CN113737101A - Thin-specification oriented silicon steel plate with excellent manufacturability and manufacturing method thereof - Google Patents

Thin-specification oriented silicon steel plate with excellent manufacturability and manufacturing method thereof Download PDF

Info

Publication number
CN113737101A
CN113737101A CN202010470542.0A CN202010470542A CN113737101A CN 113737101 A CN113737101 A CN 113737101A CN 202010470542 A CN202010470542 A CN 202010470542A CN 113737101 A CN113737101 A CN 113737101A
Authority
CN
China
Prior art keywords
silicon steel
oriented silicon
thin
tension
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010470542.0A
Other languages
Chinese (zh)
Inventor
马长松
储双杰
杨勇杰
李国保
章华兵
沈侃毅
赵自鹏
曹伟
吉亚明
谢伟勇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Baoshan Iron and Steel Co Ltd
Original Assignee
Baoshan Iron and Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Baoshan Iron and Steel Co Ltd filed Critical Baoshan Iron and Steel Co Ltd
Priority to CN202010470542.0A priority Critical patent/CN113737101A/en
Priority to PCT/CN2021/096391 priority patent/WO2021239057A1/en
Publication of CN113737101A publication Critical patent/CN113737101A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/18—Ferrous alloys, e.g. steel alloys containing chromium
    • C22C38/34—Ferrous alloys, e.g. steel alloys containing chromium with more than 1.5% by weight of silicon
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/26—Methods of annealing
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D3/00—Diffusion processes for extraction of non-metals; Furnaces therefor
    • C21D3/02—Extraction of non-metals
    • C21D3/04—Decarburising
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D6/00—Heat treatment of ferrous alloys
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D6/00—Heat treatment of ferrous alloys
    • C21D6/002—Heat treatment of ferrous alloys containing Cr
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D6/00—Heat treatment of ferrous alloys
    • C21D6/005—Heat treatment of ferrous alloys containing Mn
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D6/00—Heat treatment of ferrous alloys
    • C21D6/008—Heat treatment of ferrous alloys containing Si
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00—Modifying the physical properties by deformation combined with, or followed by, heat treatment
    • C21D8/12—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00—Modifying the physical properties by deformation combined with, or followed by, heat treatment
    • C21D8/12—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
    • C21D8/1216—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties the working step(s) being of interest
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/0081—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for slabs; for billets
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/001—Ferrous alloys, e.g. steel alloys containing N
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/04—Ferrous alloys, e.g. steel alloys containing manganese
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/06—Ferrous alloys, e.g. steel alloys containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/18—Ferrous alloys, e.g. steel alloys containing chromium
    • C22C38/22—Ferrous alloys, e.g. steel alloys containing chromium with molybdenum or tungsten
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/18—Ferrous alloys, e.g. steel alloys containing chromium
    • C22C38/24—Ferrous alloys, e.g. steel alloys containing chromium with vanadium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electromagnetism (AREA)
  • Manufacturing & Machinery (AREA)
  • Soft Magnetic Materials (AREA)
  • Manufacturing Of Steel Electrode Plates (AREA)

Abstract

The invention discloses a thin-specification oriented silicon steel plate with excellent manufacturability, which contains the following chemical elements in percentage by mass: si: 3.0-4.0%, C: 0.04-0.1%, Mn: 0.05-0.20%, S: 0.003-0.014%, Als: 0.015 to 0.04%, N: 0.001-0.010% and at least one of Cr, Mo, V and W, and the content of Cr + Mo + W + V is more than or equal to 0.03% and less than or equal to 0.2%. In addition, the invention also discloses a manufacturing method of the thin-specification oriented silicon steel plate, which comprises the following steps: steel making, hot rolling, normalizing, cold rolling, decarburization annealing, coating of a high-temperature separant, coiling, high-temperature annealing and hot stretching leveling annealing; wherein, when coating the high-temperature release agent, the coating weight D is controlled to be 10-22g/m2(ii) a When in coiling, the coiling tension F is controlled to be 60-160N/mm2And both satisfy 10 XD-100<F<10 XD + 20. The thin-specification oriented silicon steel plate disclosed by the invention adopts reasonable chemical components and process design, and not only has good manufacturability, but also has excellent electromagnetic performance.

