CN113699784A - 一种具有防紫外线功能的面料及其制备方法和应用 - Google Patents
一种具有防紫外线功能的面料及其制备方法和应用 Download PDFInfo
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Abstract
本发明属于纺织品技术领域,公开了一种具有防紫外线功能的面料及其制备方法和应用,该面料包括基布和氧化铌纳米膜层,氧化铌纳米膜层沉积在基布的表面上。该面料通过对基布的表面依次进行离子源清洗和磁控溅射得到。本发明面料的颜色会随着紫外线的照射越来越深,颜色越深,阻挡紫外线的能力越强,随着紫外线照射时间的增加,防紫外线性能增强,同时氧化铌纳米膜层的厚度为纳米级别,厚度非常薄,使得面料的柔软度和透气性与未沉积膜层前基本一致。
Description
技术领域
本发明属于纺织品技术领域,特别涉及一种具有防紫外线功能的面料及其制备方法和应用。
背景技术
紫外线辐射可以使人体皮肤变黑,加速皮肤老化,若皮肤长时间暴露在强紫外线环境中,严重地会导致皮肤病或皮肤癌。所以,具有防紫外线功能的面料被不断开发出来。根据国家标准GB/T 18830-2009《纺织品防紫外线性能的评定》的规定,只有当样品的UPF(紫外线防护系数)值大于40,并且T(UVA)AV(日光紫外线UVA透射比)的透过率小于5%时,才能称之为“防紫外线产品”,这两个条件缺一不可。这是衡量一种产品是不是“防紫外线产品”的指标。目前,国内外研制防紫外线面料的方法主要是利用化学方法在面料表面涂覆一层防紫外涂层,该方法制备的面料的防紫外线效果不佳,同时透气性和舒适性较差。
发明内容
本发明旨在至少解决上述现有技术中存在的技术问题之一。为此,本发明提出一种具有防紫外线功能的面料,具有较强的防紫外线功能,且具有良好的透气性和柔软度。
本发明的第一方面提供一种具有防紫外线功能的面料。
具体的,一种具有防紫外线功能的面料,包括基布和氧化铌纳米膜层,所述氧化铌纳米膜层沉积在所述基布的表面上。
优选地,所述氧化铌纳米膜层为五氧化二铌纳米膜层。
优选地,所述氧化铌纳米膜层的厚度为20~600nm。
优选地,所述基布的材质为涤纶、丙纶或纯棉。
本发明的第二方面提供所述具有防紫外线功能的面料的制备方法。
具体的,一种具有防紫外线功能的面料的制备方法,包括以下步骤:
对所述基布的表面依次进行离子源清洗和磁控溅射,得到所述面料。
离子源清洗为低温等离子体表面改性技术,它是利用等离子体中的高能粒子(电子、离子、自由基等)对基布表面进行轰击,产生氧化、刻蚀等作用,清洁基布的表面并产生一定的活化作用,增加基布的表面活性和表面粗糙度,使基布与其它材料的化学键合、物理嵌合作用增强,进而增强其它材料与基布界面之间的结合牢度,有利于纳米粒子沉积时与基布表面的结合。
优选地,进行离子源清洗前还包括预处理,所述预处理具体过程为:将所述基布用水清洗,去除基布的表面污渍,烘干去除水分。
优选地,所述离子源清洗的具体条件为:采用氩气和金属离子源对所述基布的表面进行轰击;所述离子源清洗的频率为22~26KHz,氩气的流量为500~550sccm,偏压为400~500V。
优选地,所述金属离子源采用Ti、Cr、Ni或不锈钢作为离子源。优选采用Ti作为离子源。
优选地,进行磁控溅射前还包括对靶材进行预溅射,清除靶材表面的杂质,预溅射的真空度为0.003~0.005Pa。
优选地,所述磁控溅射的具体条件为:使用Nb作为靶材,靶材的生产电流设置为10~100A,氩气和氧气的体积比为0.2~3:1,真空度为0.08~0.3Pa。
本发明的第三方面提供所述具有防紫外线功能的面料在纺织品中的应用。
优选的,一种服装,包括本发明所述具有防紫外线功能的面料。
相对于现有技术,本发明的有益效果如下:
本发明具有防紫外线功能的面料,包括基布和氧化铌纳米膜层,氧化铌纳米膜层沉积在基布的表面上,该氧化铌纳米膜层的颜色会随着紫外线的照射越来越深,颜色越深,阻挡紫外线的能力越强,随着紫外线照射时间的增加,防紫外线性能增强,同时该氧化铌纳米膜层的厚度为纳米级别,厚度非常薄,使得面料的柔软度和透气性与未沉积膜层前基本一致。
