CN113816612A - Method for manufacturing anti-dazzle glass - Google Patents
Method for manufacturing anti-dazzle glass Download PDFInfo
- Publication number
- CN113816612A CN113816612A CN202111056327.7A CN202111056327A CN113816612A CN 113816612 A CN113816612 A CN 113816612A CN 202111056327 A CN202111056327 A CN 202111056327A CN 113816612 A CN113816612 A CN 113816612A
- Authority
- CN
- China
- Prior art keywords
- photoresist
- glass substrate
- glass
- baking
- curing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 131
- 238000000034 method Methods 0.000 title claims abstract description 49
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 32
- 239000000758 substrate Substances 0.000 claims abstract description 84
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 78
- 239000002253 acid Substances 0.000 claims abstract description 52
- 238000005530 etching Methods 0.000 claims abstract description 34
- 238000004140 cleaning Methods 0.000 claims abstract description 10
- 238000005520 cutting process Methods 0.000 claims abstract description 9
- 238000001259 photo etching Methods 0.000 claims abstract description 9
- 238000012545 processing Methods 0.000 claims abstract description 9
- 238000002360 preparation method Methods 0.000 claims description 16
- 238000002791 soaking Methods 0.000 claims description 11
- 239000012752 auxiliary agent Substances 0.000 claims description 8
- 238000005507 spraying Methods 0.000 claims description 8
- 238000007639 printing Methods 0.000 claims description 2
- 238000011161 development Methods 0.000 abstract description 12
- 230000000694 effects Effects 0.000 abstract description 3
- 230000001681 protective effect Effects 0.000 abstract description 3
- -1 fluoride ions Chemical class 0.000 description 6
- 230000000007 visual effect Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000004313 glare Effects 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000013404 process transfer Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention discloses a method for manufacturing anti-dazzle glass, which comprises the following steps: step one, processing a glass substrate: cutting a glass substrate to a specific size, attaching a layer of photoresist on the surface of the glass substrate, and manufacturing a protection pattern on the photoresist on the surface of the glass substrate by using a MASK process; step two, photoetching the substrate: firstly, primarily baking and curing the glass substrate, then sequentially exposing and developing, and then baking and curing for the second time; step three, removing the photoresist: and carrying out acid etching treatment on the glass substrate, stripping the residual photoresist, and cleaning to obtain the clean anti-dazzle glass. According to the invention, a protective pattern is designed on the surface of the photoresist through an MASK process, and acid etching is carried out after soft baking curing, exposure, development and hard baking curing are carried out in sequence, so that spherical-like salient points with diffuse reflection effects are uniformly formed on the surface of the prepared glass, the problem that the size of the spherical-like salient points exceeds the size of pixel points is avoided, and the anti-dazzle purpose is achieved.
Description
Technical Field
The invention relates to the technical field of anti-dazzle glass, in particular to a manufacturing method of anti-dazzle glass.
Background
With the development of modern display technology, people have higher and higher requirements on imaging of display devices, and the requirements on the comfort level of users are gradually increased. During the use of the display, a glare phenomenon is often generated due to the influence of the surrounding environment. Glare is a visual condition in which light entering human eyes is scattered when the brightness distribution in the visual field is not suitable or there is extreme brightness contrast in the space, which not only seriously affects the visual experience, but also makes people feel uncomfortable, dislike, or even lose visibility. The principle of the anti-dazzle glass, called AG glass for short, is that the single surface or double surfaces of high-quality glass are processed to make the glass have lower reflectance than that of common glass, so that the interference of ambient light is reduced, the definition of picture is improved, the reflection of light on screen is reduced, the image is clearer and more vivid, and the viewer can enjoy better visual effect.
The prior anti-dazzle glass is mostly produced by adopting a frosting process, wherein frosting liquid is used as a covering object, the glass obtains a rough surface under the action of hydrofluoric acid or similar acid liquid, and then optical values such as required glossiness, haze, definition of reflected images and the like can be obtained after chemical polishing. However, the frosting process cannot accurately control the span size of the etched particles, so that the phenomenon of uneven patterns is easily caused; moreover, the glass is affected by the material of the frosting liquid, so that the surface of the glass is easy to have defects, the appearance yield of the glass is affected, and the appearance yield is low, so that the glossiness and the haze of the produced glass cannot be well controlled.
