CN103399367B - A kind of display base plate and manufacture method, display device - Google Patents
A kind of display base plate and manufacture method, display device Download PDFInfo
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- CN103399367B CN103399367B CN201310324992.9A CN201310324992A CN103399367B CN 103399367 B CN103399367 B CN 103399367B CN 201310324992 A CN201310324992 A CN 201310324992A CN 103399367 B CN103399367 B CN 103399367B
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- 238000000034 method Methods 0.000 title claims abstract description 33
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 53
- 239000011159 matrix material Substances 0.000 claims description 42
- 239000000463 material Substances 0.000 claims description 31
- 239000011347 resin Substances 0.000 claims description 22
- 229920005989 resin Polymers 0.000 claims description 22
- 239000012528 membrane Substances 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 8
- 239000003292 glue Substances 0.000 claims description 8
- 238000003384 imaging method Methods 0.000 claims description 7
- 230000000694 effects Effects 0.000 abstract description 22
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000007596 consolidation process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133502—Antiglare, refractive index matching layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Abstract
The invention provides a kind of display base plate and manufacture method, display device, relate to display technique field, display device surface and the reflection of inner light can be eliminated, promote display effect.The underlay substrate of this display base plate is formed the anti-reflection structure comprising multiple convex architecture, and the spacing of the width of this convex architecture and adjacent two convex architecture is all less than or equal to the wavelength of visible ray; And the height of convex architecture is more than or equal to its width.
Description
Technical field
The present invention relates to display technique field, particularly relate to a kind of display base plate and manufacture method, display device.
Background technology
For various display device of the prior art, very easily there is reflection on the surface of display screen thus have a strong impact on display effect in external light source, and that how to eliminate that the impact of external light source on display effect seem very is important.Method at present as antireflection mainly contains LR(LowReflection, low reflection) process and AG(AntiGlare, against sunshine) process; Wherein LR process covers the material different from the refractive index forming display screen surfacing on the surface of display, by reducing reflection in the interference effect of display surface incident light and reflected light, but, the reflection that the reflection that usual air and LR membrane interface occur and LR film and display surface occur, respective amplitude reflectivity, phase place are different from desirable condition, therefore, these reflected light can not be offset completely, and reflecting effect is unsatisfactory; And AG process forms trickle relief pattern, the dispersion effect used up is mirrored to prevent outer light, but the imaging of external light source so can be made to thicken, and affects display effect.
Comparing AG process, adopting moth eye (Moth-eye) structure can by not using the mode of the interference of light to reach anti-reflection effect.Moth ocular structure is the surface at display screen, by wavelength that is trickleer than AG light scattering structure, that be spaced apart light (such as, 380nm) length or following relief pattern arrange with gap, thus make outside air relative continuous with the change of film surface-boundary refractive index.So, external light source roughly can all transmissions, therefore almost can eliminate the light reflection on display screen surface.Moth ocular structure is due to its size too small (nanometer scale), and simultaneously high to accuracy requirement, bossing spacing is very little, again can not adhesion mutually, otherwise can cause the scattering of light, so the difficulty making moth ocular structure is very large.Generally adopt mould pressing to be prepared at present, namely prepare the mould structure contrary with moth ocular structure, and then by being compressed on filmogen by mould physics, obtain the moth ocular structure wanted.This preparation technology is strict to materials and process parameter request, and technology stability is bad, is difficult to the size and the spacing that control moth ocular structure, also easily causes the inter-adhesive of moth ocular structure bossing, have a strong impact on anti-reflection effect.
Summary of the invention
Embodiments of the invention provide a kind of display base plate and manufacture method, display device, can eliminate display device surface and the reflection of inner light, promote display effect.
