WO2015014073A1

WO2015014073A1 - Display substrate and manufacturing method therefor, and display device

Info

Publication number: WO2015014073A1
Application number: PCT/CN2013/089455
Authority: WO
Inventors: 郭磊; 涂志中; 申莹; 尹傛俊
Original assignee: 合肥京东方光电科技有限公司; 京东方科技集团股份有限公司
Priority date: 2013-07-30
Filing date: 2013-12-14
Publication date: 2015-02-05
Also published as: CN103399367B; CN103399367A

Abstract

A display substrate and a manufacturing method therefor, and a display device. An anti-reflection structure (20) containing a plurality of convex structures (201, 203) is formed on an underlayment substrate (10) of the display substrate. Both the width of the convex structures (201, 203) and the distance between two adjacent convex structures (201, 203) are less than or equal to the wavelength of visible light.

Description

Display substrate, manufacturing method thereof, and display device

Embodiments of the present invention relate to a display substrate, a method of manufacturing the same, and a display device. Background technique

For various display devices in the conventional technology, the external light source is easily reflected on the surface of the display screen to seriously affect the display effect. Therefore, how to eliminate the influence of the external light source on the display effect is very important. At present, as an anti-reflection method, there are mainly low reflection (LR, Low Reflection) processing and anti-glare (AG, Anti Glare) processing; wherein LR processing is to cover a surface of the display with a refractive index different from that of the surface material constituting the display screen. By the reflection occurring at the interface of the display film and the reflection of the LR film and the surface of the display, the respective amplitude reflectance and phase are different from the ideal conditions, and therefore, the reflected light is not completely canceled, and the reflection effect is not ideal; The AG process forms a fine concavo-convex pattern on the surface of the display, and uses the scattering effect of light to prevent external light from being reflected. However, the imaging of the external light source is blurred, which affects the display effect.

Compared with the AG process, the Moth-eye structure can achieve anti-reflection effects without using light interference. The moth-eye structure is arranged on the surface of the display screen, and is arranged with a finer pitch of the wavelength of the light (for example, 380 nm) or less than the gap of the AG light scattering structure, so that the boundary refractive index between the outside air and the film surface is made. The change is relatively continuous. In this way, the external light source can be substantially completely transmitted, so that the light reflection on the surface of the display screen can be almost eliminated. Because the size of the moth-eye structure is too small (nano-scale), and the precision is high, the pitch of the convex portions is small, and it is not allowed to adhere to each other (otherwise, it will cause scattering of light), so it is difficult to make the moth-eye structure. At present, a mold pressing method is generally used to prepare such a structure, that is, a mold structure opposite to the moth-eye structure is first prepared, and then the desired moth-eye structure is obtained by physically pressing the mold onto the film-forming material. The preparation process has strict requirements on materials and process parameters, and the process stability is not good. It is difficult to control the size and spacing of the moth-eye structure, and it is also easy to cause the mutual adhesion of the moth-eye structure convex portions, which seriously affects the anti-reflection effect. Summary of the invention Embodiments of the present invention provide a display substrate, a method of manufacturing the same, and a display device, which can eliminate light reflection on the surface and inside of the display device and improve display effects.

According to an aspect of the invention, a display substrate is provided, comprising:

Village substrate;

a black matrix formed on the substrate of the village; and

An anti-reflection structure formed on the substrate of the village, the anti-reflection structure comprising a plurality of first convex structures;

The position of the first convex structure corresponds to the position of the black matrix.

According to another aspect of the present invention, there is provided a display device comprising the display substrate as described above.

According to still another aspect of the present invention, a method of manufacturing a display substrate including a substrate substrate and a black matrix formed on the substrate substrate, the method comprising: on the substrate substrate Forming the anti-reflection structure includes forming a plurality of first convex structures at positions corresponding to positions of the black matrix. DRAWINGS

The embodiments of the present invention will be described in more detail below with reference to the accompanying drawings, in which FIG.

