CN113299578B - Vertical furnace front end storage unit - Google Patents
Vertical furnace front end storage unit Download PDFInfo
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- CN113299578B CN113299578B CN202010111266.9A CN202010111266A CN113299578B CN 113299578 B CN113299578 B CN 113299578B CN 202010111266 A CN202010111266 A CN 202010111266A CN 113299578 B CN113299578 B CN 113299578B
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- 238000003860 storage Methods 0.000 title claims abstract description 43
- 239000003638 chemical reducing agent Substances 0.000 claims description 41
- 230000007246 mechanism Effects 0.000 claims description 35
- 210000000245 forearm Anatomy 0.000 claims description 32
- 230000001360 synchronised effect Effects 0.000 claims description 25
- 238000000034 method Methods 0.000 abstract description 6
- 230000008569 process Effects 0.000 abstract description 6
- 239000004065 semiconductor Substances 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 3
- 238000012545 processing Methods 0.000 abstract description 3
- 229910052710 silicon Inorganic materials 0.000 abstract description 3
- 239000010703 silicon Substances 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 44
- 238000012546 transfer Methods 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 3
- 238000002397 field ionisation mass spectrometry Methods 0.000 description 3
- 230000033001 locomotion Effects 0.000 description 3
- 230000032258 transport Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 210000001503 joint Anatomy 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
- H01L21/67781—Batch transfer of wafers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Manipulator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention relates to the technical field of silicon wafer heat treatment processes in semiconductor manufacturing, in particular to a vertical furnace front end storage unit. The vertical furnace comprises a vertical furnace main body, a triaxial manipulator, a vertical furnace frame and a loading and unloading platform, wherein the triaxial manipulator and the vertical furnace frame are arranged in the vertical furnace main body, and a multilayer wafer box storage station is arranged on the vertical furnace frame along the height direction; the loading and unloading platform is arranged at one side of the vertical furnace main body and is used for loading and unloading the wafer box; the three-axis manipulator is used for conveying the wafer box between the wafer box storage station and the loading and unloading platform. The number of the wafer box storage stations is increased from 18 to 26, so that the storage capacity of the vertical furnace is increased, and the processing efficiency is improved.
Description
Technical Field
The invention relates to the technical field of silicon wafer heat treatment processes in semiconductor manufacturing, in particular to a vertical furnace front end storage unit.
Background
In semiconductor manufacturing, a vertical furnace is one of the devices widely used in heat treatment of silicon wafers, and is also called a vertical diffusion furnace. The vertical furnace front end storage unit (vertical furnace STK) is mainly used for storing FOUPs (wafer cassettes) at the front part of vertical furnace equipment, the existing vertical furnace front end storage unit can store 18 FOUPs (wafer cassettes) mostly, and a three-axis box transfer manipulator (CARRIER TRANSFER Robot) is arranged in the vertical furnace front end storage unit, but due to the height limitation of a semiconductor Fab factory building and transportation 2.8m, a manipulator upright column is in single-Z-axis screw transmission or synchronous belt transmission. Currently, most of such devices are in the form of 18FOUP storage, which has limited storage capacity and low process efficiency. Due to further development of the semiconductor manufacturing industry, the productivity is gradually improved, and particularly under the gradual popularization of the 12 inch wafer process, a vertical furnace front end mold with large storage position is urgently needed.
Disclosure of Invention
The invention aims to provide a vertical furnace front end storage unit to solve the problems that the storage capacity of the existing vertical furnace front end storage unit is limited and the process efficiency is low.
In order to achieve the above purpose, the present invention adopts the following technical scheme:
The vertical furnace front end storage unit comprises a vertical furnace main body, a triaxial manipulator, a vertical furnace frame and a loading and unloading platform, wherein the triaxial manipulator and the vertical furnace frame are arranged in the vertical furnace main body, and a multilayer wafer box storage station is arranged on the vertical furnace frame along the height direction; the loading and unloading platform is arranged at one side of the vertical furnace main body and is used for loading and unloading the wafer box; the three-axis manipulator is used for conveying the wafer box between the wafer box storage station and the loading and unloading platform.
