CN113242845A - 陶瓷材料、层和层体系 - Google Patents

陶瓷材料、层和层体系 Download PDF

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CN113242845A
CN113242845A CN201980082905.9A CN201980082905A CN113242845A CN 113242845 A CN113242845 A CN 113242845A CN 201980082905 A CN201980082905 A CN 201980082905A CN 113242845 A CN113242845 A CN 113242845A
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oxide
mol
layer
ceramic material
ceramic
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阿尔图罗·弗洛勒斯伦特里亚
维尔纳·施塔姆
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Siemens Energy Global GmbH and Co KG
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Abstract

通过具有稳定剂即氧化钇以及材料即氧化铒或氧化镱中的至少一种材料的陶瓷材料，显示出用于陶瓷层和陶瓷层体系的陶瓷材料的烧结稳定的相，所述陶瓷材料即使在高温使用时也长时间具有机械和热学特性。

Description

陶瓷材料、层和层体系
技术领域
本发明涉及一种具有稳定剂的基于氧化锆的陶瓷材料、一种层和一种由所述层构成的层体系。
背景技术
涡轮叶片或一般用于高温使用的部件常常设有热障涂层。这主要是完全或部分地稳定的基于氧化锆陶瓷隔热层或基于烧绿石，例如锆酸钆的陶瓷隔热层。
除了低的热导率以外，对陶瓷隔热层的要求是高的断裂韧性和低的烧结特性，以便随着时间过去也能够经得起机械负荷。
发明内容
因此，本发明的目的是，示出一种解决该问题的陶瓷材料。
所述目的通过根据权利要求1所述的陶瓷材料、根据权利要求12所述的层和根据权利要求15所述的层体系实现。
附图说明
图1、2示意性地示出基于本发明的层体系。
具体实施方式
所述附图和说明代表实施例。
所述陶瓷材料具有四方的和立方的晶体结构，这与稳定剂即氧化钇的份额相关。四方相通过氧化钇的份额来稳定。
基于氧化锆(ZrO2)的陶瓷材料含有氧化钇(Y2O3)以及至少一种另外的，尤其两种，更尤其仅两种另外的氧化物，所述另外的氧化物选自：氧化铒(Er2O3)和氧化镱(Yb2O3)，其优选用作为稳定剂。
可选地，存在至少一种另外的氧化物，尤其至少两种另外的氧化物，其份额尤其为至少0.1mol％，尤其为至少0.5mol％，并且尤其为最大5mol％，所述另外的氧化物选自：氧化铪(HfO2)、氧化铈(CeO2)、氧化钙(CaO)和/或氧化镁(MgO)，它们的。
氧化钇(Y2O3)的份额优选为2.0mol％-3.9mol％，尤其为2.5mol％-3.5mol％。
优选地，使用2.1mol％-4.9mol％的氧化铒(Er2O3)和/或氧化镱(Yb2O3)，尤其2.5mol％-4.5mol％的氧化铒(Er2O3)和/或氧化镱(Yb2O3)。
氧化镱(Yb2O3)的份额优选为3.5mol％氧化镱(Yb2O3)。
氧化钇(Y2O3)的份额优选为3.0mol％氧化钇(Y2O3)。
实施例(非排它性)是：
ZrO2/Y2O3/Yb2O3+
-HfO2
-CeO2
-CaO
-MgO
-CeO2+CaO
-CeO2+MgO
-CaO+MgO
-HfO2+CeO2
-HfO2+CaO
-HfO2+MgO
-CeO2+CaO+MgO
-HfO2+CaO+MgO
-HfO2+CeO2+MgO
-HfO2+CeO2+CaO
-HfO2+CeO2+CaO+MgO
由这种陶瓷材料能够制造陶瓷层。现有技术中的所有覆层方法都能够用于创建层，例如等离子喷涂，(APS、VPS、LPPS…)或HVOF。
由这种陶瓷材料构成的陶瓷层的厚度尤其是20μm，尤其200μm至2000μm，并且通过大气等离子体喷涂制造。同样地，所述层也能够通过EBPVD方法制造，并且于是优选具有20μm至100μm的层厚度。
所述陶瓷层在层体系中能够作为单层(图1)或双层(图2)施加。
图1示出由基板4构成的层体系1。基板4优选是金属的并且优选是镍基或钴基超级合金。同样地，基板4能够陶瓷地构成，尤其具有CMC材料。
在基板4上存在结合层7。在金属材料的情况下，这优选是NiCoCrAlY层7。
然后，在结合层7上存在由根据本发明的陶瓷材料构成的单层10。
图2示出另一层体系1’，其中所述单层被由内层16和外层19构成的双层13替代，所述内层尤其基于钇-部分稳定的氧化锆，但是不同于外层的材料，所述外层基于根据本发明的陶瓷材料。
位于下部的陶瓷结合层16优选是部分稳定的氧化钇-氧化锆层，尤其具有3mol％-4mol％的氧化钇(Y2O3)。
在这两种情况下(图1、2)，至少外部的陶瓷层10、19能够是分区段的(DVC)。

Claims (17)

