CN113121209B - 一种996氧化铝陶瓷基板的制备方法 - Google Patents
一种996氧化铝陶瓷基板的制备方法 Download PDFInfo
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Abstract
本发明涉及陶瓷基板的制备领域,提供一种996氧化铝陶瓷基板的制备方法,解决现有技术的氧化铝陶瓷基板制备过程中噪音大、容易团聚、粒径分布不匀一及纯度不高的缺陷,包括以下制备步骤:(1)改性氧化铝颗粒;(2)球磨处理;(3)真空除泡、流延成型、干燥、脱模得到流延生坯、冲片、排胶、烧结。
Description
技术领域
本发明涉及陶瓷基板的制备领域,尤其涉及一种996氧化铝陶瓷基板的制备方法。
背景技术
陶瓷与金属材料及高分子材料并列为当代固体的三大材料,其在建筑、化工、电气、航天、汽车及生物医学领域均有重要的应用。氧化铝陶瓷作为最常见的陶瓷之一,由于其具有较高的机械强度、硬度、抗损毁性及较高的热导率,在电子技术领域中得到了广泛的应用,例如,被广泛应用作半导体集成电路陶瓷封装管壳、真空电容器的陶瓷管壳、大功率栅控金属陶瓷管等。
氧化铝陶瓷通常以配料或瓷体中的氧化铝的含量来分类,目前分为高纯型和普通型两种。高纯型氧化铝陶瓷系氧化铝含量在99.9%以上的陶瓷材料,普通型氧化铝陶瓷系氧化铝按含量不同分为99瓷、95瓷、90瓷、85瓷等品种,有时氧化铝含量在80%或者75%的也划为普通型氧化铝陶瓷系列。高纯氧化铝陶瓷主要是用于制作高温坩埚、耐火管及特殊耐磨材料,如陶瓷轴承、陶瓷密封件及水阀片等。
世界范围内制备高纯氧化铝陶瓷的原料主要依赖法国BAIKOWSKI、日本住友化学工业和大明化学等公司。他们的粉体平均粒径小,粒度分布均匀,杂质含量极低,适于制备细晶粒或透明氧化铝陶瓷。在制备细晶高强高纯氧化铝陶瓷过程中,对原料粉体的要求非常严格,必须以无团聚的高纯度亚微米或纳米级α-Al2O3粉体为原料。实际上目前报导的细晶高强高纯氧化铝陶瓷几乎完全采用了日本大明化学株式会社生产的TM-DAR型低团聚高烧结活性α-Al2O3粉体为原料。同时为了实现低温烧结、控制晶粒长大,获得高性能氧化铝陶瓷,几乎都是采用热压、热等静压或放电等离子体烧结等特殊烧结工艺,如中国专利CN1304903A提出采用真空热压烧结工艺,在1500~1650℃下烧结得到的氧化铝陶瓷抗弯强度达到610~660MPa。A.Krell则采用热等静压工艺制备出相对密度高于99.95%的亚微米晶氧化铝陶瓷,抗弯强度达到709±49MPa。赵喆(中国专利CN101306943A)和高濂(中国专利CN101624290A)等人都是采用放电等离子体烧结工艺制备出了高性能的氧化铝透明陶瓷。和无压烧结工艺相比,以上工艺需要特殊的烧结设备,投资大成本高,不适合大规模的工业化生产。
另外,现有氧化铝在进行加工生产时,需要利用球磨装置对氧化铝进行研磨作业,将氧化铝研磨成粉末,但是在球磨装置内的研磨球在对氧化铝进行研磨过程中,研磨球与物料的撞击摩擦会产生大量的热量,而被球磨的物料受热容易粘附在料筒的内壁上,而且物料也容易因受热而发生变质,进而影响物料的加工质量。另外,现有的球磨机在制作氧化铝时由于球与物料的撞击,导致噪音污染严重。