For achieving the above object, embodiments of the invention adopt following technical scheme:
The embodiment of the present invention provides a kind of display base plate, comprise underlay substrate and be formed in the black matrix on described underlay substrate, described display base plate also comprises: be formed at the anti-reflection structure on described underlay substrate, and described anti-reflection structure comprises multiple first convex architecture;
Wherein, the position of described first convex architecture is corresponding with the position of described black matrix.
Another aspect of the present invention provides, and provides a kind of display device, comprises display base plate as above.
The another aspect of embodiments of the invention, provides a kind of manufacture method of display base plate, and described display base plate comprises underlay substrate and is formed in the black matrix on described underlay substrate, and described method comprises:
Described underlay substrate forms anti-reflection structure, and described anti-reflection structure comprises multiple first convex architecture;
Wherein, the position of described first convex architecture is corresponding with the position of described black matrix.
A kind of display base plate that the embodiment of the present invention provides and manufacture method, display device, the underlay substrate of this display base plate is formed the anti-reflection structure comprising multiple convex architecture, and the spacing of the width of this convex architecture and adjacent two convex architecture is all less than or equal to the wavelength of visible ray; And the height of convex architecture is more than or equal to its width.This anti-reflection structure can be positioned at display device inside or be positioned at the display side of display device, so, by this anti-reflection structure, can eliminate display device surface and the reflection of inner light, promote display effect.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
The structural representation of a kind of display base plate that Fig. 1 provides for the embodiment of the present invention;
The structural representation of the another kind of display base plate that Fig. 2 provides for the embodiment of the present invention;
The structural representation of another display base plate that Fig. 3 provides for the embodiment of the present invention;
The manufacturing process schematic diagram of a kind of anti-reflection structure that Fig. 4 provides for the embodiment of the present invention;
The manufacturing process schematic diagram of the another kind of anti-reflection structure that Fig. 5 provides for the embodiment of the present invention.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, be clearly and completely described the technical scheme in the embodiment of the present invention, obviously, described embodiment is only the present invention's part embodiment, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making the every other embodiment obtained under creative work prerequisite, belong to the scope of protection of the invention.
The embodiment of the present invention provides a kind of display base plate, as shown in Figure 1, comprise underlay substrate 10 and be formed in the black matrix 101 on underlay substrate 10, this display base plate also comprises: be formed at the anti-reflection structure 20 on underlay substrate 10, and this anti-reflection structure can comprise multiple first convex architecture 201.
Wherein, the position of the first convex architecture 201 is corresponding with the position of black matrix 101.
It should be noted that, the position of the first convex architecture 201 is corresponding with the position of black matrix 101 specifically refers to that the upper-lower position of the position of the first convex architecture 201 and black matrix 101 is corresponding, and the position of namely corresponding with black matrix 101 upper-lower position multiple first convex architecture 201 is all no more than the width of black matrix 101.Adopt so a kind of positional structure, can utilize this anti-reflection structure 20 eliminate light reflection while make the function of viewing area between black matrix and display effect unaffected.
A kind of display base plate that the embodiment of the present invention provides, the underlay substrate of this display base plate is formed the anti-reflection structure comprising multiple convex architecture, and the spacing of the width of this convex architecture and adjacent two convex architecture is all less than or equal to the wavelength of visible ray; And the height of convex architecture is more than or equal to its width.This anti-reflection structure can be positioned at display device inside or be positioned at the display side of display device, so, by this anti-reflection structure, can eliminate display device surface and the reflection of inner light, promote display effect.
Further, as shown in Figure 2, anti-reflection structure 20 is between underlay substrate 10 and black matrix 101.So, this anti-reflection structure 20 not only can eliminate the reflected light through this underlay substrate, and underlay substrate can be made away from black matrix side to be the surperficial have no occluder of the display side of general display device, promote smooth finish and the flatness of display screen outside surface.
Or as shown in Figure 3, display base plate is color membrane substrates 01, described anti-reflection structure 20 is positioned at the surface of the side away from described black matrix 101 of color membrane substrates 01.So, this anti-reflection structure 20 can eliminate the light reflection of the side away from described black matrix 101 of color membrane substrates 01, thus promotes the display effect of display device.
