CN113299578A - Vertical furnace front end storage unit - Google Patents
Vertical furnace front end storage unit Download PDFInfo
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- CN113299578A CN113299578A CN202010111266.9A CN202010111266A CN113299578A CN 113299578 A CN113299578 A CN 113299578A CN 202010111266 A CN202010111266 A CN 202010111266A CN 113299578 A CN113299578 A CN 113299578A
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- 238000003860 storage Methods 0.000 title claims abstract description 43
- 239000003638 chemical reducing agent Substances 0.000 claims description 41
- 230000007246 mechanism Effects 0.000 claims description 36
- 230000001360 synchronised effect Effects 0.000 claims description 29
- 238000012546 transfer Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 6
- 230000008569 process Effects 0.000 abstract description 6
- 239000004065 semiconductor Substances 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 3
- 238000012545 processing Methods 0.000 abstract description 3
- 229910052710 silicon Inorganic materials 0.000 abstract description 3
- 239000010703 silicon Substances 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 47
- 210000000245 forearm Anatomy 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 3
- 238000002397 field ionisation mass spectrometry Methods 0.000 description 3
- 230000032258 transport Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 2
- 210000001503 joint Anatomy 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
- H01L21/67781—Batch transfer of wafers
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Abstract
The invention relates to the technical field of silicon wafer heat treatment processes in semiconductor manufacturing processes, in particular to a front-end storage unit of a vertical furnace. The vertical furnace comprises a vertical furnace main body, a three-shaft manipulator, a vertical furnace frame and a loading and unloading platform, wherein the three-shaft manipulator and the vertical furnace frame are arranged in the vertical furnace main body, and a plurality of layers of wafer box storage stations are arranged on the vertical furnace frame along the height direction; the loading and unloading platform is arranged on one side of the vertical furnace main body and is used for loading and unloading the wafer box; the three-axis manipulator is used for conveying the wafer boxes between the wafer box storage station and the loading and unloading platform. The number of the wafer box storage stations is increased from 18 to 26, so that the storage capacity of the vertical furnace is improved, and the processing efficiency is improved.
Description
Technical Field
The invention relates to the technical field of silicon wafer heat treatment processes in semiconductor manufacturing processes, in particular to a front-end storage unit of a vertical furnace.
Background
In semiconductor manufacturing, a vertical furnace is one of the equipments widely used in heat treatment of silicon wafers, and is also called as a vertical diffusion furnace. Vertical furnace front end memory cell (vertical furnace STK) mainly used is at the anterior FOUP (wafer box) of saving of vertical furnace equipment, and current vertical furnace front end memory cell mostly can save 18FOUP (wafer box), and its inside is furnished with three-axis and passes a box manipulator (Carrier Transfer Robot), nevertheless because semiconductor Fab factory building and transportation 2.8m height limit, the manipulator stand is single Z axle screw drive or synchronous belt drive. Currently, most of the equipments are in the form of 18FOUP storage sites, which have limited storage capacity and low process efficiency. Due to the further development of the semiconductor manufacturing process industry, the productivity is gradually improved, and particularly under the gradual popularization of the 12-inch wafer process, a large-storage-position vertical furnace front end mold is urgently needed.
Disclosure of Invention
In view of the above problems, an object of the present invention is to provide a vertical furnace front end storage unit, so as to solve the problems of limited storage capacity and low process efficiency of the existing vertical furnace front end storage unit.
In order to achieve the purpose, the invention adopts the following technical scheme:
a vertical furnace front-end storage unit comprises a vertical furnace main body, a three-axis manipulator, a vertical furnace frame and a loading and unloading platform, wherein the three-axis manipulator and the vertical furnace frame are arranged in the vertical furnace main body, and a plurality of layers of wafer box storage stations are arranged on the vertical furnace frame along the height direction; the loading and unloading platform is arranged on one side of the vertical furnace main body and is used for loading and unloading the wafer box; the three-axis manipulator is used for conveying the wafer boxes between the wafer box storage station and the loading and unloading platform.
