WO2015014073A1 - Display substrate and manufacturing method therefor, and display device - Google Patents

Display substrate and manufacturing method therefor, and display device Download PDF

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Publication number
WO2015014073A1
WO2015014073A1 PCT/CN2013/089455 CN2013089455W WO2015014073A1 WO 2015014073 A1 WO2015014073 A1 WO 2015014073A1 CN 2013089455 W CN2013089455 W CN 2013089455W WO 2015014073 A1 WO2015014073 A1 WO 2015014073A1
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WO
WIPO (PCT)
Prior art keywords
substrate
convex
display
black matrix
display substrate
Prior art date
Application number
PCT/CN2013/089455
Other languages
French (fr)
Chinese (zh)
Inventor
郭磊
涂志中
申莹
尹傛俊
Original Assignee
合肥京东方光电科技有限公司
京东方科技集团股份有限公司
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Application filed by 合肥京东方光电科技有限公司, 京东方科技集团股份有限公司 filed Critical 合肥京东方光电科技有限公司
Publication of WO2015014073A1 publication Critical patent/WO2015014073A1/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/118Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133502Antiglare, refractive index matching layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix

Definitions

  • Display substrate manufacturing method thereof, and display device
  • Embodiments of the present invention relate to a display substrate, a method of manufacturing the same, and a display device. Background technique
  • LR low reflection
  • AG Anti Glare
  • the respective amplitude reflectance and phase are different from the ideal conditions, and therefore, the reflected light is not completely canceled, and the reflection effect is not ideal;
  • the AG process forms a fine concavo-convex pattern on the surface of the display, and uses the scattering effect of light to prevent external light from being reflected.
  • the imaging of the external light source is blurred, which affects the display effect.
  • the Moth-eye structure can achieve anti-reflection effects without using light interference.
  • the moth-eye structure is arranged on the surface of the display screen, and is arranged with a finer pitch of the wavelength of the light (for example, 380 nm) or less than the gap of the AG light scattering structure, so that the boundary refractive index between the outside air and the film surface is made.
  • the change is relatively continuous. In this way, the external light source can be substantially completely transmitted, so that the light reflection on the surface of the display screen can be almost eliminated.
  • a mold pressing method is generally used to prepare such a structure, that is, a mold structure opposite to the moth-eye structure is first prepared, and then the desired moth-eye structure is obtained by physically pressing the mold onto the film-forming material.
  • the preparation process has strict requirements on materials and process parameters, and the process stability is not good.
  • Embodiments of the present invention provide a display substrate, a method of manufacturing the same, and a display device, which can eliminate light reflection on the surface and inside of the display device and improve display effects.
  • a display substrate comprising:
  • the position of the first convex structure corresponds to the position of the black matrix.
  • a display device comprising the display substrate as described above.
  • a method of manufacturing a display substrate including a substrate substrate and a black matrix formed on the substrate substrate comprising: on the substrate substrate
  • Forming the anti-reflection structure includes forming a plurality of first convex structures at positions corresponding to positions of the black matrix.
  • FIG. 1 is a schematic structural diagram of a display substrate according to an embodiment of the present invention.
  • FIG. 2 is a schematic structural diagram of another display substrate according to an embodiment of the present invention.
  • FIG. 3 is a schematic structural diagram of still another display substrate according to an embodiment of the present invention.
  • FIG. 4 is a schematic diagram of a manufacturing process of an anti-reflection structure according to an embodiment of the present invention
  • FIG. 5 is a schematic diagram of a manufacturing process of another anti-reflection structure according to an embodiment of the present invention.
  • the embodiment of the invention provides a display substrate, as shown in FIG. 1, comprising a substrate substrate 10 and a black matrix 101 formed on the substrate substrate 10.
  • the display substrate further includes: an anti-reflection structure 20 formed on the substrate substrate 10, and the anti-reflection structure may include a plurality of first convex structures 201.
  • the position of the first convex structure 201 may correspond to the position of the black matrix 101.
  • the anti-reflection structure may be located on either side of the substrate substrate 10 at a position corresponding to the position of the black matrix.
  • the position of the first convex structure 201 corresponds to the position of the black matrix 101, which means that the position of the first convex structure 201 corresponds to the upper and lower positions of the black matrix 101, that is, corresponding to the upper and lower positions of the black matrix 101.
  • the positions of the plurality of first convex structures 201 do not exceed the width of the black matrix 101. With such a positional structure, the light reflection can be eliminated by the anti-reflection structure 20 without affecting the area of the display area between the black matrices, so that the pixel aperture ratio is not affected.
  • a display substrate is provided on the substrate substrate of the display substrate, and an anti-reflection structure including a plurality of convex structures is formed on a width of the convex structure and a pitch of two adjacent convex structures. Less than or equal to the wavelength of visible light.
  • the height of the convex structure is greater than or equal to its width.
  • the anti-reflection structure may be located inside the display device or on the display side of the display device, so that the anti-reflection structure can eliminate light reflection on the surface and inside of the display device, thereby improving the display effect.
  • the anti-reflection structure 20 is located between the substrate substrate 10 and the black matrix 101.
  • the anti-reflection structure 20 can not only eliminate the reflected light transmitted through the substrate of the village, but also can make the substrate of the substrate away from the side of the black matrix, that is, the surface of the display side of the general display device is unobstructed, and the display screen is raised.
  • the smoothness and flatness of the outer surface are particularly important.
  • the display substrate is a color filter substrate 01
  • the anti-reflection structure 20 is located on a surface of the color filter substrate 01 on a side away from the black matrix 101.
  • the anti-reflection structure 20 can eliminate the light reflection of the side of the color filter substrate 01 away from the black matrix 101. Thereby improving the display effect of the display device.
  • the first convex structure 201 includes a transparent photoresist layer 2011 and/or a transparent resin layer 2012.
  • the anti-reflection structure 20 may further include a film layer 202 at the bottom of the first convex structure 201.
  • the film layer 202 is laid on the substrate substrate 10 and located between the first convex structure 201 and the substrate substrate 10.
  • the material of the film layer is, for example, a transparent photoresist or a transparent resin, and can be formed on a substrate by a conventional process such as spin coating.
  • the material layers included in the first convex structure 201 are also different depending on the processing method.
  • the surface of the film layer 202 laid on the substrate substrate 10 is coated with a transparent resin layer 2012, and then a transparent photoresist layer 2011 is formed on the surface of the transparent resin layer 2012.
  • a transparent photoresist layer 2011 is formed on the surface of the transparent resin layer 2012.
  • the transparent photoresist layer 2011 in the above structure is peeled off, and as shown in Fig. 4, the first convex structure 201 includes only the transparent resin layer 2012.
  • a transparent photoresist layer 2011 is coated on the surface of the film layer 202 laid on the substrate 10, and then the surface of the transparent photoresist layer 2011 is exposed through a mask.
  • the photoresist curing region 11 and the photoresist non-curing region 12 are then etched away from the transparent photoresist layer 2011 uncured region 12 by an etching process, and the first convex structure 201 includes only a transparent photoresist layer.
  • the width of the first convex structure 201 and the pitch of the adjacent two first convex structures 201 are both less than or equal to the wavelength of visible light.
