CN115821233B - MPCVD equipment with equipartition growth function - Google Patents
MPCVD equipment with equipartition growth function Download PDFInfo
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- CN115821233B CN115821233B CN202211642389.0A CN202211642389A CN115821233B CN 115821233 B CN115821233 B CN 115821233B CN 202211642389 A CN202211642389 A CN 202211642389A CN 115821233 B CN115821233 B CN 115821233B
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- 238000000259 microwave plasma-assisted chemical vapour deposition Methods 0.000 title claims abstract description 14
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 10
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- 238000005096 rolling process Methods 0.000 claims description 9
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- 229910000639 Spring steel Inorganic materials 0.000 claims description 3
- 229910003460 diamond Inorganic materials 0.000 abstract description 26
- 239000010432 diamond Substances 0.000 abstract description 26
- 238000010438 heat treatment Methods 0.000 abstract 1
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- 238000012986 modification Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
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- 230000000149 penetrating effect Effects 0.000 description 1
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Abstract
The invention discloses MPCVD equipment with uniformly distributed growth function, and belongs to the technical field of diamond growth. The invention comprises a machine base, wherein a growth chamber is arranged on the machine base, a combustor is arranged on the growth chamber, a main coil is arranged in the inner wall of the growth chamber, the combustor is connected with a carbon-containing gas source, a plurality of air inlet pipes are arranged between the combustor and the growth chamber, the combustor is used for heating carbon-containing gas, a conical table is arranged at the bottom of the growth chamber, an imager is arranged at the top of the growth chamber, a growth substrate is arranged on the conical table, an adjusting mechanism is further arranged on the machine base, the combustor, the imager and the adjusting mechanism are all connected with a control system circuit, a plurality of small coils are arranged on the adjusting mechanism, and the small coils are used for controlling the movement of plasma.
Description
Technical Field
The invention relates to the technical field of diamond growth, in particular to MPCVD equipment with uniformly distributed growth function.
Background
Diamond is the hardest naturally occurring material in nature, and due to the characteristics of high hardness and high wear resistance of diamond, diamond is an excellent tool material, for example, diamond is used as a tool for turning or a tool for dressing a grinding wheel, but diamond resources are scarce, the diamond is labor-and time-consuming to process, expensive, diamond minerals are generally small and difficult to use as a larger tool, and thus it is necessary to obtain a large diamond with low price by means of MPCVD technology.
MPCVD is an acronym for microwave plasma chemical vapor deposition, in which a carbon-containing gas mixture is excited to decompose at high temperature and at a pressure below standard atmospheric pressure to form carbon atoms in a plasma state, and diamond is deposited on a substrate to form polycrystalline or single crystals by interactive growth.
Disclosure of Invention
The invention aims to provide MPCVD equipment with uniformly distributed growth function so as to solve the problems in the background technology.
In order to solve the technical problems, the invention provides the following technical scheme: the MPCVD equipment with uniformly distributed growth function comprises a machine base, a growth chamber is arranged on the machine base, a combustor is arranged on the growth chamber, a main coil is arranged in the inner wall of the growth chamber, the combustor is connected with a carbon-containing gas source, a plurality of air inlet pipes are arranged between the combustor and the growth chamber, the combustor heats the carbon-containing gas, a conical table is arranged at the bottom of the growth chamber, an imager is arranged at the top of the growth chamber, a growth substrate is arranged on the conical table, an adjusting mechanism is further arranged on the machine base, the combustor, the imager and the adjusting mechanism are all connected with a control system circuit, a plurality of small coils are arranged on the adjusting mechanism, the small coils control the movement of plasma, after high-temperature plasma enters the growth chamber, the electromagnetic field generated by the main coil is restrained from moving from top to bottom, the lateral penetrating growth chamber cannot escape, the small coils rotate at high speed on the periphery of the growth chamber, the electromagnetic field direction generated by the small coils is consistent with the electromagnetic field direction generated by the main coil, when the center distance between the small coils and the growth chamber is the same, the electromagnetic field of the small coils acts on high-temperature plasmas, the stress of the high-temperature plasmas is uniform in all directions, the high-temperature plasmas can be uniformly distributed in the growth chamber, when the center distance between the small coils and the growth chamber is changed, the electromagnetic restraint force of the small coils at the position nearer to the growth chamber on the high-temperature plasmas is stronger, and the movement direction of the high-temperature plasmas is influenced, so that the deposited thickness at the upper part of the growth substrate is changed.