The three-axis manipulator comprises a Z-axis manipulator, an X-axis manipulator and an R-axis manipulator which are sequentially connected, wherein the Z-axis manipulator comprises a Z1-axis manipulator and a Z2-axis manipulator, the Z1-axis manipulator and the Z2-axis manipulator can move relatively along the Z-axis direction, and the Z2-axis manipulator is connected with the X-axis manipulator.
The Z1 shaft of the manipulator comprises a Z1 shaft motor, a Z1 shaft speed reducer, a Z1 shaft gear, a Z1 shaft rack, a Z1 shaft guide rail, a Z1 shaft, a Z2 shaft adapter flange plate and a manipulator back plate, wherein the Z1 shaft guide rail is arranged on the manipulator back plate, a Z1 shaft and a Z2 shaft adapter flange plate are in sliding connection with the Z1 shaft guide rail, and the Z1 shaft rack is arranged on a Z1 shaft guide rail;
the Z1 axle speed reducer is installed on Z1 axle and Z2 axle adapter flange board, and the input shaft is connected with Z1 axle motor, the output shaft and the Z1 axle gear connection of Z1 axle speed reducer, Z1 axle gear with Z1 axle rack meshing.
The Z2 shaft of the manipulator comprises a Z2 shaft motor, a Z2 shaft speed reducer, a Z2 shaft gear, a Z2 shaft rack, a Z2 shaft guide rail, a Z2 shaft and an X shaft rotating flange plate, wherein the Z2 shaft guide rail is arranged on the Z1 shaft and Z2 shaft rotating flange plate, the Z2 shaft and the X shaft rotating flange plate are connected with the Z2 shaft guide rail in a sliding manner, and the Z2 shaft rack is arranged on the Z2 shaft guide rail;
the Z2 axle speed reducer sets up on Z2 axle and X axle flange board of changeing, and the input shaft is connected with Z2 axle motor, the output shaft of Z2 axle speed reducer is connected with Z2 axle gear, Z2 axle gear and Z2 axle rack toothing.
The X-axis of the manipulator comprises an X-axis driving mechanism, an X-axis flange plate, an X-axis and R-axis adapter flange, an X-axis frame and an X-axis guide rail, wherein the X-axis frame is connected with the Z2 shaft of the manipulator through the X-axis flange plate, the X-axis guide rail is arranged on the X-axis frame, and the X-axis and R-axis adapter flange are connected with the X-axis guide rail in a sliding manner;
the X-axis driving mechanism is arranged in the X-axis frame and connected with the X-axis and R-axis rotating flanges, and the X-axis and R-axis rotating flanges move on the X-axis guide rail through the driving of the X-axis driving mechanism.
The X-axis driving mechanism comprises an X-axis motor, an X-axis belt pulley, a synchronous belt and an X-axis belt pulley fixing block, wherein the synchronous belt is supported by two X-axis belt pulleys; the synchronous belt is connected with the X-axis and the R-axis connecting flanges.
The R shaft of the manipulator comprises an R shaft motor, an R shaft harmonic reducer, a large arm shell, a large arm driving mechanism, a small arm shell, a small arm driving mechanism and a wafer box tray;
the R-axis harmonic reducer is arranged on the X axis of the manipulator, an input shaft is connected with an output shaft of the R-axis motor, an output shaft flange of the R-axis harmonic reducer is fixedly connected with the large arm shell, and the R-axis harmonic reducer drives the large arm shell to rotate;
one end of the small arm shell is rotatably connected with the tail end of the large arm shell, and the other end of the small arm shell is rotatably provided with a wafer box tray;
the large arm driving mechanism is arranged in the large arm shell and connected with the small arm shell, and the large arm driving mechanism is used for driving the small arm shell to rotate relative to the large arm shell;
the small arm driving mechanism is arranged in the small arm shell and is connected with the wafer box tray; the small arm driving mechanism is used for driving the wafer box tray to rotate relative to the small arm shell.
The large arm driving mechanism comprises a large arm driving wheel, a large arm synchronous belt, an elbow shaft and a large arm driven wheel, wherein the large arm driving wheel is fixedly connected with an outer ring of the R-axis harmonic reducer, the elbow shaft is fixed at the tail end of the large arm shell, and the large arm driven wheel is rotatably arranged on the elbow shaft and is connected with the large arm driving wheel through the large arm synchronous belt; the large arm driven wheel is fixedly connected with the small arm shell.
