that the efficiency of plasma pyrolysis is low.
Disclosure of Invention
In order to improve peripheral waste gas in the reaction chamber and be difficult to keep abundant reaction contact with the high temperature plasma arc that plasma generator produced for the lower problem of efficiency of plasma pyrolysis, the application provides a plasma water cleaning ization equipment.
The application provides a plasma water cleaning ization equipment adopts following technical scheme:
the utility model provides a plasma water cleaning ization equipment, includes the frame and sets up the plasma reaction unit in the frame, plasma reaction unit includes plasma generator, reaction storehouse and a plurality of air feed line, plasma generator sets up on the reaction storehouse, the air feed line is connected with the reaction storehouse, the air feed line is used for letting in the waste gas of treating purifying in to the reaction storehouse, be provided with the guide plate in the reaction storehouse, set up the water conservancy diversion hole that the plasma arc that supplies plasma generator to produce passed on the guide plate.
Through adopting above-mentioned technical scheme, semiconductor waste gas with treating purification treatment passes through in the gas supply line lets in the reaction storehouse, plasma generator produces the plasma electric arc in the reaction storehouse, carry out high temperature ionization to waste gas and decompose, plasma generator's plasma electric arc passes from the water conservancy diversion hole of water conservancy diversion crown plate, the water conservancy diversion crown plate plays the water conservancy diversion effect to waste gas through in the reaction storehouse, waste gas passes through the water conservancy diversion hole and flows outside the reaction storehouse, make waste gas can with the abundant contact of keeping of plasma electric arc, then improve the ionization decomposition effect to waste gas.
Preferably, one end of the gas supply pipeline close to the reaction bin is connected with a corrugated pipe, and the gas supply pipeline is communicated with the reaction bin through the corrugated pipe.
Through adopting above-mentioned technical scheme, the one end of gas supply line is connected with the bellows, utilizes the scalable, the easy characteristics of buckling of bellows to make things convenient for the erection joint between gas supply line and the reaction bin.
Preferably, the reaction bin includes reaction ring seat and sets up the end cover in reaction bin one end, the guide plate sets up in reaction ring seat, the inside of end cover is formed with first water-cooling chamber, be connected with first water-cooling inlet pipe and first water-cooling outlet pipe on the end cover, first water-cooling inlet pipe and first water-cooling outlet pipe all communicate with first water-cooling chamber.
Through adopting above-mentioned technical scheme, advance pipe and first water-cooling exit tube through first water-cooling and can be to the comdenstion water of first water-cooling intracavity circulation, cool down end cover and reaction ring seat to plasma generator's the effect of playing the cooling protection, make plasma generator be difficult for appearing the condition that high temperature damaged when lasting high temperature operation, guarantee plasma generator's life.
Preferably, still including washing purifier, washing purifier includes elementary washing subassembly, elementary washing subassembly includes a first washing section of thick bamboo and first exhaust pipe, a first washing section of thick bamboo is connected in the one end that the end cover was kept away from to the reaction ring seat, first exhaust pipe is worn to establish in a first washing section of thick bamboo, a first exhaust pipe and a first washing section of thick bamboo fixed connection, be formed with first washing ring chamber between a first exhaust pipe and the first washing section of thick bamboo, be connected with first washing on the first washing section of thick bamboo and advance the pipe, first washing advances pipe and first washing ring chamber intercommunication.
By adopting the technical scheme, the waste gas is introduced into the reaction bin, the reaction device carries out pyrolysis treatment on the waste gas, the decomposed waste gas enters the first exhaust pipe, and when the waste gas flows in the first exhaust pipe, dust particles in the waste gas are easily attached to the first exhaust pipe; advance the pipe through first washing and lead to water to first washing ring chamber, water not only plays the cooling effect to the waste gas after pyrolysis in entering into first exhaust pipe through first washing ring chamber for the gas that can dissolve in water in the waste gas, and play the effect of erodeing to the dust granule on the first exhaust pipe inner wall, ensure this washing clarification plant good running state.
Preferably, elementary washing subassembly still includes the second washing section of thick bamboo and wears to establish the second blast pipe in the second washing section of thick bamboo, second blast pipe and second washing section of thick bamboo fixed connection, the one end of reaction ring seat is kept away from at first washing section of thick bamboo to the setting of second washing section of thick bamboo, be formed with second washing ring chamber between second blast pipe and the second washing section of thick bamboo, it advances the pipe to be connected with the second washing on the second washing section of thick bamboo, second blast pipe and first blast pipe coaxial line, be formed with first clearance of intaking between second blast pipe and the first blast pipe.
Through adopting above-mentioned technical scheme, when waste gas flowed into the second blast pipe from first blast pipe, advance the pipe through the second washing and lead to water to second washing ring intracavity, water piles up and rises gradually to first water gap department in the second washing ring intracavity, and flow into in the second blast pipe through first water gap, thereby further play the cooling effect to high temperature waste gas, make dust particle difficult pile up on the inner wall of second blast pipe, and make the gas that can dissolve in water in the waste gas after the processing dissolve in water.
Preferably, a flange seat is fixed at one end, close to the reaction ring seat, of the first water washing barrel, the water washing barrel is connected with the reaction ring seat through the flange seat, a second water cooling cavity is formed in the flange seat and communicated with the first water washing ring cavity, a second water cooling inlet pipe is connected to the flange seat, and the second water cooling inlet pipe is communicated with the second water cooling cavity.
