CN113699561A - Electrolysis or electrodeposition device and installation method thereof - Google Patents

Abstract

The invention provides an electrolysis or electrodeposition device and an installation method thereof, belonging to the technical field of electrolysis and electrodeposition equipment for nonferrous metal hydrometallurgy, wherein the electrolysis or electrodeposition device realizes that under the same electrolyte feeding pressure, the outlet lift of electrolyte at a liquid feeding nozzle of a main liquid feeding device is higher, and the outlet lift at a liquid feeding nozzle of an auxiliary liquid feeding device is lower, so that the traction speed of the main liquid feeding device on metal ions in the electrolyte is higher than that of the auxiliary liquid feeding device, the purposes of facilitating the settlement of anode mud and inhibiting the generation of floating anode mud are achieved, and the anode passivation phenomenon on the surface of an anode plate is effectively weakened; meanwhile, the electrolyte entering the tank body through the auxiliary liquid feeding device can effectively supplement kinetic energy and heat required by the internal circulation of the solution in the tank body, thereby being beneficial to maintaining the temperature balance of the solution in the tank body, avoiding the generation of the phenomenon of local supercooling or overheating and effectively weakening the phenomenon of concentration polarization on the surface of the cathode plate.

Description

Electrolysis or electrodeposition device and installation method thereof

Technical Field

The invention belongs to the technical field of electrolysis and electrodeposition equipment for non-ferrous metal hydrometallurgy, and particularly relates to an electrolysis or electrodeposition device and an installation method of the device.

Background

In the technical field of electrolysis and electrodeposition of hydrometallurgy, how to increase the contact chance of non-ferrous metal cations in electrolyte and cathodes, accelerate cation diffusion around anodes, and reduce concentration polarization and anode passivation in the copper electrolysis process is always a hot point and a difficult point of technical research.

At present, the circulation mode of solution in conventional electrolysis trough or electrodeposition tank mainly divide into and goes into down to go out or goes into up and go out down, gets into the cell body through control solution from one end, all easily causes the solution diffusion uneven, perhaps concentrates the feed liquor from cell body upper portion or lower part, and the direction confusion is sent out in all easily causing the interior solution flow of cell body, causes to be unfavorable for promoting by a wide margin of current density and subsides of anode mud. In recent years, applied bidirectional parallel flow electrolysis techniques have been developed, such as: the electrolysis or electrodeposition device with the solution parallel bidirectional rotary flow of patent No. 201020128861.5 adopts the technology that the liquid is fed from the upper parts of two sides of a tank body, the cathode current density is greatly improved by increasing the circulation volume of the solution, and the sedimentation influence on anode mud is improved; however, this method is likely to cause the solution flow direction to be staggered and cause solution mixing, and because the newly entered upper solution is a hot solution, which is not favorable for the solution to sink, a liquid guiding groove needs to be added at the overflow port, thereby increasing the solution flow resistance, not favorable for the solution diffusion efficiency, and the concentration polarization on the surface of the cathode plate and the anode passivation on the surface of the anode plate are likely to occur.

Disclosure of Invention

In order to solve the technical problems, the invention provides an electrolysis or electrodeposition device, which realizes the effect of internal circulation flow of electrolyte in a tank, enables the solution to be distributed more uniformly, reduces the temperature gradient of the electrolyte in the tank, and effectively weakens the concentration polarization on the surface of a cathode plate and the anode passivation phenomenon on the surface of an anode plate.