The three-axis manipulator comprises a manipulator Z axis, a manipulator X axis and a manipulator R axis which are sequentially connected, wherein the manipulator Z axis comprises a manipulator Z1 axis and a manipulator Z2 axis, the manipulator Z1 axis and the manipulator Z2 axis can move relatively along the Z axis direction, and the manipulator Z2 axis is connected with the manipulator X axis.
The Z1 shaft of the manipulator comprises a Z1 shaft motor, a Z1 shaft speed reducer, a Z1 shaft gear, a Z1 shaft rack, a Z1 shaft guide rail, Z1 shaft and Z2 shaft adapter flange plates and a manipulator back plate, wherein the Z1 shaft guide rail is arranged on the manipulator back plate, the Z1 shaft and Z2 shaft adapter flange plates are in sliding connection with the Z1 shaft guide rail, and the Z1 shaft rack is arranged on the Z1 shaft guide rail;
The Z1 shaft speed reducer is arranged on a Z1 shaft and a Z2 shaft adapter flange plate, an input shaft is connected with a Z1 shaft motor, an output shaft of the Z1 shaft speed reducer is connected with a Z1 shaft gear, and the Z1 shaft gear is meshed with the Z1 shaft rack.
The Z2 shaft of the manipulator comprises a Z2 shaft motor, a Z2 shaft speed reducer, a Z2 shaft gear, a Z2 shaft rack, a Z2 shaft guide rail, a Z2 shaft and an X shaft adapter flange plate, wherein the Z2 shaft guide rail is arranged on the Z1 shaft and the Z2 shaft adapter flange plate, the Z2 shaft and the X shaft adapter flange plate are in sliding connection with the Z2 shaft guide rail, and the Z2 shaft rack is arranged on the Z2 shaft guide rail;
The Z2 shaft speed reducer set up in on Z2 axle and the X axle adapter flange board to the input shaft is connected with Z2 axle motor, the output shaft and the Z2 axle gear connection of Z2 shaft speed reducer, Z2 axle gear and Z2 axle rack meshing.
The X-axis of the manipulator comprises an X-axis driving mechanism, an X-axis flange plate, an X-axis and R-axis adapter flange, an X-axis frame and an X-axis guide rail, wherein the X-axis frame is connected with the Z2 axis of the manipulator through the X-axis flange plate, the X-axis guide rail is arranged on the X-axis frame, and the X-axis and R-axis adapter flange are in sliding connection with the X-axis guide rail;
The X-axis driving mechanism is arranged in the X-axis frame and is connected with the X-axis and R-axis adapter flange, and the X-axis and R-axis adapter flange is driven by the X-axis driving mechanism to move on the X-axis guide rail.
The X-axis driving mechanism comprises an X-axis motor, an X-axis belt pulley, a synchronous belt and an X-axis belt pulley fixing block, wherein the synchronous belt is supported by the two X-axis belt pulleys, the X-axis belt pulley is arranged in the X-axis frame through the X-axis belt pulley fixing block, and one X-axis belt pulley is arranged on an output shaft of the X-axis motor; and the synchronous belt is connected with the X-axis and R-axis adapter flange.
The manipulator R shaft comprises an R shaft motor, an R shaft harmonic reducer, a large arm shell, a large arm driving mechanism, a small arm shell, a small arm driving mechanism and a wafer box tray;
The R-axis harmonic speed reducer is arranged on the X axis of the manipulator, an input shaft is connected with an output shaft of the R-axis motor, an output shaft flange of the R-axis harmonic speed reducer is fixedly connected with the large arm shell, and the R-axis harmonic speed reducer drives the large arm shell to rotate;
one end of the small arm shell is rotationally connected with the tail end of the large arm shell, and the other end of the small arm shell is rotationally provided with a wafer box tray;
The large arm driving mechanism is arranged in the large arm shell and connected with the small arm shell, and the large arm driving mechanism is used for driving the small arm shell to rotate relative to the large arm shell;
the small arm driving mechanism is arranged in the small arm shell and is connected with the wafer box tray; the small arm driving mechanism is used for driving the wafer box tray to rotate relative to the small arm shell.
The large arm driving mechanism comprises a large arm driving wheel, a large arm synchronous belt, an elbow shaft and a large arm driven wheel, wherein the large arm driving wheel is fixedly connected with the outer ring of the R-axis harmonic speed reducer, the elbow shaft is fixed at the tail end of the large arm shell, and the large arm driven wheel is rotatably arranged on the elbow shaft and is connected with the large arm driving wheel through the large arm synchronous belt; the big arm driven wheel is fixedly connected with the small arm shell.
