CN112661410A - Manufacturing method of anti-dazzle cover plate - Google Patents
Manufacturing method of anti-dazzle cover plate Download PDFInfo
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- CN112661410A CN112661410A CN202011585494.6A CN202011585494A CN112661410A CN 112661410 A CN112661410 A CN 112661410A CN 202011585494 A CN202011585494 A CN 202011585494A CN 112661410 A CN112661410 A CN 112661410A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 145
- 238000005530 etching Methods 0.000 claims abstract description 111
- 238000005498 polishing Methods 0.000 claims abstract description 45
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 44
- 230000000694 effects Effects 0.000 claims abstract description 39
- 238000011010 flushing procedure Methods 0.000 claims abstract description 29
- 239000007788 liquid Substances 0.000 claims abstract description 26
- 238000005520 cutting process Methods 0.000 claims abstract description 13
- 238000005507 spraying Methods 0.000 claims abstract description 13
- 238000005406 washing Methods 0.000 claims abstract description 10
- 239000002253 acid Substances 0.000 claims abstract description 9
- 238000005554 pickling Methods 0.000 claims abstract description 9
- 238000004140 cleaning Methods 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 23
- 238000012795 verification Methods 0.000 claims description 22
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 10
- 239000011241 protective layer Substances 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 9
- 238000002791 soaking Methods 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 239000011775 sodium fluoride Substances 0.000 claims description 5
- 235000013024 sodium fluoride Nutrition 0.000 claims description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims description 3
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 3
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 3
- 239000007888 film coating Substances 0.000 claims description 3
- 238000009501 film coating Methods 0.000 claims description 3
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 claims description 3
- 229910052939 potassium sulfate Inorganic materials 0.000 claims description 3
- 235000011151 potassium sulphates Nutrition 0.000 claims description 3
- 239000012530 fluid Substances 0.000 claims description 2
- 238000002203 pretreatment Methods 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims 2
- 238000007517 polishing process Methods 0.000 abstract description 4
- 238000001035 drying Methods 0.000 abstract description 2
- 239000011521 glass Substances 0.000 description 25
- 230000004313 glare Effects 0.000 description 8
- 230000008569 process Effects 0.000 description 6
- 238000012876 topography Methods 0.000 description 5
- 230000000007 visual effect Effects 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 208000003464 asthenopia Diseases 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000007781 pre-processing Methods 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 239000010410 layer Substances 0.000 description 3
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- 230000009286 beneficial effect Effects 0.000 description 2
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- 238000011109 contamination Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000004438 eyesight Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- -1 fluorine ions Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
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Abstract
The application is suitable for the technical field of anti-glare, and provides a manufacturing method of an anti-glare cover plate, which sequentially comprises the following steps: cutting: cutting the substrate according to a preset space form; a pretreatment step: cleaning the substrate by adopting a hydrofluoric acid solution with a first preset mass concentration, and then flushing the substrate by adopting a flushing liquid; frosting etching step: immersing the substrate into a frosting etching solution, taking out after immersing for a first preset time, and then flushing the substrate by adopting a flushing solution; acid washing step: immersing the substrate into a pickling solution with a second preset mass concentration, and taking out after immersing for a second preset time; and (3) polishing: spraying the substrate with hydrofluoric acid polishing solution with a third preset mass concentration for a third preset time; and flushing the substrate by adopting flushing liquid, and drying the substrate. The pretreatment makes the frosting etching effect of the substrate uniform; the spraying and polishing prevent the frosted surface from being damaged in the polishing process, and the anti-dazzle effect is ensured; the washing position and the flow of the polishing solution are controlled, and the polishing depth of the surface of the substrate can be controlled in a partitioned mode.
Description
Technical Field
The application relates to the technical field of anti-glare, in particular to a manufacturing method of an anti-glare cover plate.
Background
In the range observed by the human eye, when there is an extreme brightness contrast in space or time, it is easy to cause visual discomfort and a reduction in the ability of the human eye to observe, that is, glare in general. High-intensity or long-lasting glare may cause psychological aversion, physiological discomfort, and even temporary or permanent deterioration of vision, and as such, for devices capable of emitting light or reflecting light, such as lamps and displays, anti-glare structures or programs are often provided.
For an anti-glare cover plate adopted by a display screen, the traditional scheme discloses a scheme for processing the surface of the anti-glare cover plate, so that the original plane is changed into a matte diffuse reflection surface, and the anti-glare effect is further achieved. Although the traditional anti-glare cover plate for the display screen can reduce the glare effect, the users still have serious visual fatigue after the users visually observe the cover plate for a long time.