Description

Thin-specification oriented silicon steel plate with excellent manufacturability and manufacturing method thereof
Technical Field
The invention relates to a metal material and a manufacturing method thereof, in particular to a thin-specification oriented silicon steel plate and a manufacturing method thereof.
Background
The Si content in the steel of the oriented silicon steel is 3-4%, and the oriented silicon steel is a soft magnetic functional material with the grain easy magnetization direction <001> parallel to the rolling direction and is mainly used for manufacturing transformer cores. The general production flow of the oriented silicon steel comprises steel making, hot rolling, normalizing, cold rolling, decarburization annealing, high-temperature separant coating, high-temperature annealing, hot stretching leveling annealing and the like. The finished thicknesses of the oriented silicon steel product are generally 0.23mm, 0.27mm and 0.30 mm. In recent years, since thin oriented silicon steel of 0.23mm or less has the advantages of low iron loss and excellent performance, more and more oriented silicon steel manufacturers begin to develop oriented silicon steel products with the thickness of 0.20mm, 0.18mm or even 0.15 mm.
However, in the hot-drawing leveling annealing process of thin oriented silicon steel with the thickness of 0.23mm or less, the problems of easy bonding and cracking at the edge, deviation and the like exist, the machine set stops and reduces the speed, the production efficiency and the yield are greatly reduced, and the problems of belt breakage, incapability of continuing production, rollback and the like even occur seriously; waste products such as parking spots, creases and the like or tail rolls are generated, and the product quality is greatly influenced. The manufacturability of the thin-specification oriented silicon steel in a hot-drawing flattening unit is a key technical problem influencing the yield and quality of products.
The "formation of adhesion and prevention of measures for the adhesion during the bell-type annealing of thin strip" published in pages 66 to 69 of 1996, world Steel, "page 3, considers that many factors are influencing the adhesion and needs to be comprehensively solved from the viewpoints of cold rolling tension, bell-type furnace annealing temperature, and the like. In addition, the "some discussion on the bonding problem of the bell-type annealed steel coil" (tomayu, liu jinghuan) published in the national conference on narrow strip production technology in 2003 suggests that: the surface roughness of the annealed steel strip can be reduced by reasonably controlling the normal stress of the steel strip, and the heat preservation time and the reduction rate in the rolling process are controlled, so that the annealing bonding rate is reduced from 48% to below 26%.
Above-mentioned scheme all is to ordinary cold drawing, is difficult to solve the bonding problem that thin specification oriented silicon steel plate exists, and the leading cause is:
(1) the component system and the texture of the oriented silicon steel are greatly different from those of the conventional cold rolled product, and the difference between the mechanical property, the heat conduction property and other physical characteristics of the oriented silicon steel is large;
(2) the highest temperature of the oriented silicon steel in high-temperature annealing is far higher than that of a cold plate, the temperature reaches 1200 ℃ or above, and the bonding phenomenon is more serious.
Japanese patent publication No. 2001-303137, published as 2001-10-31, entitled "method for producing grain-oriented silicon steel having excellent coil shape", discloses an oriented silicon steel sheet having excellent coil shape by controlling powder characteristics such as angle of repose, grain size and coil tension of a high-temperature release agent.
Disclosure of Invention
One of the objectives of the present invention is to provide a thin-gauge oriented silicon steel sheet with excellent manufacturability, which effectively improves the quality of the bottom layer of the substrate and reduces the adhesion and deviation through reasonable chemical composition design, and the iron loss P of the thin-gauge oriented silicon steel sheet17/50Less than 0.8W/Kg, magnetic induction B8The width of the finished product is more than 1.9T, the width of the finished product is more than 1000mm, the roll weight is more than 2T, and the electromagnetic steel has good manufacturability and excellent electromagnetic performance.
In order to achieve the above object, the present invention provides a thin gauge grain-oriented silicon steel sheet excellent in manufacturability, which contains the following chemical elements in mass percent in addition to Fe:
si: 3.0-4.0%, C: 0.04-0.1%, Mn: 0.05-0.20%, S: 0.003-0.014%, Als: 0.015 to 0.04%, N: 0.001-0.010% and at least one of Cr, Mo, W and V, and the content of Cr + Mo + W + V is more than or equal to 0.03% and less than or equal to 0.2%. Wherein Cr, Mo, V and W in the formula respectively represent the mass percent of the corresponding elements.
Further, in the thin-gauge oriented silicon steel plate of the present invention, the chemical elements thereof are, by mass:
