CN113686879A - Optical film defect visual detection system and method - Google Patents

Optical film defect visual detection system and method Download PDF

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Publication number
CN113686879A
CN113686879A CN202111054081.XA CN202111054081A CN113686879A CN 113686879 A CN113686879 A CN 113686879A CN 202111054081 A CN202111054081 A CN 202111054081A CN 113686879 A CN113686879 A CN 113686879A
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film
light source
dark field
defect
scanning area
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陈嘉文
陆哲
陈礼诚
柯林旭
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Hangzhou Lipo Science & Technology Co ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • G01N2021/8822Dark field detection

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Abstract

本发明公开光学薄膜缺陷视觉检测系统及方法。光学薄膜缺陷视觉检测系统及方法用于视觉检测薄膜平面的瑕疵缺陷。光学薄膜缺陷视觉检测系统包含有,摄影装置,其布置于所述薄膜平面上方,所述摄影装置在所述薄膜平面上界定出摄影扫描区;透镜部件,其布置于所述薄膜平面下方;照明光源,其布置于所述透镜部件下方并且所述照明光源处于所述透镜部件的焦平面位置,所述照明光源平行于所述摄影扫描区,所述照明光源、所述摄影扫描区及所述透镜部件具有共同的中心线;以及,暗场挡块,其形成于所述照明光源顶面并且所述暗场挡块处于所述照明光源的中段区域。本发明的有益效果在于:对划伤类瑕疵有明显的检出效果。

Figure 202111054081

The invention discloses a visual inspection system and method for optical film defects. The optical film defect visual inspection system and method are used for visually inspecting the defect defects of the film plane. An optical film defect visual inspection system includes a photographic device disposed above the film plane, the photographic device defining a photographic scanning area on the film plane; a lens component disposed below the film plane; illumination a light source arranged below the lens part and the illumination light source is at the focal plane position of the lens part, the illumination light source is parallel to the photographic scanning area, the illumination light source, the photographic scanning area and the The lens parts have a common centerline; and a dark field stopper is formed on the top surface of the illumination light source and the dark field stopper is located in a mid-section area of the illumination light source. The beneficial effect of the present invention is that it has obvious detection effect on scratches.