The small arm driving mechanism comprises a small arm driving wheel, a small arm driven wheel and a small arm synchronous belt, wherein the small arm driving wheel is fixed on the elbow shaft, the small arm driven wheel is rotatably arranged at the tail end of the small arm shell and is connected with the small arm driving wheel through the small arm synchronous belt, and the wafer box tray is fixedly connected with the small arm driven wheel.
The forearm synchronous belt is tensioned by a forearm tensioning wheel arranged in the forearm shell.
The invention has the advantages and beneficial effects that: the invention further increases the storage capacity of the vertical furnace and improves the processing efficiency on the basis of the front end storage unit of the existing vertical furnace, and the number of the wafer box storage stations is increased from 18 to 26. Because the layering height limit of the vertical furnace leads to that the station single Z axle on the upper layer can not be taken and placed after layering, the double Z axle design is carried out on the manipulator, the scheme adopts an integrated rack guide rail, the thickness of the double-layer Z axle is thinned to 70mm, so that the double-layer Z axle can be taken and placed when the limit position 294.5mm at the left end of the wafer box is met, and the configuration optimization is carried out on the X axle and the R axle.
Drawings
FIG. 1 is an isometric view of a vertical furnace front end storage unit of the present invention;
FIG. 2 is a diagram of the internal station arrangement of the vertical furnace front end storage unit of the present invention;
FIG. 3 is an overall top view of the present invention;
FIG. 4 is an isometric view of a three-axis robot in accordance with the present invention;
FIG. 5 is a front view of a three-axis manipulator according to the present invention;
FIG. 6 is a right side view of FIG. 5;
FIG. 7 is a Z-axis cross-sectional view of a three-axis manipulator of the present invention;
FIG. 8 is an isometric view of an X-axis of a three-axis manipulator of the present invention;
FIG. 9 is an R-axis cross-sectional view of a three-axis manipulator according to the present invention;
FIG. 10 is a top view of the R-axis of the three-axis manipulator of the present invention;
Fig. 11 is a left and right limit position diagram of a three-axis manipulator according to the present invention.
In the figure: 1. a vertical furnace main body, 2, a three-axis manipulator, 3, a vertical furnace frame, 4, a loading and unloading platform, 5, a manipulator Z1 axis, 6, a manipulator Z2 axis, 7, a manipulator X axis, 8, a manipulator R axis, 9, a Z1 axis motor, 10, a Z1 axis speed reducer, 11, a Z1 axis gear, 12, a Z1 axis rack, 13, a Z1 axis guide rail, 14, a Z1 axis and Z2 axis transfer flange plate, 15, a Z2 axis motor, 16, a Z2 axis speed reducer, 17, a Z2 axis gear, 18, a Z2 axis rack, 19, a Z2 axis guide rail, 20, a Z2 axis and X axis transfer flange plate, 21, a drag chain, 22, an X axis motor, 23, an X axis flange plate, 24, an X axis and an R axis transfer flange, 25, an X-axis frame, 26, an X-axis guide rail, 27, an X-axis belt wheel, 28, an X-axis belt wheel fixing block, 29, an X-axis drag chain, 30, an R-axis motor, 31, an R-axis harmonic speed reducer, 32, a large arm shell, 33, a large arm driving wheel, 34, a large arm upper cover, 35, a large arm synchronous belt, 36, an elbow shaft, 37, a large arm driven wheel, 38, a small arm shell, 39, a small arm driving wheel, 40, a small arm driven wheel, 41, a wafer box tray, 42, a small arm tensioning wheel, 43, a small arm synchronous belt, 44, a wafer box, 45, a wafer box storage station, 46, FIMS (vertical furnace main body and front end module butt joint box opening module) and 50 are manipulator back plates.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in detail with reference to the accompanying drawings and specific embodiments.
