KR20150126317A - Cover glass and method of manufacturing the same - Google Patents

Abstract

An embodiment of the present invention provides a cover glass which is slim and has good aesthetic, and a manufacturing method thereof. The cover glass according to one embodiment of the present invention comprises: a glass substrate; a pattern unit formed to be coelanaglyphic by etching on a first surface of the glass substrate; a multi-layered thin film unit laminated and formed to implement a color by covering the pattern unit; and a printing unit formed to cover the multi-layered thin film unit, wherein the multi-layered thin film unit is formed at a thickness capable of being deposited along a curve of the pattern unit.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a cover glass,

The present invention relates to a cover glass and a method of manufacturing the cover glass. More particularly, the present invention relates to a cover glass of a portable terminal having a slimmer and aesthetically pleasing appearance, and a manufacturing method thereof.

2. Description of the Related Art In recent years, there has been an increasing demand for designing mobile phones such as mobile phones, smart phones, personal digital assistants (PDAs), portable multimedia players (PMPs)

Accordingly, various attempts have been made to add a design to the main window, which is disposed at the outermost part of the touch screen, in addition to the slimming of the display panel.

For example, a bezel region of a cover portion, in which black ink is printed to cover the wiring of a display panel and the like, has been added to the design. However, printing such as black or white is applied to the bezel region, And a hairline or a geometric pattern of the film is laminated to add the most.

However, this method is easy to apply when using acrylic or PC sheet as the material of the cover part, but recently it is difficult to apply it because the glass is preferred as the material of the cover part. That is, a sufficient adhesion between the glass and the UV pattern can not be secured, and various applications are limited.

1 is an exemplary view showing the structure of a conventional cover glass.

1, a conventional cover glass 10 is made of polyethylene terephthalate (hereinafter referred to as " OCA ") 30 adhered to the lower surface of a glass substrate 20 with an optically clear adhesive (OCA) PET (polyethylene terephthalate, hereinafter referred to as " PET film ") film 40 is provided. Then, an ultraviolet (UV) pattern 50 is applied on the PET film 40. The UV pattern 50 is coated with a layer 60 for adjusting the wavelength of light to realize a color, and a black matrix layer 70 is formed on the upper side of the layer 60.

As described above, since the OCA 30 for adhering the PET film 40 and the PET film 40 to the glass substrate 20 is further provided and the UV pattern 50 is formed on the PET film 40, The conventional cover glass 10 has a problem that it is difficult to realize slimming down.

Further, since the light emitted from the display panel must pass through the PET film 40 and the OCA 30, the transmittance is lowered.

On the other hand, since the UV pattern 50 is provided on the PET film 40, that is, the UV pattern 50 is formed with a positive angle, the average value of the incident light from the outside until reaching the layer 60 The vertical distance L1 and the average vertical distance L1 when reflected to the layer 60 and emitted to the outside of the glass substrate 20 become longer. Accordingly, light may be incident on the layer 60 and reflected and emitted from the layer 60, and light incident on the layer 60 and light reflected and emitted by the layer 60 may be transmitted through the OCA 30 and the PET film 40, the transmittance may also be lowered. This phenomenon may interfere with the provision of a clear color and may cause a deterioration of aesthetics.

2 is an exemplary view showing the structure of another conventional cover glass.

2, in the conventional cover glass 10a, a portion of the black matrix layer 70a formed on the lower surface of the glass substrate 20a is removed, and a printing layer 80 is formed on the black matrix layer 70a. However, such a printing layer 80 is formed on the glass substrate 20a and has a surface having the same height as the black matrix layer 70a, so that there is a limitation in not providing a three-dimensional effect.

SUMMARY OF THE INVENTION The present invention provides a cover glass for a portable terminal and a method of manufacturing the same, which is slim and has a better esthetic feeling.

According to an aspect of the present invention, there is provided a display device including a glass substrate, a pattern portion formed on the first surface of the glass substrate by etching, a multi-layer thin film portion formed by stacking the pattern portion to form a color, And a printing section formed so as to cover the multilayer thin film section, wherein the multilayer thin film section is formed to have a thickness capable of being deposited along the curvature of the pattern section.

The cover glass may include a bezel portion, a pattern portion, a multilayer thin film portion, and a printing portion may be formed on the bezel portion.

The bezel portion may be a non-transmissive region.

The printing unit may block light emitted to the first surface.

The cover glass may include a second surface facing the first surface, and the printing portion may reflect light incident from the second surface.

The cover glass may be a camera window covering the camera module of the portable terminal and exposing the camera lens.

