CN103399367A - Display base plate and manufacturing method thereof, as well as display device - Google Patents
Display base plate and manufacturing method thereof, as well as display device Download PDFInfo
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- CN103399367A CN103399367A CN2013103249929A CN201310324992A CN103399367A CN 103399367 A CN103399367 A CN 103399367A CN 2013103249929 A CN2013103249929 A CN 2013103249929A CN 201310324992 A CN201310324992 A CN 201310324992A CN 103399367 A CN103399367 A CN 103399367A
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- convex structure
- base plate
- convex
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- underlay substrate
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133502—Antiglare, refractive index matching layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Abstract
The invention provides a display base plate and a manufacturing method thereof, as well as a display device and relates to the field of display technology. The display base plate can be used for eliminating the light reflection at the surface and interior of the display device and improving the display effect. An anti-reflection structure with multiple convex structures is formed on a substrate base plate of the display base plate, and the width of each convex structure and the distance between two adjacent convex structures are less than the wavelength of visible light, and the height of each convex structure is greater than or equal to the width of each convex structure.
Description
Technical field
The present invention relates to the display technique field, relate in particular to a kind of display base plate and manufacture method thereof, display device.
Background technology
For various display device of the prior art, have a strong impact on display effect thereby reflection very easily occurs on the surface of display screen external light source, how to eliminate external light source to seem very important of the impact of display effect.Method as antireflection mainly contains LR(Low Reflection at present, low reflection) process and AG(Anti Glare, against sunshine) process; Wherein the LR processing is to cover the material different from the refractive index that forms the display screen surfacing on the surface of display, by at display surface incident light and catoptrical interference effect, reducing reflection, but, usually the reflection that occurs on the reflection that occurs on air and LR membrane interface and LR film and display surface, amplitude reflectivity separately, phase place are different from desirable condition, therefore, these reflected light can not offset fully, and reflecting effect is unsatisfactory; And AG to process be to form trickle relief pattern on the surface of display, the dispersion effect of using up prevents that outer light from mirroring, but so can make the imaging of external light source thicken, and affects display effect.
The AG that compares processes, and adopts moth eye (Moth-eye) structure to reach anti-reflection effect by the mode of not using the interference of light.The moth ocular structure is the surface at display screen, will than AG light scattering structure trickleer, (for example be spaced apart light wavelength, 380nm) length or following relief pattern are arranged with gap, thereby make outside air relative continuous with the variation of film surface-boundary refractive index.So, external light source is all transmissions roughly, therefore can almost eliminate the light reflection on display screen surface.The moth ocular structure is due to its size too small (nanometer scale), and high to accuracy requirement simultaneously, the bossing spacing is very little, adhesion mutually again, otherwise can cause scattering of light, so the difficulty of making moth ocular structure is very large.Generally adopt at present the mould pressing to be prepared, namely prepare the mould structure opposite with the moth ocular structure, and then by mould physics is compressed on filmogen, the moth ocular structure that obtains wanting.This preparation technology is strict to material and technological parameter, and technology stability is bad, is difficult to control size and the spacing of moth ocular structure, also easily causes the inter-adhesive of moth ocular structure bossing, has a strong impact on anti-reflection effect.
Summary of the invention
Embodiments of the invention provide a kind of display base plate and manufacture method thereof, display device, can eliminate display device surface and inner light reflection, promote display effect.
For achieving the above object, embodiments of the invention adopt following technical scheme:
The embodiment of the present invention provides a kind of display base plate, comprise underlay substrate and be formed on black matrix on described underlay substrate, described display base plate also comprises: be formed at the anti-reflection structure on described underlay substrate, described anti-reflection structure comprises a plurality of the first convex structures;
Wherein, the position of described the first convex structure is corresponding with the position of described black matrix.
Another aspect of the present invention provides, and a kind of display device is provided, and comprises display base plate as above.
