CN113292250B - High-performance transparent electromagnetic protection material and preparation method thereof - Google Patents
High-performance transparent electromagnetic protection material and preparation method thereof Download PDFInfo
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- CN113292250B CN113292250B CN202110605513.5A CN202110605513A CN113292250B CN 113292250 B CN113292250 B CN 113292250B CN 202110605513 A CN202110605513 A CN 202110605513A CN 113292250 B CN113292250 B CN 113292250B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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- H05K9/0007—Casings
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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Abstract
The invention provides a high-performance transparent electromagnetic protection material and a preparation method thereof, and is characterized in that: the electromagnetic protection material comprises a glass substrate, a first functional film group, a second functional film group and a third functional film group which are sequentially arranged on the glass substrate, wherein a top protection layer is plated on the surface of the third functional film group.
Description
Technical Field
The invention belongs to the field of inorganic nonmetal electromagnetic protection materials, and particularly relates to a high-performance transparent electromagnetic protection material and a preparation method thereof.
Background
With the progress of science and technology, the application of computers, networks and the like is spread in various industries, and electromagnetic waves also affect the living environment and living space of people while bringing great abundance and convenience to the life of people. The electromagnetic environment in which we are located is increasingly complex, at present, the higher the integration level of information equipment, the higher the electromagnetic sensitivity and vulnerability of a circuit system, and the more important the electromagnetic protection, the electromagnetic protection material not only needs to effectively protect electronic devices, but also needs to provide effective protection for people in the electromagnetic environment. In the conventional non-visible field, electromagnetic waves are shielded or enclosed in a local space by a metal plate or an equipment shell and the like, so that electromagnetic interference or electromagnetic leakage can be effectively prevented. However, in the fields of instrument panels, electronic touch screens, optoelectronic devices, modern wearable electronics, computer security, navigation guidance and the like, the transparent electromagnetic shielding material needs to have visible and even high light transmission requirements while effectively protecting, and thus, the transparent electromagnetic shielding material has a wide application prospect.
The comprehensive performance of the existing transparent electromagnetic protection material needs to be improved, and the transparent electromagnetic protection material at the visible window part with high shielding efficiency, high visible light transmittance, high image definition and the like is particularly needed. Generally speaking, high conductivity, high electromagnetic shielding efficiency and high light transmittance are contradictory, that is, the shielding efficiency is improved by ensuring the material with good conductivity and large thickness, but this usually sacrifices the light transmittance of the material due to the reflection, absorption, scattering and other mechanisms of light. Therefore, how to significantly improve the electrical conductivity and the electromagnetic shielding effectiveness of the material under the condition that the material keeps the thickness of a thin film layer or has higher light transmittance, and realize the unification of high light transmittance and high shielding effectiveness becomes a main problem in the development of the materials.
Disclosure of Invention
In view of this, the present invention is directed to provide a high-performance transparent electromagnetic shielding material and a method for manufacturing the same, wherein the high-performance transparent electromagnetic shielding material is configured to have an alternating refractive index structure with low/high/low refractive indexes, and a film layer with an intermediate refractive index is inserted between two different media with low refractive index and high refractive index to form a progressive structure with low/medium/high refractive index, so that high conductivity and high electromagnetic shielding performance can be maintained through multi-layer anti-reflection under the condition that the thickness of the film layer is relatively thin or the material keeps relatively high light transmittance.
In order to achieve the purpose, the technical scheme of the invention is realized as follows:
the utility model provides a transparent electromagnetic protection material of high performance, electromagnetic protection material includes the glass substrate to and set gradually first functional film group, second functional film group, third functional film group on the glass substrate, the system top protective layer of plating on the surface of third functional film group.
Preferably, the first functional film group, the second functional film group and the third functional film group respectively comprise an optical medium layer lower layer, a conductive ceramic shielding layer and an optical medium layer upper layer.
Preferably, the optical medium layer is one or more of a metal oxide layer or a nitride ceramic layer; the conductive ceramic shielding layer is one or more of a metal oxide layer or a nitride ceramic layer.
Preferably, the materials of the upper layer of the optical medium layer and the lower layer of the optical medium layer are one or more of TiOx, siOx, siAlNx, nbOx, znAlOx and ZnSnOx, and the thicknesses of the materials are 5-160nm;
preferably, the material of the upper layer of the optical medium layer of the third functional module is SiOx, the thickness is 50-130nm, the materials of the upper layer and the lower layer of the optical medium layer of the first functional film group, the upper layer and the lower layer of the optical medium layer of the second functional film group, and the material of the lower layer of the optical medium layer of the third functional film group are preferably one or more of SiAlNx, znAlOx, tiOx, and NbOx, and the thickness is preferably 5 nm-50 nm.