The method for manufacturing the anti-dazzle glass comprises the steps of designing a protection pattern on the surface of a photoresist by adopting a MASK process, sequentially carrying out soft baking curing, exposure, development, hard baking curing and acid etching, so that spherical-like salient points with a diffuse reflection effect are uniformly formed on the surface of the prepared glass, the problem that the size of the spherical-like salient points exceeds the size of pixel points is solved, the glossiness and the haze uniformity of the anti-dazzle glass are ensured, and the anti-dazzle purpose is achieved.
Disclosure of Invention
The present invention aims to provide a method for manufacturing anti-dazzle glass, which solves the problems mentioned in the background technology.
In order to achieve the above purpose, the solution of the invention is: a method for manufacturing anti-dazzle glass comprises the following steps:
step one, processing a glass substrate: cutting a glass substrate to a specific size, attaching a layer of photoresist on the surface of the glass substrate, and manufacturing a protection pattern on the photoresist on the surface of the glass substrate by using a MASK process;
step two, photoetching the substrate: firstly, primarily baking and curing the glass substrate with the photoresist protection pattern, then sequentially exposing and developing, and then baking and curing for the second time;
step three, removing the photoresist: and carrying out acid etching treatment on the glass substrate subjected to secondary curing, stripping the residual photoresist on the surface of the glass substrate subjected to acid etching treatment, and cleaning to obtain the clean anti-dazzle glass.
Further, the photoresist in the first step is a positive photoresist and is attached to the surface of the glass substrate in a spraying or printing mode.
Furthermore, in the first step, the protection patterns are distributed on the surface of the photoresist in a lattice shape, the diameter of each protection pattern point is 3-50 μm, and the distance between two adjacent protection pattern points is 3-50 μm.
Further, in the second step, the primary baking and curing and the secondary baking and curing of the glass substrate are respectively soft baking and hard baking.
Furthermore, the primary baking curing temperature in the step two is 70-120 ℃, and the baking time is 100-120 s.
Further, in the second step, the secondary baking curing temperature is 100-240 ℃, and the baking time is 16 min.
Further, the preparation adopted in the acid etching treatment in the third step is single acid or mixed acid containing fluorinion, the concentration is 0.000206mol/L, the acid etching time is 3min +/-30 s-6 min +/-15 s, and HCL and NH are added into the preparation4HF2And organic matters are used as auxiliary agents.
Further, the step three can be performed by using a KOH soaking method or a physical wiping method; the soaking time of the KOH soaking method is 2min to 4min, and the wiping time of the physical wiping method is 5min to 10 min.
Compared with the prior art, the invention has the beneficial effects that:
(1) according to the invention, the photoresist is adhered to the surface of the glass, and the protective pattern is designed on the surface of the photoresist through the MASK process, so that the glass substrate with the protective pattern is subjected to acid etching after primary soft baking curing, exposure, development and secondary hard baking curing, the curing degree of the photoresist is accurately controlled, the photoresist gradually falls off in the acid etching process, and then the sphere-like salient points with diffuse reflection effect are formed, the size of the sphere-like salient points is relatively uniform, the flash point problem that the size of the sphere-like salient points exceeds the size of pixel points can be effectively avoided, and the glossiness and the haze uniformity of the anti-dazzle glass are ensured.
Drawings
FIG. 1 is a block flow diagram of the present invention;
FIG. 2 is a diagram illustrating various process states of the glass substrate according to the present invention;
FIG. 3 is a photoresist protection pattern fabricated on a glass substrate in accordance with the present invention;
FIG. 4 is a partial side cross-sectional view of a finished glass substrate according to the present invention;
FIG. 5 is a schematic view of a surface structure of a glass substrate according to the present invention;
FIG. 6 is a data sheet of the finished antiglare glass produced according to various embodiments of the present invention.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention.
Referring to fig. 1-5, the present invention will be described in detail with reference to the accompanying drawings and embodiments.
