CN206607167U - Half-reflection and half-transmission glass with electro-magnetic screen function - Google Patents
Half-reflection and half-transmission glass with electro-magnetic screen function Download PDFInfo
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- CN206607167U CN206607167U CN201720283465.1U CN201720283465U CN206607167U CN 206607167 U CN206607167 U CN 206607167U CN 201720283465 U CN201720283465 U CN 201720283465U CN 206607167 U CN206607167 U CN 206607167U
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Abstract
The utility model discloses a kind of half-reflection and half-transmission glass with electro-magnetic screen function, including glass substrate, multilayer dielectric film is provided with glass substrate from the inside to the outside, deielectric-coating carries out arranged in a crossed manner using high refractive index layer and low-index layer；Wherein innermost layer and outermost layer dielectric are high refractive index layer；Except in other high refractive index layers of outermost layer dielectric, wherein a certain floor height index layer is made of high refractive index transparent conductive material, specific material is tin indium oxide, zinc oxide aluminum or fluorine doped tin oxide, and refractive index is 1.8 ~ 2.5.The glass is integrated with electromagnetic shielding and half-reflection and half-transmission function, on the one hand reduces production process, reduces production cost, the transparent conductive material for being on the other hand placed in internal layer would be more protected, with the higher electro-magnetic screen function of reliability.
Description
Technical field
The utility model is related to transparent conducting glass field, specially a kind of half-reflection and half-transmission glass with electro-magnetic screen function
Glass.
Background technology
But with the high speed development of electronic technology, the dense degree of electronic equipment is increasing, and electromagnetic interference situation is also got over
More to protrude.It will not operationally be disturbed to ensure that electronics is set by external electromagnetic field, while not to other in the environment
Equipment causes the electromagnetic interference not allowed, and electromagnetic shielding film and its design also become particularly important.
The application that half-reflection and half-transmission is shown in terms of vehicular rear mirror, smart home is more and more extensive.Current half anti-half
Display is mainly realized by setting the glass with half-reflection and half-transmission optical characteristics outside display screen thoroughly.The optics of half-reflection and half-transmission
Characteristic mainly utilizes the principle of interference of light, by setting the membrane system of high and low refractive index of multilayer specific thicknesses to realize.And for
The processing of electromagnetic shielding, often through setting single conductive film layer to realize, for example, is directly deposited transparent in display module
Conductive layer ITO etc..This product structure is complicated, on the one hand increases new process and cost, and another aspect conductive material is often not
It can be effectively protected, cause shield effectiveness decay serious.
The content of the invention
Technical problem to be solved in the utility model is to provide a kind of half-reflection and half-transmission glass with electro-magnetic screen function,
Transparent conductive material is placed in internal layer, production process can be reduced, production cost is reduced, the reliable of electromagnetic shielding is improved
Property.
In order to solve the above technical problems, the technical scheme that the utility model is used is：One kind has electro-magnetic screen function
Half-reflection and half-transmission glass, including glass substrate, be sequentially provided with glass substrate the first high refractive index layer, the first low-index layer and
Second high refractive index layer, wherein the first high refractive index layer is high index of refraction conductive layer；The thickness of first high refractive index layer is 50-
80nm, the thickness of the second high refractive index layer is 40-70nm, and the thickness of the first low-index layer is 50-80nm.
Preferably, the high index of refraction conductive layer is indium tin oxide layer or zinc aluminium oxide layer or fluorine doped tin oxide layer.Refraction
Rate is 1.8~2.5.
Preferably, the thickness of first high refractive index layer is 60-70nm, and the thickness of the second high refractive index layer is 50-
60nm, the thickness of the first low-index layer is 60-70nm.
Preferably, the thickness of first high refractive index layer is 60nm.