Disclosure of Invention
The application aims to provide a manufacturing method of an anti-glare cover plate, and aims to solve the technical problems that the anti-glare effect of the anti-glare cover plate obtained by the traditional method is poor, and the visual fatigue is easily caused after a user visually observes the anti-glare cover plate for a long time.
The method for manufacturing the anti-dazzle cover plate sequentially comprises the following steps of:
cutting: cutting the substrate according to a preset space form;
a pretreatment step: cleaning the substrate by adopting a hydrofluoric acid solution with a first preset mass concentration, and then flushing the substrate by adopting a flushing liquid;
frosting etching step: immersing the substrate into a frosting etching solution, taking out after immersing for a first preset time, and then flushing the substrate by adopting a flushing solution;
acid washing step: immersing the substrate into a pickling solution with a second preset mass concentration, and taking out the substrate after immersing for a second preset time;
and (3) polishing: spraying the substrate with hydrofluoric acid polishing solution with a third preset mass concentration for a third preset time; the substrate is then rinsed with a rinse solution.
In one embodiment of the present application, in the pre-treatment step, the first preset mass concentration is in a range of 2% to 3%.
In an embodiment of the present application, before the step of frosting etching, a step of preparing a frosting etching solution is further included: 10-15 parts of ammonium bifluoride, 1-3 parts of calcium fluoride, 4-7 parts of potassium sulfate, 5-8 parts of sodium hydroxide and 6-9 parts of water are stirred until the components are fully mixed, then 3-5 parts of sodium fluoride solution are added, the mixture is stirred until the components are fully mixed, and then the mixture is aged for 24-48 hours.
In one embodiment of the present application, in the frosting etching step, the first preset time is in a range of 60 to 90 seconds.
In an embodiment of the present application, after the step of preparing the frosting etching solution, before the step of frosting etching, the method further includes a step of frosting effect verification: and putting a verification material into the frosting etching solution, soaking for the first preset time, then taking out, then flushing the substrate verification material by adopting flushing fluid, measuring the representation of the verification material, and judging the effectiveness of the frosting etching solution according to the representation of the verification material.
In one embodiment of the present application, in the acid washing step, the second preset mass concentration is in a range of 5% to 8%, and the second preset time is in a range of 15 to 30 minutes.
In one embodiment of the present application, in the polishing step, the third predetermined concentration is in a range of 10% to 20% by mass, and the third predetermined time is in a range of 5 to 8 minutes.
In one embodiment of the present application, the rinsing liquid is water, or a mixture of water and alcohol.
In an embodiment of the present application, after the cutting step and before the frosting etching step, a film covering step is further included: coating a protective layer on the surface area of the substrate which does not need to be etched;
the polishing step specifically comprises: removing the protective layer, spraying the substrate with hydrofluoric acid polishing solution with a third preset mass concentration for a third preset time; the substrate is then rinsed with a rinse solution.
In one embodiment of the present application, in the step of coating, the surface region not to be etched includes: the area of the substrate is used for the light sensor of the terminal equipment to collect information.
The embodiment of the method for manufacturing the anti-glare cover plate provided by any embodiment of the application has at least the following beneficial effects:
in the manufacturing method of the anti-glare cover plate provided by the embodiment, before the frosting etching step, the oil stain on the surface of the substrate is cleaned through the pretreatment step and the surface of the substrate is slightly corroded, so that the frosting etching effect of the substrate is uniform; in the polishing step, the polishing is carried out in a spraying polishing mode, so that the frosted surface formed in the frosted etching step can be effectively prevented from being damaged in the polishing process, and the anti-dazzle effect is ensured; furthermore, in the polishing step, the polishing depth of the surface of the substrate can be conveniently controlled by controlling the flushing position and the liquid flow of the polishing liquid, and the polished surface of the substrate can be smoother by adopting the scheme that the protective film is attached to the part of the surface of the substrate in the frosting etching process, so that the concave-convex feeling of a user when the user touches the boundary between the frosting etching area and the protected area can be reduced or eliminated.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
FIG. 1 is a schematic structural view of an anti-glare cover sheet provided in accordance with an embodiment of the present application;
FIG. 2 is a schematic flow chart of a method of manufacturing an anti-glare cover sheet according to an embodiment of the present application;
fig. 3 is a schematic flow chart of a method for manufacturing an anti-glare cover sheet according to another embodiment of the present application;
FIG. 4 is a micro-topography of a frosted etched area of an anti-glare cover sheet provided by an embodiment of the present application;
FIG. 5 is a front side micro-topography of a frosted etched area of an anti-glare cover sheet provided by an embodiment of the present application;
fig. 6 is a front micro-topography image of a frosted etched area of an anti-glare cover sheet provided by an embodiment of the present application at a larger scale.
