CN113088892B - Vapor deposition source and vapor deposition device - Google Patents

Vapor deposition source and vapor deposition device Download PDF

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Publication number
CN113088892B
CN113088892B CN202110348544.7A CN202110348544A CN113088892B CN 113088892 B CN113088892 B CN 113088892B CN 202110348544 A CN202110348544 A CN 202110348544A CN 113088892 B CN113088892 B CN 113088892B
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reflecting
shell
assembly
reflection
evaporation
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CN113088892A (en
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牛玉山
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BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
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BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/26Vacuum evaporation by resistance or inductive heating of the source
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The embodiment of the application provides an evaporation source and an evaporation device. This coating by vaporization source includes: the evaporation cavity comprises a shell and an evaporation cavity arranged in the shell; the heating assembly is arranged on the periphery of the shell; the reflecting assembly is arranged on the periphery of the heating assembly, one side of the reflecting assembly, which faces the shell, is provided with a surface with a designed shape, and the reflecting assembly is used for reflecting part of heat of a first area of the heating assembly to a to-be-heated area of the shell, which corresponds to a second area of the heating assembly, and the temperature of the first area is higher than that of the second area. The embodiment of the application can reflect partial heat of a high-temperature area to a low-temperature area, so that the uniformity of the coating film is improved, the stability of a product is improved, and the productivity of a factory is improved.

Description

Vapor deposition source and vapor deposition device
Technical Field
The application relates to the technical field of evaporation, in particular to an evaporation source and an evaporation device.
Background
The manufacture of an Organic Light-Emitting Diode (OLED) device is mainly in a fine metal Mask (FMM Mask) mode, and the OLED material is evaporated on a glass backplane according to a predetermined program by a vacuum thermal evaporation method, and a full-color device is formed by using a pattern on a Mask.
In the evaporation process, the influence of the uniformity of the evaporation coating layer on the product is particularly important in order to ensure the stability of the production. However, the existing evaporation source often has the problem of poor coating uniformity, which leads to serious waste of factory productivity.
Disclosure of Invention
This application provides an evaporation coating source and evaporation coating device to the shortcoming of current mode for solve the relatively poor technical problem of coating film homogeneity that prior art exists.
In a first aspect, an embodiment of the present application provides an evaporation source, including:
the evaporation cavity comprises a shell and an evaporation cavity arranged in the shell;
the heating assembly is arranged on the periphery of the shell;
the reflecting assembly is arranged on the periphery of the heating assembly, one side of the reflecting assembly, which faces the shell, is provided with a surface with a designed shape, and the surface is used for reflecting part of heat of a first area of the heating assembly to a to-be-heated area of the shell, which corresponds to a second area of the heating assembly, and the temperature of the first area is higher than that of the second area.
In one possible implementation, the reflective component includes at least one arc segment or at least one ramp segment, and the surface of the designed shape includes a surface of the at least one arc segment or the at least one ramp segment.
In one possible implementation manner, the surface of the designed shape comprises a wavy surface formed by sequentially connecting at least two circular arc sections; alternatively, the first and second liquid crystal display panels may be,
the surface of the design shape comprises at least two wavy surfaces formed by connecting slope sections in sequence.
In one possible implementation, the reflective assembly is wavy in cross section parallel to the bottom surface of the housing.
In one possible implementation, the radius of the arc segment ranges from 10 mm to 30 mm; alternatively, the first and second liquid crystal display panels may be,
the included angle between the inclined surface section and the corresponding heating component ranges from 10 degrees to 60 degrees.
In one possible implementation, the shell is a square shell, and the evaporation chamber is a square space.
In one possible implementation, the reflective assembly includes at least one first reflective plate and at least one second reflective plate;
the first reflecting plate and the second reflecting plate are arranged oppositely and are arranged along a first direction; the first direction is the length direction of the shell;
the first reflection plate and the second reflection plate have surfaces of a designed shape on the sides facing the housing.
