CN113502462B - Lifting device of MPCVD growth platform - Google Patents

Lifting device of MPCVD growth platform Download PDF

Info

Publication number
CN113502462B
CN113502462B CN202110743448.2A CN202110743448A CN113502462B CN 113502462 B CN113502462 B CN 113502462B CN 202110743448 A CN202110743448 A CN 202110743448A CN 113502462 B CN113502462 B CN 113502462B
Authority
CN
China
Prior art keywords
transmission
groove
adjusting device
chamber
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202110743448.2A
Other languages
Chinese (zh)
Other versions
CN113502462A (en
Inventor
胡常青
赵建海
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Boshiguang Semiconductor Technology Co ltd
Original Assignee
Shanghai Boshiguang Semiconductor Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Boshiguang Semiconductor Technology Co ltd filed Critical Shanghai Boshiguang Semiconductor Technology Co ltd
Priority to CN202110743448.2A priority Critical patent/CN113502462B/en
Publication of CN113502462A publication Critical patent/CN113502462A/en
Application granted granted Critical
Publication of CN113502462B publication Critical patent/CN113502462B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate

Abstract

The invention discloses a lifting device of an MPCVD growth platform, which comprises a fixing device and a power device, adjusting device and detection device, fixing device and power device connect, power device and adjusting device transmission are connected, adjusting device one side is equipped with a plurality of detection device, detection device and adjusting device swing joint, fixing device includes the frame, workstation and reacting chamber, the frame upside is arranged in to the workstation, frame and workstation fastening connection, the workstation upside is equipped with the reacting chamber, be equipped with the through-hole on the workstation, the reacting chamber bottom side is equipped with the import, workstation through-hole and reacting chamber import intercommunication, be equipped with the reaction chamber on the reacting chamber, adjusting device and detection device arrange the reaction intracavity in, the adjusting device upside is equipped with the growth platform, growth platform and adjusting device fastening connection, fixing device still includes the base, base and frame fastening connection, base one side is equipped with power device.