Further, adjustment mechanism includes bottom plate slide rail, curb plate, clamp plate slide rail, the bottom plate slide rail rotates and sets up on the frame, the curb plate sets up one side at the bottom plate slide rail, the clamp plate slide rail is installed on the curb plate, and the clamp plate slide rail is located the bottom plate slide rail directly over, and the groove of seting up on the clamp plate slide rail is last slide rail, the groove of seting up on the bottom plate slide rail is lower slide rail, slidable mounting has an upper transfer ring in the upper slide rail, slidable mounting has a lower transfer ring in the lower slide rail, upper spout has been seted up to the side of upper transfer ring, lower spout has been seted up to the side of lower transfer ring, and fixed frame of a set of is formed with the clamp plate slide rail to bottom plate slide rail, and the transposition motor circular profile that forms with the clamp plate slide rail when adjustment motor drives upper transfer ring and lower transfer ring respectively on clamp plate slide rail, and the side of a plurality of little coil is not collineation for a position is close to the growth chamber, and the relative position of motor upwards forms a plurality of relative little coil of transposition is kept away from with the control of the position of the cooperation realization of a plurality of plasma, and further realizes the control of relative position of the plasma coil.
Further, an adjusting motor is arranged on the side plate, a driving gear is arranged on the adjusting motor, a front side gear and a rear side gear are rotationally arranged on the side plate, the front side gear and the rear side gear are symmetrically arranged on two sides of the driving gear, the front side gear and the rear side gear are meshed with the driving gear, a front screw rod is coaxially arranged on the front side gear, a rear screw rod is arranged on the rear side gear, the adjusting motor is electrified to drive the driving gear to rotate, and the driving gear drives the front side gear and the rear side gear to rotate in the same direction and at the same speed, so that the front screw rod and the rear screw rod rotate in the same direction and at the same speed.
Further, the upper push rod and the lower push rod are rotatably arranged on the side plate, one end of the upper push rod is slidably connected in the upper sliding groove, the other end of the upper push rod is slidably connected with the upper hollow block, a spherical cavity is formed in the middle of the upper hollow block, a first spherical slider is slidably arranged in the upper hollow block, the first spherical slider is sleeved on the front screw rod, a ball groove is formed in the first spherical slider, a rubber pad is arranged on the surface of the ball groove, a plurality of compensation balls are rotatably arranged in the ball groove, the compensation balls are in contact with the front screw rod, the compensation balls are arranged in the threaded groove of the front screw rod, the compensation balls can only roll at fixed positions, cannot roll along the annular groove, the rubber pad enables the compensation balls to be in close contact with the front screw rod, the first spherical slider can only roll along the axial direction of the front screw rod in the spherical cavity, namely the front screw rod rotates to drive the first spherical slider to reciprocate in any direction, the first spherical slider swings around the switching position through the upper hollow block, the other end of the upper push rod is rotatably provided with a plurality of compensation balls, the compensation balls can move up and down through the upper sliding plate or the lower sliding plate in the same way, the sliding plate is prevented from being driven by the sliding ring, and the sliding ring is driven by the sliding ring is prevented from moving down in the sliding ring.
The upper push rod and the lower push rod are vertically symmetrically arranged, one end of the lower push rod is slidably connected in the lower sliding groove, the other end of the lower push rod is slidably connected with a lower hollow block, and the connection mode between the lower hollow block and the rear screw rod is the same as the connection mode between the upper hollow block and the front screw rod.
Further, go up the adapter ring and rotate and be provided with the solid fixed ring, it is provided with down solid fixed ring to rotate down on the adapter ring, a plurality of gu the little coil equipartition sets up between last solid fixed ring and lower solid fixed ring, and a plurality of little coil is around the outside at the growth room, down the adapter ring with down solid fixed ring's contact position also be provided with magnet, go up the inside of adapter ring still is provided with a plurality of driving coil, a plurality of driving coil equipartition sets up, and a plurality of driving coil is connected with control system circuit, and a plurality of little coil, go up solid fixed ring and lower solid fixed ring and connect into a fixed whole, and the electromagnetic field that a plurality of little coil produced and the magnetic field of magnet that sets up down on the adapter ring repulse in the position department of contact for form the clearance between lower solid fixed ring and the lower adapter ring, a plurality of driving coil lets in succession under control system's control the electric current, and the interact that makes the electric current produce with a plurality of little coil, and then drive a plurality of little coil produce rotatory power, and when a plurality of little coil, the whole that a plurality of little coil, go up solid fixed ring and down solid fixed ring are connected into at high-speed rotation, and are all in the rotation, and are connected into the whole at high-speed rotation, and are rotated, and are influenced by the vibration of the magnetic field deposition of diamond is more evenly in the growth in the vibration and the vibration reduction of the magnetic field is realized.