Preferably, the conductive ceramic shielding layer is made of one or two of SnFOx and InSnOx, and the thickness of the conductive ceramic shielding layer is 70-180nm;
preferably, the material of the conductive ceramic shielding layer is InSnOx, the thickness of the conductive ceramic shielding layer is 90nm-130nm, and the ratio of Sn: the proportion of In is 5-15:85-95;
more preferably, sn: the In proportion is 12:88.
preferably, the top protective layer is made of one or more of SiNx, siAlNx, crNx, niCrNx, niCrOx, tiOx and ZrOx, and the thickness of the top protective layer is 5 nm-50 nm;
preferably, the material of the top protective layer is one or two of TiOx and ZrOx, and the thickness is 10nm-30nm.
The purpose of the top protective layer is to isolate O in air 2 Water, SO 2 Oxidation or erosion of the film layer, etc.
Preferably, the glass substrate is K9 glass.
Preferably, the visible light transmittance of the electromagnetic protection material is more than or equal to 90 percent; the resistance of the film layer surface is less than or equal to 5 omega/□; the electromagnetic shielding efficiency of the wide band of 100MHz-14GHz is-30 dB to-35 dB.
The second purpose of the invention is to provide a preparation method of a high-performance transparent electromagnetic protection material, which comprises the following steps:
(1) Cleaning a substrate: cleaning the K9 glass with deionized water, and drying to remove adsorbed water on the surface of the base material;
(2) Vacuumizing: firstly, adjusting the vacuum degree of a coating chamber to 1*E-7mbar; in the plating process, the vacuum degree of the film plating chamber is about 1*E-4 mbar. Plating ofIn the manufacturing process, sputtering gas Ar andor reaction gas O is filled in the film coating chamber 2 Or N 2 Maintaining the vacuum degree at 1*E-4mbar;
(3) Coating a film layer: and (3) conveying the clean K9 glass substrate into a coating chamber, and sequentially plating a first functional film group, a second functional film group and a third functional film combined top protective layer by magnetron sputtering. When each layer is plated, gas is filled into each film plating chamber, the gas proportion and the gas pressure are adjusted to be proper, and then the film plating is carried out;
(4) High-temperature heat treatment: after the film is coated, introducing O into a heat treatment furnace 2 Increasing oxygen partial pressure to 20% -40%, heating the film layer from room temperature to 400-500 ℃ at a speed of 50-60 ℃/min at a slow speed, heating to 700-800 ℃ at a speed of 120-150 ℃/min at a fast speed, then preserving heat for 80-120 seconds, and naturally cooling or cooling by blowing to room temperature;
(5) The K9 glass can be subjected to size division before cleaning of the substrate, and also can be subjected to size division before high-temperature heat treatment after the film coating is finished.
The third purpose of the invention is to provide the application of the high-performance transparent electromagnetic protection material in an electromagnetic shielding transparent protection cover, an armored vehicle, a military transportation vehicle, a glass window of an electromagnetic security room, a window of electronic/electromagnetic instrument equipment or a touch screen.
The principle of the invention is as follows: the invention realizes the maintenance of high conductivity and high electromagnetic shielding efficiency under the condition that the material keeps the thickness of a thin film layer or higher light transmittance through multi-layer anti-reflection, the structure is set to be a refractive index low/high/low alternating structure, and a film layer with middle refractive index is inserted between two different media with low refractive index and high refractive index, so that a progressive structure with low/medium/high refractive index is formed.
The ITO refractive index belongs to a film layer with a larger refractive index in the conductive film, the conductivity is good, and the visible light transmittance is higher under the same conductivity. In the invention, ITO not only serves as a shielding function film, but also has an anti-reflection function. The multilayer ITO film selected from the composite film can form a low/high/low refractive index alternating structure by matching with a multilayer dielectric film. Meanwhile, the adjacent dielectric films adopt different material designs to form refractive index change buffer, such as L3/L4 and L6/L7, so that the refractive index change gradient is reduced, the anti-reflection effect is better, and the composite electromagnetic shielding film with higher transmittance is obtained.
