CN113252304A - 测定装置及成膜装置 - Google Patents

测定装置及成膜装置 Download PDF

Info

Publication number
CN113252304A
CN113252304A CN202110124529.4A CN202110124529A CN113252304A CN 113252304 A CN113252304 A CN 113252304A CN 202110124529 A CN202110124529 A CN 202110124529A CN 113252304 A CN113252304 A CN 113252304A
Authority
CN
China
Prior art keywords
light
film
integrating sphere
film forming
membrane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202110124529.4A
Other languages
English (en)
Inventor
村山彻也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dexerials Corp
Original Assignee
Dexerials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dexerials Corp filed Critical Dexerials Corp
Publication of CN113252304A publication Critical patent/CN113252304A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N21/4738Diffuse reflection, e.g. also for testing fluids, fibrous materials
    • G01N21/474Details of optical heads therefor, e.g. using optical fibres
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N21/4738Diffuse reflection, e.g. also for testing fluids, fibrous materials
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N21/49Scattering, i.e. diffuse reflection within a body or fluid
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/59Transmissivity
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3476Testing and control
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N2021/635Photosynthetic material analysis, e.g. chrorophyll
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • G01N2021/8427Coatings
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/065Integrating spheres

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Textile Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Physical Vapour Deposition (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)

Abstract

本发明的目的在于提供能够高精度地测定运送膜片的任意部位的光学特性的测定装置及成膜装置。该测定装置具备:测定部,对膜片照射光,将由前述膜片透射或反射的光聚光;以及移动机构,使前述测定部能够沿与前述膜片的运送方向交叉的第一方向移动,前述测定部具有对前述膜片照射光的光投射部、将来自前述膜片的光聚光的积分球、以及接受由前述积分球聚光的光的光接受部。