Through adopting above-mentioned technical scheme, advance the pipe through the second water-cooling and let in the comdenstion water to the second water-cooling intracavity, cool down flange seat and reaction storehouse, further play the cooling guard action to plasma generator, guarantee plasma generator continuous stable operation.
Preferably, washing purifier still includes secondary washing subassembly, secondary washing subassembly includes a third washing section of thick bamboo and wears to establish the third blast pipe in a third washing section of thick bamboo, a third blast pipe and a third washing section of thick bamboo fixed connection, be formed with third washing ring chamber between a third blast pipe and the third washing section of thick bamboo, a third washing section of thick bamboo in-connection has the third washing to advance the pipe, third blast pipe and second blast pipe coaxial line, be formed with the second between third blast pipe and the second blast pipe and advance the water gap.
Through adopting above-mentioned technical scheme, when waste gas enters into the third blast pipe from the second blast pipe, advance the pipe through the third washing and lead to water to the third washing ring intracavity, water advances in the clearance flows into the third blast pipe through the second, further cools down high temperature waste gas for the gas that can dissolve in water in the waste gas can fully dissolve in water, and make the dust granule be difficult for piling up on the inner wall of third blast pipe.
Preferably, washing purifier still includes and washes the subassembly to the water spray, wash the subassembly to the water spray and include to the spray tube way, the third blast pipe with say the connection to the spray tube, the one end to spraying the pipeline is connected with first pair of injection pipe, the other end to spraying the pipeline is connected with the second and is to spouting the pipe, first pair of injection pipe and second are to spouting the pipe and all being used for to the interior logical water of spray tube way, the first pair of injection pipe and the second are to spouting the opposite direction setting of intaking of pipe.
Through adopting above-mentioned technical scheme, waste gas enters into to the spray pipe way through the third blast pipe, spout the pipe and the second is to spouting the interior water spray of pipe way through first pair of spouting, and water spray opposite direction between them, make rivers form the torrent in to the spray pipe way, can intensive mixing between waste gas and the rivers, effectively cool down waste gas, and make the gas that can dissolve in water in the waste gas fully dissolve in water, and under the effect to spouting the torrent, the dust granule is difficult for piling up in to the spray pipe way.
Preferably, be fixed with first water conservancy diversion spinning disk on being close to the inner wall that first pair spouts into the pipe to the spray pipe way, be fixed with second water conservancy diversion spinning disk on being close to the inner wall that second pair spouts into the pipe on spouting the pipe, first water conservancy diversion spinning disk and second water conservancy diversion spinning disk all are the helix along the length direction of self, the spiral between first water conservancy diversion spinning disk and the second water conservancy diversion spinning disk is to opposite.
Through adopting above-mentioned technical scheme, first water conservancy diversion rotor and second water conservancy diversion rotor play the water conservancy diversion effect to letting in rivers to spouting in the pipeline, make to let in and be the whirl state when the rivers along the inner wall to spouting the pipeline in to spouting the pipeline remove, and the spiral of first water conservancy diversion rotor and second water conservancy diversion rotor is revolved to opposite, thereby improve the offset effect of further rivers to spouting in the pipeline, make and get into can the intensive mixing between the waste gas and the rivers of spouting the pipeline, gas soluble in water in the waste gas can fully be dissolved in water, and under the effect to spouting the torrent, dust particle is difficult for piling up in saying to spouting the pipeline.
In summary, the present application includes at least one of the following beneficial technical effects:
1. the guide plate is arranged, so that the guide effect on the waste gas passing through the reaction bin is achieved, the waste gas flows out of the reaction bin through the guide hole, the waste gas can be in full contact with the plasma arc, and the ionization and decomposition effects on the waste gas are improved;
2. by arranging the primary washing assembly, the cooling effect on the waste gas subjected to pyrolysis is achieved, so that water-soluble gas in the waste gas is dissolved in water, the washing effect on dust particles on the inner wall of the exhaust pipe is achieved, and the good operation state of the waste gas treatment equipment is guaranteed;
3. through setting up to spouting the washing subassembly, rivers are forming the torrent to the spray pipe way, can the intensive mixing between waste gas and the rivers, effectively cool down waste gas to make the gas that can dissolve in water in the waste gas can fully dissolve in water, and under the effect to spouting the torrent, the dust granule is difficult for piling up in the spray pipe way.
Drawings
Fig. 1 is a schematic diagram of an overall structure of a plasma water cleaning apparatus according to an embodiment of the present invention.
FIG. 2 is a schematic structural diagram of a plasma reaction device and a water washing and purifying device according to an embodiment of the present application.
Fig. 3 is a schematic partial structure diagram of a plasma reaction apparatus according to an embodiment of the present disclosure.
Fig. 4 is a partial structural sectional view for embodying a plasma reaction apparatus according to an embodiment of the present application.
Fig. 5 is a partially enlarged view of a portion a in fig. 4.
Fig. 6 is an exploded view of a flow channel adjustment structure according to an embodiment of the present application.
Fig. 7 is a guarantee diagram for embodying the first return spring and the second return spring in the embodiment of the present application.
Fig. 8 is a partial structural sectional view for embodying the primary water washing assembly and the secondary water washing assembly according to the embodiment of the present application.
Fig. 9 is a partial structural schematic diagram for showing the connection between the water washing purification device and the frame according to the embodiment of the present application.
Fig. 10 is a partially enlarged view of a portion B in fig. 9.