中国专利申请号202010975290.7公开了一种高纯氧化铝陶瓷基板的制备方法,包括如下步骤:S1、料浆配制:将重量份数为99-99.5份的高纯氧化铝粉、重量份数为0.5-1份的烧结助剂放入球磨机中,以水为溶剂,加入水溶性分散剂,研磨混合,得到陶瓷料浆;S2、成型:将所述陶瓷料浆真空除泡后装入料浆桶,加入催化剂和引发剂,搅拌均匀,将所述料浆桶接入气源,开启气源对所述料浆桶中的陶瓷料浆施加压力以控制所述料浆桶中的陶瓷料浆通过连通所述料浆桶和模具底部的注浆口的连通管自模具底部的注浆口注入模具内,以使陶瓷料浆在模具内自下而上流动直至陶瓷料浆注满模具,固化后脱模,得到陶瓷坯体;S3、切片:烘干所述陶瓷坯体,将烘干后的陶瓷坯体软化,切制成坯片,自然干燥;S4、烧结:将S3步骤处理后的坯片烧结,复平,得到陶瓷基板。其将料浆由模具底部自下而上注入模具,避免了料浆中比重高的物料沉积到模具底部引起坯体密度差大、成型缺陷大的问题,但是其对物料的球磨并没有进行改进。
发明内容
因此,针对上述的问题,本发明提供一种996氧化铝陶瓷基板的制备方法,解决现有技术的氧化铝陶瓷基板制备过程中噪音大、容易团聚、粒径分布不匀一及纯度不高的缺陷。
为实现上述目的,本发明采用了以下技术方案:一种996氧化铝陶瓷基板的制备方法,包括以下制备步骤:
(1)改性氧化铝颗粒:将氧化铝颗粒与水按1:100-120的重量比混合,超声波分散处理1-2h,接着烘干处理至水分在40-50%,得到半成品,再将半成品送入有机分散体中搅拌2-3h,再室温下放置1-2天,送入离心机离心处理,去除溶剂,烘干,得到表面包裹一层纳米氢氧化铝涂层的亚微米级氧化铝颗粒;
(2)球磨处理:将改性氧化铝颗粒及辅料送入改进型球磨机进行球磨处理;所述改进型球磨机包括卧式筒体,所述卧式筒体内设有研磨球,所述卧式筒体内设有转轴且转轴贯穿筒体的左右两侧设置,所述转轴上间隔设置有复数个搅拌叶片,还包括固定架,所述转轴的横向两端可转动的设置在固定架上,所述固定架的一侧边设置有放置台,所述放置台上设有用于驱动转轴转动的驱动装置,所述卧式筒体具有内壁和外壁,所述内壁和外壁之间具有间隙,间隙内填充有隔音材质,所述卧式筒体的一侧设有通孔,所述卧式筒体内壁沿着圆周方向固设有冷却管,所述卧式筒体内间隔设有3至5个分隔栅栏;所述辅料为溶剂、分散剂、增塑剂、粘结剂、表面活性剂、除泡剂;
(3)真空除泡、流延成型、干燥、脱模得到流延生坯、冲片、排胶、烧结。
进一步的改进是:间隙的长度为1.5-4cm。
进一步的改进是:隔音材质为隔音棉。
进一步的改进是:所述冷却管具有进口端和出口端,所述进口端和出口端均设置在通孔处。
进一步的改进是:所述分隔栅栏为3个,平行间隔设置在卧式筒体内将卧式筒体分隔为4个腔体,各腔体内均有研磨球。
进一步的改进是:所述有机分散体为异丙醇铝与二甲苯的混合液。
进一步的改进是:所述异丙醇铝与二甲苯的用量比以重量份计为1:50-80。
进一步的改进是:烧结后还进行复平处理,所述复平处理采用在基板上压重物的方式,复平处理时的温度控制在1400-1580℃。
进一步的改进是:在复平处理后还进行激光处理,所述激光处理时先在陶瓷基板表面涂抹一层着色剂,接着以氢气作为辅助气体,采用光纤激光器进行激光处理。
进一步的改进是:所述着色剂为胭脂红与酒精按1:100-150的重量比混合而成。
进一步的改进是:球磨处理的具体步骤为:将改性氧化铝颗粒送入球磨机的卧式筒体内,分散在被分隔栅栏分隔而成的各个腔体内,各个腔体内设置有研磨球,通过启动驱动装置,带动转轴转动,搅拌叶片对研磨球和粉体进行搅拌分散,转轴转动带动筒体转动,促使物料被分散和研磨,冷却管从通孔通入筒体环设在筒体内壁,往冷却管内持续通入冷却液使筒体的内壁保持在一个较低的温度,使得物料不容易粘附在筒体内壁。
进一步的改进是:步骤(2)中的分散剂为聚丙烯酸,粘结剂为聚乙烯醇和乳胶以1:2-3的重量比混合而成。
通过采用前述技术方案,本发明的有益效果为:
1、本发明所用的氧化铝为改性的氧化铝颗粒,其是采用超声波处理分散烘干再与有机分散体搅拌离心处理制得,通过改性处理,在氧化铝颗粒的表面包裹一层纳米级的氢氧化铝涂层,使氧化铝颗粒能够稳定的保持单个颗粒而不发生团聚,且每个颗粒仍然能保持较高的表面能和表面活性,使氧化铝在流延成型过程中颗粒与颗粒之间的分散性能较为稳定,提高烧结的致密化。