Description

测定装置及成膜装置
技术领域
本发明涉及测定装置及成膜装置的制造方法。
背景技术
已知通过蒸镀、溅射等在膜片的表面将薄膜成膜、赋予了防反射等功能的光学膜片。光学膜片的特性根据薄膜的成膜条件等变动,所以要求正确地评估所成膜的薄膜。
例如,在专利文献1中,记载了具有内周面为球状扩散反射面的聚光构件、评估所运送的膜片的光学特性测定装置。另外,在专利文献2中,记载了能够在现场(in-situ)评估载置于台上的平面基板的光学特性测定装置。
现有技术文献
专利文献
专利文献1:日本特开2000-199731号公报。
专利文献2:日本特开2002-236076号公报。
发明内容
发明要解决的问题
然而,专利文献1和2所记载的光学特性测定装置不能进行膜片的任意部位的评估,例如在膜片的宽度方向上存在特性的不一致的情况下,不能检测该特性的不一致。
本发明是鉴于上述问题做出的,目的在于提供能够高精度地测定运送膜片的任意部位的光学特性的测定装置及成膜装置。
用于解决问题的方案
本发明为了解决上述问题,提供以下的手段。
第一方式所涉及的测定装置具备:测定部,对膜片照射光,将由前述膜片透射或反射的光聚光;以及移动机构,使前述测定部能够沿与前述膜片的运送方向交叉的第一方向移动,前述测定部具有对前述膜片照射光的光投射部、将来自前述膜片的光聚光的积分球、以及接受由前述积分球聚光的光的光接受部。
在上述方式所涉及的测定装置中,前述积分球也可以与前述膜片不接触。
在上述方式所涉及的测定装置中,照射到前述积分球的开口面的外界光的照度也可以为1.0 Lux以下。
上述方式所涉及的测定装置也可以还具备支撑体,该支撑体从与前述膜片的光照射面相反的一侧支撑前述膜片,前述支撑体的反射率为1.0%以下。
上述方式所涉及的测定装置也可以在前述膜片的前述第一方向的侧方还具备校正板。
第二方式所涉及的成膜装置具备:成膜部,在真空中对膜片成膜;上述方式所涉及的测定装置,测定在前述成膜部成膜的膜片;分光器,对在前述测定装置的光接受部接受的光进行分光;以及运算部,基于前述分光器的测定结果,评估成膜于前述膜片的膜,将成膜条件反馈至前述成膜部。
发明效果
根据上述方式所涉及的测定装置及成膜装置,能够高精度地测定运送膜片的任意部位的光学特性。
附图说明
图1是第一实施方式所涉及的成膜装置的示意图。
图2是第一实施方式所涉及的测定装置的测定部的放大图。
图3是第一实施方式所涉及的测定装置的积分球附近的放大图。
图4是第一实施方式所涉及的测定装置的测定部附近的截面图。
图5是第一实施方式所涉及的测定装置的测定部附近的另一例的截面图。
图6是第一实施方式所涉及的测定装置的测定部附近的另一例的截面图。
图7是第一实施方式所涉及的测定装置的支撑体及校正板的示意图。
图8是将辊的反射率的演变示出的曲线图。
图9是第一实施方式所涉及的测定装置的支撑体的另一例的示意图。
图10是第一实施方式所涉及的测定装置的校正板的侧视图。
具体实施方式
以下,对于本实施方式,适当参照附图详细地说明。在以下的说明中使用的附图为了使特征易于理解,有时出于方便而将成为特征的部分放大示出,各构成要素的尺寸比率等有时与实际不同。在以下的说明中例示的材料、尺寸等是一例,本发明不受它们限定,能够在实现本发明的效果的范围内适当变更而实施。
[成膜装置]
图1是第一实施方式所涉及的成膜装置200的示意图。成膜装置200具有测定装置100、成膜部110、分光器120、运算部130和驱动装置140。成膜装置200例如横跨由间隔壁150划分的真空环境和大气环境。测定装置100及成膜部110处于真空环境。分光器120及运算部130例如处于大气环境。驱动装置140例如横跨真空环境和大气环境。
成膜部110在膜片F的表面层积功能膜。功能膜例如是层积了多层电介质层的防反射膜。成膜部110例如通过蒸镀法、溅射法等在膜片F的表面层积功能膜。
层积了功能膜的膜片F被向测定装置100运送。以下,将膜片F从成膜部110到测定装置100的运送方向称为x方向,将膜片F的宽度方向称为y方向,将与x方向及y方向正交的方向称为z方向。测定装置100测定膜片F的光学特性。测定装置100的细节之后说明。
驱动装置140通过移动机构20使测定部10沿y方向运动。测定部10沿y方向运动,从而能够使测定部10移动至膜片F的任意位置,测定任意位置的膜片F的光学特性。驱动装置140例如由控制部141和马达142组成。控制部141控制马达142。