In another preferred scheme, a kind of half-reflection and half-transmission glass with electro-magnetic screen function, including glass substrate, glass
The first high refractive index layer, the first low-index layer, the second high refractive index layer, the second low-index layer and are sequentially provided with substrate
Three high refractive index layers；One in wherein the first high refractive index layer and the second high refractive index layer is high index of refraction conductive layer, height folding
The thickness for penetrating rate conductive layer is 20-120nm, and the thickness of another high refractive index layer is 25-45nm, the thickness of the 3rd high refractive index layer
For 50-70nm, the thickness of the first low-index layer is 1-20nm, and the thickness of the second low-index layer is 80-120nm.
Further, the high index of refraction conductive layer is indium tin oxide layer or zinc aluminium oxide layer or fluorine doped tin oxide layer.
Further, the thickness of the high index of refraction conductive layer is 50-60nm.
The material of high refractive index layer in addition to high index of refraction conductive layer is TiO2、Nb2O5、Si3N4、Ta2O5Or ZrO2, folding
It is 1.8~2.5 to penetrate rate.
The material of all low-index layers is SiO2、MgF2、SiON；Refractive index is 1.35~1.65.
It is for 3 layers of half-reflection and half-transmission representation with electro-magnetic screen function：Substrate/H1/L/H, wherein H represent high folding
Penetrate rate material, TiO2、Nb2O5、Si3N4、Ta2O5Or ZrO2, refractive index is 1.8~2.5, correspondence film thickness range 40-70nm；L is represented
Low-index material, the material of the low-index layer is SiO2、MgF2、SiON；Refractive index is 1.35~1.65, correspondence thickness
For 50-80nm；H1 is the transparent conductive oxide of high index of refraction, and specific material is tin indium oxide, zinc oxide aluminum or fluorine doped oxidation
Tin, refractive index is 1.8~2.5, and thickness is 50-80nm, and square resistance is 40-25 Europe.
It is for the 5 half-reflection and half-transmission representations with electro-magnetic screen function：Substrate/H1/L/H/L/H or substrate/H/L/
H1/L/H, wherein H represent high-index material, TiO2、Nb2O5、Si3N4、Ta2O5Or ZrO2, refractive index is 1.8~2.5, is pressed close to
The H layer film thickness range 25-45nm of substrate, the H layers film thickness range away from substrate is 50-70nm；L represents low-index material, institute
The material for stating low-index layer is SiO2、MgF2、SiON；Refractive index is 1.35~1.65, presses close to the L layer film thickness ranges 0- of substrate
20nm, the L layers film thickness range away from substrate is 80-120nm；H1 is the transparent conductive oxide of high index of refraction, and specific material is
Tin indium oxide, zinc oxide aluminum or fluorine doped tin oxide, refractive index are 1.8~2.5, and thickness is 20-120nm, and square resistance is 100-
12 Europe.
In traditional mode of production scheme, half-reflecting half mirror and function of shielding layer belong to two categories, often using two kinds of processes come
Realize respectively.Half-reflecting half mirror product stacks to realize using the dielectric film layer of high low-refraction；For screen layer, often
Realized using applying conductive coatings, or vacuum moulding machine conducting metal.The utility model is anti-using transparent conductive material as half
One layer in pellicle mirror membrane system, thus half anti-transmissive optical and shielding properties progress is integrated, while transparent conductive material conduct
Low layer film is not readily susceptible to damage and corroded, with excellent reliability.
The utility model has the advantages that：
Nesa coating film layer as the floor height refractivity film layer in half-reflection and half-transmission membrane system, is integrated with by the utility model
Electromagnetic shielding and half-reflection and half-transmission function, on the one hand reduce production process, reduce production cost, be on the other hand placed in internal layer
Transparent conductive material would be more protected, and transparent conductive material is not readily susceptible to damage and corroded as low layer film, has
Excellent reliability, with the higher electro-magnetic screen function of reliability, and can realize the optical effect of half-reflection and half-transmission.
Brief description of the drawings
Fig. 1 is the structural representation of embodiment 1.