FIG. 11 is a partial structural cross-sectional view of an embodiment of the present application for embodying the spray wash assembly and the spray assembly.
Fig. 12 is a partial structural sectional view for embodying the internal structure of a water tank according to the embodiment of the present application.
Description of reference numerals: 1. a frame; 11. a slide rail; 111. a sliding groove; 12. mounting a plate; 121. a sliding strip; 122. mounting holes; 2. a gas supply duct; 21. a main gas supply pipe; 22. protecting the air pipe; 23. a bellows; 24. a bypass pipe; 3. a plasma generator; 4. a reaction bin; 41. an end cap; 411. an air inlet pipe orifice; 412. a first gasket; 413. a first water-cooling cavity; 414. a first water-cooling inlet pipe; 415. a first water-cooled outlet pipe; 42. a reaction ring seat; 421. a support ring table; 422. a baffle; 4221. a flow guide hole; 423. a reaction chamber; 5. a primary water washing assembly; 51. a first water washing drum; 511. a first water wash inlet pipe; 512. a first water wash ring cavity; 513. a flange seat; 5131. a second water-cooling cavity; 5132. a water outlet; 5133. a second water inlet pipe; 5134. a second gasket; 52. a first exhaust pipe; 53. a second water washing drum; 531. a second water wash inlet pipe; 532. a second water washing ring cavity; 54. a second exhaust pipe; 541. a first water intake gap; 6. a secondary water washing assembly; 61. a third water washing drum; 611. a third water wash inlet pipe; 612. a third water washing ring cavity; 62. a third exhaust pipe; 621. a second water intake gap; 7. a counter-spray water washing assembly; 71. spraying pipelines; 711. a first flow guide rotary sheet; 712. a second flow guide rotary sheet; 72. a first pair of injection pipes; 73. a second pair of injection pipes; 74. a drain pipe; 75. a water tank; 751. a filter plate; 752. a sewage area; 753. a water purification area; 754. a circulation pump; 755. a sewage pump; 756. a bubbling pipe; 7561. a bubbling main pipe; 7562. a bubbling branch pipe; 8. a spray assembly; 71. a spray cylinder; 72. a tail gas cylinder; 73. a shower pipe; 731. an atomizing nozzle; 74. installing a screen plate; 75. a filler garland; 9. a flow channel adjusting structure; 91. a first baffle plate; 911. a first slider; 92. a second baffle; 921. a second slider; 93. an adjusting ring; 94. a first mounting groove; 941. a first return spring; 95. a second mounting groove; 951. a second return spring; 96. a first adjustment guide block; 97. and a second adjusting guide block.
Detailed Description
The present application is described in further detail below with reference to figures 1-10.
The embodiment of the application discloses plasma water cleaning equipment. Referring to fig. 1, a plasma water cleaning apparatus includes a frame 1, and a plasma reaction device and a water cleaning purification device mounted on the frame 1. The plasma reaction device is used for carrying out plasma ionization decomposition on the waste gas and decomposing harmful waste gas into harmless gas. Washing purifier is connected with plasma reaction unit, and the waste gas after plasma ionization decomposes lets in washing purifier in, and washing purifier cools down the dust removal to high temperature waste gas to absorb the gas that can dissolve in the waste gas in, the cleanliness factor of guarantee exhaust waste gas.
Referring to fig. 2 and 3, the plasma reaction device includes a reaction chamber 4 and a plasma generator 3, the plasma generator 3 is installed on the reaction chamber 4, the top of the reaction chamber 4 is connected with four gas supply pipelines 2, the gas supply pipelines 2 are communicated with the inside of the reaction chamber 4, waste gas is introduced into the reaction chamber 4 through the gas supply pipelines 2, the plasma generator 3 is powered on and generates high-temperature plasma arc, the waste gas is subjected to high-temperature ionization decomposition, extra fuel is not needed for combustion, energy is saved, the central temperature of the plasma arc is up to more than 8000 ℃, the peripheral temperature of the plasma arc can also reach more than 1500 ℃, and the decomposition rate of the waste gas is high.
Referring to fig. 3, the gas supply duct 2 includes a gas supply main pipe 21 and a protection gas pipe 22, the gas supply main pipe 21 communicates with the inside of the reaction chamber 4, and the exhaust gas is introduced into the reaction chamber 4 through the gas supply main pipe 21. The protective gas pipe 22 is communicated with the gas supply main pipe 21, in the embodiment, N passes through the protective gas pipe 22 to the reaction chamber 42And N is2Compared with air, the plasma reaction device is easier to ionize, so that the decomposition rate of the plasma reaction device on the waste gas is improved. One end of the main gas supply pipe 21 close to the reaction bin 4 is connected with a corrugated pipe 23 through a quick-connection hoop, and the main gas supply pipe 21 is communicated with the reaction bin 4 through the corrugated pipe 23. The characteristics of the bellows 23 of extension and easy bending are utilized to facilitate the connection of the gas supply pipeline 2 and the reaction bin 4. The bypass pipe 24 is communicated with the main gas supply pipe 21, the bypass pipe 24 is in a normally closed state, when the main gas supply pipe 21 is damaged and needs to be replaced and maintained, waste gas is introduced into the reaction bin 4 through the bypass pipe 24, the shutdown is not needed, and the continuous operation of the waste gas treatment equipment is guaranteed.