膜片F的测定结果从测定部10例如经由光纤被送至分光器120。分光器120获取膜片F的透射或反射光的光谱。获取的光谱被送到运算部130。
运算部130根据由测定部10实际测出的光谱算出功能膜的光学特性。运算部130基于算出的光学特性,对成膜部110中的成膜条件进行反馈。在算出的光学特性与设计特性不同的情况下,变更成膜部110中的成膜条件。
[测定装置]
测定装置100例如具备测定部10、移动机构20、支撑体30和校正板40。测定部10能够通过移动机构20沿y方向移动。支撑体30与测定部10相向。校正板40处于支撑体30的y方向的侧方。
图2是将第一实施方式所涉及的测定装置100的测定部10放大的图。测定部10至少具备积分球11、投射光纤12和接受光纤13。投射光纤12连接至光源。接受光纤13连接至分光器120。投射光纤12及接受光纤13例如分别具有能够弯曲的光纤12A、13A及固定部12B、13B。固定部12B、13B与框体11例如螺纹固定。通过将不弯曲的固定部12B、13B与积分球11牢固地固定,即使测定部10移动,也能够抑制由振动引起的影响。测定部10对光纤F照射光,测定由光纤F透射或反射的光。
积分球11的大小不作特别限制。积分球11的直径例如只要不构成对后述移动机构20的动作的妨碍,就能够任意地选择。
积分球11不限于直接固定至移动机构20的情况。例如,还可以将积分球11设置在另行设置的框体内,经由框体固定至移动机构20。
图3是将积分球11放大的图。光投射部12C及光接受部13C连接至积分球11。光投射部12C是投射光纤12的一部分。光接受部13C是接受光纤13的一部分。积分球11在内壁施加了反射率高、扩散性优异的涂层。积分球11例如与膜片F不接触,不会损伤膜片F。
光投射部12C对膜片F照射光。照射到膜片F的光照射面F1的光由光照射面F1扩散反射。扩散反射的光碰到积分球11的内壁,反复进行扩散反射。积分球11将来自膜片F的光聚光。光接受部13C接受在积分球11内反复进行扩散反射并变为大致均匀的亮度的光。光接受部13C接受由积分球11聚光的光。接受的光包含光照射面F1处的正反射分量和扩散反射分量。
光投射部12C例如具备聚光透镜12D。聚光透镜12D与膜片F的光照射面F1的距离FL例如从聚光透镜12D的焦距偏移。聚光透镜12D与膜片F的光照射面F1的距离FL例如比聚光透镜12D的焦距短。通过拉近聚光透镜12D与膜片F的距离,光照射面F1的照射点尺寸变大。照射点尺寸例如为5mmφ。如果照射点尺寸变大,那么即使从光照射面F1反射的光的扩散分量多,测定面也被平均化,能够进行稳定的测定。另外,通过拉近聚光透镜12D与膜片F的距离,能够使投射光纤12接近膜片F侧,使测定部10小型化。
另外,图4是第一实施方式所涉及的测定装置100的测定部10附近的放大图。测定部10还可以具有将积分球11的开口面11A的周围包围的遮蔽部件16。遮蔽部件16遮蔽以防外界光L进入积分球11内。外界光L为测定数据的扰动的原因。遮蔽部件16例如使照射到积分球11的开口面11A的外界光L的照度为1.0 Lux以下。
遮蔽部件16例如具有支撑板16A和遮蔽板16B。支撑板16A支撑遮蔽板16B。支撑板16A沿着积分球11的外表面扩展。遮蔽板16B遮蔽以防外界光L进入积分球11内。遮蔽板16B例如从积分球11的外表面立起。被遮蔽板16B包围的区域的面积例如可以随着朝向膜片F而变小。遮蔽板16B的内径朝向膜片F缩小直径,从而能够进一步抑制外界光L向积分球11的入射。另外例如,遮蔽板16B的一部分还可以与膜片F保持一定的距离,沿膜片F延伸。
另外,如图5所示,还可以在包围积分球11的框体15设置遮蔽部件16。遮蔽部件16没有直接设在积分球11。例如,在将积分球11设于框体15的情况下,在框体15的开口部15A周围设置遮蔽部件16。
减少进入积分球11内的外界光L的手段不限于遮蔽部件16。例如,还可以使由隔壁150包围的真空环境全部暗室化。另外例如,如图6所示,还可以设置将测定部10和支撑体30包围的外壳B。照射到积分球15的开口面15A的外界光的照度例如优选为1.0 Lux以下,更优选为0.3 Lux以下。
移动机构20使测定部10沿y方向移动。测定部10例如能够跨膜片F的宽度方向、第一校正板41及第二校正板42而移动。移动机构20例如是去往y方向的直线移动机构。移动机构20例如为线性促动器、滚珠丝杠。