Figure 202111054081

Description

Optical film defect visual detection system and method
Technical Field
The present invention relates to optical film defect inspection, and in particular, to optical film defect visual inspection systems and methods.
Background
Referring to fig. 1, a conventional optical film defect inspection system is shown. The optical film defect visual inspection system generally comprises a film plane 1, a camera 2 and an illuminator 3. The camera device is fixed above the plane of the film and comprises a series of pixels for receiving images on its scan lines 4. The illumination device is fixed below the plane of the film, typically an LED or similar illumination source. The film plane is driven by the roller to move horizontally, so that the photographic device can obtain a complete image of the film plane. And detecting the defects by using a detection algorithm according to the complete image of the film plane. The defect detection method has the defects that the defect detection precision is not high, and defects such as scratches, concave-convex points or crystal points cannot be accurately detected.
Disclosure of Invention
The invention provides a novel optical film defect visual detection system and method, aiming at solving the problem of detection precision of optical film defects in the prior art.
In order to achieve the purpose, the technical scheme of the invention is as follows: an optical film defect visual inspection system for visually inspecting defect defects in a film plane, comprising,
a photographic device disposed above the film plane, the photographic device defining a photographic scan area on the film plane;
a lens component disposed below the film plane;
an illumination source disposed below the lens component while also in a focal plane position of the lens component, the illumination source, the photographic scan area, and the lens component having a common centerline; and the number of the first and second groups,
a dark field block formed on the top surface of the illumination light source, wherein the dark field block is also positioned at the middle position of the illumination light source;
the illumination light source emits light upwards, and the light emitting beam of the illumination light source is divided into a shielding part and a non-shielding part according to the dark field stop block, wherein the shielding part forms a film dark field in the photographing scanning area, the film dark field covers the whole length of the photographing scanning area, and the non-shielding part reaches the photographing scanning area through the lens component.
As a preferable scheme of the optical film defect visual inspection system, the film plane is translated along the length direction thereof in the visual inspection process, the length directions of the illumination light source and the photographing scanning area both extend along the width direction of the film plane, the width directions of the illumination light source and the photographing scanning area both extend along the length direction of the film plane, and the photographing scanning area covers the whole width of the film plane.
As a preferred solution for the optical film defect visual inspection system, the film dark field also covers the entire width of the photogrammetric scanning zone at the same time, i.e. the photogrammetric scanning zone is completely covered by the film dark field.
As a preferred embodiment of the optical film defect visual inspection system, the film dark field does not completely cover the entire width of the photographic scanning zone, i.e. one part of the photographic scanning zone is covered by the film dark field and the other part is not covered by the film dark field.
Preferably, the photographing device is a single photographing camera as the optical film defect visual inspection system.
As a preferred scheme of the optical film defect visual detection system, the photographing device is a linear array camera set arranged according to a line or an area array camera set arranged according to a rectangle.
As a preferable scheme of the optical film defect visual detection system, the lens component is a cylindrical lens, an aspheric lens, a Fresnel lens or a free-form lens.
Preferably, the defect detection system for optical thin film defects comprises defects such as scratches, concave-convex points, crystal points, dirt, textures or imprints.
The invention also provides a visual inspection method for the defects of the optical film, which comprises the following steps,
providing the optical film defect visual detection system;
translating the film plane, and photographing the film plane by the photographing device to acquire a photographed image about the film plane; and the number of the first and second groups,
and judging whether the film plane has a flaw or not according to the shot image.
Compared with the prior art, the invention has the beneficial effects that: 1. the scratch detection method has an obvious detection effect on scratch defects. 2. Can be compatible with the detection of various defects (except scratches, concave-convex points, crystal points, dirt, textures or imprints).
In addition to the technical problems solved by the present invention, the technical features constituting the technical solutions, and the advantageous effects brought by the technical features of the technical solutions described above, other technical problems solved by the present invention, other technical features included in the technical solutions, and advantageous effects brought by the technical features will be described in further detail with reference to the accompanying drawings.
Drawings