Referring to fig. 3 and 4, the reaction chamber 4 includes an end cap 41 and a reaction ring seat 42, the end cap 41 is disposed at one end of the reaction ring seat 42, and the end cap 41 and the reaction ring seat 42 are fixed by KF hook type flange clamp connection, so that the end cap 41 and the reaction ring seat 42 have better sealing performance. A reaction chamber 423 is formed inside the reaction ring seat 42, the plasma generator 3 is fixed on the top wall of the end cover 41 far away from the reaction ring seat 42, and the electrode head of the plasma generator 3 passes through the end cover 41 and is located in the reaction chamber 423. Four air inlet pipe orifices 411 are formed on the end cover 41, the air inlet pipe orifices 411 are communicated with the inside of the reaction cavity 423, each air inlet pipe orifice 411 corresponds to the air supply pipeline 2 one by one, and one end of the corrugated pipe 23 far away from the air supply pipeline 2 is connected with the air inlet pipe orifices 411 through a quick connection hoop.
Referring to fig. 4 and 5, a support ring table 421 is welded and fixed on the inner wall of the reaction ring seat 42, the support ring table 421 and the reaction ring seat 42 are coaxial, a guide plate 422 is placed on the support ring table 421, and a guide hole 4221 for a plasma arc generated by the plasma generator 3 to pass through is formed in the center of the guide plate 422. The guide plate 422 plays a role in guiding the waste gas introduced into the reaction cavity 423, and the waste gas flows through the guide holes 4221, so that the waste gas can be in full contact with the plasma arc, and the ionization decomposition effect of the waste gas is guaranteed.
Referring to fig. 5 and 6, the bottom of the flow guide plate 422 is provided with a flow channel adjusting structure 9, the flow channel adjusting structure 9 includes a first baffle 91, a second baffle 92 and an adjusting ring 93, the first baffle 91 and the second baffle 92 are all provided with four, the four first baffles 91 are attached to the bottom surface of the flow guide plate 422 and uniformly arranged along the circumferential direction of the flow guide holes 4221, the four second baffles 92 are attached to the outer wall of the first baffle 91 far away from the flow guide plate 422, and the second baffles 92 are also uniformly arranged along the axial direction of the flow guide holes 4221. First baffle 422 and second baffle 422 all are fan-shaped, and first baffle 422 and second baffle 422's angle is 60, and first baffle 422 and second baffle 422 are in the setting of misplacing in circumference.
Referring to fig. 5 and 6, four first mounting grooves 94 are formed in the bottom surface of the air deflector 422, the first mounting grooves 94 correspond to the first baffle plates 91 one by one, first sliding blocks 911 are fixed on the outer wall of the first baffle plate 91 close to the air deflector 422, the first sliding blocks 911 are located in the first mounting grooves 94, and each first baffle plate 91 is connected with the air deflector 422 through the first sliding blocks 911 in a sliding manner. Four second mounting grooves 95 have been seted up to guide plate 422's bottom surface, and second mounting groove 95 and second baffle 92 one-to-one are fixed with second slider 921 on second baffle 92 is close to the outer wall of guide plate 422, and second slider 921 is located second mounting groove 95, and each second baffle 92 slides through second slider 921 and is connected with guide plate 422.
Referring to fig. 5 and 6, the adjusting ring 93 is sleeved on the outer sides of the first baffle plate 91 and the second baffle plate 92, the adjusting ring 93 shares the same axis with the flow guide hole 4221, the adjusting ring 93 is connected with the first baffle plate 91 in a sliding manner, four first adjusting guide blocks 96 are fixed on the inner wall of the adjusting ring 93, the first adjusting guide blocks 96 correspond to the first baffle plate 91 one by one, the first adjusting guide blocks 96 are abutted to the outer wall of the first baffle plate 91 far away from the flow guide hole 4221, and the thickness of the first adjusting guide blocks 96 is gradually increased along the circumferential direction of the adjusting ring 93. The inner wall of adjusting ring 93 is fixed with four second regulation guide blocks 97, and second regulation guide block 97 and second baffle 92 one-to-one, the outer wall butt that water conservancy diversion hole 4221 was kept away from to second regulation guide block 97 and second baffle 92, and the thickness of second regulation guide block 97 increases progressively along the axial of adjusting ring 93 sets up, and the direction that increases progressively of the thickness of first regulation guide block 96 and second regulation guide block 97 is the same. Thereby when adjusting ring 93 is rotated along the degressive direction of first regulation guide block 96 thickness, first baffle 91 and second baffle 92 move towards the direction that is close to water conservancy diversion hole 4221 under corresponding first regulation guide block 96 and the conflict effect of second regulation guide block 97 to the adjustment to water conservancy diversion hole 4221 aperture is realized indirectly, then can adjust water conservancy diversion hole 4221's aperture through runner adjustment mechanism according to actual processing reaction effect, improves the purification treatment effect.
Referring to fig. 6 and 7, a first return spring 941 is disposed in the first mounting groove 94, the first return spring 941 is located on one side of the first slider 911 away from the adjusting ring 93, the first return spring 941 is in a compressed state, one end of the first return spring 941 is abutted against the inner wall of the first mounting groove 94, and the other end of the first return spring 941 is abutted against the first slider 911. Be provided with second reset spring 951 in the second mounting groove 95, second reset spring 951 is located the one side that the adjustable ring 93 was kept away from to second slider 921, and second reset spring 951 is in compression state, the one end of second reset spring 951 and the inner wall butt of second mounting groove 95, the other end and second slider 921 butt, thereby first baffle 91 and second baffle 92 and corresponding first regulation guide 96 and second regulation guide 97 keep the butt state, be convenient for first baffle 91 and the reseing of second baffle 92.