Reference numerals referred to in the above figures are detailed below:
1-a substrate; 11-protected area; 12-frosted etched area.
Detailed Description
In order to make the objects, technical solutions and advantages of the present application more apparent, the present application is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly or indirectly secured to the other element. When an element is referred to as being "connected to" another element, it can be directly or indirectly connected to the other element. The terms "upper", "lower", "left", "right", "front", "rear", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like indicate orientations or positions based on the orientations or positions shown in the drawings, and are for convenience of description only and not to be construed as limiting the technical solution. The terms "first", "second" and "first" are used merely for descriptive purposes and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features. The meaning of "plurality" is two or more unless specifically limited otherwise.
In order to explain the technical solutions of the present application, the following detailed descriptions are made with reference to specific drawings and examples.
Referring to fig. 1 and 2, an embodiment of the present application provides a method for manufacturing an anti-glare cover plate, which sequentially includes the following steps:
s10: cutting: cutting the substrate 1 according to a preset space shape;
s20: a pretreatment step: cleaning the substrate 1 by adopting a hydrofluoric acid solution with a first preset mass concentration, and then flushing the substrate 1 by adopting a flushing liquid;
s30: frosting etching step: immersing the substrate 1 in a frosting etching solution, taking out after immersing for a first preset time, and then flushing the substrate 1 by adopting a flushing solution;
s40: acid washing step: immersing the substrate 1 into a pickling solution with a second preset mass concentration, and taking out after immersing for a second preset time;
s50: and (3) polishing: spraying the substrate 1 with hydrofluoric acid polishing solution with a third preset mass concentration for a third preset time; the substrate 1 is then rinsed with a rinsing liquid.
Specifically, in the method for manufacturing the anti-glare cover plate provided by the present embodiment, after a series of processes is performed on the substrate 1, the anti-glare cover plate capable of being used in a display device or a lighting device is formed, and the preset spatial form of the anti-glare cover plate should be matched with the corresponding display device or lighting device; for example, the substrate 1 applied to a device such as a mobile phone, a personal computer, a tablet computer, etc. may have a rectangular preset spatial form, and the substrate 1 applied to a device such as a lighting fixture, a smart watch, or a smart bracelet, etc. may have a rectangular preset spatial form, a circular preset spatial form, a square preset spatial form, etc.; furthermore, it is preferable that the substrate 1 cut into the predetermined spatial form is left with a redundant size to prevent the substrate 1 after the frosting etching step S30 and the polishing step S50 from being smaller than the predetermined size and being unable to be matched with a corresponding display device or lighting device.
The embodiment of the method for manufacturing the anti-glare cover plate has the following beneficial technical effects:
referring to fig. 4 to 6, in the method for manufacturing the anti-glare cover plate according to the embodiment, before the frosting etching step S30, the pretreatment step S20 is performed to clean the oil stain on the surface of the substrate 1 and slightly corrode the surface of the substrate 1, so that the frosting etching effect of the substrate 1 is uniform; in the polishing step S50, the frosted surface formed in the frosted etching step S30 can be effectively prevented from being damaged in the polishing process by adopting a spray polishing mode for polishing, so that the anti-glare effect is ensured; further, in the polishing step S50, by controlling the rinsing position and the liquid flow rate of the polishing liquid, the polishing depth of the surface of the substrate 1 can be conveniently controlled, and for the scheme of attaching the protective film to the portion of the surface of the substrate 1 during the frosting etching process, this will enable the surface of the polished substrate 1 to be smoother, and can reduce or eliminate the concave-convex feeling when the user touches the boundary between the frosting etching area 12 and the protected area 11.
Optionally, in the polishing step S50, after the substrate 1 is rinsed with the rinsing liquid, the method includes a step of drying the substrate, that is, the polishing step S50 specifically includes: spraying the substrate 1 with hydrofluoric acid polishing solution with a third preset mass concentration for a third preset time; then, the substrate 1 is rinsed with a rinsing liquid, and finally, the substrate 1 is dried.
Referring to fig. 1 and 3, in an embodiment of the present application, in the preprocessing step S20, the first predetermined mass concentration ranges from 2% to 3%. That is, the preprocessing step S20 specifically includes: the substrate 1 is cleaned by hydrofluoric acid solution with the mass concentration range of 2% -3%, and then the substrate 1 is washed by flushing liquid.