Fig. 1 is a schematic structural diagram of the prior art.
Fig. 2 is a schematic structural diagram according to an embodiment of the present invention.
FIG. 3 is a top view of an illumination source according to an embodiment of the invention.
FIG. 4 is a schematic diagram illustrating the principle of dark field of the pellicle according to an embodiment of the present invention.
FIG. 5 is a schematic diagram of the inspection according to an embodiment of the present invention (no defect).
FIG. 6 is a schematic diagram of the inspection according to one embodiment of the present invention (defective defect).
Fig. 7 is a schematic structural diagram of another embodiment of the present invention.
FIG. 8 is a top view of an illumination source in another embodiment of the present invention.
FIG. 9 is a schematic diagram of the detection of another embodiment of the present invention (no defect).
Detailed Description
The invention will be described in further detail below with reference to specific embodiments and drawings. Here, the description of the embodiments is provided to help understanding of the present invention, but the present invention is not limited thereto. In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
Example 1:
referring to fig. 2-3, a system for visual inspection of optical film defects is shown. The optical film defect visual inspection system is used for detecting defect defects of a film plane 1 (such as a polarizing film), particularly scratch-type defect defects.
The optical film defect visual detection system comprises a photographic device 2, a lens component 3, an illuminating light source 4, a dark field stop 5 and the like.
The film plane 1 can be arranged horizontally. The film plane 1 has a length direction and a width direction. During the visual inspection, the film plane 1 is driven by the external roller to move horizontally along the length direction.
The camera device 2 is arranged directly above the film plane 1. The camera device 2 defines a camera scan area 20 on the film plane 1. The scan region 20 has a length and a width. The length direction of the photographic scan area 20 extends along the width direction of the film plane 1. The photographic scan area 20 covers the entire width of the film plane 1, i.e. the photographic scan area 20 extends all the way from one long side of the film plane 1 to the other long side. The width direction of the photographic scan area 20 extends along the length direction of the film plane 1. In this embodiment, the photographing device 2 is a single photographing camera. In other embodiments, the photographing device is a linear array camera set arranged in a line or an area array camera set arranged in a rectangle.
The lens component 3 is arranged directly below the membrane plane 1. In the present embodiment, the lens member 3 is not limited to the selection of a cylindrical lens, an aspherical lens, a fresnel lens, or a free-form lens.
The illumination light source 4 is disposed directly below the lens part 3 at the focal plane position of the lens part 3. The length direction of the illumination light source 4 extends in the width direction of the film plane 1. The width direction of the illumination light source 4 extends along the length direction of the film plane 1. The illumination light source 4 corresponds upward to the photographic scanning area 20.
The dark field block 5 is arranged on the top surface of the illumination light source 4 at a mid-position (i.e., at and/or near the focal position) of the illumination light source 4. The dark field block 5 covers the entire width of the illumination light source 4, i.e. the dark field block 5 extends from one long side of the illumination light source 4 all the way to the other long side (see fig. 3).
Wherein the photographing scanning area 20, the lens part 3, the illumination light source 4 and the dark field block 5 have a common vertical center line.
The illumination light source 4 emits light upward. The light beam of the illumination light source 4 is divided into a shielding part and a non-shielding part according to the dark field stop block 5. The shielded portion is shielded by the dark field block 5 to form a film dark field in the photographing scanning area 20, and the film dark field covers the entire length and the entire width of the photographing scanning area 20, that is, the film dark field covers the entire photographing scanning area 20. The non-occluded part passes through the lens unit 3 to reach the photographic scanning area 20.
And (3) visual detection process: the film plane is translated and photographed by the photographing apparatus to obtain a photographed image with respect to the film plane. And judging whether the film plane 1 has a defect or not according to the shot image.
Visual inspection principle: referring to fig. 4, the light beams 17, 18 and 19 are emitted from the focal point of the lens component, and then are emitted in parallel as light beams 20, 21 and 22 through the lens component. I.e. the dark field stop will project a film dark field at infinity, equivalent to the lens component size, to the photographic scan area. The film dark field provides a dark field environment for the photographic device to photograph the film plane.