  • the height of the first convex structure 201 is greater than or equal to the width of the first convex structure 201.
  • the opening size of the exposed region of the mask for fabricating the anti-reflection structure and the pitch of the adjacent two exposed regions are both less than or equal to the wavelength of visible light.
  • the anti-reflection structure including the plurality of first convex structures can simulate the change of the refractive index of the surface boundary of the outside air and the anti-reflection structure to be approximately continuous change, so that the visible light can be substantially totally projected, so the defense
  • the reflective structure eliminates light reflection from its surface. For example, as shown in FIG.
  • the anti-reflection structure 20 may further include a plurality of second convex structures 203 located outside the corresponding regions of the black matrix 101 (such as the A region shown in FIG. 3). And the distance between the adjacent second convex structures 203 and between the adjacent first convex structures 201 and the second convex structures 203 is less than or equal to the wavelength of visible light. In this way, it is possible to eliminate the reflected light of the area other than the corresponding area of the black matrix, that is, the display area, thereby improving the display effect of the display screen.
  • the second convex structure 203 may include:
  • a transparent photoresist layer 2011 and/or a transparent resin layer 2012 coated on the surface of the film layer 202; a transparent photoresist layer having a convex structure obtained by exposure development and etching processing through a mask 2011 and / or transparent resin layer 2012 part (see Figure 4b).
  • first convex structure 202 may be as described above with respect to the different material layers of the first convex structure 202.
  • the material of the film layer 202 is a transparent photoresist 2011 or a transparent resin 2012.
  • a transparent material allows light to pass through, thereby avoiding affecting the display function and effect of the display device.
  • Embodiments of the present invention provide a display device including any one of the above display substrates.
  • the display device has the same advantageous effects as the display substrate provided by the foregoing embodiments of the present invention.
  • a display device provided by an embodiment of the present invention includes a display substrate on which an anti-reflection structure including a plurality of convex structures is formed on a substrate of the display substrate, the width of the convex structure and adjacent
  • the pitch of the two convex structures is less than or equal to the wavelength of visible light; and the height of the convex structure is greater than or equal to the width thereof.
  • the anti-reflection structure may be located inside the display device or on the display side of the display device, so that the anti-reflection structure can eliminate light reflection on the surface and inside of the display device and enhance the display effect.
  • the embodiment of the present invention provides a method for manufacturing a display substrate.
  • the display substrate includes a substrate substrate 10 and a black matrix 101 formed on the substrate substrate 10.
  • the method includes:
  • an anti-reflection structure 20 is formed on the substrate substrate 10, and the anti-reflection structure 20 includes a plurality of first convex structures 201.
  • the position of the first convex structure 201 may correspond to the position of the black matrix 101.
  • the position of the first convex structure 201 corresponds to the position of the black matrix 101, which means that the position of the first convex structure 201 corresponds to the upper and lower positions of the black matrix 101, that is, corresponding to the upper and lower positions of the black matrix 101.
  • the positions of the plurality of first convex structures 201 are not more than the black matrix 101 Width. With such a positional structure, the light reflection can be eliminated by the anti-reflection structure 20 without affecting the area of the display area between the black matrices, so that the pixel aperture ratio is not affected.
  • an anti-reflection structure including a plurality of convex structures is formed on a substrate of the display substrate, and a width of the convex structure and two adjacent convex structures are formed.
  • the pitch is less than or equal to the wavelength of visible light.
  • the height of the convex structure is greater than or equal to its width.
  • the anti-reflection structure may be located inside the display device or on the display side of the display device, so that the anti-reflection structure can eliminate light reflection on the surface and inside of the display device and enhance the display effect.
  • the anti-reflection structure 20 is formed between the substrate substrate 10 and the black matrix 101.
  • the anti-reflection structure 20 can not only eliminate the reflected light transmitted through the substrate of the village, but also can make the substrate of the substrate away from the side of the black matrix, that is, the surface of the display side of the general display device is unobstructed, and the display screen is raised.
  • the smoothness and flatness of the outer surface are not only eliminate the reflected light transmitted through the substrate of the village, but also can make the substrate of the substrate away from the side of the black matrix, that is, the surface of the display side of the general display device is unobstructed, and the display screen is raised. The smoothness and flatness of the outer surface.
  • the anti-reflection structure 20 is formed on the surface of the color filter substrate 01 on the side away from the black matrix. In this way, the anti-reflection structure 20 can eliminate the light reflection of the side of the color filter substrate 01 away from the black matrix 101, thereby improving the display effect of the display device.
  • the first convex structure 201 includes a transparent photoresist layer 2011 and/or a transparent resin layer 2012.
  • the anti-reflective structure 20 also includes a film layer 202.
  • the film layer 202 laid on the substrate substrate 10 is formed between the first convex structure 201 and the substrate substrate 10. It should be noted that, depending on the processing method, the material layers included in the first convex structure 201 are also different. The examples are as follows:
  • the film layer 202 laid on the substrate substrate 10 is coated with a transparent resin layer 2012.
  • a transparent photoresist layer 2011 is formed on the surface of the transparent resin layer 2012, and a transparent photoresist pattern is formed by exposure and development through a mask.
  • the first convex structure 201 includes a transparent photoresist layer 2011. And transparent resin layer 2012.
  • the transparent photoresist layer 2011 in the above structure is peeled off, and as shown in c in FIG. 4, the first convex structure 201 includes only the transparent resin layer 2012.
  • a transparent photoresist layer 2011 is coated on the surface of the film layer 202 laid on the substrate 10 of the village.
  • the person skilled in the art can adjust the hierarchical structure of the first convex structure 201 according to the production and processing requirements, thereby obtaining the anti-reflection structure 20 of different structures.
  • the width of the first convex structure 201 and the pitch of the adjacent two first convex structures 201 are both less than or equal to the wavelength of visible light.
  • the height of the first convex structure 201 is greater than or equal to the width of the convex structure 201.
  • the opening size of the exposed region of the mask for fabricating the anti-reflection structure and the pitch of the adjacent two exposed regions are both less than or equal to the wavelength of visible light.
  • the anti-reflection structure including the plurality of first convex structures can be such that the change in the refractive index of the surface boundary of the outside air and the anti-reflection structure is simulated to be a continuous change, so that the visible light can be projected substantially all, eliminating the display. The light reflection of the surface.
  • a plurality of second convex structures 203 are formed outside the corresponding regions of the black matrix 101 (such as the A region shown in FIG. 3), and between the adjacent second convex structures 203, The distance between the adjacent first convex structure 201 and the second convex structure 203 is less than or equal to the wavelength of visible light.
  • the anti-reflection structure 20 includes a plurality of such second convex structures 203, which can eliminate the reflected light of the area other than the corresponding area of the black matrix, that is, the display area, thereby improving the display effect of the display screen.
  • the second convex structure 203 includes:
  • the transparent photoresist layer 2011 and/or the transparent resin layer 2012 are applied to the surface of the film layer 202 and subjected to exposure development and etching processes through a mask.
  • the material of the film layer 202 may be a transparent photoresist or a transparent resin 2012 as described in detail above with respect to the different material layers of the first convex structure 202.