Further, as shown in Figure 4, the first convex architecture 201 comprises transparent photomask glue-line 2011 and/or transparent resin layer 2012.
Further, anti-reflection structure 20 also comprises the film sheet material layers 202 bottom the first convex architecture 201, and this film sheet material layers 202 is laid on underlay substrate 10, and between the first convex architecture 201 and underlay substrate 10.
It should be noted that, according to the difference of job operation, the material layer that the first convex architecture 201 comprises is also corresponding different.Concrete, such as, as shown in a figure in Fig. 4, be laid in the surface of the film sheet material layers on underlay substrate 10 coating transparent resin layer 2012, then transparent photomask glue-line 2011 is made on this transparent resin layer 2012 surface, carry out exposure imaging by mask plate and form transparent photomask glue pattern, then the transparent resin layer 2012 not covering transparent photomask glue 2011 part is etched away by etching technics, then as shown in the b figure in Fig. 4, the first convex architecture 201 comprises transparent photomask glue-line 2011 and transparent resin layer 2012.
Again such as, peel off the transparent photomask glue-line 2011 in said structure, then, as shown in the c figure in Fig. 4, the first convex architecture 201 only comprises transparent resin layer 2012.
Again such as, as shown in Figure 5, be laid in the surface of the film sheet material layers 202 on underlay substrate 10 coating transparent photomask glue-line 2011, by mask plate, exposure is carried out to the surface of transparent photomask glue-line 2011 again and form photoresist consolidation zone 11 and the uncured region 12 of photoresist, then etch away the uncured region 12 of transparent photomask glue-line 2011 by etching technics, then the first convex architecture 201 only comprises transparent photomask glue-line 2011.
So, those skilled in the art can need to adjust the hierarchical structure of the first convex architecture 201 according to production and processing, thus make the job operation of anti-reflection structure 20 more diversified.
Further, the width of the first convex architecture 201 and the spacing of adjacent two described first convex architecture 201 are all less than or equal to the wavelength of visible ray;
The height of the first convex architecture 201 is more than or equal to the width of the first convex architecture 201.
It should be noted that, the spacing of the opening size and adjacent two exposure areas that make the exposure area of the mask plate of above-mentioned anti-reflection structure is all less than or equal to the wavelength of visible ray.So, the anti-reflection structure having multiple first convex architecture to form can make the change of the refractive index of outside air and anti-reflection structure surface-boundary become and simulate to obtain continuous print change, visible ray can be made roughly all to project, and therefore this anti-reflection structure can eliminate the light reflection on its surface.
Further, as shown in Figure 3, anti-reflection structure 20 can also comprise multiple second convex architecture 203, and this second convex architecture 203 is positioned at outside black matrix 101 corresponding region (a-quadrant as shown in Figure 3); And the distance between the second adjacent convex architecture 203, between the first adjacent convex architecture 201 and the second convex architecture 203 is less than or equal to the wavelength of visible ray.So, the radiating light of region outside black matrix corresponding region and viewing area can be eliminated, thus promote the display effect of display frame.
Further, as shown in Figure 4, the second convex architecture 203 can comprise:
Be coated on film sheet material layers 202 surface and carry out transparent photomask glue-line 2011 that exposure imaging and etching technics process formed and/or transparent resin layer 2012 by mask plate.
Illustrated by needs, identical with the first convex architecture 202, according to the difference of job operation, the material layer that the second convex architecture 203 comprises is also corresponding different.Owing to having done detailed illustrating to the not material layer of the first convex architecture 202 before, therefore, no longer the different layers level structure of the second convex architecture 203 is repeated one by one here.
Further, the material of film sheet material layers 202 is transparent photomask glue 2011 or transparent resin 2012.Adopt so a kind of transparent material to allow light therethrough, thus avoid the Presentation Function and the effect that affect display device.
