CN113265641B - 一种基于低温辉光等离子体的疏水减摩自润滑碳膜及其制备方法 - Google Patents
一种基于低温辉光等离子体的疏水减摩自润滑碳膜及其制备方法 Download PDFInfo
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Abstract
本发明涉及碳膜制备技术领域,具体涉及一种基于低温辉光等离子体的疏水减摩自润滑碳膜及其制备方法,对材料进行抛光处理,将材料置于等离子体渗氮炉中,抽真空至10~50Pa,接通电压,电压保持在600~800V,占空比30%~80%;通入碳源气体和氢气/氩气,调节炉内温度和气压,开始制备疏水减摩自润滑的碳膜,保持稳定的温度和气压等参数一段时间,接着试样随炉冷却至室温,取出试样;这种基于低温辉光等离子体的疏水减摩自润滑碳膜及其制备方法,解决了如何在低温下采用低成本制备兼具疏水和减摩自润滑特性的碳膜的问题。
Description
技术领域
本发明涉及碳膜制备技术领域,具体涉及一种基于低温辉光等离子体的疏水减摩自润滑碳膜及其制备方法。
背景技术
材料的薄膜可以为材料提供耐蚀性、疏水性、减摩润滑特性等功能特性,在电子器件、机械汽车、生物医用、航空航天等领域有着广泛的应用。传统的碳膜制备方法包括离子束沉积、溅射沉积、真空电弧沉积、脉冲激光沉积等物理气相沉积方法,设备工艺成本较高。化学气相沉积法一般需要较高的温度沉积薄膜,对基体材料提出了限制。碳膜的减摩润滑性能有助于碳膜作为耐磨防护涂层,应用在模具、刀具、机械工具、磁记录介质等方面。其中,电子元器件对碳膜的疏水性能也提出要求。因此,一种低成本的低温制备方法制备兼具疏水和减摩自润滑特性的碳膜具有重要的应用价值。
鉴于上述缺陷,本发明创作者经过长时间的研究和实践终于获得了本发明。
发明内容
本发明的目的在于解决如何在低温下采用低成本制备兼具疏水和减摩自润滑特性的碳膜的问题,提供了一种基于低温辉光等离子体的疏水减摩自润滑碳膜及其制备方法。
为了实现上述目的,本发明公开了一种基于低温辉光等离子体的疏水减摩自润滑碳膜的制备方法,包括以下步骤:
S1:用砂纸将试样材料打磨,并进一步抛光至低粗糙度状态,在丙酮或酒精溶液中清洗干净;
S2:将步骤S1中得到的材料置于等离子体渗氮炉中,抽真空至50Pa,接通电压;
S3:通入碳源气体、氢气和氩气,调节炉内温度和气压,开始制备疏水减摩自润滑的碳膜;
S4:依据膜的厚度需求,保持稳定的温度和气压,接着试样随炉冷却至室温,取出试样。
所述步骤S1中的试样材料熔点大于200℃。
所述步骤S1中的试样材料为金属材料、陶瓷材料、聚合物材料中的任意一种。
所述步骤S1中试样材料进一步抛光至镜面状态。
所述步骤S2中电压保持在600~800V,占空比为30%-80%。
所述步骤S3中的碳源气体为甲烷、乙烷、丙烷、苯类、二甲基二氯硅烷、二甲基氯硅烷、三甲基氯硅烷、一氧化碳、甲醇、丙酮、酒精中的任意一种。
所述步骤S3中碳源气体通入量10-100sccm,氢气、氩气或者其混合气体的通入量10-100sccm。
所述步骤S3中的炉内温度低于250℃,炉内气压为1~100Pa。
本发明还公开了一种由上述方法制备得到的基于低温辉光等离子体的疏水减摩自润滑碳膜。
与现有技术比较本发明的有益效果在于:本发明采用低温辉光等离子体制备疏水减摩自润滑的碳膜,制备方法简单,制备成本较低,得到的碳膜致密、厚度均匀,与基体结合良好,具有良好的疏水性能、减摩耐磨性能和一定的耐腐蚀性能,可以作为疏水薄膜应用在电子元器件上,也可以作为润滑薄膜或者防刮伤涂层应用于机械零部件、磁性存储介质等。
附图说明
图1为本发明实施例1中碳膜的截面形貌;
图2为本发明实施例2中碳膜的截面形貌;
图3为本发明实施例1中碳膜的拉曼测试结果;
图4为本发明实施例1中碳膜的XPS测试结果;
图5为本发明实施例2中碳膜的XPS测试结果;
图6为本发明实施例1与对比例试样的摩擦磨损测试结果。
具体实施方式
以下结合附图,对本发明上述的和另外的技术特征和优点作更详细的说明。
实施例1
步骤1:用砂纸将M50NiL渗氮钢试样材料打磨,并进一步抛光至低粗糙度状态(镜面状态为最佳),在丙酮或酒精溶液中清洗干净;
步骤2:将步骤1得到的材料置于等离子体渗氮炉中,抽真空至50Pa,接通电压,电压保持在700V,占空比35%;
步骤3:通入丙烷和氢气,比例为2:1,调节炉内温度为170℃和气压为55Pa,开始制备疏水减摩自润滑的碳膜;
步骤4:保持170℃的温度和55Pa的气压5h,接着试样随炉冷却至室温,取出试样。