Before frosting etching, hydrofluoric acid with the mass concentration range of 2% -3% is adopted to clean the substrate 1, oil stains on the surface of the substrate 1 can be removed, and the surface of the substrate 1 is pre-corroded, so that after the frosting etching area 12 on the surface of the substrate 1 is contacted with the frosting etching liquid, the substrate can be immediately reacted with the frosting etching liquid, and the uniformity of the frosting effect on the surface of the substrate 1 is improved. The mass concentration of hydrofluoric acid is too low, the corrosion effect of hydrofluoric acid solution on glass is poor, and the pre-corrosion effect is poor; too high a mass concentration of hydrofluoric acid may make it difficult to control the degree of pre-etching at different locations on the surface of the substrate 1 during the pretreatment process, and the uniformity of the final obtained sanding effect on the surface of the substrate 1 may be poor.
As a specific solution of this embodiment, the first predetermined mass concentration is in a range of 2.14% to 2.97% to obtain better effects of removing oil stains and pre-corrosion. That is, the preprocessing step S20 specifically includes: cleaning the substrate 1 by adopting hydrofluoric acid solution with the mass concentration range of 2.14-2.97%, and then flushing the substrate 1 by adopting flushing liquid.
Referring to fig. 1 and 3, in an embodiment of the present application, before the step of performing the frosting etching S30, a step of preparing a frosting etching solution S31 is further included: 10-15 parts of ammonium bifluoride, 1-3 parts of calcium fluoride, 4-7 parts of potassium sulfate, 5-8 parts of sodium hydroxide and 6-9 parts of water are stirred until the components are fully mixed, then 3-5 parts of sodium fluoride solution are added, the mixture is stirred until the components are fully mixed, and then the mixture is aged for 24-48 hours.
In the frosting etching solution provided by this embodiment, the split beam of each component should be understood as mass part; the part of the sodium fluoride solution is understood to mean the mass part of sodium fluoride contained in the saturated sodium fluoride solution at normal temperature and pressure. The frosting etching solution provided by the embodiment is very suitable for the substrate 1 made of glass, such as the toughened glass substrate 1. After the substrate 1 is put into the frosting etching solution provided by the embodiment, under the action of fluorine ions, the surface of the substrate 1 can be corroded and frosted, and an uneven surface appearance is formed, so that light rays emitted by display equipment or lighting equipment can be scattered on the surface of the substrate 1, and a diffuse reflection-like effect is achieved; moreover, the frosted surface generated by the substrate 1 corroded by the frosted etching solution provided by the embodiment has moderate depth range and width range, has the visual effect similar to paper, and can reduce or even eliminate the visual fatigue of a user after the user visually observes the substrate 1 for a long time.
Referring to fig. 1 and 3, in accordance with the frosting etching solution provided in the above embodiments, in an embodiment of the present application, the first predetermined time is in a range of 60 to 90 seconds in the frosting etching step S30. That is, the frosting etching step S30 specifically includes: and (3) immersing the substrate 1 in the frosted etching solution, taking out after immersing for 60-90 seconds, and then flushing the substrate 1 by adopting flushing liquid.
In the frosting etching step S30, the frosting etching solution provided in the embodiment is used, and the time for soaking the glass substrate 1 in the frosting etching solution should be controlled within the range of 60-90 seconds. The insufficient soaking time easily causes that the frosted parameters such as the depth range, the width range and the like of the surface of the glass substrate 1 cannot reach preset values, thereby further influencing the anti-glare effect and the paper-like effect of the substrate 1; the soaking time is too long, which easily causes the glass substrate 1 to be excessively corroded, causes the thickness of the glass substrate 1 to be too low, reduces the uniformity of the corrosion degree of each part of the surface of the glass substrate 1, and causes the surface of the glass substrate 1 to be uneven.
As a preferable scheme of the embodiment, the first preset time is in a range of 69 to 83 seconds to ensure that the sanding parameter of the surface of the substrate 1 falls within a desirable range and the glass substrate 1 is not excessively corroded. That is, the frosting etching step S30 specifically includes: the substrate 1 is immersed in the frosted etching solution, taken out after being immersed for 69-83 seconds, and then the substrate 1 is washed by the flushing liquid.
By adopting the frosted etching solution and corroding the surface of the glass substrate 1 according to the first preset time to obtain the substrate 1 with the anti-glare function, the surface of the substrate 1 can form a frosted etching area 12, and in one embodiment of the application, the surface topography of the frosted etching area 12 can meet the following requirements: the frosted etching area 12 is formed by splicing a plurality of microscopic concave spherical surfaces, the width range of each microscopic concave spherical surface is 2-25 μm, and the depth range of each microscopic concave spherical surface is 0.2-2.5 μm.