In one possible implementation, the housing is a rectangular housing;
the distance between the first position of the reflecting component and the heating component in the second direction is 10-20 mm; the first position is the position where the reflecting component is closest to the heating component, and the second direction is the width direction of the shell; and/or the presence of a gas in the atmosphere,
the second position of the reflecting component and the heating component are spaced at a distance of 30 mm-40 mm in the second direction, and the second position is the position where the reflecting component and the heating component are farthest away.
In one possible implementation, the reflection assembly includes a reflection plate body and a reflection layer;
the reflecting layer is arranged on one side of the reflecting plate body close to the heating assembly;
the side of the reflective layer facing the housing has a surface of a designed shape.
In a second aspect, an embodiment of the present application provides an evaporation apparatus, including: such as the evaporation source of the first aspect.
The technical scheme provided by the embodiment of the application brings beneficial technical effects that:
the evaporation source of the embodiment of the application is provided with the reflection assembly at the periphery of the heating assembly, one side of the reflection assembly facing the shell is provided with the surface of a designed shape, partial heat of the first area of the heating assembly can be reflected to the to-be-heated area of the shell corresponding to the second area of the heating assembly, equivalently, partial heat of the high-temperature area can be reflected to the low-temperature area, so that all parts of the shell can be heated more uniformly, the uniformity of the coating film is improved, the stability of a product is improved, the problems that continuous production cannot be carried out and equipment is abnormally shut down due to poor uniformity of the coating film are solved, and the productivity of a factory is improved.
Additional aspects and advantages of the present application will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the present application.
Drawings
The above and/or additional aspects and advantages of the present application will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
fig. 1 is a schematic top view of an evaporation source provided in an embodiment of the present application;
fig. 2 is a schematic top view of another evaporation source provided in an embodiment of the present application;
fig. 3 is a schematic diagram of a right-view structure of an evaporation source according to an embodiment of the present disclosure;
fig. 4 is a schematic right-view structural diagram of another evaporation source provided in the embodiment of the present application;
fig. 5 is a schematic right-view structural diagram of another evaporation source provided in an embodiment of the present application.
Reference numerals:
100-evaporation chamber, 110-shell and 120-evaporation chamber;
200-a heating assembly;
300-a reflective assembly, 310-a first reflective plate, 320-a second reflective plate;
400-a nozzle;
r1-a first region;
r2-a second region;
a-a first direction;
b-a second direction.
Detailed Description
Reference will now be made in detail to the present application, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar parts or parts having the same or similar functions throughout. In addition, if a detailed description of the known art is unnecessary for the features of the present application shown, it is omitted. The embodiments described below with reference to the drawings are exemplary only for the purpose of explaining the present application and are not to be construed as limiting the present application.
It will be understood by those within the art that, unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the prior art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
As used herein, the singular forms "a", "an", "the" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof. It will be understood that when an element is referred to as being "connected" or "coupled" to another element, it can be directly connected or coupled to the other element or intervening elements may also be present. Further, "connected" or "coupled" as used herein may include wirelessly connected or wirelessly coupled. As used herein, the term "and/or" includes all or any element and all combinations of one or more of the associated listed items.
The following describes the technical solutions of the present application and how to solve the above technical problems with specific embodiments.
An embodiment of the present application provides an evaporation source, as shown in fig. 1 and fig. 2, the evaporation source including: the evaporation chamber 100, the heating assembly 200 and the reflection assembly 300.
The evaporation chamber 100 includes a housing 110 and an evaporation chamber 120 disposed in the housing 110.
The heating assembly 200 is provided at the periphery of the housing 110.
The reflection assembly 300 is disposed at the periphery of the heating assembly 200, one side of the reflection assembly 300 facing the housing 110 has a surface with a designed shape, and is used for reflecting part of heat of the first region R1 of the heating assembly 200 to a region to be heated of the housing 110 corresponding to the second region R2 of the heating assembly 200, and the temperature of the first region R1 is higher than that of the second region R2.
Optionally, the evaporation chamber 120 is used to contain evaporation material.