It should be noted that the film dark field is not a dark field with a gray scale of 0 in the strict sense. As can be further understood from the optical principle, the light beams 23, 24 and 25 emitted from the portion of the focal plane not blocked by the dark field block will be emitted in parallel as the light beams 26, 27 and 28 through the lens component. It can be seen that the light beam from the illumination source is also received by the camera device at the film plane, so that the dark field environment is actually a "bright" dark field. The degree of darkness of the film dark field is determined by the size of the dark field stop and the properties of the illumination source (length, power, etc., primarily length). In this embodiment, the ratio of the length of the dark field stop to the length of the illumination light source is 1/4. The proportional relation is not the only proportion of the embodiment of the invention, and the proportional relation can be properly adjusted according to actual requirements, so that the required dark field environment can be provided for the photographic device.
Referring to fig. 5 and 6, the captured image obtained by the camera device is a series of regularly arranged pixels. The pixel is for receiving a brightness distribution of the photogrammetric scan area of the film plane. Each pixel in the series of pixels receives an outgoing light beam from the illumination source. These outgoing light beams will illuminate the film plane in the form of parallel light. Taking three continuous pixels 30, 31 and 32 as an example, the circular areas 30a, 31a and 32a represent the corresponding brightness of the three pixels, and the brightness is expressed by the color depth. If there are no defect defects in the photo-scanned area of the film plane, the circular areas 30a, 31a, 32a are of the same color, i.e. equal intensity (i.e. fig. 5). If a defect exists in the photographic scanning area of the film plane, a scattering phenomenon occurs at a defect position where the light beam of the illumination light source passes through the film plane, so that the brightness at the positions of the pixels 30, 31, and 32 is changed from a uniform state to a bright-dark state, the brightness 30b at the position of the pixel 30 is darkest, the brightness 31b at the position of the pixel 31 is brightest, and the brightness 32b at the position of the pixel 32 is between 30b and 31b (i.e., fig. 6). This effect eventually presents a bright spot in the dark field in the captured image, from which defects can be discerned. For scratch defect, the shot image is often represented in the form of a bright dot strip, and the scratch defect which is originally invisible to naked eyes can be clearly seen in the shot image according to the form of the scratch defect.
If the lens component and the dark field stop block are removed, all parts of the light-emitting beams of the illuminating light source directly reach the photographic scanning area of the film plane, and the light-emitting beams of the illuminating light source are disordered in the photographic scanning area, so that the film plane is illuminated uniformly, that is, the defect of the film plane cannot be accurately identified from the shot image.
The lens component and the dark field stop are added to have a first function that the shielding part in the light-emitting beam of the illuminating light source forms a film dark field on the film plane, and a second function that the dark field stop shields the illuminating light source to directly irradiate the photographic device, so that the illuminating light source is in an oblique side lighting mode.
Example 2:
example 1 has a disadvantage that it is impossible to detect well whether the film plane has defects such as irregularities or crystal grains. This is because the defect such as a concave-convex point or a crystal point forms a single bright point in the captured image, and the bright point strip formed by the defect such as a scratch is less likely to be observed and the morphological feature thereof is lost, and the defect on the captured image loses its concave-convex feeling and is easily confused with the dust and impurities on the film plane, thereby increasing the detection difficulty.
The present embodiment is proposed for this purpose. Referring to fig. 7 to 8, in comparison with embodiment 1, in this embodiment, the dark field block 5 is shifted toward a long side direction of the illumination light source 4, so that the dark field block 5 only covers a part of the width of the illumination light source 4, that is, a part of the film dark field covered (dark) in the photographing scanning area 20 and another part of the film dark field uncovered (bright) in the photographing scanning area 20, so that the photographing apparatus 2 can better capture the brightness variation information on the photographing scanning area 20 of the film plane 1.
Referring to fig. 9, the brightness information received by a series of pixels in the photographing device is light and dark alternately, that is, only a part of a single pixel is illuminated and the other part is in a dark state. By the method, the brightness distribution of concave-convex points and crystal point defects in the shot image is more obvious, concave-convex information of the defects is not lost, dust and the like which do not belong to a detected object can be prevented from influencing the analysis of the final detection result, and flaw defect classification is facilitated.
Therefore, the comprehensive detection method can realize comprehensive detection of common defect defects such as scratches, concave-convex points, crystal points and the like.
The foregoing merely represents embodiments of the present invention, which are described in some detail and detail, and therefore should not be construed as limiting the scope of the invention. It should be noted that, for those skilled in the art, various changes and modifications can be made without departing from the spirit of the invention, and these changes and modifications are all within the scope of the invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.