According to an embodiment of the present invention, since the pattern portion is formed directly on the glass substrate by etching the glass substrate, the structure of the OCA, the PET film, and the UV pattern is not required as in the conventional method, , And the transmittance can also be improved.

Further, according to the embodiment of the present invention, since the pattern portion is formed inside the glass substrate to shorten the distance from the multilayered film to the outermost side of the glass substrate, light loss in the glass substrate can be reduced, It is possible to provide a sharper and more beautiful color, thereby providing an effect of enhancing aesthetic feeling.

According to an embodiment of the present invention, the pattern accuracy of the resist film can be enhanced by masking with an acid-resistant photoresist ink, and the duration of the pattern shape of the resist film during etching can be increased by etching the non- And the etching rate is not too high, so that fine pattern formation can be made possible.

In addition, according to the embodiment of the present invention, since the pattern portion is formed directly on the glass substrate, durability can be improved since the phenomenon of invasion, lifting and the like, which is caused in the conventional cover glass, is fundamentally prevented.

Further, according to the embodiment of the present invention, since the pattern portion and the logo portion are simultaneously formed through etching, the process can be shortened and the manufacturing cost can be reduced.

Further, according to an embodiment of the present invention, a mirror coating layer is formed on the inner surface of the logo portion, thereby making it possible to provide a better esthetics by increasing the stereoscopic effect and the change rate of the logo portion.

It should be understood that the effects of the present invention are not limited to the above effects and include all effects that can be deduced from the detailed description of the present invention or the configuration of the invention described in the claims.

1 is an exemplary view showing the structure of a conventional cover glass.
2 is an exemplary view showing the structure of another conventional cover glass.
3 is a plan view illustrating a cover glass according to an embodiment of the present invention.
4 is a cross-sectional view illustrating a cover glass according to an embodiment of the present invention.
5 is a view illustrating a process for producing a cover glass according to an embodiment of the present invention.
6 is a view illustrating a masking process of a method of manufacturing a cover glass according to an embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described with reference to the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. In order to clearly illustrate the present invention, parts not related to the description are omitted, and similar parts are denoted by like reference characters throughout the specification.

Throughout the specification, when a part is referred to as being "connected" to another part, it includes not only "directly connected" but also "indirectly connected" . Also, when an element is referred to as "comprising ", it means that it can include other elements, not excluding other elements unless specifically stated otherwise.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. In one embodiment of the present invention, a cover glass of a smart phone will be described as an example for convenience of explanation.

3 is a plan view illustrating a cover glass according to an exemplary embodiment of the present invention, and FIG. 4 is a cross-sectional view illustrating a cover glass according to an exemplary embodiment of the present invention

3 and 4, the cover glass 100 according to an exemplary embodiment of the present invention includes a glass substrate 110, a pattern unit 120, and a multi-layered thin film 130 .

In the present invention, the cover glass may include all kinds of glass substrates including window glass. The cover glass may cover the entire front or back of the portable terminal, such as a window glass or battery case. Further, the cover glass may be disposed on a part of the front surface or a rear surface of the portable terminal. At this time, the cover glass can be applied to a camera window, function buttons, various decorations, and the like. When the cover glass is applied to the camera window, the camera window covers the camera module of the portable terminal and exposes the lens of the camera. When the cover glass is applied as a function button, it can be arranged so as to be the surface of the function button. The various decorating units may be all glass substrates arranged to have a decorative effect on the external appearance of the portable terminal, for example, one surrounding the camera window.

On the other hand, the cover glass may include openings. The opening may expose a camera lens, a function button, a sensor, or the like, but is not limited thereto and may be for all parts capable of providing decorative effects.

In the present invention, the bezel region means not only an edge region on a cover glass, but also a non-transmissive region for a pattern or decorating function, or a specific region for displaying a portion of the edge of a cover glass for functional separation.

The glass substrate 110 protects the display panel inside the portable terminal and transmits the screen of the display panel. Wiring (not shown), a speaker (not shown), a camera (not shown), and the like may be positioned in the bezel area 101 at the edge of the glass substrate 110. The glass substrate 110 may be cut to a certain size depending on the application to be used, and then the surface may be washed and dried. The glass substrate 110 may be a soda lime glass substrate, a non-alkali glass substrate or a tempered glass substrate, or may be a transparent resin such as acrylic.