The average height of the frosted etching area 12 is taken as the plane of the original point, the direction perpendicular to the plane of the frosted etching area 12 is taken as the direction of the ordinate, the width of the microscopic concave spherical surface refers to the average value of the diameter of the maximum opening part circle of the spherical crown surface after each microscopic concave spherical surface is approximated to the spherical crown surface in a plurality of microscopic concave spherical surfaces sampled randomly; the depth of the micro concave spherical surface refers to the average value of the depths of the micro concave spherical surfaces in a plurality of micro concave spherical surfaces sampled randomly. The width and depth of the microscopic concave spherical surface are all determinants of the unevenness and roughness of the surface of the frosted etching area 12.
According to the glass substrate obtained by the frosted etching solution provided by the embodiment, the frosted etching area 12 consisting of the plurality of sunken microcosmic concave spherical surfaces is formed in the frosted etching area 12, and the width and the depth of each microcosmic concave spherical surface are set within a preset range, so that the glass substrate 1 has a moderate frosted effect, light irradiating the frosted etching area 12 is scattered more efficiently on the basis that human eyes watch a screen through the glass substrate 1 is not influenced, the glass substrate has better diffuse reflection capability, a visual effect close to paper is achieved, and a glare effect and a flash point effect are reduced to a great extent or even completely eliminated; moreover, by configuring the frosted etching area 12 according to the preset parameters, the visual effect of the frosted etching area 12 is similar to that of paper, the watching habit of human eyes under general conditions is met, the visual fatigue of a user after the user visually observes the glass substrate 1 for a long time is further reduced, and the glass substrate is particularly suitable for screens or cover plates of various electronic terminals; in addition, the glass substrate 1 provided in the present embodiment has a plurality of microscopic concave spherical surfaces on the surface thereof, but does not have a significant negative effect on the structural strength of the glass substrate 1.
It should be noted that the flash point effect refers to an effect that when light emitted by one pixel passes through the frosted etching area 12, the light is refracted on the surface of the frosted etching area 12, and the light refracted by different microscopic concave spherical surfaces interferes with each other, so that a color point or a bright and dark point is generated when a human eye watches the light. The glass substrate 1 provided by the embodiment has reasonable parameter configuration, and the microscopic concave spherical surface has small enough width, so that the flash point effect can be reduced to a great extent or even completely eliminated.
It should be further noted that if the width of the microscopic concave spherical surface is too small, the frosting effect is not obvious, and the elimination capability of the frosted etching area 12 on the glare effect is affected; if the width of the microscopic concave spherical surface is too large, the frosted etching area 12 is too rough and has strong burr feeling, which affects the visual experience and tactile experience of the user given by the glass substrate 1. If the depth of the microscopic concave spherical surface is too large, the depth of the microscopic concave spherical surface is too shallow, which easily causes the frosting effect to be not obvious, and influences the elimination capability of the frosting etching area 12 on the glare effect; if the depth of the microscopic concave spherical surface is too small, the frosted etching area 12 is too rough and has a strong burr feeling, which affects the visual experience and tactile experience of the user given by the glass substrate 1. Any one of the width and the depth of the microscopic concave spherical surface exceeding the preset numerical range affects the paper-like effect of the glass substrate 1 provided by the present embodiment.
The microscopic concave spherical surfaces are densely distributed on the surface of the frosted etching area 12, the microscopic concave spherical surfaces are all concave spherical surfaces, a plurality of elongated saddle-shaped surfaces are formed at the joints of the adjacent microscopic concave spherical surfaces, and vertexes are formed at two ends of each saddle-shaped surface. At the moment, the height difference between the top point and the lowest point of the micro concave spherical surface is the depth of the micro concave spherical surface, and the arithmetic value of the height difference is the depth of the micro concave spherical surface; each microscopic concave spherical surface formed by enclosing the saddle-shaped surface is equivalent to a spherical crown surface, the diameter of the maximum opening part circle of the spherical crown surface is the width of the microscopic concave spherical surface, and the arithmetic value is the width of the microscopic concave spherical surface. The light rays irradiated to the frosted etching area 12 from different positions of the microscopic concave spherical surface can be reflected or refracted to different directions, so that the light rays are scattered, and the effect of eliminating glare is achieved; furthermore, the size of the microscopic concave spherical surface is in the micron level and is smaller than the size of the pixel point of the display adopting the glass substrate 1 provided by the embodiment, light rays emitted by the same pixel point cannot interfere after being refracted from different positions of the frosted etching area 12, and the flash point effect of the anti-dazzle plate can be eliminated while glare is eliminated.