The small arm driving mechanism comprises a small arm driving wheel, a small arm driven wheel and a small arm synchronous belt, wherein the small arm driving wheel is fixed on the elbow shaft, the small arm driven wheel is rotatably arranged at the tail end of the small arm shell and is connected with the small arm driving wheel through the small arm synchronous belt, and the wafer box tray is fixedly connected with the small arm driven wheel.
The small arm synchronous belt is tensioned through a small arm tensioning wheel arranged in the small arm shell.
The invention has the advantages and beneficial effects that: on the basis of the front-end storage unit of the existing vertical furnace, the storage capacity of the vertical furnace is further increased to improve the processing efficiency, and the number of wafer box storage stations is increased from 18 to 26. Because the layering limit for height of vertical furnace leads to the station list Z axle on upper strata behind the layering can't get and puts, consequently carries out two Z axle designs to the manipulator, and the scheme adopts integral type rack guide rail, and the thickness of the double-deck Z axle of attenuate is to 70mm, makes it can satisfy when wafer box left end extreme position 294.5mm, can get and put to carry out configuration optimization to X axle and R axle.
Drawings
FIG. 1 is an isometric view of a vertical furnace front end storage unit of the present invention;
FIG. 2 is a view showing the arrangement of internal stations of the front-end storage unit of the vertical furnace according to the present invention;
FIG. 3 is an overall top view of the present invention;
FIG. 4 is an isometric view of a three-axis manipulator of the present invention;
FIG. 5 is a front view of a three-axis robot of the present invention;
FIG. 6 is a right side view of FIG. 5;
FIG. 7 is a cross-sectional Z-axis view of a three-axis robot of the present invention;
FIG. 8 is an X-axis isometric view of a three-axis robot of the present invention;
FIG. 9 is an R-axis cross-sectional view of a three-axis robot of the present invention;
FIG. 10 is a top view of the R axis of the three axis robot of the present invention;
fig. 11 is a left and right extreme position diagram of a three-axis manipulator pick-and-place system of the present invention.
In the figure: 1. a vertical furnace body, 2, a three-axis manipulator, 3, a vertical furnace frame, 4, a loading platform, 5, a manipulator Z1 axis, 6, a manipulator Z2 axis, 7, a manipulator X axis, 8, a manipulator R axis, 9, a Z1 axis motor, 10, a Z1 axis reducer, 11, a Z1 axis gear, 12, a Z1 axis rack, 13, a Z1 axis guide rail, 14, a Z1 axis and a Z2 axis adapter flange plate, 15, a Z2 axis motor, 16, a Z2 axis reducer, 17, a Z2 axis gear, 18, a Z2 axis rack, 19, a Z2 axis guide rail, 20, a Z2 axis and an X axis adapter flange plate, 21, a drag chain, 22, an X axis motor, 23, an X axis flange plate, 24, an X axis and R axis adapter flange, 25, an X axis frame, 26, an X axis guide rail, 27, an X axis fixing block, 28, an X axis frame, 29, an X axis motor, a drag chain, a harmonic wave motor, a drag chain housing, a drag arm housing, a harmonic wave motor, 33. big arm driving wheel, 34, big arm upper cover, 35, big arm synchronous belt, 36, elbow shaft, 37, big arm driven wheel, 38, forearm casing, 39, forearm driving wheel, 40, forearm driven wheel, 41, wafer box tray, 42, forearm tensioning wheel, 43, forearm synchronous belt, 44, wafer box, 45, wafer box storage station, 46, FIMS (vertical furnace main body and front end module butt joint box opening module), 50 is the manipulator backplate.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in detail with reference to the accompanying drawings and specific embodiments.
As shown in fig. 1-3, the vertical furnace front-end storage unit provided by the invention comprises a vertical furnace main body 1, a three-axis manipulator 2, a vertical furnace frame 3 and a loading and unloading platform 4, wherein the three-axis manipulator 2 and the vertical furnace frame 3 are arranged in the vertical furnace main body 1, and a multilayer wafer cassette storage station 45 is arranged on the vertical furnace frame 3 along the height direction; the loading and unloading platform 4 is arranged on one side of the vertical furnace main body 1 and is used for loading and unloading the wafer box; the three-axis robot 2 is used to transfer the wafer cassettes between the wafer cassette storage station 45 and the load-and-unload table 4.