Further, a worm wheel is arranged below the bottom plate sliding rail, an indexing motor is arranged in the machine base, a worm is arranged on the indexing motor, and the worm is meshed with the worm wheel.
Further, the outside of toper platform is provided with sealed conical ring, be provided with the spring steel sheet between sealed conical ring and the toper platform, install the elastic expansion bracket between the bottom of toper platform and the frame, the inside of frame still is provided with the rolling motor, install the reel on the rolling motor, the winding has the cable wire on the reel, the inside reversing wheel that is provided with of frame, the reversing wheel is located toper platform bottom, the one end of cable wire is walked around the reversing wheel and is connected in the bottom of toper platform, the frame outside still is provided with a sliding window, and the toper platform forms the conical surface seal with the bottom of growth chamber under the ejector action of elastic expansion bracket, prevents high temperature plasma gas from leaking, and at the during the stop work, operating personnel drives the reel through control rolling motor and rolls up or loosen the cable wire, and the cable wire pulls down the toper platform, and the elastic expansion bracket compresses and folds, and operating personnel can take off the growth base plate on the toper platform after opening the sliding window, change new growth base plate.
Further, one end that the imager stretched into the growth room is provided with a plurality of layers of filter discs, the top of growth room is provided with servo motor, install the brush-holder stud on the servo motor, the brush-holder stud stretches into in the growth room, the brush-holder stud contacts with the outermost filter disc of imager, in the in-process of plasma gas deposition growth, the imager detects the deposition growth condition of diamond on the growth base plate, because the process of the vapor deposition growth of diamond is unpredictable and irregular, consequently, based on the observation data of imager make control system drive adjustment mechanism motion, finally regulate and control the direction of motion and the deposition position of plasma through a plurality of little coil, realize the evenly growing of diamond, servo motor drives the brush-holder stud and can clear the outermost filter disc of imager, make the formation of image of imager more clear.
Compared with the prior art, the invention has the following beneficial effects:
1. through setting up the compensation ball, preceding lead screw rotates and drives reciprocal slippage of first sphere slider, and first sphere slider moves the push rod round switching position swing through last hollow block, and the other end of going up the push rod is through last spout promotion or pulling go up the adapter ring and remove on the clamp plate slide rail, and the lower push rod passes through lower spout drive down the adapter ring and removes on the bottom plate slide rail, has avoided the clearance between the screw transmission in the forward lead screw forward and backward to change switching process to influence driven precision, ensures that accommodate motor drives the distance of adapter ring and lower adapter ring skew, realizes the accurate control to little coil position.
2. Through setting up a plurality of small coil, make a plurality of small coil rotate at the peripheral high speed of growth room, the electromagnetic field direction that a plurality of small coil produced is unanimous with the electromagnetic field direction that the main coil produced, when the central distance of a plurality of small coil and growth room is the same, the electromagnetic field of a plurality of small coil is even acted on high temperature plasma, high temperature plasma's atress is still equidirectional even, can make high temperature plasma evenly distributed in the growth room, when the central distance of a plurality of small coil to the growth room changes, the electromagnetic restraint power of small coil to high temperature plasma of the position that is nearer to the growth room is stronger, high temperature plasma's direction of motion receives the influence, thereby change the thickness of deposit in growth substrate upper portion position.