The first embodiment is as follows:
a method for manufacturing anti-dazzle glass comprises the following steps:
step one, processing a glass substrate: cutting a glass substrate to 400mm multiplied by 500mm, spraying a layer of photoresist on the surface of the glass substrate, wherein the photoresist is RZJ2500D positive photoresist, the thickness is 1.5 mu m, manufacturing protection pattern points distributed in a lattice shape on the photoresist on the surface of the glass substrate by using a MASK process, the diameter of each protection pattern point is 3 mu m, and the distance between every two adjacent protection pattern points is 3 mu m to form a complete protection pattern;
step two, photoetching the substrate: firstly, carrying out primary soft baking curing on the glass substrate with the photoresist protection pattern at the curing temperature of 70 ℃ for 120s, then sequentially carrying out exposure and development, and then carrying out secondary hard baking curing at the curing temperature of 180 ℃ for 16 min;
step three, removing the photoresist: adopting a preparation of single acid or mixed acid containing fluoride ions to carry out acid etching treatment on the glass substrate after the secondary curing, wherein the concentration is 0.000206mol/L, the acid etching time is 6min15s, and HCL and NH are added into the preparation4HF2And taking organic matters as an auxiliary agent, stripping the residual photoresist on the surface of the glass substrate after the acid etching treatment by a KOH soaking method for 3min, and cleaning to obtain the clean anti-dazzle glass with the glossiness of 96.3 and the haze of 1.5.
Example two:
a method for manufacturing anti-dazzle glass comprises the following steps:
step one, processing a glass substrate: cutting a glass substrate to 400mm multiplied by 500mm, spraying a layer of photoresist on the surface of the glass substrate, wherein the photoresist is RZJ2500D positive photoresist, the thickness is 1.5 mu m, manufacturing protection pattern points distributed in a lattice shape on the photoresist on the surface of the glass substrate by using a MASK process, the diameter of each protection pattern point is 50 mu m, and the distance between every two adjacent protection pattern points is 50 mu m to form a complete protection pattern;
step two, photoetching the substrate: firstly, carrying out primary soft baking curing on the glass substrate with the photoresist protection pattern at the curing temperature of 120 ℃ for 120s, then sequentially carrying out exposure and development, and then carrying out secondary hard baking curing at the curing temperature of 180 ℃ for 16 min;
step three, removing the photoresist: adopting a preparation of single acid or mixed acid containing fluoride ions to carry out acid etching treatment on the glass substrate after the secondary curing, wherein the concentration is 0.000206mol/L, the acid etching time is 6min15s, and HCL and NH are added into the preparation4HF2And taking organic matters as an auxiliary agent, stripping the residual photoresist on the surface of the glass substrate after the acid etching treatment by a KOH soaking method for 3min, and cleaning to obtain the clean anti-dazzle glass with the glossiness of 96.5 and the haze of 1.6.
Example three:
step one, processing a glass substrate: cutting a glass substrate to 400mm multiplied by 500mm, spraying a layer of photoresist on the surface of the glass substrate, wherein the photoresist is RZJ2500D positive photoresist, the thickness is 1.5 mu m, manufacturing protection pattern points distributed in a lattice shape on the photoresist on the surface of the glass substrate by using a MASK process, the diameter of each protection pattern point is 3 mu m, and the distance between every two adjacent protection pattern points is 3 mu m to form a complete protection pattern;
step two, photoetching the substrate: firstly, carrying out primary soft baking curing on the glass substrate with the photoresist protection pattern at the curing temperature of 70 ℃ for 120s, then sequentially carrying out exposure and development, and then carrying out secondary hard baking curing at the curing temperature of 240 ℃ for 16 min;
step three, removing the photoresist: adopting a preparation of single acid or mixed acid containing fluoride ions to carry out acid etching treatment on the glass substrate after the secondary curing, wherein the concentration is 0.000206mol/L, the acid etching time is 6min15s, and HCL and NH are added into the preparation4HF2Taking organic matters as an auxiliary agent, stripping the surface of the glass substrate subjected to acid etching treatment by a KOH soaking methodAnd soaking the residual photoresist for 3min, and cleaning to obtain the clean anti-dazzle glass with the glossiness of 107 and the haze of 1.6.