The pattern unit 120 may be formed on the glass substrate 110 by etching, and the pattern unit 120 may be formed in the bezel region 101. That is, the surface of the pattern unit 120 is formed of the inner surface of the glass substrate 110. Accordingly, unlike the conventional cover glass, the light incident on the glass substrate 110 is incident on the OCA 30 (see Fig. 1), which is provided in a component of another material (conventional cover glass 10 (see Fig. 1) It is possible to directly reach the surface of the pattern portion 120 without passing through the PET film 40 (see FIG. 1) and the UV pattern 50 (see FIG. 1)). That is, the distance from the conventional cover glass 10 to the pattern unit 120 is shortened, and a high transmittance can be obtained.

The pattern unit 120 may have various shapes and depths. The pattern unit 120 may be a line, a figure, or the like, and these shapes may be repeatedly formed to represent geometric patterns such as hair lines or weave patterns. In addition, the pattern unit 120 may include shapes such as symbols, numbers, and letters. In this case, the pattern units 120 may be formed to have different depths from each other.

The multi-layered film 130 may be coated on the surface of the pattern portion 120. The multilayered film 130 may be formed by stacking at least one of a metal oxide layer and a non-metal oxide layer. The multi-layered film 130 can control the wavelength of light entering the pattern unit 120 in various ways, thereby realizing various colors on the glass substrate 110. In one example, the multi-layered film 130 may include a titanium oxide layer and a silicon oxide, and may be formed by stacking at least one of a titanium oxide layer and a silicon oxide layer.

The printing unit 150 may be formed on the multilayer thin film 130 and the printing unit 150 may be formed to cover the multilayer thin film 130. The printing unit 150 blocks the light emitted from the display panel so that the display panel is displayed only in the center portion of the glass substrate 110 and reflects external incident light.

Accordingly, when the external incident light is reflected by the printing unit 150, the surface shape of the pattern unit 120 and the multi-layered film 130 can be scattered and reflected to exhibit colorful and various stereoscopic effects.

Particularly, in the cover glass 100 according to the present invention, since the surface of the pattern portion 120 is made of the inner surface of the glass substrate 110, in other words, the pattern portion 120 is formed inside the glass substrate 110 The average vertical distance L2 until the light incident from the outside reaches the multilayered film 130 can be shortened. 1) according to the present invention, compared with the average vertical distance L1 (see Fig. 1) until the light incident from outside in the conventional cover glass 10 reaches the layer 60 (see Fig. 1) The average vertical distance L2 until the light incident from the outside reaches the multilayered film 130 can be much shorter. This means that the distance when the light reflected on the multilayered film 130 is emitted to the outside of the glass substrate 110 is shortened. As described above, when the pattern unit 120 according to the present invention is formed into a geometric pattern such as a hair line or a woven pattern, the light reflected by the multilayered film 130 is emitted at various angles. The multilayered film 130 ) To the outermost side of the glass substrate 110 is short, the optical loss in the glass substrate 110 can be reduced. This can provide a sharper and more beautiful color, thereby providing an effect of enhancing a sense of beauty. The multilayered film 130 may be deposited to a very thin thickness so that the patterned portion 120 may be formed on the surface of the patterned portion 120. In this case, As shown in FIG.

The inner fingerprint and the antireflection thin film coating layer 170 may be further formed on the back surface of the glass substrate 110 on which the pattern unit 120 is formed. The thin film coating layer 170 may have a thickness of 1500 to 8000 ANGSTROM. The thin film coating layer 170 can control the reflection of light to clarify the pattern, thereby realizing a more luxurious image. The thin film coating layer 170 may be coated by an undiluted solution spraying method.

Next, a method of manufacturing a cover glass according to an embodiment of the present invention will be described with reference to FIGS. 5 and 6. FIG. FIG. 5 is a view illustrating a process of manufacturing a cover glass according to an embodiment of the present invention, and FIG. 6 is a view illustrating a masking process of a method of manufacturing a cover glass according to an embodiment of the present invention.

5 and 6, a method of manufacturing a cover glass according to an embodiment of the present invention includes a step S110 of masking a glass substrate. The step of masking the glass substrate (S110) may include a step (S111) of applying an acid-resistant photoresist ink to the glass substrate to a thickness of 10 to 20 占 퐉.

The acid-resistant photoresist ink may not be responsive to an etchant for etching the glass. The acid-resistant photoresist ink has resistance to etching, and can withstand strong acid and hydrofluoric acid (HF) for a long time, which can be advantageous for fine pattern formation.

The acid-resistant photoresist ink may further contain at least one resin component of an epoxy resin, a silicone resin, an acrylic resin or a urethane resin, and the curing agent and the paint may further be contained in this state. The curing agent may be added in a large amount so that the curing proceeds too quickly and the photoresist ink is not formed in place or an appropriate proportion may be included so that the curing proceeds too slowly and the desired pattern is not oversized have. The acid-resistant photoresist ink may have sufficient adhesion with the glass substrate 110.