Referring to fig. 4 and 5, a first sealing gasket 412 is disposed on a surface of the reaction ring seat 42 close to the end cap 41, and the first sealing gasket 412 is clamped between the end cap 41 and the reaction ring seat 42 to ensure the sealing performance between the reaction ring seat 42 and the end cap 41. A first water-cooling cavity 413 is formed inside the end cover 41, a first water-cooling inlet pipe 414 and a first water-cooling outlet pipe 415 are connected to the end cover 41, and both the first water-cooling inlet pipe 414 and the first water-cooling outlet pipe 415 are communicated with the first water-cooling cavity 413. When waste gas carries out ionization decomposition in reaction chamber 423, let in circulation cold water through first water cooling inlet pipe 414 and first water cooling outlet pipe 415 in to first water cooling chamber 413, cool down end cover 41 and reaction ring seat 42 for plasma generator 3 is difficult for appearing the overtemperature and damages when continuously operating, and plays the effect of cooling protection to first sealed pad 412.
Referring to fig. 4 and 8, the water washing purification device comprises a primary water washing assembly 5, the primary water washing assembly 5 comprises a first water washing barrel 51 and a second water washing barrel 53, the first water washing barrel 51 is located at one end of the reaction ring seat 42 far away from the end cover 41, the second water washing barrel 53 is welded and fixed at one end of the first water washing barrel 51 far away from the reaction ring seat 42, and the second water washing barrel 53 and the first water washing barrel 51 are coaxial. One end of the washing cylinder close to the reaction ring seat 42 is fixedly welded with a flange seat 513, and the flange seat 513 and the reaction ring seat 42 are clamped and fixed through KF hook type flange hoops.
Referring to fig. 4 and 5, a second gasket 5134 is provided between the flange seat 513 and the reaction ring seat 42 for improving the sealability of the connection between the reaction ring seat 42 and the water washing tub. A second water-cooling cavity 5131 is formed in the flange seat 513, a second water-cooling inlet pipe 5133 is connected to the circumferential side wall of the flange seat 513, the second water-cooling inlet pipe 5133 is communicated with the second water-cooling cavity 5131, a water outlet 5132 is formed in the inner wall, close to the first water-washing ring cavity 512, of the flange seat 513 along the circumferential direction of the flange seat, and the second water-cooling cavity 5131 is communicated with the first water-washing ring cavity 512 through the water outlet 5132. Let in the comdenstion water in to second water-cooling chamber 5131 through second water-cooling inlet pipe 5133, lower the temperature to flange seat 513 and reaction ring seat 42, play the effect of cooling protection to plasma generator 3, ensure long-term stable operation work of plasma generator 3 to also play the cooling guard action to the sealed pad 5134 of second, so that the sealed pad 5134 of second is difficult for receiving the high temperature and burns out.
Referring to fig. 8, a first exhaust pipe 52 penetrates through the first washing barrel 51, the first exhaust pipe 52 is fixedly connected with the first washing barrel 51, one end of the first exhaust pipe 52, which is far away from the first washing barrel 51, is located in the second washing barrel 53, and the first exhaust pipe 52 and the flow guide hole 4221 are coaxial; a second exhaust pipe 54 penetrates through the second water washing barrel 53, the second exhaust pipe 54 is fixedly connected with the second water washing barrel 53, the second exhaust pipe 54 and the first exhaust pipe 52 are coaxial, a first water inlet gap 541 is formed between the first exhaust pipe 52 and the second exhaust pipe 54, and the width of the first water inlet gap 541 is 5 mm. After being decomposed by plasma arc high-temperature ionization in the reaction chamber 4, the exhaust gas enters the first exhaust pipe 52 through the diversion hole 4221 and enters the second exhaust pipe 54 from the first exhaust pipe 52.
Referring to fig. 8, a first washing ring 512 is formed between the first exhaust pipe 52 and the first washing cylinder 51, a first washing inlet pipe 511 is connected to the first washing cylinder 51, a second washing ring 532 is formed between the second exhaust pipe 54 and the second washing cylinder 53, and a second washing inlet pipe 531 is connected to the second washing cylinder 53. When waste gas flows through the first exhaust pipe 52 and the second exhaust pipe 54, water flows into the first water washing annular cavity 512 through the first water washing inlet pipe 511, and the water enters the first exhaust pipe 52 through the first water washing annular cavity 512, so that the cooling effect on the waste gas subjected to pyrolysis is realized, water-soluble gas in the waste gas is dissolved in the water, and dust particles on the inner wall of the first exhaust pipe 52 are washed. And water is introduced into the second water washing ring cavity 532 through the second water washing inlet pipe 531, the water is accumulated in the second water washing ring cavity 532 and gradually rises to the first water inlet gap 541, and flows into the second exhaust pipe 54 through the first water inlet gap 541, so that the cooling effect on high-temperature exhaust gas is further achieved, dust particles are not easy to accumulate on the inner wall of the second exhaust pipe 54, and water-soluble gas in the treated exhaust gas is dissolved in the water.