附图说明
图1是本发明实施例1的面料的结构示意图;
图2是本发明实施例1的面料的SEM图;
图3是本发明实施例1的面料经过皂洗后的SEM图;
图4是本发明对比例1的面料的SEM图。
图中,100-春亚纺基布,200-五氧化二铌纳米膜层。
具体实施方式
为了让本领域技术人员更加清楚明白本发明所述技术方案,现列举以下实施例进行说明。需要指出的是,以下实施例对本发明要求的保护范围不构成限制作用。
以下实施例中所用的原料、试剂或装置如无特殊说明,均可从常规商业途径得到,或者可以通过现有已知方法得到。
实施例1
如图1所示,一种具有防紫外线功能的面料,包括春亚纺基布100和五氧化二铌纳米膜层200,五氧化二铌纳米膜层200沉积在春亚纺基布100的表面上。
该具有防紫外线功能的面料的制备方法,包括以下步骤:
1)将春亚纺基布用清水清洗,去除表面污渍,并使用蒸汽烘干去除水分;
2)将烘干后的春亚纺基布接入镀膜机的放卷装置上,并使春亚纺基布在放卷装置的表面保持平整,随后工作腔室开始抽气,待真空度达到0.003Pa时,对此次生产所需的全部Nb靶材进行预溅射,以去除靶材表面的氮化物、氧化物等,提高靶材的溅射速率;
3)对春亚纺基布进行离子源清洗,包括采用氩气和Ti离子源对春亚纺基布的表面进行轰击;离子源清洗的频率为22KHz,氩气的流量为500sccm,偏压为400V;
4)车速为1m/min,对经过离子源清洗后的春亚纺基布的表面进行磁控溅射,以沉积五氧化二铌纳米膜层,得到所述面料;磁控溅射的条件为:使用Nb作为靶材,数量为2个,每个靶材的生产电流设置为30A,对应总功率为24kW,氩气总流量为800sccm,氧气总流量为300sccm,靶材溅射期间工作腔室的真空度保持在0.2Pa,使制得的五氧化二铌纳米膜层的厚度为20nm。
如图2所示,图2为本实施例所得面料的扫描电子显微镜(SEM)图,由图2可看出,基布的表面沉积有由大量的五氧化二铌纳米粒子(图中白点)构成的纳米膜层。
将本实施例所得面料经过常规皂洗后,再对其进行扫描,由图3可以看出,皂洗后的五氧化二铌纳米粒子仍沉积在基布的表面。主要原因在于,经过离子源清洗处理后的基布表面的粗糙度增加,在高能磁控溅射粒子的作用下更易局部软化和熔融,从而对五氧化二铌纳米粒子的粘结作用更牢固。
实施例2
一种具有防紫外线功能的面料,包括仿真丝基布和五氧化二铌纳米膜层,五氧化二铌纳米膜层沉积在仿真丝基布的表面上。
该具有防紫外线功能的面料的制备方法,包括以下步骤:
1)将仿真丝基布用清水清洗,去除表面污渍,并使用蒸汽烘干去除水分;
2)将烘干后的仿真丝基布接入镀膜机的放卷装置上,并使仿真丝基布在放卷装置的表面保持平整,随后工作腔室开始抽气,待真空度达到0.005Pa时,对此次生产所需的全部Nb靶材进行预溅射,以去除靶材表面的氮化物、氧化物等,提高靶材的溅射速率;
3)对仿真丝基布进行离子源清洗,包括采用氩气和Ti离子源对仿真丝基布的表面进行轰击;离子源清洗的频率为26KHz,氩气的流量为550sccm,偏压为500V;
4)车速为1m/min,对经过离子源清洗后的仿真丝基布的表面进行磁控溅射,以沉积五氧化二铌纳米膜层,得到所述面料;磁控溅射的条件为:使用Nb作为靶材,数量为20个,仿真丝基布在靶材溅射下来回沉积3次,每个靶材的生产电流设置为30A,对应总功率为720kW,氩气总流量为500sccm,氧气总流量为500sccm,,靶材溅射期间工作腔室的真空度保持在0.13Pa,使制得的五氧化二铌纳米膜层的厚度为600nm。
实施例3
一种具有防紫外线功能的面料,包括春亚纺基布和五氧化二铌纳米膜层,五氧化二铌纳米膜层沉积在春亚纺基布的表面上。
该具有防紫外线功能的面料的制备方法,包括以下步骤:
1)将春亚纺基布用清水清洗,去除表面污渍,并使用蒸汽烘干去除水分;
2)将烘干后的春亚纺基布接入镀膜机的放卷装置上,并使春亚纺基布在放卷装置的表面保持平整,随后工作腔室开始抽气,待真空度达到0.003Pa时,对此次生产所需的全部Nb靶材进行预溅射,以去除靶材表面的氮化物、氧化物等,提高靶材的溅射速率;