In a preferred embodiment of the present invention, the gloss of the frosted etching area 12 at an angle of 60 ° is in a range of 10 to 40 SGU. The Unit of Gloss SGU is understood to be the standard Gloss Unit, i.e. the Unit of standard Gloss, which is dimensionless and is related to the width, depth of the microscopic concave spheres, and the properties of the material itself. The gloss level of the frosted etched area 12 can reflect the microscopic flatness of the surface of the frosted etched area 12.
It should be understood that the depth range and the width range of the micro concave spherical surface described in the embodiments of the present application refer to the depth range and the width range of the majority of the micro concave spherical surface on the frosted etching area 12. This is because the formation of microscopic concavely spherical surfaces on the frosted etched areas 12 is often achieved by macroscopic methods, which means that the presence of microscopic concavely spherical surfaces with a width and depth outside the above-mentioned ranges is a necessary event. Such as microscopic concave spherical surfaces in the regions of some glass surfaces where the amorphous structure is relatively loose, the depth and width of the microscopic concave spherical surfaces are often larger than the depth and width ranges; such as microscopic concave spherical surfaces at the boundaries of the frosted etched areas 12, sometimes have a depth and width less than the width and depth ranges described above. For the above reasons, the depth range and the width range of the micro concave spherical surface according to the embodiments of the present application can be understood as that the depth range and the width range of the micro concave spherical surface are respectively within the above depth range and width range as long as the width and the depth of the micro concave spherical surface exceeding the preset ratio fall within the above ranges. The above-mentioned preset ratio may be one of 88%, 90%, 93%, 95%, and 98% according to the requirements for the process level. Of course, from a statistical point of view, the above range may also be considered to refer to the average depth range and the average depth range of the microscopic concave spherical surface.
Referring to fig. 1 and 3, in an embodiment of the present application, after the step of preparing the frosting etching solution S31, before the step of etching the frosting etching S30, a step of verifying the frosting effect S32 is further included: and putting the verification material into the frosting etching solution, soaking for a first preset time, then taking out, washing the verification material of the substrate 1 by adopting a washing liquid, measuring the characteristics of the verification material, and judging the effectiveness of the frosting etching solution according to the characteristics of the verification material.
In this embodiment, after the step S31 of preparing the frosting etching solution, before the step S30 of etching the frosting, the step S32 of verifying the frosting effect is used to verify the frosting etching effect of the frosting etching solution, and the validity of the frosting etching solution is determined according to the characteristics of the verification material, so as to ensure that the frosting etching solution has sufficient etching capability when being put into use.
As a specific aspect of this embodiment, the verification material may be a leftover material obtained after cutting the substrate 1 according to a preset spatial form in the cutting step, and the soaking time of the verification material in the frosting etching solution should be greater than 60 s. The leftover materials generated by cutting the substrate 1 are used as verification materials, so that the variable control is facilitated, the effectiveness of the frosted etching solution can be accurately reflected by the representation of the verification materials after the frosted etching solution is soaked, the raw materials can be saved, and the method is more energy-saving and environment-friendly.
As a specific aspect of this embodiment, the measuring the characteristic of the verification material includes measuring the haze and the gloss of the verification material. Compared with the verification of the microscopic topography characteristics of the material surface, the haze and the glossiness are easier to measure, and whether the frosting etching capability of the frosting etching solution meets the expectation or not can be reflected more intuitively.
Referring to fig. 1 and 3, in one embodiment of the present application, in the pickling step S40, the second predetermined mass concentration ranges from 5% to 8%, and the second predetermined time ranges from 15 minutes to 30 minutes. That is, the pickling step S40 specifically includes: immersing the substrate 1 into a pickling solution with the mass concentration range of 5-8%, soaking for 15-30 minutes, and taking out.
After the frosting etching step S30, the substrate 1 is further acid-washed to wash away the residual components of the frosting etching solution in the micropores formed on the surface of the substrate 1 in the frosting etching step S30, thereby preventing contamination and preventing the substrate 1 from being excessively corroded.
In a specific embodiment of this embodiment, in the pickling step S40, a strong acid that is not corrosive to glass, such as sulfuric acid, is used as the pickling solution. That is, in one embodiment, the acid washing step S40 includes: the substrate 1 is immersed in sulfuric acid with the mass concentration range of 5% -8%, soaked for 15-30 minutes and then taken out.
