CN113611637A - Exhaust device and semiconductor heat treatment equipment - Google Patents
Exhaust device and semiconductor heat treatment equipment Download PDFInfo
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- CN113611637A CN113611637A CN202111014360.3A CN202111014360A CN113611637A CN 113611637 A CN113611637 A CN 113611637A CN 202111014360 A CN202111014360 A CN 202111014360A CN 113611637 A CN113611637 A CN 113611637A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 30
- 238000010438 heat treatment Methods 0.000 title claims abstract description 21
- 230000007704 transition Effects 0.000 claims description 34
- 238000009413 insulation Methods 0.000 claims description 31
- 239000012212 insulator Substances 0.000 claims description 30
- 230000004308 accommodation Effects 0.000 claims description 10
- 239000003570 air Substances 0.000 description 95
- 239000007789 gas Substances 0.000 description 47
- 238000000034 method Methods 0.000 description 22
- 230000008569 process Effects 0.000 description 22
- 238000001816 cooling Methods 0.000 description 8
- 239000011810 insulating material Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 238000009423 ventilation Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000003466 welding Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000012080 ambient air Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000005465 channeling Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D19/00—Arrangements of controlling devices
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D9/00—Cooling of furnaces or of charges therein
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D9/00—Cooling of furnaces or of charges therein
- F27D2009/0002—Cooling of furnaces
- F27D2009/0005—Cooling of furnaces the cooling medium being a gas
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D19/00—Arrangements of controlling devices
- F27D2019/0028—Regulation
- F27D2019/0056—Regulation involving cooling
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- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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Abstract
The application discloses exhaust device and semiconductor heat treatment equipment relates to the semiconductor equipment field. An exhaust device comprising: the air inlet of the first air exhaust component is communicated with the air outlet of the furnace body of the semiconductor heat treatment equipment; the control valve assembly comprises a valve body, a valve plate and a driver, the valve body is connected to an air outlet of the first exhaust assembly, a valve port opposite to the air outlet of the first exhaust assembly is arranged on the valve body, a containing space used for containing the valve plate is further arranged on the valve body, an opening is formed in one side of the containing space, and the driver is connected with the valve plate and used for driving the valve plate to move into the containing space or move out of the containing space so as to enable the valve plate to close or open the valve port. A semiconductor heat treatment device comprises the air exhaust device. The problem that the valve plate is normally opened or closed due to the fact that the rotating shaft of the valve plate deforms under the high-temperature environment can be solved.
Description
Technical Field
The application belongs to the technical field of semiconductor equipment, and particularly relates to an exhaust device and semiconductor heat treatment equipment.
Background
The semiconductor heat treatment equipment is important process equipment for manufacturing the integrated circuit and is suitable for various processes such as oxidation, annealing, thin film growth and the like in the manufacturing process of the integrated circuit. In order to meet the process requirements and improve the productivity of products, it is necessary to heat the semiconductor wafer to the process temperature as quickly as possible without causing damage such as slipping to the semiconductor wafer and to quickly cool the semiconductor wafer in a high temperature state, and therefore, it is necessary to quickly raise and lower the temperature of the furnace body.
The furnace body is provided with an air inlet and an air outlet, and in the process, cooling gas enters the furnace body through the air inlet and is discharged from the air outlet after heat exchange, so that the aim of quickly cooling the furnace body is fulfilled. Usually, an exhaust system is disposed at the air outlet, and whether air is exhausted or not is controlled by the exhaust system.
Currently, some exhaust systems include a valve plate that is rotatably disposed by a shaft, and is opened or closed by the valve plate rotating around the shaft. However, the valve plate and the rotating shaft are both installed in the front end component of the exhaust system, so that the valve rotating shaft is opposite to the air outlet of the furnace body, and the rotating shaft is exposed in a high-temperature environment.
Disclosure of Invention
The embodiment of the application aims to provide an exhaust device and semiconductor heat treatment equipment, which can solve the problem that the normal opening or closing of a valve plate is influenced by the deformation of a rotating shaft of the valve plate in a high-temperature environment.
In order to solve the technical problem, the present application is implemented as follows:
the embodiment of the application provides an exhaust device, is applied to semiconductor thermal treatment equipment, and this exhaust device includes:
the air inlet of the first air exhaust assembly is communicated with the air outlet of the furnace body of the semiconductor heat treatment equipment;
the control valve assembly comprises a valve body, a valve plate and a driver, the valve body is connected to the air outlet of the first exhaust assembly, a valve port opposite to the air outlet of the first exhaust assembly is arranged on the valve body, an accommodating space for accommodating the valve plate is further arranged on the valve body, an opening is formed in one side of the accommodating space, and the driver is connected with the valve plate and used for driving the valve plate to move into the accommodating space or move out of the accommodating space so as to enable the valve plate to close or open the valve port.
The embodiment of the application also provides semiconductor heat treatment equipment which comprises the air exhaust device.
In the embodiment of the application, the gas discharged from the air outlet of the furnace body can be discharged outside a plant through the first air exhaust assembly and the control valve assembly, and the valve plate is opened or closed according to the actual working condition, so that the opening or closing of the valve port can be realized; when the valve plate is opened, gas discharged from the air outlet of the furnace body can be discharged out of a plant through the air inlet of the first air exhaust assembly, the air outlet of the first air exhaust assembly and the valve port of the control valve assembly in sequence. Based on the above setting, the mode that the exhaust device in this application embodiment adopted the valve plate immigration or shifted out accommodation space has replaced the traditional mode that makes the valve plate rotate to open or close through the pivot to there is not the pivot to the condition of the gas outlet of furnace body, effectively avoided the pivot to receive the high temperature influence to take place to warp and lead to the problem that the valve plate can't be opened or close, and then ensured the normal open or the closure of valve plate, guaranteed exhaust system's normal operating.