The embodiment of the present invention provides a kind of display device, comprises any one display base plate above-mentioned.There is the beneficial effect identical with the display base plate that previous embodiment of the present invention provides, because display base plate has been described in detail in the aforementioned embodiment, repeat no more herein.
A kind of display device that the embodiment of the present invention provides, this display device comprises display base plate, the underlay substrate of this display base plate is formed the anti-reflection structure comprising multiple convex architecture, and the spacing of the width of this convex architecture and adjacent two convex architecture is all less than or equal to the wavelength of visible ray; And the height of convex architecture is more than or equal to its width.This anti-reflection structure can be positioned at display device inside or be positioned at the display side of display device, so, by this anti-reflection structure, can eliminate display device surface and the reflection of inner light, promote display effect.
The embodiment of the present invention provides a kind of manufacture method of display base plate, and as shown in Figure 1, display base plate comprises underlay substrate 10 and is formed in the black matrix 101 on underlay substrate 10, and the method comprises:
S101, on underlay substrate 10, form anti-reflection structure 20, this anti-reflection structure 20 comprises multiple first convex architecture 201.
Wherein, the position of the first convex architecture 201 is corresponding with the position of black matrix 101.
It should be noted that, the position of the first convex architecture 201 is corresponding with the position of black matrix 101 specifically refers to that the upper-lower position of the position of the first convex architecture 201 and black matrix 101 is corresponding, and the position of namely corresponding with black matrix 101 upper-lower position multiple first convex architecture 201 is all no more than the width of black matrix 101.Adopt so a kind of positional structure, can utilize this anti-reflection structure 20 eliminate light reflection while make the function of viewing area between black matrix and display effect unaffected.
The manufacture method of a kind of display base plate that the embodiment of the present invention provides, the underlay substrate of this display base plate is formed the anti-reflection structure comprising multiple convex architecture, and the spacing of the width of this convex architecture and adjacent two convex architecture is all less than or equal to the wavelength of visible ray; And the height of convex architecture is more than or equal to its width.This anti-reflection structure can be positioned at display device inside or be positioned at the display side of display device, so, by this anti-reflection structure, can eliminate display device surface and the reflection of inner light, promote display effect.
Further, as shown in Figure 2, between underlay substrate 10 and black matrix 101, this anti-reflection structure 20 is made.So, this anti-reflection structure 20 not only can eliminate the reflected light through this underlay substrate, and underlay substrate can be made away from black matrix side to be the surperficial have no occluder of the display side of general display device, promote smooth finish and the flatness of display screen outside surface.
Or, as shown in Figure 3, when display base plate is color membrane substrates 01, make anti-reflection structure 20 on the surface of the side away from described black matrix of color membrane substrates 01.So, this anti-reflection structure 20 can eliminate the light reflection of the side away from described black matrix 101 of color membrane substrates 01, thus promotes the display effect of display device.
Further, as shown in Figure 4, the first convex architecture 201 comprises transparent photomask glue-line 2011 and/or transparent resin layer 2012.
Further, between the first convex architecture 201 and underlay substrate 10, form the film sheet material layers 202 be laid on underlay substrate 10.
Wherein, anti-reflection structure 20 also comprises film sheet material layers 202.
It should be noted that, according to the difference of job operation, the material layer that the first convex architecture 201 comprises is also corresponding different.Concrete illustrating is as follows:
Example one:
S301, as shown in a figure in Fig. 4, be laid in the film sheet material layers on underlay substrate 10 surface coating transparent resin layer 2012.
S302, make transparent photomask glue-line 2011 on this transparent resin layer 2012 surface, carry out exposure imaging by mask plate and form transparent photomask glue pattern.
S303, etched away the transparent resin layer 2012 not covering transparent photomask glue 2011 part by etching technics, then, as shown in the b figure in Fig. 4, the first convex architecture 201 comprises transparent photomask glue-line 2011 and transparent resin layer 2012.