1 is a schematic structural diagram of a display substrate according to an embodiment of the present invention;

2 is a schematic structural diagram of another display substrate according to an embodiment of the present invention;

3 is a schematic structural diagram of still another display substrate according to an embodiment of the present invention;

FIG. 4 is a schematic diagram of a manufacturing process of an anti-reflection structure according to an embodiment of the present invention; FIG. 5 is a schematic diagram of a manufacturing process of another anti-reflection structure according to an embodiment of the present invention. detailed description

The technical solutions in the embodiments of the present invention are clearly and completely described in the following with reference to the accompanying drawings in the embodiments of the present invention. It is obvious that the described embodiments are only a part of exemplary embodiments of the present invention, but not all embodiments. . Based on these exemplary embodiments, all other embodiments obtained by those skilled in the art without the need for inventive work are within the scope of the present invention.

Unless otherwise defined, the technical terms or scientific terms used herein shall be the subject of the invention. The usual meaning understood by people with general skills in the domain. The words "first", "second" and similar terms used in the specification and claims of the present invention are not intended to indicate any order, quantity, or importance, but only to distinguish different components. Similarly, the words "a", "an", "the", and the like do not denote a quantity limitation, but rather mean that there is at least one. The word "comprising" or "comprises" or the like means that the element or item that precedes the word is intended to encompass the element or the item recited after the word and its equivalent, and does not exclude other element or item. "Up", "Bottom", etc. are only used to indicate the relative positional relationship, and when the absolute position of the object to be described is changed, the relative positional relationship may also change accordingly.

The embodiment of the invention provides a display substrate, as shown in FIG. 1, comprising a substrate substrate 10 and a black matrix 101 formed on the substrate substrate 10. The display substrate further includes: an anti-reflection structure 20 formed on the substrate substrate 10, and the anti-reflection structure may include a plurality of first convex structures 201.

The position of the first convex structure 201 may correspond to the position of the black matrix 101. For example, the anti-reflection structure may be located on either side of the substrate substrate 10 at a position corresponding to the position of the black matrix.

It should be noted that the position of the first convex structure 201 corresponds to the position of the black matrix 101, which means that the position of the first convex structure 201 corresponds to the upper and lower positions of the black matrix 101, that is, corresponding to the upper and lower positions of the black matrix 101. The positions of the plurality of first convex structures 201 do not exceed the width of the black matrix 101. With such a positional structure, the light reflection can be eliminated by the anti-reflection structure 20 without affecting the area of the display area between the black matrices, so that the pixel aperture ratio is not affected.

A display substrate is provided on the substrate substrate of the display substrate, and an anti-reflection structure including a plurality of convex structures is formed on a width of the convex structure and a pitch of two adjacent convex structures. Less than or equal to the wavelength of visible light. The height of the convex structure is greater than or equal to its width. The anti-reflection structure may be located inside the display device or on the display side of the display device, so that the anti-reflection structure can eliminate light reflection on the surface and inside of the display device, thereby improving the display effect.

For example, as shown in Fig. 2, the anti-reflection structure 20 is located between the substrate substrate 10 and the black matrix 101. In this way, the anti-reflection structure 20 can not only eliminate the reflected light transmitted through the substrate of the village, but also can make the substrate of the substrate away from the side of the black matrix, that is, the surface of the display side of the general display device is unobstructed, and the display screen is raised. The smoothness and flatness of the outer surface.

Alternatively, for example, as shown in FIG. 3, the display substrate is a color filter substrate 01, and the anti-reflection structure 20 is located on a surface of the color filter substrate 01 on a side away from the black matrix 101. In this way, the anti-reflection structure 20 can eliminate the light reflection of the side of the color filter substrate 01 away from the black matrix 101. Thereby improving the display effect of the display device.

For example, as shown in FIG. 4, the first convex structure 201 includes a transparent photoresist layer 2011 and/or a transparent resin layer 2012.

The anti-reflection structure 20 may further include a film layer 202 at the bottom of the first convex structure 201. The film layer 202 is laid on the substrate substrate 10 and located between the first convex structure 201 and the substrate substrate 10. The material of the film layer is, for example, a transparent photoresist or a transparent resin, and can be formed on a substrate by a conventional process such as spin coating.

It should be noted that the material layers included in the first convex structure 201 are also different depending on the processing method. For example, as shown in a of FIG. 4, the surface of the film layer 202 laid on the substrate substrate 10 is coated with a transparent resin layer 2012, and then a transparent photoresist layer 2011 is formed on the surface of the transparent resin layer 2012. Forming a transparent photoresist pattern by exposure and development through a mask, and then etching away the transparent resin layer 2012 not covering the transparent photoresist portion 2011 by an etching process, as shown in FIG. 4, the first convex The structure 201 includes a transparent photoresist layer 2011 and a transparent resin layer 2012.