Example four:
a method for manufacturing anti-dazzle glass comprises the following steps:
step one, processing a glass substrate: cutting a glass substrate to 400mm multiplied by 500mm, spraying a layer of photoresist on the surface of the glass substrate, wherein the photoresist is RZJ2500D positive photoresist, the thickness is 1.5 mu m, manufacturing protection pattern points distributed in a lattice shape on the photoresist on the surface of the glass substrate by using a MASK process, the diameter of each protection pattern point is 50 mu m, and the distance between every two adjacent protection pattern points is 50 mu m to form a complete protection pattern;
step two, photoetching the substrate: firstly, carrying out primary soft baking curing on the glass substrate with the photoresist protection pattern at the curing temperature of 120 ℃ for 120s, then sequentially carrying out exposure and development, and then carrying out secondary hard baking curing at the curing temperature of 240 ℃ for 16 min;
step three, removing the photoresist: adopting a preparation of single acid or mixed acid containing fluoride ions to carry out acid etching treatment on the glass substrate after the secondary curing, wherein the concentration is 0.000206mol/L, the acid etching time is 6min15s, and HCL and NH are added into the preparation4HF2And taking organic matters as an auxiliary agent, stripping the residual photoresist on the surface of the glass substrate after the acid etching treatment by a KOH soaking method for 3min, and cleaning to obtain the clean anti-dazzle glass with the glossiness of 108.4 and the haze of 1.5.
Example five:
a method for manufacturing anti-dazzle glass comprises the following steps:
step one, processing a glass substrate: cutting a glass substrate to 400mm multiplied by 500mm, spraying a layer of photoresist on the surface of the glass substrate, wherein the photoresist is RZJ2500D positive photoresist, the thickness is 1.5 mu m, manufacturing protection pattern points distributed in a lattice shape on the photoresist on the surface of the glass substrate by using a MASK process, the diameter of each protection pattern point is 3 mu m, and the distance between every two adjacent protection pattern points is 3 mu m to form a complete protection pattern;
step two, photoetching the substrate: firstly, carrying out primary soft baking curing on the glass substrate with the photoresist protection pattern at the curing temperature of 120 ℃ for 120s, then sequentially carrying out exposure and development, and then carrying out secondary hard baking curing at the curing temperature of 240 ℃ for 16 min;
step three, removing the photoresist: adopting a preparation of single acid or mixed acid containing fluoride ions to carry out acid etching treatment on the glass substrate after the secondary curing, wherein the concentration is 0.000206mol/L, the acid etching time is 6min15s, and HCL and NH are added into the preparation4HF2And taking organic matters as an auxiliary agent, stripping the residual photoresist on the surface of the glass substrate after the acid etching treatment by a physical wiping method, wherein the physical wiping time is 7min, and cleaning to obtain the clean anti-dazzle glass with the glossiness of 110.2 and the haze of 1.4.
Example six:
a method for manufacturing anti-dazzle glass comprises the following steps:
step one, processing a glass substrate: cutting a glass substrate to 400mm multiplied by 500mm, spraying a layer of photoresist on the surface of the glass substrate, wherein the photoresist is RZJ2500D positive photoresist, the thickness is 1.5 mu m, manufacturing protection pattern points distributed in a lattice shape on the photoresist on the surface of the glass substrate by using a MASK process, the diameter of each protection pattern point is 50 mu m, and the distance between every two adjacent protection pattern points is 50 mu m to form a complete protection pattern;
step two, photoetching the substrate: firstly, carrying out primary soft baking curing on the glass substrate with the photoresist protection pattern at the curing temperature of 120 ℃ for 120s, then sequentially carrying out exposure and development, and then carrying out secondary hard baking curing at the curing temperature of 240 ℃ for 16 min;
step three, removing the photoresist: adopting a preparation of single acid or mixed acid containing fluoride ions to carry out acid etching treatment on the glass substrate after the secondary curing, wherein the concentration is 0.000206mol/L, the acid etching time is 3min30s, and HCL and NH are added into the preparation4HF2Taking organic matters as an auxiliary agent, and stripping the residual photoresist on the surface of the glass substrate after the acid etching treatment by a physical wiping method, wherein the physical wiping time is 7miAnd n, cleaning to obtain the clean anti-dazzle glass with the glossiness of 120.1 and the haze of 1.6.
As shown in fig. 6, it can be known from the comparison of the experimental data that the protection pattern size and the primary soft test curing temperature do not affect the gloss and the haze of the manufactured glass, but the secondary hard bake curing temperature and the acid etching time affect the gloss and the haze of the manufactured glass, and when the secondary hard bake curing temperature is higher and the acid etching time is shorter, the prepared anti-glare glass has better gloss and haze, and the formed spherical-like bumps are more uniform.