3)对春亚纺基布进行离子源清洗,包括采用氩气和Cr离子源对春亚纺基布的表面进行轰击;离子源清洗的频率为24KHz,氩气的流量为520sccm,偏压为450V;
4)车速为1.5m/min,对经过离子源清洗后的春亚纺基布的表面进行磁控溅射,以沉积五氧化二铌纳米膜层,得到所述面料;磁控溅射的条件为:使用Nb作为靶材,数量为10个,春亚纺基布在靶材溅射下来回沉积2次,每个靶材的生产电流设置为30A,对应总功率为360kW,氩气总流量为100sccm,氧气总流量为500sccm,靶材溅射期间工作腔室的真空度保持在0.08Pa,使制得的五氧化二铌纳米膜层的厚度为300nm。
实施例4
一种具有防紫外线功能的面料,包括春亚纺基布和五氧化二铌纳米膜层,五氧化二铌纳米膜层沉积在春亚纺基布的表面上。
该具有防紫外线功能的面料的制备方法,包括以下步骤:
1)将春亚纺基布用清水清洗,去除表面污渍,并使用蒸汽烘干去除水分;
2)将烘干后的春亚纺基布接入镀膜机的放卷装置上,并使春亚纺基布在放卷装置的表面保持平整,随后工作腔室开始抽气,待真空度达到0.003Pa时,对此次生产所需的全部Nb靶材进行预溅射,以去除靶材表面的氮化物、氧化物等,提高靶材的溅射速率;
3)对春亚纺基布进行离子源清洗,包括采用氩气和Ti离子源对春亚纺基布的表面进行轰击;离子源清洗的频率为22KHz,氩气的流量为500sccm,偏压为400V;
4)车速为1m/min,对经过离子源清洗后的春亚纺基布的表面进行磁控溅射,以沉积五氧化二铌纳米膜层,得到所述面料;磁控溅射的条件为:使用Nb作为靶材,数量为2个,每个靶材的生产电流设置为30A,对应总功率为24kW,氩气总流量为800sccm,氧气总流量为300sccm,靶材溅射期间工作腔室的真空度保持在0.2Pa,使制得的五氧化二铌纳米膜层的厚度为10nm。
实施例5
一种具有防紫外线功能的面料,包括春亚纺基布和五氧化二铌纳米膜层,五氧化二铌纳米膜层沉积在春亚纺基布的表面上。
该具有防紫外线功能的面料的制备方法,包括以下步骤:
1)将春亚纺基布用清水清洗,去除表面污渍,并使用蒸汽烘干去除水分;
2)将烘干后的春亚纺基布接入镀膜机的放卷装置上,并使春亚纺基布在放卷装置的表面保持平整,随后工作腔室开始抽气,待真空度达到0.005Pa时,对此次生产所需的全部Nb靶材进行预溅射,以去除靶材表面的氮化物、氧化物等,提高靶材的溅射速率;
3)对春亚纺基布进行离子源清洗,包括采用氩气和Ti离子源对春亚纺基布的表面进行轰击;离子源清洗的频率为26KHz,氩气的流量为550sccm,偏压为500V;
4)车速为1m/min,对经过离子源清洗后的春亚纺基布的表面进行磁控溅射,以沉积五氧化二铌纳米膜层,得到所述面料;磁控溅射的条件为:使用Nb作为靶材,数量为20个,春亚纺基布在靶材溅射下来回沉积3次,每个靶材的生产电流设置为30A,对应总功率为720kW,氩气总流量为500sccm,氧气总流量为500sccm,靶材溅射期间工作腔室的真空度保持在0.13Pa,使制得的五氧化二铌纳米膜层的厚度为700nm。
对比例1(与实施例1的区别在于未对基布进行离子源清洗)
一种面料的制备方法,包括以下步骤:
1)将春亚纺基布用清水清洗,去除表面污渍,并使用蒸汽烘干去除水分;
2)将烘干后的春亚纺基布接入镀膜机的放卷装置上,并使春亚纺基布在放卷装置的表面保持平整,随后工作腔室开始抽气,待真空度达到0.003Pa时,对此次生产所需的全部Nb靶材进行预溅射,以去除靶材表面的氮化物、氧化物等,提高靶材的溅射速率;
3)车速为1m/min,对春亚纺基布的表面进行磁控溅射,以沉积五氧化二铌纳米膜层,得到所述面料;磁控溅射的条件为:使用Nb作为靶材,数量为2个,每个靶材的生产电流设置为30A,对应总功率为24kW,氩气总流量为800sccm,氧气总流量为300sccm,靶材溅射期间工作腔室的真空度保持在0.2Pa。