图7是第一实施方式所涉及的测定装置100的支撑体30及校正板40的示意图。支撑体30例如具有辊31和轴心32。辊31沿y方向延伸,以轴心32作为中心而旋转。膜片F被沿着辊31的外表面运送。
辊31例如反射率为1.0%以下,优选为小于0.4%。辊31的反射率低,从而能够抑制从投射光纤12照射到膜片F的光在辊31的表面处反射。来自辊31的表面的反射光是来自测定对象的膜片F以外的反射,成为外界光L的一种原因。
另外,辊31例如为黑色的橡胶辊、金属辊。辊31例如优选为金属制的黑色辊。金属制的黑色辊例如为经过耐酸铝处理的金属辊、铬制的金属辊、经过镀黑处理的金属辊。镀层例如为镀铬、镀锌、镀镍。
图8是将辊的反射率的演变示出的曲线图。图8(a)是使用前的橡胶辊的反射率,图8(b)是使用后的橡胶辊的反射率,图8(c)是使用前的金属制黑色辊的反射率,图8(d)是使用后的金属制黑色辊的反射率。使用后例如是指将膜片F运送40万米后的橡胶辊或黑色辊。曲线图的横轴是辊31的y方向的位置,纵轴是辊31的周向方向的四个不同点(A、B、C、D)的反射率。四个不同点(A、B、C、D)分别以辊31的轴心32为中心各自错开90°。
如图8所示,橡胶辊的使用前的反射率的平均值为0.45,使用后的反射率的平均值增加至1.22。相对于此,金属制黑色辊的使用前的反射率的平均值为0.27,使用后的反射率的平均值为0.29。金属制黑色辊的反射率变化小,能够进行稳定的测定。另外,金属制黑色辊中,成膜碎屑的残余物的附着少,能够降低对膜片F的不良影响。
另外,轴心32也例如反射率为1.0%以下,优选为小于0.4%。通过降低轴心32的反射率,能够降低入射到积分球15的外界光L。轴心32例如为对表面进行了黑色加工的金属。
在图8中示出了支撑体30具有辊31的例子,但支撑体不限于本例。例如,图9是第一实施方式所涉及的测定装置的支撑体的另一例的示意图。图9所示的支撑体35对膜片F的光照射面F1,支撑光照射面F1的相反侧的面。支撑体35例如反射率为1.0%以下,优选为小于0.4%。
校正板40例如具有第一校正板41和第二校正板42(参照图7)。第一校正板41及第二校正板42例如处于所运送的膜片F的y方向的侧方。第一校正板41是用于参考测定的标准反射板。第二校正板42用于暗度测定。
通过另行设置第二校正板42,能够进行与膜片F的测定环境几乎相同的环境下的暗度测定。
通过将第一校正板41及第二校正板42设置在膜片F的侧方,从而易于定期地进行校正。例如,在以卷对卷(roll to roll)成膜的长尺寸膜片的情况下,有时候如果例如温度等各种条件变化,则校正混乱,定期的校正是重要的。
图10是第一实施方式所涉及的测定装置100的校正板40的侧视图。第一校正板41与来自测定部10的光的照射方向正交。来自测定部10的光的照射方向是指例如与积分球15的开口面15A正交的方向。第二校正板42相对于与来自测定部10的光的照射方向正交的假想面而倾斜。通过使第二校正板42相对于假想面倾斜,能够抑制第二校正板42处的反射光返回测定部10,能够进一步降低外界光L的影响。
如上所述,根据第一实施方式所涉及的测定装置100,能够高精度地测定运送膜片的任意部位的光学特性。另外,根据第一实施方式所涉及的成膜装置200,在制造途中也能够测定膜片F的光学特性,能够将其结果反馈至成膜部110中的成膜条件。
另外,在宽度大的膜片F的情况下,有时候根据宽度方向的场所,成膜条件波动。测定部10能够沿膜片F的宽度方向移动,从而能够评估宽度方向上的成膜条件的波动。另外,通过将该评估结果反馈至成膜部110,能够针对膜片F的宽度方向的各位置改变成膜条件,能够制作光学特性更均匀的膜片。
符号说明
10 测定部
11 框体
12 投射光纤
13 接受光纤
12A、13A 光纤
12B、13B 固定部
12C 光投射部
13C 光接受部
12D 聚光透镜
15 积分球
15A 开口面
16 遮蔽部件
16A 支撑板
16B 遮蔽板
20 移动机构
30、35 支撑体
31 辊
32 轴心
40 校正板
41 第一校正板
42 第二校正板
100 测定装置
110 测定部
120 分光器
130 运算部
140 驱动装置
141 控制部
141 马达
150 间隔壁
200 成膜装置。