Referring to fig. 9 and 10, a horizontally disposed mounting plate 12 is slidably connected to the frame 1, a mounting hole 122 is opened on the mounting plate 12, the second washing cylinder 53 is inserted into the mounting hole 122, and the first washing cylinder 51 is fixed to the mounting plate 12 by bolts. The both sides that mounting panel 12 is relative are provided with slide rail 11, slide rail 11 and frame 1 fixed connection, and slide rail 11 has seted up the groove 111 that slides along the length direction of self, is fixed with the strip 121 that slides with the groove 111 looks adaptation that slides on the mounting panel 12, and the strip 121 that slides is located the groove 111 that slides, and mounting panel 12 is through the strip 121 and the slide rail 11 sliding connection that slide. When this washing clarification plant is maintained to needs, conveniently remove plasma reaction unit and main washing subassembly to the outside of frame 1, increase staff's operating space, improve the convenience of maintaining.
Referring to fig. 8, the water washing purification device further includes a secondary water washing assembly 6, the secondary water washing assembly 6 includes a third water washing barrel 61 and a third exhaust pipe 62 penetrating through the third water washing barrel 61, the third exhaust pipe 62 is fixedly connected with the third water washing barrel 61, one end of the second exhaust pipe 54 far from the first exhaust pipe 52 is located in the third water washing barrel 61, the third exhaust pipe 62 and the second exhaust pipe 54 are coaxial, a second water inlet gap 621 is formed between the third exhaust pipe 62 and the second exhaust pipe 54, and the width of the second water inlet gap 621 is 5 mm. When the exhaust gas flows into the third exhaust pipe 62 from the second exhaust pipe 54, water passes through the third water washing inlet pipe 611 into the third water washing ring cavity 612, and the water flows into the third exhaust pipe 62 through the second water inlet gap 621, so that the high-temperature exhaust gas is further cooled, the water-soluble gas in the exhaust gas can be sufficiently dissolved in the water, and the dust particles are not easily accumulated on the inner wall of the third exhaust pipe 62.
Referring to fig. 9 and 11, the water washing and purifying device further comprises a pair of water spraying washing assemblies 7, and the pair of water spraying washing assemblies 7 comprise a pair of spraying pipelines 71, a water discharging pipe 74 and a water tank 75. The side wall of one end of the spraying pipeline 71 is provided with an air inlet, one end of the third exhaust pipe 62 is connected with the air inlet of the spraying pipeline 71 through a quick-connection hoop, one end, close to the third exhaust pipe 62, of the spraying pipeline 71 is connected with a first pair of spraying pipes 72, the other end of the spraying pipeline 71 is connected with a second pair of spraying pipes 73, the first pair of spraying pipes 72 and the second pair of spraying pipes 73 are used for communicating water in the spraying pipeline 71, and the water inlet direction of the first pair of spraying pipes 72 is opposite to the water inlet direction of the second pair of spraying pipes 73. The water tank 75 is fixed on the frame 1, the opposite spraying pipeline 71 is positioned at the top of the water tank 75, the water discharge pipe 74 is connected with the side wall of one end of the opposite spraying pipeline 71 close to the second pair of spraying pipes 73, and the opposite spraying pipeline 71 is communicated with the water tank 75 through the water discharge pipe 74.
Referring to fig. 9 and 11, the exhaust gas enters the counter-spraying pipe 71 through the third exhaust pipe 62, water is sprayed into the counter-spraying pipe 71 through the first pair of spraying pipes 72 and the second pair of spraying pipes 73, water flows are convected in the counter-spraying pipe 71, the exhaust gas and the water flows can be sufficiently mixed, the exhaust gas is effectively cooled, water-soluble gas in the exhaust gas can be sufficiently dissolved in water, dust particles in the exhaust gas are not easily accumulated in the counter-spraying pipe 71 under the action of counter-spraying rush current, and the water in the counter-spraying pipe 71 flows into the water tank 75 through the drain pipe 74 to be stored.
Referring to fig. 9 and 11, in order to further improve the washing effect of the water spray washing assembly 7 on the exhaust gas, a first flow guide spiral sheet 711 is welded and fixed on the inner wall of the spray pipeline 71 close to the first pair of spray pipes 72, a second flow guide spiral sheet 712 is welded and fixed on the inner wall of the spray pipeline 71 close to the second pair of spray pipes 73, the first flow guide spiral sheet 711 and the second flow guide spiral sheet 712 are both in a spiral shape along the length direction thereof, and the spiral directions of the first flow guide spiral sheet 711 and the second flow guide spiral sheet 712 are opposite. When water flow enters the opposite spraying pipeline 71 through the first pair of spraying pipes 72 and the second pair of spraying pipes 73, the first flow guide rotary vane 711 and the second flow guide rotary vane 712 play a guiding role in the flow of the water flow, the water flow is in a rotational flow state when moving along the inner wall of the opposite spraying pipeline 71, the opposite flushing effect of the water flow in the opposite spraying pipeline 71 is better, waste gas and the water flow can be in full contact, dust particles on the inner wall of the opposite spraying pipeline 71 can be effectively flushed, and the opposite spraying pipeline 71 is not easy to be blocked.