Acid-resistant photoresist inks can be used in various applications such as screen printing, spin coating, painting, spraying, dip coating, feeding and slit die coating etc. The glass substrate 110 may be coated with a predetermined thickness.

The step S110 of masking the glass substrate includes a step S112 of arranging a mask pattern on the resist film coated with the acid-resistant photoresist ink and exposing it, a step of developing the exposure pattern formed on the resist film S113). The light irradiated on the mask pattern in the exposure step (S112) may be UV light. In the developing step (S113), a 2 to 7% solution of sodium carbonate at 45 to 60 ° C can be used as the developing solution. The resist film can be finely patterned by immersing in the developing solution for 60 to 180 seconds, followed by washing with water and drying.

The acid-resistant photoresist ink may be a positive type which becomes soluble at the time of exposure, or a negative type which becomes insoluble.

Next, a step (S120) of forming a pattern portion by etching the glass substrate may be performed. The etching solution used for etching the glass substrate may be a non-fluorine-based etching solution. The non-boric acid-based etch solution may contain 50 to 300 g / l of ammonium fluoride (NH4F), 1 to 30 g / l of an amine compound, 0.1 to 5 g / l of an anionic surfactant and water, The non-boric acid based etching solution not only controls the abrupt reaction of the glass to hydrofluoric acid but also suppresses the surface adsorption of the generated sulphuryl fluoride to increase the penetration ability of the solution, and can rapidly realize the fine pattern. In the case where the conventional hydrofluoric acid etching agent or the etching solution is pure hydrofluoric acid (HF), the etching proceeds too fast and the formation of the fine pattern becomes difficult. Thus, the fine pattern can be formed more effectively by using the non-etching acid etching solution. That is, masking is performed with an acid-resistant photoresist ink, and the etching process is performed with a non-borate-based etching solution, so that the pattern of the resist film is not damaged and the pattern accuracy is increased. In addition, the duration of the pattern shape of the resist film is increased during etching, So that fine pattern formation can be made possible. The amine-based compound may include any one of monoethyl amine (MEA), diethyl amine (DEA), and triethyl amine (TEA) The reaction rate of the etching solution and the glass can be controlled. The anionic surfactant may include alkyl benzene sulfonate or sodium lauryl sulfate. These anionic surfactants can be used for the penetration and cleansing properties of the etchant.

In the present step (S120), etching may be performed by microbubbing the non-borane-based etching solution. By physically bubbling the etching solution, a physical force can be uniformly applied to the etching solution, so that rapid etching and cleaning can be efficiently performed. The pattern portion formed by etching the glass substrate in the present step (S120) may be etched to have a depth of 10 to 30 mu m. For this, a micro bubble device may be used in the present step (S120).

Compare Example 1 Comparative Example 1 Remarks Etching rate (占 퐉 / min) 5 to 10 20 ~ 30 Comparison at room temperature Etching property of resist film No peeling phenomenon occurred Partial exfoliation

Table 1 shows the results of a comparison between the etching rate of the non-boric acid etchant and the conventional glass etchant and the peelability of the resist film according to the method of manufacturing the cover glass according to an embodiment of the present invention. The resist film used in Example 1 and Comparative Example 1 was the same resist film patterned through various processes. As the etchant, a non-borate-based etchant according to an embodiment of the present invention and a general composition of hydrofluoric acid, Existing glass etchants composed of additives were used.

Specifically, the non-boric acid-based etchant used in Example 1 was prepared by dissolving 50 to 300 g / l of ammonium fluoride, 1 to 30 g / l of an amine compound and 0.1 to 5 g / l of an anionic surfactant in 1 liter of water. The conventional hydrofluoric acid etching solution used in Comparative Example 1 is composed of 50 to 350 g / l of hydrofluoric acid (HF), 100 to 200 g / l of inorganic acid (sulfuric acid, hydrochloric acid, etc.) and water. As shown in Table 1, in Example 1, the etching rate was 5 to 10 占 퐉 / min, which was slower than 20 to 30 占 퐉 / min in Comparative Example 1. In Example 1, the resist film did not peel off, but in Comparative Example 1, a part of the resist film peeled off. That is, when the non-boric acid-based etchant according to an embodiment of the present invention is used, it is easier to form a fine pattern because the etching rate is slower than that of the conventional fluoric acid-based etchant, It is possible to form a fine pattern.