Description

Lifting device of MPCVD growth platform
Technical Field
The invention relates to the technical field of MPCVD position adjustment, in particular to a lifting device of an MPCVD growth platform.
Background
The diamond has outstanding performances of high hardness, good thermal conductivity, excellent optical performance and the like in a material, but the conventional diamond can only be collected from the nature, has high cost and is not suitable for large-scale use, and along with the continuous development of science and technology, the artificial diamond gradually becomes a main means for obtaining the diamond material, so that the production cost is reduced, and the diamond can be used in a large range. At present, the main methods for obtaining diamond include a hot wire method, a direct current arc plasma jet method and a microwave method, and among the three diamond deposition techniques, diamond obtained by Microwave Plasma Chemical Vapor Deposition (MPCVD) has high quality and is the preferred method.
In order to improve the deposition quality of diamond continuously, research still needs to be carried out continuously, however, in the existing structure, most of diamond growth tables are fixed and inconvenient to move, when the diamond is settled, the relative positions of the growth tables and plasma clusters need to be adjusted to obtain high-quality diamond, the growth tables are not suitable in height, the plasma can be cut off, the clustering is unstable, and the deposition quality is influenced. In addition, the lifting of part of the growth table can be observed and adjusted only through human eyes, when plasma groups in the reaction chamber react violently, the observation is inconvenient, the positioning failure is easily caused, after the carbon source is subjected to plasmatization, the carbon source is easily influenced by air flow disturbance, disordered flow is carried out, deposited diamond is uneven, when the plasma turns into a solid phase, a large amount of heat can be emitted, and the deposition quality can be influenced by uneven heating of the substrate.
Disclosure of Invention
The present invention is directed to a lifting device for an MPCVD growth stage to solve the above problems.
In order to solve the technical problems, the invention provides the following technical scheme:
the utility model provides a elevating gear of MPCVD growth platform, including fixing device, power device, adjusting device and detection device, fixing device and power device connect, power device and adjusting device transmission are connected, adjusting device one side is equipped with a plurality of detection device, detection device and adjusting device swing joint, fixing device includes the frame, workstation and reacting chamber, the frame upside is arranged in to the workstation, frame and workstation fastening connection, the workstation upside is equipped with the reacting chamber, be equipped with the through-hole on the workstation, the reacting chamber bottom side is equipped with the import, workstation through-hole and reacting chamber import intercommunication, be equipped with the reaction chamber on the reacting chamber, adjusting device and detection device arrange the reaction intracavity in, the adjusting device upside is equipped with the growth platform, growth platform and adjusting device fastening connection.
The fixing device is a main force bearing device of the invention, the power device is fixed, the adjusting device is driven by the power device to move up and down, the growth platform is arranged at the upper end of the adjusting device so as to drive the growth platform to move, the positions of plasma clusters and other gases in the reaction cavity are detected by the detection device so as to move the growth platform to the lower part of the plasma clusters, the growth platform is positioned, the plasma clusters are prevented from being cut off by the growth platform, the stability of the plasma clusters is improved, the deposition efficiency is improved, the workbench is fixed by the framework, the heat transfer efficiency of the growth platform and the adjusting device is improved by fastening connection, the temperature of each substrate prevented on the growth platform is kept consistent, the deposition is more uniform, the deposition quality is improved, and the reaction chamber is fixed by the workbench.
Further, the fixing device also comprises a base, the base is fastened and connected with the frame, one side of the base is provided with a power device, the power device comprises a servo motor and a transmission seat, the outer frame of the servo motor is fastened and connected with the base, the output end of the servo motor is provided with a supporting flange, the supporting flange extends upwards to be provided with a lead screw, the servo motor is in transmission connection with the lead screw through the supporting flange, the lead screw is connected with the frame through a supporting component, the outer ring of the lead screw is sleeved with the transmission seat, the middle of the transmission seat is provided with a threaded hole, the transmission seat is in threaded connection with the lead screw, the supporting component comprises an upper bracket and a lower bracket, the upper bracket is provided with a bearing hole, the upper end of the lead screw is provided with a bearing, the outer ring of the bearing is connected with the bearing hole, the transmission seat is symmetrically provided with a guide groove, the guide groove is positioned on the upper side of the threaded hole, the upper bracket penetrates through the guide groove, the outer side of the upper bracket is in sliding connection with the wall surface of the guide groove, and the two ends of the upper bracket are fastened and connected with the frame, the lower bracket is provided with a supporting groove, the supporting flange is movably connected with the supporting groove, and two ends of the lower bracket are fixedly connected with the frame.
The base is fixed through the frame, the servo motor is placed on the base, the servo motor is fixed through fastening connection, the servo motor is in transmission connection with the lead screw through the supporting flange, the transmission stability is improved, the supporting groove is formed in the lower bracket, the supporting flange is supported through the supporting groove, the lead screw is supported in a rotary mode, the rotary stability is improved, the two ends of the lower bracket are connected with the frame, the self stability is guaranteed, the servo motor is in transmission through the lead screw, the lead screw is connected with the transmission seat through a threaded hole, the lead screw is rotated to move up and down of the transmission seat, the double-end support is carried out on the lead screw through the supporting assembly, the rotary stability is improved, the two ends of the upper bracket are supported on the frame, the bearing is supported through the bearing hole, the upper end of the lead screw is supported, the friction is reduced through the bearing connection, the rotary smoothness is improved, the guide grooves are symmetrically arranged, the upper bracket passes the guide way to spacing to driving seat prevents that driving seat from rotating, improves displacement output precision, and upper bracket and guide way prevent through swing joint that the motion is interfered.