Referring to fig. 9 and 11, the opposite spray pipe 71 is connected with the spray assembly 8, the spray assembly 8 includes a spray cylinder 71, an exhaust gas cylinder 72 and a spray pipe 73, the spray cylinder 71 is vertically disposed, the bottom end of the spray cylinder 71 is connected with the opposite spray pipe 71, the other end of the spray cylinder 71 is connected with the exhaust gas cylinder 72, the spray cylinder 71 and the drain pipe 74 are coaxial, two installation mesh plates 74 are fixed in the spray cylinder 71, a plurality of packing wreaths 75 are placed on each installation mesh plate 74, in this embodiment, the packing wreaths 75 are PVC pall rings. The number of the spray pipes 73 is two, the two spray pipes 73 are connected with the spray cylinder 71, one end of each spray pipe 73 penetrates through the spray cylinder 71 and is connected with an atomizing nozzle 731, the atomizing nozzles 731 correspond to the installation screen plates 74 one by one, and each atomizing nozzle 731 is located at the top of the corresponding installation screen plate 74. Waste gas flows into the spray cylinder 71 through the spray pipeline 71, the spray pipe 73 sprays water mist into the spray cylinder 71 through the atomizing nozzle 731, the water mist catches residual dust and soluble gas in the waste gas and flows back to the water tank 75, and the filler garland 75 increases the contact time between the liquid sprayed out by the spray pipe 73 and the waste gas, ensures the cleanliness of the waste gas discharged from the tail gas cylinder 72, and reduces the pollution to the environment.
Referring to fig. 11 and 12, a filter plate 751 is installed in the water tank 75, the filter plate 751 divides an inner cavity of the water tank 75 into a sewage area 752 and a water purification area 753, the drain pipe 74 is communicated with the sewage area 752 of the water tank 75, a circulating pump 754 is installed on the top wall of the water tank 75 near the water purification area 753, and one end of each shower pipe 73 far away from the shower canister 71 is communicated with the water purification area 753 through the circulating pump 754. The sewage generated by washing the waste gas is discharged into the sewage area 752 through the drain pipe 74, part of the sewage flows into the water purification area 753 under the filtering action of the filter plates 751, the purified water in the water purification area 753 is discharged into the spray cylinder 71 through the circulating pump 754 to perform spray purification on the waste gas in the spray cylinder 71, and the sprayed water flows back into the sewage area 752 through the drain pipe 74 again, so that the water in the water tank 75 is fully utilized.
Referring to fig. 11 and 12, a sewage pump 755 is provided at one side of the water tank 75, and the sewage pump 755 is communicated with the sewage area 752 of the water tank 75 through a pipe for discharging the sewage in the water tank 75. The sewage area 752 of the water tank 75 is communicated with a bubbling pipeline 756, the bubbling pipeline 756 is used for passing gas into the sewage area 752, in this embodiment, N is introduced into the sewage area 752 through the bubbling pipeline 7562On the one hand, the effect of cooling is played to the water in the sewage district 752, and on the other hand, plays pneumatic stirring's effect to the sewage in the sewage district 752 for the difficult deposit that appears of dust particle in the sewage, the sewage of being convenient for is discharged, is difficult for causing the pipe blockage. The bubbling pipe 756 includes a main bubbling pipe 7561 and a plurality of branch bubbling pipes 7562, each branch bubbling pipe 7562 is communicated with the main bubbling pipe 7561, and the plurality of branch bubbling pipes 7562 are arranged in the height direction of the water tank 75 to ensure the pneumatic stirring effect for the sewage in the water tank 75.
The implementation principle of the plasma water cleaning device in the embodiment of the application is as follows: waste gas is introduced into the reaction bin 4 through the gas supply pipeline 2, the plasma generator 3 is electrified and generates high-temperature plasma arc, and the waste gas is ionized and decomposed. The waste gas is ionized and decomposed by the plasma arc in the reaction chamber 4. The central temperature of the plasma arc is up to more than 8000 ℃, and the peripheral temperature of the plasma arc can also be up to more than 1500 ℃, so that the waste gas can be effectively subjected to pyrolysis treatment. In the process of ionizing and decomposing the PFC waste gas, condensed water is introduced into the end cover 41 and the flange seat 513 through the first water inlet pipe 414 and the second water inlet pipe 5133 to cool down, so that the plasma generator 3 is not easily damaged due to continuous high-temperature operation, and meanwhile, the first sealing gasket 412 and the second sealing gasket 5134 are also cooled down and protected.
The decomposed and purified waste gas enters the first exhaust pipe 52, the second exhaust pipe 54 and the third exhaust pipe 62 in sequence, and water is introduced into the first washing cylinder 51, the second washing cylinder 53 and the third washing cylinder 61, so that the cooling effect on the waste gas subjected to pyrolysis is achieved, water-soluble gas in the waste gas is dissolved in water, and dust particles on the inner wall of each exhaust pipe are washed away. Waste gas enters into spraying pipeline 71 through third blast pipe 62, through first pair of injection pipe 72 and second pair of injection pipe 73 to spraying water in spraying pipeline 71, rivers are to spraying pipeline 71 internal convection, can intensive mixing between waste gas and the rivers, effectively cool down waste gas, and make the gas that can dissolve in water in the waste gas can fully dissolve in water, and under the effect to spraying torrent, the dust granule in the waste gas is difficult for piling up in spraying pipeline 71. Waste gas flows into the spraying cylinder 71 through the spraying pipeline 71, the circulating pump 754 sprays water mist into the spraying cylinder 71 through the spraying pipe 73, and the water mist captures residual dust and soluble gas in the waste gas and flows back to the water tank 75, so that the cleanliness of the waste gas discharged from the tail gas cylinder 72 is guaranteed, and the pollution to the environment is reduced.
The above embodiments are preferred embodiments of the present application, and the protection scope of the present application is not limited by the above embodiments, so: all equivalent changes made according to the structure, shape and principle of the present application shall be covered by the protection scope of the present application.