As shown in fig. 4-6, the three-axis robot 2 includes a Z-axis robot, an X-axis robot 7, and an R-axis robot 8, which are connected in sequence, wherein the Z-axis robot has a two-axis structure and includes a Z1-axis robot 5 and a Z2-axis robot 6, the Z1-axis robot 5 and the Z2-axis robot 6 are movable relative to each other along the Z-axis direction, and the Z2-axis robot 6 is connected to the X-axis robot 7.
As shown in fig. 7, the Z1 axis 5 of the manipulator includes a Z1 axis motor 9, a Z1 axis reducer 10, a Z1 axis gear 11, a Z1 axis rack 12, a Z1 axis guide rail 13, a Z1 axis and Z2 axis adapter flange plate 14 and a manipulator back plate 50, wherein the Z1 axis guide rail 13 is disposed on the manipulator back plate 50, the Z1 axis and Z2 axis adapter flange plate 14 are slidably connected with the Z1 axis guide rail 13, and the Z1 axis rack 12 is disposed on the Z1 axis guide rail 13; the Z1 shaft speed reducer 10 is installed on a Z1 shaft and Z2 shaft rotating flange plate 14, an input shaft is connected with a Z1 shaft motor 9, an output shaft of the Z1 shaft speed reducer 10 is connected with a Z1 shaft gear 11, and the Z1 shaft gear 11 is meshed with a Z1 shaft rack 12.
The Z1 shaft motor 9 drives the Z1 shaft gear 11 to rotate through the Z1 shaft speed reducer 10, and the Z1 shaft gear 11 is meshed with the Z1 shaft rack 12, so the Z1 shaft gear 11 rolls along the Z1 shaft rack 12, and the Z1 shaft and the Z2 shaft adapter flange plate 14 are driven to move up and down along the Z1 shaft guide rail 13.
In the embodiment of the invention, the Z1 shaft rack 12 and the Z1 shaft guide rail 13 are of an integral structure.
As shown in fig. 7, the Z2 shaft 6 of the manipulator includes a Z2 shaft motor 15, a Z2 shaft reducer 16, a Z2 shaft gear 17, a Z2 shaft rack 18, a Z2 shaft guide rail 19, a Z2 shaft and an X shaft adapter flange plate 20, wherein the Z2 shaft guide rail 19 is disposed on the Z1 shaft and Z2 shaft adapter flange plate 14, the Z2 shaft and X shaft adapter flange plate 20 are slidably connected with the Z2 shaft guide rail 19, and the Z2 shaft rack 18 is disposed on the Z2 shaft guide rail 19; the Z2 shaft speed reducer 16 is arranged on the Z2 shaft and the X shaft rotating flange plate 20, the input shaft is connected with the Z2 shaft motor 15, the output shaft of the Z2 shaft speed reducer 16 is connected with the Z2 shaft gear 17, and the Z2 shaft gear 17 is meshed with the Z2 shaft rack 18.
The Z2 shaft motor 15 drives the Z2 shaft gear 17 to rotate through the Z2 shaft speed reducer 16, the Z2 shaft gear 17 is meshed with the Z2 shaft rack 18, so the Z2 shaft gear 17 rolls along the Z2 shaft rack 18, the Z2 shaft gear 17 drives the Z2 shaft and the X shaft adapter flange plate 20 to move up and down along the Z2 shaft guide rail 19, and further drives the X shaft 7 and the R shaft 8 of the manipulator to move up and down.
In the embodiment of the invention, the Z2 shaft rack 18 and the Z2 shaft guide rail 19 are of an integral structure.
As shown in fig. 8, the X-axis 7 of the manipulator includes an X-axis driving mechanism, an X-axis flange plate 23, an X-axis and R-axis adapter flange 24, an X-axis frame 25 and an X-axis guide rail 26, wherein the X-axis frame 25 is connected to the Z2 axis 6 of the manipulator through the X-axis flange plate 23, the X-axis guide rail 26 is disposed on the X-axis frame 25, and the X-axis and R-axis adapter flanges 24 are slidably connected to the X-axis guide rail 26;
the X-axis driving mechanism is disposed in the X-axis frame 25 and connected to the X-axis and R-axis adapter flanges 24, and the X-axis and R-axis adapter flanges 24 are moved on the X-axis guide rails 26 by driving of the X-axis driving mechanism.