Drawings
The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate the invention and together with the embodiments of the invention, serve to explain the invention. In the drawings:
FIG. 1 is a schematic view of the overall appearance structure of the present invention;
FIG. 2 is a schematic diagram of the overall internal structure of the present invention;
FIG. 3 is a schematic view of the internal structure of the present invention;
FIG. 4 is a schematic top view of a growth chamber portion of the present invention;
FIG. 5 is a schematic view of the structure of the adjustment mechanism of the present invention;
FIG. 6 is a schematic view of the mounting structure of the upper hollow block of the present invention;
FIG. 7 is a schematic view of the construction of a brush bar portion of the present invention;
FIG. 8 is a schematic view of the structure of a floor rail portion of the present invention;
FIG. 9 is a schematic view of the structure of the interior of the housing of the present invention;
FIG. 10 is a schematic view of the configuration of the cone table portion of the present invention;
in the figure: 1. a base; 2. a growth chamber; 3. an air inlet pipe; 4. a burner; 5. a bottom plate slide rail; 6. a side plate; 7. a platen slide rail; 8. a small coil; 9. an upper adapter ring; 10. a lower adapter ring; 11. an upper push rod; 12. a push rod is downwards pushed; 13. adjusting a motor; 14. a drive gear; 15. a front side gear; 16. a rear side gear; 17. a first spherical slider; 18. compensating the ball; 19. a worm wheel; 20. a worm; 21. an indexing motor; 22. an imager; 23. a conical table; 24. sealing the conical ring; 25. an elastic expansion bracket; 26. a wire rope; 27. a winding motor; 28. a servo motor; 29. a brush bar; 30. and driving the coil.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Referring to fig. 1 to 10, the present invention provides the following technical solutions: the MPCVD equipment with uniformly distributed growth function comprises a machine base 1, a growth chamber 2 is arranged on the machine base 1, a combustor 4 is arranged on the growth chamber 2, a main coil is arranged in the inner wall of the growth chamber 2, the combustor 4 is connected with a carbon-containing gas source, a plurality of air inlet pipes 3 are arranged between the combustor 4 and the growth chamber 2, the combustor 4 heats the carbon-containing gas to decompose the carbon-containing gas into high-temperature plasmas, a conical table 23 is arranged at the bottom of the growth chamber 2, an imager 22 is arranged at the top of the growth chamber 2, a growth substrate is arranged on the conical table 23, an adjusting mechanism is further arranged on the machine base 1, the combustor 4, the imager 22 and the adjusting mechanism are all in circuit connection with a control system, a plurality of small coils 8 are arranged on the adjusting mechanism, the plurality of small coils 8 control the movement of the plasmas, one end of the imager 22 extending into the growth chamber 2 is provided with a plurality of layers of filter discs, a servo motor 28 is arranged above the growth chamber 2, a brush rod 29 is arranged on the servo motor 28, and the brush rod 29 extends into the growth chamber 2, and the brush rod 29 contacts with the filter discs on the outermost layer of the imager 22.
After the high-temperature plasma enters the growth chamber 2, the high-temperature plasma is restrained by the electromagnetic field generated by the main coil, the high-temperature plasma moves from top to bottom and cannot laterally penetrate the growth chamber 2 to escape, the small coils 8 rotate at high speed on the periphery of the growth chamber 2, the electromagnetic field direction generated by the small coils 8 is consistent with the electromagnetic field direction generated by the main coil, when the distances between the small coils 8 and the center of the growth chamber 2 are the same, the electromagnetic field of the small coils 8 is even under the action of the high-temperature plasma even though the high-temperature plasma is acted on, the high-temperature plasma can be uniformly distributed in the growth chamber 2, when the distance between the small coils 8 and the center of the growth chamber 2 is changed, the electromagnetic restraint force of the small coils 8 at the position closer to the growth chamber 2 on the high-temperature plasma is stronger, the movement direction of the high-temperature plasma is influenced, so that the deposition thickness of the part of the diamond on the growth substrate is changed, in the process of deposition growth of the plasma gas deposition growth is detected by the imager 22, and the deposition growth of diamond on the growth substrate is not predictable, therefore, the control system drives the motor to drive the small coils 8 to uniformly move by the motor, the imaging filter sheet 22 to the deposition condition is driven by the diamond deposition brush the optimal position of the diamond brush 22, and the imaging device is more clearly regulated and controlled by the diamond deposition electrode 22, and the imaging device is realized, and the deposition condition is clear.
The worm wheel 19 is arranged below the bottom plate slide rail 5, the indexing motor 21 is arranged in the machine base 1, the worm 20 is arranged on the indexing motor 21, the worm 20 is meshed with the worm wheel 19, the adjusting mechanism comprises a bottom plate slide rail 5, a side plate 6 and a pressing plate slide rail 7, the bottom plate slide rail 5 is rotatably arranged on the machine base 1, the side plate 6 is arranged on one side of the bottom plate slide rail 5, the pressing plate slide rail 7 is arranged on the side plate 6, the pressing plate slide rail 7 is positioned right above the bottom plate slide rail 5, a groove formed in the pressing plate slide rail 7 is an upper slide rail, a groove formed in the bottom plate slide rail 5 is a lower slide rail, an upper transfer ring 9 is slidably arranged in the upper slide rail, a lower transfer ring 10 is slidably arranged in the lower slide rail, an upper slide groove is formed in the side edge of the upper transfer ring 9, a lower slide groove is formed in the side edge of the lower transfer ring 10, the bottom plate slide rail 5, the side plate 6 and the pressing plate slide rail 7 form a fixed frame, the indexing motor 21 is electrified to work so that the worm 20 rotates, the worm 20 drives the worm 20 to rotate, the worm 20 drives the bottom plate slide rail 5 to synchronously deflect in angle, namely, the frame formed by the bottom plate slide rail 5, the side plate 6 and the pressing plate slide rail 7 can be freely adjusted, when the adjusting motor 13 drives the upper switching ring 9 and the lower switching ring 10 to slide on the pressing plate slide rail 7 and the bottom plate slide rail 5 respectively, the circular outline surrounded by the small coils 8 is not collinear with the center of the growth chamber 2, one position is close to the growth chamber 2, the opposite side of the position in the radial direction is far away from the growth chamber 2, and the movement positions of the small coils 8 are controlled through the cooperation of the indexing motor 21 and the adjusting motor 13, so that the control of plasmas is realized.