2、本发明球磨处理时采用改进型球磨机,在筒体的内壁环设冷却管,冷却管内通有冷却液体,有效降低筒体的温度,物料不容易粘附在筒体内壁。
3、筒体具有内壁和外壁,所述内壁和外壁之间具有间隙,间隙内填充有隔音材质,使得研磨时噪音。
4、在筒体内设有几个分隔栅栏,各个分隔栅栏内均有研磨球,使得研磨后粉体的粒径均一。
5、进一步的,本发明以聚乙烯醇和乳胶复配作为粘结剂,单独采用聚乙烯作为粘结剂,制备的浆料粘度高、固含量低,流延处理后干燥速度慢,但是强度高,而单独采用乳胶作为粘结剂时,制备的浆料粘度低、固含量高,流延处理后干燥速度快,但强度低,而本发明以聚乙烯和乳胶复配作为粘结剂,能够发挥两者单独使用时的优点且规避了单独使用时的缺陷。
6、在复平处理后还进行激光处理,所述激光处理时先在陶瓷基板表面涂抹一层着色剂,接着以氢气作为辅助气体,采用光纤激光器进行激光处理,通过在基板表面涂抹一层着色剂再激光处理,能够减小氮化铝陶瓷基板表面对激光的反射,减少断点和断线的出现,以氢气作为辅助气体,避免切割截面和划片截面出现发黑现象。
附图说明
图1是本发明实施例中球磨机的立体图;
图2为图1的剖视图;
图3为本发明实施例中卧式筒体的结构剖视图。
具体实施方式
现结合附图和具体实施方式对本发明进一步说明。
本发明实施例为:
参考图1至图3,一种996氧化铝陶瓷基板的制备方法,包括以下制备步骤:
(1)改性氧化铝颗粒:将氧化铝颗粒与水按1:100的重量比混合,超声波分散处理1.5h,接着烘干处理至水分在40%,得到半成品,再将半成品送入有机分散体中搅拌2h,再室温下放置1天,送入离心机离心处理,去除溶剂,烘干,得到表面包裹一层纳米氢氧化铝涂层的亚微米级氧化铝颗粒,有机分散体为异丙醇铝与二甲苯以1:50的重量比混合而成。
(2)球磨处理:将改性氧化铝颗粒及辅料送入改进型球磨机进行球磨处理;所述改进型球磨机包括卧式筒体1,所述卧式筒体1内设有研磨球2,所述卧式筒体1内设有转轴3且转轴3贯穿筒体1的左右两侧设置,所述转轴3上间隔设置有复数个搅拌叶片4,还包括固定架5,所述转轴3的横向两端可转动的设置在固定架5上,所述固定架5的一侧边设置有放置台6,所述放置台6上设有用于驱动转轴3转动的驱动电机7,所述卧式筒体1具有内壁11和外壁12,所述内壁11和外壁12之间具有间隙,间隙的长度为2cm,间隙内填充有隔音棉8,所述卧式筒体1的一侧设有通孔13,所述卧式筒体1内壁沿着圆周方向固设有冷却管9,所述冷却管具有进口端和出口端,所述进口端和出口端均设置在通孔13处,冷却管从通孔处进入接着环绕设置在卧式筒体1的内壁,通过外接冷却液体,使冷却管中持续充满冷却液,进而对筒体的内壁进行降温,使物料不容易粘附在筒体内壁。所述卧式筒体1内间隔设有三个分隔栅栏10,各个分隔栅栏10平行间隔设置在卧式筒体1内将卧式筒体1分隔为四个腔体,在各个腔体内均设有研磨球。
球磨处理的具体步骤为:将改性氧化铝颗粒送入球磨机的卧式筒体内,分散在被分隔栅栏分隔而成的各个腔体内,各个腔体内设置有研磨球,通过启动驱动装置,带动转轴转动,搅拌叶片对研磨球和粉体进行搅拌分散,转轴转动带动筒体转动,促使物料被分散和研磨,冷却管从通孔通入筒体环设在筒体内壁,往冷却管内持续通入冷却液使筒体的内壁保持在一个较低的温度,使得物料不容易粘附在筒体内壁。
所述辅料为无水乙醇、聚丙烯酸分散剂、领苯二甲酸二丁酯、聚乙烯醇和乳胶以1:2-3的重量比混合而成的粘结剂、表面活性剂、除泡剂;辅料与改性氮化铝颗粒的重量比为0.05:1,以重量份计,无水乙醇:聚丙烯酸分散剂:领苯二甲酸二丁酯:粘结剂:表面活性剂:除泡剂=10:8:3:9:2:1。
(3)真空除泡、流延成型、干燥、脱模得到流延生坯、冲片、排胶、烧结;