Embodiments of the invention on the other hand, provide a kind of manufacture method of display base plate, and described display base plate comprises underlay substrate and be formed on black matrix on described underlay substrate, and described method comprises:
Form anti-reflection structure on described underlay substrate, described anti-reflection structure comprises a plurality of the first convex structures;
Wherein, the position of described the first convex structure is corresponding with the position of described black matrix.
A kind of display base plate that the embodiment of the present invention provides and manufacture method thereof, display device, form the anti-reflection structure comprise a plurality of convex structures on the underlay substrate of this display base plate, the spacing of the width of this convex structure and adjacent two convex structures is all less than or equal to visible light wavelength; And the height of convex structure is more than or equal to its width.This anti-reflection structure can be positioned at display device inside or be positioned at the demonstration side of display device, so,, by this anti-reflection structure, can eliminate display device surface and inner light reflection, promotes display effect.
Description of drawings
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, below will the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
The structural representation of a kind of display base plate that Fig. 1 provides for the embodiment of the present invention;
The structural representation of the another kind of display base plate that Fig. 2 provides for the embodiment of the present invention;
The structural representation of another display base plate that Fig. 3 provides for the embodiment of the present invention;
The manufacturing process schematic diagram of a kind of anti-reflection structure that Fig. 4 provides for the embodiment of the present invention;
The manufacturing process schematic diagram of the another kind of anti-reflection structure that Fig. 5 provides for the embodiment of the present invention.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is only the present invention's part embodiment, rather than whole embodiment.Based on the embodiment in the present invention, those of ordinary skills, not making under the creative work prerequisite the every other embodiment that obtains, belong to the scope of protection of the invention.
The embodiment of the present invention provides a kind of display base plate, as shown in Figure 1, comprise underlay substrate 10 and be formed on black matrix 101 on underlay substrate 10, this display base plate also comprises: be formed at the anti-reflection structure 20 on underlay substrate 10, this anti-reflection structure can comprise a plurality of the first convex structures 201.
Wherein, the position of the first convex structure 201 is corresponding with the position of black matrix 101.
Need to prove, the position of the first convex structure 201 is corresponding with the position of black matrix 101 refers to that specifically the upper-lower position of the position of the first convex structure 201 and black matrix 101 is corresponding, and namely the position of a plurality of first convex structures 201 corresponding with black matrix 101 upper-lower positions all is no more than the width of black matrix 101.Adopt a kind of like this positional structure, make function and the display effect of viewing area between black matrix unaffected when can utilize this anti-reflection structure 20 to eliminate the light reflection.
A kind of display base plate that the embodiment of the present invention provides, form the anti-reflection structure comprise a plurality of convex structures on the underlay substrate of this display base plate, the spacing of the width of this convex structure and adjacent two convex structures is all less than or equal to visible light wavelength; And the height of convex structure is more than or equal to its width.This anti-reflection structure can be positioned at display device inside or be positioned at the demonstration side of display device, so,, by this anti-reflection structure, can eliminate display device surface and inner light reflection, promotes display effect.
Further, as shown in Figure 2, anti-reflection structure 20 is between underlay substrate 10 and black matrix 101.So, this anti-reflection structure 20 not only can be eliminated the reflected light through this underlay substrate, and can, so that underlay substrate is the surperficial have no occluder of the demonstration side of general display device away from black matrix one side, promote smooth finish and the flatness of display screen outside surface.
Perhaps, as shown in Figure 3, display base plate is color membrane substrates 01, and described anti-reflection structure 20 is positioned at the surface of the side away from described black matrix 101 of color membrane substrates 01.So, this anti-reflection structure 20 can be eliminated the light reflection of the side away from described black matrix 101 of color membrane substrates 01, thereby promotes the display effect of display device.
Further, as shown in Figure 4, the first convex structure 201 comprises transparent photomask glue-line 2011 and/or transparent resin layer 2012.
Further, anti-reflection structure 20 also comprises the film material layer 202 of the first convex structure 201 bottoms, and this film material layer 202 is tiled on underlay substrate 10, and between the first convex structure 201 and underlay substrate 10.