Ag has very good conductivity, but the refractive index of the Ag metal film is very small, so that the reflectivity of the film layer is high, and the transmittance of the Ag film is reduced to be within 10 percent when the Ag film exceeds 15nm, even the Ag film is completely opaque. Even if the antireflection film is designed on both sides of the Ag layer in the composite layer, the transmittance of the composite film is about 70% when the surface resistance is as low as about 5 omega/□. Meanwhile, ag has strong oxidation activity, and the oxidation resistance and high-temperature thermal stability of the silver-containing electromagnetic shielding film at normal temperature are further improved, so the ITO conductive layer is selected and the ZrOx protective layer is added. In order to further improve the conductivity of the film layer, the ratio of Sn is adjusted in ITO to cause lattice distortion of InSnOx, and the change of oxygen partial pressure also changes the ratio of oxygen holes in InSnOx, namely the carrier concentration changes, thereby changing the conductivity and the shielding effect of the shielding functional layer.
After high-temperature heat treatment, each layer in the shielding film is fully oxidized and ceramized, so that the film layer after high-temperature oxygen-enriched sintering has excellent hardness, toughness and stability, and meets various use environments, even severe environments such as high temperature, high humidity and the like.
Compared with the prior art, the invention has the beneficial effects that:
1. according to the high-performance transparent electromagnetic protection material, each functional film group is a metal oxide or nitride ceramic layer, and the high-performance transparent electromagnetic protection material does not contain a metal layer, and has good acid and alkali resistance, wear resistance and oxidation resistance. The coating has high transmittance, high conductivity, high electromagnetic shielding property, excellent stability and environmental adaptability;
2. the high-performance transparent electromagnetic protection material is arranged into a refractive index low/high/low alternating structure, a film layer with a middle refractive index is inserted between two layers of different media with low refractive index and high refractive index to form a progressive structure with low/medium/high refractive index, and high conductivity and high electromagnetic shielding efficiency are maintained under the condition that the thickness of the material is kept to be thinner or the light transmittance is higher through multiple layers of antireflection;
3. according to the high-performance transparent electromagnetic protection material, the ITO conductive layer is selected, the ratio of Sn is adjusted in the ITO, lattice distortion of InSnOx is caused by the change of the ratio of Sn, and the ratio of oxygen holes in the InSnOx is changed by the change of oxygen partial pressure, so that the conductivity and the electromagnetic shielding efficiency of the shielding functional layer are changed;
4. the ZrOx top protective layer is added into the film layer of the high-performance transparent electromagnetic protection material, so that the overall chemical stability and environmental adaptability of the electromagnetic protection material are improved. After high-temperature heat treatment, the film layer is slowly (50-60 ℃/min) heated to 400-500 ℃ from room temperature, quickly (120-150 ℃/min) heated to 700-800 ℃, and kept for 80-120 seconds, and all layers in the shielding film are fully oxidized and ceramized, so that the film layer has excellent hardness, toughness and stability after high-temperature oxygen-enriched sintering so as to meet various use environments;
5. compared with the common soda-lime-silica glass, the K9 glass of the high-performance transparent electromagnetic protection material has higher hardness, toughness and stability, is suitable for a more severe use environment, and is mostly applied to military equipment, windows and the like;
6. the high-performance transparent electromagnetic protection material is applied to an electromagnetic shielding transparent protection cover, an armored vehicle, an military transportation vehicle, a glass window of an electromagnetic security room, a window of electronic/electromagnetic equipment or a touch screen.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate an embodiment of the invention and, together with the description, serve to explain the invention and not to limit the invention. In the drawings:
fig. 1 is a schematic diagram of a simple structure of a high-performance transparent electromagnetic shielding material according to an embodiment of the invention.
Description of reference numerals:
l1 — a first optical medium layer; l2-a first conductive ceramic layer; l3-a second optical medium layer; l4-a third optical medium layer; l5-a second conductive ceramic layer; l6-a fourth optical medium layer; l7-a fifth optical medium layer; l8-a third conductive ceramic layer; l9-a sixth optical medium layer; l10-top protective layer;
FG 1-first functional membrane group; FG 2-second functional film group; FG 3-third functional membrane group.
Detailed Description
In order to better illustrate the present invention and facilitate the understanding of the technical solutions of the present invention, the following embodiments are merely simple examples of the present invention and do not represent or limit the scope of the present invention, which is defined by the claims.
The present invention will be described in detail below with reference to the embodiments with reference to the attached drawings.
As shown in fig. 1, the electromagnetic protection material includes a glass substrate, and a first functional film group, a second functional film group, and a third functional film group disposed on the glass substrate, wherein a top protection layer is plated on a surface of the third functional film group.
The preparation method comprises the following steps: sequentially sputtering a first optical medium layer, a first conductive ceramic layer, a second optical medium layer, a third optical medium layer, a second conductive ceramic layer, a fourth optical medium layer, a fifth optical medium layer, a third conductive ceramic layer, a sixth optical medium layer and a top protective layer on a glass substrate by using a high-vacuum magnetron sputtering device; after the film layer is prefabricated, introducing O into a heat treatment furnace 2 Increasing oxygen partial pressure to 30%, heating the film layer from room temperature to 500 deg.C at slow speed (50-60 deg.C/min), heating to 800 deg.C at fast speed (120-150 deg.C/min), maintaining for 100 s, and naturally cooling or air-blowing cooling to room temperature.
Examples 1 to 4
The embodiment provides a high-performance transparent electromagnetic protection material and a preparation method thereof, wherein the high-performance transparent electromagnetic protection material comprises the following components in sequence from a glass substrate to the outside: the optical module comprises a first optical medium layer, a first conductive ceramic layer, a second optical medium layer, a third optical medium layer, a second conductive ceramic layer, a fourth optical medium layer, a fifth optical medium layer, a third conductive ceramic layer, a sixth optical medium layer and a top protective layer.
The preparation method comprises the following steps:
(1) Cleaning a substrate: cleaning the K9 glass with deionized water, and drying to remove adsorbed water on the surface of the base material;
(2) Vacuumizing: firstly, adjusting the vacuum degree of a coating chamber to 1*E-7mbar; in the plating process, the vacuum degree of the film plating chamber is 1*E-4mbar;
(3) Sequentially sputtering a first optical medium layer, a first conductive ceramic layer, a second optical medium layer, a third optical medium layer, a second conductive ceramic layer, a fourth optical medium layer, a fifth optical medium layer, a third conductive ceramic layer, a sixth optical medium layer and a top protective layer on a glass substrate by using a high-vacuum magnetron sputtering device; wherein, when each layer is plated, the atmosphere in each film plating chamber is required to be adjusted to a proper gas proportion (detailed in table 1) and a gas pressure (1*E-4 mbar) for film plating;
(4) After the film layer is prefabricated, introducing O into a heat treatment furnace 2 Increasing oxygen partial pressure to 30%, heating the film layer from room temperature to 500 deg.C at slow speed (50-60 deg.C/min), heating to 800 deg.C at fast speed (120-150 deg.C/min), maintaining for 100 s, and naturally cooling or air-blowing cooling to room temperature.
The thicknesses of the respective film layers formed by sputtering in examples 1 to 4 are shown in Table 2.
TABLE 1 Material proportioning and plating process table of each film
Comparative example 1
Comparative example 1 is substantially the same as example 1 except that: the thickness of the conductive ceramic layer was 60nm, which is lower than that in the examples.
Comparative example 2
Comparative example 2 is substantially the same as example 1 except that: the thickness of the optical medium layer is 40nm, which is higher than the thickness in the embodiment; the thickness of L9 was 40nm, which is lower than that in the examples.
Comparative example 3
Comparative example 3 is substantially the same as example 1 except that: the oxygen partial pressure was 20%, which is higher than that in the examples.
Comparative example 4
Comparative example 4 is substantially the same as example 1 except that: the conducting layer is a nano Ag layer.
Table 2 comparative table of film thickness of examples and comparative examples
TABLE 3 optical Property test results
As can be seen from the above examples, the light transmittance of the embodiments 1-4 is 89.9% -92.8%, the surface resistance is within 5 Ω/□, the electromagnetic shielding efficiency is between-30 and-33 db, and both high light transmittance and low surface resistance, high conductivity and high electromagnetic shielding efficiency are realized;
the functional layer ITO of comparative example 1 has the advantages of satisfactory light transmittance, poor surface resistance and low electromagnetic shielding efficiency after being thinned;
in the comparative example 2, under the condition that the functional layer ITO is not changed, the thickness of the optical medium layer is increased, the surface resistance is good, the electromagnetic shielding efficiency can meet the requirement, but the light transmittance can not meet the requirement;
the ITO sputtering of comparative example 3 has a change in oxygen partial pressure, an increase in sheet resistance, and although the transmittance can satisfy the requirement, the electromagnetic shielding efficiency is very low and cannot satisfy the requirement.
Comparative example 4 was a solution of replacing ITO with Ag, and the sheet resistance was good, and the electromagnetic shielding efficiency also met the requirements, but the transmittance decreased significantly, only 72%, and the chemical stability was poor.
Therefore, by adjusting the thickness of the dielectric layer or replacing it with another dielectric layer, the transmittance decreases, and by adjusting the thickness of ITO, the sheet resistance increases and the barrier property deteriorates when the thickness becomes thin, and the transmittance decreases when the thickness becomes thick.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (8)
1. A high-performance transparent electromagnetic protection material is characterized in that: the electromagnetic protection material comprises a glass substrate, a first functional film group, a second functional film group and a third functional film group which are sequentially arranged on the glass substrate, wherein a top protection layer is plated on the surface of the third functional film group;
the first functional film group, the second functional film group and the third functional film group respectively comprise an optical medium layer lower layer, a conductive ceramic shielding layer and an optical medium layer upper layer, and the optical medium layer lower layer, the conductive ceramic shielding layer and the optical medium layer upper layer form a low/medium/high refractive index progressive structure;
the upper layer of the optical medium layer of the third functional module is made of SiOx with the thickness of 50-130nm, the upper layer and the lower layer of the optical medium layer of the first functional module, the upper layer and the lower layer of the optical medium layer of the second functional module and the lower layer of the optical medium layer of the third functional module are made of one or more of SiAlNx, znAlOx, tiOx and NbOx with the thickness of 5nm to 50nm;
the conductive ceramic shielding layer is made of InSnOx, the thickness of the conductive ceramic shielding layer is 90nm-130nm, and the ratio of Sn: the In proportion is 5-15:85-95.
2. The high-performance transparent electromagnetic shielding material according to claim 1, wherein: sn: the In proportion is 12:88.
3. the high-performance transparent electromagnetic shielding material according to claim 1, wherein: the top protective layer is made of one or more of SiNx, siAlNx, crNx, niCrNx, niCrOx, tiOx and ZrOx, and the thickness of the top protective layer is 5nm to 50nm.
4. The high-performance transparent electromagnetic shielding material according to claim 1, wherein: the top protective layer is made of one or two of TiOx and ZrOx, and the thickness of the top protective layer is 10-30 nm.
5. The high-performance transparent electromagnetic shielding material according to claim 1, wherein: the glass substrate is K9 glass.
6. The high-performance transparent electromagnetic shielding material according to claim 1, wherein: the visible light transmittance of the electromagnetic protection material is more than or equal to 90 percent; the film layer resistance is less than or equal to 5 omega/□; the electromagnetic shielding efficiency of the wide band of 100MHz-14GHz is-30 dB to-35 dB.
7. The method for preparing a high-performance transparent electromagnetic shielding material according to any one of claims 1 to 6, wherein: the preparation method comprises the following steps:
(1) Cleaning a substrate: cleaning the K9 glass with deionized water, and drying to remove adsorbed water on the surface of the base material;
(2) Vacuumizing: firstly, the vacuum degree of a coating chamber is adjusted to 1*E-7mbar in advance; in the plating process, sputtering gas Ar and reaction gas O are filled in the film plating chamber 2 Or N 2 Maintaining the vacuum degree at 1*E-4mbar;
(3) Coating a film layer: conveying the clean K9 glass substrate into a film coating chamber, and sequentially coating a first functional film group, a second functional film group, a third functional film group and a top protective layer by magnetron sputtering;
(4) High-temperature heat treatment: after the film is coated, introducing O into a heat treatment furnace 2 Increasing the oxygen partial pressure to 20-40%, and slowly cooling the film layer at the room temperature at the speed of 50-60 ℃/minHeating to 400-500 deg.C, rapidly heating to 700-800 deg.C at a speed of 120-150 deg.C/min, maintaining for 80-120 s, and naturally cooling or air cooling to room temperature.
8. Use of a high performance transparent electromagnetic shielding material according to any one of claims 1 to 6 in an electromagnetically shielded transparent protective cover, an armored vehicle, a military transportation vehicle, a glass window for an electromagnetic security booth, a window for electronic/electromagnetic equipment or a touch screen.
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