1.一种基于氧化锆(ZrO2)的陶瓷材料，所述陶瓷材料具有氧化钇(Y2O3)和至少一种另外的氧化物，所述另外的氧化物选自：
氧化铒(Er2O3)和氧化镱(Yb2O3)，以及
可选地
所述陶瓷材料具有至少一种另外的氧化物，尤其至少两种另外的氧化物，所述另外的氧化物选自：
氧化铪(HfO2)、氧化铈(CeO2)、氧化钙(CaO)和/或氧化镁(MgO)，
其份额尤其为至少0.1mol％，
尤其为至少0.5mol％，和
尤其为最大5mol％，
尤其地，所述陶瓷材料由以上物质构成。
2.根据权利要求1所述的陶瓷材料，其中氧化钇(Y2O3)、氧化铒(Er2O3)和氧化镱(Yb2O3)用作为氧化物，
可选地
所述陶瓷材料具有至少一种另外的氧化物，
尤其具有至少两种另外的氧化物，
所述另外的氧化物选自：
氧化铪(HfO2)、氧化铈(CeO2)、氧化钙(CaO)和/或氧化镁(MgO)，
尤其仅具有这些氧化物。
3.根据权利要求1所述的陶瓷材料，其中氧化钇(Y2O3)和氧化铒(Er2O3)用作为氧化物，
可选地
具有至少一种另外的氧化物，
尤其至少两种另外的氧化物，
所述另外的氧化物选自：
氧化铪(HfO2)、氧化铈(CeO2)、氧化钙(CaO)和/或氧化镁(MgO)，
尤其仅具有这些氧化物。
4.根据权利要求1所述的陶瓷材料，其中氧化钇(Y2O3)和氧化镱(Yb2O3)用作为氧化物，
可选地
具有至少一种另外的氧化物，
尤其至少两种另外的氧化物，
所述另外的氧化物选自：
氧化铪(HfO2)、氧化铈(CeO2)、氧化钙(CaO)和/或氧化镁(MgO)，
尤其仅具有这些氧化物。
5.根据权利要求1至4中的一项或多项所述的陶瓷材料，所述陶瓷材料具有4.0mol％-16mol％的氧化钇(Y2O3)，尤其6.0mol％-16mol％的氧化钇(Y2O3)。
6.根据权利要求1至4中的一项或多项所述的陶瓷材料，所述陶瓷材料具有2.0mol％-3.9mol％的氧化钇(Y2O3)，尤其2.5mol％-3.5mol％的氧化钇(Y2O3)。
7.根据权利要求1、2、3、4、5或6中的一项或多项所述的陶瓷材料，所述陶瓷材料具有2.0mol％-40mol％的氧化铒(Er2O3)和/或氧化镱(Yb2O3)，尤其5mol％-32mol％的氧化铒(Er2O3)和/或氧化镱(Yb2O3)。
8.根据权利要求1、2、3、4、5或6中的一项或多项所述的陶瓷材料，所述陶瓷材料具有2.1mol％-4.9mol％的氧化铒(Er2O3)和/或氧化镱(Yb2O3)，尤其2.5mol％-4.5mol％的氧化铒(Er2O3)和/或氧化镱(Yb2O3)。
9.根据权利要求1、2、3、4、5、6、7或8中的一项或多项所述的陶瓷材料，所述陶瓷材料具有2.5mol％-4.5mol％的氧化镱(Yb2O3)，尤其是3.0mol％-4.0mol％的氧化镱(Yb2O3)，
和
2.0mol％-4.0mol％的氧化钇(Y2O3)，尤其2.5mol％-3.5mol％的氧化钇(Y2O3)。
10.根据权利要求1、2、3、5、6、7、8或9中的一项或多项所述的陶瓷材料，所述陶瓷材料具有3.5mol％的氧化镱(Yb2O3)。
11.根据权利要求1、2、4、5、6、7、8、9或10中的一项或多项所述的陶瓷材料，所述陶瓷材料具有3.0mol％的氧化钇(Y2O3)。
12.一种陶瓷层，所述陶瓷层具有根据权利要求1至11中的一项或多项所述的陶瓷材料，
所述陶瓷层尤其由根据权利要求1至11中的一项或多项所述陶瓷材料构成。
13.根据权利要求12所述的陶瓷层，所述陶瓷层通过APS制造，并且
所述陶瓷层尤其具有20μm至2000μm的层厚度。
14.根据权利要求12所述的陶瓷层，所述陶瓷层通过EB-PVD制造，并且
所述陶瓷层尤其具有20μm至1000μm的层厚度。
15.一种层体系，所述层体系至少具有：
基板(4)，
所述基板是金属或陶瓷的；
结合层(7)，
所述结合层是金属的或陶瓷的；
由根据权利要求1至11中一项或多项所述的陶瓷材料构成的至少一个层(10、19)或根据权利要求12至14中的一项或两项所述的陶瓷层。
16.根据权利要求15所述的层体系，其中在外层(19)之间存在陶瓷结合层(16)，
尤其其中所述结合层(17)具有部分稳定的氧化锆，尤其由部分稳定的氧化锆构成。
17.根据权利要求15或16所述的层体系，其中至少外部的陶瓷层(19)是分区段的。
CN201980082905.9A 2018-12-17 2019-11-19 陶瓷材料、层和层体系 Pending CN113242845A (zh)

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