CN113296358A - 黑色感光性树脂组合物、黑矩阵及图像显示装置 - Google Patents
黑色感光性树脂组合物、黑矩阵及图像显示装置 Download PDFInfo
- Publication number
- CN113296358A CN113296358A CN202110193301.0A CN202110193301A CN113296358A CN 113296358 A CN113296358 A CN 113296358A CN 202110193301 A CN202110193301 A CN 202110193301A CN 113296358 A CN113296358 A CN 113296358A
- Authority
- CN
- China
- Prior art keywords
- black
- photosensitive resin
- resin composition
- black photosensitive
- acrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Structural Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Architecture (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020200021838A KR20210106824A (ko) | 2020-02-21 | 2020-02-21 | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 |
KR10-2020-0021838 | 2020-02-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN113296358A true CN113296358A (zh) | 2021-08-24 |
Family
ID=77318964
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202110193301.0A Pending CN113296358A (zh) | 2020-02-21 | 2021-02-20 | 黑色感光性树脂组合物、黑矩阵及图像显示装置 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR20210106824A (ko) |
CN (1) | CN113296358A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024092524A1 (en) * | 2022-11-01 | 2024-05-10 | Materion Precision Optics (Shanghai) Limited | Black adhesion film for lidar cover window structure |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0844049A (ja) * | 1994-08-01 | 1996-02-16 | Sekisui Chem Co Ltd | 着色レジスト膜 |
WO2013027936A2 (ko) * | 2011-08-22 | 2013-02-28 | 성균관대학교 산학협력단 | 흑색 감광성 수지 조성물 및 이를 구비한 화상표시장치 |
WO2014208348A1 (ja) * | 2013-06-24 | 2014-12-31 | 東レ株式会社 | タッチパネル用黒色樹脂組成物 |
CN107526249A (zh) * | 2016-06-15 | 2017-12-29 | 山阳色素株式会社 | 黑色颜料组合物和含有其的黑色涂膜形成组合物 |
KR20180086132A (ko) * | 2017-01-20 | 2018-07-30 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 사용하여 제조된 블랙 매트릭스, 컬럼 스페이서 또는 블랙 컬럼 스페이서를 포함하는 컬러필터, 및 상기 컬러필터를 포함하는 표시장치 |
CN109765756A (zh) * | 2017-11-09 | 2019-05-17 | 东友精细化工有限公司 | 着色感光性树脂组合物、滤色器以及显示装置 |
KR20190053131A (ko) * | 2017-11-09 | 2019-05-17 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 이용하여 제조되는 컬러필터 및 상기 컬러필터를 포함하는 표시장치 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150062889A (ko) | 2013-11-29 | 2015-06-08 | 주식회사 엘지화학 | 블랙 컬럼 스페이서용 감광성 수지 조성물 |
-
2020
- 2020-02-21 KR KR1020200021838A patent/KR20210106824A/ko not_active Application Discontinuation
-
2021
- 2021-02-20 CN CN202110193301.0A patent/CN113296358A/zh active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0844049A (ja) * | 1994-08-01 | 1996-02-16 | Sekisui Chem Co Ltd | 着色レジスト膜 |
WO2013027936A2 (ko) * | 2011-08-22 | 2013-02-28 | 성균관대학교 산학협력단 | 흑색 감광성 수지 조성물 및 이를 구비한 화상표시장치 |
WO2014208348A1 (ja) * | 2013-06-24 | 2014-12-31 | 東レ株式会社 | タッチパネル用黒色樹脂組成物 |
CN107526249A (zh) * | 2016-06-15 | 2017-12-29 | 山阳色素株式会社 | 黑色颜料组合物和含有其的黑色涂膜形成组合物 |
KR20180086132A (ko) * | 2017-01-20 | 2018-07-30 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 사용하여 제조된 블랙 매트릭스, 컬럼 스페이서 또는 블랙 컬럼 스페이서를 포함하는 컬러필터, 및 상기 컬러필터를 포함하는 표시장치 |
CN109765756A (zh) * | 2017-11-09 | 2019-05-17 | 东友精细化工有限公司 | 着色感光性树脂组合物、滤色器以及显示装置 |
KR20190053131A (ko) * | 2017-11-09 | 2019-05-17 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 이용하여 제조되는 컬러필터 및 상기 컬러필터를 포함하는 표시장치 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024092524A1 (en) * | 2022-11-01 | 2024-05-10 | Materion Precision Optics (Shanghai) Limited | Black adhesion film for lidar cover window structure |
Also Published As
Publication number | Publication date |
---|---|
KR20210106824A (ko) | 2021-08-31 |
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