Claims (6)

1. 一种测定装置,具备:
测定部,其对膜片照射光,测定由所述膜片透射或反射的光;以及
移动机构,其使所述测定部能够沿与所述膜片的运送方向交叉的第一方向移动,
所述测定部具有对所述膜片照射光的光投射部、将来自所述膜片的光聚光的积分球、以及接受由所述积分球聚光的光的光接受部。
2.根据权利要求1所述的测定装置,其中,所述积分球与所述膜片不接触。
3. 根据权利要求1或2所述的测定装置,其中,照射到所述积分球开口面的外界光的照度为1.0 Lux以下。
4.根据权利要求1至3中的任一项所述的测定装置,
还具备支撑体,该支撑体从与所述膜片的光照射面相反的一侧支撑所述膜片,
所述支撑体的反射率为1.0%以下。
5.根据权利要求1至4中的任一项所述的测定装置,其中,在所述膜片的所述第一方向的侧方,还具备校正板。
6.一种成膜装置,具备:
成膜部,其在真空中对膜片成膜;
权利要求1至5中的任一项所述的测定装置,其测定在所述成膜部成膜的膜片;
分光器,其对在所述测定装置的光接受部接受的光进行分光;以及
运算部,其基于所述分光器的测定结果,评估成膜于所述膜片的膜,将成膜条件反馈至所述成膜部。
CN202110124529.4A 2020-02-12 2021-01-29 测定装置及成膜装置 Pending CN113252304A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-021413 2020-02-12
JP2020021413A JP6751214B1 (ja) 2020-02-12 2020-02-12 測定装置及び成膜装置

Publications (1)

Publication Number Publication Date
CN113252304A true CN113252304A (zh) 2021-08-13

Family

ID=72276771

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110124529.4A Pending CN113252304A (zh) 2020-02-12 2021-01-29 测定装置及成膜装置

Country Status (4)

Country Link
US (1) US11543359B2 (zh)
JP (2) JP6751214B1 (zh)
KR (2) KR102235915B1 (zh)
CN (1) CN113252304A (zh)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2821103A (en) * 1952-10-30 1958-01-28 Centre Nat Rech Scient Micro-photometry
US3488117A (en) * 1967-05-08 1970-01-06 Berkey Photo Inc High speed color enlarger with integrating spheres
JP2000199731A (ja) * 1999-01-06 2000-07-18 Sony Corp 光学特性測定装置及びその光学特性測定装置を備える成膜装置
JP2002236076A (ja) * 2001-02-08 2002-08-23 Sony Corp 光学特性測定装置及び光学薄膜成膜装置
CN1815138A (zh) * 2005-02-04 2006-08-09 欧姆龙株式会社 薄膜检查装置以及薄膜检查方法
CN102565005A (zh) * 2010-12-24 2012-07-11 株式会社堀场制作所 光学测量装置和光学测量方法
CN103403531A (zh) * 2010-12-22 2013-11-20 皇家飞利浦电子股份有限公司 用于测试发光薄膜的方法和装置
US20180364160A1 (en) * 2015-12-11 2018-12-20 Dsm Ip Assets B.V. System and method for optical measurement on a transparent sheet
CN110500963A (zh) * 2018-05-18 2019-11-26 大塚电子株式会社 光学测定装置以及光学测定方法