As shown in fig. 1-3, the front end storage unit of the vertical furnace provided by the invention comprises a vertical furnace main body 1, a triaxial manipulator 2, a vertical furnace frame 3 and a loading and unloading platform 4, wherein the triaxial manipulator 2 and the vertical furnace frame 3 are arranged in the vertical furnace main body 1, and a multilayer wafer box storage station 45 is arranged on the vertical furnace frame 3 along the height direction; the loading and unloading platform 4 is arranged at one side of the vertical furnace main body 1 and is used for loading and unloading the wafer boxes; the three axis robot 2 is used to transfer cassettes between a cassette storage station 45 and a load-out platform 4.
As shown in fig. 4-6, the triaxial manipulator 2 comprises a manipulator Z axis, a manipulator X axis 7 and a manipulator R axis 8 which are sequentially connected, wherein the manipulator Z axis is of a biaxial structure, and comprises a manipulator Z1 axis 5 and a manipulator Z2 axis 6, the manipulator Z1 axis 5 and the manipulator Z2 axis 6 can relatively move along the Z axis direction, and the manipulator Z2 axis 6 is connected with the manipulator X axis 7.
As shown in fig. 7, the manipulator Z1 axis 5 includes a Z1 axis motor 9, a Z1 axis speed reducer 10, a Z1 axis gear 11, a Z1 axis rack 12, a Z1 axis guide rail 13, a Z1 axis and Z2 axis adapting flange plate 14, and a manipulator back plate 50, wherein the Z1 axis guide rail 13 is disposed on the manipulator back plate 50, the Z1 axis and Z2 axis adapting flange plate 14 is slidably connected with the Z1 axis guide rail 13, and the Z1 axis rack 12 is disposed on the Z1 axis guide rail 13; the Z1-axis speed reducer 10 is arranged on a Z1-axis and Z2-axis adapter flange plate 14, an input shaft is connected with the Z1-axis motor 9, an output shaft of the Z1-axis speed reducer 10 is connected with a Z1-axis gear 11, and the Z1-axis gear 11 is meshed with a Z1-axis rack 12.
The Z1 shaft motor 9 drives the Z1 shaft gear 11 to rotate through the Z1 shaft speed reducer 10, and the Z1 shaft gear 11 is meshed with the Z1 shaft rack 12, so that the Z1 shaft gear 11 rolls along the Z1 shaft rack 12, and the Z1 shaft and Z2 shaft adapter flange plates 14 are driven to move up and down along the Z1 shaft guide rail 13.
In the embodiment of the invention, the Z1-axis rack 12 and the Z1-axis guide rail 13 are of an integrated structure.
As shown in fig. 7, the manipulator Z2 axis 6 includes a Z2 axis motor 15, a Z2 axis speed reducer 16, a Z2 axis gear 17, a Z2 axis rack 18, a Z2 axis guide 19, and a Z2 axis and X axis adapter flange plate 20, wherein the Z2 axis guide 19 is disposed on the Z1 axis and Z2 axis adapter flange plate 14, the Z2 axis and X axis adapter flange plate 20 is slidably connected with the Z2 axis guide 19, and the Z2 axis rack 18 is disposed on the Z2 axis guide 19; the Z2-axis speed reducer 16 is arranged on the Z2-axis and X-axis adapter flange plate 20, an input shaft is connected with the Z2-axis motor 15, an output shaft of the Z2-axis speed reducer 16 is connected with the Z2-axis gear 17, and the Z2-axis gear 17 is meshed with the Z2-axis rack 18.
The Z2 shaft motor 15 drives the Z2 shaft gear 17 to rotate through the Z2 shaft speed reducer 16, and the Z2 shaft gear 17 is meshed with the Z2 shaft rack 18, so that the Z2 shaft gear 17 rolls along the Z2 shaft rack 18, the Z2 shaft gear 17 drives the Z2 shaft and X shaft adapter flange plate 20 to move up and down along the Z2 shaft guide rail 19, and further drives the manipulator X shaft 7 and the manipulator R shaft 8 to move up and down.
In the embodiment of the invention, the Z2-axis rack 18 and the Z2-axis guide rail 19 are of an integrated structure.
As shown in fig. 8, the manipulator X-axis 7 includes an X-axis driving mechanism, an X-axis flange plate 23, X-axis and R-axis adapter flanges 24, an X-axis frame 25, and an X-axis guide rail 26, wherein the X-axis frame 25 is connected with the manipulator Z2-axis 6 through the X-axis flange plate 23, the X-axis guide rail 26 is disposed on the X-axis frame 25, and the X-axis and R-axis adapter flanges 24 are slidably connected with the X-axis guide rail 26;
the X-axis drive mechanism is disposed within the X-axis frame 25 and is connected to the X-axis and R-axis adapter flange 24, and the X-axis and R-axis adapter flange 24 is moved on the X-axis guide rail 26 by the drive of the X-axis drive mechanism.