The side plate 6 is provided with an adjusting motor 13, the adjusting motor 13 is provided with a driving gear 14, the side plate 6 is rotatably provided with a front side gear 15 and a rear side gear 16, the front side gear 15 and the rear side gear 16 are symmetrically arranged on two sides of the driving gear 14, the front side gear 15 and the rear side gear 16 are meshed with the driving gear 14, a front screw rod is coaxially arranged on the front side gear 15, a rear screw rod is arranged on the rear side gear 16, the side plate 6 is rotatably provided with an upper push rod 11 and a lower push rod 12, one end of the upper push rod 11 is slidably connected in an upper sliding groove, the other end of the upper push rod 11 is slidably connected with an upper hollow block, the middle part of the upper hollow block is provided with a spherical cavity, the upper hollow block is slidably provided with a first spherical slider 17, the first spherical slider 17 is sleeved on the front screw rod, the inner part of the first spherical slider 17 is provided with a ball groove, the surface of the ball groove is provided with a rubber pad, a plurality of compensating balls 18 are in the ball groove, the compensating balls 18 are in contact with the front screw rod, one end of the upper push rod 11 and the lower push rod 12 are vertically symmetrically arranged, one end of the lower push rod 12 is slidably connected in the lower sliding groove, and the other end of the lower push rod 12 is slidably connected with the lower hollow block in the same manner as the hollow block.
The driving gear 14 is driven to rotate by the power on of the adjusting motor 13, the driving gear 14 simultaneously drives the front side gear 15 and the rear side gear 16 to rotate in the same direction and at the same speed, so that the front screw rod and the rear screw rod rotate in the same direction and at the same speed, the compensating balls 18 are arranged in the threaded grooves of the front screw rod, the compensating balls 18 can roll only at fixed positions and cannot roll along the annular shape of the ball grooves, the rubber pads enable the compensating balls 18 to be in close contact with the front screw rod, the first spherical sliding block 17 can only deflect along the axial direction of the front screw rod in the spherical cavity of the upper hollow block and cannot move in any direction in the spherical cavity, namely, the front screw rod rotates to drive the first spherical sliding block 17 to slide reciprocally through the compensating balls 18, the first spherical sliding block 17 swings around the switching position through the upper push rod 11, the other end of the upper push rod 11 pushes or pulls the upper switching ring 9 to move on the pressing plate sliding rail 7 through the upper sliding groove, the lower push rod 12 drives the lower switching ring 10 to move on the bottom plate sliding rail 5 through the lower sliding groove according to the same mechanism, the clearance between the transmission in the front screw rod switching process and the axial direction of the front screw rod is prevented from influencing the transmission precision, and the distance between the upper and lower switching ring 9 is ensured.
The upper transfer ring 9 is rotatably provided with an upper fixing ring, the lower transfer ring 10 is rotatably provided with a lower fixing ring, a plurality of small coils 8 are uniformly distributed between the upper fixing ring and the lower fixing ring, the plurality of small coils 8 surround the outer side of the growth chamber 2, the contact position of the lower transfer ring 10 and the lower fixing ring is also provided with a magnet, the inside of the upper transfer ring 9 is also provided with a plurality of driving coils 30, the plurality of driving coils 30 are uniformly distributed, the plurality of driving coils 30 are connected with a control system circuit, the plurality of small coils 8, the upper fixing ring and the lower fixing ring are connected into a fixed whole, an electromagnetic field generated by the plurality of small coils 8 and the magnetic field of the magnet arranged on the lower transfer ring 10 repel at the contact position, the gap is formed between the lower fixing ring and the lower adapter ring 10, the plurality of driving coils 30 are sequentially supplied with current under the control of the control system, so that an electromagnetic field generated by the current interacts with an electromagnetic field generated by the plurality of small coils 8, and further the plurality of small coils 8 are driven to generate rotary power.