The X-axis driving mechanism comprises an X-axis motor 22, X-axis belt wheels 27, synchronous belts and X-axis belt wheel fixing blocks 28, wherein the synchronous belts are supported by the two X-axis belt wheels 27, the X-axis belt wheels 27 are arranged in the X-axis frame 25 through the X-axis belt wheel fixing blocks 28, and one X-axis belt wheel 27 is arranged on an output shaft of the X-axis motor 22; the synchronous belt is connected with the X-axis and R-axis adapter flanges 24.
The X-axis motor 22 drives the synchronous belt to rotate, and the synchronous belt is connected with the X-axis and R-axis adapter flanges 24, so that the X-axis and R-axis adapter flanges 24 are driven to move along the X-axis guide rail 26, and the R-axis 8 of the manipulator is driven to move along the X-axis.
As shown in fig. 9-10, the R-axis robot 8 includes an R-axis motor 30, an R-axis harmonic reducer 31, a large arm housing 32, a large arm driving mechanism, a small arm housing 38, a small arm driving mechanism, and a wafer cassette tray 41; the R-axis harmonic reducer 31 is arranged on the X-axis 7 of the manipulator, an input shaft is connected with an output shaft of the R-axis motor 30, an output shaft flange of the R-axis harmonic reducer 31 is fixedly connected with the large arm shell 32, and the R-axis harmonic reducer 31 drives the large arm shell 32 to rotate; one end of the small arm shell 38 is rotatably connected with the tail end of the large arm shell 32, and the other end is rotatably provided with a wafer box tray 41; the large arm driving mechanism is arranged in the large arm shell 32 and connected with the small arm shell 38, and the large arm driving mechanism is used for driving the small arm shell 38 to rotate relative to the large arm shell 32; the small arm driving mechanism is arranged in the small arm shell 38 and is connected with the wafer box tray 41; the arm drive mechanism is used to drive the wafer cassette tray 41 to rotate relative to the arm housing 38.
The big arm driving mechanism comprises a big arm driving wheel 33, a big arm synchronous belt 35, an elbow shaft 36 and a big arm driven wheel 37, wherein the big arm driving wheel 33 is fixedly connected with the outer ring of the R-axis harmonic reducer 31, the elbow shaft 36 is fixed at the tail end of the big arm shell 32, and the big arm driven wheel 37 is rotatably arranged on the elbow shaft 36 and is connected with the big arm driving wheel 33 through the big arm synchronous belt 35; the large arm driven wheel 37 is fixedly connected with the small arm housing 38.
The small arm driving mechanism comprises a small arm driving wheel 39, a small arm driven wheel 40 and a small arm synchronous belt 43, wherein the small arm driving wheel 39 is fixed on the toggle shaft 36, the small arm driven wheel 40 is rotatably arranged at the tail end of the small arm shell 38 and is connected with the small arm driving wheel 39 through the small arm synchronous belt 43, and the wafer box tray 41 is fixedly connected with the small arm driven wheel 40. The arm timing belt 43 is tensioned by an arm tensioning pulley 42 provided in the arm case 38.
The working principle of the mechanical arm R shaft 8 is as follows:
the R-axis motor 30 is coaxial with the R-axis harmonic speed reducer 31, the outer ring of the R-axis harmonic speed reducer 31 is fixedly connected with the large arm belt pulley 33, the speed reducer output flange is fixedly connected with the large arm upper cover 34 through a shoulder shaft, the large arm upper cover 34 is fixedly connected with the large arm shell 32, and relative movement of the large arm and the large arm driving wheel 33 is realized; the large arm driving wheel 33 is connected with a large arm driven wheel 37 through a synchronous belt 35, the large arm driven wheel 37 and a small arm driving wheel 39 are arranged on an elbow shaft 36, and the large arm driven wheel 37 can rotate; the large arm shell 32 is fixedly connected with an elbow shaft 36, the elbow shaft 36 is fixedly connected with a small arm driving wheel 39, and the small arm shell 38 is fixedly connected with a large arm driven wheel 37, so that small arm movement is realized; the small arm driving wheel 39 is connected with the small arm driven wheel 40 through a small arm synchronous belt 43, and further drives the wafer box tray 41 to move; because the length of the big arm and the small arm in the structure is consistent, the reciprocating linear motion of the R axis is realized.