Need to prove, according to the difference of job operation, the material layer that the first convex structure 201 comprises is also corresponding different.Concrete, for example, as shown in a figure in Fig. 4, apply transparent resin layer 2012 on the film material layer surface that is tiled on underlay substrate 10, then make transparent photomask glue-line 2011 on these transparent resin layer 2012 surfaces, carry out exposure imaging by mask plate and form transparent photomask glue pattern, then etch away by etching technics the transparent resin layer 2012 that does not cover transparent photomask glue 2011 parts, as shown in the b figure in Fig. 4, the first convex structure 201 comprises transparent photomask glue-line 2011 and transparent resin layer 2012.
Again for example, the transparent photomask glue-line 2011 in said structure is peeled off, as shown in the c figure in Fig. 4, the first convex structure 201 only comprises transparent resin layer 2012.
Again for example, as shown in Figure 5, apply transparent photomask glue-line 2011 on film material layer 202 surface that are tiled on underlay substrate 10, by mask plate, exposed and form photoresist consolidation zone 11 and the non-consolidation zone 12 of photoresist in the surface of transparent photomask glue-line 2011 again, then etch away the non-consolidation zone 12 of transparent photomask glue-line 2011 by etching technics, the first convex structure 201 only comprises transparent photomask glue-line 2011.
So, those skilled in the art can need to adjust the hierarchical structure of the first convex structure 201 according to production and processing, thereby make the job operation of anti-reflection structure 20 more diversified.
Further, the spacing of the width of the first convex structure 201 and adjacent two described the first convex structures 201 is all less than or equal to visible light wavelength;
The height of the first convex structure 201 is more than or equal to the width of the first convex structure 201.
Need to prove, the opening size of the exposure area of the mask plate of the above-mentioned anti-reflection structure of making and the spacing of adjacent two exposure areas are all less than or equal to visible light wavelength.So, the anti-reflection structure that has a plurality of the first convex structures to form can be so that the variation of the refractive index of outside air and anti-reflection structure surface-boundary becomes the variation of simulating continuously, can be so that roughly all projections of visible light, so this anti-reflection structure can be eliminated the reflection of its surperficial light.
Further, as shown in Figure 3, anti-reflection structure 20 can also comprise a plurality of the second convex structures 203, and this second convex structure 203 is positioned at outside black matrix 101 corresponding regions (a-quadrant as shown in Figure 3); And between the second adjacent convex structure 203, adjacent the first convex structure 201 and the distance between the second convex structure 203 be less than or equal to visible light wavelength.So, the zone that can eliminate outside black matrix corresponding region is the radiating light of viewing area, thereby promotes the display effect of display frame.
Further, as shown in Figure 4, the second convex structure 203 can comprise:
The transparent photomask glue-line 2011 and/or the transparent resin layer 2012 that are coated on film material layer 202 surface and carry out exposure imaging and etching technics processing formation by mask plate.
What needs were illustrated is that identical with the first convex structure 202, according to the difference of job operation, the material layer that the second convex structure 203 comprises is also corresponding different., owing to before the not material layer of the first convex structure 202 having been done detailed illustrating, therefore, no longer the different layers level structure of the second convex structure 203 is repeated one by one here.
Further, the material of film material layer 202 is transparent photomask glue 2011 or transparent resin 2012.Adopt a kind of like this transparent material can allow light to see through, thereby avoid affecting Presentation Function and the effect of display device.
The embodiment of the present invention provides a kind of display device, comprises above-mentioned any one display base plate.The identical beneficial effect of display base plate that provides with previous embodiment of the present invention is provided,, because display base plate has been described in detail in the aforementioned embodiment, repeats no more herein.
A kind of display device that the embodiment of the present invention provides, this display device comprises display base plate, form the anti-reflection structure comprise a plurality of convex structures on the underlay substrate of this display base plate, the spacing of the width of this convex structure and adjacent two convex structures is all less than or equal to visible light wavelength; And the height of convex structure is more than or equal to its width.This anti-reflection structure can be positioned at display device inside or be positioned at the demonstration side of display device, so,, by this anti-reflection structure, can eliminate display device surface and inner light reflection, promotes display effect.