In the above embodiment, the coating thickness of the photoresist is not limited to 1.5 μm, and the demand of the glass substrate can be increased or decreased during the actual production; the MASK process transfers the MASK pattern to the light resistance through the exposure machine, and the process can enable the rough surface of the bump to be more uniform, so that the processed glass product has better touch feeling; after the glass substrate is processed, convex sphere-like points are formed on the surface of the glass substrate, the height of the sphere-like points is 100 nm-1000 nm, and the actual size of the sphere-like points changes according to the coating thickness of the photoresist and the production requirements of glass.
In summary, the method for manufacturing the anti-glare glass provided by the invention comprises the steps of carrying out primary soft baking curing, exposure, development and secondary hard baking curing on a photoresist on the surface of the glass, then carrying out acid etching, volatilizing a solvent of the photoresist to form a solid film layer through primary baking, enabling the glass to directly act on the photoresist film layer during exposure and development, and curing a photoresist of a developed pattern through secondary baking, so that a protection pattern can be more stably attached to the photoresist, ensuring that a glass substrate is acid etched, removing residual photoresist and cleaning, and obtaining the anti-glare glass with better glossiness and haze.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (8)
1. The method for manufacturing the anti-dazzle glass is characterized by comprising the following steps of:
step one, processing a glass substrate: cutting a glass substrate to a specific size, attaching a layer of photoresist on the surface of the glass substrate, and manufacturing a protection pattern on the photoresist on the surface of the glass substrate by using a MASK process;
step two, photoetching the substrate: firstly, primarily baking and curing the glass substrate with the photoresist protection pattern, then sequentially exposing and developing, and then baking and curing for the second time;
step three, removing the photoresist: and carrying out acid etching treatment on the glass substrate subjected to secondary curing, stripping the residual photoresist on the surface of the glass substrate subjected to acid etching treatment, and cleaning to obtain the clean anti-dazzle glass.
2. The method for manufacturing an antiglare glass according to claim 1, wherein: in the first step, the photoresist is a positive photoresist and is attached to the surface of the glass substrate in a spraying or printing mode.
3. The method for manufacturing an antiglare glass according to claim 1, wherein: in the first step, the protection patterns are distributed on the surface of the photoresist in a lattice shape, the diameter of each protection pattern point is 3-50 mu m, and the distance between two adjacent protection pattern points is 3-50 mu m.
4. The method for manufacturing an antiglare glass according to claim 1, wherein: and in the second step, the primary baking and curing and the secondary baking and curing of the glass substrate are respectively soft baking and hard baking.
5. The method for manufacturing an antiglare glass according to claim 4, wherein: in the second step, the primary baking curing temperature is 70-120 ℃, and the baking time is 100-120 s.
6. The method for manufacturing an antiglare glass according to claim 4, wherein: in the second step, the secondary baking curing temperature is 100-240 ℃, and the baking time is 16 min.
7. The method for producing an antiglare glass according to any one of claims 1 to 6, wherein: the preparation adopted by the acid etching treatment in the third step is single acid or mixed acid containing fluorinion, the concentration is 0.000206mol/L, the acid etching time is 3min +/-30 s-6 min +/-15 s, and HCL and NH are added into the preparation4HF2And organic matters are used as auxiliary agents.