Referring to fig. 1 and 3, in one embodiment of the present application, in the polishing step S50, the third predetermined concentration is in a range of 10% to 20% by mass, and the third predetermined time is in a range of 5 minutes to 8 minutes. That is, the polishing step S50 specifically includes: spraying a hydrofluoric acid polishing solution with the mass concentration range of 10% -20% on the substrate 1 for 5-8 minutes; the substrate 1 is then rinsed with a rinsing liquid.
By adopting the spray polishing mode, the polishing position and strength can be accurately controlled, specifically, hydrofluoric acid is selectively sprayed to different positions of the surface of the substrate 1, and the flow of the hydrofluoric acid sprayed everywhere is controlled, so that the accurate control of the spray polishing position and strength can be realized. Thus, the frosted surface formed in the frosted etching step S30 can be prevented from being damaged during polishing, ensuring an anti-glare effect; meanwhile, according to the scheme that the protective film is attached to the part of the surface of the substrate 1 in the frosting etching process, the flow of spraying hydrofluoric acid to the protected area 11 coated with the protective layer can be improved, the protected area 11 provided with the protective film is attached to cut a thicker surface layer structure of the substrate 1 through polishing, the surface of the polished substrate 1 is further smooth, and the concave-convex feeling of a user when the boundary between the frosting etching area 12 and the protected area 11 is touched is reduced or eliminated.
In one embodiment of the present application, the rinsing liquid is water, or a mixture of water and alcohol in any ratio.
As a specific example of this embodiment, in the preprocessing step S20, the frosting etching step S30, and the polishing step S50, the rinsing liquid may be a mixture of 75% alcohol and 25% water, and the substrate 1 may be rinsed by ultrasonic rinsing, so as to improve the efficiency of rinsing the surface of the substrate 1 and reduce the loss of the rinsing liquid.
In an embodiment of the present application, after the cutting step and before the frosting etching step S30, a film covering step S11 is further included: coating a protective layer on the surface area of the substrate 1 which does not need to be etched;
the polishing step S50 specifically includes: removing the protective layer, spraying the substrate 1 with hydrofluoric acid polishing solution with a third preset mass concentration for a third preset time; the substrate 1 is then rinsed with a rinsing liquid. That is, before the frosting etching step S30, the protection layer is applied to the protected region 11.
Optionally, in the step of coating, the protected area 11, i.e. the surface area not to be etched, includes: the area of the substrate 1 for the light sensor of the terminal device to collect information. That is, the film coating step specifically includes: the substrate 1 is coated with a protective layer in the area for the light sensor of the terminal device to collect information.
In this way, by using the protective layer to protect the surface area of the surface of the substrate 1 that does not need to be etched, including the area of the substrate 1 used for the image sensor of the terminal device to collect information, and the like, the surface of the substrate 1 is divided into the frosted etching area 12 and the protected area 11, so that the protected area 11 of the substrate 1 can be prevented from being corroded by the frosted etching solution, and the normal lighting of the light sensor is prevented from being influenced; further, after the frosting etching, the protection layer is removed, and the protected area 11 of the substrate 1, which is used for the information acquisition of the light sensor of the terminal device, is polished in a spraying polishing mode, so that the frosted surface formed in the frosting etching step S30 is prevented from being damaged in the polishing process, and the anti-glare effect is ensured, and simultaneously, the concave-convex feeling of a user when the user touches the boundary between the frosting etching area and the protected area 11 of the substrate 1, which is used for the information acquisition of the light sensor of the terminal device, is reduced or eliminated.
As a specific embodiment of this embodiment, the protective layer is an acid-resistant ink layer.
The above description is only exemplary of the present application and should not be taken as limiting the present application, as any modification, equivalent replacement, or improvement made within the spirit and principle of the present application should be included in the protection scope of the present application.
Claims (10)
1. The manufacturing method of the anti-dazzle cover plate is characterized by sequentially comprising the following steps of:
cutting: cutting the substrate according to a preset space form;
a pretreatment step: cleaning the substrate by adopting a hydrofluoric acid solution with a first preset mass concentration, and then flushing the substrate by adopting a flushing liquid;
frosting etching step: immersing the substrate into a frosting etching solution, taking out after immersing for a first preset time, and then flushing the substrate by adopting a flushing solution;
acid washing step: immersing the substrate into a pickling solution with a second preset mass concentration, and taking out the substrate after immersing for a second preset time;
and (3) polishing: spraying the substrate with hydrofluoric acid polishing solution with a third preset mass concentration for a third preset time; the substrate is then rinsed with a rinse solution.
2. The method for manufacturing an anti-glare cover sheet according to claim 1, wherein the first preset mass concentration ranges from 2% to 3% in the pre-treatment step.