Drawings
FIG. 1 is a schematic structural diagram of a furnace body and an exhaust device disclosed in an embodiment of the present application;
FIG. 2 is a schematic structural diagram of a first exhaust assembly and a control valve assembly according to an embodiment of the present disclosure;
FIG. 3 is a disassembled schematic view of the first flange, the second flange and the valve plate disclosed in the embodiment of the application;
FIG. 4 is a schematic view of an assembly of a first flange and a valve plate disclosed in an embodiment of the present application;
FIG. 5 is a schematic structural diagram of a valve plate, a fixing bracket and a linear driving element disclosed in an embodiment of the present application;
fig. 6 is a schematic structural diagram of a first viewing angle of a first exhaust assembly according to an embodiment of the present disclosure;
fig. 7 is a schematic structural diagram of a second view angle of the first exhaust assembly according to the embodiment of the present application;
FIG. 8 is a disassembled schematic view of a first exhaust assembly disclosed in an embodiment of the present application;
FIG. 9 is a schematic view of the assembly of the first discharge assembly, the control valve assembly and the second discharge assembly disclosed in the embodiments of the present application;
fig. 10 is a schematic cross-sectional view of a first perspective of a semiconductor thermal processing apparatus disclosed in an embodiment of the present application;
fig. 11 is a schematic cross-sectional view of a second perspective of a semiconductor thermal processing apparatus according to an embodiment of the present application.
Description of reference numerals:
100-a first exhaust assembly; 110-a transition box; 111-a cartridge body; 112-a third flange; 113-a fourth flange; 120-insulation; 121-air duct; 122-a first sub insulation; 123-a second sub insulation;
200-a control valve assembly; 210-a valve body; 211-a first flange; 2111-groove; 212-a second flange; 213-air outlet; 220-a valve plate; 230-a driver; 231-linear drive; 232-fixed support; 2321-avoid the gap; 2322-a fixed part; 2323-folding edge;
300-a second exhaust assembly; 310-a fifth flange; 320-an exhaust pipe;
400-furnace body; 410-a chamber; 420-air inlet channel; 421-main path channel; 422-branch channel; 430-an air outlet channel; 440-gas injection holes; 450-vent hole; 460-a process tube;
500-blower.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some, but not all, embodiments of the present application. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
The terms first, second and the like in the description and in the claims of the present application are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It will be appreciated that the data so used may be interchanged under appropriate circumstances such that embodiments of the application may be practiced in sequences other than those illustrated or described herein, and that the terms "first," "second," and the like are generally used herein in a generic sense and do not limit the number of terms, e.g., the first term can be one or more than one. In addition, "and/or" in the specification and claims means at least one of connected objects, a character "/" generally means that a preceding and succeeding related objects are in an "or" relationship.
The embodiments of the present application are described in detail below with reference to the accompanying drawings through specific embodiments and application scenarios thereof.
Referring to fig. 1 to 11, an air exhaust device is disclosed in an embodiment of the present application, and the disclosed air exhaust device includes a first air exhaust assembly 100 and a control valve assembly 200.
The first exhaust assembly 100 is an exhaust member of an exhaust device, and can conduct exhaust gas. In some embodiments, the first exhaust assembly 100 has an inlet for communicating with an outlet of the furnace 400 of the semiconductor thermal processing apparatus. In the process, the gas may be discharged from the air outlet of the furnace body 400 into the air inlet of the first exhaust assembly 100, and enter the inner cavity of the first exhaust assembly 100 through the air inlet, so as to be ducted by the first exhaust assembly and discharged to the outside through the air outlet of the first exhaust assembly 100. Alternatively, the first exhaust assembly 100 may be an exhaust duct or other components with exhaust function, and the specific form of the first exhaust assembly 100 is not limited in the embodiment of the present application.
The control valve assembly 200 is a component for controlling the exhaust of the exhaust device, and the exhaust device can be opened or closed by the control valve assembly 200. Referring to fig. 2, in some embodiments, the control valve assembly 200 includes a valve body 210, a valve plate 220 and a driver 230, wherein the valve body 210 is connected to the air outlet of the first exhaust assembly 100, and a valve port opposite to the air outlet of the first exhaust assembly 100 is disposed on the valve body 210. Optionally, the valve body 210 is fixed at the air outlet of the first exhaust component 100, and the fixing manner may be bolt connection, welding, riveting, bonding, clamping, and the like, and the embodiment of the present application does not limit a specific fixing manner as long as the control valve assembly 200 can be fixedly connected with the first exhaust component 100. Based on the above arrangement, the gas guided out through the outlet of the furnace body 400 can be guided to the control valve assembly 200 through the first exhaust assembly 100 and exhausted through the valve port of the control valve assembly 200.
In order to assemble the valve plate 220 to the valve body 210, the valve body 210 in the embodiment of the present application is further provided with a receiving space for receiving the valve plate 220, and one side of the receiving space is provided with an opening. Alternatively, the valve plate 220 may be slidably connected to the valve body 210, and when the valve plate 220 slides to a first position (moves out of the accommodation space) relative to the valve body 210, the valve plate 220 opens the valve port, so that gas can be discharged through the valve port; when the valve plate 220 slides to the second position (moves into the receiving space) relative to the valve body 210, the valve plate 220 closes the valve port, i.e., blocks the valve port from the outside, to prevent gas from being discharged outward through the valve port.
In order to move the valve plate 220 into or out of the accommodating space, the control valve assembly 200 in the embodiment of the present application further includes a driver 230, the driver 230 is connected to the valve plate 220, and under the driving action of the driver 230, the valve plate 220 can move into or out of the accommodating space, so as to switch the valve plate 220 to close or open the valve port.
It should be noted here that, when the semiconductor heat treatment apparatus performs the temperature raising process, it needs to be isolated from the outside, and at this time, the valve port can be closed by the valve plate 220, so as to prevent the heat inside the furnace body 400 from being transferred to the outside and affecting the temperature raising process. When the semiconductor heat treatment equipment is used for a cooling process, high-temperature gas inside the furnace body 400 needs to be released to the outside to discharge internal heat, and at the moment, the valve port can be opened through the valve plate 220, so that the high-temperature gas inside the furnace body 400 is discharged to the outside through the air outlet of the furnace body 400, the first exhaust assembly 100 and the valve port of the control valve assembly 200 in sequence to realize cooling.