si: 3.0-4.0%, C: 0.04-0.1%, Mn: 0.05-0.20%, S: 0.003-0.014%, Als: 0.015 to 0.04%, N: 0.001-0.010% and at least one of Cr, Mo, W and V, wherein the Cr + Mo + W + V is more than or equal to 0.03% and less than or equal to 0.2%, and the balance is Fe and other inevitable impurities. Wherein Cr, Mo, V and W in the formula respectively represent the mass percent of the corresponding elements.
In the thin-gauge oriented silicon steel plate of the present invention, the design principle of each chemical element is as follows:
si: in the thin oriented silicon steel plate, Si element can effectively improve the resistivity of the material and reduce the iron loss of steel. However, it should be noted that the higher the Si content in the steel, the poorer the manufacturability. When the content of Si element in the steel is higher than 4.0%, the cold rolling strip breakage rate is increased; if the content of Si in the steel is less than 3.0%, the effects of effectively reducing iron loss and improving performance cannot be achieved. Therefore, the mass percent of Si in the thin-specification oriented silicon steel plate is controlled to be 3.0-4.0%.
C: in the thin gauge grain-oriented silicon steel sheet according to the present invention, C may mainly form a gamma phase during hot rolling, and when the content of C element in the steel is less than 0.04%, an effective gamma phase may not be formed. However, it should be noted that if the content of C element in the steel is too high, exceeding 0.1%, decarburization becomes difficult. Therefore, the mass percent of C in the thin oriented silicon steel plate is controlled to be 0.04-0.1%.
Mn: in the thin-gauge oriented silicon steel plate, the Mn element has similar action to the Si element, and can also play a role in improving the resistivity of the material and reducing the iron loss of the steel. In addition, Mn and S may combine to form MnS as an inhibitor. However, it should be noted that the above effect cannot be obtained when the Mn element content in the steel is less than 0.05%, and the hot rolling workability and magnetic properties are deteriorated when the Mn element content in the steel is more than 0.20%. Therefore, the mass percent of Mn in the thin-specification oriented silicon steel plate is controlled to be 0.05-0.20%.
S: in the thin-gauge oriented silicon steel sheet according to the present invention, S is mainly combined with Mn, Cu, etc. to form MnS or CuS as an inhibitor. When the content of S in the steel is less than 0.003%, the above-described effects cannot be effectively achieved, whereas when the content of S in the steel is more than 0.014%, the clean desulfurization is difficult. Therefore, the mass percent of S in the thin oriented silicon steel plate is controlled to be 0.003-0.014%.
And Als: in the thin-gauge grain-oriented silicon steel sheet according to the present invention, Als mainly forms an AlN inhibitor with N. The quality of the bottom layer can be deteriorated if the content of Als in the steel is too high, and the inhibiting force cannot be exerted if the content of Als in the steel is too low. Therefore, the mass percent of Als in the thin-specification oriented silicon steel plate is controlled to be 0.015-0.04%.
N: in the thin gauge grain-oriented silicon steel sheet according to the present invention, N may form an AlN inhibitor with Als. If the content of N in the steel is less than 0.001%, the inhibitor is insufficient, and if the content of N in the steel is more than 0.010%, the steel-making casting is liable to bulge, and the product may have peeling and blister defects. Therefore, the mass percent of N in the thin-specification oriented silicon steel plate is controlled to be 0.001-0.010%.
Cr, Mo, W, V: in the thin oriented silicon steel plate, elements Cr, Mo, V and W are added to promote the surface oxidation of the strip steel in the decarburization annealing process and improve the quality of a bottom layer. If the amount of the elements Cr, Mo, V and W added is less than 0.03%, such effects cannot be exerted, and if the amount of the elements Cr, Mo, V and W added is more than 0.2%, the electromagnetic properties of the substrate deteriorate. Therefore, the mass percent of Cr, Mo, V and W elements added in the thin-specification oriented silicon steel plate is controlled to be more than or equal to 0.03% and less than or equal to 0.2%.
Furthermore, the mass percent of the elements Cr, Mo, V and W added into the thin-specification oriented silicon steel plate can be controlled to be more than or equal to 0.05 percent and less than or equal to 0.1 percent.
Further, in the thin gauge grain-oriented silicon steel sheet according to the present invention, the thickness thereof is 0.15mm to 0.23 mm.
Further, in the thin gauge oriented silicon steel sheet according to the present invention, the iron loss P is17/50Less than 0.8W/Kg, and its magnetic induction B8＞1.9T。
Accordingly, another object of the present invention is to provide a method for manufacturing a thin gauge grain-oriented silicon steel sheet with excellent manufacturability, which can effectively solve the manufacturability problems of adhesion, deviation and the like in the field production of the thin gauge grain-oriented silicon steel, and the iron loss P of the thin gauge grain-oriented silicon steel sheet manufactured by the method17/50Less than 0.8W/Kg, and its magnetic induction B8Is more than 1.9T, and has good manufacturability and excellent electromagnetic performance.