如图4所示,图4为本对比例所得面料的扫描电子显微镜(SEM)图,由图4可看出,基布的表面仅沉积有极少量的五氧化二铌纳米粒子(图中白点)。
效果测试
1.色牢度检测
按照GB 18401-2010《国家纺织产品基本安全技术规范》标准A类产品对色牢度的要求,分别对实施例1-5及对比例1制备的面料进行测试,结果见表1所示。
表1
由表1可以看出,本发明实施例1-5所得的面料的染色牢度均达到了标准要求,而对比例1所得的面料的染色牢度明显低于实施例1-5,未达到标准要求,说明本发明通过对基布进行离子源清洗,有利于五氧化二铌纳米膜层与基布表面的结合,染色牢度高。将实施例1-5中基布的材质替换为丙纶或纯棉等,所得的面料仍具有与实施例1-5所得面料同等的染色牢度。
2.透气性检测
按照GB 5453-1997《纺织品织物透气性的测定》标准,分别对实施例1-5及对比例1制备的面料进行测试,结果见表2所示。
表2
由表2可以看出,实施例1-5及对比例1所得面料的透气率与所用基布的透气率相比变化很小,说明书在基布的表面进行磁控溅射沉积纳米膜层,对透气性的影响非常小,最终所得的面料能够保持原有的透气性。将实施例1-5中基布的材质替换为丙纶或纯棉等,所得的面料仍具有与实施例1-5所得面料同等的透气性。
3.防紫外线检测
按照GB 18830-2009《防紫外线性能的评定》标准,分别对实施例1-5及对比例1制备的面料进行测试,在紫外线下照射5分钟、24小时以及5天后,检测,结果见表3所示。
表3
其中日光紫外线UVA指的是波长在315~400nm的日光紫外线辐射。日光紫外线UVB指的是波长在280~315nm的日光紫外线辐射。
由表3可以看出,本发明实施例1-5所得的面料均具有防紫外线的性能,说明本发明的五氧化二铌纳米膜层具有阻挡紫外线的能力,而且随着紫外线照射时间的增加,面料的防紫外线性能增强。将实施例1、实施例4和实施例5对比可知,实施例4和实施例5所得面料虽然也具有一定的防紫外线性能,但是明显低于实施例1所得的面料,说明五氧化二铌纳米膜层的厚度较薄或者较厚,其防紫外线性能均会降低。将实施例1和对比例1对比可知,对比例1由于未对基布进行离子源清洗,后续进行磁控溅射后,基布的表面仅沉积有极少量的五氧化二铌纳米粒子,最终所得的面料不具有防紫外线性能。将实施例1-5中基布的材质替换为丙纶或纯棉等,所得的面料仍具有与实施例1-5所得面料同等的防紫外线性能。
以上对本发明的较佳实施方式进行了具体说明,但本发明创造并不限于所述实施例,熟悉本领域的技术人员在不违背本发明精神的前提下还可作出种种的等同变型或替换,这些等同的变型或替换均包含在本申请权利要求所限定的范围内。
Claims (10)
1.一种面料,其特征在于,包括基布和氧化铌纳米膜层,所述氧化铌纳米膜层沉积在所述基布的表面上。
2.根据权利要求1所述的面料,其特征在于,所述氧化铌纳米膜层为五氧化二铌纳米膜层。
3.根据权利要求1所述的面料,其特征在于,所述氧化铌纳米膜层的厚度为20~600nm。
4.根据权利要求1所述的面料,其特征在于,所述基布的材质为涤纶、丙纶或纯棉。
5.权利要求1-4任一项所述的面料的制备方法,其特征在于,包括以下步骤:
对所述基布的表面依次进行离子源清洗和磁控溅射,得到所述面料。
6.根据权利要求5所述的制备方法,其特征在于,所述离子源清洗的具体条件为:采用氩气和金属离子源对所述基布的表面进行轰击;所述离子源清洗的频率为22~26KHz,氩气的流量为500~550sccm,偏压为400~500V。
7.根据权利要求6所述的制备方法,其特征在于,所述金属离子源采用Ti、Cr、Ni或不锈钢作为离子源。
8.根据权利要求5所述的制备方法,其特征在于,所述磁控溅射的具体条件为:使用Nb作为靶材,靶材的生产电流设置为10~100A,氩气和氧气的体积比为0.2~3:1,真空度为0.08~0.3Pa。
9.权利要求1-4任一项所述的面料在纺织品中的应用。
10.一种服装,其特征在于,包括权利要求1-4任一项所述的面料。
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