Further, for example, the transparent photoresist layer 2011 in the above structure is peeled off, and as shown in Fig. 4, the first convex structure 201 includes only the transparent resin layer 2012.

For example, as shown in FIG. 5, a transparent photoresist layer 2011 is coated on the surface of the film layer 202 laid on the substrate 10, and then the surface of the transparent photoresist layer 2011 is exposed through a mask. The photoresist curing region 11 and the photoresist non-curing region 12 are then etched away from the transparent photoresist layer 2011 uncured region 12 by an etching process, and the first convex structure 201 includes only a transparent photoresist layer.

2011.

In this way, those skilled in the art can adjust the hierarchical structure of the first convex structure 201 according to the production and processing requirements, thereby making the processing method of the anti-reflection structure 20 more diverse.

For example, the width of the first convex structure 201 and the pitch of the adjacent two first convex structures 201 are both less than or equal to the wavelength of visible light.

For example, the height of the first convex structure 201 is greater than or equal to the width of the first convex structure 201. It should be noted that the opening size of the exposed region of the mask for fabricating the anti-reflection structure and the pitch of the adjacent two exposed regions are both less than or equal to the wavelength of visible light. In this way, the anti-reflection structure including the plurality of first convex structures can simulate the change of the refractive index of the surface boundary of the outside air and the anti-reflection structure to be approximately continuous change, so that the visible light can be substantially totally projected, so the defense The reflective structure eliminates light reflection from its surface. For example, as shown in FIG. 3, the anti-reflection structure 20 may further include a plurality of second convex structures 203 located outside the corresponding regions of the black matrix 101 (such as the A region shown in FIG. 3). And the distance between the adjacent second convex structures 203 and between the adjacent first convex structures 201 and the second convex structures 203 is less than or equal to the wavelength of visible light. In this way, it is possible to eliminate the reflected light of the area other than the corresponding area of the black matrix, that is, the display area, thereby improving the display effect of the display screen.

For example, as shown in FIG. 4, the second convex structure 203 may include:

a transparent photoresist layer 2011 and/or a transparent resin layer 2012 (see FIG. 4a) coated on the surface of the film layer 202; a transparent photoresist layer having a convex structure obtained by exposure development and etching processing through a mask 2011 and / or transparent resin layer 2012 part (see Figure 4b).

It is to be noted that, similar to the first convex structure 202, depending on the processing method, for example, it may be as described above with respect to the different material layers of the first convex structure 202.

For example, the material of the film layer 202 is a transparent photoresist 2011 or a transparent resin 2012. The use of such a transparent material allows light to pass through, thereby avoiding affecting the display function and effect of the display device.

Embodiments of the present invention provide a display device including any one of the above display substrates. The display device has the same advantageous effects as the display substrate provided by the foregoing embodiments of the present invention.

For example, a display device provided by an embodiment of the present invention includes a display substrate on which an anti-reflection structure including a plurality of convex structures is formed on a substrate of the display substrate, the width of the convex structure and adjacent The pitch of the two convex structures is less than or equal to the wavelength of visible light; and the height of the convex structure is greater than or equal to the width thereof. The anti-reflection structure may be located inside the display device or on the display side of the display device, so that the anti-reflection structure can eliminate light reflection on the surface and inside of the display device and enhance the display effect.

The embodiment of the present invention provides a method for manufacturing a display substrate. As shown in FIG. 1, the display substrate includes a substrate substrate 10 and a black matrix 101 formed on the substrate substrate 10. The method includes:

S101, an anti-reflection structure 20 is formed on the substrate substrate 10, and the anti-reflection structure 20 includes a plurality of first convex structures 201.

The position of the first convex structure 201 may correspond to the position of the black matrix 101.

It should be noted that the position of the first convex structure 201 corresponds to the position of the black matrix 101, which means that the position of the first convex structure 201 corresponds to the upper and lower positions of the black matrix 101, that is, corresponding to the upper and lower positions of the black matrix 101. The positions of the plurality of first convex structures 201 are not more than the black matrix 101 Width. With such a positional structure, the light reflection can be eliminated by the anti-reflection structure 20 without affecting the area of the display area between the black matrices, so that the pixel aperture ratio is not affected.