In order to achieve the above object, the present invention provides a method for manufacturing a thin gauge grain-oriented silicon steel sheet, comprising the steps of: steel making, hot rolling, normalizing, cold rolling, decarburization annealing, coating of a high-temperature separant, coiling, high-temperature annealing and hot stretching leveling annealing; wherein, when coating the high-temperature release agent, the coating weight D is controlled to be 10-22g/m2(ii) a When in coiling, the coiling tension F is controlled to be 60-160N/mm2And both satisfy 10 XD-100<F<10×D+20。
In the method for manufacturing the thin-specification oriented silicon steel plate, the process conditions, particularly the coiling tension and the coating amount of the release agent are designed, and the condition that the coiling tension is larger in the coiling step, the steel coil is wound too tightly to cause adhesion, so that the tension value is reduced, the adhesion is reduced, the situation that the adhesion is reduced is good, the tension value is not too small, the coil is loosened, and the deviation is generated when a finished product unit is produced, so that the final coiling tension F is limited to 60-160N/mm2In some preferred embodiments, the winding tension F can be controlled to 80-100N/mm for better working effect2In the meantime.
Accordingly, the coating amount of the release agent must be considered, and the larger the coating amount D, the less the release agent is bonded, but the more the release agent is coated, the less the release agent is bonded, or the release agent is loosened, so that a finished unit can be off-tracking during production. Therefore, the coating amount D of the release agent is limited to 10 to 22g/m2In some preferred embodiments, the coating weight D can also be controlled to be 13-19g/m2In the meantime.
Further, in the manufacturing method of the present invention, the winding tension F is controlled to be 80 to 100N/mm2。
Further, in the production method of the present invention, the coating amount D is controlled to be 13 to 19g/m2。
Further, in the manufacturing method of the present invention, a constant tension or a varying tension is used at the time of winding.
Further, in the production method according to the present invention, when winding is performed with a varying tension, the taper coefficient of the tension variation is greater than 1.0 and not more than 2.0.
In the above aspect, when winding is performed with a varying tension, the taper coefficient for controlling the variation in tension is greater than 1.0 and not greater than 2.0, and the roll shape can be further improved.
Further, in the manufacturing method of the present invention, the main component of the high-temperature insulator includes MgO.
Compared with the prior art, the thin-specification oriented silicon steel plate and the manufacturing method thereof have the advantages and beneficial effects that:
(1) the thin oriented silicon steel plate does not need to specially control the high-temperature release agent, and can effectively reduce the difficulty of components and process control.
(2) The thin-specification oriented silicon steel plate effectively improves the quality of the bottom layer of the substrate and reduces the adhesion and deviation through reasonable chemical composition design.
(3) The manufacturing method of the thin-specification oriented silicon steel plate eliminates the defects of bonding and deviation by properly matching the process conditions, particularly the coiling tension and the coating amount of the release agent, effectively ensures the quality and the performance of the manufactured thin-specification oriented silicon steel plate, and greatly improves the manufacturability of the thin-specification oriented silicon steel plate.
Drawings
Fig. 1 schematically shows the influence of the coating amount and the take-up tension on the manufacturability of thin gauge oriented silicon steel sheet.
Detailed Description
The thin gauge oriented silicon steel sheet and the method for manufacturing the same according to the present invention will be further explained and illustrated with reference to the following specific examples and drawings of the specification, however, the explanation and the illustration should not be construed as an undue limitation on the technical solution of the present invention.
Examples 1 to 12 and comparative examples 1 to 10
Table 1 shows the mass percentages of the respective chemical elements in the thin gauge oriented silicon steel sheets of examples 1 to 12 and comparative examples 1 to 10.
Table 1 (wt%, balance Fe and other unavoidable impurities except P, S)
Figure BDA0002514149250000051
Figure BDA0002514149250000061
The thin-gauge oriented silicon steel sheets of the embodiments 1 to 12 of the present invention are all prepared by the following steps:
(1) steel making: smelting and casting into a slab according to the chemical compositions of table 1;
(2) hot rolling;
(3) normalizing;
(4) cold rolling;
(5) decarburization annealing;
(6) coating a high-temperature release agent: controlling the coating weight D to be 10-22g/m2Preferably in the range of 13 to 19g/m2；