Fig. 2 is the structural representation of embodiment 2.
Embodiment
With reference to embodiment, the utility model is further elucidated.These embodiments are interpreted as being merely to illustrate this reality
With new rather than for limiting protection domain of the present utility model.After the content of the utility model record has been read, this
Art personnel can make various changes or modifications to the utility model, and these equivalence changes and modification equally fall into this practicality
New claims limited range.
In following example and comparative example, H layers represent high-index material, specially Nb2O5, refractive index is that 2.5, L is low
Refraction materials, specially SiO2, it is ITO that refractive index, which is 1.46, H1 layers, and refractive index is 2.1.Nb2O5、SiO2, ITO uses
Prepared by vacuum magnetic-control sputtering method, base vacuum is 3*10-4Pa, substrate temperature is 330 DEG C.Nb2O5The deposition of layer uses NbOx targets
(X=1.5), process gas is 200sccm argon gas, and oxygen is 80sccm；SiO2The deposition of layer uses pure silicon target, and process gas is
200sccm argon gas, oxygen is 50sccm；The deposition of ITO layer uses ITO targets, and process gas is 200sccm argon gas, and oxygen is
2sccm。
Comparative example 1：Three layers of common membrane system half-reflection and half-transmission structure are：Substrate/H/L/H, wherein H represent high-index material,
Substrate is transparency carrier glass, and H layers are Nb2O5, refractive index is 2.5, and the thickness that H layers of bottom is 50nm, and the thickness that H layers of top layer is
50nm；L represents low-index material, chooses SiO2, refractive index 1.46, thickness is 60nm.From substrate air surface (non-film aspect)
It is 45% to test reflectivity, is reflected into L=72, a=-10, b=-22 in blue-green, uniform color space (L, a, b).
Comparative example 2：Three layers of common membrane system half-reflection and half-transmission structure are：Substrate/H/L/H1, wherein substrate are transparency carrier glass
Glass, H represents high-index material, and H layers are Nb2O5, refractive index is 2.5, and thickness is 50nm；L represents low-index material, chooses
SiO2, refractive index 1.46, thickness is 78nm.H1 layers are ITO, and refractive index is 2.1, and thickness is 60nm, and square resistance is 30 Europe.From
Substrate air surface (non-film aspect) test reflectivity is 40%, is reflected into L=70 in blue-green, uniform color space (L, a, b),
A=-10, b=-22.
Comparative example 3：Three layers of common membrane system half-reflection and half-transmission structure are：H1/ substrates/H/L/H, wherein H represents high index of refraction material
It is transparency carrier glass that substrate is chosen in material, this example, and H layers are Nb2O5, refractive index is 2.5, and the thickness that H layers of bottom is 50nm,
The thickness that H layers of top layer is 50nm；L, which is represented, chooses SiO in low-index material, this example2, refractive index 1.46, thickness is 60nm.
H1 layers are ITO, and refractive index is 2.1, and thickness is 60nm, and square resistance is 30 Europe.It is anti-from substrate air surface (non-film aspect) test
It is 48% to penetrate rate, is reflected into L=73, a=-10, b=-22 in blue-green, uniform color space (L, a, b).
Embodiment 1：Three layers of common membrane system half-reflection and half-transmission structure are as shown in figure 1, wherein 1 is glass substrate, and 2 be the first high folding
Rate layer is penetrated, 3 be the first low-index layer, and 4 be the second high refractive index layer；Also usable substrates/H1/L/H is represented, wherein H represents height
It is transparency carrier glass that substrate is chosen in refraction materials, this example, and H layers are Nb2O5, refractive index is 2.5, the thickness that H layers of top layer
For 50nm；L, which is represented, chooses SiO in low-index material, this example2, refractive index 1.46, thickness is 80nm.H1 layers are ITO, folding
It is 2.1 to penetrate rate, and thickness is 60nm, and square resistance is 30 Europe.It is 50% from substrate air surface (non-film aspect) test reflectivity, instead
Penetrate as blue-green, L=73, a=-10, b=-22 in uniform color space (L, a, b).
