CN113215546A - 一种检验科用金属器皿表面处理方法 - Google Patents

一种检验科用金属器皿表面处理方法 Download PDF

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CN113215546A
CN113215546A CN202110540579.0A CN202110540579A CN113215546A CN 113215546 A CN113215546 A CN 113215546A CN 202110540579 A CN202110540579 A CN 202110540579A CN 113215546 A CN113215546 A CN 113215546A
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王燕
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    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/067—Borides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
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Abstract

本发明公开了一种检验科用金属器皿表面处理方法，所述金属器皿表面沉积ZnCrFB+AgTaN+Ag复合纳米涂层，ZnCrFB、AgTaN、Ag单层厚度不超过100nm，该复合涂层采用磁控溅射方法制备。本发明的金属器皿表面能够增强抑菌性、疏水性和耐腐蚀性，可用于存储液体样本及废弃物，提高其使用寿命。

Description

一种检验科用金属器皿表面处理方法
技术领域
本发明属于医用器皿表面改性技术领域，涉及了一种检验科用金属器皿表面处理方法。
背景技术
金属器皿是检验科储存液体样本常用器具，为防止样本污染及提高检验精度，必须尽量提高器皿抑菌性能。抗菌涂层材料已被广泛应用于医用设备，能够起到良好的抗菌、抑菌作用。目前，在医用器具表面涂层一般采用有机抗菌剂，虽然具有一定抗菌效果，但抑菌率低，功能单一，其抑菌性能有待于提高。
中国专利“申请号201711295934.2”报道了一种医用设备专用表面疏水抗菌涂层及其制备工艺，通过等离子喷涂技术将疏水抗菌涂层喷到医用设备表面，实现抑菌、疏水、耐磨、耐腐和除味的作用。中国专利“申请号202010628351.2”报道了一种钛合金表面载碘抗菌涂层制备方法和应用，通过微弧阳极氧化形成多孔生物活性膜，在钛合金表面注入非金属物质如聚维酮碘和碘化物以获得持久的抗菌性；中国专利“申请号201610556339.9”报道了一种疏水抗菌涂层的制备方法，将粉体改性和油性分散液制备一步完成，实现疏水抑菌薄膜涂层的制备。
发明内容
技术问题：本发明的目的在于克服上述现有技术的不足，提供一种检验科用金属器皿表面处理方法，该方法能够增强金属器皿表面抑菌性、疏水性和腐蚀性能，提高其使用寿命。
技术方案：为实现上述目的，本发明通过以下方案实施。
一种检验科用金属器皿表面处理方法，在金属器皿表面沉积ZnCrFB+AgTaN+Ag复合纳米涂层。所述纳米涂层由基体到表面依次为ZnCrFB、AgTaN、Ag层，且ZnCrFB、AgTaN、Ag单层厚度不超过100nm。
上述检验科用金属器皿表面处理方法中，ZnCrFB+AgTaN+Ag复合纳米涂层采用磁控溅射的方法制备。
上述的一种检验科用金属器皿表面处理方法，所述ZnCrFB+AgTaN+Ag复合纳米涂层具体制备步骤如下：
(1)将金属器皿分别放在去离子水和酒精溶液中超声清洗20-30min，干燥后进行表面涂层处理。
(2)将干燥后的金属器皿放入镀膜机真空室，真空室本底真空为6.0×10-3-9.0×10-3Pa，加热至150-220℃，保温时间20-30min。
(3)通入Ar气，其压力为0.5-0.8Pa，开启偏压电源，电压600-800V，占空比0.2-0.3，辉光放电清洗20-30min；偏压降低至100-120V，开启离子源离子清洗20-30min。