(7) Coiling: when in coiling, the coiling tension F is controlled to be 60-160N/mm2Preferably in the range of 80-100N/mm2And both F and D satisfy 10 XD-100<F<10 XD + 20; when the constant tension or the variable tension is adopted for coiling, the taper coefficient of the change of the tension is more than 1.0 and less than or equal to 2.0;
(8) annealing at high temperature;
(9) hot stretching, flattening and annealing;
in the step (6), a high-temperature release agent is applied, and the high-temperature release agent contains MgO as a main component.
Table 2 lists the specific process parameters of the manufacturing methods of the thin gauge oriented silicon steel sheets of examples 1 to 12 and comparative examples 1 to 10.
Table 2.
Figure BDA0002514149250000071
Note: note that the coefficient of taper of 1.0 is expressed as a constant tension.
The thin gauge oriented silicon steel sheets of examples 1 to 12 and comparative examples 1 to 10 were subjected to various performance tests, and the test results are shown in table 3.
Table 3 shows the results of the performance test of the thin gauge oriented silicon steel sheets of examples 1 to 12 and comparative examples 1 to 10.
Table 3.
Figure BDA0002514149250000072
Figure BDA0002514149250000081
It can be seen from table 1 and table 3 that in comparative example 1, because the addition amount of the element is insufficient, the adhesion or the off tracking occurs, and further the manufacturability of the thin-gauge oriented silicon steel sheet of comparative example 1, the manufacturability of the thin-gauge oriented silicon steel sheet of comparative example 1 is poor, the final cut edge is more, the width of the finished product is only 905mm, and the coil weight is only 1.8 t. Accordingly, comparative examples 2-4 have elements added in amounts greater than the design specifications of the present invention, and comparative examples 2-4, while having normal manufacturability, have a deteriorating effect on magnetic performance. Although the chemical components in the steels of the comparative examples 5 to 10 meet the design requirements of the invention, the related process parameters exist in the processes of coating the high-temperature release agent and coiling, and the parameters fail to meet the design specifications of the invention, wherein the process parameters of the coating weight D and the coiling tension F of the comparative examples 5 and 10 meet the requirements of the invention, but the coating weight D and the coiling tension F of the comparative examples 5 and 10 cannot meet 10 XD-100 < F <10 XD +20, the off-tracking occurrence rate is increased when the coiling tension is too small or the coating weight is too large, the adhesion occurrence rate is increased when the coiling tension is too large or the coating weight is too small, the through-plate property of the comparative examples 5 to 10 is poor, the width of the finished products is less than 1000mm, and the coil weight is less than 2 t.
The thin-specification oriented silicon steel plate provided by the embodiment of the invention has the advantages of good manufacturability, excellent electromagnetic performance and no bonding and deviation defects. The iron loss P17/50 of the thin oriented silicon steel plates of the embodiments 1 to 12 is less than 0.8W/Kg, the magnetic induction B8 is more than 1.9T, the width of the finished product is more than 1000mm, the coil weight is more than 2T, and the thin oriented silicon steel plates have good popularization and application values and prospects.
Fig. 1 schematically shows the influence of the coating amount and the take-up tension on the manufacturability of thin gauge oriented silicon steel sheet.
When the coating amount is less than 8g/m, as shown in FIG. 12In the case of the above, a product having good productivity cannot be obtained by adjusting the winding tension, and a product having good productivity cannot be obtained even when the winding tension is less than 40Mpa, so that it is seen that there is a proper match between the coating amount and the winding tension.
It should be noted that the prior art in the protection scope of the present invention is not limited to the examples given in the present application, and all the prior art which is not inconsistent with the technical scheme of the present invention, including but not limited to the prior patent documents, the prior publications and the like, can be included in the protection scope of the present invention. In addition, the combination of the features in the present application is not limited to the combination described in the claims of the present application or the combination described in the embodiments, and all the features described in the present application may be freely combined or combined in any manner unless contradictory to each other.
It should also be noted that the above-mentioned embodiments are only specific embodiments of the present invention. It is apparent that the present invention is not limited to the above embodiments and similar changes or modifications can be easily made by those skilled in the art from the disclosure of the present invention and shall fall within the scope of the present invention.