Furthermore, a transmission lug extends upwards from a transmission seat, one end of the transmission lug sequentially penetrates through a through hole of a workbench and an inlet of a reaction chamber, the transmission lug is hermetically connected with the inlet of the reaction chamber, the top end of the transmission lug extends into the reaction chamber, an adjusting device is arranged at the top end of the transmission lug and comprises a supporting seat, a sliding block, a magnet and an induction coil, the transmission lug is movably connected with the bottom side of the supporting seat, a growth platform is arranged on the upper side of the supporting seat, a plurality of detection devices are arranged on the supporting seat along the circumferential direction, each detection device comprises a guide plate, a heat exchange sheet and a rotating block, one end of the guide plate is movably connected with the supporting seat, an air chamber is arranged on the guide plate, a plurality of expansion chambers are arranged on the supporting seat, the air chamber is communicated with the expansion chambers through the heat exchange sheets, the sliding block is connected with the expansion chambers, compressed air is filled in a chamber close to one side of the heat exchange sheet after the expansion chambers are separated by the sliding block, and the magnet and the induction coil are arranged in a chamber on the other side of the expansion chamber separated by the sliding block, the slider is connected with the magnet fastening, is equipped with the rotation groove on the deflector, and the turning block both ends rotate with the rotation groove and are connected, and the turning block is arranged in the air chamber, is equipped with on the turning block and holds the air pocket, holds air pocket and air chamber intermittent type formula intercommunication.
The transmission seat drives the supporting seat to move through the transmission lug, the outer circular surface of the transmission lug is in sealing connection with an inlet of the reaction chamber, external air is prevented from entering the reaction chamber in an initial state to cause pollution, high-temperature gas inside is prevented from leaking when reaction is carried out, the supporting seat is rotatably supported through the transmission lug, gas around the guide plate is detected through the detection device, as the specific heat capacity of a plasma group is far larger than that of a carbon source gas inside, more heat is emitted after temperature reduction, the carbon source gas is changed into plasma after absorbing microwave, a large amount of positive and negative ions are contained inside the plasma group, the heat conductivity is good, the temperature of the plasma after agglomeration is generally about 800-1100 ℃, heat conduction is carried out through the heat exchange sheet, compressed gas in the expansion chamber is heated, as the difference of the transmitted heat is large, the distance difference for pushing the sliding block to move after the expansion of the compressed gas is large, the slider removes along the expansion chamber, drive magnet and do cutting magnetic induction line motion in induction coil, through the size that detects induced-current, judge the position of growing platform apart from the plasma group, thereby fix a position the growing platform, avoid the growing platform directly to be located the plasma group intermediate position, influence plasma balling-up effect, carry out the gyration support to the turning block through rotating the groove, the turning block is through holding near the gas of gas tank with the deflector and taking into the air chamber, carry out the heat transfer and detect, after the completion heat transfer, the turning block rotates, arrange the gas in the air chamber to the greatest extent through the disc, be convenient for carry out the continuity and detect.
Further, be equipped with feed liquor groove and play liquid tank on the transmission lug respectively, be equipped with into the runner in the middle of the supporting seat, it communicates with feed liquor groove to advance the runner, it is equipped with the commentaries on classics oar with feed liquor groove intercommunication department to advance the runner, the commentaries on classics oar includes a plurality of paddles, be equipped with the arcwall face on the paddle, the arcwall face of paddle is towards the feed liquor groove, be equipped with a plurality of subchannels on the supporting seat, place in a plurality of substrates on the growth bench, the directional substrate bottom side of subchannel, be equipped with a plurality of rotary troughs on the supporting seat, be equipped with the drainage plate in the rotary trough, the subchannel is arranged in to the drainage plate bottom, the drainage plate upside is equipped with the gear, be equipped with the transmission rack on the slider, transmission rack and gear flank meshing, drainage plate and subchannel contact, be equipped with the confluent runner on the supporting seat, subchannel and confluent runner intercommunication, confluent runner and play liquid tank intercommunication, confluent runner lower extreme and play liquid tank upper end are established to the annular.
The transmission lug is provided with a liquid inlet groove and a liquid outlet groove which are used for guiding the flow of cooling liquid and are respectively communicated with the flow inlet channel and the flow converging channel, the temperature of the growth platform is reduced through cooling circulation, so that the temperature of the substrate is reduced, the internal temperature of the reaction chamber is ensured to be constant, the continuous deposition quality is improved, the rotating propeller is driven to rotate through the flow of the cooling liquid, the outer circular surface of the rotating propeller is connected with the flow inlet channel so as to drive the supporting seat to rotate, the gas in the reaction chamber is actively guided through the rotation of the supporting seat, the flowing property is improved, the local over-dense plasma clusters are avoided, the deposition effect is improved, the deposition is more uniform, the influence of the disordered flow on the deposition quality is reduced, the bottom of the substrate is cooled through the branch channel, the rotary groove is used for rotatably supporting the drainage plate, the flow guide plate is used for rotatably controlling the flow cross section area in the branch channel, so as to control the flow of the local cooling liquid, and keep the temperature of each substrate consistent, improve the deposition quality, prevent that temperature deviation from causing the deposit inhomogeneous, the drainage plate slope is arranged, and the downstream of being convenient for drives upside plasma group and flows, makes the plasma group in the middle flow to the outside, avoids inside and outside deposition quality inhomogeneous, and the slider passes through the transmission rack and drives gear revolve to drive the drainage plate and rotate, all subchannels and conflux way intercommunication, and discharge the coolant liquid through the play liquid groove that the annular set up.
As optimization, through square setting, the limiting performance of the guide groove on the upper support is improved, and the bending and twisting resistance is improved.
As optimization, the upper support and the lower support which are vertical in space are used for preventing the installation gaps from being overlapped in the using process, reducing the slip angle and influencing the supporting performance.