Example two:
S401, peel off the transparent photomask glue-line 2011 in said structure, then, as shown in the c figure in Fig. 4, the first convex architecture 201 only comprises transparent resin layer 2012.
Example three:
S501, as shown in Figure 5, is being laid in the surface of the film sheet material layers 202 on underlay substrate 10 coating transparent photomask glue-line 2011,
S502, by mask plate, exposure is carried out to the surface of transparent photomask glue-line 2011 and forms photoresist consolidation zone 11 and the uncured region 12 of photoresist,
S503, etch away the uncured region 12 of transparent photomask glue-line 2011 by etching technics, then the first convex architecture 201 only comprises transparent photomask glue-line 2011.
So, those skilled in the art can need to adjust the hierarchical structure of the first convex architecture 201 according to production and processing, thus make the job operation of anti-reflection structure 20 more diversified.
Further, the width of the first convex architecture 201 and the spacing of adjacent two the first convex architecture 201 are all less than or equal to the wavelength of visible ray.
The height of the first convex architecture 201 is more than or equal to the width of convex architecture 201.
It should be noted that, the spacing of the opening size and adjacent two exposure areas that make the exposure area of the mask plate of above-mentioned anti-reflection structure is all less than or equal to the wavelength of visible ray.So, the anti-reflection structure having multiple first convex architecture to form can make the change of the refractive index of outside air and anti-reflection structure surface-boundary become and simulate to obtain continuous print change, visible ray can be made roughly all to project, and therefore this anti-reflection structure can eliminate the light reflection on its surface.
Further, as shown in Figure 3, outside black matrix 101 corresponding region, (a-quadrant as shown in Figure 3) makes multiple second convex architecture 203, and the distance between the second adjacent convex architecture 203, between the first adjacent convex architecture 201 and the second convex architecture 203 is less than or equal to the wavelength of visible ray.
Wherein, anti-reflection structure 20 also comprises multiple second convex architecture 203.So, the radiating light of region outside black matrix corresponding region and viewing area can be eliminated, thus promote the display effect of display frame.
Further, as shown in Figure 4, the second convex architecture 203 comprises:
Be coated on film sheet material layers 202 surface and carry out transparent photomask glue-line 2011 that exposure imaging and etching technics process formed and/or transparent resin layer 2012 by mask plate.
Illustrated by needs, identical with the first convex architecture 202, according to the difference of job operation, the material layer that the second convex architecture 203 comprises is also corresponding different.Owing to having done detailed illustrating to the method for making of the first convex architecture 202 before, therefore, no longer the different layers level structure of the second convex architecture 203 is repeated one by one here.
Further, the material of film sheet material layers 202 is transparent photomask glue or transparent resin 2012.Adopt so a kind of transparent material to allow light therethrough, thus avoid the Presentation Function and the effect that affect display device.
The above; be only the specific embodiment of the present invention, but protection scope of the present invention is not limited thereto, is anyly familiar with those skilled in the art in the technical scope that the present invention discloses; change can be expected easily or replace, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of described claim.
Claims (15)
1. a display base plate, comprise underlay substrate and be formed in the black matrix on described underlay substrate, it is characterized in that, described display base plate also comprises: be formed at the anti-reflection structure on described underlay substrate, and described anti-reflection structure and described black matrix lay respectively at the both sides of described underlay substrate, described anti-reflection structure comprises multiple first convex architecture;
Wherein, the position of described first convex architecture is corresponding with the position of described black matrix;
The spacing of the width of described first convex architecture and adjacent two described first convex architecture is all less than or equal to the wavelength of visible ray;
The height of described first convex architecture is more than or equal to the width of described first convex architecture.
2. display base plate according to claim 1, is characterized in that,
Described display base plate is color membrane substrates, and described anti-reflection structure is positioned at the surface of the side away from described black matrix of described color membrane substrates.