Compare Example 2 Comparative Example 2 Fine pattern spacing 30 to 80 탆 100 μm or more Etching boundary No peeling phenomenon occurred at boundary after etching Partial peeling of the boundary after etching

Table 2 shows the resist film masked with the acid-resistant photoresist ink and the resist film masked with the conventional mask ink according to the manufacturing method of the cover glass according to the embodiment of the present invention, by etching with the non-fluorine-based etching solution according to the embodiment of the present invention The etchability of the pattern is shown. Etching in Example 2 and Comparative Example 2 was carried out at room temperature, and fine bubbles were generated in the etching solution, and the etching time was 2 to 5 minutes. As a result, in Example 2, the boundary surface of the resist film masked with the acid-resistant photoresist ink and the boundary surface etched on the glass substrate were clear, and the fine pattern was well implemented. The spacing of the fine patterns formed on the glass substrate was 30 to 80 占 퐉.

However, in Comparative Example 2, the resist film masked with the conventional mask ink was peeled off, the pattern etched on the glass substrate was uneven, and a slurry as a reaction product was generated between the resist film and the glass substrate, It was observed to be fixed. The spacing of the fine patterns formed on the glass substrate was 100 mu m or more. That is, in the case of masking with an acid-resistant photoresist ink according to an embodiment of the present invention and using a non-boric acid-based etching solution, the boundary and surface of the pattern formed by etching on the glass substrate are cleaner than the masking with the conventional masking ink , The interval between the patterns can be narrowed, and fine pattern formation is possible.

After the etching, pure water is sprayed at a pressure of 1.0 to 2.0 kg / cm < 2 > to remove the etchant remaining on the glass substrate.

After the etching solution is removed, the resist film remaining on the surface of the glass substrate is removed. Removal of the resist film can be carried out by immersing in a 3 to 10% sodium hydroxide solution at a constant temperature and, after separation, washing with pure water.

Etching in this step S120 may be performed in the bezel region of the glass substrate 110, and therefore, a pattern portion formed through the present step S120 may be formed in the bezel region.

 The pattern portion may be a line, a figure, or the like, and these shapes may be repeatedly formed to represent a geometric pattern such as a hairline or a weave pattern. Since the pattern portion formed in this way can have a greater stereoscopic effect and a greater degree of change than a pattern obtained by laminating a conventional printing or film, a more excellent decorative effect can be realized and a better aesthetic feeling can be provided. In addition, the pattern part may include a logo shape such as a symbol, a number, a letter, etc. In this case, the depth may be formed differently for each type of pattern part, for example, a geometric pattern and a logo.

As described above, according to the embodiment of the present invention, since the pattern portion is directly formed on the glass substrate by etching the glass substrate, the structure of OCA, PET film and UV pattern is not required as in the conventional method, And the transmittance can also be improved.

Further, since the pattern portion is directly formed on the glass substrate, the phenomenon of invasion, lifting and the like that occurred in the conventional cover glass does not occur originally, and durability can also be improved.

In the next step, a step S130 of coating a multi-layered thin film on the pattern portion may be performed. The multilayer thin film can be formed on the surface of the pattern portion, and therefore, the multilayer thin film can be positioned inside the glass substrate. The multilayer thin film may be formed by laminating at least one of a metal oxide layer and a non-metal oxide layer. The metal oxide layer may be a titanium oxide layer, and the non-metal oxide layer may be a silicon oxide layer. The multi-layered film can control the wavelength of the light entering the pattern portion in various ways, thereby realizing various colors on the glass substrate.

After the step (S130) of coating the multilayered film on the patterned portion, a step of forming the printed portion to cover the multilayered film may be further performed. The process of forming the printing unit may proceed in the bezel region, and the printing unit may be formed so as to cover the multilayer thin film formed in the bezel region. The printing unit may be a black matrix layer printed using black ink, and the black ink may include an inorganic compound such as a metal, a metal oxide, or an organic compound such as a polymer resin. The printing unit blocks the light emitted from the display panel so that the display panel is displayed only in the center portion of the glass substrate, and reflects external incident light.

Then, a process of removing the multilayer thin film at the central portion of the cover glass may be performed using the printing unit as a mask. Since the middle part of the cover glass is the part through which the display screen is transmitted, the multilayer thin film should be removed. The cover glass may be immersed in the solution for removing the multilayer thin film, or the solution may be sprayed onto the cover glass to remove the multilayer thin film. At this time, the portion where the printing section is covered is not exposed to the solution, so that the multilayer thin film is not removed. Through this process, the multilayer thin film may remain only on the portion where the printing portion is formed.