  • a transparent material allows light to pass through, thereby avoiding affecting the display function and effect of the display device.
  • the invention provides a display substrate, a manufacturing method thereof, and a display device.
  • An anti-reflection structure including a plurality of convex structures is formed on a substrate of the display substrate, and the width of the convex structure and two adjacent ones are formed.
  • the pitch of the convex structures is less than or equal to the wavelength of visible light.
  • the anti-reflection structure can be located inside the display device or on the display side of the display device, so that the anti-reflection structure can eliminate light reflection on the surface and inside of the display device and enhance the display effect.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

A display substrate and a manufacturing method therefor, and a display device. An anti-reflection structure (20) containing a plurality of convex structures (201, 203) is formed on an underlayment substrate (10) of the display substrate. Both the width of the convex structures (201, 203) and the distance between two adjacent convex structures (201, 203) are less than or equal to the wavelength of visible light.

Description

显示基板及其制造方法、 显示装置 技术领域  Display substrate, manufacturing method thereof, and display device
本发明的实施例涉及一种显示基板及其制造方法、 显示装置。 背景技术  Embodiments of the present invention relate to a display substrate, a method of manufacturing the same, and a display device. Background technique
对于常规技术中的各种显示装置而言, 外界光源极易在显示屏幕的表 面发生反射从而严重影响显示效果, 因此, 如何消除外界光源对显示效果 的影响显得非常的重要。 目前作为防反射的方法主要有低反射(LR, Low Reflection )处理及防光(AG, Anti Glare )处理; 其中 LR处理是在显示器 的表面上覆盖与构成显示屏幕表面材料的折射率不同的物质, 通过在显示 膜界面上发生的反射以及 LR膜与显示器表面上发生的反射,各自的振幅反 射率、 相位与理想的条件不同, 因此, 这些反射光不会完全抵消, 反射效 果并不理想; 而 AG处理是在显示器的表面形成细微的凹凸图案,用光的散 射效果来防止外光映入, 但这样一来会使得外界光源的成像变得模糊, 影 响显示效果。  For various display devices in the conventional technology, the external light source is easily reflected on the surface of the display screen to seriously affect the display effect. Therefore, how to eliminate the influence of the external light source on the display effect is very important. At present, as an anti-reflection method, there are mainly low reflection (LR, Low Reflection) processing and anti-glare (AG, Anti Glare) processing; wherein LR processing is to cover a surface of the display with a refractive index different from that of the surface material constituting the display screen. By the reflection occurring at the interface of the display film and the reflection of the LR film and the surface of the display, the respective amplitude reflectance and phase are different from the ideal conditions, and therefore, the reflected light is not completely canceled, and the reflection effect is not ideal; The AG process forms a fine concavo-convex pattern on the surface of the display, and uses the scattering effect of light to prevent external light from being reflected. However, the imaging of the external light source is blurred, which affects the display effect.
相比较 AG处理而言, 采用蛾眼(Moth-eye )结构可以通过不使用光干 涉的方式达到防反射效果。蛾眼结构是在显示屏幕的表面,将比 AG光散射 结构更细微的、 间隔为光的波长(例如, 380nm )长度或以下的凹凸图案间 隙地排列, 从而使得外界空气和膜表面边界折射率的变化相对连续。 这样 一来, 外界光源大致可以全部透射, 因此可以几乎消除显示屏幕表面的光 反射。 蛾眼结构由于其尺寸过于微小 (纳米量级) , 同时对精度要求高, 凸起部分间距很小, 又不可互相粘连(否则会引起光的散射) , 因此制作 蛾眼结构的难度较大。 目前普遍采用模具压制法制备这种结构, 即先制备 出与蛾眼结构相反的模具结构, 然后再通过将模具物理压制在成膜材料上, 得到想要的蛾眼结构。 这种制备工艺对材料和工艺参数要求严格, 且工艺 稳定性不好, 很难控制蛾眼结构的尺寸与间距, 还容易造成蛾眼结构凸起 部分的相互粘连, 严重影响防反射效果。 发明内容 本发明的实施例提供一种显示基板及其制造方法、 显示装置, 可以消 除显示器件表面和内部的光反射, 提升显示效果。 Compared with the AG process, the Moth-eye structure can achieve anti-reflection effects without using light interference. The moth-eye structure is arranged on the surface of the display screen, and is arranged with a finer pitch of the wavelength of the light (for example, 380 nm) or less than the gap of the AG light scattering structure, so that the boundary refractive index between the outside air and the film surface is made. The change is relatively continuous. In this way, the external light source can be substantially completely transmitted, so that the light reflection on the surface of the display screen can be almost eliminated. Because the size of the moth-eye structure is too small (nano-scale), and the precision is high, the pitch of the convex portions is small, and it is not allowed to adhere to each other (otherwise, it will cause scattering of light), so it is difficult to make the moth-eye structure. At present, a mold pressing method is generally used to prepare such a structure, that is, a mold structure opposite to the moth-eye structure is first prepared, and then the desired moth-eye structure is obtained by physically pressing the mold onto the film-forming material. The preparation process has strict requirements on materials and process parameters, and the process stability is not good. It is difficult to control the size and spacing of the moth-eye structure, and it is also easy to cause the mutual adhesion of the moth-eye structure convex portions, which seriously affects the anti-reflection effect. Summary of the invention Embodiments of the present invention provide a display substrate, a method of manufacturing the same, and a display device, which can eliminate light reflection on the surface and inside of the display device and improve display effects.
根据本发明的一个方面, 提供一种显示基板, 包括:  According to an aspect of the invention, a display substrate is provided, comprising:
村底基板;  Village substrate;
形成在所述村底基板上的黑矩阵; 以及  a black matrix formed on the substrate of the village; and
形成于所述村底基板上的防反射结构, 所述防反射结构包括多个第一 凸状结构;  An anti-reflection structure formed on the substrate of the village, the anti-reflection structure comprising a plurality of first convex structures;
其中, 所述第一凸状结构的位置与所述黑矩阵的位置相对应。  The position of the first convex structure corresponds to the position of the black matrix.
根据本发明的另一方面提供, 提供一种显示装置, 包括如上所述的显 示基板。  According to another aspect of the present invention, there is provided a display device comprising the display substrate as described above.
根据本发明的又一方面, 提供一种显示基板的制造方法, 所述显示基 板包括村底基板以及形成在所述村底基板上的黑矩阵, 所述方法包括: 在所述村底基板上形成防反射结构, 包括在与所述黑矩阵的位置相对 应的位置形成多个第一凸状结构。 附图说明  According to still another aspect of the present invention, a method of manufacturing a display substrate including a substrate substrate and a black matrix formed on the substrate substrate, the method comprising: on the substrate substrate Forming the anti-reflection structure includes forming a plurality of first convex structures at positions corresponding to positions of the black matrix. DRAWINGS
以下将结合附图对本发明的实施例进行更详细的说明, 以使本领域普通 技术人员更加清楚地理解本发明, 其中:  The embodiments of the present invention will be described in more detail below with reference to the accompanying drawings, in which FIG.