Claims (9)
1. A plasma water cleaning apparatus, characterized in that: including frame (1) and set up the plasma reaction unit in frame (1), plasma reaction unit includes plasma generator (3), reaction storehouse (4) and a plurality of air feed line (2), plasma generator (3) set up on reaction storehouse (4), air feed line (2) are connected with reaction storehouse (4), air feed line (2) are used for letting in the waste gas of treating the purification in to reaction storehouse (4), be provided with guide plate (422) in reaction storehouse (4), set up water conservancy diversion hole (4221) that the plasma arc that supplies plasma generator (3) to produce passed on guide plate (422).
2. The plasma water cleaning apparatus according to claim 1, characterized in that: one end of the gas supply pipeline (2) close to the reaction bin (4) is connected with a corrugated pipe (23), and the gas supply pipeline (2) is communicated with the reaction bin (4) through the corrugated pipe (23).
3. The plasma water cleaning apparatus according to claim 1, characterized in that: reaction storehouse (4) are including reaction ring seat (42) and set up end cover (41) in reaction storehouse (4) one end, guide plate (422) set up in reaction ring seat (42), the inside of end cover (41) is formed with first water-cooling chamber (413), be connected with first water-cooling inlet pipe (414) and first water-cooling outlet pipe (415) on end cover (41), first water-cooling inlet pipe (414) and first water-cooling outlet pipe (415) all communicate with first water-cooling chamber (413).
4. A plasma water cleaning apparatus according to claim 3, characterized in that: still including washing purifier, washing purifier includes elementary washing subassembly (5), elementary washing subassembly (5) includes first washing section of thick bamboo (51) and first exhaust pipe (52), first washing section of thick bamboo (51) are connected in the one end that end cover (41) were kept away from in reaction ring seat (42), first exhaust pipe (52) are worn to establish in first washing section of thick bamboo (51), first exhaust pipe (52) and first washing section of thick bamboo (51) fixed connection, be formed with first washing ring chamber (512) between first exhaust pipe (52) and the first washing section of thick bamboo (51), be connected with first washing on first washing section of thick bamboo (51) and advance pipe (511), first washing advances pipe (511) and first washing ring chamber (512) intercommunication.
5. The plasma water cleaning apparatus according to claim 4, wherein: elementary water washing subassembly (5) still include second water washing section of thick bamboo (53) and wear to establish second blast pipe (54) in second water washing section of thick bamboo (53), second blast pipe (54) and second water washing section of thick bamboo (53) fixed connection, second water washing section of thick bamboo (53) set up the one end of keeping away from reaction ring seat (42) in first water washing section of thick bamboo (51), be formed with second water washing ring chamber (532) between second blast pipe (54) and the second water washing section of thick bamboo (53), be connected with the second water washing on second water washing section of thick bamboo (53) and advance pipe (531), second blast pipe (54) and first blast pipe (52) coaxial line, be formed with first clearance of intaking (541) between second blast pipe (54) and first blast pipe (52).
6. The plasma water cleaning apparatus according to claim 5, wherein: one end that first water wash section of thick bamboo (51) is close to reaction ring seat (42) is fixed with flange seat (513), the water wash section of thick bamboo is connected with reaction ring seat (42) through flange seat (513), be formed with second water-cooling chamber (5131) in flange seat (513), second water-cooling chamber (5131) and first water wash ring chamber (512) intercommunication, be connected with second water cooling inlet pipe (5133) on flange seat (513), second water cooling inlet pipe (5133) and second water-cooling chamber (5131) intercommunication.
7. The plasma water cleaning apparatus according to claim 6, wherein: washing purifier still includes secondary washing subassembly (6), secondary washing subassembly (6) include third washing section of thick bamboo (61) and wear to establish third blast pipe (62) in third washing section of thick bamboo (61), third blast pipe (62) and third washing section of thick bamboo (61) fixed connection, be formed with third washing ring chamber (612) between third blast pipe (62) and the third washing section of thick bamboo (61), third washing section of thick bamboo (61) in-connection has third washing to advance pipe (611), third blast pipe (62) and second blast pipe (54) coaxial line, be formed with second between third blast pipe (62) and second blast pipe (54) and advance water clearance (621).
8. A plasma water cleaning apparatus according to claim 7, characterized in that: washing purifier still includes washing subassembly (7) to spouting water, wash subassembly (7) to spouting water includes to spouting pipeline (71), third blast pipe (62) with be connected to spouting pipeline (71), the one end of spouting pipeline (71) is connected with first pair and spouts into pipe (72), the other end to spouting pipeline (71) is connected with second counterpulsation and advances pipe (73), first pair is spouted into pipe (72) and second counterpulsation and is spouted into pipe (73) and all be used for to the interior logical water of spouting pipeline (71), the opposite direction that advances of first pair spout into pipe (72) and second counterpulsation and advance pipe (73) sets up.
9. The plasma water cleaning apparatus according to claim 8, wherein: be fixed with first water conservancy diversion spiral shell (711) on being close to the inner wall of first pair of injection pipe (72) to spray pipeline (71), be fixed with second water conservancy diversion spiral shell (712) on being close to the inner wall of second pair of injection pipe (73) on spray pipeline (71), first water conservancy diversion spiral shell (711) and second water conservancy diversion spiral shell (712) all are the helix along the length direction of self, the spiral between first water conservancy diversion spiral shell (711) and second water conservancy diversion spiral shell (712) is to opposite.
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| CN113842755B (en) | 2023-11-24 |
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