Compared with Example 1, its shield effectiveness and reflectivity see the table below 1 to comparative example 1-3：
Table 1
Comparative example 1 is conventional half-reflecting half mirror membrane system, all dielectrics of its film layer, without electromagnetic shielding work(
Energy.Ito film is placed on top layer by comparative example 2, and ITO layer is arranged on the other one side of substrate by comparative example 3.The ITO of comparative example 2 and 3
Layer is outside the film layer, and it is easily corroded and destroyed, either the electromagnetic shielding of whole film layer and optical reflectivity
Weatherability is greatly reduced.H1 film layers are transparent conductive material in membrane system in embodiment 1, and are arranged on film layer bottom, and outside has
Film layer ripple is protected, and it has electro-magnetic screen function, while having good weatherability.
Comparative example 4：Five layers of common membrane system half-reflection and half-transmission structure are：Substrate/H/L/H/L/H, wherein H represent high index of refraction material
It is transparency carrier glass that substrate is chosen in material, this example, and H layers are Nb2O5, refractive index is 2.5, and the thickness that H layers of bottom is 15nm,
Intermediate layer H layers of thickness is 84nm, and the thickness that H layers of top layer is 50nm；L, which is represented, chooses SiO in low-index material, this example2,
Refractive index 1.46, bottom L layers of thickness is 22nm, and upper strata L layers of thickness is 88nm.From substrate air surface (non-film aspect) test
Reflectivity is 50%, reflected colour near colorless, L=76, a=0, b=-1 in uniform color space (L, a, b).
Comparative example 5：Five layers of common membrane system half-reflection and half-transmission structure are：H1/ substrates/H/L/H/L/H, wherein H represents high refraction
It is transparency carrier glass that substrate is chosen in rate material, this example, and H layers are Nb2O5, refractive index is 2.5, and the thickness that H layers of bottom is
15nm, intermediate layer H layers of thickness is 84nm, and the thickness that H layers of top layer is 50nm；L is represented in low-index material, this example and chosen
SiO2, refractive index 1.46, bottom L layers of thickness is 22nm, and upper strata L layers of thickness is 88nm.From substrate air surface (non-film layer
Face) test reflectivity be 55%；The H1 layers of the other one side of substrate are ITO, and refractive index is 2.1, and thickness is 95nm, and square resistance is
17 Europe.It is 50% from substrate air surface (non-film aspect) test reflectivity, reflected colour near colorless, uniform color space (L, a,
B) L=76 in, a=0, b=-2.
Embodiment 2：Five layers of common membrane system half-reflection and half-transmission structure are as shown in Fig. 2 wherein 1 is glass substrate, and 2 be the first high folding
Rate layer is penetrated, 3 be the first low-index layer, and 4 be the second high refractive index layer, and 5 be the second low-index layer, and 6 be the 3rd high index of refraction
Layer；Also usable substrates/H1/L/H/L/H is represented, it is transparency carrier that wherein H, which is represented and substrate is chosen in high-index material, this example,
Glass, H layers are Nb2O5, refractive index is 2.5, and the thickness that H layers of bottom is 33nm, and the thickness that H layers of top layer is 65nm；L represents low folding
Penetrate in rate material, this example and choose SiO2, refractive index 1.46, bottom L layers of thickness is 2nm, and upper strata L layers of thickness is 90nm.
The H1 layers of the other one side of substrate are ITO, and refractive index is 2.1, and thickness is 95nm, and square resistance is 17 Europe.It is (non-from substrate air surface
Film layer face) test reflectivity is 48%, reflected colour near colorless, L=75, a=0, b=-1 in uniform color space (L, a, b).
