CN106830708A - Half-reflection and half-transmission glass with electro-magnetic screen function - Google Patents
Half-reflection and half-transmission glass with electro-magnetic screen function Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 35
- 239000000758 substrate Substances 0.000 claims abstract description 54
- 239000000463 material Substances 0.000 claims abstract description 34
- 239000004020 conductor Substances 0.000 claims abstract description 23
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 6
- JYMITAMFTJDTAE-UHFFFAOYSA-N aluminum zinc oxygen(2-) Chemical compound [O-2].[Al+3].[Zn+2] JYMITAMFTJDTAE-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 6
- 239000011737 fluorine Substances 0.000 claims abstract description 6
- 238000000576 coating method Methods 0.000 claims abstract description 5
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000011248 coating agent Substances 0.000 claims abstract description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 4
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 19
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 10
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 10
- 229910052681 coesite Inorganic materials 0.000 claims description 10
- 229910052906 cristobalite Inorganic materials 0.000 claims description 10
- 239000000377 silicon dioxide Substances 0.000 claims description 10
- 229910052682 stishovite Inorganic materials 0.000 claims description 10
- 229910052905 tridymite Inorganic materials 0.000 claims description 10
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 5
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 5
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 230000000052 comparative effect Effects 0.000 description 15
- 239000012528 membrane Substances 0.000 description 14
- 238000002310 reflectometry Methods 0.000 description 9
- 238000012360 testing method Methods 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001579 optical reflectometry Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Abstract
The invention discloses a kind of half-reflection and half-transmission glass with electro-magnetic screen function, including glass substrate, multilayer dielectric film is provided with glass substrate from the inside to the outside, deielectric-coating carries out arranged in a crossed manner using high refractive index layer and low-index layer；Wherein innermost layer and outermost layer dielectric are high refractive index layer；In except other high refractive index layers of outermost layer dielectric, wherein a certain floor height index layer is made of high refractive index transparent conductive material, specific material is tin indium oxide, zinc oxide aluminum or fluorine doped tin oxide, and refractive index is 1.8 ~ 2.5.The glass is integrated with electromagnetic shielding and half-reflection and half-transmission function, on the one hand reduces production process, reduces production cost, and the transparent conductive material for being on the other hand placed in internal layer would be more protected, with reliability electro-magnetic screen function higher.
Description
Technical field
The present invention relates to transparent conducting glass field, specially a kind of half-reflection and half-transmission glass with electro-magnetic screen function.
Background technology
But as the high speed development of electronic technology, the dense degree of electronic equipment are increasing, electromagnetic interference situation is also got over
More to protrude.For ensure electronics set will not operationally be disturbed by external electromagnetic field, while not in the environment other
Equipment causes the electromagnetic interference not allowed, and electromagnetic shielding film and its design also become particularly important.
The application that half-reflection and half-transmission is displayed in the aspects such as vehicular rear mirror, smart home is more and more extensive.Current half anti-half
Display thoroughly is mainly realized by setting the glass with half-reflection and half-transmission optical characteristics outside display screen.The optics of half-reflection and half-transmission
Characteristic mainly using the principle of interference of light, is realized by setting the membrane system of high and low refractive index of multilayer specific thicknesses.And for
The treatment of electromagnetic shielding, realizes often through single conductive film layer is set, for example, directly deposit in display module transparent
Conductive layer ITO etc..This product structure is complicated, on the one hand increases new operation and cost, and another aspect conductive material is often not
Can be effectively protected, cause shield effectiveness to be decayed serious.
The content of the invention
The technical problems to be solved by the invention are to provide a kind of half-reflection and half-transmission glass with electro-magnetic screen function, will be saturating
Bright conductive material is placed in internal layer, can reduce production process, reduces production cost, improves the reliability of electromagnetic shielding.
In order to solve the above technical problems, the technical solution adopted in the present invention is：A kind of with electro-magnetic screen function half
Anti- semi-transparent glass, including glass substrate, are provided with multilayer dielectric film from the inside to the outside on glass substrate, deielectric-coating uses high refractive index layer
Carried out with low-index layer arranged in a crossed manner；Wherein innermost layer and outermost layer dielectric are high refractive index layer；Except outermost layer dielectric
Other high refractive index layers in, wherein a certain floor height index layer is made of high refractive index transparent conductive material, specific material
It is tin indium oxide, zinc oxide aluminum or fluorine doped tin oxide, refractive index is 1.8~2.5.