A method for manufacturing a display substrate according to an embodiment of the present invention, an anti-reflection structure including a plurality of convex structures is formed on a substrate of the display substrate, and a width of the convex structure and two adjacent convex structures are formed. The pitch is less than or equal to the wavelength of visible light. And the height of the convex structure is greater than or equal to its width. The anti-reflection structure may be located inside the display device or on the display side of the display device, so that the anti-reflection structure can eliminate light reflection on the surface and inside of the display device and enhance the display effect.

For example, as shown in Fig. 2, the anti-reflection structure 20 is formed between the substrate substrate 10 and the black matrix 101. In this way, the anti-reflection structure 20 can not only eliminate the reflected light transmitted through the substrate of the village, but also can make the substrate of the substrate away from the side of the black matrix, that is, the surface of the display side of the general display device is unobstructed, and the display screen is raised. The smoothness and flatness of the outer surface.

Alternatively, as shown in Fig. 3, when the display substrate is the color filter substrate 01, the anti-reflection structure 20 is formed on the surface of the color filter substrate 01 on the side away from the black matrix. In this way, the anti-reflection structure 20 can eliminate the light reflection of the side of the color filter substrate 01 away from the black matrix 101, thereby improving the display effect of the display device.

For example, the anti-reflective structure 20 also includes a film layer 202.

The film layer 202 laid on the substrate substrate 10 is formed between the first convex structure 201 and the substrate substrate 10. It should be noted that, depending on the processing method, the material layers included in the first convex structure 201 are also different. The examples are as follows:

Example 1:

5301. As shown in a in FIG. 4, the film layer 202 laid on the substrate substrate 10 is coated with a transparent resin layer 2012.

5302, a transparent photoresist layer 2011 is formed on the surface of the transparent resin layer 2012, and a transparent photoresist pattern is formed by exposure and development through a mask.

S303. Etching the transparent resin layer of the uncovered transparent photoresist portion 2011 by an etching process

2012, as shown in FIG. 4b, the first convex structure 201 includes a transparent photoresist layer 2011. And transparent resin layer 2012.

Example 2:

S401, the transparent photoresist layer 2011 in the above structure is peeled off, and as shown in c in FIG. 4, the first convex structure 201 includes only the transparent resin layer 2012.

Example three:

5501. As shown in FIG. 5, a transparent photoresist layer 2011 is coated on the surface of the film layer 202 laid on the substrate 10 of the village.

5502. Exposing the surface of the transparent photoresist layer 2011 through the mask to form a photoresist curing region 11 and a photoresist non-curing region 12.

S503: etching the transparent photoresist layer 2011 by the etching process, the first convex structure 201 includes only the transparent photoresist layer 2011.

In this way, the person skilled in the art can adjust the hierarchical structure of the first convex structure 201 according to the production and processing requirements, thereby obtaining the anti-reflection structure 20 of different structures.

The height of the first convex structure 201 is greater than or equal to the width of the convex structure 201.

It is to be noted that the opening size of the exposed region of the mask for fabricating the anti-reflection structure and the pitch of the adjacent two exposed regions are both less than or equal to the wavelength of visible light. In this way, the anti-reflection structure including the plurality of first convex structures can be such that the change in the refractive index of the surface boundary of the outside air and the anti-reflection structure is simulated to be a continuous change, so that the visible light can be projected substantially all, eliminating the display. The light reflection of the surface.

For example, as shown in FIG. 3, a plurality of second convex structures 203 are formed outside the corresponding regions of the black matrix 101 (such as the A region shown in FIG. 3), and between the adjacent second convex structures 203, The distance between the adjacent first convex structure 201 and the second convex structure 203 is less than or equal to the wavelength of visible light.

The anti-reflection structure 20 includes a plurality of such second convex structures 203, which can eliminate the reflected light of the area other than the corresponding area of the black matrix, that is, the display area, thereby improving the display effect of the display screen.

For example, as shown in FIG. 4, the second convex structure 203 includes:

The transparent photoresist layer 2011 and/or the transparent resin layer 2012 are applied to the surface of the film layer 202 and subjected to exposure development and etching processes through a mask.

It should be noted that, similar to the first convex structure 202, according to different processing methods, For example, the material of the film layer 202 may be a transparent photoresist or a transparent resin 2012 as described in detail above with respect to the different material layers of the first convex structure 202. The use of such a transparent material allows light to pass through, thereby avoiding affecting the display function and effect of the display device.