图 1为本发明实施例提供的一种显示基板的结构示意图;  1 is a schematic structural diagram of a display substrate according to an embodiment of the present invention;
图 2为本发明实施例提供的另一种显示基板的结构示意图;  2 is a schematic structural diagram of another display substrate according to an embodiment of the present invention;
图 3为本发明实施例提供的又一种显示基板的结构示意图;  3 is a schematic structural diagram of still another display substrate according to an embodiment of the present invention;
图 4为本发明实施例提供的一种防反射结构的制作过程示意图; 图 5为本发明实施例提供的另一种防反射结构的制作过程示意图。 具体实施方式  FIG. 4 is a schematic diagram of a manufacturing process of an anti-reflection structure according to an embodiment of the present invention; FIG. 5 is a schematic diagram of a manufacturing process of another anti-reflection structure according to an embodiment of the present invention. detailed description
下面将结合本发明实施例中的附图, 对本发明实施例中的技术方案进行 清楚、 完整地描述, 显然, 所描述的实施例仅仅是本发明一部分示例性实施 例, 而不是全部的实施例。 基于这些示例性的实施例, 本领域普通技术人员 在无需创造性劳动前提下所获得的所有其他实施例, 都属于本发明保护的范 围。  The technical solutions in the embodiments of the present invention are clearly and completely described in the following with reference to the accompanying drawings in the embodiments of the present invention. It is obvious that the described embodiments are only a part of exemplary embodiments of the present invention, but not all embodiments. . Based on these exemplary embodiments, all other embodiments obtained by those skilled in the art without the need for inventive work are within the scope of the present invention.
除非另作定义, 此处使用的技术术语或者科学术语应当为本发明所属领 域内具有一般技能的人士所理解的通常意义。 本发明专利申请说明书以及权 利要求书中使用的 "第一"、 "第二" 以及类似的词语并不表示任何顺序、 数 量或者重要性, 而只是用来区分不同的组成部分。 同样, "一个"、 "一"或者 "该"等类似词语也不表示数量限制, 而是表示存在至少一个。 "包括 "或者 "包含" 等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后 面列举的元件或者物件及其等同,而不排除其他元件或者物件。 "上"、 "下"、 等仅用于表示相对位置关系, 当被描述对象的绝对位置改变后, 则该相对位 置关系也可能相应地改变。 Unless otherwise defined, the technical terms or scientific terms used herein shall be the subject of the invention. The usual meaning understood by people with general skills in the domain. The words "first", "second" and similar terms used in the specification and claims of the present invention are not intended to indicate any order, quantity, or importance, but only to distinguish different components. Similarly, the words "a", "an", "the", and the like do not denote a quantity limitation, but rather mean that there is at least one. The word "comprising" or "comprises" or the like means that the element or item that precedes the word is intended to encompass the element or the item recited after the word and its equivalent, and does not exclude other element or item. "Up", "Bottom", etc. are only used to indicate the relative positional relationship, and when the absolute position of the object to be described is changed, the relative positional relationship may also change accordingly.
本发明实施例提供一种显示基板, 如图 1所示, 包括村底基板 10以及 形成在村底基板 10上的黑矩阵 101。 该显示基板还包括: 形成于村底基板 10上的防反射结构 20, 该防反射结构可以包括多个第一凸状结构 201。  The embodiment of the invention provides a display substrate, as shown in FIG. 1, comprising a substrate substrate 10 and a black matrix 101 formed on the substrate substrate 10. The display substrate further includes: an anti-reflection structure 20 formed on the substrate substrate 10, and the anti-reflection structure may include a plurality of first convex structures 201.
第一凸状结构 201的位置可以与黑矩阵 101的位置相对应。 例如, 该 防反射结构可以位于村底基板 10的任何一侧, 与黑矩阵位置相应的位置。  The position of the first convex structure 201 may correspond to the position of the black matrix 101. For example, the anti-reflection structure may be located on either side of the substrate substrate 10 at a position corresponding to the position of the black matrix.
需要说明的是, 第一凸状结构 201的位置与黑矩阵 101的位置相对应 指第一凸状结构 201 的位置与黑矩阵 101的上下位置相对应, 即与黑矩阵 101上下位置相对应的多个第一凸状结构 201的位置均不超过黑矩阵 101的 宽度。 采用这样一种位置结构, 在利用该防反射结构 20消除光反射的同时 不会影响黑矩阵之间的显示区域的面积, 从而使像素开口率不受影响。  It should be noted that the position of the first convex structure 201 corresponds to the position of the black matrix 101, which means that the position of the first convex structure 201 corresponds to the upper and lower positions of the black matrix 101, that is, corresponding to the upper and lower positions of the black matrix 101. The positions of the plurality of first convex structures 201 do not exceed the width of the black matrix 101. With such a positional structure, the light reflection can be eliminated by the anti-reflection structure 20 without affecting the area of the display area between the black matrices, so that the pixel aperture ratio is not affected.
本发明实施例提供的一种显示基板, 在该显示基板的村底基板上形成 包含多个凸状结构的防反射结构, 该凸状结构的宽度以及相邻的两个凸状 结构的间距均小于等于可见光的波长。 该凸状结构的高度大于等于其宽度。 该防反射结构可以位于显示装置内部或者位于显示装置的显示侧, 这样一 来, 通过该防反射结构, 可以消除显示器件表面和内部的光反射, 提升显 示效果。  A display substrate is provided on the substrate substrate of the display substrate, and an anti-reflection structure including a plurality of convex structures is formed on a width of the convex structure and a pitch of two adjacent convex structures. Less than or equal to the wavelength of visible light. The height of the convex structure is greater than or equal to its width. The anti-reflection structure may be located inside the display device or on the display side of the display device, so that the anti-reflection structure can eliminate light reflection on the surface and inside of the display device, thereby improving the display effect.
例如, 如图 2所示, 防反射结构 20位于村底基板 10和黑矩阵 101之 间。 这样一来, 该防反射结构 20不仅可以消除透过该村底基板的反射光, 而且可以使得村底基板远离黑矩阵一侧即为一般显示器件的显示侧的表面 无遮挡物, 提升显示屏外表面的光洁度和平整度。  For example, as shown in Fig. 2, the anti-reflection structure 20 is located between the substrate substrate 10 and the black matrix 101. In this way, the anti-reflection structure 20 can not only eliminate the reflected light transmitted through the substrate of the village, but also can make the substrate of the substrate away from the side of the black matrix, that is, the surface of the display side of the general display device is unobstructed, and the display screen is raised. The smoothness and flatness of the outer surface.
或者, 例如, 如图 3所示, 显示基板为彩膜基板 01 , 所述防反射结构 20位于彩膜基板 01的远离所述黑矩阵 101的一侧的表面。 这样一来, 该防 反射结构 20可以消除彩膜基板 01的远离所述黑矩阵 101的一侧的光反射, 从而提升显示器件的显示效果。 Alternatively, for example, as shown in FIG. 3, the display substrate is a color filter substrate 01, and the anti-reflection structure 20 is located on a surface of the color filter substrate 01 on a side away from the black matrix 101. In this way, the anti-reflection structure 20 can eliminate the light reflection of the side of the color filter substrate 01 away from the black matrix 101. Thereby improving the display effect of the display device.