Claims (9)

1.光学薄膜缺陷视觉检测系统,其用于视觉检测薄膜平面的瑕疵缺陷,其特征在于,包含有,1. An optical film defect visual inspection system, which is used for visually inspecting the defect defect of the film plane, is characterized in that, comprises, 摄影装置,其布置于所述薄膜平面上方,所述摄影装置在所述薄膜平面上界定出摄影扫描区;a photographing device arranged above the film plane, the photographing device defining a photographic scanning area on the film plane; 透镜部件,其布置于所述薄膜平面下方;a lens component disposed below the plane of the film; 照明光源,其布置于所述透镜部件下方,所述照明光源同时还处在所述透镜部件的焦平面位置,所述照明光源、所述摄影扫描区及所述透镜部件具有共同的中心线;以及,an illumination light source, which is arranged below the lens part, the illumination light source is also at the focal plane position of the lens part, and the illumination light source, the photographic scanning area and the lens part have a common centerline; as well as, 暗场挡块,其形成于所述照明光源顶面,所述暗场挡块同时还处在所述照明光源的中段位置;a dark field block, which is formed on the top surface of the illumination light source, and the dark field block is also in the middle position of the illumination light source; 所述照明光源向上出光,所述照明光源的出光光束根据所述暗场挡块被分为遮挡部分及非遮挡部分,其中,所述遮挡部分在所述摄影扫描区形成薄膜暗场,所述薄膜暗场覆盖所述摄影扫描区的整长,而所述非遮挡部分透过所述透镜部件到达所述摄影扫描区。The illuminating light source emits light upward, and the emitting beam of the illuminating light source is divided into a blocking part and a non-blocking part according to the dark field block, wherein the blocking part forms a thin film dark field in the photographing scanning area, and the The thin film dark field covers the entire length of the photographic scanning area, and the non-blocking portion reaches the photographic scanning area through the lens member. 2.根据权利要求1所述的光学薄膜缺陷视觉检测系统,其特征在于,所述薄膜平面在视觉检测过程中沿其长度方向作平移,所述照明光源及所述摄影扫描区的长度方向均沿所述薄膜平面的宽度方向延伸,所述照明光源及所述摄影扫描区的宽度方向均沿所述薄膜平面的长度方向延伸,所述摄影扫描区覆盖所述薄膜平面的整宽。2 . The optical film defect visual inspection system according to claim 1 , wherein the film plane is translated along its length direction during the visual inspection process, and the length directions of the illumination light source and the photographic scanning area are both equal. 3 . Extending along the width direction of the film plane, the width directions of the illumination light source and the photographing scanning area both extend along the length direction of the film plane, and the photographing scanning area covers the entire width of the film plane. 3.根据权利要求2所述的光学薄膜缺陷视觉检测系统,其特征在于,所述薄膜暗场同时还覆盖所述摄影扫描区的整宽,即所述摄影扫描区被所述薄膜暗场完整覆盖。3 . The optical film defect visual inspection system according to claim 2 , wherein the film dark field also covers the entire width of the photographic scanning area, that is, the photographic scanning area is completely covered by the film dark field. 4 . cover. 4.根据权利要求2所述的光学薄膜缺陷视觉检测系统,其特征在于,所述薄膜暗场未完整覆盖所述摄影扫描区的整宽,即所述摄影扫描区中有一部分被所述薄膜暗场覆盖,而另一部分未被所述薄膜暗场覆盖。4 . The optical film defect visual inspection system according to claim 2 , wherein the film dark field does not completely cover the entire width of the photographic scanning area, that is, a part of the photographic scanning area is covered by the film. 5 . The dark field is covered, while the other part is not covered by the thin film dark field. 5.根据权利要求1至4中任意一项所述的光学薄膜缺陷视觉检测系统,其特征在于,所述摄影装置为单摄影相机。5. The optical film defect visual inspection system according to any one of claims 1 to 4, wherein the photographing device is a single photographing camera. 6.根据权利要求1至4中任意一项所述的光学薄膜缺陷视觉检测系统,其特征在于,所述摄影装置为按线排布的线阵相机组或按矩形排布的面阵相机组。6. The optical film defect visual inspection system according to any one of claims 1 to 4, wherein the photographing device is a line scan camera group arranged in a line or an area scan camera group arranged in a rectangle . 7.根据权利要求1至4中任意一项所述的光学薄膜缺陷视觉检测系统,其特征在于,所述透镜部件为柱透镜、非球面透镜、菲涅尔透镜或自由曲面透镜。7 . The optical film defect visual inspection system according to claim 1 , wherein the lens component is a cylindrical lens, an aspheric lens, a Fresnel lens or a free-form surface lens. 8 . 8.根据权利要求1至4中任意一项所述的光学薄膜缺陷视觉检测系统,其特征在于,所述瑕疵缺陷为划伤类、凹凸点类、晶点类、脏污类、纹理类或压印类缺陷。8. The optical film defect visual inspection system according to any one of claims 1 to 4, wherein the defect defect is scratch, concave and convex point, crystal point, contamination, texture or Imprinting defects. 9.光学薄膜缺陷视觉检测方法,其特征在于,包含有以下步骤,9. The optical film defect visual inspection method is characterized in that, comprises the following steps, 提供权利要求1至4中任意一项所述的光学薄膜缺陷视觉检测系统;Provide the optical film defect visual inspection system according to any one of claims 1 to 4; 平移所述薄膜平面,由所述摄影装置拍摄所述薄膜平面以获取关于所述薄膜平面的拍摄图像;以及,translating the film plane, and photographing the film plane by the photographing device to obtain a photographed image of the film plane; and, 根据所述拍摄图像,判断所述薄膜平面是否存在瑕疵缺陷。According to the captured image, it is judged whether the film plane has a flaw defect.
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TWI781840B (en) * 2021-12-02 2022-10-21 友達光電股份有限公司 A light control device, testing system and method for dark field photography
CN115290561A (en) * 2022-08-09 2022-11-04 佛山市南海利达印刷包装有限公司 Co-extruded film abnormal crystal point detection clamp and co-extruded film crystal point detection method
CN115326828A (en) * 2022-08-09 2022-11-11 福清轩朗光电科技有限公司 AOI detection mechanism for optical diaphragm
CN115791788A (en) * 2022-10-13 2023-03-14 杭州百子尖科技股份有限公司 Transparent optical film scratch detection system based on machine vision
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CN117684953A (en) * 2023-12-11 2024-03-12 江苏省环境科学研究院 Visual detection equipment and detection method for non-aqueous phase liquid pollutants of underground water
CN117871415A (en) * 2024-03-11 2024-04-12 天津大学四川创新研究院 Exposure type structural flaw detection system and method based on parallel light source

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CN117684953B (en) * 2023-12-11 2024-05-24 江苏省环境科学研究院 A visual detection device and method for groundwater non-aqueous phase liquid pollutants
CN117871415A (en) * 2024-03-11 2024-04-12 天津大学四川创新研究院 Exposure type structural flaw detection system and method based on parallel light source

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