The embodiment of the present invention provides a kind of manufacture method of display base plate, and as shown in Figure 1, display base plate comprises underlay substrate 10 and be formed on black matrix 101 on underlay substrate 10, and the method comprises:
S101, form anti-reflection structure 20 on underlay substrate 10, this anti-reflection structure 20 comprises a plurality of the first convex structures 201.
Wherein, the position of the first convex structure 201 is corresponding with the position of black matrix 101.
Need to prove, the position of the first convex structure 201 is corresponding with the position of black matrix 101 refers to that specifically the upper-lower position of the position of the first convex structure 201 and black matrix 101 is corresponding, and namely the position of a plurality of first convex structures 201 corresponding with black matrix 101 upper-lower positions all is no more than the width of black matrix 101.Adopt a kind of like this positional structure, make function and the display effect of viewing area between black matrix unaffected when can utilize this anti-reflection structure 20 to eliminate the light reflection.
The manufacture method of a kind of display base plate that the embodiment of the present invention provides, form the anti-reflection structure comprise a plurality of convex structures on the underlay substrate of this display base plate, the spacing of the width of this convex structure and adjacent two convex structures is all less than or equal to visible light wavelength; And the height of convex structure is more than or equal to its width.This anti-reflection structure can be positioned at display device inside or be positioned at the demonstration side of display device, so,, by this anti-reflection structure, can eliminate display device surface and inner light reflection, promotes display effect.
Further, as shown in Figure 2, make this anti-reflection structure 20 between underlay substrate 10 and black matrix 101.So, this anti-reflection structure 20 not only can be eliminated the reflected light through this underlay substrate, and can, so that underlay substrate is the surperficial have no occluder of the demonstration side of general display device away from black matrix one side, promote smooth finish and the flatness of display screen outside surface.
Perhaps, as shown in Figure 3,, when display base plate is color membrane substrates 01, on the surface of the side away from described black matrix of color membrane substrates 01, make anti-reflection structure 20.So, this anti-reflection structure 20 can be eliminated the light reflection of the side away from described black matrix 101 of color membrane substrates 01, thereby promotes the display effect of display device.
Further, as shown in Figure 4, the first convex structure 201 comprises transparent photomask glue-line 2011 and/or transparent resin layer 2012.
Further, form the film material layer 202 that is tiled on underlay substrate 10 between the first convex structure 201 and underlay substrate 10.
Wherein, anti-reflection structure 20 also comprises film material layer 202.
Need to prove, according to the difference of job operation, the material layer that the first convex structure 201 comprises is also corresponding different.Concrete illustrating is as follows:
Example one:
S301, as shown in a figure in Fig. 4, apply transparent resin layer 2012 on the film material layer surface that is tiled on underlay substrate 10.
S302, on this transparent resin layer 2012 surfaces, make transparent photomask glue-lines 2011, carry out exposure imaging by mask plate and form transparent photomask glue pattern.
S303, etch away the transparent resin layer 2012 that does not cover transparent photomask glue 2011 parts by etching technics, as shown in the b figure in Fig. 4, the first convex structure 201 comprises transparent photomask glue-line 2011 and transparent resin layer 2012.
Example two:
S401, the transparent photomask glue-line 2011 in said structure is peeled off, as shown in the c figure in Fig. 4, the first convex structure 201 only comprises transparent resin layer 2012.
Example three:
S501, as shown in Figure 5, apply transparent photomask glue-lines 2011 on film material layer 202 surface that are tiled on underlay substrate 10,
S502, by mask plate, exposed and form photoresist consolidation zone 11 and the non-consolidation zone 12 of photoresist in the surface of transparent photomask glue-line 2011,
S503, by etching technics, etch away the non-consolidation zone 12 of transparent photomask glue-line 2011, the first convex structure 201 only comprises transparent photomask glue-line 2011.
So, those skilled in the art can need to adjust the hierarchical structure of the first convex structure 201 according to production and processing, thereby make the job operation of anti-reflection structure 20 more diversified.