Claims (11)

1. A thin gauge grain-oriented silicon steel sheet excellent in manufacturability is characterized by containing the following chemical elements in mass percent in addition to Fe:
si: 3.0-4.0%, C: 0.04-0.1%, Mn: 0.05-0.20%, S: 0.003-0.014%, Als: 0.015 to 0.04%, N: 0.001-0.010% and at least one of Cr, Mo, W and V, and the content of Cr + Mo + W + V is more than or equal to 0.03% and less than or equal to 0.2%.
2. The thin gauge oriented silicon steel sheet according to claim 1, wherein the chemical elements are, in mass percent:
si: 3.0-4.0%, C: 0.04-0.1%, Mn: 0.05-0.20%, S: 0.003-0.014%, Als: 0.015 to 0.04%, N: 0.001-0.010% and at least one of Cr, Mo, W and V, wherein the Cr + Mo + W + V is more than or equal to 0.03% and less than or equal to 0.2%, and the balance is Fe and other inevitable impurities.
3. The thin gauge oriented silicon steel sheet according to claim 1 or 2, wherein the mass percentage of Cr, Mo, W, V is 0.05% or more and Mo + W + V or less and 0.1% or less.
4. The thin gauge oriented silicon steel sheet according to claim 1 or 2, wherein the thickness thereof is 0.15mm to 0.23 mm.
5. The thin gauge oriented silicon steel sheet according to claim 1 or 2, wherein the iron loss P17/50 is less than 0.8W/Kg, the magnetic induction B8 is more than 1.9T, and the finished product width is more than 1000 mm.
6. A method for manufacturing thin gauge oriented silicon steel sheet as claimed in any one of claims 1 to 5, comprising the steps of: steel making, hot rolling, normalizing, cold rolling, decarburization annealing, coating of a high-temperature separant, coiling, high-temperature annealing and hot stretching leveling annealing; wherein, when coating the high-temperature release agent, the coating weight D is controlled to be 10-22g/m2(ii) a When in coiling, the coiling tension F is controlled to be 60-160N/mm2And both satisfy 10 XD-100<F<10×D+20。
7. The manufacturing method according to claim 6, wherein the winding tension F is controlled to be 80 to 100N/mm2。
8. The production method according to claim 6, wherein the coating amount D is controlled to 13 to 19g/m2。
9. The manufacturing method according to claim 6, wherein a constant tension or a varying tension is used at the time of winding.
10. The manufacturing method according to claim 9, wherein when the winding is performed with a varying tension, a taper coefficient of the tension variation is more than 1.0 and 2.0 or less.
11. The manufacturing method according to claim 6, wherein the main component of the high-temperature insulator includes MgO.
CN202010470542.0A 2020-05-28 2020-05-28 Thin-specification oriented silicon steel plate with excellent manufacturability and manufacturing method thereof Pending CN113737101A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202010470542.0A CN113737101A (en) 2020-05-28 2020-05-28 Thin-specification oriented silicon steel plate with excellent manufacturability and manufacturing method thereof
PCT/CN2021/096391 WO2021239057A1 (en) 2020-05-28 2021-05-27 Thin-gauge oriented silicon steel plate having excellent manufacturability, and manufacturing method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010470542.0A CN113737101A (en) 2020-05-28 2020-05-28 Thin-specification oriented silicon steel plate with excellent manufacturability and manufacturing method thereof

Publications (1)

Publication Number Publication Date
CN113737101A true CN113737101A (en) 2021-12-03

Family

ID=78724313

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010470542.0A Pending CN113737101A (en) 2020-05-28 2020-05-28 Thin-specification oriented silicon steel plate with excellent manufacturability and manufacturing method thereof

Country Status (2)