3. display base plate according to claim 1, is characterized in that, described first convex architecture comprises transparent photomask glue-line and/or transparent resin layer.
4. display base plate according to claim 1, it is characterized in that, described anti-reflection structure also comprises the film sheet material layers bottom described first convex architecture, and described film sheet material layers is laid on described underlay substrate, and between described first convex architecture and described underlay substrate.
5. the display base plate according to any one of claim 1-4, is characterized in that, described anti-reflection structure also comprises multiple second convex architecture, and described second convex architecture is positioned at outside described black matrix corresponding region; And the distance between adjacent described second convex architecture, between adjacent described first convex architecture and described second convex architecture is all less than or equal to the wavelength of visible ray.
6. display base plate according to claim 4, is characterized in that,
Described anti-reflection structure also comprises multiple second convex architecture, and described second convex architecture is positioned at outside described black matrix corresponding region; And the distance between adjacent described second convex architecture, between adjacent described first convex architecture and described second convex architecture is all less than or equal to the wavelength of visible ray;
Described second convex architecture comprises:
Be coated on described film sheet material layers surface and carry out transparent photomask glue-line that exposure imaging and etching technics process formed and/or transparent resin layer by mask plate.
7. display base plate according to claim 6, is characterized in that, the material of described film sheet material layers is transparent photomask glue or transparent resin.
8. a display device, is characterized in that, comprise as arbitrary in claim 1-7 as described in display base plate.
9. a manufacture method for display base plate, described display base plate comprises underlay substrate and is formed in the black matrix on described underlay substrate, and it is characterized in that, described method comprises:
Described underlay substrate forms anti-reflection structure, and described anti-reflection structure and described black matrix lay respectively at the both sides of described underlay substrate, described anti-reflection structure comprises multiple first convex architecture;
Wherein, the position of described first convex architecture is corresponding with the position of described black matrix;
The spacing of the width of described first convex architecture and adjacent two described first convex architecture is all less than or equal to the wavelength of visible ray;
The height of described first convex architecture is more than or equal to the width of described convex architecture.
10. manufacture method according to claim 9, is characterized in that, described display base plate is color membrane substrates, makes described anti-reflection structure on the surface of the side away from described black matrix of described color membrane substrates.
11. manufacture methods according to claim 9, is characterized in that, described first convex architecture comprises transparent photomask glue-line and/or transparent resin layer.
12. manufacture methods according to claim 9, is characterized in that,
The film sheet material layers be laid on described underlay substrate is formed between described first convex architecture and described underlay substrate;
Wherein, described anti-reflection structure also comprises described film sheet material layers.
13. manufacture methods according to any one of claim 9-12, is characterized in that,
Outside described black matrix corresponding region, make multiple second convex architecture, and the distance between adjacent described second convex architecture, between adjacent described first convex architecture and described second convex architecture is all less than or equal to the wavelength of visible ray;
Wherein, described anti-reflection structure also comprises described multiple second convex architecture.
14. manufacture methods according to claim 12, is characterized in that,
Outside described black matrix corresponding region, make multiple second convex architecture, and the distance between adjacent described second convex architecture, between adjacent described first convex architecture and described second convex architecture is all less than or equal to the wavelength of visible ray;
Wherein, described anti-reflection structure also comprises described multiple second convex architecture;
Described second convex architecture comprises:
Be coated on described film sheet material layers surface and carry out transparent photomask glue-line that exposure imaging and etching technics process formed and/or transparent resin layer by mask plate.
15. manufacture methods according to claim 14, is characterized in that, the material of described film sheet material layers is transparent photomask glue or transparent resin.