例如, 如图 4所示, 第一凸状结构 201包括透明光刻胶层 2011和 /或透 明树脂层 2012。  For example, as shown in FIG. 4, the first convex structure 201 includes a transparent photoresist layer 2011 and/or a transparent resin layer 2012.
防反射结构 20还可以包括第一凸状结构 201底部的膜材层 202, 该膜 材层 202平铺在村底基板 10上, 且位于第一凸状结构 201和村底基板 10 之间,所述膜材层的材料例如为透明光刻胶或透明树脂,可以利用旋涂等常 规工艺形成基板上。  The anti-reflection structure 20 may further include a film layer 202 at the bottom of the first convex structure 201. The film layer 202 is laid on the substrate substrate 10 and located between the first convex structure 201 and the substrate substrate 10. The material of the film layer is, for example, a transparent photoresist or a transparent resin, and can be formed on a substrate by a conventional process such as spin coating.
需要说明的是, 根据加工方法的不同, 第一凸状结构 201 包括的物质 层也相应有所不同。 例如, 如图 4中的 a图所示, 在平铺于村底基板 10上 的膜材层 202表面涂覆透明树脂层 2012,然后在该透明树脂层 2012表面制 作透明光刻胶层 2011 , 通过掩膜板进行曝光显影形成透明光刻胶图案, 然 后通过刻蚀工艺刻蚀掉未覆盖透明光刻胶 2011部分的透明树脂层 2012,则 如图 4中的 b图所示, 第一凸状结构 201包括透明光刻胶层 2011和透明树 脂层 2012。  It should be noted that the material layers included in the first convex structure 201 are also different depending on the processing method. For example, as shown in a of FIG. 4, the surface of the film layer 202 laid on the substrate substrate 10 is coated with a transparent resin layer 2012, and then a transparent photoresist layer 2011 is formed on the surface of the transparent resin layer 2012. Forming a transparent photoresist pattern by exposure and development through a mask, and then etching away the transparent resin layer 2012 not covering the transparent photoresist portion 2011 by an etching process, as shown in FIG. 4, the first convex The structure 201 includes a transparent photoresist layer 2011 and a transparent resin layer 2012.
又例如, 对上述结构中的透明光刻胶层 2011进行剥离, 则如图 4中的 c图所示, 第一凸状结构 201仅包括透明树脂层 2012。  Further, for example, the transparent photoresist layer 2011 in the above structure is peeled off, and as shown in Fig. 4, the first convex structure 201 includes only the transparent resin layer 2012.
再例如, 如图 5所示, 在平铺于村底基板 10上的膜材层 202表面涂覆 透明光刻胶层 2011 ,再通过掩膜板对透明光刻胶层 2011的表面进行曝光形 成光刻胶固化区域 11和光刻胶非固化区域 12,然后通过刻蚀工艺刻蚀掉透 明光刻胶层 2011非固化区域 12,则第一凸状结构 201仅包括透明光刻胶层 For example, as shown in FIG. 5, a transparent photoresist layer 2011 is coated on the surface of the film layer 202 laid on the substrate 10, and then the surface of the transparent photoresist layer 2011 is exposed through a mask. The photoresist curing region 11 and the photoresist non-curing region 12 are then etched away from the transparent photoresist layer 2011 uncured region 12 by an etching process, and the first convex structure 201 includes only a transparent photoresist layer.
2011。 2011.
这样一来, 本领域技术人员可以根据生产和加工需要对第一凸状结构 201的层级结构进行调整,从而使得防反射结构 20的加工方法更为多样化。  In this way, those skilled in the art can adjust the hierarchical structure of the first convex structure 201 according to the production and processing requirements, thereby making the processing method of the anti-reflection structure 20 more diverse.
例如,第一凸状结构 201的宽度以及相邻的两个所述第一凸状结构 201 的间距均小于等于可见光的波长。  For example, the width of the first convex structure 201 and the pitch of the adjacent two first convex structures 201 are both less than or equal to the wavelength of visible light.
例如, 第一凸状结构 201的高度大于等于第一凸状结构 201的宽度。 需要说明的是, 制作上述防反射结构的掩膜板的曝光区域的开口尺寸 以及相邻两个曝光区域的间距均小于等于可见光的波长。 这样一来, 包括 多个第一凸状结构的防反射结构可以使得外界空气和防反射结构表面边界 的折射率的变化被模拟成近似连续变化, 这样, 可以使得可见光大致全部 投射, 因此该防反射结构可以消除其表面的光反射。 例如, 如图 3所示, 防反射结构 20还可以包括多个第二凸状结构 203 , 该第二凸状结构 203位于黑矩阵 101对应区域之外 (如图 3中所示的 A区 域) ; 且相邻的第二凸状结构 203之间、 相邻的第一凸状结构 201与第二 凸状结构 203之间的距离小于等于可见光的波长。 这样, 可以消除黑矩阵 对应区域之外的区域即显示区域的反射光, 从而提升显示画面的显示效果。 For example, the height of the first convex structure 201 is greater than or equal to the width of the first convex structure 201. It should be noted that the opening size of the exposed region of the mask for fabricating the anti-reflection structure and the pitch of the adjacent two exposed regions are both less than or equal to the wavelength of visible light. In this way, the anti-reflection structure including the plurality of first convex structures can simulate the change of the refractive index of the surface boundary of the outside air and the anti-reflection structure to be approximately continuous change, so that the visible light can be substantially totally projected, so the defense The reflective structure eliminates light reflection from its surface. For example, as shown in FIG. 3, the anti-reflection structure 20 may further include a plurality of second convex structures 203 located outside the corresponding regions of the black matrix 101 (such as the A region shown in FIG. 3). And the distance between the adjacent second convex structures 203 and between the adjacent first convex structures 201 and the second convex structures 203 is less than or equal to the wavelength of visible light. In this way, it is possible to eliminate the reflected light of the area other than the corresponding area of the black matrix, that is, the display area, thereby improving the display effect of the display screen.
例如, 如图 4所示, 第二凸状结构 203可以包括:  For example, as shown in FIG. 4, the second convex structure 203 may include:
涂覆于膜材层 202表面的透明光刻胶层 2011和 /或透明树脂层 2012(见 图 4a ) ; 通过掩膜板进行曝光显影和刻蚀工艺处理获得凸状结构的透明光 刻胶层 2011和 /或透明树脂层 2012部分(见图 4b ) 。  a transparent photoresist layer 2011 and/or a transparent resin layer 2012 (see FIG. 4a) coated on the surface of the film layer 202; a transparent photoresist layer having a convex structure obtained by exposure development and etching processing through a mask 2011 and / or transparent resin layer 2012 part (see Figure 4b).
需要所说明的是, 与第一凸状结构 202类似, 根据加工方法的不同, 例如可以如前面关于第一凸状结构 202的不同材质层的详细描述中的。  It is to be noted that, similar to the first convex structure 202, depending on the processing method, for example, it may be as described above with respect to the different material layers of the first convex structure 202.