Country Link
CN (1) CN113737101A (en)
WO (1) WO2021239057A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114635027A (en) * 2022-03-11 2022-06-17 安阳钢铁股份有限公司 Normalizing process for stabilizing AlN restraining force of low-temperature high-magnetic-induction oriented silicon steel
CN115074520B (en) * 2022-05-20 2023-11-14 本钢板材股份有限公司 Method for controlling shape of extremely-thin wide cold-rolled outer plate
CN115058573B (en) * 2022-06-20 2024-01-16 马鞍山钢铁股份有限公司 Production method for high-grade non-oriented silicon steel after strip breakage during primary cold rolling

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1254021A (en) * 1998-09-18 2000-05-24 川崎制铁株式会社 Grain-oriented silicon-iron plate with excellent tectorial memebrane property and magnetic property
CN103069032A (en) * 2010-08-06 2013-04-24 杰富意钢铁株式会社 Grain oriented electrical steel sheet and method for manufacturing the same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100340495B1 (en) * 1997-06-27 2002-11-22 주식회사 포스코 Method for manufacturing grain oriented electric steel sheet with high magnetic density
KR100321044B1 (en) * 1997-12-19 2002-03-08 이구택 Method for manufacturing grain oriented silicon steel sheets with high magnetic flux density
KR100435479B1 (en) * 1999-12-27 2004-06-10 주식회사 포스코 A method for manufacturing low temperature slab reheating grain-oriented electrical steel sheet with superior film property
JP5593942B2 (en) * 2010-08-06 2014-09-24 Ｊｆｅスチール株式会社 Oriented electrical steel sheet and manufacturing method thereof
CN104342548B (en) * 2013-07-30 2016-10-05 宝山钢铁股份有限公司 The method for coiling of orientation silicon steel MgO coating coil of strip
CN110218853B (en) * 2019-06-26 2020-11-24 武汉钢铁有限公司 Process method for preparing low-temperature high-magnetic-induction oriented silicon steel

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1254021A (en) * 1998-09-18 2000-05-24 川崎制铁株式会社 Grain-oriented silicon-iron plate with excellent tectorial memebrane property and magnetic property
CN103069032A (en) * 2010-08-06 2013-04-24 杰富意钢铁株式会社 Grain oriented electrical steel sheet and method for manufacturing the same

Also Published As

Publication number Publication date
WO2021239057A1 (en) 2021-12-02

Similar Documents

Publication Publication Date Title
JP5780013B2 (en) Method for producing non-oriented electrical steel sheet
CN113737101A (en) Thin-specification oriented silicon steel plate with excellent manufacturability and manufacturing method thereof
CN109844156B (en) Hot-rolled steel sheet for producing electromagnetic steel sheet and method for producing same
US20150243419A1 (en) Method for producing grain-oriented electrical steel sheet
TW201233813A (en) Process for production of non-oriented electromagnetic steel sheet
JP5760590B2 (en) Method for producing grain-oriented electrical steel sheet
JPWO2011148849A1 (en) Manufacturing method of unidirectional electrical steel sheet
JP5831435B2 (en) Method for producing grain-oriented electrical steel sheets with excellent magnetic properties
JP2008127659A (en) Non-oriented electromagnetic steel sheet with less anisotropy
JP5644154B2 (en) Method for producing grain-oriented electrical steel sheet
JP5287615B2 (en) Method for producing grain-oriented electrical steel sheet
JP7028337B2 (en) Non-oriented electrical steel sheet and manufacturing method of laminated core using it
EP2243865B1 (en) Grain-oriented electromagnetic steel sheet excellent in magnetic characteristics
JP3531996B2 (en) Method of manufacturing unidirectional electromagnetic steel strip
JP5920387B2 (en) Method for producing grain-oriented electrical steel sheet
JP2953978B2 (en) Thick grain-oriented electrical steel sheet having no glass coating with excellent insulating coating properties and method for producing the same
JP2023554123A (en) Non-oriented electrical steel sheet and its manufacturing method
JPS6311406B2 (en)
JP2005002401A (en) Method for producing non-oriented silicon steel sheet
JP3893759B2 (en) Method for producing grain-oriented silicon steel sheet
JP4016552B2 (en) Method for producing non-oriented electrical steel sheets with excellent magnetic properties and surface properties
JP3350351B2 (en) Manufacturing method of non-oriented electrical steel sheet with excellent shape and magnetic properties
JP5310510B2 (en) Method for producing grain-oriented electrical steel sheet
JP2002080948A (en) Nonoriented silicon steel sheet having excellent blanking workability
JP7338812B1 (en) Manufacturing method of grain-oriented electrical steel sheet

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20211203