As optimization, the air containing groove arranged in an arc shape improves air containing quantity, so that heat exchange quantity is improved, detection precision is improved, the rotating block is cylindrical, and the contact area between the rotating block and the air chamber is improved by reducing the open angle area, so that exhaust efficiency is improved.
As optimization, the transmission sliding block is guided through the spiral groove, and the transmission sliding block is pushed through the spiral groove during horizontal movement of the sliding block through spiral arrangement, so that the guide plate is driven to rotate along the fixed shaft, a downward exhaust angle is adjusted, the exhaust volume is changed, the flow speed of an upper side plasma group is adjusted, deposition is more uniform, and the deposition quality is improved.
Compared with the prior art, the invention has the following beneficial effects: according to the invention, the detection device is used for detecting the gas around the guide plate, as the specific heat capacity of the plasma group is far greater than that of the carbon source gas in the plasma group, more heat is emitted after cooling, heat conduction is carried out through the heat exchange plate, the compressed gas in the expansion chamber is heated, the sliding block moves along the expansion chamber, the magnet is driven to do cutting magnetic induction linear motion in the induction coil, and the position of the growth table away from the plasma group is judged by detecting the size of the induced current, so that the growth table is positioned, and the phenomenon that the growth table is directly positioned in the middle of the plasma group to influence the plasma group forming effect is avoided; the rotating block brings gas near the guide plate into the gas chamber through the gas containing groove for heat exchange detection, and after heat exchange is completed, the rotating block rotates to exhaust the gas in the gas chamber through the outer circular surface, so that continuity detection is facilitated; the temperature of the growth table is reduced through cooling circulation, so that the temperature of the substrate is reduced, the internal temperature of the reaction chamber is ensured to be constant, and the continuous deposition quality is improved; the rotating paddle is driven to rotate through the flowing of the cooling liquid, so that the supporting seat is driven to rotate, the gas in the reaction chamber is actively guided through the rotation of the supporting seat, the flowing performance is improved, the local over-dense plasma clusters are avoided, the deposition effect is improved, the deposition is more uniform, and the influence of the disordered flow on the deposition quality is reduced; the bottom of the substrate is cooled through the sub-runner, the drainage plate is rotatably supported through the rotary groove, and the drainage plate rotates to control the flow cross section area in the sub-runner, so that the flow of local cooling liquid is controlled, the temperature of each substrate is kept consistent, the deposition quality is improved, and uneven deposition caused by temperature deviation is prevented; lead to the transmission slider through the helicla flute, through the spiral setting, promote the transmission slider through the helicla flute during messenger's slider horizontal migration to drive the deflector and rotate along the dead axle, adjust decurrent exhaust angle, thereby change the displacement, adjust the flow velocity of upside plasma group, make the deposit more even, improve deposition quality.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention. In the drawings:
FIG. 1 is a schematic diagram of the general structure of the present invention;
FIG. 2 is a schematic view of a plasma cluster guiding structure according to the present invention;
FIG. 3 is a schematic view of the power transmission configuration of the present invention;
FIG. 4 is an enlarged view of portion B of the view of FIG. 3;
FIG. 5 is a sectional view taken along A-A of the adjustment device and detection device of the view of FIG. 2;
FIG. 6 is an enlarged view of portion E of the view of FIG. 5;
FIG. 7 is a schematic view of a thermal expansion sensing configuration of the present invention;
FIG. 8 is an enlarged view of a portion D of the view of FIG. 3;
FIG. 9 is an enlarged view of portion C of the view of FIG. 3;
in the figure: 1-fixing device, 11-frame, 12-base, 13-workbench, 14-reaction chamber, 2-power device, 21-servo motor, 22-lead screw, 23-support component, 231-upper support, 2311-bearing hole, 232-lower support, 2321-support groove, 24-transmission seat, 241-threaded hole, 242-guide groove, 25-transmission lug, 251-liquid inlet groove, 252-liquid outlet groove, 26-support flange, 3-adjusting device, 31-support seat, 311-inlet channel, 312-branch channel, 313-junction channel, 314-expansion chamber, 315-rotary groove, 32-slide block, 321-spiral groove, 33-magnet, 34-induction coil, 35-transmission rack, 36-flow guide plate, 37-rotary paddle, 4-detection device, 41-guide plate, 411-air chamber, 413-rotary groove, 42-heat exchange plate, 43-transmission slide block, 44-rotary block, 441-air containing groove and 5-growth table.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The invention provides the technical scheme that:
as shown in FIGS. 1 to 9, a lifting device for an MPCVD growth table comprises a fixing device 1 and a power device 2, adjusting device 3 and detection device 4, fixing device 1 and power device 2 are connected, power device 2 and 3 transmission connections of adjusting device, adjusting device 3 one side is equipped with a plurality of detection device 4, detection device 4 and 3 swing joint of adjusting device, fixing device 1 includes frame 11, workstation 13 and reacting chamber 14, frame 11 upside is arranged in to workstation 13, frame 11 and 13 fastening connection of workstation, workstation 13 upside is equipped with reacting chamber 14, be equipped with the through-hole on workstation 13, reacting chamber 14 bottom side is equipped with the import, workstation 13 through-hole and reacting chamber 14 import intercommunication, be equipped with the reacting chamber on reacting chamber 14, adjusting device 3 and detecting device 4 are arranged in the reacting chamber, adjusting device 3 upside is equipped with growth platform 5, growth platform 5 and 3 fastening connection of adjusting device.
The fixing device 1 is a main force bearing device of the invention, fixes the power device 2, drives the adjusting device 3 to move up and down through the power device 2, the growth platform 5 is arranged at the upper end of the adjusting device 3, thereby driving the growth platform 5 to move, detecting the positions of plasma clusters and other gases in the reaction cavity through the detection device 4, thereby moving the growth platform 5 to the lower part of the plasma clusters, the growth platform 5 is positioned, the plasma cluster is prevented from being cut off by the growth platform 5, the stability of the plasma cluster is improved, thereby improving the deposition efficiency, fixing the worktable 13 through the frame 11, improving the heat transfer efficiency of the growth platform 5 and the adjusting device 3 through fastening connection, thereby ensuring that the temperature of each substrate prevented on the growth platform 5 is kept consistent, ensuring more uniform deposition, improving the deposition quality, and fixing the reaction chamber 14 through the workbench 13.