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59779B2 (ja) * 1977-01-20 1984-01-09 株式会社京都第一科学 尿等の分析方法
CH667528A5 (de) 1985-03-15 1988-10-14 Alusuisse Verfahren zum bestimmen der dicke von transparenten lackschichten und vorrichtung zu dessen ausfuehrung.
US5182618A (en) * 1985-11-27 1993-01-26 Aimo Heinonen Reflectometric method of measurement and apparatus for realizing the method
JPS62228946A (ja) 1986-03-31 1987-10-07 Toray Ind Inc フイルムの表面特性測定方法及びその装置
IE65900B1 (en) * 1988-10-15 1995-11-29 Satake Eng Co Ltd Apparatus for evaluating quality of raw coffee beans
US4873430A (en) * 1988-10-25 1989-10-10 International Business Machines Corporation Method and apparatus for optically measuring characteristics of a thin film by directing a P-polarized beam through an integrating sphere at the brewster's angle of the film
US20020015146A1 (en) 1997-09-22 2002-02-07 Meeks Steven W. Combined high speed optical profilometer and ellipsometer
US6392749B1 (en) 1997-09-22 2002-05-21 Candela Instruments High speed optical profilometer for measuring surface height variation
US6275295B1 (en) * 1999-04-30 2001-08-14 Midwest Research Institute Optical system for determining physical characteristics of a solar cell
WO2004090488A1 (en) * 2003-03-27 2004-10-21 The Sherwin-Williams Company Color compison for control of wood stain production
US20070046944A1 (en) * 2005-08-23 2007-03-01 Samsung Electro-Mechanics Co., Ltd. Method of measuring haze and apparatus thereof
JP2008049604A (ja) 2006-08-25 2008-03-06 Toray Ind Inc 透明な積層体の製造方法及びその製造装置
DE112007000650B4 (de) * 2006-10-30 2012-04-12 Von Ardenne Anlagentechnik Gmbh Lichtsender, Lichtempfänger und Messeinrichtung zur Messung optischer Eigenschaften transparenter Substrate
DE102009040642B3 (de) * 2009-09-09 2011-03-10 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur Messung von optischen Kenngrößen transparenter, streuender Messobjekte
JP5630183B2 (ja) * 2009-11-27 2014-11-26 コニカミノルタ株式会社 白色校正部材およびそれを用いた光学特性測定システム
JP5491368B2 (ja) * 2010-11-29 2014-05-14 浜松ホトニクス株式会社 量子収率測定装置及び量子収率測定方法
DE102011077290A1 (de) * 2011-06-09 2012-12-13 Carl Zeiss Microimaging Gmbh Messverfahren und Messvorrichtung zur Ermittlung von Transmissions- und/oder Reflektionseigenschaften
JP2013168534A (ja) * 2012-02-16 2013-08-29 Panasonic Corp 樹脂塗布装置および樹脂塗布方法
JP5529305B1 (ja) 2013-02-04 2014-06-25 浜松ホトニクス株式会社 分光測定装置、及び分光測定方法
US9423346B2 (en) * 2014-03-14 2016-08-23 Datacolor Holding Ag System and method for haze measurement
JP2017523312A (ja) * 2014-05-16 2017-08-17 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated 基板上の材料を処理するための装置、及び基板上で処理される材料の光学特性を測定するための方法
US9574993B2 (en) * 2014-06-24 2017-02-21 Shimadzu Corporation Method and apparatus for analyzing the concentration of materials in suspension
CN104501960B (zh) 2014-12-16 2016-07-06 杭州彩谱科技有限公司 一种基于led光源的分光测色仪及其实现方法
JP6204416B2 (ja) * 2015-07-17 2017-09-27 住友化学株式会社 フィルム検査装置、フィルム検査方法、およびフィルム製造方法
US11306392B2 (en) 2016-06-07 2022-04-19 Nitto Denko Corporation Method for producing optical film
JP6394825B1 (ja) 2018-02-08 2018-09-26 横河電機株式会社 測定装置および測定方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2821103A (en) * 1952-10-30 1958-01-28 Centre Nat Rech Scient Micro-photometry
US3488117A (en) * 1967-05-08 1970-01-06 Berkey Photo Inc High speed color enlarger with integrating spheres
JP2000199731A (ja) * 1999-01-06 2000-07-18 Sony Corp 光学特性測定装置及びその光学特性測定装置を備える成膜装置
JP2002236076A (ja) * 2001-02-08 2002-08-23 Sony Corp 光学特性測定装置及び光学薄膜成膜装置
CN1815138A (zh) * 2005-02-04 2006-08-09 欧姆龙株式会社 薄膜检查装置以及薄膜检查方法
CN103403531A (zh) * 2010-12-22 2013-11-20 皇家飞利浦电子股份有限公司 用于测试发光薄膜的方法和装置
CN102565005A (zh) * 2010-12-24 2012-07-11 株式会社堀场制作所 光学测量装置和光学测量方法
US20180364160A1 (en) * 2015-12-11 2018-12-20 Dsm Ip Assets B.V. System and method for optical measurement on a transparent sheet
CN110500963A (zh) * 2018-05-18 2019-11-26 大塚电子株式会社 光学测定装置以及光学测定方法