The outside of toper platform 23 is provided with sealed conical ring 24, be provided with the spring steel sheet between sealed conical ring 24 and the toper platform 23, install elastic expansion bracket 25 between the bottom of toper platform 23 and the frame 1, the inside of frame 1 still is provided with rolling motor 27, install the reel on the rolling motor 27, the winding has cable wire 26 on the reel, the frame 1 inside is provided with the switching-over wheel, the switching-over wheel is located toper platform 23 bottom, the one end of cable wire 26 is walked around the switching-over wheel and is connected in the bottom of toper platform 23, the frame 1 outside still is provided with a sliding window, toper platform 23 is under elastic expansion bracket 25's the pushing effect, sealed conical ring 24 forms the conical surface with the bottom of growth chamber 2 and seals, prevent high temperature plasma gas from leaking, when stopping working, operating personnel drives the reel through control rolling motor 27 and rolls up cable wire 26, cable wire 26 pulls down, elastic expansion bracket 25 compresses and folds, operating personnel opens the growth base plate on the toper platform 23 after the sliding window, can be taken off the new growth base plate.
The working principle of the invention is as follows: before the MPCVD equipment is used for growing diamond, an operator drives a winding drum to rotate by controlling a winding motor 27 to wind a steel cable 26, the steel cable 26 pulls a conical table 23 downwards, an elastic expansion bracket 25 is compressed and folded, the operator places a growth substrate on the conical table 23 after opening a sliding window, then the winding motor 27 loosens the steel cable 26, the conical table 23 forms conical surface sealing with the bottom of a growth chamber 2 under the pushing action of the elastic expansion bracket 25, the sealing conical ring 24 prevents high-temperature plasma gas from leaking, and the high-temperature plasma is restrained by an electromagnetic field generated by a main coil after entering the growth chamber 2 and moves from top to bottom to deposit and grow on the growth substrate and cannot laterally penetrate the growth chamber 2 to escape.
In the process of plasma gas deposition growth, the imager 22 detects the deposition growth condition of diamond on the growth substrate, and because the process of the diamond vapor deposition growth is unpredictable and irregular, the control system drives the adjusting mechanism to move based on the observation data of the imager 22, finally the movement direction and the deposition position of plasma are regulated and controlled through a plurality of small coils 8, the brush rod 29 is driven by the servo motor 28 to brush the filter disc on the outermost layer of the imager 22, the imaging of the imager 22 is clearer, the worm 20 is enabled to rotate when the transposition motor 21 is electrified, the worm 20 drives the worm 20 to rotate, and the worm 20 drives the bottom plate slide rail 5 to synchronously deflect angles, namely, the frame consisting of the bottom plate slide rail 5, the side plate 6 and the pressing plate slide rail 7 can be freely adjusted.
The driving gear 14 is driven to rotate by the power on of the adjusting motor 13, the driving gear 14 simultaneously drives the front side gear 15 and the rear side gear 16 to rotate in the same direction and at the same speed, so that the front screw rod and the rear screw rod rotate in the same direction and at the same speed, the compensating balls 18 are arranged in the threaded grooves of the front screw rod, the compensating balls 18 can roll only at fixed positions and cannot roll along the annular shape of the ball grooves, the rubber pad enables the compensating balls 18 to be in close contact with the front screw rod, the first spherical sliding block 17 can only deflect along the axial direction of the front screw rod in the spherical cavity of the upper hollow block and cannot move in any direction in the spherical cavity, namely, the front screw rod rotates to drive the first spherical sliding block 17 to slide reciprocally through the compensating balls 18, the first spherical sliding block 17 swings around the switching position through the upper push rod 11, the other end of the upper push rod 11 pushes or pulls the upper switching ring 9 to move on the pressing plate sliding rail 7 through the upper sliding groove, the lower push rod 12 drives the lower switching ring 10 to move on the bottom plate sliding rail 5 through the lower sliding groove according to the same mechanism, the clearance between the threaded transmission in the front screw rod switching process is prevented from influencing the axial direction of the front screw rod, and the adjusting motor is prevented from influencing the accuracy in the switching process, and the accurate switching distance between the upper switching ring and the upper ring 9 and the lower switching ring 9 is ensured to be driven to have no error.