In the embodiment of the invention, 26 wafer box storage stations 45 are arranged on a vertical furnace frame 3, a manipulator back plate 50 is arranged on the vertical furnace frame 3, the height of a manipulator Z1 shaft 5 is within 2.8m, and the thickness of the manipulator Z shaft is 70mm, so that the manipulator can be taken and placed when the wafer box left end limit position is 294.5mm, namely the left end limit position value meets the design standard of SEMI E15.1. As shown in fig. 3, the loading/unloading platform 4 transports the wafer box 44 outside the vertical furnace to the inside of the vertical furnace through the electric sliding table structure, and the three-axis robot 2 transports the wafer box 44 to each wafer box storage station 45 for storage.
The working principle of the invention is as follows:
as shown in fig. 11, an operator or an OHT (overhead traveling crane) puts a wafer cassette into a Load Port (Load-out platform) Load-out position, transports the wafer cassette into the vertical furnace through an electric slide table, i.e., loads the wafer cassette into the position, moves the three-axis robot 2 into the Load Port Load-in position, and then sends the wafer cassette to a station in the vertical furnace for storage, and resets the three-axis robot 2, which is a pick-and-place operation cycle of the three-axis robot 2. When the rear-end vertical diffusion furnace needs oxidation work, the wafer box on the station is taken out by the three-axis manipulator 2 and is sent to the FIMS (butt joint box opening module of the vertical furnace main body and the front-end module) for box opening, the wafer in the wafer box is sent to the Boat by the manipulator on one side of the vertical oxidation furnace, and the oxidation process operation is carried out. When the oxidation process is finished, the mechanical arm on one side of the vertical oxidation furnace sends the wafer back to the wafer box, the FIMS closes the box, the three-axis mechanical arm 2 takes the wafer box away for storage, then the wafer box is transported to the Load Port for loading, the Load Port carries out loading and unloading actions, and an OHT (overhead traveling crane) takes the wafer box which is loaded away.
The invention increases the storage capacity of the vertical furnace and improves the processing efficiency. Carry out two Z axle designs to the manipulator, the scheme adopts integral type rack guide rail, and the thickness of the double-deck Z axle of attenuate reaches 70mm, makes it can satisfy when wafer box left end extreme position 294.5mm, can get and put to carry out configuration optimization to X axle and R axle.
The above description is only an embodiment of the present invention, and is not intended to limit the scope of the present invention. Any modification, equivalent replacement, improvement, extension, etc. made within the spirit and principle of the present invention are included in the protection scope of the present invention.
Claims (10)
1. A vertical furnace front-end storage unit is characterized by comprising a vertical furnace main body (1), a three-axis manipulator (2), a vertical furnace frame (3) and a loading and unloading platform (4), wherein the three-axis manipulator (2) and the vertical furnace frame (3) are arranged in the vertical furnace main body (1), and a multilayer wafer box storage station (45) is arranged on the vertical furnace frame (3) along the height direction; the loading and unloading platform (4) is arranged on one side of the vertical furnace main body (1) and is used for loading and unloading the wafer box; the three-axis manipulator (2) is used for conveying the wafer boxes between the wafer box storage station (45) and the loading and unloading platform (4).
2. The vertical furnace front end storage unit according to claim 1, wherein the three-axis robot (2) comprises a robot Z-axis, a robot X-axis (7) and a robot R-axis (8) which are connected in sequence, wherein the robot Z-axis comprises a robot Z1-axis (5) and a robot Z2-axis (6), the robot Z1-axis (5) and the robot Z2-axis (6) are relatively movable in the Z-axis direction, and the robot Z2-axis (6) is connected with the robot X-axis (7).