3. The method for manufacturing an anti-glare cover sheet according to claim 1, further comprising, before the frosting etching step, a frosting etching solution preparation step of: 10-15 parts of ammonium bifluoride, 1-3 parts of calcium fluoride, 4-7 parts of potassium sulfate, 5-8 parts of sodium hydroxide and 6-9 parts of water are stirred until the components are fully mixed, then 3-5 parts of sodium fluoride solution are added, the mixture is stirred until the components are fully mixed, and then the mixture is aged for 24-48 hours.
4. The method for manufacturing an anti-glare cover sheet according to claim 3, wherein the first predetermined time is in the range of 60 to 90 seconds in the frosting etching step.
5. The method for manufacturing an anti-glare cover sheet according to claim 3, further comprising a frosting effect verification step, after the frosting etching solution preparation step and before the frosting etching step: and putting a verification material into the frosting etching solution, soaking for the first preset time, then taking out, then flushing the substrate verification material by adopting flushing fluid, measuring the representation of the verification material, and judging the effectiveness of the frosting etching solution according to the representation of the verification material.
6. The method for manufacturing an anti-glare cover sheet according to claim 1, wherein the second predetermined mass concentration ranges from 5% to 8% and the second predetermined time ranges from 15 to 30 minutes in the acid washing step.
7. The method for manufacturing an anti-glare cover sheet according to claim 1, wherein in the polishing step, the third predetermined concentration is in a range of 10% to 20% by mass, and the third predetermined time is in a range of 5 minutes to 8 minutes.
8. The method for manufacturing an anti-glare cover sheet according to any one of claims 1 to 7, wherein the rinsing liquid is water, or a mixture of water and alcohol.
9. The method for manufacturing an anti-glare cover sheet according to any one of claims 1 to 7, further comprising, after the splitting step and before the frosting etching step, a film-coating step of: coating a protective layer on the surface area of the substrate which does not need to be etched;
the polishing step specifically comprises: removing the protective layer, spraying the substrate with hydrofluoric acid polishing solution with a third preset mass concentration for a third preset time; the substrate is then rinsed with a rinse solution.
10. The method of manufacturing an anti-glare cover sheet according to claim 9, wherein in the film-coating step, the surface region not to be etched includes: the area of the substrate is used for the light sensor of the terminal equipment to collect information.
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| CN202011585494.6A CN112661410A (en) | 2020-12-28 | 2020-12-28 | Manufacturing method of anti-dazzle cover plate |
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| CN202011585494.6A CN112661410A (en) | 2020-12-28 | 2020-12-28 | Manufacturing method of anti-dazzle cover plate |
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| CN113173709A (en) * | 2021-04-30 | 2021-07-27 | 广东小天才科技有限公司 | Glass product and preparation method thereof, electronic equipment cover plate and electronic equipment |
| CN113292247A (en) * | 2021-06-08 | 2021-08-24 | 广东小天才科技有限公司 | Anti-reflection glass and preparation method thereof |
| CN114772941A (en) * | 2022-05-09 | 2022-07-22 | 合肥工业大学 | Polishing solution for display frosted glass and application thereof |
| CN114873933A (en) * | 2022-06-13 | 2022-08-09 | 深圳市东方硅源科技有限公司 | Anti-glare AG glass and preparation process thereof |
| CN115477475A (en) * | 2021-06-16 | 2022-12-16 | 广州视源电子科技股份有限公司 | Glass with haze and smoothness and preparation method thereof |
| CN116282903A (en) * | 2023-02-15 | 2023-06-23 | 清远南玻节能新材料有限公司 | Anti-dazzle glass, preparation method thereof and display device |
| CN116354609A (en) * | 2023-03-08 | 2023-06-30 | 东莞市吉田光学玻璃有限公司 | Anti-dizziness treatment process for face recognition glass panel |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113173709A (en) * | 2021-04-30 | 2021-07-27 | 广东小天才科技有限公司 | Glass product and preparation method thereof, electronic equipment cover plate and electronic equipment |
| CN113292247A (en) * | 2021-06-08 | 2021-08-24 | 广东小天才科技有限公司 | Anti-reflection glass and preparation method thereof |
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| CN116354609A (en) * | 2023-03-08 | 2023-06-30 | 东莞市吉田光学玻璃有限公司 | Anti-dizziness treatment process for face recognition glass panel |
| CN116354609B (en) * | 2023-03-08 | 2023-09-22 | 东莞市吉田光学玻璃有限公司 | Anti-dizziness treatment process for face recognition glass panel |
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