例如, 膜材层 202的材料为透明光刻胶 2011或透明树脂 2012。 采用这 样一种透明材料可以允许光线透过, 从而避免影响显示器件的显示功能和 效果。  For example, the material of the film layer 202 is a transparent photoresist 2011 or a transparent resin 2012. The use of such a transparent material allows light to pass through, thereby avoiding affecting the display function and effect of the display device.
本发明实施例提供一种显示装置, 包括上述任意一种显示基板。 该显 示装置具有与本发明前述实施例提供的显示基板相同的有益效果。  Embodiments of the present invention provide a display device including any one of the above display substrates. The display device has the same advantageous effects as the display substrate provided by the foregoing embodiments of the present invention.
例如, 本发明实施例提供的一种显示装置, 该显示装置包括显示基板, 在该显示基板的村底基板上形成包含多个凸状结构的防反射结构, 该凸状 结构的宽度以及相邻的两个凸状结构的间距均小于等于可见光的波长; 且 凸状结构的高度大于等于其宽度。 该防反射结构可以位于显示装置内部或 者位于显示装置的显示侧, 这样一来, 通过该防反射结构, 可以消除显示 器件表面和内部的光反射, 提升显示效果。  For example, a display device provided by an embodiment of the present invention includes a display substrate on which an anti-reflection structure including a plurality of convex structures is formed on a substrate of the display substrate, the width of the convex structure and adjacent The pitch of the two convex structures is less than or equal to the wavelength of visible light; and the height of the convex structure is greater than or equal to the width thereof. The anti-reflection structure may be located inside the display device or on the display side of the display device, so that the anti-reflection structure can eliminate light reflection on the surface and inside of the display device and enhance the display effect.
本发明实施例提供一种显示基板的制造方法, 如图 1 所示, 显示基板 包括村底基板 10以及形成在村底基板 10上的黑矩阵 101 , 该方法包括: The embodiment of the present invention provides a method for manufacturing a display substrate. As shown in FIG. 1, the display substrate includes a substrate substrate 10 and a black matrix 101 formed on the substrate substrate 10. The method includes:
S101、 在村底基板 10上形成防反射结构 20, 该防反射结构 20包括多 个第一凸状结构 201。 S101, an anti-reflection structure 20 is formed on the substrate substrate 10, and the anti-reflection structure 20 includes a plurality of first convex structures 201.
第一凸状结构 201的位置可以与黑矩阵 101的位置相对应。  The position of the first convex structure 201 may correspond to the position of the black matrix 101.
需要说明的是, 第一凸状结构 201 的位置与黑矩阵 101的位置相对应 指第一凸状结构 201的位置与黑矩阵 101的上下位置相对应, 即与黑矩阵 101上下位置相对应的多个第一凸状结构 201的位置均不超过黑矩阵 101的 宽度。 采用这样一种位置结构, 在利用该防反射结构 20消除光反射的同时 不会影响黑矩阵之间的显示区域的面积, 从而使像素开口率不受影响。 It should be noted that the position of the first convex structure 201 corresponds to the position of the black matrix 101, which means that the position of the first convex structure 201 corresponds to the upper and lower positions of the black matrix 101, that is, corresponding to the upper and lower positions of the black matrix 101. The positions of the plurality of first convex structures 201 are not more than the black matrix 101 Width. With such a positional structure, the light reflection can be eliminated by the anti-reflection structure 20 without affecting the area of the display area between the black matrices, so that the pixel aperture ratio is not affected.
本发明实施例提供的一种显示基板的制造方法, 在该显示基板的村底 基板上形成包含多个凸状结构的防反射结构, 该凸状结构的宽度以及相邻 的两个凸状结构的间距均小于等于可见光的波长。 且凸状结构的高度大于 等于其宽度。 该防反射结构可以位于显示装置内部或者位于显示装置的显 示侧, 这样一来, 通过该防反射结构, 可以消除显示器件表面和内部的光 反射, 提升显示效果。  A method for manufacturing a display substrate according to an embodiment of the present invention, an anti-reflection structure including a plurality of convex structures is formed on a substrate of the display substrate, and a width of the convex structure and two adjacent convex structures are formed. The pitch is less than or equal to the wavelength of visible light. And the height of the convex structure is greater than or equal to its width. The anti-reflection structure may be located inside the display device or on the display side of the display device, so that the anti-reflection structure can eliminate light reflection on the surface and inside of the display device and enhance the display effect.
例如, 如图 2所示, 在村底基板 10与黑矩阵 101之间制作该防反射结 构 20。这样一来,该防反射结构 20不仅可以消除透过该村底基板的反射光, 而且可以使得村底基板远离黑矩阵一侧即为一般显示器件的显示侧的表面 无遮挡物, 提升显示屏外表面的光洁度和平整度。  For example, as shown in Fig. 2, the anti-reflection structure 20 is formed between the substrate substrate 10 and the black matrix 101. In this way, the anti-reflection structure 20 can not only eliminate the reflected light transmitted through the substrate of the village, but also can make the substrate of the substrate away from the side of the black matrix, that is, the surface of the display side of the general display device is unobstructed, and the display screen is raised. The smoothness and flatness of the outer surface.
或者, 如图 3所示, 当显示基板为彩膜基板 01 , 在彩膜基板 01的远离 所述黑矩阵的一侧的表面制作防反射结构 20。 这样一来, 该防反射结构 20 可以消除彩膜基板 01的远离所述黑矩阵 101的一侧的光反射, 从而提升显 示器件的显示效果。  Alternatively, as shown in Fig. 3, when the display substrate is the color filter substrate 01, the anti-reflection structure 20 is formed on the surface of the color filter substrate 01 on the side away from the black matrix. In this way, the anti-reflection structure 20 can eliminate the light reflection of the side of the color filter substrate 01 away from the black matrix 101, thereby improving the display effect of the display device.
例如, 如图 4所示, 第一凸状结构 201包括透明光刻胶层 2011和 /或透 明树脂层 2012。  For example, as shown in FIG. 4, the first convex structure 201 includes a transparent photoresist layer 2011 and/or a transparent resin layer 2012.
例如, 防反射结构 20还包括膜材层 202。  For example, the anti-reflective structure 20 also includes a film layer 202.
在第一凸状结构 201和村底基板 10之间形成平铺于村底基板 10上的 该膜材层 202。 需要说明的是, 根据加工方法的不同, 第一凸状结构 201 包括的材质 层也相应有所不同。 现举例说明如下:  The film layer 202 laid on the substrate substrate 10 is formed between the first convex structure 201 and the substrate substrate 10. It should be noted that, depending on the processing method, the material layers included in the first convex structure 201 are also different. The examples are as follows:
例一:  Example 1:
5301、 如图 4中的 a图所示, 在平铺于村底基板 10上的膜材层 202表 面涂覆透明树脂层 2012。  5301. As shown in a in FIG. 4, the film layer 202 laid on the substrate substrate 10 is coated with a transparent resin layer 2012.
5302、在该透明树脂层 2012表面制作透明光刻胶层 2011 , 并通过掩膜 板进行曝光显影形成透明光刻胶图案。  5302, a transparent photoresist layer 2011 is formed on the surface of the transparent resin layer 2012, and a transparent photoresist pattern is formed by exposure and development through a mask.