On the other hand, the inner fingerprint and antireflection thin film coating layer 170 are formed on the back surface of the glass substrate 110 on which the pattern unit 120 is formed after the step of forming the pattern unit by etching the glass substrate with the etchant, Thickness. The thin film coating layer 170 can control the reflection of light to clarify the pattern, thereby realizing a more luxurious image. The thin film coating layer 170 may be coated by an undiluted solution spraying method.

7 is a cross-sectional view illustrating a cover glass according to another embodiment of the present invention. In the following description, the same components as those of the cover glasses shown in Figs. 3 to 6 are denoted by the same reference numerals, and a detailed description thereof will be omitted.

7, the cover glass 200 according to another embodiment of the present invention includes a glass substrate 110, a logo portion 220, a printing portion 150, and a complementary layer 230 .

The logo portion 220 may be formed in the bezel region 101 of the glass substrate 110 through etching. The logo part 220 may be formed in a groove shape on the glass substrate 110 and the surface of the logo part 220 may be the inner surface of the glass substrate 110. Therefore, when viewed from above the glass substrate 110, the logo portion 220 can have a three-dimensional effect. 1) and the PET film 40 (see FIG. 1) provided in the conventional cover glass 10 (see FIG. 1), since the logo portion 220 is formed directly on the glass substrate 110 ) And the UV pattern 50 (see FIG. 1) are unnecessary, so that the overall thickness can be made slim. In addition, the light incident on the glass substrate 110 can reach the surface of the logo portion 220 directly without going through the above-mentioned other conventional components, and thus can have a high transmittance. The logo part 220 may be embodied in the form of a symbol, a number, a letter, or the like.

The printing unit 150 may be formed in the bezel area 101 of the glass substrate 110 such that the upper portion of the logo unit 220 is opened.

The complementary film 230 may be coated on the inner surface of the logo portion 220. Here, the complementary film 230 may be extended to the printing unit 150 in order to increase the convenience in the coating process of the complementary film 230 and the adhesion of the complementary film 230.

The complementary film 230 may be a mirror coating layer. The mirror coating layer may reflect light incident on the logo portion 220. The mirror coating layer can be realized by a coating using a mirror ink. When the complementary layer 230 is implemented as a mirror coating layer, the light reflectance of the logo portion 220 is increased in addition to the three-dimensional effect of the logo portion 220 itself formed on the glass substrate 110, ) Can be improved and the aesthetic sensitivity can be improved. Of course, the coating means for forming the complementary film 230 is not limited to mirror printing, and coatings using other kinds of paints such as metallic ink, mirror-surface ink, metallic paint and the like can be applied.

In addition, a thin film layer 240 may be further provided between the glass substrate 110 and the printing unit 150. The thin film layer 240 may have a multilayer structure, and at least one of a metal oxide layer and a non-metal oxide layer may be laminated. For example, the thin film layer 240 may comprise a titanium oxide layer and a silicon oxide, and may be formed by laminating at least one of a titanium oxide layer and a silicon oxide layer. The thin film layer 240 can control various wavelengths of light introduced into the glass substrate 110 and can realize various colors on the glass substrate 110. The thin film layer 240 may have a different color, texture, and pattern from the complementary film 230 to allow the logo part 220 and the bezel area 101 except for the logo part 220 to have different It is possible to provide an effect of enabling the logo portion 220 to have greater stereoscopic effect and change rate.

Meanwhile, as shown in FIG. 8, the pattern unit 120 may be further formed in the bezel region of the glass substrate 110a. Therefore, the cover glass 100a can have both the logo portion 220a and the pattern portion 120. [ The pattern unit 120 and the logo unit 220a can be formed simultaneously through etching, whereby the process can be shortened. In addition, the manufacturing cost can be reduced. The pattern unit 120 and the logo unit 220a may be formed to have the same depth. The pattern unit 120 may be a line, a figure, or the like, and these shapes may be repeatedly formed to represent geometric patterns such as hair lines or weave patterns. On the other hand, the logo portion 220a may be in the shape of a symbol, a number, a letter, or the like. Therefore, even if the pattern portion 120 and the logo portion 220a are formed to have the same depth, the logo portion 220a may be deformed due to the difference in width because the logo portion 220a has a wider width than the pattern portion 120. [ Can be seen more stereoscopically than the pattern unit 120. In addition, the pattern portion 120 and the logo portion 220a may be formed at different depths, and this is because the etching process time is different from the etching process time due to the difference in etching area of the pattern portion 120 and the logo portion 220a To adjust the depth of the pattern.