3. The vertical furnace front end storage unit according to claim 2, wherein the manipulator Z1 shaft (5) comprises a Z1 shaft motor (9), a Z1 shaft speed reducer (10), a Z1 shaft gear (11), a Z1 shaft rack (12), a Z1 shaft guide rail (13), a Z1 shaft and Z2 shaft adapter flange plate (14) and a manipulator back plate (50), wherein the Z1 shaft guide rail (13) is arranged on the manipulator back plate (50), the Z1 shaft and Z2 shaft adapter flange plate (14) are in sliding connection with the Z1 shaft guide rail (13), and the Z1 shaft rack (12) is arranged on the Z1 shaft guide rail (13);
the Z1 shaft speed reducer (10) is installed on a Z1 shaft and Z2 shaft rotating flange plate (14), an input shaft is connected with a Z1 shaft motor (9), an output shaft of the Z1 shaft speed reducer (10) is connected with a Z1 shaft gear (11), and the Z1 shaft gear (11) is meshed with the Z1 shaft rack (12).
4. The vertical furnace front end storage unit according to claim 3, wherein the manipulator Z2 shaft (6) comprises a Z2 shaft motor (15), a Z2 shaft reducer (16), a Z2 shaft gear (17), a Z2 shaft rack (18), a Z2 shaft guide rail (19), a Z2 shaft and X shaft transfer flange plate (20), wherein the Z2 shaft guide rail (19) is arranged on the Z1 shaft and Z2 shaft transfer flange plate (14), the Z2 shaft and X shaft transfer flange plate (20) are in sliding connection with the Z2 shaft guide rail (19), and the Z2 shaft rack (18) is arranged on the Z2 shaft guide rail (19);
the Z2 shaft speed reducer (16) is arranged on the Z2 shaft and the X shaft rotating flange plate (20), an input shaft is connected with the Z2 shaft motor (15), an output shaft of the Z2 shaft speed reducer (16) is connected with the Z2 shaft gear (17), and the Z2 shaft gear (17) is meshed with the Z2 shaft rack (18).
5. The vertical furnace front end storage unit according to claim 2, characterized in that the manipulator X-axis (7) comprises an X-axis driving mechanism, an X-axis flange plate (23), an X-axis adapter flange (24) and an R-axis adapter flange (24), an X-axis frame (25) and an X-axis guide rail (26), wherein the X-axis frame (25) is connected with the manipulator Z2 axis (6) through the X-axis flange plate (23), the X-axis guide rail (26) is arranged on the X-axis frame (25), and the X-axis adapter flange (24) and the R-axis adapter flange (24) are in sliding connection with the X-axis guide rail (26);
the X-axis driving mechanism is arranged in the X-axis frame (25) and is connected with the X-axis and R-axis adapter flanges (24), and the X-axis and R-axis adapter flanges (24) move on the X-axis guide rail (26) through the driving of the X-axis driving mechanism.
6. The vertical furnace front end storage unit according to claim 5, wherein the X-axis driving mechanism comprises an X-axis motor (22), an X-axis pulley (27), a synchronous belt and an X-axis pulley fixing block (28), wherein the synchronous belt is supported by two X-axis pulleys (27), the X-axis pulley (27) is arranged in the X-axis frame (25) through the X-axis pulley fixing block (28), and one X-axis pulley (27) is arranged on an output shaft of the X-axis motor (22); the synchronous belt is connected with the X-axis and R-axis rotating flanges (24).
7. The vertical furnace front end storage unit according to claim 2, wherein the robot R-axis (8) comprises an R-axis motor (30), an R-axis harmonic reducer (31), a large arm housing (32), a large arm drive mechanism, a small arm housing (38), a small arm drive mechanism, and a wafer cassette tray (41);
the R-axis harmonic reducer (31) is arranged on the X-axis (7) of the manipulator, an input shaft of the R-axis harmonic reducer is connected with an output shaft of the R-axis motor (30), an output shaft flange of the R-axis harmonic reducer (31) is fixedly connected with a large arm shell (32), and the R-axis harmonic reducer (31) drives the large arm shell (32) to rotate;
one end of the small arm shell (38) is rotatably connected with the tail end of the large arm shell (32), and the other end of the small arm shell is rotatably provided with a wafer box tray (41);
the large arm driving mechanism is arranged in the large arm shell (32) and is connected with the small arm shell (38), and the large arm driving mechanism is used for driving the small arm shell (38) to rotate relative to the large arm shell (32);
the small arm driving mechanism is arranged in the small arm shell (38) and is connected with the wafer box tray (41); the small arm driving mechanism is used for driving the wafer box tray (41) to rotate relative to the small arm shell (38).