(4)复平处理:所述复平处理采用在基板上压重物的方式,复平处理时的温度控制在1400℃。
(5)激光处理:所述激光处理时先在陶瓷基板表面涂抹一层着色剂,所述着色剂为胭脂红与酒精按1:100的重量比混合而成,接着以氢气作为辅助气体,采用光纤激光器进行激光处理。
采用实施例一的方法制得的氧化铝陶瓷基板的技术性能指标如下表:晶粒尺寸:2-5μm,抗弯强度:605Mpa。
尽管结合优选实施方案具体展示和介绍了本发明,但所属领域的技术人员应该明白,在不脱离所附权利要求书所限定的本发明的精神和范围内,在形式上和细节上可以对本发明做出各种变化,均为本发明的保护范围。
Claims (7)
1.一种996氧化铝陶瓷基板的制备方法,其特征在于,包括以下制备步骤:
(1)改性氧化铝颗粒:将氧化铝颗粒与水按1:100-120的重量比混合,超声波分散处理1-2h,接着烘干处理至水分在40-50%,得到半成品,再将半成品送入有机分散体中搅拌2-3h,再室温下放置1-2天,送入离心机离心处理,去除溶剂,烘干,得到表面包裹一层纳米氢氧化铝涂层的亚微米级氧化铝颗粒;
(2)球磨处理:将改性氧化铝颗粒及辅料送入改进型球磨机进行球磨处理;所述改进型球磨机包括卧式筒体,所述卧式筒体内设有研磨球,所述卧式筒体内设有转轴且转轴贯穿筒体的左右两侧设置,所述转轴上间隔设置有复数个搅拌叶片,还包括固定架,所述转轴的横向两端可转动的设置在固定架上,所述固定架的一侧边设置有放置台,所述放置台上设有用于驱动转轴转动的驱动装置,所述驱动装置与转轴的一端连接,所述卧式筒体具有内壁和外壁,所述内壁和外壁之间具有间隙,间隙内填充有隔音材质,所述卧式筒体的一侧设有通孔,所述卧式筒体内壁沿着圆周方向固设有冷却管,所述卧式筒体内间隔设有3至5个分隔栅栏;所述辅料为溶剂、分散剂、增塑剂、粘结剂、表面活性剂、除泡剂;
(3)真空除泡、流延成型、干燥、脱模得到流延生坯、冲片、排胶、烧结;
烧结后还进行复平处理,所述复平处理采用在基板上压重物的方式,复平处理时的温度控制在1400-1580℃;在复平处理后还进行激光处理,所述激光处理时先在陶瓷基板表面涂抹一层着色剂,接着以氢气作为辅助气体,采用光纤激光器进行激光处理;所述着色剂为胭脂红与酒精按1:100-150的重量比混合而成;
球磨处理的具体步骤为:将改性氧化铝颗粒送入球磨机的卧式筒体内,分散在被分隔栅栏分隔而成的各个腔体内,各个腔体内设置有研磨球,通过启动驱动装置,带动转轴转动,搅拌叶片对研磨球和粉体进行搅拌分散,转轴转动带动筒体转动,促使物料被分散和研磨,冷却管从通孔通入筒体环设在筒体内壁,往冷却管内持续通入冷却液使筒体的内壁保持在一个较低的温度,使得物料不容易粘附在筒体内壁;
步骤(2)中的分散剂为聚丙烯酸,粘结剂为聚乙烯醇和乳胶以1:2-3的重量比混合而成。
2.根据权利要求1所述的一种996氧化铝陶瓷基板的制备方法,其特征在于:间隙的长度为1.5-4cm。
3.根据权利要求1所述的一种996氧化铝陶瓷基板的制备方法,其特征在于:隔音材质为隔音棉。
4.根据权利要求1所述的一种996氧化铝陶瓷基板的制备方法,其特征在于:所述冷却管具有进口端和出口端,所述进口端和出口端均设置在通孔处。
5.根据权利要求1所述的一种996氧化铝陶瓷基板的制备方法,其特征在于:所述分隔栅栏为3个,平行间隔设置在卧式筒体内将卧式筒体分隔为4个腔体,各腔体内均有研磨球。
6.根据权利要求1所述的一种996氧化铝陶瓷基板的制备方法,其特征在于:所述有机分散体为异丙醇铝与二甲苯的混合液。
7.根据权利要求6所述的一种996氧化铝陶瓷基板的制备方法,其特征在于:所述异丙醇铝与二甲苯的用量比以重量份计为1:50-80。
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