S303、 通过刻蚀工艺刻蚀掉未覆盖透明光刻胶 2011部分的透明树脂层 S303. Etching the transparent resin layer of the uncovered transparent photoresist portion 2011 by an etching process
2012, 则如图 4中的 b图所示, 第一凸状结构 201包括透明光刻胶层 2011 和透明树脂层 2012。 2012, as shown in FIG. 4b, the first convex structure 201 includes a transparent photoresist layer 2011. And transparent resin layer 2012.
例二:  Example 2:
S401、 对上述结构中的透明光刻胶层 2011进行剥离, 则如图 4中的 c 图所示, 第一凸状结构 201仅包括透明树脂层 2012。  S401, the transparent photoresist layer 2011 in the above structure is peeled off, and as shown in c in FIG. 4, the first convex structure 201 includes only the transparent resin layer 2012.
例三:  Example three:
5501、 如图 5所示, 在平铺于村底基板 10上的膜材层 202表面涂覆透 明光刻胶层 2011。  5501. As shown in FIG. 5, a transparent photoresist layer 2011 is coated on the surface of the film layer 202 laid on the substrate 10 of the village.
5502、 通过掩膜板对透明光刻胶层 2011的表面进行曝光形成光刻胶固 化区域 11和光刻胶非固化区域 12。  5502. Exposing the surface of the transparent photoresist layer 2011 through the mask to form a photoresist curing region 11 and a photoresist non-curing region 12.
S503、通过刻蚀工艺刻蚀掉透明光刻胶层 2011非固化区域 12, 则第一 凸状结构 201仅包括透明光刻胶层 2011。  S503: etching the transparent photoresist layer 2011 by the etching process, the first convex structure 201 includes only the transparent photoresist layer 2011.
这样一来, 本领域技术人员可以根据生产和加工需要对第一凸状结构 201的层级结构进行调整, 从而获得不同结构的防反射结构 20。  In this way, the person skilled in the art can adjust the hierarchical structure of the first convex structure 201 according to the production and processing requirements, thereby obtaining the anti-reflection structure 20 of different structures.
例如, 第一凸状结构 201的宽度以及相邻的两个第一凸状结构 201的 间距均小于等于可见光的波长。  For example, the width of the first convex structure 201 and the pitch of the adjacent two first convex structures 201 are both less than or equal to the wavelength of visible light.
第一凸状结构 201的高度大于等于凸状结构 201的宽度。  The height of the first convex structure 201 is greater than or equal to the width of the convex structure 201.
需要说明的是, 制作上述防反射结构的掩膜板的曝光区域的开口尺寸 以及相邻两个曝光区域的间距均小于等于可见光的波长。 这样一来, 包括 多个第一凸状结构的防反射结构可以使得外界空气和防反射结构表面边界 的折射率的变化被模拟成类似连续的变化, 从而使得可见光可以被大致全 部投射, 消除显示器表面的光反射。  It is to be noted that the opening size of the exposed region of the mask for fabricating the anti-reflection structure and the pitch of the adjacent two exposed regions are both less than or equal to the wavelength of visible light. In this way, the anti-reflection structure including the plurality of first convex structures can be such that the change in the refractive index of the surface boundary of the outside air and the anti-reflection structure is simulated to be a continuous change, so that the visible light can be projected substantially all, eliminating the display. The light reflection of the surface.
例如, 如图 3所示, 在黑矩阵 101对应区域之外 (如图 3中所示的 A 区域)制作多个第二凸状结构 203 , 且相邻的第二凸状结构 203之间、 相邻 的第一凸状结构 201和第二凸状结构 203之间的距离小于等于可见光的波 长。  For example, as shown in FIG. 3, a plurality of second convex structures 203 are formed outside the corresponding regions of the black matrix 101 (such as the A region shown in FIG. 3), and between the adjacent second convex structures 203, The distance between the adjacent first convex structure 201 and the second convex structure 203 is less than or equal to the wavelength of visible light.
防反射结构 20包括多个这样的第二凸状结构 203 , 可以消除黑矩阵对 应区域之外的区域即显示区域的反射光, 从而提升显示画面的显示效果。  The anti-reflection structure 20 includes a plurality of such second convex structures 203, which can eliminate the reflected light of the area other than the corresponding area of the black matrix, that is, the display area, thereby improving the display effect of the display screen.
例如, 如图 4所示, 第二凸状结构 203包括:  For example, as shown in FIG. 4, the second convex structure 203 includes:
涂覆于膜材层 202表面并通过掩膜板进行曝光显影和刻蚀工艺处理形 成的透明光刻胶层 2011和 /或透明树脂层 2012。  The transparent photoresist layer 2011 and/or the transparent resin layer 2012 are applied to the surface of the film layer 202 and subjected to exposure development and etching processes through a mask.
需要说明的是, 与第一凸状结构 202类似, 根据加工方法的不同, 第 如可以如前面关于第一凸状结构 202 的不同材质层的详细描述的例如, 膜 材层 202的材料为透明光刻胶或透明树脂 2012。 采用这样一种透明材料可 以允许光线透过, 从而避免影响显示器件的显示功能和效果。 It should be noted that, similar to the first convex structure 202, according to different processing methods, For example, the material of the film layer 202 may be a transparent photoresist or a transparent resin 2012 as described in detail above with respect to the different material layers of the first convex structure 202. The use of such a transparent material allows light to pass through, thereby avoiding affecting the display function and effect of the display device.
本发明实施例提供的一种显示基板及其制造方法、 显示装置, 在该显 示基板的村底基板上形成包含多个凸状结构的防反射结构, 该凸状结构的 宽度以及相邻的两个凸状结构的间距均小于等于可见光的波长。 该防反射 结构可以位于显示装置内部或者位于显示装置的显示侧, 这样一来, 通过 该防反射结构, 可以消除显示器件表面和内部的光反射, 提升显示效果。  The invention provides a display substrate, a manufacturing method thereof, and a display device. An anti-reflection structure including a plurality of convex structures is formed on a substrate of the display substrate, and the width of the convex structure and two adjacent ones are formed. The pitch of the convex structures is less than or equal to the wavelength of visible light. The anti-reflection structure can be located inside the display device or on the display side of the display device, so that the anti-reflection structure can eliminate light reflection on the surface and inside of the display device and enhance the display effect.
以上所述, 仅为本发明的具体实施方式, 但本发明的保护范围并不局 轻易想到许多其它实施例、 变化或替换, 这些实施例、 变化或替换都应涵 盖在本发明的保护范围之内。  The above description is only the specific embodiment of the present invention, but the scope of the present invention is not to be construed as being limited to many other embodiments, variations or substitutions, and the embodiments, variations or alternatives are intended to be covered by the scope of the present invention. Inside.

Claims

权利要求书 claims
1、 一种显示基板, 包括: 1. A display substrate, including:
村底基板; Village base plate;
形成在所述村底基板上的黑矩阵; 以及 a black matrix formed on the base substrate; and
形成于所述村底基板上的防反射结构,所述防反射结构包括多个第一 凸状结构; An anti-reflective structure formed on the base substrate, the anti-reflective structure including a plurality of first convex structures;
其中, 所述第一凸状结构的位置与所述黑矩阵的位置相对应。 Wherein, the position of the first convex structure corresponds to the position of the black matrix.