A multi-layered thin film 130 may be formed on the pattern unit 120. The multilayered film 130 may be formed by stacking at least one of a metal oxide layer and a non-metal oxide layer. The multi-layered film 130 can control the wavelength of the light introduced into the pattern unit 120 in various ways, thereby realizing various colors on the glass substrate 110a. In one example, the multi-layered film 130 may include a titanium oxide layer and a silicon oxide, and may be formed by stacking at least one of a titanium oxide layer and a silicon oxide layer. The multilayered film 130 may be the same as the thin film layer 240 described above. The complementary layer 230a and the multilayered layer 130 are shown to fill the patterned portion 120 while the complementary layer 230a and the multilayered layer 130 are formed to have a very thin thickness And thus can be formed along the curvature of the surface of the logo portion 220a and the surface of the pattern portion 120, respectively.

The pattern part 120 formed as described above can have a greater stereoscopic effect and a greater degree of change than a pattern obtained by laminating a conventional printing or film, and can realize a better decoration effect as compared with the logo part 220a. In addition, the color effect contrast between the multilayered film 130 and the complementary film 230a can be further improved, thereby providing a better aesthetics.

Next, a method of manufacturing a cover glass according to another embodiment of the present invention will be described with reference to FIG. 9 is a view illustrating a process for producing a cover glass according to another embodiment of the present invention.

As shown in FIG. 9, a method of manufacturing a cover glass according to another embodiment of the present invention includes a step S220 of forming a logo portion by etching a bezel region of a glass substrate.

The logo portion may be formed through etching in the bezel region of the glass substrate. The logo portion can be formed on the glass substrate through etching, and the surface of the logo portion is made of the inner surface of the glass substrate. Thus, unlike conventional cover glasses, light incident on the glass substrate can reach the surface of the logo portion directly without passing through other material components (OCA, PET film and UV pattern provided in conventional cover glasses) . The logo portion may include shapes such as symbols, numbers, letters, and the like.

Before the step S220 of forming the logo portion by etching the bezel region of the glass substrate, a step S210 of masking the glass substrate with an acid-resistant photoresist ink may be further performed. The masking step S210 is the same as that in the above-described embodiment, and thus the description thereof will be omitted.

Thereafter, a step S230 of forming a printing unit in the bezel area such that the upper part of the logo part is opened may be performed. The printing unit may be a black matrix layer printed using black ink.

Then, a process (S240) may be performed in which complementary film coating is performed on the inner surface of the logo portion. The complementary film coating on the inner side of the logo portion may be a mirror coating, and the complementary film formed therewith may be a mirror coating layer. The complementary film coating can be extended not only to the logo part but also to the printing part adjacent to the logo part for convenience in processing and increase in adhesion. The mirror coating layer can be realized by a coating using a mirror ink. In addition to the three-dimensional effect of the logo part itself, the light reflection factor in the logo part is increased, and the discrimination power and vision can be improved. . The coating means for forming the complementary film is not necessarily limited to mirror printing, and coatings using other kinds of paints such as metallic ink, mirror-surface ink, metallic paint and the like can be applied.

On the other hand, in the step of forming the logo part (S220), the bezel area of the glass substrate may be etched to form the pattern part concurrently with the logo part. The pattern portion may be formed at the same or different depth as the logo portion, which may be possible by adjusting the etching time to adjust the depth of the pattern. The pattern portion may be a line, a figure, or the like, and these shapes may be repeatedly formed to represent a geometric pattern such as a hairline or a weave pattern.

Further, a process of etching a bezel region to form a pattern portion, and then coating a multi-layer thin film on the pattern portion may be further performed. The multilayer thin film may be formed by laminating at least one of a metal oxide layer and a non-metal oxide layer. The multi-layered film can control the wavelength of the light entering the pattern portion in various ways, thereby realizing various colors on the glass substrate.

Further, before the process (S240) in which the complementary film coating is performed on the inner surface of the logo portion, a process of removing the multilayered film from the inner surface of the logo portion may be further performed. Such a process can be carried out when the multilayer thin film is coated on the inner surface of the logo portion. The step of removing the multilayer thin film may be performed by etching using a printing unit formed on the pattern unit as a mask. As a result, the complementary film is coated on the logo portion and the multilayered film is coated on the pattern portion, thereby realizing the effect of increasing the rate of change through contrast of different coating films.

In addition, after the step S220 of forming the logo portion by etching the bezel region of the glass substrate, the inner fingerprint and the antireflection thin film coating layer may be further formed on the back surface of the glass substrate having the logo portion formed thereon to a thickness of 1500-8000 ANGSTROM. The thin film coating layer may be coated by a micro-liquid spray method. The thin film coating layer can control the reflection of light to clarify the pattern and realize a more luxurious image.