As shown in fig. 1 to 3, the fixing device 1 further includes a base 12, the base 12 is fastened to the frame 11, a power device 2 is disposed on one side of the base 12, the power device 2 includes a servo motor 21 and a transmission seat 24, an outer frame of the servo motor 21 is fastened to the base 12, a support flange 26 is disposed at an output end of the servo motor 21, a lead screw 22 extends upward from the support flange 26, the servo motor 21 is connected to the lead screw 22 through the support flange 26, the lead screw 22 is connected to the frame 11 through a support assembly 23, the transmission seat 24 is sleeved on an outer ring of the lead screw 22, a threaded hole 241 is disposed in the middle of the transmission seat 24, the transmission seat 24 is in threaded connection with the lead screw 22, the support assembly 23 includes an upper bracket 231 and a lower bracket 232, a bearing hole 2311 is disposed on the upper bracket 231, a bearing is disposed on an upper end of the lead screw 22, the bearing outer ring is connected to the bearing hole 2311, guide grooves 242 are symmetrically disposed on the transmission seat 24, the guide grooves 242 are disposed on an upper side of the threaded hole 241, the upper bracket 231 penetrates through the guide slot 242, the outer side of the upper bracket 231 is slidably connected with the wall surface of the guide slot 242, two ends of the upper bracket 231 are fixedly connected with the frame 11, the lower bracket 232 is provided with a support slot 2321, the support flange 26 is movably connected with the support slot 2321, and two ends of the lower bracket 232 are fixedly connected with the frame 11.
The base 12 is fixed through the frame 11, the servo motor 21 is placed on the base 12, the servo motor 21 is fixed through fastening connection, the servo motor 21 is in transmission connection with the lead screw 22 through the support flange 26, the transmission stability is improved, the support groove 2321 is arranged on the lower bracket 232, the support flange 26 is supported through the support groove 2321, so that the lead screw 22 is rotatably supported, the rotation stability is improved, the two ends of the lower bracket 232 are connected with the frame 11, the self stability is ensured, the servo motor 2 is in transmission through the lead screw 22, the lead screw 22 is connected with the transmission seat 24 through the threaded hole 241, the lead screw 22 is rotated to be converted into the up-and-down movement of the transmission seat 24, the double-end support is carried out on the lead screw through the support component 23, the rotation stability is improved, the two ends of the upper bracket 231 are supported on the frame 11, and the bearing is supported through the bearing hole 2311, so that the upper end of the lead screw 22 is supported, connect through the bearing and reduce the friction, improve the smoothness of rotating, guide way 242 symmetrical arrangement, upper bracket 231 passes guide way 242 to spacing transmission seat 24, preventing that transmission seat 24 from rotating, improving displacement output precision, upper bracket 231 and guide way 242 prevent through swing joint that the motion is interfered.
As shown in fig. 2, 3, 5 and 6, a transmission lug 25 is extended upwards from a transmission seat 24, one end of the transmission lug 25 sequentially penetrates through a through hole of a worktable 13 and an inlet of a reaction chamber 14, the transmission lug 25 is hermetically connected with the inlet of the reaction chamber 14, the top end of the transmission lug 25 extends into the reaction chamber, an adjusting device 3 is arranged at the top end of the transmission lug 25, the adjusting device 3 comprises a support seat 31, a slider 32, a magnet 33 and an induction coil 34, the transmission lug 25 is movably connected with the bottom side of the support seat 31, a growth platform 5 is arranged on the upper side of the support seat 31, a plurality of detection devices 4 are arranged on the support seat 31 along the circumferential direction, the detection devices 4 comprise a guide plate 41, a heat exchange sheet 42 and a rotating block 44, one end of the guide plate 41 is movably connected with the support seat 31, an air chamber 411 is arranged on the guide plate 41, a plurality of expansion chambers 314 are arranged on the support seat 31, the air chamber 411 is communicated with the expansion chambers 314 through the heat exchange sheet 42, and the slider 32 is slidably connected with the expansion chambers 314, the cavity of the expansion chamber 314 close to one side of the heat exchange plate 42 after being separated by the sliding block 32 is filled with compressed gas, the magnet 33 and the induction coil 34 are arranged in the cavity of the other side of the expansion chamber 314 separated by the sliding block 32, the sliding block 32 is tightly connected with the magnet 33, the guide plate 41 is provided with a rotating groove 413, two ends of the rotating block 44 are rotatably connected with the rotating groove 413, the rotating block 44 is arranged in the air chamber 411, the rotating block 44 is provided with an air containing groove 441, and the air containing groove 441 is intermittently communicated with the air chamber 411.
The transmission seat 24 drives the supporting seat 31 to move through the transmission convex block 25, the outer circular surface of the transmission convex block 25 is hermetically connected with the inlet of the reaction chamber 14, external air is prevented from entering the reaction chamber 14 in an initial state, pollution is prevented, when reaction is prevented, internal high-temperature gas is leaked, the supporting seat 31 is rotatably supported through the transmission convex block 25, gas around the guide plate 41 is detected through the detection device 4, the specific heat capacity of a plasma group is far greater than that of an internal carbon source gas, the heat emitted after cooling is more, the carbon source gas is changed into plasma after absorbing microwave, the plasma group contains a large amount of positive and negative ions, the heat conductivity is good, the temperature of the clustered plasma is generally about 800-1100 ℃, heat conduction is carried out through a heat exchange sheet, compressed gas in the expansion chamber 314 is heated, and the difference of transmitted heat is large, the compressed gas expands to push the slide block 32 to move by a large distance difference, the slide block 32 moves along the expansion chamber 314 to drive the magnet 33 to do cutting magnetic induction line motion in the induction coil 34, the position of the growth table 5 away from the plasma cluster is judged by detecting the magnitude of the induced current, so that the growth table 5 is positioned, the growth table 5 is prevented from being directly positioned at the middle position of the plasma cluster to influence the plasma cluster forming effect, the rotating block 44 is rotatably supported by the rotating groove 413 to drive the rotating block 44 to rotate intermittently, so that the gas containing groove 441 is communicated with the gas chamber intermittently, the rotating block 44 brings gas near the guide plate 41 into the gas chamber 411 through the gas containing groove 441 to perform heat exchange detection, after the heat exchange is completed, the rotating block 44 rotates, the gas in the gas chamber 411 is exhausted through the outer circular surface, and the continuity detection is facilitated.