The X-axis driving mechanism comprises an X-axis motor 22, an X-axis belt pulley 27, a synchronous belt and an X-axis belt pulley fixed block 28, wherein the synchronous belt is supported by the two X-axis belt pulleys 27, the X-axis belt pulley 27 is arranged in the X-axis frame 25 through the X-axis belt pulley fixed block 28, and one X-axis belt pulley 27 is arranged on an output shaft of the X-axis motor 22; the timing belt is connected to the X-axis and R-axis adapter flange 24.
The X-axis motor 22 drives the synchronous belt to rotate, and the synchronous belt is connected with the X-axis and R-axis adapter flange 24, so that the X-axis and R-axis adapter flange 24 is driven to move along the X-axis guide rail 26, and the manipulator R-axis 8 is driven to move along the X-axis.
As shown in fig. 9-10, the robot R-axis 8 includes an R-axis motor 30, an R-axis harmonic reducer 31, a boom housing 32, a boom drive mechanism, a forearm housing 38, a forearm drive mechanism, and a wafer cassette tray 41; the R-axis harmonic speed reducer 31 is arranged on the X-axis 7 of the manipulator, an input shaft is connected with an output shaft of the R-axis motor 30, an output shaft flange of the R-axis harmonic speed reducer 31 is fixedly connected with the large arm shell 32, and the R-axis harmonic speed reducer 31 drives the large arm shell 32 to rotate; one end of the small arm casing 38 is rotatably connected with the end of the large arm casing 32, and the other end is rotatably provided with a wafer cassette tray 41; the large arm driving mechanism is arranged in the large arm shell 32 and connected with the small arm shell 38, and is used for driving the small arm shell 38 to rotate relative to the large arm shell 32; the forearm drive mechanism is disposed within the forearm housing 38 and is connected to the wafer cassette tray 41; the forearm drive mechanism is used to drive rotation of the wafer cassette tray 41 relative to the forearm housing 38.
The large arm driving mechanism comprises a large arm driving wheel 33, a large arm synchronous belt 35, an elbow shaft 36 and a large arm driven wheel 37, wherein the large arm driving wheel 33 is fixedly connected with the outer ring of the R-axis harmonic speed reducer 31, the elbow shaft 36 is fixed at the tail end of the large arm shell 32, and the large arm driven wheel 37 is rotatably arranged on the elbow shaft 36 and is connected with the large arm driving wheel 33 through the large arm synchronous belt 35; the large arm driven wheel 37 is fixedly connected with the small arm shell 38.
The forearm driving mechanism comprises a forearm driving wheel 39, a forearm driven wheel 40 and a forearm synchronous belt 43, wherein the forearm driving wheel 39 is fixed on the elbow shaft 36, the forearm driven wheel 40 is rotatably arranged at the tail end of the forearm shell 38 and is connected with the forearm driving wheel 39 through the forearm synchronous belt 43, and the wafer box tray 41 is fixedly connected with the forearm driven wheel 40. The arm timing belt 43 is tensioned by an arm tensioning pulley 42 provided in the arm casing 38.
The working principle of the manipulator R shaft 8 is as follows:
the R-axis motor 30 is coaxial with the R-axis harmonic speed reducer 31, the outer ring of the R-axis harmonic speed reducer 31 is fixedly connected with the big arm belt wheel 33, the output flange of the speed reducer is fixedly connected with the big arm upper cover 34 through a shoulder shaft, and the big arm upper cover 34 is fixedly connected with the big arm shell 32, so that the relative movement of the big arm and the big arm driving wheel 33 is realized; the large arm driving wheel 33 is connected with a large arm driven wheel 37 through a synchronous belt 35, the large arm driven wheel 37 and a small arm driving wheel 39 are arranged on an elbow shaft 36, and the large arm driven wheel 37 can rotate; the large arm shell 32 is fixedly connected with the elbow shaft 36, the elbow shaft 36 is fixedly connected with the small arm driving wheel 39, and the small arm shell 38 is fixedly connected with the large arm driven wheel 37 to realize small arm movement; the small arm driving wheel 39 is connected with the small arm driven wheel 40 through a small arm synchronous belt 43 so as to drive the wafer box tray 41 to move; the length of the large arm and the small arm in the structure is consistent, so that the reciprocating linear motion of the R shaft is realized.