The electromagnetic field generated by the plurality of small coils 8 repels the magnetic field of the magnet arranged on the lower adapter ring 10 at the contact position, so that a gap is formed between the lower fixed ring and the lower adapter ring 10, the plurality of driving coils 30 sequentially feed current under the control of the control system, the electromagnetic field generated by the current interacts with the electromagnetic field generated by the plurality of small coils 8, and further the plurality of small coils 8 are driven to generate rotary power, the direction of the electromagnetic field generated by the plurality of small coils 8 is consistent with that of the electromagnetic field generated by the main coil, the center distance between the plurality of small coils 8 and the growth chamber 2 is the same, the electromagnetic field of the plurality of small coils 8 even acts on high-temperature plasma, the stress of the high-temperature plasma is even in all directions, the high-temperature plasma can be uniformly distributed in the growth chamber 2, the electromagnetic confinement force of the small coils 8 at the position nearer to the growth chamber 2 is stronger, the motion direction of the high-temperature plasma is influenced, the thickness of the deposition at partial position on the growth substrate is changed, the rotation of the diamond is avoided when the plurality of small coils 8, the upper fixed ring and the lower fixed ring are all fast, the diamond deposition is realized, the vibration is reduced, and the vibration is prevented from being generated, and the vibration is reduced, the vibration is more uniform, and the diamond deposition is realized.
It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Finally, it should be noted that: the foregoing description is only a preferred embodiment of the present invention, and the present invention is not limited thereto, but it is to be understood that modifications and equivalents of some of the technical features described in the foregoing embodiments may be made by those skilled in the art, although the present invention has been described in detail with reference to the foregoing embodiments. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (4)
1. MPCVD equipment with equipartition growth function, its characterized in that: the device comprises a base (1), a growth chamber (2) is arranged on the base (1), a combustor (4) is arranged on the growth chamber (2), a main coil is arranged in the inner wall of the growth chamber (2), the combustor (4) is connected with a carbon-containing gas source, a plurality of air inlet pipes (3) are arranged between the combustor (4) and the growth chamber (2), the combustor (4) heats carbon-containing gas, a conical table (23) is arranged at the bottom of the growth chamber (2), an imager (22) is arranged at the top of the growth chamber (2), a growth substrate is arranged on the conical table (23), an adjusting mechanism is further arranged on the base (1), the combustor (4), the imager (22) and the adjusting mechanism are all connected with a control system circuit, a plurality of small coils (8) are arranged on the adjusting mechanism, and the small coils (8) control the movement of plasma;
the adjusting mechanism comprises a bottom plate sliding rail (5), a side plate (6) and a pressing plate sliding rail (7), wherein the bottom plate sliding rail (5) is rotationally arranged on the machine base (1), the side plate (6) is arranged on one side of the bottom plate sliding rail (5), the pressing plate sliding rail (7) is arranged on the side plate (6), the pressing plate sliding rail (7) is positioned right above the bottom plate sliding rail (5), a groove formed in the pressing plate sliding rail (7) is an upper sliding rail, a groove formed in the bottom plate sliding rail (5) is a lower sliding rail, an upper transfer ring (9) is slidably arranged in the upper sliding rail, a lower transfer ring (10) is slidably arranged in the lower sliding rail, an upper sliding groove is formed in the side edge of the upper transfer ring (9), and a lower sliding groove is formed in the side edge of the lower transfer ring (10);
an adjusting motor (13) is arranged on the side plate (6), a driving gear (14) is arranged on the adjusting motor (13), a front side gear (15) and a rear side gear (16) are rotatably arranged on the side plate (6), the front side gear (15) and the rear side gear (16) are symmetrically arranged on two sides of the driving gear (14), the front side gear (15) and the rear side gear (16) are meshed with the driving gear (14), a front screw rod is coaxially arranged on the front side gear (15), and a rear screw rod is arranged on the rear side gear (16);
an upper push rod (11) and a lower push rod (12) are rotatably arranged on the side plate (6), one end of the upper push rod (11) is slidably connected in an upper sliding groove, the other end of the upper push rod (11) is slidably connected with an upper hollow block, a spherical cavity is formed in the middle of the upper hollow block, a first spherical slider (17) is slidably arranged in the upper hollow block, the first spherical slider (17) is sleeved on a front screw rod, a ball groove is formed in the first spherical slider (17), a rubber pad is arranged on the surface of the ball groove, a plurality of compensation balls (18) are arranged in the ball groove in a rolling mode, and the compensation balls (18) are in contact with the front screw rod;
the upper push rod (11) and the lower push rod (12) are vertically symmetrically arranged, one end of the lower push rod (12) is slidably connected in the lower chute, the other end of the lower push rod (12) is slidably connected with a lower hollow block, and the connection mode between the lower hollow block and the rear screw rod is the same as the connection mode between the upper hollow block and the front screw rod;
the upper transfer ring (9) is rotatably provided with an upper fixing ring, the lower transfer ring (10) is rotatably provided with a lower fixing ring, a plurality of small coils (8) are uniformly distributed between the upper fixing ring and the lower fixing ring, the plurality of small coils (8) surround the outer side of the growth chamber (2), magnets are also arranged at the contact positions of the lower transfer ring (10) and the lower fixing ring, a plurality of driving coils (30) are further arranged in the upper transfer ring (9), and the driving coils (30) are uniformly distributed and connected with a control system circuit.
2. The MPCVD apparatus with uniformly distributed growth function according to claim 1, wherein: the worm gear (19) is arranged below the bottom plate sliding rail (5), an indexing motor (21) is arranged in the machine base (1), a worm (20) is arranged on the indexing motor (21), and the worm (20) is meshed with the worm gear (19).
3. The MPCVD apparatus with uniformly distributed growth function according to claim 1, wherein: the outside of toper platform (23) is provided with sealed conical ring (24), be provided with the spring steel sheet between sealed conical ring (24) and toper platform (23), install elastic expansion bracket (25) between the bottom of toper platform (23) and frame (1), the inside of frame (1) still is provided with rolling motor (27), install the reel on rolling motor (27), the winding has cable wire (26) on the reel, the inside reversing wheel that is provided with of frame (1), the reversing wheel is located toper platform (23) bottom, the bottom at toper platform (23) is walked around the reversing wheel to the one end of cable wire (26), the frame (1) outside still is provided with a sliding window.
4. The MPCVD apparatus with uniformly distributed growth function according to claim 1, wherein: one end of the imager (22) extending into the growth chamber (2) is provided with a plurality of layers of filter discs, a servo motor (28) is arranged above the growth chamber (2), a brush rod (29) is arranged on the servo motor (28), the brush rod (29) extends into the growth chamber (2), and the brush rod (29) is in contact with the filter disc on the outermost layer of the imager (22).
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| Application Number | Priority Date | Filing Date | Title |
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| CN202211642389.0A CN115821233B (en) | 2022-12-20 | 2022-12-20 | MPCVD equipment with equipartition growth function |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202211642389.0A CN115821233B (en) | 2022-12-20 | 2022-12-20 | MPCVD equipment with equipartition growth function |
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| CN115821233A CN115821233A (en) | 2023-03-21 |
| CN115821233B true CN115821233B (en) | 2024-03-08 |
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| JP2013177270A (en) * | 2012-02-28 | 2013-09-09 | Kurita Seisakusho:Kk | Method and apparatus for producing single crystal diamond |
| CN103560068A (en) * | 2013-11-04 | 2014-02-05 | 中微半导体设备(上海)有限公司 | Plasma treatment device evenly changing distribution of plasmas and control method thereof |
| CN107572770A (en) * | 2017-10-18 | 2018-01-12 | 南京卓茨机电科技有限公司 | A kind of preform process units with control function using PCVD methods |
| CN113502462A (en) * | 2021-07-01 | 2021-10-15 | 上海铂世光半导体科技有限公司 | Lifting device of MPCVD growth platform |
| CN115044885A (en) * | 2022-06-14 | 2022-09-13 | 上海征世科技股份有限公司 | MPCVD device and method for preparing high-purity CVD diamond wafer |
| CN115181954A (en) * | 2022-09-13 | 2022-10-14 | 陛通半导体设备(苏州)有限公司 | Electromagnetically controlled physical vapor deposition apparatus |
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2022
- 2022-12-20 CN CN202211642389.0A patent/CN115821233B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013177270A (en) * | 2012-02-28 | 2013-09-09 | Kurita Seisakusho:Kk | Method and apparatus for producing single crystal diamond |
| CN103560068A (en) * | 2013-11-04 | 2014-02-05 | 中微半导体设备(上海)有限公司 | Plasma treatment device evenly changing distribution of plasmas and control method thereof |
| CN107572770A (en) * | 2017-10-18 | 2018-01-12 | 南京卓茨机电科技有限公司 | A kind of preform process units with control function using PCVD methods |
| CN113502462A (en) * | 2021-07-01 | 2021-10-15 | 上海铂世光半导体科技有限公司 | Lifting device of MPCVD growth platform |
| CN115044885A (en) * | 2022-06-14 | 2022-09-13 | 上海征世科技股份有限公司 | MPCVD device and method for preparing high-purity CVD diamond wafer |
| CN115181954A (en) * | 2022-09-13 | 2022-10-14 | 陛通半导体设备(苏州)有限公司 | Electromagnetically controlled physical vapor deposition apparatus |
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| CN115821233A (en) | 2023-03-21 |
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