Compared with Example 2, its shield effectiveness and reflectivity see the table below 2 to comparative example 4-5：
Table 2
Comparative example 4 is conventional half-reflecting half mirror membrane system, all dielectrics of its film layer, without electromagnetic shielding work(
Energy.Conductive ito film is arranged on the other one side of substrate by comparative example 5.The ITO layer of comparative example 5 is outside film layer, and it holds
It is vulnerable to corrosion and destroys, either the electromagnetic shielding of whole film layer and the weatherability of optical reflectivity is greatly reduced.Implement
H1 film layers are transparent conductive material in membrane system in example 2, and are arranged on film layer bottom, and there is the protection of film layer ripple outside, and it has electromagnetism
Function of shielding, while having good weatherability.
In addition, the high refractive index layer that high refractive index transparent conductive material is made also can select zinc oxide aluminum or fluorine doped oxidation
Tin, refractive index is 1.8~2.5；Other high-index materials also can select TiO2、Si3N4、Ta2O5Or ZrO2, refractive index is 1.8
~2.5；The also optional MgF of low-index layer2Or SiON；Refractive index is 1.35~1.65.
Claims (7)
1. a kind of half-reflection and half-transmission glass with electro-magnetic screen function, it is characterised in that：Including glass substrate, on glass substrate according to
It is secondary to be provided with the first high refractive index layer, the first low-index layer and the second high refractive index layer, wherein the first high refractive index layer is rolled over to be high
Penetrate rate conductive layer；The thickness of first high refractive index layer is 50-80nm, and the thickness of the second high refractive index layer is 40-70nm, and first is low
The thickness of index layer is 50-80nm.
2. glass according to claim 1, it is characterised in that：The high index of refraction conductive layer is indium tin oxide layer or oxidation
Zinc-aluminium layer or fluorine doped tin oxide layer.
3. glass according to claim 1, it is characterised in that：The thickness of first high refractive index layer is 60-70nm, the
The thickness of two high refractive index layers is 50-60nm, and the thickness of the first low-index layer is 60-70nm.
4. the glass according to claim 1-3 any one, it is characterised in that：The thickness of first high refractive index layer is
60nm。
5. a kind of half-reflection and half-transmission glass with electro-magnetic screen function, it is characterised in that：Including glass substrate, on glass substrate according to
It is secondary to be provided with the first high refractive index layer, the first low-index layer, the second high refractive index layer, the second low-index layer and the 3rd high refraction
Rate layer；One in wherein the first high refractive index layer and the second high refractive index layer is high index of refraction conductive layer, and high index of refraction is conductive
The thickness of layer is 20-120nm, and the thickness of another high refractive index layer is 25-45nm, and the thickness of the 3rd high refractive index layer is 50-
70nm, the thickness of the first low-index layer is 1-20nm, and the thickness of the second low-index layer is 80-120nm.
6. glass according to claim 5, it is characterised in that：The high index of refraction conductive layer is indium tin oxide layer or oxidation
Zinc-aluminium layer or fluorine doped tin oxide layer.
7. glass according to claim 5, it is characterised in that：The thickness of the high index of refraction conductive layer is 50-60nm.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108109721A (en) * | 2017-12-12 | 2018-06-01 | 中国南玻集团股份有限公司 | Colourful transparent conductive film and its preparation method and application |
| CN108218250A (en) * | 2018-01-30 | 2018-06-29 | 林嘉佑 | A kind of half-reflection and half-transmission glass |
-
2017
- 2017-03-22 CN CN201720283465.1U patent/CN206607167U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108109721A (en) * | 2017-12-12 | 2018-06-01 | 中国南玻集团股份有限公司 | Colourful transparent conductive film and its preparation method and application |
| CN108218250A (en) * | 2018-01-30 | 2018-06-29 | 林嘉佑 | A kind of half-reflection and half-transmission glass |
| CN108218250B (en) * | 2018-01-30 | 2024-05-28 | 林嘉佑 | Semi-reflecting and semi-transparent glass |
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