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| CN201310324992.9A CN103399367B (en) | 2013-07-30 | 2013-07-30 | A kind of display base plate and manufacture method, display device |
| PCT/CN2013/089455 WO2015014073A1 (en) | 2013-07-30 | 2013-12-14 | Display substrate and manufacturing method therefor, and display device |
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| CN201310324992.9A CN103399367B (en) | 2013-07-30 | 2013-07-30 | A kind of display base plate and manufacture method, display device |
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| CN103399367B true CN103399367B (en) | 2016-02-17 |
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| CN103399367B (en) * | 2013-07-30 | 2016-02-17 | 合肥京东方光电科技有限公司 | A kind of display base plate and manufacture method, display device |
| CN104297978B (en) * | 2014-10-30 | 2017-06-09 | 京东方科技集团股份有限公司 | A kind of preparation method of display base plate, the preparation method of display device |
| KR20170136109A (en) * | 2016-05-31 | 2017-12-11 | 삼성디스플레이 주식회사 | Color conversion panel and display device including the same |
| CN106292045B (en) * | 2016-08-12 | 2019-12-03 | 京东方科技集团股份有限公司 | Light emission side substrate of mirror face display equipment and preparation method thereof, mirror face display equipment |
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| CN1532606A (en) * | 2003-03-26 | 2004-09-29 | 鸿富锦精密工业（深圳）有限公司 | Black matrix, color optical filter and liquid crystal display device |
| CN101663600A (en) * | 2007-02-09 | 2010-03-03 | 三菱丽阳株式会社 | Transparent molded body and reflection preventing article using the same |
| CN102016650A (en) * | 2008-05-27 | 2011-04-13 | 夏普株式会社 | Reflection preventing film and display device |
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| US20030038105A1 (en) * | 2001-08-27 | 2003-02-27 | Harker Alan B. | Tool for embossing high aspect ratio microstructures |
| WO2004036294A2 (en) * | 2002-10-17 | 2004-04-29 | Trivium Technologies, Inc. | Light control device and methods of making same |
| JP4357854B2 (en) * | 2003-02-28 | 2009-11-04 | 大日本印刷株式会社 | Optical filter and organic EL display using the same |
| JP2005099467A (en) * | 2003-09-25 | 2005-04-14 | Seiko Epson Corp | Electrooptical device |
| JP2008216733A (en) * | 2007-03-06 | 2008-09-18 | Toshiba Matsushita Display Technology Co Ltd | Display element |
| EP2426520A4 (en) * | 2009-06-12 | 2012-11-14 | Sharp Kk | Antireflection film, display device and light transmissive member |
| JPWO2012115059A1 (en) * | 2011-02-22 | 2014-07-07 | 旭硝子株式会社 | Fine structure molded body and liquid crystal display device provided with the fine structure molded body |
| CN102830539B (en) * | 2012-09-06 | 2015-09-02 | 京东方科技集团股份有限公司 | Liquid crystal indicator |
| CN202837750U (en) * | 2012-09-29 | 2013-03-27 | 京东方科技集团股份有限公司 | Color film substrate and liquid crystal display device |
| CN103399367B (en) * | 2013-07-30 | 2016-02-17 | 合肥京东方光电科技有限公司 | A kind of display base plate and manufacture method, display device |
-
2013
- 2013-07-30 CN CN201310324992.9A patent/CN103399367B/en not_active Expired - Fee Related
- 2013-12-14 WO PCT/CN2013/089455 patent/WO2015014073A1/en active Application Filing
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1532606A (en) * | 2003-03-26 | 2004-09-29 | 鸿富锦精密工业（深圳）有限公司 | Black matrix, color optical filter and liquid crystal display device |
| CN101663600A (en) * | 2007-02-09 | 2010-03-03 | 三菱丽阳株式会社 | Transparent molded body and reflection preventing article using the same |
| CN102016650A (en) * | 2008-05-27 | 2011-04-13 | 夏普株式会社 | Reflection preventing film and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2015014073A1 (en) | 2015-02-05 |
| CN103399367A (en) | 2013-11-20 |
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