2、 根据权利要求 1所述的显示基板, 其中, 2. The display substrate according to claim 1, wherein,
所述防反射结构位于所述村底基板和所述黑矩阵之间。 The anti-reflection structure is located between the bottom substrate and the black matrix.
3、 根据权利要求 1或 2所述的显示基板, 其中, 3. The display substrate according to claim 1 or 2, wherein,
所述显示基板为彩膜基板,所述防反射结构位于所述彩膜基板的远离 所述黑矩阵的一侧的表面。 The display substrate is a color filter substrate, and the anti-reflection structure is located on a surface of the color filter substrate on a side away from the black matrix.
4、 根据权利要求 1-3任一项所述的显示基板, 其中, 所述第一凸状 结构包括透明光刻胶层和 /或透明树脂层。 4. The display substrate according to any one of claims 1 to 3, wherein the first convex structure includes a transparent photoresist layer and/or a transparent resin layer.
5、 根据权利要求 1-4任一项所述的显示基板, 其中, 所述防反射结 构还包括所述第一凸状结构底部的膜材层,所述膜材层平铺在所述村底基 板上, 且位于所述第一凸状结构和所述村底基板之间。 5. The display substrate according to any one of claims 1 to 4, wherein the anti-reflective structure further includes a film material layer at the bottom of the first convex structure, and the film material layer is laid flat on the village. on the bottom substrate and between the first convex structure and the bottom substrate.
6、 根据权利要求 1-5任一项所述的显示基板, 其中, 所述第一凸状 结构的宽度以及相邻的两个所述第一凸状结构的间距均小于等于可见光 的波长。 6. The display substrate according to any one of claims 1 to 5, wherein the width of the first convex structure and the spacing between two adjacent first convex structures are both less than or equal to the wavelength of visible light.
7、 根据权利要求 1-6任一项所述的显示基板, 其中, 所述第一凸状 结构的高度大于等于所述第一凸状结构的宽度。 7. The display substrate according to any one of claims 1 to 6, wherein the height of the first convex structure is greater than or equal to the width of the first convex structure.
8、 根据权利要求 1-7任一项所述的显示基板, 其中, 所述防反射结 构还包括多个第二凸状结构,所述第二凸状结构位于所述黑矩阵对应区域 之外;且相邻的所述第二凸状结构之间、相邻的所述第一凸状结构与所述 第二凸状结构之间的距离均小于等于可见光的波长。 8. The display substrate according to any one of claims 1 to 7, wherein the anti-reflection structure further includes a plurality of second convex structures, the second convex structures are located outside the black matrix corresponding area. ; And the distances between the adjacent second convex structures and between the adjacent first convex structures and the second convex structures are less than or equal to the wavelength of visible light.
9、根据权利要求 8所述的显示基板, 其中, 所述第二凸状结构包括: 涂覆于膜材层表面并通过掩膜板进行曝光显影和刻蚀工艺处理形成 的透明光刻胶层和 /或透明树脂层。 9. The display substrate according to claim 8, wherein the second convex structure includes: a transparent photoresist layer coated on the surface of the film material layer and formed by exposure, development and etching processes through a mask. and/or transparent resin layer.
10、根据权利要求 9所述的显示基板, 其中, 所述膜材层的材料为透 明光刻胶或透明树脂。 10. The display substrate according to claim 9, wherein the material of the film layer is transparent photoresist or transparent resin.
11、 一种显示装置, 包括如权利要求 1-10任一项所述的显示基板。 11. A display device, comprising the display substrate according to any one of claims 1-10.
12、一种显示基板的制造方法,所述显示基板包括村底基板以及形成 在所述村底基板上的黑矩阵, 所述方法包括: 12. A method of manufacturing a display substrate, the display substrate comprising a bottom substrate and a black matrix formed on the bottom substrate, the method comprising:
在所述村底基板上形成防反射结构,包括在与所述黑矩阵的位置相对 应的位置形成多个第一凸状结构。 Forming an anti-reflective structure on the base substrate includes forming a plurality of first convex structures at positions corresponding to the positions of the black matrix.
13、 根据权利要求 12所述的制造方法, 其中在所述村底基板与所述 黑矩阵之间形成所述防反射结构。 13. The manufacturing method according to claim 12, wherein the anti-reflection structure is formed between the base substrate and the black matrix.
14、 根据权利要求 12所述的制造方法, 其中所述显示基板为彩膜基 板, 在所述彩膜基板的远离所述黑矩阵的一侧的表面形成所述防反射结 构。 14. The manufacturing method according to claim 12, wherein the display substrate is a color filter substrate, and the anti-reflective structure is formed on the surface of the color filter substrate on a side away from the black matrix.
15、 根据权利要求 12所述的制造方法, 其中形成所述第一凸状结构 包括形成透明光刻胶层和 /或透明树脂层。 15. The manufacturing method according to claim 12, wherein forming the first convex structure includes forming a transparent photoresist layer and/or a transparent resin layer.
16、 根据权利要求 12所述的制造方法, 还包括, 16. The manufacturing method according to claim 12, further comprising:
在所述第一凸状结构和所述村底基板之间形成平铺于所述村底基板 上的膜材层。 A film material layer laid flat on the bottom substrate is formed between the first convex structure and the bottom substrate.
17、 根据权利要求 12-16任一项所述的制造方法, 其中, 所述第一凸 状结构的宽度以及相邻的两个所述第一凸状结构的间距均小于等于可见 光的波长; 以及 17. The manufacturing method according to any one of claims 12 to 16, wherein the width of the first convex structure and the distance between two adjacent first convex structures are both less than or equal to the wavelength of visible light; as well as
所述第一凸状结构的高度大于等于所述凸状结构的宽度。 The height of the first convex structure is greater than or equal to the width of the convex structure.
18、 根据权利要求 12-16任一项所述的制造方法, 其中, 18. The manufacturing method according to any one of claims 12-16, wherein,
在所述黑矩阵对应区域之外形成多个第二凸状结构,且相邻的所述第 二凸状结构之间、相邻的所述第一凸状结构与所述第二凸状结构之间的距 离均小于等于可见光的波长。 A plurality of second convex structures are formed outside the black matrix corresponding area, and between the adjacent second convex structures, the adjacent first convex structures and the second convex structures The distance between them is less than or equal to the wavelength of visible light.
19、 根据权利要求 18所述的制造方法, 其中, 所述第二凸状结构包 括: 19. The manufacturing method according to claim 18, wherein the second convex structure includes:
涂覆于膜材层表面并通过掩膜板进行曝光显影和刻蚀工艺处理形成 的透明光刻胶层和 /或透明树脂层。 A transparent photoresist layer and/or a transparent resin layer that is coated on the surface of the film material layer and subjected to exposure, development and etching processes through a mask.
20、 根据权利要求 19所述的制造方法, 其中, 所述膜材层的材料为透 明光刻胶或透明树脂。 20. The manufacturing method according to claim 19, wherein the material of the film layer is transparent photoresist or transparent resin.
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