The invention provides a display substrate, a manufacturing method thereof, and a display device. An anti-reflection structure including a plurality of convex structures is formed on a substrate of the display substrate, and the width of the convex structure and two adjacent ones are formed. The pitch of the convex structures is less than or equal to the wavelength of visible light. The anti-reflection structure can be located inside the display device or on the display side of the display device, so that the anti-reflection structure can eliminate light reflection on the surface and inside of the display device and enhance the display effect.

The above description is only the specific embodiment of the present invention, but the scope of the present invention is not to be construed as being limited to many other embodiments, variations or substitutions, and the embodiments, variations or alternatives are intended to be covered by the scope of the present invention. Inside.

Claims

claims

1. A display substrate, including:

Village base plate;

a black matrix formed on the base substrate; and

An anti-reflective structure formed on the base substrate, the anti-reflective structure including a plurality of first convex structures;

Wherein, the position of the first convex structure corresponds to the position of the black matrix.

2. The display substrate according to claim 1, wherein,

The anti-reflection structure is located between the bottom substrate and the black matrix.

3. The display substrate according to claim 1 or 2, wherein,

The display substrate is a color filter substrate, and the anti-reflection structure is located on a surface of the color filter substrate on a side away from the black matrix.

4. The display substrate according to any one of claims 1 to 3, wherein the first convex structure includes a transparent photoresist layer and/or a transparent resin layer.

5. The display substrate according to any one of claims 1 to 4, wherein the anti-reflective structure further includes a film material layer at the bottom of the first convex structure, and the film material layer is laid flat on the village. on the bottom substrate and between the first convex structure and the bottom substrate.

6. The display substrate according to any one of claims 1 to 5, wherein the width of the first convex structure and the spacing between two adjacent first convex structures are both less than or equal to the wavelength of visible light.

7. The display substrate according to any one of claims 1 to 6, wherein the height of the first convex structure is greater than or equal to the width of the first convex structure.

8. The display substrate according to any one of claims 1 to 7, wherein the anti-reflection structure further includes a plurality of second convex structures, the second convex structures are located outside the black matrix corresponding area. ; And the distances between the adjacent second convex structures and between the adjacent first convex structures and the second convex structures are less than or equal to the wavelength of visible light.

9. The display substrate according to claim 8, wherein the second convex structure includes: a transparent photoresist layer coated on the surface of the film material layer and formed by exposure, development and etching processes through a mask. and/or transparent resin layer.

10. The display substrate according to claim 9, wherein the material of the film layer is transparent photoresist or transparent resin.

11. A display device, comprising the display substrate according to any one of claims 1-10.

12. A method of manufacturing a display substrate, the display substrate comprising a bottom substrate and a black matrix formed on the bottom substrate, the method comprising:

Forming an anti-reflective structure on the base substrate includes forming a plurality of first convex structures at positions corresponding to the positions of the black matrix.

13. The manufacturing method according to claim 12, wherein the anti-reflection structure is formed between the base substrate and the black matrix.

14. The manufacturing method according to claim 12, wherein the display substrate is a color filter substrate, and the anti-reflective structure is formed on the surface of the color filter substrate on a side away from the black matrix.

15. The manufacturing method according to claim 12, wherein forming the first convex structure includes forming a transparent photoresist layer and/or a transparent resin layer.

16. The manufacturing method according to claim 12, further comprising:

A film material layer laid flat on the bottom substrate is formed between the first convex structure and the bottom substrate.

17. The manufacturing method according to any one of claims 12 to 16, wherein the width of the first convex structure and the distance between two adjacent first convex structures are both less than or equal to the wavelength of visible light; as well as

The height of the first convex structure is greater than or equal to the width of the convex structure.

18. The manufacturing method according to any one of claims 12-16, wherein,

A plurality of second convex structures are formed outside the black matrix corresponding area, and between the adjacent second convex structures, the adjacent first convex structures and the second convex structures The distance between them is less than or equal to the wavelength of visible light.

19. The manufacturing method according to claim 18, wherein the second convex structure includes:

A transparent photoresist layer and/or a transparent resin layer that is coated on the surface of the film material layer and subjected to exposure, development and etching processes through a mask.

20. The manufacturing method according to claim 19, wherein the material of the film layer is transparent photoresist or transparent resin.