As shown in fig. 3, 4 and 8, the driving protrusion 25 is respectively provided with a liquid inlet groove 251 and a liquid outlet groove 252, the middle of the supporting base 31 is provided with a liquid inlet channel 311, the liquid inlet channel 311 is communicated with the liquid inlet groove 251, the connection part of the liquid inlet channel 311 and the liquid inlet groove 251 is provided with a rotating paddle 37, the rotating paddle 37 comprises a plurality of blades, the blades are provided with arc surfaces, the arc surfaces of the blades face the liquid inlet groove 251, the supporting base 31 is provided with a plurality of branch channels 312, the growth table 5 is placed on a plurality of substrates, the branch channels 312 point to the bottom side of the substrates, the supporting base 31 is provided with a plurality of rotating grooves 315, the rotating grooves 315 are internally provided with a flow guide plate 36, the bottom of the flow guide plate 36 is placed in the branch channels 312, the upper side of the flow guide plate 36 is provided with a gear, the sliding block 32 is provided with a driving rack 35, the driving rack 35 is meshed with the gear tooth surface, the flow guide plate 36 is contacted with the branch channels 312, the supporting base 31 is provided with a converging channel 313, the branch channel 312 is communicated with the converging channel 313, the converging channel 313 and the liquid outlet groove 252, the lower end of the fluid collection passage 313 and the upper end of the fluid outlet groove 252 are formed in a ring shape.
The transmission lug 25 is provided with a liquid inlet groove 251 and a liquid outlet groove 252 which guide the flow of cooling liquid, the cooling liquid is respectively communicated with a flow inlet passage 311 and a flow converging passage 313, the temperature of the growth platform 5 is reduced through cooling circulation, thereby reducing the temperature of the substrate, ensuring the constant temperature inside the reaction chamber 14, improving the continuous deposition quality, driving the rotating paddle 37 to rotate through the flowing of the cooling liquid, the outer circular surface of the rotating paddle 37 is connected with the flow inlet passage 311, thereby driving the supporting seat 31 to rotate, actively guiding the flow of gas inside the reaction chamber 14 through the rotation of the supporting seat 31, improving the flow performance, avoiding the local over-dense plasma clusters, improving the deposition effect, ensuring the more uniform deposition, reducing the influence of disordered flow on the deposition quality, reducing the temperature of the bottom of the substrate through the flow splitting passage 312, rotatably supporting the flow guide plate 36 through the rotary groove 315, and controlling the flow cross-over area in the flow splitting passage 312 through the rotation of the flow guide plate 36, thereby controlling the local flow of the cooling liquid, make each substrate temperature keep unanimous, improve the deposition quality, prevent that temperature deviation from causing the deposit inhomogeneous, drainage plate 36 slope is arranged, be convenient for exhaust downwards, it flows to drive upside plasma group, make middle plasma group flow to the outside, it is inhomogeneous to avoid inside and outside deposition quality, slider 32 drives gear revolve through drive rack 35, thereby drive drainage plate 36 and rotate, all subchannel 312 and conflux 313 intercommunication, and discharge the coolant liquid through the play liquid groove 252 of annular setting.
As optimization, the limit performance of the guide groove 242 on the upper bracket 231 is improved and the bending and twisting resistance is improved by the square arrangement.
As optimization, the upper support 231 and the lower support 232 which are perpendicular to each other in space are used for preventing the installation gaps from being overlapped in the using process, reducing the slip angle and influencing the supporting performance.
As optimization, the air containing amount is improved through the air containing grooves 441 arranged in an arc shape, so that the heat exchange amount is improved, the detection precision is improved, the rotating block 44 is cylindrical, the contact area between the rotating block 44 and the air chamber 411 is improved through reducing the open angle area, and the exhaust efficiency is improved.
As optimization, the transmission slide block 43 is guided through the spiral groove 321, and the transmission slide block 43 is pushed through the spiral groove 321 when the slide block 32 moves horizontally through spiral arrangement, so that the guide plate 41 is driven to rotate along a fixed shaft, a downward exhaust angle is adjusted, the exhaust amount is changed, the flow speed of an upper side plasma cluster is adjusted, deposition is more uniform, and the deposition quality is improved.
The working principle of the invention is as follows: the detection device 4 is used for detecting the gas around the guide plate 41, as the specific heat capacity of the plasma group is far larger than that of the carbon source gas in the plasma group, more heat is emitted after temperature reduction, the carbon source gas is changed into plasma after absorbing microwaves, the plasma group contains a large amount of positive and negative ions, the heat conductivity is good, the temperature of the clustered plasma is high, heat conduction is carried out through a heat exchange plate, the compressed gas in the expansion chamber 314 is heated, as the difference of the transmitted heat is large, the distance difference of pushing the sliding block 32 to move after the compressed gas expands is large, the sliding block 32 moves along the expansion chamber 314, the magnet 33 is driven to do cutting magnetic induction line movement in the induction coil 34, and the position of the growth platform 5 from the plasma group is judged by detecting the size of induced current, so that the growth platform 5 is positioned; the rotating block 44 brings the gas near the guide plate 41 into the gas chamber 411 through the gas containing groove 441 for heat exchange detection, after the heat exchange is completed, the rotating block 44 rotates, and the gas in the gas chamber 411 is exhausted through the outer circular surface; the temperature of the growth table 5 is reduced through cooling circulation, so that the temperature of the substrate is reduced, and the constant temperature in the reaction chamber 14 is ensured; the rotating paddle 37 is driven to rotate by flowing of the cooling liquid, the outer circular surface of the rotating paddle 37 is connected with the flow inlet channel 311, so that the supporting seat 31 is driven to rotate, the guide plate 41 is driven to rotate by the rotation of the supporting seat 31, the gas in the reaction chamber 14 is guided actively, and the flowing performance is improved; the bottom of the substrate is cooled through the sub-channel 312, the flow guide plate 36 is rotatably supported through the rotary groove 315, and the flow guide plate 36 rotates to control the flow cross section area in the sub-channel 312, so that the flow of local cooling liquid is controlled; the transmission slide block 43 is guided through the spiral groove 321, and the transmission slide block 43 is pushed through the spiral groove 321 when the slide block 32 moves horizontally through spiral arrangement, so that the guide plate 41 is driven to rotate along a fixed shaft, a downward exhaust angle is adjusted, the exhaust volume is changed, and the flow speed of an upper side plasma cluster is adjusted.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that changes may be made in the embodiments and/or equivalents thereof without departing from the spirit and scope of the invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (6)