Next, a method of manufacturing a cover glass according to another embodiment of the present invention will be described with reference to FIGS. 10 to 12. FIG.

FIG. 10 is a view illustrating a process for producing a cover glass according to another embodiment of the present invention. FIG. 11 is a view for explaining a process for manufacturing a cover glass according to another embodiment of the present invention, FIG. 12 is an exemplary view showing a jig shape for machining a glass substrate of a cover glass into a curved surface according to another embodiment of the present invention. FIG.

10 to 12, a method of manufacturing a cover glass according to another embodiment of the present invention includes a step S301 of masking the glass substrate with an acid-resistant photoresist ink, (S310) of processing the glass substrate into a curved surface after the step (S302) of forming the patterned portion by etching the glass substrate with the non-fluoric acid based etching solution.

The step S310 of processing the glass substrate into a curved surface may include a step S311 of supplying the glass substrate 430 between the lower jig 410 and the upper jig 420. [ The lower panel jig 410 may be formed to match the shape of the curved surface to be implemented on the glass substrate 430 and the upper panel jig 420 may be formed to apply pressure to the entire glass substrate 430.

Next, a step (S312) for preheating the glass substrate 430 may be performed. It is necessary that the glass be preheated before heating since it is easily broken at a rapid temperature change.

Next, a step S313 of heating the glass substrate 430 to a temperature equal to or higher than the annealing point may be performed. The preferable temperature for heating the glass substrate 430 is not less than the releasing point but may be within the temperature range near the releasing point. By heating the glass substrate 430 to a temperature not lower than the releasing point, the residual stress inside the glass substrate 430 can be reduced during the forming process due to the compression. Accordingly, when pressure is applied to the glass substrate 430, It is possible to prevent the generation of chippings and cracks that may occur in the resin layer 430. Further, it is possible to prevent the pattern formed by etching from being damaged due to softening by heating the glass substrate 430 at a temperature near the annealing point without heating it at a high temperature which is too high, Can be maintained. The temperature of the releasing point is lower than the actual softening point of the glass substrate 430 by about 150 ° C.

Next, a step of compressing the glass substrate 430 by applying pressure to the glass substrate 430 (S314) may be performed. At this time, pressure is applied to the entire glass substrate 430 through the top plate jig 420, so that the glass substrate 430 can be curved.

Next, a step S315 for slowly cooling the glass substrate 430 may be performed. It is possible to prevent breakage of the patterned portions formed by etching the glass substrate 430 and the glass substrate 430 due to abrupt temperature change as in the case of preheating.

A glass substrate having a curved surface can have a higher quality in terms of design than a general flat glass substrate and can exhibit an effect that a pattern portion formed through etching is more cubic. Also, in terms of space utilization inside the product, the glass substrate having a curved surface unlike the conventional flat glass substrate is formed to enclose internal parts, so that the product can be realized in a slim form as a whole.

It will be understood by those skilled in the art that the foregoing description of the present invention is for illustrative purposes only and that those of ordinary skill in the art can readily understand that various changes and modifications may be made without departing from the spirit or essential characteristics of the present invention. will be. It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive. For example, each component described as a single entity may be distributed and implemented, and components described as being distributed may also be implemented in a combined form.

The scope of the present invention is defined by the appended claims, and all changes or modifications derived from the meaning and scope of the claims and their equivalents should be construed as being included within the scope of the present invention.

10,100: cover glass
20, 110: glass substrate
120:
130: multilayer thin film
150:
170: Thin film coating layer

Claims (6)

A glass substrate,
A pattern portion formed on the first surface of the glass substrate by etching,
A multilayer thin film portion formed to cover the pattern portion to form a hue,
And a printing unit formed to cover the multilayer thin film portion,
Wherein the multilayer thin film portion is formed to have a thickness capable of being deposited along the curvature of the pattern portion. The method according to claim 1,
Wherein the cover glass includes a bezel portion,
Wherein the pattern portion, the multilayer thin film portion, and the printing portion are formed on the bezel portion. 3. The method of claim 2,
Wherein the bezel portion is a non-transmissive region. The method of claim 3,
Wherein the printing unit blocks light emitted to the first surface. 5. The method of claim 4,
Wherein the cover glass includes a second surface facing the first surface,
And the printing unit reflects light incident from the second surface. 6. The method according to any one of claims 1 to 5,
Wherein the cover glass is a camera window covering the camera module of the portable terminal and exposing a camera lens.

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