The inventors of the present application have conducted studies to find that the uniformity of the plated film is greatly affected by the heating uniformity of the heating element 200 during the evaporation process, and that the uniformity of the plated film is deteriorated due to the uneven heating at a local position. Meanwhile, the phenomenon of poor uniformity of the coating film can also be caused due to the heat dissipation phenomenon of the evaporation source installed in the equipment.
Based on the above analysis, the evaporation source of the embodiment of the present application is provided with the reflection assembly 300 at the periphery of the heating assembly 200, one side of the reflection assembly 300 facing the housing 110 has a surface with a designed shape, and can reflect part of heat of the first region R1 of the heating assembly 200 to the region to be heated of the housing 110 corresponding to the second region R2 of the heating assembly 200, which is equivalent to reflect part of heat of the high temperature region to the low temperature region, so that each part of the housing 110 is heated more uniformly, the uniformity of the coating film is improved, the stability of the product is improved, the problems of discontinuous production and abnormal shutdown of the apparatus caused by poor uniformity of the coating film are avoided, and further the productivity of the plant is improved.
In some embodiments, the reflective assembly 300 includes at least one arc segment or at least one beveled segment, and the contoured surface includes a surface of the at least one arc segment or the at least one beveled segment.
The arrangement of the arc section and the slope section in the embodiment of the application is matched with the positions of the first region R1 and the second region R2, so that the function that part of heat of the first region R1 is reflected to the region to be heated of the shell 110 corresponding to the second region R2 of the heating assembly 200 can be realized.
In some embodiments, the contoured surface comprises an undulating surface formed by sequentially joining at least two circular arc segments.
In some embodiments, the contoured surface comprises an undulating surface formed by at least two ramp segments connected in series.
In the embodiment of the present application, a wavy surface may be disposed on only one side of the reflection assembly 300 facing the housing 110, so as to implement a function of reflecting a part of heat of the first region R1 to the region to be heated of the housing 110 corresponding to the second region R2 of the heating assembly 200.
In some embodiments, the reflective member 300 is wavy in cross section parallel to the bottom surface of the housing 110.
Alternatively, referring to fig. 1, the reflection assembly 300 is formed by sequentially connecting a plurality of circular arc segments along a wave shape of a cross section parallel to the bottom surface of the housing 110.
In some embodiments, referring to FIG. 1, the radius of the arc segment ranges from 10 mm to 30 mm.
Alternatively, as shown in FIG. 1, the radius of the circular arc segment is 20 millimeters.
Alternatively, all numerical ranges of embodiments of the present application include end points, for example, the radius of the circular arc segment may be 10 mm or 30 mm.
Alternatively, referring to fig. 2, the reflection assembly 300 is formed by sequentially connecting a plurality of slope sections along a wave shape of a cross section parallel to the bottom surface of the housing 110.
In some embodiments, referring to FIG. 2, the angle α between a ramp segment and a corresponding heating assembly 200 ranges from 10 to 60. Optionally, the ramp section has an angle α with the corresponding heating assembly 200 in a cross-section parallel to the bottom surface of the housing 110 in the range of 10 ° -60 ° (deg. °)
Alternatively, the included angle α between the slope segment and the corresponding heating element 200 may be selected to be 10 ° or 60 °.
Alternatively, referring to FIG. 2, the angle α between a ramp segment and the corresponding heating assembly 200 may range from 15 to 45. The angle α of the ramp segment with the corresponding heating assembly 200 in a cross-section parallel to the bottom surface of the housing 110 ranges from 15 to 45.
Alternatively, the angle α between the ramp segment and the corresponding heating assembly 200 may be selected from the range of 15 ° and 45 °.
Alternatively, as shown in fig. 2, all ramp segments are at the same angle to the corresponding heating assembly 200. The included angle between the adjacent inclined surface sections is 60-160 degrees.
Alternatively, the included angle between adjacent ramp segments may be 60 ° or 160 °.
Optionally, the included angle between adjacent ramp segments is between 90 ° and 150 °.
Alternatively, the included angle between adjacent ramp segments may be selected to be 90 ° or 150 °.