得到的碳膜的截面形貌如图1所示,可以看出碳膜厚度均匀,与基体结合良好;图3为得到的碳膜的拉曼测试结果,显示包含碳膜对应的典型D峰和G峰;碳膜的XPS测试结果如图4所示,显示sp2含量占比为73.18%,sp3含量占比为26.82%,摩擦系数远低于对比例,如图6所示。
实施例2
步骤1:用砂纸将M50NiL渗氮钢试样材料打磨,并进一步抛光至低粗糙度状态(镜面状态为最佳),在丙酮或酒精溶液中清洗干净;
步骤2:将步骤1得到的材料置于等离子体渗氮炉中,抽真空至50Pa,接通电压,电压保持在700V,占空比35%;
步骤3:通入丙烷和氢气,比例为2:3,调节炉内温度为170℃和气压为55Pa,开始制备疏水减摩自润滑的碳膜;
步骤4:保持170℃的温度和55Pa的气压5h,接着试样随炉冷却至室温,取出试样。
得到的碳膜的截面形貌如图2所示,可以看出碳膜厚度均匀,碳膜的XPS测试结果如图5所示,显示sp2含量占比为74.28%,sp3含量占比为25.72%,摩擦系数远低于对比例,如图6所示。
实施例3
步骤1:用砂纸将4140钢试样材料打磨,并进一步抛光至低粗糙度状态(镜面状态为最佳),在丙酮或酒精溶液中清洗干净;
步骤2:将步骤1得到的材料置于等离子体渗氮炉中,抽真空至50Pa,接通电压,电压保持在700V,占空比20%;
步骤3:通入丙烷和氢气,比例为2:3,调节炉内温度为170℃和气压为55Pa,开始制备疏水减摩自润滑的碳膜;
步骤4:保持170℃的温度和55Pa的气压5h,接着试样随炉冷却至室温,取出试样。
实施例4
步骤1:用砂纸将Si基体材料打磨,并进一步抛光至低粗糙度状态(镜面状态为最佳),在丙酮或酒精溶液中清洗干净;
步骤2:将步骤1得到的材料置于等离子体渗氮炉中,抽真空至50Pa,接通电压,电压保持在650V,占空比35%;
步骤3:通入丙烷和氢气,比例为2:1,调节炉内温度为170℃和气压为55Pa,开始制备疏水减摩自润滑的碳膜;
步骤4:保持170℃的温度和55Pa的气压5h,接着试样随炉冷却至室温,取出试样。
碳膜的润湿角测试结果显示润湿角大约为96°,表现出疏水性。
对比例
未作任何处理的M50NiL渗氮钢。
将实施例1得到的有碳膜覆盖的M50NiL渗氮钢与对比例中的未作任何处理的M50NiL渗氮钢进行摩擦磨损测试,测试结果如图6所示,碳膜覆盖的M50NiL渗氮钢摩擦系数相比较无碳膜的M50NiL渗氮钢大幅度降低。
以上所述仅为本发明的较佳实施例,对本发明而言仅仅是说明性的,而非限制性的。本专业技术人员理解,在本发明权利要求所限定的精神和范围内可对其进行许多改变,修改,甚至等效,但都将落入本发明的保护范围内。
Claims (9)
1.一种基于低温辉光等离子体的疏水减摩自润滑碳膜的制备方法,其特征在于,包括以下步骤:
S1:将试样材料打磨,并进一步抛光至低粗糙度状态,在丙酮或酒精溶液中清洗干净;
S2:将步骤S1中得到的材料置于等离子体渗氮炉中,抽真空,接通电压;
S3:通入碳源气体、氢气/氩气,调节炉内温度低于250℃,炉内气压为1~100Pa,开始制备疏水减摩自润滑的碳膜,
S4:依据膜的厚度需求,保持稳定的温度和气压,接着试样随炉冷却至室温,取出试样。
2.如权利要求1所述的一种基于低温辉光等离子体的疏水减摩自润滑碳膜的制备方法,其特征在于,所述步骤S1中的试样材料熔点大于200℃。
3.如权利要求1所述的一种基于低温辉光等离子体的疏水减摩自润滑碳膜的制备方法,其特征在于,所述步骤S1中的试样材料为金属材料、陶瓷材料、聚合物材料中的任意一种。
4.如权利要求1所述的一种基于低温辉光等离子体的疏水减摩自润滑碳膜的制备方法,其特征在于,所述步骤S1中试样材料进一步抛光至镜面状态。
5.如权利要求1所述的一种基于低温辉光等离子体的疏水减摩自润滑碳膜的制备方法,其特征在于,所述步骤S2中抽真空后至10~50Pa。
6.如权利要求1所述的一种基于低温辉光等离子体的疏水减摩自润滑碳膜的制备方法,其特征在于,所述步骤S2中电压保持在600~800V,占空比为30%-80%。
7.如权利要求1所述的一种疏基于低温辉光等离子体的疏水减摩自润滑碳膜的制备方法,其特征在于,所述步骤S3中的碳源气体为甲烷、乙烷、丙烷、苯类、二甲基二氯硅烷、二甲基氯硅烷、三甲基氯硅烷、一氧化碳、甲醇、丙酮、酒精中的任意一种。
8.如权利要求1所述的一种基于低温辉光等离子体的疏水减摩自润滑碳膜的制备方法,其特征在于,所述步骤S3中碳源气体通入量10-100sccm,氢气、氩气或者其混合气体的通入量10-100sccm。
9.一种采用如权利要求1~8任一项所述的制备方法制得的基于低温辉光等离子体的疏水减摩自润滑碳膜。
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