Further, the spacing of the width of the first convex structure 201 and adjacent two the first convex structures 201 is all less than or equal to visible light wavelength.
The height of the first convex structure 201 is more than or equal to the width of convex structure 201.
Need to prove, the opening size of the exposure area of the mask plate of the above-mentioned anti-reflection structure of making and the spacing of adjacent two exposure areas are all less than or equal to visible light wavelength.So, the anti-reflection structure that has a plurality of the first convex structures to form can be so that the variation of the refractive index of outside air and anti-reflection structure surface-boundary becomes the variation of simulating continuously, can be so that roughly all projections of visible light, so this anti-reflection structure can be eliminated the reflection of its surperficial light.
Further, as shown in Figure 3, (a-quadrant as shown in Figure 3) makes a plurality of the second convex structures 203 outside black matrix 101 corresponding regions, and between the second adjacent convex structure 203, adjacent the first convex structure 201 and the distance between the second convex structure 203 be less than or equal to visible light wavelength.
Wherein, anti-reflection structure 20 also comprises a plurality of the second convex structures 203.So, the zone that can eliminate outside black matrix corresponding region is the radiating light of viewing area, thereby promotes the display effect of display frame.
Further, as shown in Figure 4, the second convex structure 203 comprises:
The transparent photomask glue-line 2011 and/or the transparent resin layer 2012 that are coated on film material layer 202 surface and carry out exposure imaging and etching technics processing formation by mask plate.
What needs were illustrated is that identical with the first convex structure 202, according to the difference of job operation, the material layer that the second convex structure 203 comprises is also corresponding different., because the method for making to the first convex structure 202 has before been done detailed illustrating, therefore, no longer the different layers level structure of the second convex structure 203 is repeated one by one here.
Further, the material of film material layer 202 is transparent photomask glue or transparent resin 2012.Adopt a kind of like this transparent material can allow light to see through, thereby avoid affecting Presentation Function and the effect of display device.
The above; be only the specific embodiment of the present invention, but protection scope of the present invention is not limited to this, anyly is familiar with those skilled in the art in the technical scope that the present invention discloses; can expect easily changing or replacing, within all should being encompassed in protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of described claim.
Claims (19)
1. display base plate, comprise underlay substrate and be formed on black matrix on described underlay substrate, it is characterized in that, described display base plate also comprises: be formed at the anti-reflection structure on described underlay substrate, described anti-reflection structure comprises a plurality of the first convex structures;
Wherein, the position of described the first convex structure is corresponding with the position of described black matrix.
2. display base plate according to claim 1, is characterized in that,
Described anti-reflection structure is between described underlay substrate and described black matrix.
3. display base plate according to claim 1, is characterized in that,
Described display base plate is color membrane substrates, and described anti-reflection structure is positioned at the surface of the side away from described black matrix of described color membrane substrates.
4. display base plate according to claim 1, is characterized in that, described the first convex structure comprises transparent photomask glue-line and/or transparent resin layer.
5. display base plate according to claim 1, it is characterized in that, described anti-reflection structure also comprises the film material layer of described the first convex structural base, and described film material layer is tiled on described underlay substrate, and between described the first convex structure and described underlay substrate.
6. according to claim 1-5 described display base plates, is characterized in that, the spacing of the width of described the first convex structure and adjacent two described the first convex structures is all less than or equal to visible light wavelength;
The height of described the first convex structure is more than or equal to the width of described the first convex structure.
7. according to claim 1-5 described display base plates, is characterized in that, described anti-reflection structure also comprises a plurality of the second convex structures, and described the second convex structure is positioned at outside described black matrix corresponding region; And between adjacent described the second convex structure, adjacent described the first convex structure and the distance between described the second convex structure be all less than or equal to visible light wavelength.
8. display base plate according to claim 7, is characterized in that, described the second convex structure comprises:
The described transparent photomask glue-line and/or the described transparent resin layer that are coated on described film material layer surface and carry out exposure imaging and etching technics processing formation by mask plate.