Alternatively, referring to fig. 1 and 2, the embodiment of the present application may adopt the shape of a circular arc segment and a bevel segment, and may implement a scattering function in a bent position, where arrows indicate a scattering direction. The function of scattering can be realized to reflect part of the heat of the first region R1 of the heating assembly 200 to the region of the housing 110 to be heated corresponding to the second region R2 of the heating assembly 200.
The waveform period of the embodiment of the present application may be correspondingly adjusted according to the positions of the first region R1 and the second region R2 to achieve uniform heating of the housing 110.
In some embodiments, referring to fig. 3-5, the housing 110 is a square housing.
Alternatively, referring to fig. 1 and 2, the distance L1 between the first position of the reflection assembly 300 and the heating assembly 200 in the second direction B is 10 mm to 20 mm; the first position is a position where the reflection member 300 is closest to the heating member 200, and the second direction B is a width direction of the housing 110.
Alternatively, referring to fig. 1 and 2, the distance L2 between the second position of the reflection assembly 300 and the heating assembly 200 in the second direction B is 30 mm to 40 mm, and the second position is the farthest position of the reflection assembly 300 from the heating assembly 200.
Alternatively, the distance L2 between the second position of the reflection assembly 300 and the heating assembly 200 in the second direction B may be 30 mm or 40 mm.
In some embodiments, referring to fig. 3 to 5, the casing 110 is a square casing 110, and the evaporation chamber 120 is a square space.
Optionally, the evaporation source is an evaporation line source. The evaporation chamber 100 is a crucible for an evaporation line source.
In some embodiments, referring to fig. 1 and 2, the reflection assembly 300 includes at least one first reflection plate 310 and at least one second reflection plate 320. The first reflection plate 310 and the second reflection plate 320 are oppositely arranged and are arranged along a first direction A; the first direction a is a longitudinal direction of the case 110. The first and second reflection plates 310 and 320 each have a surface of a designed shape on a side facing the case 110.
In some embodiments, the reflective assembly 300 includes a reflective plate body and a reflective layer.
The reflective layer is disposed on a side of the reflective plate body close to the heating element 200.
The side of the reflective layer facing the housing 110 has a surface with a designed shape.
Alternatively, the reflection plate body is waved along a cross section parallel to the bottom surface of the case 110, and the reflection layer is waved along a cross section parallel to the bottom surface of the case 110.
Optionally, a side of the reflective layer facing the housing 110 has a surface of at least one circular arc segment or at least one inclined surface segment, and a reflective layer is correspondingly disposed on the surface of at least one circular arc segment or at least one inclined surface segment.
Optionally, the side of the reflective layer facing the housing 110 has a wavy surface formed by at least two circular arc segments or at least two inclined surface segments, and the wavy surface is correspondingly provided with a reflective layer.
Optionally, the reflective layer is made of a heat reflective material comprising lanthanide metal oxide co-aluminum or aluminum oxide doped NaZn (PO 4). The reflective layer may be made of a metal material having a heat reflection function, such as aluminum or silver.
Alternatively, as shown in fig. 3 to 5, the heating assembly 200 includes a plurality of coils of heating wires wound around the outer periphery of the housing 110. Specifically, the heating assembly 200 includes a first group of heating wires and a second group of heating wires, which are respectively disposed at intervals in a height direction of the housing 110.
Alternatively, as shown in fig. 3 to 5, the evaporation chamber 120 contains an evaporation material. At least one nozzle 400 is arranged on the top of the shell 110 and used for attaching the evaporation material on the substrate, the vacuum state inside and outside the line source is kept during evaporation, the heating wire heats the shell 110 to evaporate the material inside, and meanwhile, the cooling device cools the outer wall of the shell 110 to prevent the heat from damaging the equipment outside the line source too high.
Alternatively, referring to fig. 3 to 5, a first reflection plate 310 and a second reflection plate 320 are respectively disposed outside opposite sides of the case 110, and the first reflection plate 310 and the second reflection plate 320 are symmetrically disposed with respect to a central axis of the case 110.
As an example, referring to fig. 3, the first and second reflection plates 310 and 320 are provided with two spaced arc surface along the height direction of the housing 110, and the two arc surfaces correspond to the first and second groups of heating wires, respectively.