The high refractive index layer of the outermost layer dielectric and other non-high refractive index transparent conductive materials are made high index of refraction
The material of layer is TiO2、Nb2O5、Si3N4、Ta2O5Or ZrO2, refractive index is 1.8~2.5, and refractive index is 1.8~2.5.
The material of the low-index layer is SiO2、MgF2、SiON；Refractive index is 1.35~1.65.
High refractive index layer, low-index layer and high refractive index layer are provided with the glass substrate from the inside to the outside；Positioned at glass
High refractive index layer between substrate and low-index layer is made of high refractive index transparent conductive material.
Further, the thickness of the high refractive index layer for using high refractive index transparent conductive material to be made is 50-80nm,
The thickness of other high refractive index layer is 40-70nm, and the thickness of low-index layer is 50-80nm.
For 3 layers, the half-reflection and half-transmission representation with electro-magnetic screen function is：Substrate/H1/L/H, wherein H represent folding high
Penetrate rate material, TiO2、Nb2O5、Si3N4、Ta2O5Or ZrO2, refractive index is 1.8~2.5, correspondence film thickness range 40-70nm；L is represented
Low-index material, the material of the low-index layer is SiO2、MgF2、SiON；Refractive index is 1.35~1.65, correspondence thickness
It is 50-80nm；H1 is the transparent conductive oxide of high index of refraction, and specific material is the oxidation of tin indium oxide, zinc oxide aluminum or fluorine doped
Tin, refractive index is 1.8~2.5, and thickness is 50-80nm, and square resistance is 40-25 Europe.
High refractive index layer, low-index layer, high refractive index layer, low-index layer are provided with the glass substrate from the inside to the outside
And high refractive index layer；In other high refractive index layers in addition to outermost layer high refractive index layer, a certain high refractive index layer is rolled over using high
The rate transparent conductive material of penetrating is made.
Further, the thickness of the high refractive index layer for using high refractive index transparent conductive material to be made is 20-
120nm, is 25-45nm near the thickness of the high refractive index layer of substrate in other high refractive index layers, away from the height refraction of substrate
The thickness of rate layer is 50-70nm, press close to the thickness of low-index layer of substrate for 0-20nm, away from the low-index layer of substrate
Thickness is 80-120nm.
For 5, the half-reflection and half-transmission representation with electro-magnetic screen function is：Substrate/H1/L/H/L/H or substrate/H/L/
H1/L/H, wherein H represent high-index material, TiO2、Nb2O5、Si3N4、Ta2O5Or ZrO2, refractive index is 1.8~2.5, is pressed close to
H layers of film thickness range 25-45nm of substrate, the H layers of film thickness range away from substrate is 50-70nm；L represents low-index material, institute
The material for stating low-index layer is SiO2、MgF2、SiON；Refractive index is 1.35~1.65, presses close to L layers of film thickness range 0- of substrate
20nm, the L layers of film thickness range away from substrate is 80-120nm；H1 is the transparent conductive oxide of high index of refraction, and specific material is
Tin indium oxide, zinc oxide aluminum or fluorine doped tin oxide, refractive index are 1.8~2.5, and thickness is 20-120nm, and square resistance is 100-
12 Europe.
In traditional mode of production scheme, half-reflecting half mirror and function of shielding layer belong to two categories, often using two kinds of operations come
Realize respectively.Half-reflecting half mirror product is realized using the dielectric film layer stacking of low-refraction high；For screen layer, often
Using applying conductive coatings, or vacuum moulding machine conducting metal is realized.The present invention is using transparent conductive material as half-reflection and half-transmission
One layer in mirror membrane system, thus will half anti-transmissive optical and shielding properties carry out it is integrated, while transparent conductive material is used as low layer
Film is not readily susceptible to damage and corrodes, with excellent reliability.