8. The vertical furnace front end storage unit according to claim 7, wherein the big arm driving mechanism comprises a big arm driving wheel (33), a big arm synchronous belt (35), an elbow shaft (36) and a big arm driven wheel (37), wherein the big arm driving wheel (33) is fixedly connected with an outer ring of the R-axis harmonic reducer (31), the elbow shaft (36) is fixed at the tail end of the big arm casing (32), and the big arm driven wheel (37) is rotatably arranged on the elbow shaft (36) and is connected with the big arm driving wheel (33) through the big arm synchronous belt (35); the large arm driven wheel (37) is fixedly connected with the small arm shell (38).
9. The vertical stoker front end storage unit according to claim 8, characterized in that the small arm driving mechanism comprises a small arm driving wheel (39), a small arm driven wheel (40) and a small arm synchronous belt (43), wherein the small arm driving wheel (39) is fixed on the elbow shaft (36), the small arm driven wheel (40) is rotatably arranged at the tail end of the small arm casing (38) and is connected with the small arm driving wheel (39) through the small arm synchronous belt (43), and the wafer cassette tray (41) is fixedly connected with the small arm driven wheel (40).
10. The vertical furnace front end storage unit according to claim 9, wherein the arm timing belt (43) is tensioned by an arm tensioning pulley (42) provided in the arm housing (38).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010111266.9A CN113299578A (en) | 2020-02-24 | 2020-02-24 | Vertical furnace front end storage unit |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010111266.9A CN113299578A (en) | 2020-02-24 | 2020-02-24 | Vertical furnace front end storage unit |
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| CN113299578A true CN113299578A (en) | 2021-08-24 |
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| CN202010111266.9A Pending CN113299578A (en) | 2020-02-24 | 2020-02-24 | Vertical furnace front end storage unit |
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| CN101190524A (en) * | 2006-12-01 | 2008-06-04 | 日本电产三协株式会社 | Arm driving device and robot used for industrial |
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| CN102476383A (en) * | 2010-11-30 | 2012-05-30 | 沈阳新松机器人自动化股份有限公司 | Planar articulated robot arm mechanism |
| KR20120123839A (en) * | 2011-05-02 | 2012-11-12 | 주식회사 로보스타 | Vertical driving apparatus of 2 step sliding |
| CN107186533A (en) * | 2017-04-19 | 2017-09-22 | 中煤科工集团西安研究院有限公司 | Drilling rod conveying robot based on truss |
| CN109787414A (en) * | 2019-03-05 | 2019-05-21 | 英诺维尔智能科技（苏州）有限公司 | A kind of twin-stage Z axis device driven by single servo motor |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101190524A (en) * | 2006-12-01 | 2008-06-04 | 日本电产三协株式会社 | Arm driving device and robot used for industrial |
| CN101256408A (en) * | 2007-02-13 | 2008-09-03 | 东京毅力科创株式会社 | Setting operation support device for substrate processing apparatus, setting operation support method |
| JP2008264980A (en) * | 2007-04-24 | 2008-11-06 | Kawasaki Heavy Ind Ltd | Substrate carrier robot |
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| KR20120123839A (en) * | 2011-05-02 | 2012-11-12 | 주식회사 로보스타 | Vertical driving apparatus of 2 step sliding |
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Effective date of registration: 20231102 Address after: No.15-1 Feiyun Road, Hunnan District, Shenyang City, Liaoning Province, 110169 Applicant after: Shenyang Xinsong Semiconductor Equipment Co.,Ltd. Address before: Hunnan New District Jinhui street in Shenyang of Liaoning province 110168 City No. 16 Applicant before: SHENYANG SIASUN ROBOT & AUTOMATION Co.,Ltd. |