(4)开启ZnCrFB复合靶电源，偏压80-95V，靶电流15-17A，磁控溅射沉积ZnCrFB涂层1.0-5.0min，使ZnCrFB涂层厚度为10-100nm，关闭ZnCrFB复合靶。
(5)调整工作气压为0.4-0.5Pa，开启中频AgTaN复合靶，调整电流12-13A，磁控溅射沉积AgTaN涂层1.0-5.0min，使AgTaN涂层厚度为10-100nm，关闭AgTaN复合靶。
(6)调整工作气压至0.3-0.4Pa，偏压至75-80V，开启Ag靶材，电流调制20-25A，磁控溅射沉积Ag涂层0.5-3.0min，使Ag涂层厚度为10-50nm，关闭Ag靶。
(7)关闭所有靶材、偏压电源、离子源及气体源，保温30-40min，涂层结束。
有益效果：与现有技术相比，本发明的金属器皿表面处理方法可实现自动化，工艺简单，所制备的复合涂层具有良好的抑菌、抗菌作用，克服单一涂层功能单一缺点，提高了抑菌率；同时，所制备的复合涂层具有良好的疏水性能，能够提高金属器皿表面耐腐蚀性，提高金属器皿的使用寿命。
附图说明
图1为本发明的一种检验科用金属器皿表面处理方法制得涂层结构示意图；其中：1为金属基体，2为ZnCrFB涂层，3为AgTaN涂层，4为Ag涂层。
具体实施方式
实例1：
一种检验科用金属器皿表面处理方法，在金属器皿表面沉积ZnCrFB+AgTaN+Ag复合纳米涂层。所述纳米涂层由基体到表面依次为ZnCrFB、AgTaN、Ag层，且ZnCrFB、AgTaN、Ag单层厚度为10nm。
上述检验科用金属器皿表面处理方法中，ZnCrFB+AgTaN+Ag复合纳米涂层采用磁控溅射的方法制备，所述ZnCrFB+AgTaN+Ag复合纳米涂层具体制备步骤如下：
(1)将金属器皿分别放在去离子水和酒精溶液中超声清洗20min，干燥后进行表面涂层处理。
(2)将干燥后的金属器皿放入镀膜机真空室，真空室本底真空为6.0×10-3Pa，加热至150℃，保温时间20min。
(3)通入Ar气，其压力为0.5Pa，开启偏压电源，电压600V，占空比0.2，辉光放电清洗20min；偏压降低至100V，开启离子源离子清洗20min。
(4)开启ZnCrFB复合靶电源，偏压80V，靶电流15A，磁控溅射沉积ZnCrFB涂层1.0min，使ZnCrFB涂层厚度为10nm，关闭ZnCrFB复合靶。
(5)调整工作气压为0.4Pa，开启中频AgTaN复合靶，调整电流12A，磁控溅射沉积AgTaN涂层1.0min，使AgTaN涂层厚度为10nm，关闭AgTaN复合靶。
(6)调整工作气压至0.3Pa，偏压至75V，开启Ag靶材，电流调制20A，磁控溅射沉积Ag涂层0.5min，使Ag涂层厚度为10nm，关闭Ag靶。
(7)关闭所有靶材、偏压电源、离子源及气体源，保温30min，涂层结束。
实例2：
一种检验科用金属器皿表面处理方法，在金属器皿表面沉积ZnCrFB+AgTaN+Ag复合纳米涂层。所述纳米涂层由基体到表面依次为ZnCrFB、AgTaN、Ag层，且ZnCrFB、AgTaN、Ag单层厚度为100nm。
上述检验科用金属器皿表面处理方法中，ZnCrFB+AgTaN+Ag复合纳米涂层采用磁控溅射的方法制备，所述ZnCrFB+AgTaN+Ag复合纳米涂层具体制备步骤如下：
(1)将金属器皿分别放在去离子水和酒精溶液中超声清洗30min，干燥后进行表面涂层处理。
(2)将干燥后的金属器皿放入镀膜机真空室，真空室本底真空为9.0×10-3Pa，加热至220℃，保温时间30min。
(3)通入Ar气，其压力为0.8Pa，开启偏压电源，电压800V，占空比0.3，辉光放电清洗30min；偏压降低至120V，开启离子源离子清洗30min。
(4)开启ZnCrFB复合靶电源，偏压95V，靶电流17A，磁控溅射沉积ZnCrFB涂层5.0min，使ZnCrFB涂层厚度为100nm，关闭ZnCrFB复合靶。
(5)调整工作气压为0.5Pa，开启中频AgTaN复合靶，调整电流13A，磁控溅射沉积AgTaN涂层5.0min，使AgTaN涂层厚度为100nm，关闭AgTaN复合靶。
(6)调整工作气压至0.4Pa，偏压至80V，开启Ag靶材，电流调制25A，磁控溅射沉积Ag涂层3.0min，使Ag涂层厚度为50nm，关闭Ag靶。
(7)关闭所有靶材、偏压电源、离子源及气体源，保温40min，涂层结束。