In the embodiment of the invention, 26 wafer box storage stations 45 are arranged on the vertical furnace frame 3, the manipulator backboard 50 is arranged on the vertical furnace frame 3, the height of the manipulator Z1 axis 5 is within 2.8m, and the thickness of the manipulator Z axis is 70mm, so that the manipulator Z axis can be taken and placed when the limit position of the left end of the wafer box is 294.5mm, namely, the limit position value of the left end meets the design standard of SEMI E15.1. As shown in fig. 3, the loading and unloading platform 4 transports the wafer cassette 44 outside the vertical furnace to the inside of the vertical furnace through the electric sliding table structure, and the triaxial manipulator 2 transports the wafer cassette 44 to each wafer cassette storage station 45 for storage.
The working principle of the invention is as follows:
As shown in fig. 11, an operator or an OHT (overhead travelling crane) places a wafer cassette at a Load Port (Load-and-unload platform) unloading position, transports the wafer cassette to the inside of a vertical furnace through an electric sliding table, namely, the loading position, moves the three-axis manipulator 2 to the Load Port loading position, then sends the wafer cassette to a station in the vertical furnace for storage, resets the three-axis manipulator 2, and is a cycle of taking and placing actions of the three-axis manipulator 2. When the rear-end vertical diffusion furnace needs oxidation, the wafer box on the station is taken out by the triaxial manipulator 2, sent to the FIMS (the vertical furnace main body and the front-end module are in butt joint with the box opening module) for box opening, and the manipulator on one side of the vertical oxidation furnace conveys the wafer in the wafer box to the Boat for oxidation process operation. When the oxidation process is finished, the wafer is sent back to the wafer box by the manipulator at one side of the vertical oxidation furnace, the wafer box is taken away and stored by the FIMS closing box, then the wafer box is transported to the Load Port loading position by the triaxial manipulator 2, the Load Port carries out loading and unloading actions, and the wafer box at the loading position is taken away by the OHT (overhead travelling crane).
The invention increases the storage capacity of the vertical furnace and improves the processing efficiency. The double Z-axis design is carried out on the manipulator, the integral rack guide rail is adopted in the scheme, the thickness of the double Z-axis is thinned to 70mm, so that the double Z-axis can be taken and placed when 294.5mm of the limit position of the left end of the wafer box is met, and the configuration of the X-axis and the R-axis is optimized.
The foregoing is merely an embodiment of the present invention and is not intended to limit the scope of the present invention. Any modification, equivalent replacement, improvement, expansion, etc. made within the spirit and principle of the present invention are included in the protection scope of the present invention.
Claims (7)
1. The vertical furnace front end storage unit is characterized by comprising a vertical furnace main body (1), a three-axis mechanical arm (2), a vertical furnace frame (3) and a loading and unloading platform (4), wherein the three-axis mechanical arm (2) and the vertical furnace frame (3) are arranged in the vertical furnace main body (1), and a multilayer wafer box storage station (45) is arranged on the vertical furnace frame (3) along the height direction; the loading and unloading platform (4) is arranged at one side of the vertical furnace main body (1) and is used for loading and unloading the wafer boxes; the triaxial manipulator (2) is used for conveying the wafer cassette between the wafer cassette storage station (45) and the loading and unloading platform (4);
The three-axis manipulator (2) comprises a manipulator Z axis, a manipulator X axis (7) and a manipulator R axis (8) which are sequentially connected, wherein the manipulator Z axis comprises a manipulator Z1 axis (5) and a manipulator Z2 axis (6), the manipulator Z1 axis (5) and the manipulator Z2 axis (6) can relatively move along the Z axis direction, and the manipulator Z2 axis (6) is connected with the manipulator X axis (7);