In the embodiment of the present application, the gas discharged from the air outlet of the furnace body 400 can be discharged to the plant system through the first exhaust assembly 100 and the control valve assembly 200, and the valve plate 220 is opened or closed according to the actual working condition, so that the opening or closing of the valve port can be realized; when the valve plate 220 is opened, the gas discharged from the outlet of the furnace body 400 can be discharged to the plant system through the inlet of the first exhaust assembly 100, the outlet of the first exhaust assembly 100 and the valve port of the control valve assembly 200 in sequence. Based on the above arrangement, in the embodiment of the present application, the exhaust device adopts the mode that the valve plate 220 moves into or out of the accommodating space, the traditional mode that the valve plate is opened or closed in a rotating manner through the rotating shaft is replaced, the condition that the rotating shaft is just opposite to the air outlet of the furnace body 400 does not exist, the problem that the valve plate cannot be opened or closed due to the deformation of the rotating shaft under the influence of high temperature is effectively avoided, the normal opening or closing of the valve plate 220 is ensured, and the normal operation of the whole exhaust system is ensured.
In some embodiments, the size of the valve plate 220 is smaller than the size of the receiving space and larger than the size of the valve port, and in case the valve plate 220 moves into the receiving space, the valve plate 220 is in clearance fit with the inner wall of the receiving space.
Considering that when the exhaust device is applied to a high-temperature working condition, the high-temperature environment may cause the valve plate 220 to generate a certain deformation, and thus, the contact force between the valve plate 220 and the valve body 210 may be increased, so as to increase the resistance of the valve plate 220 to the movement of the valve body 210, so that the valve plate 220 is easily stuck, and the normal operation of the exhaust device is affected. Based on this, in the embodiment of the present application, the size of the valve plate 220 is made smaller than that of the accommodation space, and the valve plate 220 is clearance-fitted to the inner wall of the accommodation space.
Based on the above arrangement, when the valve plate 220 is in a high-temperature working condition, due to factors such as expansion with heat and contraction with cold, stress concentration and the like, the valve plate 220 is deformed to a certain extent, and due to clearance fit, the deformed valve plate 220 can still move smoothly in the accommodating space, so that the phenomenon that the valve plate 220 is blocked is avoided, the valve plate 220 is ensured to be opened or closed smoothly, and further the normal operation of the exhaust device is ensured.
In addition, in order to ensure the sealing of the valve port, the size of the valve plate 220 in the embodiment of the present application is also larger than that of the valve port, so that when the valve plate 220 moves into the accommodating space, the valve plate 220 can completely cover the valve port to prevent the gas leakage in the furnace body 400.
In some embodiments, the size of the valve plate 220 is smaller than the size of the receiving space in a first direction, which is a thickness direction of the valve plate 220. Based on this, after valve plate 220 is assembled in the accommodating space, a gap can be formed between the side surface of valve plate 220 in the thickness direction and the side wall of the accommodating space, so as to reserve a high-temperature deformation space for valve plate 220, and prevent valve plate 220 from being locked with valve body 210 after being deformed to affect the normal operation of the exhaust device.
In other embodiments, the valve plate 220 has a size smaller than the size of the receiving space and larger than the size of the valve port in a second direction perpendicular to the thickness direction of the valve plate 220 and the moving direction of the valve plate 220. Based on this, after the valve plate 220 is assembled in the accommodating space, a gap can be formed between the side surface of the valve plate 220 in the second direction (i.e., the width direction) and the side wall of the accommodating space, so that a high-temperature deformation space can be reserved for the valve plate 220 as well, the valve plate 220 is prevented from being locked with the valve body 210 after being deformed to affect the normal operation of the exhaust device, and the valve port can be closed in the second direction. In addition, the valve plate 220 also has a size greater than that of the valve port in the lengthwise direction of the valve plate 220 to completely close the valve port against leakage.
Of course, a deformation gap may be left in both the first direction and the second direction to ensure smooth movement of the valve plate 220 to the maximum.
Referring to fig. 6 to 8, in some embodiments, the first exhaust assembly 100 includes a transition box 110 and a heat insulating member 120, the transition box 110 is connected to the furnace body 400 at an air outlet of the furnace body 400, the heat insulating member 120 is disposed in the transition box 110, an air duct 121 is disposed in the heat insulating member 120, and openings at two ends of the air duct 121 form an air inlet and an air outlet of the first exhaust assembly 100.
Optionally, the transition box 110 has a channel in which the insulation 120 is disposed, and in order to prevent the insulation 120 from blocking the channel of the transition box 110, an air duct 121 is opened in the insulation 120. Therefore, the air can be dredged through the ventilation duct 121 to be exhausted, and meanwhile, the heat insulation piece 120 can isolate the high-temperature air from the wall surface of the transition box 110, so that the heat in the high-temperature air can be effectively relieved and dissipated to the ambient air through the transition box 110, and the ambient temperature is increased to cause the damage of the nearby components and the damage of the first exhaust assembly 100.
Referring to fig. 6, in some embodiments, the transition box 110 includes a box body 111, and a third flange 112 and a fourth flange 113 respectively disposed at openings at two ends of the box body 111, the third flange 112 is disposed at the opening of the box body 111 far from the furnace body 400 and connected with the valve body 210, and the fourth flange 113 is disposed at the opening of the box body 111 near the furnace body 400 and used for being connected with the furnace body 400 at the air outlet of the furnace body 400. Based on the above arrangement, the control valve assembly 200 and the first exhaust assembly 100 can be fixed together by the third flange 112, and are communicated with the valve port of the control valve assembly 200 through the opening of the cartridge body 111 far away from the oven body 400; the first exhaust assembly 100 may be fixed to the furnace body 400 by the third flange 112, and communicate with the air outlet of the furnace body 400 through an opening of the cartridge body 111 close to the furnace body 400. Therefore, the connection of the control valve assembly 200 to the furnace body 400 is achieved through the cartridge body 111, and the channeling of the gas is achieved through the cartridge body 111 and the heat insulator 120 therein to facilitate the gas discharge.