9. display base plate according to claim 8, is characterized in that, the material of described film material layer is transparent photomask glue or transparent resin.
10. a display device, is characterized in that, comprise as arbitrary in claim 1-9 as described in display base plate.
11. the manufacture method of a display base plate, described display base plate comprise underlay substrate and be formed on black matrix on described underlay substrate, it is characterized in that, described method comprises:
Form anti-reflection structure on described underlay substrate, described anti-reflection structure comprises a plurality of the first convex structures;
Wherein, the position of described the first convex structure is corresponding with the position of described black matrix.
12. manufacture method according to claim 11, is characterized in that, makes described anti-reflection structure between described underlay substrate and described black matrix.
13. manufacture method according to claim 11, is characterized in that, described display base plate is color membrane substrates, on the surface of the side away from described black matrix of described color membrane substrates, makes described anti-reflection structure.
14. manufacture method according to claim 11, is characterized in that, described the first convex structure comprises transparent photomask glue-line and/or transparent resin layer.
15. manufacture method according to claim 11, is characterized in that,
Form the film material layer that is tiled on described underlay substrate between described the first convex structure and described underlay substrate;
Wherein, described anti-reflection structure also comprises described film material layer.
16. according to claim 11-15 described manufacture methods, is characterized in that, the spacing of the width of described the first convex structure and adjacent two described the first convex structures is all less than or equal to visible light wavelength;
The height of described the first convex structure is more than or equal to the width of described convex structure.
17. according to claim 11-15 described manufacture methods, is characterized in that,
Make a plurality of the second convex structures outside described black matrix corresponding region, and between adjacent described the second convex structure, adjacent described the first convex structure and the distance between described the second convex structure be all less than or equal to visible light wavelength;
Wherein, described anti-reflection structure also comprises described a plurality of the second convex structure.
18. manufacture method according to claim 17, is characterized in that, described the second convex structure comprises:
The described transparent photomask glue-line and/or the described transparent resin layer that are coated on described film material layer surface and carry out exposure imaging and etching technics processing formation by mask plate.
19. manufacture method according to claim 18, is characterized in that, the material of described film material layer is transparent photomask glue or transparent resin.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310324992.9A CN103399367B (en) | 2013-07-30 | 2013-07-30 | A kind of display base plate and manufacture method, display device |
| PCT/CN2013/089455 WO2015014073A1 (en) | 2013-07-30 | 2013-12-14 | Display substrate and manufacturing method therefor, and display device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310324992.9A CN103399367B (en) | 2013-07-30 | 2013-07-30 | A kind of display base plate and manufacture method, display device |
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| CN103399367A true CN103399367A (en) | 2013-11-20 |
| CN103399367B CN103399367B (en) | 2016-02-17 |
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| CN104297978A (en) * | 2014-10-30 | 2015-01-21 | 京东方科技集团股份有限公司 | Display substrate and preparation method thereof, display device and preparation method thereof |
| WO2015014073A1 (en) * | 2013-07-30 | 2015-02-05 | 合肥京东方光电科技有限公司 | Display substrate and manufacturing method therefor, and display device |
| CN106292045A (en) * | 2016-08-12 | 2017-01-04 | 京东方科技集团股份有限公司 | Light emission side substrate of mirror face display equipment and preparation method thereof, mirror face display equipment |
| CN107450220A (en) * | 2016-05-31 | 2017-12-08 | 三星显示有限公司 | Color conversion panel and the display device for including the color conversion panel |
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| CN106292045A (en) * | 2016-08-12 | 2017-01-04 | 京东方科技集团股份有限公司 | Light emission side substrate of mirror face display equipment and preparation method thereof, mirror face display equipment |
| CN106292045B (en) * | 2016-08-12 | 2019-12-03 | 京东方科技集团股份有限公司 | Light emission side substrate of mirror face display equipment and preparation method thereof, mirror face display equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2015014073A1 (en) | 2015-02-05 |
| CN103399367B (en) | 2016-02-17 |
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