The Z1 shaft (5) of the manipulator comprises a Z1 shaft motor (9), a Z1 shaft speed reducer (10), a Z1 shaft gear (11), a Z1 shaft rack (12), a Z1 shaft guide rail (13), Z1 shaft and Z2 shaft adapter flange plates (14) and a manipulator back plate (50), wherein the Z1 shaft guide rail (13) is arranged on the manipulator back plate (50), the Z1 shaft and Z2 shaft adapter flange plates (14) are in sliding connection with the Z1 shaft guide rail (13), and the Z1 shaft rack (12) is arranged on the Z1 shaft guide rail (13); the Z1 shaft speed reducer (10) is arranged on a Z1 shaft and Z2 shaft adapter flange plate (14), an input shaft is connected with a Z1 shaft motor (9), an output shaft of the Z1 shaft speed reducer (10) is connected with a Z1 shaft gear (11), and the Z1 shaft gear (11) is meshed with the Z1 shaft rack (12);
The Z2 shaft (6) of the manipulator comprises a Z2 shaft motor (15), a Z2 shaft speed reducer (16), a Z2 shaft gear (17), a Z2 shaft rack (18), a Z2 shaft guide rail (19) and a Z2 shaft and X shaft adapter flange plate (20), wherein the Z2 shaft guide rail (19) is arranged on the Z1 shaft and Z2 shaft adapter flange plate (14), the Z2 shaft and X shaft adapter flange plate (20) is in sliding connection with the Z2 shaft guide rail (19), and the Z2 shaft rack (18) is arranged on the Z2 shaft guide rail (19); the Z2 shaft speed reducer (16) is arranged on the Z2 shaft and X shaft adapter flange plate (20), an input shaft is connected with the Z2 shaft motor (15), an output shaft of the Z2 shaft speed reducer (16) is connected with the Z2 shaft gear (17), and the Z2 shaft gear (17) is meshed with the Z2 shaft rack (18);
Z1 axle rack (12) and Z1 axle guide rail (13) are integral type structure, Z2 axle rack (18) and Z2 axle guide rail (19) are integral type structure, and the thickness of double-deck Z axle reduces to 70mm, makes it can satisfy when the extreme position 294.5mm in wafer box left end, can get and put.
2. The vertical furnace front end storage unit according to claim 1, characterized in that the manipulator X-axis (7) comprises an X-axis drive mechanism, an X-axis flange plate (23), an X-axis and R-axis adapter flange (24), an X-axis frame (25) and an X-axis guide rail (26), wherein the X-axis frame (25) is connected with the manipulator Z2-axis (6) by means of the X-axis flange plate (23), the X-axis guide rail (26) is arranged on the X-axis frame (25), and the X-axis and R-axis adapter flange (24) is in sliding connection with the X-axis guide rail (26);
The X-axis driving mechanism is arranged in the X-axis frame (25) and is connected with the X-axis and R-axis adapter flange (24), and the X-axis and R-axis adapter flange (24) moves on the X-axis guide rail (26) through the driving of the X-axis driving mechanism.
3. The vertical furnace front end storage unit according to claim 2, wherein the X-axis driving mechanism comprises an X-axis motor (22), an X-axis pulley (27), a timing belt and an X-axis pulley fixing block (28), wherein the timing belt is supported by two X-axis pulleys (27), the X-axis pulleys (27) are arranged in the X-axis frame (25) by the X-axis pulley fixing block (28), and one of the X-axis pulleys (27) is arranged on an output shaft of the X-axis motor (22); the timing belt is connected with the X-axis and R-axis adapter flange (24).
4. The vertical furnace front end storage unit according to claim 1, wherein the manipulator R-axis (8) comprises an R-axis motor (30), an R-axis harmonic reducer (31), a large arm housing (32), a large arm driving mechanism, a small arm housing (38), a small arm driving mechanism and a wafer cassette tray (41);
The R-axis harmonic speed reducer (31) is arranged on the X-axis (7) of the manipulator, an input shaft is connected with an output shaft of the R-axis motor (30), an output shaft flange of the R-axis harmonic speed reducer (31) is fixedly connected with the big arm shell (32), and the R-axis harmonic speed reducer (31) drives the big arm shell (32) to rotate;
one end of the small arm shell (38) is rotatably connected with the tail end of the large arm shell (32), and the other end of the small arm shell is rotatably provided with a wafer box tray (41);
The big arm driving mechanism is arranged in the big arm shell (32) and is connected with the small arm shell (38), and the big arm driving mechanism is used for driving the small arm shell (38) to rotate relative to the big arm shell (32);
The small arm driving mechanism is arranged in the small arm shell (38) and is connected with the wafer box tray (41); the small arm driving mechanism is used for driving the wafer box tray (41) to rotate relative to the small arm shell (38).