Alternatively, the third flange 112 and the valve body 210 of the control valve assembly 200 may be fixed by bolts; the fourth flange 113 and the furnace body 400 may be connected by screws, or may be welded, riveted, or adhesively fixed.
Referring to fig. 7, since the fourth flange 113 is connected to the furnace body 400, when the outer sidewall of the furnace body 400 is arc-shaped, the fourth flange 113 may be designed as an arc-shaped flange member, so that the fourth flange 113 is tightly fixed to the furnace body 400. Meanwhile, the end of the box body 111 may be designed to be arc-shaped so as to be adapted to the fourth flange 113.
In order to enable the first exhaust assembly 100 to channel gas, through holes may be respectively formed in the third flange 112 and the fourth flange 113, wherein the through holes on the third flange 112 may be communicated with the valve port of the control valve assembly 200, and the through holes on the fourth flange 113 may be communicated with the air outlet of the furnace body 400. Alternatively, the size of the through hole on the third flange 112 may be the same as that of the valve port, and the size of the through hole on the fourth flange 113 may be the same as that of the air outlet of the oven body 400, so that the air can more smoothly pass through the first exhaust assembly 100.
Alternatively, the third flange 112, the fourth flange 113 and the box body 111 may be stainless steel pieces, and the three may be connected in sequence by welding to form the transition box 110.
In some embodiments, the size of the opening of the cartridge body 111 distal from the furnace body 400 is larger than the size of the opening proximal to the furnace body 400. Based on this, in the case where the size of the outlet of the furnace body 400 is different from the size of the valve port of the control valve assembly 200, connection can be performed through the cartridge body 111, thereby adapting to connection between components of different sizes.
Alternatively, the transition box 110 may include a first box section and a second box section, wherein the first box section is a rectangular housing, the second box section is a funnel-shaped housing, and a small end of the funnel-shaped housing is connected with the rectangular housing.
Here, since the heat insulating material 120 needs to be processed according to the transition box 110, in consideration of the processing difficulty and the installation difficulty of the heat insulating material 120, in the embodiment of the present application, the heat insulating material 120 includes a first sub heat insulating material 122 and a second sub heat insulating material 123, where the first sub heat insulating material 122 is disposed in a region of the transition box 110 close to the furnace body 400 and has a shape matching the shape of the region, and the second sub heat insulating material 123 is disposed in a region of the transition box 110 far from the furnace body 400 and has a shape matching the shape of the region. As such, when the thermal insulation members 120 are installed, the first sub thermal insulation member 122 and the second sub thermal insulation member 123 may be installed into the transition box 110, respectively, so that the gas in the transition box 110 may be isolated from the wall surface of the transition box 110 to mitigate the heat from being diffused outward.
Alternatively, the region of the transition box 110 close to the furnace body 400 (i.e., the first box section) may be a rectangular housing, in which case the longitudinal section of the first sub heat insulation member 122 may be designed to be rectangular; the region of the transition box 110 away from the furnace body 400 (i.e., the second box section) may be a funnel housing, and in this case, the second sub heat insulator 123 may be designed in a funnel shape. Thus, when the heat insulation piece 120 is installed, the first sub heat insulation piece 122 penetrates from one end of the first box section, which is far away from the second box section, and the second sub heat insulation piece 123 penetrates from one end of the second box section, which is far away from the first box section, so that the first sub heat insulation piece 122 and the second sub heat insulation piece 123 are installed respectively, the installation efficiency is improved, the first sub heat insulation piece 122 and the second sub heat insulation piece 123 can be manufactured and processed respectively, and the manufacturing and processing efficiency can be improved.
Referring to fig. 8, in some embodiments, the area of the cross section of the air path 121 in the first sub-insulator 122 is maintained constant, the area of the cross section of the air path 121 in the second sub-insulator 123 is gradually increased in a direction away from the semiconductor heat treatment apparatus, and the maximum area of the cross section of the air path 121 in the second sub-insulator 123 is smaller than the area of the valve port.
Based on the above arrangement, on one hand, it can be ensured that the gas in the furnace body 400 can sequentially flow to the valve port through the ventilation duct 121 of the first sub-heat-insulation piece 122 and the ventilation duct 121 of the second sub-heat-insulation piece 123 and be discharged from the valve port, and on the other hand, since the area of the cross section of the ventilation duct 121 of the first sub-heat-insulation piece 122 is kept unchanged, the heat insulation effect of the region of the transition box 110 close to the furnace body 400 is relatively uniform, so as to alleviate the outward diffusion of heat.
In addition, since the end of the transition box 110 far from the furnace body 400 is fixed to the control valve assembly 200 by the third flange 112, the area of the cross section of the end of the transition box 110 far from the furnace body 400 is gradually increased, and the area of the cross section of the second sub heat insulator 123 is also gradually increased to adapt to the shape of the transition box 110. In addition, the area of the cross section of the air duct 121 in the second sub-heat insulator 123 is gradually increased along the direction away from the semiconductor heat treatment apparatus, so that on one hand, the air in the furnace body 400 can be smoothly guided to the valve port through the air duct 121 of the second sub-heat insulator 123 and discharged from the valve port, and on the other hand, the heat insulation effect of the region of the transition box 110 away from the furnace body 400 is relatively uniform, so as to alleviate the outward diffusion of heat.
In some embodiments, the cross-sectional area of the outlet of the oven body 400, the cross-sectional area of the air duct 121 of the first sub-heat insulator 122, and the cross-sectional area of the air duct 121 of the second sub-heat insulator 123 are all equal. In this way, in the exhaust process, the gas sequentially passes through the air outlet of the furnace body 400, the air duct 121 of the first sub heat insulator 122 and the air duct 121 of the second sub heat insulator 123, and in this process, the gas smoothly flows without being blocked, so that the exhaust amount is not affected.
In some embodiments, the air path 121 of the first sub-insulator 122 may be a rectangular path having a relatively large aspect ratio, and the inlet of the air path 121 of the second sub-insulator 123 may be a rectangular hole having a relatively small aspect ratio, and the cross-sectional area of the rectangular path is equal to that of the rectangular hole, so as to avoid affecting the amount of exhaust gas.
In order to limit the second sub-insulator 123 to prevent the second sub-insulator 123 from moving in the transition box 110, the maximum area of the cross section of the air duct 121 in the second sub-insulator 123 is made smaller than the area of the valve port, so that the second sub-insulator 123 can abut on the valve body 210, thereby blocking and limiting the movement of the second sub-insulator 123 by the valve body 210.
In order to limit the first sub-thermal insulation member 122 and prevent the first sub-thermal insulation member 122 from moving in the transition box 110, the fourth flange 113 is sealed at one end of the box body 111 close to the furnace body 400, and a through hole is formed in the fourth flange 113. In this way, the fourth flange 113 can limit the first sub-insulating member 122 from moving or separating from the transition box 110, and is communicated with the ventilation channel 121 of the first sub-insulating member 122 through the through hole, so as to ensure that the gas exhausted from the furnace body 400 can be exhausted through the first exhaust assembly 100 and the control valve assembly 200.
Referring to fig. 3, in some embodiments, the valve body 210 includes a first flange 211 and a second flange 212 arranged in a stack, and the first flange 211 and the second flange 212 are each provided with an exhaust port 213, which cooperate to form a valve port.
Optionally, the first flange 211 and the second flange 212 may be detachably connected, for example, by bolts, screws, clamping, or the like, or may be fixedly connected, for example, by welding, bonding, riveting, or the like. Of course, the first flange 211 and the second flange 212 may also be integrally formed, that is, the valve body 210 may be integrally formed. The specific form of the valve body 210 is not limited in the embodiments of the present application.
In the embodiment of the present application, first flange 211 and the range upon range of setting of second flange 212, valve plate 220 is movably set up between first flange 211 and second flange 212, so, first flange 211, second flange 212 and valve plate 220 three have formed "sandwich" structure, can reduce control valve subassembly 200's volume to a certain extent, weight reduction, be favorable to realizing exhaust device's miniaturized development, and still make control valve subassembly 200 structure simpler, reduce design, manufacturing cost.
In addition, since the surface of the heat insulator 120 is rough, when the end surface of the heat insulator 120 contacts the valve plate 220, the valve plate 220 moves relative to the valve body 210 and generates a large frictional force with the heat insulator 120, so that the valve plate 220 is not easily moved and the heat insulator 120 is easily damaged. In this way, during assembly, the end surface of the heat insulator 120 (specifically, the second sub heat insulator 123) abuts against the surface of the valve body 210, that is, the surface of the second flange 212 facing away from the valve plate 220, so that the heat insulator 120 and the valve plate 220 are separated by the second flange 212 to avoid contact therebetween, thereby ensuring smooth movement of the valve plate 220 and the integrity of the heat insulator 120.
Referring to fig. 4, in order to assemble the valve plate 220 on the valve body 210, the embodiment of the present application is provided with a groove 2111 on a surface of one of the first flange 211 and the second flange 212 facing the other one around the exhaust port 213, and the groove 2111 and the surface of the other one enclose a receiving space. Alternatively, the notch 2111 may be formed on the surface of the first flange 211, or on the surface of the second flange 212. After the first flange 211 and the second flange 212 are assembled, an accommodation space is formed therebetween, so that the valve plate 220 can be assembled to the valve body 210, and the valve plate 220 can also move in the accommodation space to switch the open and closed states.
In addition to the above, it is also possible to provide the grooves 2111 on the opposed surfaces of the first flange 211 and the second flange 212, respectively, around the exhaust port 213, and the two grooves 2111 together enclose the accommodation space. Based on this, after the first flange 211 and the second flange 212 are assembled, a receiving space may be also formed therebetween to assemble the valve plate 220, and the valve plate 220 may be moved in the receiving space formed by the two recesses 2111 to switch the open and closed state.
In some embodiments, when the groove 2111 is formed in the first flange 211, the thickness of the first flange 211 may be greater than that of the second flange 212 during design, and a certain thickness of the structure may be cut off from the surface of the first flange 211 facing the second flange 212 to form the groove 2111. In this way, the first flange 211 and the second flange 212 form a space with the above thickness after being connected so as to accommodate the valve plate 220 and allow the valve plate 220 to move relative to the valve body 210, while also reserving a space for high temperature deformation of the valve plate 220.
In some embodiments, a side surface of the groove 2111 is provided with an escape opening, and after the first flange 211 and the second flange 212 are relatively fixedly installed, an opening is formed through the escape opening to allow the valve plate 220 to move into or out of the accommodating space.
Alternatively, a material may be cut from the bottom end surface of the first flange 211 toward the top direction to form the groove 2111, and the top end surface of the groove 2111 is spaced apart from the top end surface of the first flange 211 by a distance such that one side of the groove 2111 is open and the other side is closed. Based on this, when the driver 230 fails, the valve plate 220 can be limited by the closed side of the notch 2111, so as to ensure that the valve plate 220 cannot be separated from the notch 2111. When the first flange 211 is mounted, the side of the opening is directed downward, and the surface of the first flange 211 where the recess 2111 is opened is attached to the second flange 212 to form a receiving space for receiving the valve plate 220.
In order to allow the first exhaust assembly 100 to communicate with the outside, the valve body 210 in the embodiment of the present application is provided with an opening. Specifically, the first flange 211 and the second flange 212 are respectively provided with an air outlet 213 communicated with the accommodating space, and the air outlet 213 of the first flange 211 and the air outlet 213 of the second flange 212 are oppositely arranged, so that the two air outlets 213 can form a valve port together, and the first air exhausting assembly 100 can be communicated with the outside through the valve port, thereby facilitating the exhaust of the gas in the furnace body 400.
Optionally, the length and width of the valve plate 220 are larger than those of the air outlet 213, so as to ensure that the valve plate 220 can completely block the valve port when closed, and at the same time, the installation of other components is not affected.
It should be noted here that the groove 2111 has a groove bottom area larger than the respective air outlets 213 of the first flange 211 and the second flange 212, so as to ensure that the valve plate 220 can completely isolate the air outlet 213 of the first flange 211 from the air outlet 213 of the second flange 212. Of course, the groove bottom area of the groove 2111 is not too large, and a space for the assembly of the first flange 211 and the second flange 212 needs to be provided. For example, when the first flange 211 and the second flange 212 are connected by bolts, mounting holes are required to be formed in the two flanges, and in this case, the formation of the notch 2111 does not affect the formation of the mounting holes.
Based on the above arrangement, when the valve plate 220 is completely moved into the recess 2111, the valve plate 220 partitions the respective exhaust ports 213 of the first and second flanges 211 and 212, so that the first exhaust assembly 100 can be prevented from communicating with the outside; when the valve plate 220 is at least partially moved out of the groove 2111, the exhaust port 213 of the first flange 211 is at least partially communicated with the exhaust port 213 of the second flange 212, so that the gas can be exhausted to the outside through the exhaust port of the furnace body 400, the first exhaust assembly 100, the exhaust port 213 of the second flange 212 and the exhaust port 213 of the first flange 211 in sequence.
With continued reference to fig. 2, to effect movement of valve plate 220 relative to valve body 210, control valve assembly 200 in the present embodiment further includes a driver 230, wherein driver 230 includes a linear driver 231, and a driving end of linear driver 231 is connected to valve plate 220 to drive valve plate 220 to move relative to valve body 210 to open or close. Alternatively, the linear actuator 231 may be a pneumatic cylinder, a hydraulic cylinder, an electric cylinder, or the like.
In the embodiment of the present application, the moving direction of the valve plate 220 is perpendicular to the setting direction of the valve port, and the output end of the linear driving element 231 is connected to the end of the valve plate 220 away from the valve port, so that the linear driving element 231 is relatively far away from the valve port and far away from the first exhaust assembly 100, and thus the normal operation of the linear driving element 231 is not affected by the high temperature gas in the first exhaust assembly 100 and the valve port, thereby ensuring the normal opening or closing of the valve plate 220, and further ensuring the normal operation of the exhaust device.
In order to control the opening and closing of the valve plate 220, a magnetic switch may be disposed on the linear driving member 231, and the magnetic switch is configured to send a status signal of the linear driving member 231 to the controller, so as to implement remote control of the program. It should be noted that, for the specific structure and principle of the magnetic switch, reference may be made to the related art, and details are not described herein.
Referring to fig. 2 and 5, in order to fix the linear driving member 231, in the embodiment of the present application, a fixing bracket 232 is additionally provided, wherein the fixing bracket 232 is connected to the first exhaust assembly 100 or the valve body 210, and the linear driving member 231 connects the fixing bracket 232 to the valve plate 220. Based on this, the fixing bracket 232 can fix and support the linear actuator 231, and the valve plate 220 can be driven to move relative to the valve body 210 by the linear actuator 231. Alternatively, the fixing bracket 232 may be a stainless steel member.
With continued reference to fig. 5, in some embodiments, the end of the first exhaust assembly 100 is provided with a flange, the valve body 210 is attached to one side of the flange, and the fixing bracket 232 may be attached to the side of the flange opposite the valve body 210. Accordingly, in order to avoid the first exhaust module 100, the fixed bracket 232 is provided with an avoiding gap 2321, and when the fixed bracket 232 is connected to the first exhaust module 100, at least a part of the first exhaust module 100 is located in the avoiding gap 2321, so that interference between the fixed bracket 232 and the first exhaust module 100 can be prevented. The fixing portions 2322 are respectively disposed at both sides of the escape notch 2321, and when the fixing bracket 232 is mounted, the fixing portions 2322 at both sides are fixed to the first exhaust component 100, for example, by means of screws, bolts, or the like.
In some embodiments, the fixing bracket 232, the third flange 112, the second flange 212 and the first flange 211 are sequentially stacked in this order, and a plurality of screws or bolts are inserted through the four to achieve locking fixation. Of course, it is also possible to stack the third flange 112, the second flange 212, the first flange 211 and the fixing bracket 232 in sequence, and pass a plurality of screws or bolts through the third flange, the second flange 212, the first flange 211 and the fixing bracket 232 to achieve locking and fixing. Of course, in any arrangement, the linear actuator 231 may be fixed and the valve plate 220 may be driven by the linear actuator 231 to move smoothly.
With continued reference to fig. 5, in order to achieve the fixation of the linear driving member 231, the fixing bracket 232 in the embodiment of the present application includes a folded edge 2323 disposed perpendicular to the moving direction of the valve plate 220, and the main body of the linear driving member 231 is fixed to the folded edge 2323 to drive the valve plate 220 to move relative to the valve body 210. Based on the above arrangement, the fixing bracket 232 is an L-shaped plate, wherein the long-side plate of the L-shaped plate is provided with an avoiding notch 2321, the long-side plate is of a U-shaped structure, and the short-side plate is used for fixing the linear driving member 231.
In order to realize the connection between the linear driving member 231 and the valve plate 220, in the embodiment of the present application, the valve plate 220 may be designed as an L-shaped plate, wherein a long side plate of the L-shaped plate is movably disposed on the valve body 210, a connecting frame is disposed on a short side plate, and an output end of the linear driving member 231 is connected to the connecting frame. And the connection frame is disposed opposite to the folding edge 2323, so that the linear driving member 231 can be respectively connected to the valve plate 220 and the fixing frame 232.
Referring to fig. 1 and 9, in order to facilitate the exhaust, the exhaust device according to the embodiment of the present application further includes a second exhaust assembly 300, and the second exhaust assembly 300 may receive the gas exhausted from the control valve assembly 200 and exhaust the gas to the outside. In some embodiments, the second exhaust assembly 300 includes a fifth flange 310 and an exhaust pipe 320, wherein the fifth flange 310 is connected to a side of the valve body 210 facing away from the first exhaust assembly 100, and the exhaust pipe 320 is opposite to the valve port.
Optionally, the fifth flange 310 and the exhaust pipe 320 may be stainless steel members, and are fixed by welding. In addition, the fifth flange 310 is provided with a vent hole, and the cross sectional area of the vent hole is the same as that of the exhaust pipe 320, so that the exhaust amount is not affected. The exhaust duct 320 may be a single-layer duct or a double-layer water-cooling duct, and when the heat exchanger is at the front end, the exhaust duct 320 may be a single-layer duct, and when the heat exchanger is at the rear end, the exhaust duct 320 may be a double-layer water-cooling duct.
When installed, fifth flange 310 is secured to first flange 211. Optionally, the fifth flange 310 is fixed to the first flange 211 by screws or bolts. In addition, after the fifth flange 310 is mounted on the first flange 211, in order not to affect the mounting of the first flange 211 and the second flange 212 and the mounting of the valve body 210 and the first exhaust component 100, in the embodiment of the present application, the size of the fifth flange 310 is made small, so that the cross-sectional area of the fifth flange 310 is smaller than that of the first flange 211, so as to reserve a certain mounting space, and thus not affect the mounting of other structures.
Based on the above arrangement, by replacing the exhaust box with the fifth flange 310, the overall volume and weight of the second exhaust assembly 300 are reduced, thereby reducing the space occupied by the entire exhaust device.
In order to improve the gas discharge efficiency, the fan 500 may be additionally disposed at the downstream of the second air exhaust assembly 300, and under the action of the fan 500, a certain negative pressure is generated in the air exhaust pipe 320 of the second air exhaust assembly 300, so as to accelerate the gas discharge, and meanwhile, a certain vacuum degree is generated in the air exhaust pipe 320, so as to accelerate the gas flow efficiency in the second channel and the first channel, and further, to efficiently exhaust the high-temperature gas in the furnace, so as to achieve the purpose of rapid cooling.
Referring to fig. 10 and 11, the embodiment of the application also discloses a semiconductor heat treatment device, which comprises the air exhaust device.
In addition, the semiconductor thermal processing equipment further comprises a furnace body 400 and the air exhaust device, wherein the furnace body 400 comprises a chamber 410, and an air inlet channel 420 and an air outlet channel 430 which are respectively communicated with the chamber 410, and the air outlet channel 430 is communicated with the first air exhaust assembly 100 through an air outlet.
In addition, the semiconductor heat treatment apparatus further includes a process tube 460 disposed in the chamber 410, the chamber 410 concentrically installed at the periphery of the process tube 460, the process tube 460 concentrically installed at the periphery of the carrying boat, and a carrying boat on which a product to be processed is placed.
When the furnace body 400 needs to be rapidly cooled, a cooling medium, which may be cold air, is introduced into the air inlet channel 420, and the cold air flows into the chamber 410 along the air inlet channel 420, flows from the chamber 410 to the air outlet channel 430, then flows into the first exhaust assembly 100 through the air outlet channel 430, and flows from the first exhaust assembly 100 to the control valve assembly 200. In this way, when the valve plate 220 is opened, the cool air can be discharged. In the process of cold air flowing, the heat in the furnace body 400 is taken away and discharged to the outside, thereby achieving the purpose of rapidly cooling the furnace body 400.
Referring to fig. 10, in order to realize the flow of the cooling medium in the furnace body 400, in the embodiment of the present application, the air intake channel 420 includes a main channel 421 and a branch channel 422, and the branch channel 422 is communicated with the main channel 421, and the branch channel 422 is disposed around the chamber 410. Optionally, a plurality of branch passages 422 may be provided, and the plurality of branch passages 422 are all communicated with the main passage 421, so that gas may be dredged for the plurality of branch passages 422 through the main passage 421, and meanwhile, the plurality of branch passages 422 are disposed around the chamber 410, so as to increase the heat exchange area with the chamber 410, and further improve the heat exchange efficiency.
In order to introduce the gas into the space between the inner wall of the chamber 410 and the process tube 460, the gas injection holes 440 are disposed between the branch passage 422 and the chamber 410 to communicate the branch passage 422 and the chamber 410, so that the gas in the branch passage 422 can be injected into the space between the inner wall of the chamber 410 and the process tube 460 through the gas injection holes 440, thereby reducing the temperature of the environment in the chamber 410. Alternatively, the side walls of the branch passages 422 may be opened with a plurality of gas injection holes 440, and the plurality of gas injection holes 440 may also be disposed around the chamber 410 to inject gas from a plurality of angles, so as to improve heat exchange efficiency.
In order to exhaust the gas in the space between the inner wall of the chamber 410 and the process tube 460, the exhaust holes 450 communicating the chamber 410 and the exhaust channel 430 are disposed between the chamber 410 and the process tube 460, so that the gas in the space between the inner wall of the chamber 410 and the process tube 460 can be exhausted into the exhaust channel 430 through the exhaust holes 450, and exhausted through the exhaust channel 430 and other subsequent exhaust components. Alternatively, the exhaust hole 450 may be provided at the top of the chamber 410 because the gas injected into the space between the inner wall of the chamber 410 and the process tube 460 absorbs heat in the chamber 410 to heat the gas, and the gas having a higher temperature flows upward, so that the heated gas can be smoothly exhausted through the exhaust hole 450 opened at the top of the chamber 410.
In summary, the exhaust device in the embodiment of the present application can alleviate the problem of the valve plate 220 being stuck; set up heat insulating part 120 in transition box 110, can effectively alleviate the heat and give off to the surrounding environment in to reduce the influence to surrounding parts, meanwhile, linear driving piece 231 is far away from high-temperature gas, thereby can not influence linear driving piece 231's normal work, has guaranteed that valve plate 220 normally opens or closes, and then has guaranteed exhaust device's normal operating.
The air exhaust device in the embodiment of the application also has the advantages of small volume, light weight, few parts, simple structure, low assembly difficulty and the like, so that the occupied space can be reduced, the cost is reduced, and the assembly efficiency is improved.
While the present embodiments have been described with reference to the accompanying drawings, it is to be understood that the invention is not limited to the precise embodiments described above, which are meant to be illustrative and not restrictive, and that various changes may be made therein by those skilled in the art without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (10)
1. An air exhaust device applied to semiconductor heat treatment equipment is characterized by comprising:
the air inlet of the first air exhaust assembly (100) is communicated with the air outlet of the furnace body (400) of the semiconductor heat treatment equipment;
the control valve assembly (200) comprises a valve body (210), a valve plate (220) and a driver (230), wherein the valve body (210) is connected to an air outlet of the first exhaust assembly (100), the valve body (210) is provided with a valve port opposite to an air outlet of the first exhaust assembly (100), the valve body (210) is further provided with a containing space for containing the valve plate (220), one side of the containing space is provided with an opening, and the driver (230) is connected with the valve plate (220) and used for driving the valve plate (220) to move into the containing space or move out of the containing space so as to enable the valve plate (220) to close or open the valve port.
2. Exhaust device according to claim 1, characterized in that the valve plate (220) has a size smaller than the size of the accommodation space and larger than the size of the valve port, the valve plate (220) being in clearance fit with the inner wall of the accommodation space in case the valve plate (220) is moved into the accommodation space.
3. The exhaust device according to claim 1 or 2, characterized in that the first exhaust assembly (100) comprises a transition box (110) and insulation (120);
transition box (110) be in the air outlet department of furnace body (400) with furnace body (400) are connected, heat insulating part (120) set up in transition box (110), just be equipped with air duct (121) in heat insulating part (120), the opening at air duct (121) both ends forms the air intake and the air outlet of first exhaust subassembly (100).
4. The exhaust device according to claim 3, wherein the transition box (110) comprises a box body (111) and a third flange (112) and a fourth flange (113) respectively arranged at openings at two ends of the box body (111), the size of the opening of the box body (111) far away from the furnace body (400) is larger than that of the opening close to the furnace body (400), the third flange (112) is arranged at the opening of the box body (111) far away from the furnace body (400) and is connected with the valve body (210), and the fourth flange (113) is arranged at the opening of the box body (111) close to the furnace body (400) and is used for being connected with the furnace body (400) at the air outlet of the furnace body (400);
the heat insulation piece (120) comprises a first sub heat insulation piece (122) and a second sub heat insulation piece (123), the first sub heat insulation piece (122) is arranged in a region, close to the furnace body (400), of the transition box (110) and is matched with the region in shape, and the second sub heat insulation piece (123) is arranged in a region, far away from the furnace body (400), of the transition box (110) and is matched with the region in shape.
5. The exhaust device according to claim 4, wherein the cross-sectional area of the air duct (121) in the first sub-insulator (122) is kept constant, the cross-sectional area of the air duct (121) in the second sub-insulator (123) is gradually increased in a direction away from the semiconductor heat treatment apparatus, and the maximum cross-sectional area of the air duct (121) in the second sub-insulator (123) is smaller than the area of the valve port.
6. The exhaust device according to claim 3, wherein the valve body (210) comprises a first flange (211) and a second flange (212) which are arranged in a stacked manner, the first flange (211) and the second flange (212) are provided with exhaust openings (213) which are matched to form the valve port;
a groove (2111) is arranged on the surface of one of the first flange (211) and the second flange (212) facing the other flange and surrounds the air outlet (213), and the groove (2111) and the surface of the other flange enclose the accommodating space; or grooves (2111) are formed in the surfaces, opposite to the first flange (211) and the second flange (212), of the first flange (211) and the second flange (212) and surround the air exhaust opening (213), and the notch of the groove (2111) of the first flange (211) is opposite to the notch of the groove (2111) of the second flange (212) and is surrounded into the accommodating space;
an avoidance opening is formed in one side surface of the groove (2111) to form the opening.
7. The exhaust device according to claim 1, characterised in that the drive (230) comprises a linear drive (231) and a fixed bracket (232);
the fixed support (232) is connected to the first exhaust assembly (100) or the valve body (210), the linear driving piece (231) is connected to the fixed support (232), and the driving end of the linear driving piece (231) is connected to the valve plate (220) to drive the valve plate (220) to move.
8. The exhaust device according to claim 7, characterized in that the fixing bracket (232) is provided with an avoidance gap (2321), both sides of the avoidance gap (2321) are respectively provided with a fixing part (2322), the fixing part (2322) is fixed to the first exhaust component (100), and the first exhaust component (100) is at least partially located in the avoidance gap (2321);
the fixed support (232) further comprises a folding edge (2323) perpendicular to the moving direction of the valve plate (220), and the linear driving piece (231) is fixed on the folding edge (2323).
9. The exhaust device according to claim 1, further comprising a second exhaust assembly (300), the second exhaust assembly (300) comprising a fifth flange (310) and an exhaust duct (320);
the fifth flange (310) is connected to a side of the valve body (210) facing away from the first exhaust component (100), and the exhaust pipe (320) is opposite to the valve port.
10. A semiconductor heat treatment apparatus characterized by comprising the air exhaust device of any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202111014360.3A CN113611637A (en) | 2021-08-31 | 2021-08-31 | Exhaust device and semiconductor heat treatment equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111014360.3A CN113611637A (en) | 2021-08-31 | 2021-08-31 | Exhaust device and semiconductor heat treatment equipment |
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| CN113611637A true CN113611637A (en) | 2021-11-05 |
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| CN202111014360.3A Pending CN113611637A (en) | 2021-08-31 | 2021-08-31 | Exhaust device and semiconductor heat treatment equipment |
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