Claims (3)

1.本发明公开了一种检验科用金属器皿表面处理方法，其特征在于：在金属器皿表面沉积ZnCrFB+AgTaN+Ag复合纳米涂层。所述纳米涂层由基体到表面依次为ZnCrFB、AgTaN、Ag层，且ZnCrFB、AgTaN、Ag单层厚度不超过100nm。
2.权利要求1所述的一种检验科用金属器皿表面处理方法，其特征在于：ZnCrFB+AgTaN+Ag复合纳米涂层采用磁控溅射的方法制备。
3.权利要求1或2所述的一种检验科用金属器皿表面处理方法，其特征在于：所述ZnCrFB+AgTaN+Ag复合纳米涂层具体制备步骤如下：
(1)将金属器皿分别放在去离子水和酒精溶液中超声清洗20-30min，干燥后进行表面涂层处理。
(2)将干燥后的金属器皿放入镀膜机真空室，真空室本底真空为6.0×10-3-9.0×10- 3Pa，加热至150-220℃，保温时间20-30min。
(3)通入Ar气，其压力为0.5-0.8Pa，开启偏压电源，电压600-800V，占空比0.2-0.3，辉光放电清洗20-30min；偏压降低至100-120V，开启离子源离子清洗20-30min。
(4)开启ZnCrFB复合靶电源，偏压80-95V，靶电流15-17A，磁控溅射沉积ZnCrFB涂层1.0-5.0min，使ZnCrFB涂层厚度为10-100nm，关闭ZnCrFB复合靶。
(5)调整工作气压为0.4-0.5Pa，开启中频AgTaN复合靶，调整电流12-13A，磁控溅射沉积AgTaN涂层1.0-5.0min，使AgTaN涂层厚度为10-100nm，关闭AgTaN复合靶。
(6)调整工作气压至0.3-0.4Pa，偏压至75-80V，开启Ag靶材，电流调制20-25A，磁控溅射沉积Ag涂层0.5-3.0min，使Ag涂层厚度为10-50nm，关闭Ag靶。
(7)关闭所有靶材、偏压电源、离子源及气体源，保温30-40min，涂层结束。
CN202110540579.0A 2021-05-18 2021-05-18 一种检验科用金属器皿表面处理方法 Pending CN113215546A (zh)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101117700A (zh) * 2006-07-31 2008-02-06 北京有色金属研究总院 金属基带上连续生长的多层立方织构隔离层及制备方法
US9771656B2 (en) * 2012-08-28 2017-09-26 Ut-Battelle, Llc Superhydrophobic films and methods for making superhydrophobic films
CN111155066A (zh) * 2020-01-20 2020-05-15 西安交通大学 一种镀银层的微针阵列及其制备方法
CN112452683A (zh) * 2020-10-19 2021-03-09 赵梓俨 一种红外抗菌涂层及制备方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101117700A (zh) * 2006-07-31 2008-02-06 北京有色金属研究总院 金属基带上连续生长的多层立方织构隔离层及制备方法
US9771656B2 (en) * 2012-08-28 2017-09-26 Ut-Battelle, Llc Superhydrophobic films and methods for making superhydrophobic films
CN111155066A (zh) * 2020-01-20 2020-05-15 西安交通大学 一种镀银层的微针阵列及其制备方法
CN112452683A (zh) * 2020-10-19 2021-03-09 赵梓俨 一种红外抗菌涂层及制备方法

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