As another example, referring to fig. 4, the first reflective plate 310 and the second reflective plate 320 are respectively provided with a slope section along the height direction of the housing 110, the slope section is inclined towards the direction away from the housing 110, that is, on the cross section parallel to the bottom surface of the housing 110, the distance between the top of the slope section of the first reflective plate 310 and the housing 110 is smaller than the distance between the bottom of the slope section of the first reflective plate 310 and the housing 110, and the distance between the top of the slope section of the second reflective plate 320 and the housing 110 is smaller than the distance between the bottom of the slope section of the second reflective plate 320 and the housing 110.
As still another example, referring to fig. 5, the first reflection plate 310 and the second reflection plate 320 are two reflection plates disposed obliquely, and the first reflection plate 310 and the second reflection plate 320 are both disposed obliquely in a direction away from the housing 110, that is, in a cross section parallel to the bottom surface of the housing 110, a distance between the top of the first reflection plate 310 and the housing 110 is smaller than a distance between the bottom of the first reflection plate 310 and the housing 110, and a distance between the top of the second reflection plate 320 and the housing 110 is smaller than a distance between the bottom of the second reflection plate 320 and the housing 110.
Optionally, the inclined structures of the first reflection plate 310 and the second reflection plate 320 according to the embodiment of the present application may reflect the heat excess from the top of the housing 110 to the material region at the bottom of the housing 110, so as to improve the heating efficiency.
Optionally, the evaporation source includes at least two first reflection plates 310 and at least two second reflection plates 320, and the at least two first reflection plates 310 and the at least two second reflection plates 320 are disposed at intervals along a height direction of the housing 110.
Alternatively, the distance between the adjacent first reflection plates 310 in the height direction of the housing 110 is less than 10 mm; and/or, the adjacent second reflection plates 320 are spaced less than 10 mm apart in the height direction of the housing 110.
Based on the same inventive concept, an embodiment of the present application provides an evaporation apparatus, including: an evaporation source as in any one of the embodiments of the present application.
By applying the embodiment of the application, the following beneficial effects can be at least realized:
(1) The embodiment of the application can reflect partial heat of a high-temperature area to a low-temperature area, so that all parts of the shell 110 are uniformly heated, the uniformity of the coated film is improved, the stability of a product is improved, the problems that continuous production cannot be carried out and equipment is abnormally shut down due to poor uniformity of the coated film are solved, and the productivity of a factory is improved.
(2) The embodiment of the application can have a surface with an arc section or an inclined plane section towards one side of the casing 110, and the arc section or the inclined plane section is adopted to form a wave-shaped structure, so that the scattering function can be realized at the bending position, thereby reflecting part of heat of the first region R1 of the heating assembly 200 to the to-be-heated region of the casing 110 corresponding to the second region R2 of the heating assembly 200, and realizing uniform heating of all parts of the casing 110. In addition, the shape and size of the reflection assembly 300 can be adjusted according to practical application, so that uniform heating of each part of the shell 110 is further ensured, the uniformity of the coating film is improved, and the product quality is improved.
(3) The first reflection plate 310 and the second reflection plate 320 of the embodiment of the application are respectively provided with an inclined surface section, or the first reflection plate 310 and the second reflection plate 320 are obliquely arranged, so that the redundant heat at the top of the shell 110 can be reflected to the material area at the bottom of the shell 110, and the heating efficiency is improved.
Those of skill in the art will understand that various operations, methods, steps in the flow, measures, schemes discussed in this application can be alternated, modified, combined, or deleted. Further, other steps, measures, or schemes in various operations, methods, or flows that have been discussed in this application can be alternated, altered, rearranged, broken down, combined, or deleted. Further, steps, measures, schemes in the prior art having various operations, methods, procedures disclosed in the present application may also be alternated, modified, rearranged, decomposed, combined, or deleted.
In the description of the present application, it is to be understood that the terms "center", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience in describing the present application and simplifying the description, but do not indicate or imply that the referred device or element must have a particular orientation, be constructed in a particular orientation, and be operated, and thus should not be construed as limiting the present application.
The terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or to implicitly indicate the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present application, "a plurality" means two or more unless otherwise specified.
In the description of the present application, it should be noted that, unless otherwise explicitly stated or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, a fixed connection, a detachable connection, or an integral connection; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application can be understood in a specific case by those of ordinary skill in the art.
In the description herein, particular features, structures, materials, or characteristics may be combined in any suitable manner in any one or more embodiments or examples.
It should be understood that, although the steps in the flowcharts of the figures are shown in order as indicated by the arrows, the steps are not necessarily performed in order as indicated by the arrows. The steps are not performed in the exact order shown and may be performed in other orders unless explicitly stated herein. Moreover, at least a portion of the steps in the flow chart of the figure may include multiple sub-steps or multiple stages, which are not necessarily performed at the same time, but may be performed at different times, which are not necessarily performed in sequence, but may be performed alternately or alternately with other steps or at least a portion of the sub-steps or stages of other steps.
The foregoing is only a few embodiments of the present application and it should be noted that those skilled in the art can make various improvements and modifications without departing from the principle of the present application, and that these improvements and modifications should also be considered as the protection scope of the present application.

Claims (10)

1. An evaporation source, comprising:
the evaporation cavity comprises a shell and an evaporation cavity arranged in the shell;
the heating assembly is arranged on the periphery of the shell;
the reflecting assembly is arranged at the periphery of the heating assembly, one side of the reflecting assembly, which faces the shell, is provided with a surface with a designed shape, and the reflecting assembly is used for reflecting part of heat of a first area of the heating assembly to a to-be-heated area of the shell, which corresponds to a second area of the heating assembly, and the temperature of the first area is higher than that of the second area; the reflection assembly comprises at least one first reflection plate and at least one second reflection plate; the first reflecting plate and the second reflecting plate are respectively provided with an inclined surface section along the height direction of the shell, or the first reflecting plate and the second reflecting plate are two obliquely arranged reflecting plates.
2. The evaporation source according to claim 1, wherein the reflection assembly comprises at least one circular arc segment or at least one inclined surface segment; the surface of the design shape comprises the surface of at least one circular arc section or at least one inclined plane section.
3. The evaporation source according to claim 2, wherein the surface of the designed shape comprises a wavy surface formed by sequentially connecting at least two circular arc sections; or the surface of the designed shape comprises a wavy surface formed by sequentially connecting at least two inclined surface sections.
4. The evaporation source according to claim 1, wherein said reflection member has a wave shape in a cross section parallel to a bottom surface of said housing.
5. The evaporation source according to claim 2 or 3, wherein the radius of the circular arc segment is in the range of 10 mm to 30 mm; or the included angle between the inclined surface section and the corresponding heating component ranges from 10 degrees to 60 degrees.
6. The evaporation source according to claim 1, wherein the housing is a square housing, and the evaporation chamber is a square space.
7. The evaporation source according to claim 6, wherein the first reflection plate and the second reflection plate are disposed opposite to each other and are disposed along a first direction; the first direction is the length direction of the shell; the first and second reflection plates have surfaces of the design shape on both sides thereof facing the housing.
8. The evaporation source according to claim 4, wherein the casing is a square casing; the distance between the first position of the reflecting component and the heating component in the second direction is 10-20 mm; the first position is the position where the reflecting component is closest to the heating component, and the second direction is the width direction of the shell; and/or the distance between the second position of the reflecting component and the heating component in the second direction is 30-40 mm, and the second position is the position where the reflecting component is farthest away from the heating component.
9. The evaporation source according to claim 1, wherein the reflection assembly comprises a reflection plate body and a reflection layer; the reflecting layer is arranged on one side of the reflecting plate body close to the heating assembly; the side of the reflecting layer facing the shell is provided with a surface with a designed shape.
10. An evaporation apparatus, comprising: the evaporation source of any of claims 1-9.
CN202110348544.7A 2021-03-31 2021-03-31 Vapor deposition source and vapor deposition device Active CN113088892B (en)

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Citations (7)

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