5. The vertical furnace front end storage unit according to claim 4, wherein the large arm driving mechanism comprises a large arm driving wheel (33), a large arm synchronous belt (35), an elbow shaft (36) and a large arm driven wheel (37), wherein the large arm driving wheel (33) is fixedly connected with an outer ring of the R-axis harmonic speed reducer (31), the elbow shaft (36) is fixed at the tail end of the large arm shell (32), and the large arm driven wheel (37) is rotatably arranged on the elbow shaft (36) and is connected with the large arm driving wheel (33) through the large arm synchronous belt (35); the big arm driven wheel (37) is fixedly connected with the small arm shell (38).
6. The vertical furnace front end storage unit according to claim 5, wherein the forearm drive mechanism comprises a forearm driving wheel (39), a forearm driven wheel (40) and a forearm synchronous belt (43), wherein the forearm driving wheel (39) is fixed on the elbow shaft (36), the forearm driven wheel (40) is rotatably arranged at the tail end of the forearm housing (38) and is connected with the forearm driving wheel (39) through the forearm synchronous belt (43), and the wafer box tray (41) is fixedly connected with the forearm driven wheel (40).
7. The vertical furnace front end storage unit according to claim 6, characterized in that the forearm timing belt (43) is tensioned by a forearm tensioner (42) provided in the forearm housing (38).
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010111266.9A CN113299578B (en) | 2020-02-24 | 2020-02-24 | Vertical furnace front end storage unit |
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| CN202010111266.9A CN113299578B (en) | 2020-02-24 | 2020-02-24 | Vertical furnace front end storage unit |
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| CN113299578A CN113299578A (en) | 2021-08-24 |
| CN113299578B true CN113299578B (en) | 2024-07-05 |
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| KR20120123839A (en) * | 2011-05-02 | 2012-11-12 | 주식회사 로보스타 | Vertical driving apparatus of 2 step sliding |
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| JP3242487B2 (en) * | 1993-04-23 | 2001-12-25 | 日本トムソン株式会社 | Rolling guide unit |
| JP4506523B2 (en) * | 2005-03-17 | 2010-07-21 | パナソニック電工株式会社 | Massage machine |
| JP5016302B2 (en) * | 2006-12-01 | 2012-09-05 | 日本電産サンキョー株式会社 | Arm drive device and industrial robot |
| JP4980127B2 (en) * | 2007-04-24 | 2012-07-18 | 川崎重工業株式会社 | Substrate transfer robot |
| CN107186533A (en) * | 2017-04-19 | 2017-09-22 | 中煤科工集团西安研究院有限公司 | Drilling rod conveying robot based on truss |
| CN108821186B (en) * | 2018-08-21 | 2024-09-17 | 南京康尼电气技术有限公司 | Light and thin three-stage fork and stacker |
| CN109787414A (en) * | 2019-03-05 | 2019-05-21 | 英诺维尔智能科技（苏州）有限公司 | A kind of twin-stage Z axis device driven by single servo motor |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101256408A (en) * | 2007-02-13 | 2008-09-03 | 东京毅力科创株式会社 | Setting operation support device for substrate processing apparatus, setting operation support method |
| CN102476383A (en) * | 2010-11-30 | 2012-05-30 | 沈阳新松机器人自动化股份有限公司 | Planar articulated robot arm mechanism |
| KR20120123839A (en) * | 2011-05-02 | 2012-11-12 | 주식회사 로보스타 | Vertical driving apparatus of 2 step sliding |
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| CN113299578A (en) | 2021-08-24 |
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Effective date of registration: 20231102 Address after: No.15-1 Feiyun Road, Hunnan District, Shenyang City, Liaoning Province, 110169 Applicant after: Shenyang Xinsong Semiconductor Equipment Co.,Ltd. Address before: Hunnan New District Jinhui street in Shenyang of Liaoning province 110168 City No. 16 Applicant before: SHENYANG SIASUN ROBOT & AUTOMATION Co.,Ltd. |
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