The invention has the advantages that：
Nesa coating film layer as the floor height refractivity film layer in half-reflection and half-transmission membrane system is integrated with electromagnetism by the present invention
Shielding and half-reflection and half-transmission function, on the one hand reduce production process, reduce production cost, are on the other hand placed in the transparent of internal layer
Conductive material would be more protected, and transparent conductive material is not readily susceptible to damage and corrodes as low layer film, with excellent
Reliability, with reliability electro-magnetic screen function higher, and the optical effect of half-reflection and half-transmission can be realized.
Specific embodiment
With reference to embodiment, the present invention is furture elucidated.These embodiments be interpreted as being merely to illustrate the present invention and
It is not intended to limit the scope of the invention.After the content for having read record of the present invention, those skilled in the art can be with
The present invention is made various changes or modifications, these equivalence changes and modification equally fall into the model that claims of the present invention is limited
Enclose.
In following example and comparative example, H layers represents high-index material, specially Nb2O5, refractive index is that 2.5, L is low
Refraction materials, specially SiO2, it is ITO that refractive index is 1.46, H1 layers, and refractive index is 2.1.Nb2O5、SiO2, ITO uses
Prepared by vacuum magnetic-control sputtering method, base vacuum is 3*10-4Pa, substrate temperature is 330 DEG C.Nb2O5The deposition of layer uses NbOx targets
(X=1.5), process gas is 200sccm argon gas, and oxygen is 80sccm；SiO2The deposition of layer uses pure silicon target, and process gas is
200sccm argon gas, oxygen is 50sccm；The deposition of ITO layer uses ITO targets, and process gas is 200sccm argon gas, and oxygen is
2sccm。
Comparative example 1：Three layers of common membrane system half-reflection and half-transmission structure are：Substrate/H/L/H, wherein H represent high-index material,
Substrate is transparency carrier glass, and H layers is Nb2O5, refractive index is 2.5, and bottom H layers of thickness is 50nm, and top layer H layers of thickness is
50nm；L represents low-index material, chooses SiO2, refractive index 1.46, thickness is 60nm.From substrate air surface (non-film aspect)
Test reflectivity is 45%, is reflected into blue-green, L=72, a=-10, b=-22 in uniform color space (L, a, b).
Comparative example 2：Three layers of common membrane system half-reflection and half-transmission structure are：Substrate/H/L/H1, wherein substrate are transparency carrier glass
Glass, H represents high-index material, and H layers is Nb2O5, refractive index is 2.5, and thickness is 50nm；L represents low-index material, chooses
SiO2, refractive index 1.46, thickness is 78nm.H1 layers is ITO, and refractive index is 2.1, and thickness is 60nm, and square resistance is 30 Europe.From
Substrate air surface (non-film aspect) test reflectivity is 40%, is reflected into blue-green, L=70 in uniform color space (L, a, b),
A=-10, b=-22.
Comparative example 3：Three layers of common membrane system half-reflection and half-transmission structure are：H1/ substrates/H/L/H, wherein H represents high index of refraction material
Material, it is transparency carrier glass that substrate is chosen in this example, and H layers is Nb2O5, refractive index is 2.5, and bottom H layers of thickness is 50nm,
Top layer H layers of thickness is 50nm；L chooses SiO in representing low-index material, this example2, refractive index 1.46, thickness is 60nm.
H1 layers is ITO, and refractive index is 2.1, and thickness is 60nm, and square resistance is 30 Europe.It is anti-from substrate air surface (non-film aspect) test
It is 48% to penetrate rate, is reflected into blue-green, L=73, a=-10, b=-22 in uniform color space (L, a, b).
Embodiment 1：Three layers of common membrane system half-reflection and half-transmission structure are：Substrate/H1/L/H, wherein H represent high-index material,
It is transparency carrier glass that substrate is chosen in this example, and H layers is Nb2O5, refractive index is 2.5, and top layer H layers of thickness is 50nm；L generations
Table low-index material, chooses SiO in this example2, refractive index 1.46, thickness is 80nm.H1 layers is ITO, and refractive index is 2.1,
Thickness is 60nm, and square resistance is 30 Europe.It is 50% from substrate air surface (non-film aspect) test reflectivity, is reflected into bluish-green
Color, L=73, a=-10, b=-22 in uniform color space (L, a, b).
Compared with Example 1, its shield effectiveness and reflectivity see the table below 1 to comparative example 1-3：
Table 1
Comparative example 1 is conventional half-reflecting half mirror membrane system, all dielectrics of its film layer, without electromagnetic shielding work(
Energy.Ito film is placed on top layer by comparative example 2, and ITO layer is arranged on comparative example 3 the other one side of substrate.The ITO of comparative example 2 and 3
Outside the film layer, it is easily corroded and is destroyed layer, either the electromagnetic shielding of whole film layer and optical reflectivity
Weatherability is greatly reduced.H1 film layers are transparent conductive material in membrane system in embodiment 1, and are arranged on film layer bottom, and outside has
Film layer ripple is protected, and it has electro-magnetic screen function, while having good weatherability.
Comparative example 4：Five layers of common membrane system half-reflection and half-transmission structure are：Substrate/H/L/H/L/H, wherein H represent high index of refraction material
Material, it is transparency carrier glass that substrate is chosen in this example, and H layers is Nb2O5, refractive index is 2.5, and bottom H layers of thickness is 15nm,
Intermediate layer H layers of thickness is 84nm, and top layer H layers of thickness is 50nm；L chooses SiO in representing low-index material, this example2,
Refractive index 1.46, bottom L layers of thickness is 22nm, and upper strata L layers of thickness is 88nm.From substrate air surface (non-film aspect) test
Reflectivity is 50%, reflected colour near colorless, L=76, a=0, b=-1 in uniform color space (L, a, b).
Comparative example 5：Five layers of common membrane system half-reflection and half-transmission structure are：H1/ substrates/H/L/H/L/H, wherein H represents refraction high
Rate material, it is transparency carrier glass that substrate is chosen in this example, and H layers is Nb2O5, refractive index is 2.5, and bottom H layers of thickness is
15nm, intermediate layer H layers of thickness is 84nm, and top layer H layers of thickness is 50nm；L chooses in representing low-index material, this example
SiO2, refractive index 1.46, bottom L layers of thickness is 22nm, and upper strata L layers of thickness is 88nm.From substrate air surface (non-film layer
Face) test reflectivity be 55%；H1 layers of the other one side of substrate is ITO, and refractive index is 2.1, and thickness is 95nm, and square resistance is
17 Europe.It is 50% from substrate air surface (non-film aspect) test reflectivity, reflected colour near colorless, uniform color space (L, a,
B) L=76 in, a=0, b=-2.
Embodiment 2：Five layers of common membrane system half-reflection and half-transmission structure are：Substrate/H1/L/H/L/H, wherein H represent high index of refraction
It is transparency carrier glass that substrate is chosen in material, this example, and H layers is Nb2O5, refractive index is 2.5, and bottom H layers of thickness is
33nm, top layer H layers of thickness is 65nm；L chooses SiO in representing low-index material, this example2, refractive index 1.46, bottom L
The thickness of layer is 2nm, and upper strata L layers of thickness is 90nm.H1 layers of the other one side of substrate is ITO, and refractive index is 2.1, and thickness is
95nm, square resistance is 17 Europe.It is 48% from substrate air surface (non-film aspect) test reflectivity, reflected colour near colorless,
L=75, a=0, b=-1 in even chrominance space (L, a, b).
Compared with Example 2, its shield effectiveness and reflectivity see the table below 2 to comparative example 4-5：
Table 2
Comparative example 4 is conventional half-reflecting half mirror membrane system, all dielectrics of its film layer, without electromagnetic shielding work(
Energy.Conductive ito film is arranged on comparative example 5 the other one side of substrate.Outside film layer, it holds the ITO layer of comparative example 5
It is vulnerable to corrosion and destroys, either the electromagnetic shielding of whole film layer and the weatherability of optical reflectivity is greatly reduced.Implement
H1 film layers are transparent conductive material in membrane system in example 2, and are arranged on film layer bottom, and outside has film layer ripple to protect, and it has electromagnetism
Function of shielding, while having good weatherability.
In addition, the high refractive index layer that high refractive index transparent conductive material is made also can select zinc oxide aluminum or fluorine doped oxidation
Tin, refractive index is 1.8~2.5；Other high-index materials also can select TiO2、Si3N4、Ta2O5Or ZrO2, refractive index is 1.8
~2.5；The also optional MgF of low-index layer2Or SiON；Refractive index is 1.35~1.65.
Claims (7)
1. a kind of half-reflection and half-transmission glass with electro-magnetic screen function, it is characterised in that：Including glass substrate, on glass substrate by
Inside to multilayer dielectric film is externally provided with, deielectric-coating is carried out arranged in a crossed manner using high refractive index layer and low-index layer；Wherein innermost layer
It is high refractive index layer with outermost layer dielectric；In except other high refractive index layers of outermost layer dielectric, wherein a certain floor height is reflected
Rate layer is made of high refractive index transparent conductive material, and specific material is tin indium oxide, zinc oxide aluminum or fluorine doped tin oxide, refraction
Rate is 1.8 ~ 2.5.
2. glass according to claim 1, it is characterised in that：The high refractive index layer of the outermost layer dielectric is non-with other
The material that high refractive index transparent conductive material is made high refractive index layer is TiO2、Nb2O5、Si3N4、Ta2O5Or ZrO2, refractive index is
1.8~2.5。
3. glass according to claim 1, it is characterised in that：The material of the low-index layer is SiO2、MgF2、SiON；
Refractive index is 1.35 ~ 1.65.
4. glass according to claim 1, it is characterised in that：High index of refraction is provided with from the inside to the outside on the glass substrate
Layer, low-index layer and high refractive index layer；High refractive index layer between glass substrate and low-index layer is reflected using high
Rate transparent conductive material is made.
5. glass according to claim 4, it is characterised in that：The height that the use high refractive index transparent conductive material is made
The thickness of index layer is 50-80nm, and the thickness of high refractive index layer in addition is 40-70nm, and the thickness of low-index layer is 50-
80nm。
6. glass according to claim 1, it is characterised in that：High index of refraction is provided with from the inside to the outside on the glass substrate
Layer, low-index layer, high refractive index layer, low-index layer and high refractive index layer；Other in addition to outermost layer high refractive index layer
In high refractive index layer, a certain high refractive index layer is made of high refractive index transparent conductive material.
7. glass according to claim 6, it is characterised in that：The height that the use high refractive index transparent conductive material is made
The thickness of index layer is 20-120nm, is 25- near the thickness of the high refractive index layer of substrate in other high refractive index layers
45nm, the thickness away from the high refractive index layer of substrate is 50-70nm, and the thickness for pressing close to the low-index layer of substrate is 0-20nm,
Thickness away from the low-index layer of substrate is 80-120nm.
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| CN108218250A (en) * | 2018-01-30 | 2018-06-29 | 林嘉佑 | A kind of half-reflection and half-transmission glass |
| CN109231847A (en) * | 2017-07-11 | 2019-01-18 | 中国南玻集团股份有限公司 | Half-reflection and half-transmission glass and preparation method thereof |
| CN109383083A (en) * | 2017-08-09 | 2019-02-26 | 中国南玻集团股份有限公司 | Anti reflection glass and preparation method thereof |
| JP2020201488A (en) * | 2017-09-08 | 2020-12-17 | アップル インコーポレイテッドＡｐｐｌｅ Ｉｎｃ． | Coating for transparent substrate in electronic device |
| CN113292250A (en) * | 2021-05-31 | 2021-08-24 | 天津耀皮工程玻璃有限公司 | High-performance transparent electromagnetic protection material and preparation method thereof |
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| CN108218250B (en) * | 2018-01-30 | 2024-05-28 | 林嘉佑 | Semi-reflecting and semi-transparent glass |
| CN113292250A (en) * | 2021-05-31 | 2021-08-24 | 天津耀皮工程玻璃有限公司 | High-performance transparent electromagnetic protection material and preparation method thereof |
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Application publication date: 20170613 |