8. The method for manufacturing an antiglare glass according to claim 7, wherein: the residual photoresist can be stripped by adopting a KOH soaking method or a physical wiping method in the third step; the soaking time of the KOH soaking method is 2min to 4min, and the wiping time of the physical wiping method is 5min to 10 min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111056327.7A CN113816612A (en) | 2021-09-09 | 2021-09-09 | Method for manufacturing anti-dazzle glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111056327.7A CN113816612A (en) | 2021-09-09 | 2021-09-09 | Method for manufacturing anti-dazzle glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113816612A true CN113816612A (en) | 2021-12-21 |
Family
ID=78914327
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111056327.7A Pending CN113816612A (en) | 2021-09-09 | 2021-09-09 | Method for manufacturing anti-dazzle glass |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113816612A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116217088A (en) * | 2023-03-29 | 2023-06-06 | 芜湖长信科技股份有限公司 | Vehicle-mounted curved surface anti-glare AG cover plate and manufacturing process and manufacturing equipment thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4664748A (en) * | 1984-11-01 | 1987-05-12 | Fuji Electric Company Ltd. | Surface roughening method |
| US20120329525A1 (en) * | 2010-12-27 | 2012-12-27 | Hoya Corporation | Glass substrate of cover glass for portable electronic device, image display unit for portable electronic device, portable electronic device and method of manufacturing glass substrate of cover glass for portable electronic device |
| CN103193392A (en) * | 2013-04-11 | 2013-07-10 | 友达光电股份有限公司 | Manufacture method for glass substrate with anti-glare function |
| CN110183113A (en) * | 2019-05-22 | 2019-08-30 | 湖南天羿领航科技有限公司 | The preparation method of glare proof glass |
| CN111943519A (en) * | 2020-08-07 | 2020-11-17 | Oppo广东移动通信有限公司 | Manufacturing method of anti-glare glass shell, anti-glare glass shell and electronic equipment |
-
2021
- 2021-09-09 CN CN202111056327.7A patent/CN113816612A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4664748A (en) * | 1984-11-01 | 1987-05-12 | Fuji Electric Company Ltd. | Surface roughening method |
| US20120329525A1 (en) * | 2010-12-27 | 2012-12-27 | Hoya Corporation | Glass substrate of cover glass for portable electronic device, image display unit for portable electronic device, portable electronic device and method of manufacturing glass substrate of cover glass for portable electronic device |
| CN103193392A (en) * | 2013-04-11 | 2013-07-10 | 友达光电股份有限公司 | Manufacture method for glass substrate with anti-glare function |
| CN110183113A (en) * | 2019-05-22 | 2019-08-30 | 湖南天羿领航科技有限公司 | The preparation method of glare proof glass |
| CN111943519A (en) * | 2020-08-07 | 2020-11-17 | Oppo广东移动通信有限公司 | Manufacturing method of anti-glare glass shell, anti-glare glass shell and electronic equipment |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116217088A (en) * | 2023-03-29 | 2023-06-06 | 芜湖长信科技股份有限公司 | Vehicle-mounted curved surface anti-glare AG cover plate and manufacturing process and manufacturing equipment thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101707425B1 (en) | Cover glass and method of manufacturing the same | |
| CN107074629B (en) | Anti-glare substrate with low glare, DOI and transmission haze | |
| CN112028500B (en) | Anti-glare glass and preparation method and application thereof | |
| US20220248552A1 (en) | Shell assembly and preparation method therefor, and electronic device | |
| CN112125531A (en) | Glass cover plate and preparation method thereof | |
| CN111591080A (en) | Glass shell assembly, manufacturing method thereof and electronic equipment | |
| US8092015B2 (en) | Honeycomb coating melanin lens and manufacturing process thereof | |
| CN113816612A (en) | Method for manufacturing anti-dazzle glass | |
| CN112661410A (en) | Manufacturing method of anti-dazzle cover plate | |
| CN105183237A (en) | Manufacturing method of touch screen with IR induction zone | |
| CN107848873A (en) | Glassware and its manufacture method comprising light extraction features | |
| US7014964B1 (en) | Color filter substrate and fabricating method thereof | |
| WO2023061094A1 (en) | Housing, housing preparation method, and electronic device | |
| KR20180078148A (en) | Composition for etching glass and method for fabricating anti-glare glass | |
| CN114426401A (en) | Local AG anti-glare glass and preparation method thereof | |
| CN113772956A (en) | Anti-glare glass and preparation method thereof | |
| CN108777923B (en) | Flexible display panel, light leakage preventing cover plate and preparation method of flexible display panel and light leakage preventing cover plate | |
| CA3120789A1 (en) | Camera hole cover plate, treatment method of camera hole plate, and mobile terminal | |
| KR20150126317A (en) | Cover glass and method of manufacturing the same | |
| CN103399367A (en) | Display base plate and manufacturing method thereof, as well as display device | |
| CN110713348B (en) | Electronic device and method for manufacturing glass cover plate | |
| CN105712637A (en) | Transparent sheet material, preparation method and electronic equipment | |
| CN105527801B (en) | A kind of patterning method of film layer, substrate and preparation method thereof, display device | |
| TWI575486B (en) | Curved display and method of manufacturing curved display | |
| CN110868828A (en) | Electronic equipment, shell of electronic equipment and machining method of shell |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20211221 |