Also Published As

Publication number Publication date
JP7434100B2 (ja) 2024-02-20
KR20210102863A (ko) 2021-08-20
KR102235915B1 (ko) 2021-04-06
JP2021128015A (ja) 2021-09-02
JP6751214B1 (ja) 2020-09-02
US11543359B2 (en) 2023-01-03
US20210247322A1 (en) 2021-08-12
JP2021128142A (ja) 2021-09-02

Similar Documents

Publication Publication Date Title
US8259294B2 (en) Method and device for measuring optical characteristic variables of transparent, scattering measurement objects
US20180364160A1 (en) System and method for optical measurement on a transparent sheet
CN100339700C (zh) 偏光膜的检查方法及检查装置
CN106933066B (zh) 曝光装置、利用该曝光装置的器件制造系统和器件制造方法以及图案曝光方法
KR20070009479A (ko) 샘플 움직임에 의한 x-선 측정의 분해능 향상
US20170088941A1 (en) Apparatus for processing of a material on a substrate and method for measuring optical properties of a material processed on a substrate
WO2012083428A1 (en) Single-sided infrared sensor for thickness or weight measurement of products containing a reflective layer
KR101124933B1 (ko) 계측 장치, 계측 방법, 노광 장치 및 디바이스 제조 방법
CN113252304A (zh) 测定装置及成膜装置
CN113267130B (zh) 一种线扫描膜厚测量系统
CN111373244A (zh) 确定透明膜上的涂层性质的方法和装置以及制造电容器膜的方法
JP6520795B2 (ja) 膜厚分布測定方法
CN111060038A (zh) 一种膜表面平整度的检测装置及方法
JPWO2008136111A1 (ja) 表面検査装置及び方法
US20220291140A1 (en) Defect inspection device and defect inspection method
KR101421882B1 (ko) 코팅 치수 측정 장치
WO2019192681A1 (en) Apparatus, system and method for aligning a substrate
JP3860202B2 (ja) 透光性シート状物の欠陥検査装置
KR20220057710A (ko) 광학 검사 모듈이 구비된 롤투롤 진공 증착 장치
WO2017141299A1 (ja) 膜厚分布測定方法
EP4318132A1 (en) Contamination measurement
CN110941138B (zh) 异物检查装置、曝光装置以及物品制造方法
US11226234B2 (en) Spectrum shaping devices and techniques for optical characterization applications
JP2003106816A (ja) 膜厚測定方法及び装置
CN117148461A (zh) X射线检查装置以及x射线检查方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination