CN113311580B - Method for preparing differential array beam wavefront corrector based on aberration measurement - Google Patents
Method for preparing differential array beam wavefront corrector based on aberration measurement Download PDFInfo
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Abstract
The invention discloses a method for preparing a differential array beam wavefront corrector based on aberration measurement, which comprises the following steps of: measuring the distortion wavefront deviation of each sub-beam in an array beam comprising a plurality of sub-beams, performing three-dimensional modeling on the integrated wavefront corrector by using three-dimensional modeling software, importing the model into simulation software for simulation optimization, judging whether the deformation and the resonance frequency of each sub-beam distorting lens of the corrector meet the design requirements, and if so, recording the structural parameters of a lens body; otherwise, the three-dimensional modeling is carried out again to continue the simulation optimization until the design requirement is met; and preparing a differential wavefront corrector according to the structural parameters of the lens body. The invention has the advantages of low cost, compact system structure, customized design, high correction efficiency and the like.
Description
Technical Field
The invention relates to the field of incoherent array laser synthesis and adaptive optics, in particular to a method for preparing a differential array beam wavefront corrector based on single beam aberration measurement.
Background
The traditional high-energy laser system generally adopts a single high-power laser as a laser light source, and has the disadvantages of complex heat management, poor beam quality and poor maneuverability. At present, array synthesis of light beams emitted by a plurality of lasers with lower power is one of effective ways for realizing high-power laser output.
The array beam synthesis means that a plurality of single-path beams are arranged according to a certain spatial position to form array beams and then are synthesized and output. Array beam combining is divided into coherent combining and incoherent combining.
According to the physical and optical basic principle, in order to realize stable interference, the frequency and the polarization state of each path of light beam are required to be the same, and the phase difference of each path of laser light is required to be constant. In fact, the coherent combined light intensity is related to spatial position of the single laser, laser power, polarization state, line width, optical path difference, inclined wavefront, high-order wavefront distortion, phase noise and other factors. Therefore, the coherent combining system needs to optimally control each parameter (polarization state, phase, optical path difference, optical axis, and tilt) to achieve the optimal coherent combining effect in the performance evaluation function extremum optimization process. Whereas non-coherent combining can be understood mathematically simply as a direct superposition of the intensities of the individual sub-beams. The incoherent synthetic light intensity is only related to the spatial position, the laser power, the inclined wavefront and the high-order wavefront distortion of the single-path laser, and the incoherent synthetic system does not need to control the optical path difference, the polarization and the like of each path of light beam, so that the system structure is relatively simple.
Compared with a single light beam, all sub-light beams formed by array light beam incoherent combination are mutually incoherent, the light intensity fluctuation of a receiving end and the flicker of target imaging caused by atmospheric turbulence can be effectively inhibited, and a good illumination effect can be obtained more easily, so that the array light beam incoherent combination is widely applied to a laser active illumination imaging system. In this regard, a large number of experimental studies have been conducted in domestic and foreign institutions such as japan, the naval laboratory in the united states, and the vinpocetine institute in the domestic middle school.
For incoherent array light beams, the quality degradation and the energy density reduction of the light beams can be caused by a plurality of factors such as light intensity flicker, fluctuation, expansion and the like through turbulent atmosphere and free space transmission, the wavefront regulation of the incoherent array light beams is realized by adopting the self-adaptive optical technology, the wavefront distortion of each path of light beams is compensated, the light beam quality and the energy density of an incoherent array light beam receiving end are further improved, and the method has important application value.
Adaptive Optics (AO) is a comprehensive subject integrating scientificity and engineering, and is used for researching theories, systems, technologies and engineering for automatically improving the wave front quality of light waves in real time. In terms of technical implementation, the optical wavefront is used as a control object, the wavefront sensor is used, a set of control algorithm and hardware are used as a controller, and the wavefront corrector is used as an automatic control system of an actuator.
The adaptive optics system comprises three basic components: a wavefront sensor 5, a wavefront controller 6, a wavefront corrector 7, a beam splitter 8, a high resolution camera 10, etc., as shown in fig. 1. Among them, the anamorphic mirror is an important component of the wavefront corrector 7, as shown in fig. 2. The deformable mirror actively regulates and controls the incident distorted wavefront, so that the emergent wavefront meets the system requirements.
In the aspect of adaptive wavefront regulation of incoherent array beams, the conventional method is to independently perform tilt or higher-order aberration regulation on each sub-beam of the incoherent array beam by using a plurality of wavefront correctors, that is, to independently regulate each sub-beam of the N incoherent array beams by using N sets of adaptive optical systems. The technical scheme makes an optical system very large, and as for N wavefront sensors and N wavefront correctors, the strict spatial alignment relation among all sub-beams of incoherent array beams is required to be met, and the system assembly is more strictly required. In the disclosed technology, the conventional adaptive optics system is not reported to be used for carrying out array beam wavefront regulation. The array beam is subjected to wavefront correction based on the traditional AO idea, one idea is to combine a plurality of wavefront correctors according to a certain arrangement mode, and the other idea is to find a single wavefront corrector matched with the array beam. The combined arrangement of the wavefront correctors makes the optical system more huge in structure, more severe in requirements on the assembly of each device and the position relation of each device, higher in device supporting difficulty, more difficult in control and use, higher in required technical level, and easy to cause paralysis of the wavefront correctors due to damage of one wavefront corrector, thereby causing breakdown of the whole system.
For the idea of correcting the wavefront aberration of an array light beam by adopting the conventional single wavefront corrector, most of electrodes of a discrete driving continuous mirror Deformable Mirror (DM) are in a square arrangement mode and are not matched with the circular distribution of the array light beam; the calibers of a Micro Electro Mechanical System (MEMS) deformable mirror and a liquid crystal spatial light modulator (LC DM) are generally small, and the MEMS deformable mirror and the LC DM are not suitable for wavefront correction of array beams; each sub-mirror of the spliced sub-mirror deformable mirror only corrects oblique aberration, and gaps exist among the sub-mirrors, so that the light energy utilization rate is low, and the adjustment difficulty is high; the thin film deformable mirror (MMDM) is brittle, has low resonant frequency, and is not suitable forFor use in an array beam combining system; bimorph deformable mirror (Bimor) p h DM) is generally small, and the distortion cross-linking value between drivers is large, which is not beneficial to the independent control of each sub-region. In view of the above, no mature deformable mirror preparation technology is currently available for array beam aberration correction.
In the decades of development of the honeycomb deformable mirror, the honeycomb deformable mirror is mainly used as a primary mirror of an optical telescope, namely as a multi-element deformable mirror to correct aberration of an incident wavefront. The honeycomb structure design is adopted to mainly realize the light support of the large-caliber main mirror. The other is used for the single-path laser transmission system to carry out wavefront correction, and is also used as a single deformable mirror to correct single-path wavefront distortion. For the application of the deformable mirror to array beam wavefront correction, no report is found at present.
Disadvantages or inadequacies of the current technology: the electrodes of the drivers in the honeycomb are arranged consistently, the wavefront aberration correction capability is the same, the specific design is not carried out according to the aberration characteristics of the incident beams corresponding to the honeycomb, and the design flexibility is lacked. When the array beams are combined, each beam comes from an independent laser and an optical transmission link, and aberration components contained in the beams are different, so that the requirements of the wavefront correction capability of each beam are different, and the honeycomb type deformable mirror designed by a non-differential driver cannot be directly applied to solving the problem of wavefront correction of the array beams.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a method for preparing a differential array beam wavefront corrector based on single beam aberration measurement, which has low cost and high correction efficiency.
In order to solve the technical problems, the invention adopts the following technical scheme:
the utility model provides a differentiation array beam wave front corrector based on aberration measurement, includes the mirror body that the front has the mirror surface, the back of mirror body is equipped with a plurality of sub-beam correction subassemblies, the structure part or all are different between a plurality of sub-beam correction subassemblies, and when the array beam who contains a plurality of sub-beams shines on the mirror surface of mirror body, each sub-beam correction subassembly carries out the wavefront pixel correction of differentiation to the sub-beam of area in place respectively and makes the wavefront pixel correction volume of each sub-beam correction subassembly equalling correspond the distortion wave front deviation of sub-beam.
As a further improvement to the above technical solution:
the sub-beam correction assembly comprises a substrate and a piezoelectric assembly which are connected with each other, one side of the piezoelectric assembly, facing the substrate, is provided with a whole block of earth electrode, one side of the piezoelectric assembly, far away from the substrate and facing the mirror body, is provided with a discrete electrode, and the discrete electrodes between the sub-beam correction assemblies are partially or completely different.
The piezoelectric component is a piezoelectric material layer.
The back of the mirror body is provided with a plurality of grooves, the bottom of each groove is provided with a convex fixed support, and each fixed support is provided with a sub-beam correction assembly.
The mirror body is of an integrated structure; or the mirror body is of a split structure formed by splicing a plurality of blocks, each block is provided with a sub-beam correction assembly, each block is of a polygonal structure, and the plurality of blocks are detachably spliced and installed on the same fixing clamp respectively.
The polygonal structure is a honeycomb structure, a square structure or a strip-shaped structure.
The substrate is glass or a silicon substrate.
As a general inventive concept, the present invention further provides a design method of the aforementioned aberration measurement-based wavefront corrector with a differential array beam, comprising the following steps:
1) Measuring a distorted wavefront deviation of each sub-beam in an array beam comprising a plurality of sub-beams;
2) Establishing a three-dimensional model of the differential array beam wavefront corrector, and importing the three-dimensional model of the differential array beam wavefront corrector into finite element analysis software;
3) In finite element analysis software, aiming at the structural parameters of the differential array beam wavefront corrector, adjusting the structural parameters of each sub-beam correction component and carrying out simulation calculation on the wavefront pixel correction effect of each sub-beam correction component on the corresponding sub-beam irradiated on the mirror surface, if each sub-beam correction component respectively carries out differential wavefront pixel correction on the sub-beam in the area where the sub-beam correction component is positioned so that the wavefront pixel correction value of each sub-beam correction component is equal to the distortion wavefront deviation of the corresponding sub-beam, judging that the detection simulation result meets the design requirement, outputting the finally obtained structural parameters of the differential array beam wavefront corrector as the obtained design result, and ending and exiting; otherwise, skipping to execute step 3) to continue adjusting the structural parameters of each sub-beam correction component.
As a further improvement to the above technical solution:
the step 1) comprises the following steps:
s1-1, dividing sub-apertures of a micro-lens array of a wavefront sensor into a plurality of sub-apertures according to the sub-beam space positions of array beams, wherein each sub-aperture comprises a plurality of sub-apertures, and the sub-beams of the array beams are focused on a camera target surface through the sub-apertures of the micro-lenses in corresponding areas to form light spots;
s1-2, calculating the deviation delta x and delta y of the distorted wavefront of the sub-beam of the array beam and the centroid position of the reference wavefront by taking the position of the light spot of the reference wavefront in the corresponding target surface area as a reference;
s1-3, solving phase distortion information of incident wave fronts of sub-beams of the array beam according to the deviations delta x and delta y to obtain distortion wave front deviations of the sub-beams in the array beam comprising a plurality of sub-beams;
adjusting the structural parameters of each sub-beam correction assembly in the step 3) comprises adjusting the unit distribution of the discrete electrodes of each sub-beam correction assembly and the aperture ratio between the sub-beam correction assembly and the mirror body.
And after the step 2) and before the step 3), the step of iteratively adjusting the thickness of each sub-beam correction component, the thickness of the mirror body and the thickness of the sub-beam correction component and the adhesive layer of the mirror body repeatedly according to the structural parameters of the differentiated array beam wavefront corrector so that the deformation and the resonance frequency of the differentiated array beam wavefront corrector meet the design requirements is further included.
As a general inventive concept, the present invention further provides a method for manufacturing a differentiated array beam wavefront corrector based on aberration measurement, which comprises the steps of firstly obtaining structural parameters of the differentiated array beam wavefront corrector by using the design method of the differentiated array beam wavefront corrector based on aberration measurement; and then processing according to the obtained differentiated array beam wavefront corrector to prepare the differentiated array beam wavefront corrector.
Compared with the prior art, the invention has the advantages that:
the invention aims at that an incident beam is an array beam instead of a single beam, which is different from a traditional sensor for measuring the wave surface of the single beam, and breaks through the complex mode that a plurality of sets of adaptive optical systems (N deformable mirrors and N wave-front sensors) are required to be adopted for wave-front correction of the existing array beam to work in parallel, so that the scale of the adaptive optical systems is reduced, the wave-front correction efficiency is improved, and an integrated wave-front correction system is adopted, namely, one sensor and one wave-front corrector (integrated deformable mirror) are adopted to simultaneously measure and correct the wave-front aberration of N paths of array beams in a closed loop manner.
Based on the integrated design idea, the invention designs and manufactures an integrated multi-region independent control deformable mirror on the corrector, so that each independent control region is matched with the spatial arrangement of the array beam sub-beams, and each region has the capability of correcting the aberration distortion of the incident wavefront, thereby solving the wavefront correction problem of the array beam with the lowest cost and the highest efficiency. It should be emphasized that the number of regions and the arrangement of the regions for realizing independent control of the wavefront corrector (integrated deformable mirror) may be determined according to the beam number scale and the spatial arrangement of the array beam, and the specific arrangement of the piezoelectric component (driver) of a sub-beam correction component in a certain region may also be customized according to the aberration of the incident beam corresponding to the region, so that the wavefront corrector (integrated deformable mirror) has great design flexibility and expansibility.
Drawings
Fig. 1 is a block diagram of an adaptive optics system configuration.
Fig. 2 is a schematic diagram of the function of a deformable mirror of a wavefront corrector in adaptive optics.
Fig. 3 is a flow chart of the present invention.
Fig. 4 is a diagram of an integrated wavefront sensor wavefront measurement schematic.
Fig. 5 is a structural model of a 7 × 1 integrated wavefront corrector in the present embodiment.
Fig. 6 is a 7 × 1 integrated wavefront corrector gridding division result diagram in the present embodiment.
Fig. 7 is a structural size diagram of a 7 × 1 integrated wavefront corrector in the present embodiment.
Fig. 8 is a flowchart of a specific design of the 7 × 1 integrated wavefront corrector in this embodiment.
Fig. 9 is a schematic layout diagram of electrodes in each cell of the 7 × 1 differentiated array beam wavefront corrector in this embodiment.
Fig. 10 is a schematic diagram of a corrector layer structure within a single cell.
Fig. 11 is a perspective view (back side) of the assembled differentiated wavefront corrector of the present invention.
Fig. 12 is a front view of the assembly of the differential wavefront corrector of the present invention.
Fig. 13 is a diagram of an assembly of a differentiated wavefront corrector according to the present invention.
Illustration of the drawings:
1. a mirror body; 11. a groove; 12. fixing a bracket; 2. a sub-beam correction assembly; 21. a substrate; 22. a piezoelectric component; 221. a ground electrode; 222. a discrete electrode; 23. a support structure; 3. fixing the clamp; 4. a base; 5. a wavefront sensor; 6. a wavefront controller; 7. a wavefront corrector; 8. a beam splitter; 9. a high resolution camera.
Detailed Description
The invention will be described in further detail below with reference to the drawings and specific examples. Unless otherwise specified, the instruments or materials employed in the present invention are commercially available.
The invention discloses a differentiation array beam wavefront corrector based on aberration measurement, which comprises a mirror body 1 with a mirror surface on the front surface, wherein the back surface of the mirror body 1 is provided with a plurality of sub-beam correction assemblies 2, the structures of the plurality of sub-beam correction assemblies 2 are partially or completely different, and when an array beam comprising a plurality of sub-beams irradiates on the mirror surface of the mirror body 1, each sub-beam correction assembly 2 respectively carries out differentiation wavefront pixel correction on the sub-beams in the area, so that the wavefront pixel correction value of each sub-beam correction assembly 2 is equal to the distortion wavefront deviation of the corresponding sub-beam.
The sub-beam correction assembly 2 comprises a substrate 21 and a piezoelectric assembly 22 which are connected with each other, one side of the piezoelectric assembly 22 facing the substrate 21 is provided with a whole block of ground electrode 221, one side of the piezoelectric assembly 22 far away from the substrate 21 and facing the mirror body 1 is provided with a discrete electrode 222, and the discrete electrodes 222 are partially or totally different among the plurality of sub-beam correction assemblies 2.
The piezoelectric element 22 is a layer of piezoelectric material.
The sub-beam calibration assembly 2 further includes a support structure 23, the substrate 21 is supported on the support structure 23, and the support structure 23 is disposed at one side of the piezoelectric assembly 22.
The back of the mirror body 1 is provided with a plurality of grooves 11, the bottom of each groove 11 is provided with a convex fixed support 12, and each fixed support 12 is provided with a sub-beam correction component 2.
In the embodiment 1, the mirror body 1 is an integrated structure; in other embodiments, the lens body 1 is a split structure formed by splicing a plurality of blocks, each block is provided with a sub-beam correction assembly 2, the blocks are polygonal structures, and the plurality of blocks are detachably inserted and mounted on the same fixing clamp 3 respectively.
The invention discloses a design method of a differentiation array beam wavefront corrector based on aberration measurement, which comprises the following steps:
1) Measuring a distorted wavefront deviation of each sub-beam in an array beam comprising a plurality of sub-beams;
2) Establishing a three-dimensional model of the differentiated array beam wavefront corrector, and importing the three-dimensional model of the differentiated array beam wavefront corrector into finite element analysis software;
3) In finite element analysis software, aiming at the structural parameters of the differentiated array beam wavefront corrector, adjusting the structural parameters of each sub-beam correction component 2 and carrying out simulation calculation on the wavefront pixel correction effect of each sub-beam correction component 2 on the corresponding sub-beam irradiated on the mirror surface, if each sub-beam correction component 2 respectively carries out differentiated wavefront pixel correction on the sub-beam in the area so that the wavefront pixel correction value of each sub-beam correction component 2 is equal to the distorted wavefront deviation of the corresponding sub-beam, judging that the detection simulation result meets the design requirement, outputting the finally obtained structural parameters of the differentiated array beam wavefront corrector as the obtained design result, and ending and quitting; otherwise, the step 3) is executed to continue to adjust the structural parameters of each sub-beam correction assembly 2.
The step 1) comprises the following steps:
s1-1, dividing sub-apertures of a micro-lens array of a wavefront sensor into a plurality of sub-apertures according to the sub-beam space positions of array beams, wherein each sub-aperture comprises a plurality of sub-apertures, and the sub-beams of the array beams are focused on a camera target surface through the sub-apertures of the micro-lenses in corresponding areas to form light spots;
s1-2, with the position of a light spot of a reference wavefront in a corresponding target surface area as a reference, solving the deviation delta x and delta y between the distorted wavefront of the sub-beam of the array beam and the position of the centroid of the reference wavefront;
s1-3, phase distortion information of incident wave fronts of sub-beams of the array beam is obtained according to the deviations delta x and delta y, and distortion wave front deviation of each sub-beam in the array beam comprising a plurality of sub-beams is obtained;
adjusting the structural parameters of each sub-beam correction assembly 2 in step 3) comprises adjusting the unit distribution of the discrete electrodes of each sub-beam correction assembly 2 and the aperture ratio between the sub-beam correction assembly 2 and the mirror body 1.
The method further comprises the step of repeatedly iteratively adjusting the thickness of each sub-beam correction component 2, the thickness of the mirror body 1 and the thickness of the bonding layer of the sub-beam correction component 2 and the mirror body 1 so that the deformation and the resonant frequency of the differentiated array beam wavefront corrector meet the design requirements according to the structural parameters of the differentiated array beam wavefront corrector after the step 2) and before the step 3).
Example 1:
the noun explains:
a corrector: the surface shape change can be generated according to the control signal, and the surface shape change is used for correcting the wave front phase distortion of the light beam incident to the surface of the surface. A tilt mirror for correcting the entire tilt aberration and a deformable mirror for correcting the higher-order aberration are classified.
A deformable mirror: one type of corrector, for correcting higher order aberrations.
A driver: the active unit that performs deformation in the corrector is generally composed of a piezoelectric ceramic, a magnetostrictive material, or the like.
An electrode: a metal element, typically in the form of a copper foil or other metal mask, is connected to the actuator and applies a voltage to the actuator.
As shown in fig. 3, the method for manufacturing a wavefront corrector for a differentiated array beam based on aberration measurement according to the present invention includes steps of making N paths of array beams enter a wavefront corrector for a differentiated array beam to be processed (taking an integrated wavefront corrector as an example in the present invention) through a spectroscope, making the N paths of array beams enter an integrated wavefront sensor through the spectroscope, analyzing and obtaining wavefront phase distortion carried by each sub-beam by measuring sub-spot position information of each sub-beam on a target surface of the wavefront sensor, and then controlling the integrated wavefront controller according to the distortion information in a feedback manner, so as to implement integrated correction of incident wavefront distortion of each sub-beam, including the following steps:
(1) Array beam wavefront aberration measurement analysis: and measuring and analyzing the wavefront aberration of the array light beam by adopting the integrated wavefront sensor. The basic measurement principle and structure of the integrated wavefront sensor are similar to those of a Hartmann wavefront sensor, the Hartmann-like sensor is called for short, the integrated wavefront sensor consists of a micro-lens array and a large target surface camera, and the working principle is shown in figure 4.
The traditional Hartmann sensor is designed aiming at single-beam incident wavefront, a micro-lens array structure is also adopted by the similar Hartmann sensor, but aiming at the array beam multi-wavefront design, the algorithm adopted by sensor area division and wavefront restoration are different.
The method comprises the following specific steps:
A. the method comprises the steps of firstly, carrying out region segmentation (shown by dotted lines in figure 4) on sub-apertures of a micro-lens array according to the space positions of all sub-beams of an incident array beam, wherein each sub-aperture comprises a plurality of sub-apertures, the incident sub-beams are focused on a camera target surface through the sub-apertures of the micro-lens in a corresponding region, and the spot information of the camera target surface in the sub-regions comprises the wavefront distortion information of the sub-beams.
B. And selecting the spot position of the reference wavefront in the corresponding target surface area as a reference, and solving the deviation delta x and delta y between the distorted wavefront of the sub-beam and the centroid position of the reference wavefront through a centroid algorithm.
C. Based on the deviation data, i.e., the deviations Δ x and Δ y, phase distortion information of the incoming and outgoing sub-wavefronts is restored, or a corresponding driver (the piezoelectric element 22 of the sub-beam correction element 2) is driven by a direct slope control algorithm to correct the aberration of the sub-beam.
(2) Driver layout finite element design
The COMSOL software is utilized to limit the relevant characteristics of the substrate material and the piezoelectric material, the layout finite element design of the driver is developed on the basis of multiple physical fields such as solid mechanics, electrostatics and piezoelectric effect, and the surface shape PV value, stress and dynamic frequency response change of a mirror surface corresponding to a single honeycomb groove 11 under different structural parameters are compared.
In this embodiment, taking a 7 × 1 integrated wavefront corrector as an example, based on optical processing experience, an optical element with a diameter-thickness ratio greater than 20 belongs to an ultra-thin element, and it is difficult to ensure a surface shape by conventional optical processing beyond this range, so that a honeycomb structure is optimized on the basis of considering this condition, it is ensured that a mirror surface corresponding to a single honeycomb groove 11 does not exceed the allowable stress of a material under a large surface shape PV value, and a dynamic frequency response meets application requirements.
The 7 × 1 integrated wavefront corrector is subjected to three-dimensional modeling through solid works software, a structural model of the three-dimensional modeling is shown in fig. 5, wherein fig. 5 (a) is a three-dimensional structure diagram of the model, fig. 5 (b) is a bottom electrode arrangement schematic diagram of the model, and then the three-dimensional model is led into COMSOL software for simulation optimization.
A structural model of a 7 × 1 integrated wavefront corrector for simulation analysis in COMSOL is shown in fig. 6, which uses quartz glass or silicon as a substrate 21, and as shown in fig. 6 (a), the front surface is polished and coated for reflecting light beams reaching a mirror surface, as shown in fig. 6 (b), seven hexagonal honeycomb grooves 11 with certain depth are dug at the back of the substrate 21 according to a central circular symmetrical arrangement mode, and circular substrate bosses with certain height and smaller than the caliber of the grooves are respectively left at the bottoms of the seven honeycomb grooves 11 as fixed supports 12, 7 pieces of piezoelectric ceramics with silver electrodes respectively plated on two surfaces are respectively bonded on the circular substrate bosses in the 7 honeycomb grooves 11, the front surface of the silver-plated piezoelectric ceramics bonded with the bosses is used as a ground electrode, and the back surfaces of the 7 pieces of piezoelectric ceramics are plated with silver as 7 complete electrodes, so as to apply static voltage to the piezoelectric ceramics.
The structural design of the deformable mirror needs to be carried out according to design requirements, the number of Zernike terms which can be fitted and the fitting precision of each term mark the correction capability of the deformable mirror, so that the number of Zernike terms and the corresponding fitting precision requirement are used as design entry parameters, the spatial distribution (such as unit distribution and effective aperture ratio) of the electrodes is designed, whether the deformation amount and the resonance frequency meet the design requirements is judged, if not, the spatial distribution of the electrodes is redesigned, and if so, the configuration parameters of the deformable mirror are recorded. The deformation is related to a driver and a bonding layer (the bonding layer is a colloidal layer which bonds the driver and the mirror surface of the deformable mirror together and generally has thickness and type difference and can slightly influence the size of the deformation), the thickness of the lens, when the deformation does not meet the design requirement, the thickness of the driver or the bonding layer or the lens is optimized, the resonance frequency is related to the thickness of the driver and the lens, and when the resonance frequency does not meet the design requirement, the thickness of the driver and/or the lens is optimized, as shown in figure 7, the integral caliber of the 7 x 1 integrated wavefront corrector obtained by the invention is 50mm, the thickness is 15mm, the diameter of an inscribed circle of each honeycomb groove 11 is 15mm, the distance between the six grooves 11 at the periphery and the center of the inscribed circle of the central groove 11 is 16mm, the thickness of each honeycomb groove 11 corresponding to the mirror surface is 0.6mm, the diameter of an inner boss of each honeycomb groove 11 is 8mm, the equivalent mirror surface thickness is 1mm, the diameter of the piezoelectric ceramic is 12mm, and the thickness is 0.2mm.
(3) Driver design result examples
Taking the 7 × 1 integrated wavefront corrector for correcting wavefront aberration of 7 sub-beams as an example, the corrector can be designed to be arranged in a honeycomb manner. The honeycomb structure adopts quartz glass or silicon as a substrate 21, the front surface is polished and coated for reflecting each sub-beam reaching a mirror surface, seven hexagonal honeycomb grooves 11 with certain depth are dug at the back of the substrate 21 according to a central circular symmetrical arrangement mode, circular substrate bosses with certain height and smaller than the caliber of the grooves are respectively reserved at the bottoms of the seven honeycomb grooves 11 as fixed supports 12, 7 pieces of piezoelectric ceramics with silver electrodes plated on two surfaces are respectively bonded on the circular substrate bosses in the 7 honeycomb grooves 11, the front surface of the silver-plated piezoelectric ceramics bonded with the bosses is used as a grounding electrode, the back surfaces of the 7 pieces of piezoelectric ceramics are plated with silver to be used as 7 complete electrodes, and accordingly static voltage is applied to the piezoelectric ceramics.
According to the wavefront measurement result of each sub-beam, the layout of the electrode drivers in each honeycomb can be customized and designed, so that the wavefront aberration correction effect of all the sub-beams can be optimal. 7 light beam differentiation array light beam wavefront corrector each cellular inner electrode arrangement is schematically shown in fig. 9, the single cellular inner line (the line indicated by the black arrow) is a separation line of an electrode (a white area), the black area corresponds to the thin strip or the annular area, no electrode is covered, and no voltage is loaded during the work.
The layer structure of the single-honeycomb internal corrector (an independently operable corrector in a single honeycomb, and the whole honeycomb structure is a simultaneously operable and cooperatively controlled array corrector) is shown in fig. 10, in this embodiment, a layer of glass substrate is a substrate 21, one or two layers of piezoelectric materials with the same material and size are used to form a piezoelectric assembly 22, and the edge of the substrate 21 is connected, supported and fixed with a honeycomb supporting structure 23. A monolithic ground electrode 221 is disposed between the piezoelectric assembly 22 (piezoelectric material layer) and the substrate 21 (glass substrate), and a plurality of discrete electrodes 222 are disposed on the back surface of the piezoelectric assembly 22 (piezoelectric material layer), wherein the arrangement of the discrete electrodes 222 corresponds to the design result of the electrode arrangement in the honeycomb shown in fig. 9. Aiming at the incident wavefront aberration of different sub-beams, the invention develops the arrangement design of electrodes of each subarea, and finally the obtained wavefront corrector (deformable mirror) has different arrangements of the piezoelectric components 22 (drivers) of the sub-beam correction components 2 of each subarea.
The differential wavefront corrector is divided into a mirror body 1, a sub-beam correction component 2 (comprising a piezoelectric driver and the like), an electric connection component, a fixing clamp 4 and a base 4, and the assembly result is shown in figures 11, 12 and 13. In fig. 11, the mirror body 1 is the reflection mirror surface side, and is clamped and fixed on the base 4 by the fixing clamp 4, in fig. 12, the wavefront sensor 5 refers to an electrical connection component, and is a drive electrode control line connection component, in fig. 13, the sub-beam correction component 2 is installed on the electrical connection component, and the differential array beam wavefront corrector is obtained.
Although the present invention has been described with reference to the preferred embodiments, it is not intended to be limited thereto. Those skilled in the art can make numerous possible variations and modifications to the present invention, or modify equivalent embodiments to equivalent variations, without departing from the scope of the invention, using the teachings disclosed above. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical spirit of the present invention should fall within the protection scope of the technical scheme of the present invention, unless the technical spirit of the present invention departs from the content of the technical scheme of the present invention.
Claims (8)
1. A differentiation array beam wavefront corrector based on aberration measurement comprises a mirror body (1) with a mirror surface on the front surface, wherein the back surface of the mirror body (1) is provided with a plurality of sub-beam correction components (2), and is characterized in that the structures of the plurality of sub-beam correction components (2) are partially or totally different, when an array beam containing a plurality of sub-beams irradiates on the mirror surface of the mirror body (1), each sub-beam correction component (2) respectively carries out differentiation wavefront pixel correction on the sub-beams in the area, so that the wavefront pixel correction amount of each sub-beam correction component (2) is equal to the distortion wavefront deviation of the corresponding sub-beam;
the sub-beam correction assemblies (2) comprise a substrate (21) and a piezoelectric assembly (22) which are connected with each other, one side of the piezoelectric assembly (22) facing the substrate (21) is provided with a whole block of earth electrode (221), one side of the piezoelectric assembly (22) far away from the substrate (21) and facing the mirror body (1) is provided with a discrete electrode (222), and the discrete electrodes (222) between the sub-beam correction assemblies (2) are partially or totally different;
the mirror body (1) is of an integrated structure; or the mirror body (1) is of a split structure formed by splicing a plurality of blocks, each block is provided with a sub-beam correction assembly (2), the blocks are of polygonal structures, and the blocks are detachably spliced and installed on the same fixing clamp respectively.
2. The wavefront corrector for differentiated array beams of claim 1, characterized in that the piezoelectric component (22) is a layer of piezoelectric material.
3. The wavefront corrector for the light beam of the differential array according to claim 1, characterized in that the back of the mirror body (1) is provided with a plurality of grooves (11), the bottom of each groove (11) is provided with a convex fixing support (12), and each fixing support (12) is provided with a sub-beam correction assembly (2).
4. A method for designing a wavefront corrector for a differential array beam based on aberration measurement according to any one of claims 1 to 3, comprising the steps of:
1) Measuring a distorted wavefront deviation of each sub-beam in an array beam comprising a plurality of sub-beams;
2) Establishing a three-dimensional model of the differential array beam wavefront corrector, and importing the three-dimensional model of the differential array beam wavefront corrector into finite element analysis software;
3) In finite element analysis software, aiming at the structural parameters of a differential array beam wavefront corrector, adjusting the structural parameters of each sub-beam correction component (2) and carrying out simulation calculation on the wavefront pixel correction effect of each sub-beam correction component (2) on the corresponding sub-beam irradiated on a mirror surface, if each sub-beam correction component (2) respectively carries out differential wavefront pixel correction on the sub-beam in the area, so that the wavefront pixel correction value of each sub-beam correction component (2) is equal to the distorted wavefront deviation of the corresponding sub-beam, judging that the detection simulation result meets the design requirement, outputting the finally obtained structural parameters of the differential array beam wavefront corrector as the obtained design result, and ending and exiting; otherwise, skipping to execute the step 3) to continue to adjust the structural parameters of each sub-beam correction component (2).
5. The method for designing the aberration-measurement-based differentiated array beam wavefront corrector according to claim 4, wherein the step 1) comprises:
s1-1, dividing sub-apertures of a micro-lens array of a wavefront sensor into a plurality of sub-apertures according to the sub-beam space positions of array beams, wherein each sub-aperture comprises a plurality of sub-apertures, and the sub-beams of the array beams are focused on a camera target surface through the sub-apertures of the micro-lenses in corresponding areas to form light spots;
s1-2, with the position of a light spot of a reference wavefront in a corresponding target surface area as a reference, solving the deviation delta x and delta y between the distorted wavefront of the sub-beam of the array beam and the position of the centroid of the reference wavefront;
and S1-3, obtaining phase distortion information of the incident wave fronts of the sub-beams of the array beam according to the deviations delta x and delta y, and obtaining the distortion wave front deviation of each sub-beam in the array beam comprising a plurality of sub-beams.
6. The design method of the aberration measurement based differentiation array beam wavefront corrector according to claim 4, wherein the adjusting the structure parameters of each sub-beam correction assembly (2) in step 3) comprises adjusting the unit distribution of the discrete electrodes (222) of each sub-beam correction assembly (2) and the aperture ratio between the sub-beam correction assembly (2) and the mirror body (1).
7. The method for designing the aberration-measurement-based differentiated array beam wavefront corrector according to claim 4, further comprising, after the step 2) and before the step 3), repeating the step of iteratively adjusting the thickness of each sub-beam correction component (2), the thickness of the mirror body (1), and the thickness of the bonding layer between the sub-beam correction component (2) and the mirror body (1) so that the deformation amount and the resonance frequency of the differentiated array beam wavefront corrector meet the design requirements, for the structural parameters of the differentiated array beam wavefront corrector.
8. The method for manufacturing the aberration measurement-based differential array beam wavefront corrector according to any one of claims 1 to 3 is characterized in that structural parameters of the differential array beam wavefront corrector are firstly obtained by the aberration measurement-based design method for the differential array beam wavefront corrector according to any one of claims 4 to 7; and then processing according to the obtained differentiated array beam wavefront corrector to prepare the differentiated array beam wavefront corrector.
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| CN113900250B (en) * | 2021-10-19 | 2023-07-18 | 中国科学院光电技术研究所 | Alignment method of adaptive optical system deformable mirror and Hartmann wavefront sensor |
| CN113985539B (en) * | 2021-11-04 | 2022-09-23 | 中国人民解放军国防科技大学 | Array beam tilt aberration correction system |
| CN114924410B (en) * | 2022-05-20 | 2023-06-30 | 西南科技大学 | Focusing method and device based on small phase modulation and phase compensation |
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