1. A lifting device of an MPCVD growth platform is characterized in that: the lifting device comprises a fixing device (1), a power device (2), an adjusting device (3) and a detecting device (4), the fixing device (1) is connected with the power device (2), the power device (2) is in transmission connection with the adjusting device (3), one side of the adjusting device (3) is provided with a plurality of detecting devices (4), the detecting devices (4) are movably connected with the adjusting device (3), the fixing device (1) comprises a frame (11), a workbench (13) and a reaction chamber (14), the workbench (13) is arranged on the upper side of the frame (11), the frame (11) is in fastening connection with the workbench (13), the upper side of the workbench (13) is provided with the reaction chamber (14), the workbench (13) is provided with a through hole, the bottom side of the reaction chamber (14) is provided with an inlet, the through hole of the workbench (13) is communicated with the inlet of the reaction chamber (14), a reaction cavity is arranged on the reaction chamber (14), the adjusting device (3) and the detecting device (4) are arranged in the reaction cavity, a growth platform (5) is arranged on the upper side of the adjusting device (3), and the growth platform (5) is tightly connected with the adjusting device (3);
the fixing device (1) further comprises a base (12), the base (12) is fixedly connected with the frame (11), a power device (2) is arranged on one side of the base (12), the power device (2) comprises a servo motor (21) and a transmission seat (24), an outer frame of the servo motor (21) is fixedly connected with the base (12), a supporting flange (26) is arranged at the output end of the servo motor (21), a lead screw (22) extends upwards from the supporting flange (26), the servo motor (21) is in transmission connection with the lead screw (22) through the supporting flange (26), the lead screw (22) is connected with the frame (11) through a supporting component (23), the transmission seat (24) is sleeved on the outer ring of the lead screw (22), a threaded hole (241) is formed in the middle of the transmission seat (24), the transmission seat (24) is in threaded connection with the lead screw (22), the supporting component (23) comprises an upper support (231) and a lower support (232), the upper support (231) is provided with a bearing hole (2311), the upper end of the lead screw (22) is provided with a bearing, the outer ring of the bearing is connected with the bearing hole (2311), the transmission seat (24) is symmetrically provided with guide grooves (242), the guide grooves (242) are positioned on the upper side of a threaded hole (241), the upper support (231) penetrates through the guide grooves (242), the outer side of the upper support (231) is in sliding connection with the wall surface of the guide grooves (242), the two ends of the upper support (231) are fixedly connected with the frame (11), the lower support (232) is provided with a support groove (2321), the support flange (26) is movably connected with the support groove (2321), and the two ends of the lower support (232) are fixedly connected with the frame (11);
the device is characterized in that a transmission lug (25) extends upwards and is arranged on the transmission seat (24), one end of the transmission lug (25) sequentially penetrates through a through hole of a workbench (13) and an inlet of a reaction chamber (14), the transmission lug (25) and the inlet of the reaction chamber (14) are hermetically connected, the top end of the transmission lug (25) extends into the reaction chamber, an adjusting device (3) is arranged on the top end of the transmission lug (25), the adjusting device (3) comprises a supporting seat (31), a sliding block (32), a magnet (33) and an induction coil (34), the transmission lug (25) and the bottom side of the supporting seat (31) are movably connected, a growth platform (5) is arranged on the upper side of the supporting seat (31), a plurality of detection devices (4) are arranged on the supporting seat (31) along the circumferential direction, each detection device (4) comprises a guide plate (41), a heat exchange sheet (42) and a rotating block (44), one end of the guide plate (41) is movably connected with the supporting seat (31), an air chamber (411) is arranged on the guide plate (41), a plurality of expansion chambers (314) are arranged on the supporting seat (31), the air chamber (411) and the expansion chamber (314) are communicated through the heat exchange plate (42), the sliding block (32) is connected with the expansion chamber (314) in a sliding way, the cavity of the expansion chamber (314) close to one side of the heat exchange plate (42) after being separated by the sliding block (32) is filled with compressed gas, the magnet (33) and the induction coil (34) are arranged in a cavity on the other side of the expansion chamber (314) which is separated by the slide block (32), the slide block (32) is fixedly connected with the magnet (33), a rotating groove (413) is arranged on the guide plate (41), two ends of the rotating block (44) are rotationally connected with the rotating groove (413), the rotating block (44) is arranged in the air chamber (411), the rotating block (44) is provided with an air containing groove (441), and the air containing groove (441) is intermittently communicated with the air chamber (411).
2. The lifting device of an MPCVD growth platform of claim 1, wherein: a liquid inlet groove (251) and a liquid outlet groove (252) are respectively arranged on the transmission convex block (25), a liquid inlet channel (311) is arranged in the middle of the supporting seat (31), the liquid inlet channel (311) is communicated with the liquid inlet groove (251), a rotating paddle (37) is arranged at the communication position of the liquid inlet channel (311) and the liquid inlet groove (251), the rotating paddle (37) comprises a plurality of paddles, arc-shaped surfaces are arranged on the paddles, the arc-shaped surfaces of the paddles face the liquid inlet groove (251), a plurality of branch channels (312) are arranged on the supporting seat (31), the growing table (5) is placed on a plurality of substrates, the branch channels (312) point to the bottom sides of the substrates, a plurality of rotary grooves (315) are arranged on the supporting seat (31), a drainage plate (36) is arranged in the rotary grooves (315), the bottom of the drainage plate (36) is arranged in the branch channels (312), a gear is arranged on the upper side of the drainage plate (36), and a rack (35) is arranged on the sliding block (32), the transmission rack (35) is meshed with the tooth surface of the gear, the drainage plate (36) is in contact with the sub-channel (312), a converging channel (313) is arranged on the supporting seat (31), the sub-channel (312) is communicated with the converging channel (313), the converging channel (313) is communicated with the liquid outlet groove (252), and the lower end of the converging channel (313) and the upper end of the liquid outlet groove (252) are arranged in an annular shape.
3. The lifting device of an MPCVD growth platform of claim 1, wherein: the section of the upper bracket (231) is square.
4. The lifting device of an MPCVD growth platform of claim 1, wherein: the vertical plane of the upper bracket (231) is vertical to the vertical plane of the lower bracket (232).
5. The lifting device of an MPCVD growth platform of claim 1, wherein: the air containing groove (441) is arranged in an arc shape, and the opening angle of the air containing groove (441) is less than 180 degrees.
6. The lifting device of an MPCVD growth platform of claim 2, wherein: the guide plate (41) is provided with a plurality of transmission sliding blocks (43), the transmission sliding blocks (43) are arranged spirally, the sliding block (32) is provided with a plurality of spiral grooves (321), and the transmission sliding blocks (43) are connected with the spiral grooves (321) in a sliding mode.
CN202110743448.2A 2021-07-01 2021-07-01 Lifting device of MPCVD growth platform Active CN113502462B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110743448.2A CN113502462B (en) 2021-07-01 2021-07-01 Lifting device of MPCVD growth platform