The invention provides the following technical scheme that an electrolysis or electrodeposition device comprises

The upper end of the tank body is provided with an overflow trough;

the anode plates are suspended in the inner cavity of the tank body;

the plurality of cathode plates are suspended in the inner cavity of the groove body, and the anode plates and the cathode plates are arranged in parallel at equal intervals; preferably, the electrolysis or electrodeposition device further comprises a main liquid feeding device and an auxiliary liquid feeding device, wherein the main liquid feeding device and the auxiliary liquid feeding device form a preset height difference, and the main liquid feeding device and the auxiliary liquid feeding device are respectively arranged on the inner side wall of the tank body and are oppositely arranged; the liquid feeding port of the main liquid feeding device positioned at the upper part of the inner side wall of the tank body is lower than the production liquid level line of the tank body, and the height difference between the liquid feeding port of the auxiliary liquid feeding device positioned at the lower part of the side wall of the tank body and the lower end of the anode plate or the cathode plate is within a preset range; and the electrolyte is sprayed into the tank body along the arrangement direction parallel to the anode plate or the cathode plate through the main liquid feeding device and the auxiliary liquid feeding device respectively so as to enable the solution in the tank body to form internal circulation flow, and meanwhile, redundant electrolyte in the tank body is discharged through the overflow groove.

Compared with the prior art, the invention has the beneficial effects that: under the same electrolyte feeding pressure, the outlet lift of the electrolyte at the liquid feeding nozzle of the main liquid feeding device is higher, and the outlet lift at the liquid feeding nozzle of the auxiliary liquid feeding device is lower, so that the traction speed of the main liquid feeding device to metal ions in the electrolyte is higher than that of the auxiliary liquid feeding device, the purposes of facilitating the settlement of anode mud and inhibiting the generation of floating anode mud are achieved, and the anode passivation phenomenon on the surface of the anode plate is effectively weakened; meanwhile, the electrolyte entering the tank body through the auxiliary liquid feeding device can effectively supplement kinetic energy and heat required by the internal circulation of the solution in the tank body, thereby being beneficial to maintaining the temperature balance of the solution in the tank body, avoiding the generation of local supercooling or overheating phenomenon, effectively weakening the concentration polarization phenomenon on the surface of the cathode plate and further improving the quality of cathode products.

Preferably, the bottom of the cavity of the inner cavity of the tank body is in an inclined plane structure, and the bottom of the cavity on the same side of the main liquid feeding device inclines towards the bottom of the cavity on the same side of the auxiliary liquid feeding device to form the inclined plane structure.

Preferably, the included angle between the inclined plane structure and the horizontal plane is 2-5 degrees.

Preferably, the bottom of the tank body is provided with an anode mud port and a supernatant port; the anode mud port is positioned at the lower position of the bottom of the tank body, and the supernatant fluid port is positioned at the upper position of the bottom of the tank body.

Preferably, the preset range is-150 mm.

Preferably, the main liquid supply device and the auxiliary liquid supply device respectively comprise a liquid supply main pipe, a flow regulating valve, a liquid guide pipe and a plurality of liquid supply nozzles; the liquid supply main pipe is arranged on the inner side wall of the tank body, and two ends of the liquid guide pipe are respectively communicated with the liquid supply main pipe and the flow regulating valve; the liquid feeding nozzles are arranged on the liquid feeding main pipe and are all far away from one side of the liquid feeding main pipe on the inner side wall of the tank body at equal intervals.

Preferably, the installation direction of the liquid feeding main pipe is perpendicular to the direction of the anode plate or the cathode plate, and the injection directions of the plurality of liquid feeding nozzles on the same liquid feeding main pipe are parallel to the direction of the anode plate or the cathode plate.

Preferably, the preset height difference between the liquid feeding main pipe of the main liquid feeding device and the liquid feeding main pipe of the auxiliary liquid feeding device is 800 mm-1200 mm.

Preferably, the cross section of the liquid supply main pipe is of a square structure.

The invention also provides an installation method of the electrolysis or electrodeposition device, wherein the electrolysis or electrodeposition device is the electrolysis or electrodeposition device; the installation method comprises the following steps:

step 1, uniformly arranging a plurality of liquid feeding nozzles on the side walls of two liquid feeding main pipes, wherein the liquid feeding nozzles are linearly arranged, and are in threaded connection or embedded connection with the liquid feeding main pipes;

step 2, fixing the two liquid feeding main pipes provided with the liquid feeding nozzles on two opposite inner side walls of the tank body respectively in a pre-buried bolt or pre-buried pipe bracket mode, wherein the two liquid feeding main pipes are arranged in parallel with each other at a height difference of 800-1200 mm; wherein the liquid supply main pipe at a high position is the liquid supply main pipe of the main liquid supply device, and the liquid supply main pipe at a low position is the liquid supply main pipe of the auxiliary liquid supply device; the nozzle opening of the liquid feeding nozzle of the main liquid feeding device is positioned in a position which is 20 mm-100 mm lower than the production liquid level line of the tank body;

step 3, connecting the liquid inlet ends of the two liquid feeding main pipes with the corresponding flow regulating valves through the liquid guide pipes respectively so as to regulate the flow and the flow speed of the electrolyte and supply the electrolyte to the main liquid feeding device and the auxiliary liquid feeding device; the liquid supply main pipe is connected with the liquid guide pipe through a flange, and the flow regulating valve is fixedly supported by the aid of the groove body;

step 4, supporting a sleeve formed by the anode plates and the cathode plates which are arranged at equal intervals by a base plate arranged at the groove opening end of the groove body, so that the anode plates and the cathode plates are suspended in the inner cavity of the groove body; and controlling the height difference between the nozzle opening of the liquid feeding nozzle of the auxiliary liquid feeding device and the bottom edge of the anode plate or the cathode plate to be in the range of-150 mm.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the embodiments or the prior art descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.

FIG. 1 is a cross-sectional view of an electrolytic or electro-deposition device (not equipped with a flow control valve and a catheter) according to an embodiment of the present invention;

FIG. 2 is a schematic view of a main liquid supply device and a tank body installation position (when no polar plate and no auxiliary liquid supply device are installed) provided by an embodiment of the invention;

FIG. 3 is a partially enlarged schematic view of the section A in FIG. 2;

FIG. 4 is a top view of an electrolytic or electro-deposition device (without a flow control valve, a catheter and a plate) according to an embodiment of the present invention.

FIG. 5 is a partially enlarged schematic view of the section B in FIG. 2;

FIG. 6 is a schematic view of an installation position of an auxiliary liquid feeding device and a tank (when no polar plate and no main liquid feeding device are installed) according to an embodiment of the present invention;

description of reference numerals:

10-a tank body, 11-an overflow tank, 111-a draft tube, 12-a base plate, 13-an inclined plane structure, 14-an anode mud port and 15-a supernatant liquid port;

20-an anode plate;

30-a cathode plate;

40-main liquid feeding device, 41-main liquid feeding pipe, 411-access opening, 42-flow regulating valve, 43-liquid guide pipe and 44-liquid feeding nozzle;

50-auxiliary liquid feeding device.

Detailed Description

Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are exemplary and intended to be illustrative of the embodiments of the present invention, and should not be construed as limiting the invention.

In the description of the embodiments of the present invention, it should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience in describing the embodiments of the present invention and simplifying the description, but do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention.

Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the embodiments of the present invention, "a plurality" means two or more unless specifically limited otherwise.

In the embodiments of the present invention, unless otherwise explicitly specified or limited, the terms "mounted," "connected," "fixed," and the like are to be construed broadly, e.g., as being fixedly connected, detachably connected, or integrated; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. Specific meanings of the above terms in the embodiments of the present invention can be understood by those of ordinary skill in the art according to specific situations.

In one embodiment of the present invention, as shown in fig. 1, an electrolysis or electrodeposition apparatus includes a tank 10 and a plurality of anode plates 20 and a plurality of cathode plates 30 suspended within the tank 10. Further, the anode plate 20 is parallel and equidistant to the cathode plate 30. In order to realize more efficient electrolysis of the electrolyte, the number of the anode plates 20 is different from that of the cathode plates 30 by one, that is, the number of the anode plates 20 is one more than that of the cathode plates 30, and of course, in other embodiments, the number of the anode plates 20 is one less than that of the cathode plates 30. Specifically, the notch end of the tank body 10 is provided with a backing plate 12, and the anode plate 20 and the cathode plate 30 are arranged at equal intervals, and the kit formed by the anode plate 20 and the cathode plate 30 is arranged in the backing plate 12 at the notch end of the tank body 10, so that the anode plate 20 and the cathode plate 30 are suspended in the inner cavity of the tank body 10 at intervals. Preferably, the anode plate 20 is a copper anode plate, and the distance between the anode plate 20 and the cathode plate 30 is 100 mm. Of course, the anode plate 20 can also be an insoluble lead anode plate, and the distance between the anode plate 20 and the cathode plate 30 is controlled between 80mm and 130 mm.

As shown in fig. 2 and 3, an overflow trough 11 is provided at the upper end of the trough body 10, the base plate 12 covers the upper notch of the overflow trough 11, and a flow guide pipe 111 is provided at the bottom of the overflow trough 11, so that the production liquid level line in the trough body 10 is always flush with the bottom of the overflow trough 11.

As shown in fig. 1 and 4, the electrolysis or electrodeposition apparatus further comprises a main liquid feeding device 40 and an auxiliary liquid feeding device 50, wherein the main liquid feeding device 40 and the auxiliary liquid feeding device 50 form a preset height difference, and specifically, the preset height difference is in the range of 800mm to 1200 mm. The main liquid feeding device 40 and the auxiliary liquid feeding device 50 are respectively arranged on the inner side wall of the tank body 10 and are arranged oppositely, a liquid feeding port of the main liquid feeding device 40 positioned on the upper portion of the inner side wall of the tank body 10 is lower than a production liquid level line of the tank body 10, and the height difference between the liquid feeding port of the auxiliary liquid feeding device 50 positioned on the lower portion of the side wall of the tank body 10 and the lower end of the anode plate 20 or the cathode plate 30 is within a preset range. In a specific practice, the electrolyte is sprayed into the tank 10 through the main liquid feeding device 40 and the auxiliary liquid feeding device 50 along a direction parallel to the arrangement direction of the anode plate 20 or the cathode plate 30, so that the solution in the tank 10 forms an internal circulation flow, and meanwhile, the redundant electrolyte in the tank 10 is discharged through the overflow tank 11. The operation principle of the electrolysis or electrodeposition device is as follows: under the same electrolyte feeding pressure, the outlet lift of the electrolyte at the liquid feeding nozzle of the main liquid feeding device 40 is higher, and the outlet lift at the liquid feeding nozzle of the auxiliary liquid feeding device 50 is lower, so that the traction speed of the main liquid feeding device 40 to metal ions in the electrolyte is higher than that of the auxiliary liquid feeding device 50, the purposes of facilitating the sedimentation of anode mud and inhibiting the generation of floating anode mud are achieved, and the anode passivation phenomenon on the surface of an anode plate is effectively weakened; meanwhile, the electrolyte entering the tank body 10 through the auxiliary liquid feeding device 50 can effectively supplement kinetic energy and heat required by the internal circulation of the solution in the tank body 10, thereby being beneficial to maintaining the temperature balance of the solution in the tank body 10, avoiding the phenomenon of local supercooling or overheating and effectively weakening the phenomenon of concentration polarization on the surface of the cathode plate.

Further, the main liquid feeding device 40 and the auxiliary liquid feeding device 50 are independent from each other, so that the maintenance and repair are convenient, and technical and equipment guarantee is provided for realizing high-current-density electrolysis production. In addition, the main liquid feeding device 40 and the auxiliary liquid feeding device 50 or one of the main liquid feeding device and the auxiliary liquid feeding device can be applied to liquid feeding production of an electrolytic cell or an electrodeposition cell, so that the electrolyte in the cell body has an internal circulation flow effect.

As shown in fig. 5 and 6, each of the main liquid supply device 40 and the sub liquid supply device 50 includes a main liquid supply pipe 41, a flow rate adjustment valve 42, a liquid guide pipe 43, and a plurality of liquid supply nozzles 44. Specifically, the liquid supply main pipe 41 is disposed on the inner side wall of the tank body 10, and both ends of the liquid guide pipe 43 are respectively communicated with the liquid supply main pipe 41 and the flow rate regulating valve 42. The flow regulating valve 42 is used for regulating and balancing the liquid feeding flow and the liquid feeding running water of the main liquid feeding device 40 and the auxiliary liquid feeding device 50 so as to match the electrolysis or electrodeposition reaction in the tank body 10. Preferably, the liquid feeding flow rate of the electrolyte is controlled to be 20L/min to 100L/min, the liquid feeding flow rate is 0.3m/s to 1.25m/s, and the inner diameter of the liquid feeding nozzle 44 is selected to be phi 40mm to phi 80 mm. In a specific practice, the liquid supply nozzle 44 is made of stainless steel, and in order to facilitate the threaded connection between the liquid supply nozzle 44 and the liquid supply main pipe 41, the cross section of the liquid supply main pipe 41 is of a square structure; of course, in other embodiments, the liquid supply nozzle 44 may also be made of PVC plastic, and the liquid supply nozzle 44 and the liquid supply main pipe 41 may also be connected in an embedded manner.

Further, the plurality of liquid supply nozzles 44 are provided on the liquid supply main pipe 41, and are provided at equal intervals on the side of the liquid supply main pipe 41 away from the inner side wall of the tank body 10. Specifically, the liquid feeding main pipe 41 is arranged in a direction perpendicular to the direction of the anode plate 20 or the cathode plate 30, and the plurality of liquid feeding nozzles 44 on the same liquid feeding main pipe 41 have an injection direction parallel to the direction of the anode plate 20 or the cathode plate 30. In particular practice, the electrolyte sprayed from the liquid feeding nozzle 44 is in the space between the adjacent anode plate 20 and the adjacent cathode plate 30, which is beneficial to the electrolysis or electrodeposition reaction in the tank 10. In addition, an access opening 411 is formed at one end of the liquid supply main pipe 41, which is far away from the liquid guide pipe 42, so that the access and maintenance of the liquid supply main pipe 41 are facilitated.

As shown in fig. 1, the liquid feeding port of the main liquid feeding device 41 located at the upper part of the inner side wall of the tank 10 is lower than the production liquid level line of the tank 10. Specifically, the height difference of the electrode liquid sprayed by the liquid feeding nozzle 44 of the main liquid feeding device 40 from the production liquid level line of the tank body 10 is controlled within the range of 20 mm-100 mm. And the height difference between the liquid feeding port of the auxiliary liquid feeding device 50 positioned at the lower part of the side wall of the tank body 10 and the bottom edge of the anode plate 20 or the cathode plate 30 is controlled within the range of-150 mm to 150 mm.

As shown in fig. 1, the bottom surface of the inner cavity of the tank body 10 is an inclined surface structure 13, and the bottom surface of the inner cavity on the same side of the main liquid feeding device 40 is inclined and sloped toward the bottom surface of the inner cavity on the same side of the auxiliary liquid feeding device 50 to form the inclined surface structure 13; preferably, the included angle between the inclined plane structure 13 and the horizontal plane is controlled within the range of 2 degrees to 5 degrees.

Further, the bottom of the tank body 10 is provided with an anode mud port 14 and a supernatant fluid port 15. Specifically, the anode mud port 14 is located at a lower position of the bottom of the tank 10, and the supernatant port 15 is located at a higher position of the bottom of the tank 10, so that after electrolytic deposition, electrolyte containing less anode mud in the tank 10 is discharged from the supernatant port 15, and then electrolyte containing more anode mud is discharged from the anode mud port 14.

The electrolysis or electrodeposition device provided by the invention can effectively adjust the liquid feeding flow in the tank body, so that the solution distribution is more uniform, the concentration polarization on the surface of the cathode plate and the anode passivation on the surface of the anode plate are effectively improved, the main liquid feeding device and the main liquid feeding device are mutually independent, the overhaul and the maintenance of the main liquid feeding device and the main liquid feeding device are convenient, and the technical and equipment guarantee is provided for realizing high-current density electrolysis production. In addition, the main liquid feeding device and the auxiliary liquid feeding device or one of the main liquid feeding device and the auxiliary liquid feeding device can be applied to liquid feeding production of an electrolytic cell or an electrodeposition cell, so that the electrolyte in the cell body forms an internal circulation flow effect, the internal circulation of the solution in the cell body can be effectively improved, the temperature gradient of the electrolyte is reduced, the quality of cathode products is improved, and the recovery of precious metals in anode mud is improved.

In another embodiment of the present invention, there is also provided a method of installing the above electrolysis or electrodeposition apparatus, comprising the steps of:

step 1, uniformly arranging a plurality of liquid feeding nozzles 44 on the side walls of two liquid feeding main pipes 41, wherein the liquid feeding nozzles 44 are linearly arranged, and the liquid feeding nozzles 44 are connected with the liquid feeding main pipes 41 in a threaded or embedded manner;

step 2, fixing the two liquid feeding main pipes 41 provided with the liquid feeding nozzles 44 on two opposite inner side walls of the tank body 10 respectively in a pre-embedded bolt or pre-embedded pipe bracket mode, wherein the two liquid feeding main pipes 41 are arranged in parallel with each other with a height difference of 800 mm-1200 mm; wherein, the liquid supply main pipe at a high position is the liquid supply main pipe of the main liquid supply device 40, and the liquid supply main pipe at a low position is the liquid supply main pipe of the auxiliary liquid supply device 50; the nozzle opening of the liquid feeding nozzle 44 of the main liquid feeding device 40 is positioned in a position which is lower than the production liquid level line of the tank body 10 by 20 mm-100 mm;

step 3, connecting the liquid inlet ends of the two liquid feeding main pipes 41 with the corresponding flow regulating valves 42 through the liquid guide pipes 43 respectively so as to regulate the flow rate and the flow velocity of the electrolyte and supply the electrolyte to the main liquid feeding device 40 and the auxiliary liquid feeding device 50; wherein, the liquid supply main pipe 41 is connected with the liquid guide pipe 43 through a flange, and the flow regulating valve 42 is fixedly supported by the groove body 10;

step 4, supporting a sleeve formed by the anode plates 20 and the cathode plates 30 which are arranged at equal intervals by a backing plate 12 arranged at the slot end of the slot body 10, so that the anode plates 20 and the cathode plates 30 are suspended in the inner cavity of the slot body 10; and, the height difference between the nozzle opening of the liquid feeding nozzle of the sub liquid feeding device 50 and the anode plate 20 or the cathode plate 30 is controlled to be in the range of-150 mm to 150 mm.

The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit and principle of the present invention are intended to be included within the scope of the present invention.

Claims (10)

1. An electrolysis or electrodeposition apparatus comprising

The upper end of the tank body is provided with an overflow trough;

the anode plates are suspended in the inner cavity of the tank body;

the plurality of cathode plates are suspended in the inner cavity of the groove body, and the anode plates and the cathode plates are arranged in parallel at equal intervals; the device is characterized by further comprising a main liquid feeding device and an auxiliary liquid feeding device, wherein a preset height difference is formed between the main liquid feeding device and the auxiliary liquid feeding device, and the main liquid feeding device and the auxiliary liquid feeding device are respectively arranged on the inner side wall of the tank body and are arranged oppositely; the liquid feeding port of the main liquid feeding device positioned at the upper part of the inner side wall of the tank body is lower than the production liquid level line of the tank body, and the height difference between the liquid feeding port of the auxiliary liquid feeding device positioned at the lower part of the side wall of the tank body and the lower end of the anode plate or the cathode plate is within a preset range; and the electrolyte is sprayed into the tank body along the arrangement direction parallel to the anode plate or the cathode plate through the main liquid feeding device and the auxiliary liquid feeding device respectively so as to enable the solution in the tank body to form internal circulation flow, and meanwhile, redundant electrolyte in the tank body is discharged through the overflow groove.

2. The electrolysis or electrodeposition device according to claim 1, wherein the bottom of the inner cavity of the tank body is in a slope structure, and the slope structure is formed by inclining the bottom of the cavity positioned on the same side of the main liquid feeding device towards the bottom of the cavity positioned on the same side of the auxiliary liquid feeding device.

3. The electrolysis or electrodeposition device according to claim 2, wherein the angle between the slope structure and the horizontal plane is 2 ° to 5 °.

4. The electrolysis or electrodeposition device according to claim 2, wherein the bottom of the tank body is provided with an anode mud port and a supernatant port; the anode mud port is positioned at the lower position of the bottom of the tank body, and the supernatant fluid port is positioned at the upper position of the bottom of the tank body.

5. The electrolysis or electrowinning apparatus in accordance with claim 1 wherein the predetermined range is from-150 mm to 150 mm.

6. The electrolysis or electrodeposition device according to claim 1, wherein the main liquid feeding device and the sub liquid feeding device each comprise a main liquid feeding pipe, a flow rate regulating valve, a liquid guide pipe, and a plurality of liquid feeding nozzles; the liquid supply main pipe is arranged on the inner side wall of the tank body, and two ends of the liquid guide pipe are respectively communicated with the liquid supply main pipe and the flow regulating valve; the liquid feeding nozzles are arranged on the liquid feeding main pipe and are all far away from one side of the liquid feeding main pipe on the inner side wall of the tank body at equal intervals.

7. The electrolysis or electrodeposition device according to claim 6, wherein the liquid feeding main pipe is disposed in a direction perpendicular to the direction of the anode plate or the cathode plate, and the plurality of liquid feeding nozzles on the same liquid feeding main pipe are arranged in a direction parallel to the direction of the anode plate or the cathode plate.

8. The electrolysis or electrodeposition device according to claim 6, wherein the preset height difference between the liquid feeding main pipe of the main liquid feeding device and the liquid feeding main pipe of the sub liquid feeding device is 800mm to 1200 mm.

9. The electrolysis or electrodeposition device according to claim 6, wherein the cross section of the liquid feed main pipe has a square structure.

10. A method of installing an electrolysis or electrodeposition apparatus, wherein the electrolysis or electrodeposition apparatus is the electrolysis or electrodeposition apparatus according to any one of claims 6 to 9; the installation method comprises the following steps:

step 1, uniformly arranging a plurality of liquid feeding nozzles on the side walls of two liquid feeding main pipes, wherein the liquid feeding nozzles are linearly arranged, and are in threaded connection or embedded connection with the liquid feeding main pipes;

step 2, fixing the two liquid feeding main pipes provided with the liquid feeding nozzles on two opposite inner side walls of the tank body respectively in a pre-buried bolt or pre-buried pipe bracket mode, wherein the two liquid feeding main pipes are arranged in parallel with each other at a height difference of 800-1200 mm; wherein the liquid supply main pipe at a high position is the liquid supply main pipe of the main liquid supply device, and the liquid supply main pipe at a low position is the liquid supply main pipe of the auxiliary liquid supply device; the nozzle opening of the liquid feeding nozzle of the main liquid feeding device is positioned in a position which is 20 mm-100 mm lower than the production liquid level line of the tank body;

step 3, connecting the liquid inlet ends of the two liquid feeding main pipes with the corresponding flow regulating valves through the liquid guide pipes respectively so as to regulate the flow and the flow speed of the electrolyte and supply the electrolyte to the main liquid feeding device and the auxiliary liquid feeding device; the liquid supply main pipe is connected with the liquid guide pipe through a flange, and the flow regulating valve is fixedly supported by the aid of the groove body;

step 4, supporting a sleeve formed by the anode plates and the cathode plates which are arranged at equal intervals by a base plate arranged at the groove opening end of the groove body, so that the anode plates and the cathode plates are suspended in the inner cavity of the groove body; and controlling the height difference between the nozzle opening of the liquid feeding nozzle of the auxiliary liquid feeding device and the bottom edge of the anode plate or the cathode plate to be in the range of-150 mm.

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