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110743448.2A CN113502462B (en) 2021-07-01 2021-07-01 Lifting device of MPCVD growth platform

Publications (2)

Publication Number Publication Date
CN113502462A CN113502462A (en) 2021-10-15
CN113502462B true CN113502462B (en) 2022-02-11

Family

ID=78011078

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110743448.2A Active CN113502462B (en) 2021-07-01 2021-07-01 Lifting device of MPCVD growth platform

Country Status (1)

Country Link
CN (1) CN113502462B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115976490B (en) * 2022-12-06 2023-12-19 上海铂世光半导体科技有限公司 Online CVD diamond growth detection device
CN115821233B (en) * 2022-12-20 2024-03-08 上海铂世光半导体科技有限公司 MPCVD equipment with equipartition growth function

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2007234618B2 (en) * 2001-11-07 2009-07-02 Carnegie Institution Of Washington Apparatus and Method for Diamond Production
CN107723683B (en) * 2017-10-16 2020-06-23 江苏鲁汶仪器有限公司 Chemical vapor deposition coating equipment
CN111349914B (en) * 2020-04-09 2021-01-01 武汉大学 Microwave plasma chemical vapor deposition equipment capable of realizing online/in-situ monitoring
CN111826635A (en) * 2020-08-04 2020-10-27 西安电子科技大学 Microwave plasma chemical vapor deposition device
CN112103160B (en) * 2020-08-19 2021-09-10 上海征世科技股份有限公司 Substrate table and method for adjusting stability of microwave plasma ball

Also Published As

Publication number Publication date
CN113502462A (en) 2021-10-15

Similar Documents

Publication Publication Date Title
CN113502462B (en) Lifting device of MPCVD growth platform
CN103820769A (en) Reaction chamber and MOCVD equipment
CN217202697U (en) Bacterial incubator convenient to get and put culture dish
CN203227593U (en) Constant-temperature program control multi-station and multi-circulating lifting filming coating machine
CN112608013A (en) Glass forming device
CN115920812A (en) Lithium cell production is with special reation kettle of liquid formula is annotated with automatic voltage regulation
CN109423623B (en) Uniform gas supply device of vapor deposition furnace and vapor deposition furnace
CN112683943B (en) Turbine experimental apparatus with adjustable pitch
CN114367832A (en) Metal cutting machine tool with laser auxiliary heating function
CN213825684U (en) Material carrying device of coating machine
CN209302762U (en) A kind of reactor producing diesel pour inhibitor
CN112251732B (en) Material carrying device of coating machine
CN219185909U (en) Degasser is used in lubricating oil production
CN215280495U (en) Online full-automatic alloy welding machine
CN110563315B (en) Float glass forming system for controlling convection of molten tin to reduce tin defects
CN114921847B (en) Automatic crucible lifting device for silicon carbide vertical induction synthesis furnace
CN220878824U (en) Temperature control reaction kettle
CN214992009U (en) Airflow system structure for controlling diamond deposition rate
CN115341278B (en) Single crystal furnace water-cooling heat shield prepared from copper or copper alloy and preparation method thereof
CN213388882U (en) Vacuum coating mechanism with liquid cooling platform deck assembly
CN218154436U (en) Efficient and stable-operation heating adjusting device
CN217979996U (en) Water collecting device of cooling tower
CN215365839U (en) Argon blowing refining device for continuous casting tundish
CN112432500B (en) IGBT intermediate frequency electric furnace guiding device
CN217839126U (en) Lifting device for microwave plasma chemical vapor deposition growth base station

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant