CN113053719A - Dry etching machine and using method thereof - Google Patents

Dry etching machine and using method thereof Download PDF

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Publication number
CN113053719A
CN113053719A CN202110328670.6A CN202110328670A CN113053719A CN 113053719 A CN113053719 A CN 113053719A CN 202110328670 A CN202110328670 A CN 202110328670A CN 113053719 A CN113053719 A CN 113053719A
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fixedly connected
plate
etching
arc
wall
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CN113053719B (en
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邵帅
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Jiangsu Yuetongtai Technology Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00Cleaning by methods involving the use of air flow or gas flow
    • B08B5/04Cleaning by suction, with or without auxiliary action
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32715Workpiece holder
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32743Means for moving the material to be treated for introducing the material into processing chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67069Apparatus for fluid treatment for etching for drying etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334Etching

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

The invention relates to the technical field of dry etching, in particular to a dry etching machine and a using method thereof. The method comprises the following steps: the sealed passageway, the right side at sealed passageway top is run through and is provided with continuous feedway, the left side of sealed passageway is provided with surface cleaning equipment, conveyer belt top equidistance fixedly connected with conveyer of sealed passageway, conveyer's top equidistance fixedly connected with placement machine constructs, both sides equidistance fixedly connected with conveying axle equalling around the conveyer inner wall, the conveying axle with conveyer's bottom overlap joint, square mouth has been seted up at sealed passageway top. The gas generated by the process gas device is conveyed into the plurality of inner cavities of the plasma isolation plates through the conveying pipe, and the two plasma isolation plates are oppositely discharged, so that the gas between the two plasma isolation plates forms a plasma cluster, the number of electron losing can be increased, and the etching quality and efficiency are further increased.

Description

Dry etching machine and using method thereof
Technical Field
The invention relates to the technical field of dry etching, in particular to a dry etching machine and a using method thereof.
Background
Dry etching is a technique of performing thin film etching using plasma. When the gas is present in the form of a plasma, it has two characteristics: on one hand, the chemical activity of the gases in the plasma is much stronger than that of the gases in a normal state, and the gases can react with the materials more quickly by selecting proper gases according to the difference of the etched materials, so that the aim of etching removal is fulfilled; on the other hand, the electric field can be used for guiding and accelerating the plasma, so that the plasma has certain energy, and when the plasma bombards the surface of the etched object, atoms of the etched object material can be knocked out, thereby achieving the purpose of etching by utilizing physical energy transfer. Thus, dry etching is a result of a balance of both physical and chemical processes on the wafer surface.
Current dry etching machine is when processing the sculpture board, carry out the feed through rotatory material loading platform, the sculpture board needs the manual work to place, like this after the sculpture is accomplished, need artifical continuous material loading, unusual complicacy, and after accomplishing the sculpture, need wash the processing to the sculpture board surface, traditional singly is equipped with the washing basin, it needs artifical the participation to wash like this, degree of mechanization is poor, the important continuity is poor, every link leaves not to leave artifical the participation, lead to machining efficiency low.
The present inventors have been made to solve the above-described problems.
Disclosure of Invention
In order to achieve the purpose, the invention adopts the main technical scheme that: a dry etcher comprising:
sealed passageway, the right side at sealed passageway top is run through and is provided with continuous feedway, the left side of sealed passageway is provided with surface cleaning equipment, conveyer belt top equidistance fixedly connected with conveyer of sealed passageway, conveyer's top equidistance fixedly connected with placement machine constructs, both sides equidistance fixedly connected with conveying axle all around the conveyer inner wall, the conveying axle with conveyer's bottom overlap joint, square mouth has been seted up at sealed passageway top, square mouth endotheca is equipped with radio frequency device, the front side fixedly connected with processing procedure gas device of radio frequency device inner wall, processing procedure gas device bottom are provided with the base plate.
Preferably, sealed passageway includes the square cover of cavity, the square cover top right side fixedly connected with mounting panel of cavity, the whereabouts mouth has been seted up at the top of mounting panel, movable groove and U-shaped groove one have all been seted up to the left and right sides of whereabouts mouthful inner wall, an inner chamber intercommunication in movable groove and U-shaped groove, the movable groove has the movable rod through return spring elastic connection, the outside fixedly connected with L shape pole of movable rod, the inboard fixedly connected with stopper of movable rod.
Preferably, conveyer includes plate conveyor, the equal fixedly connected with rack in both sides around the plate conveyor, plate conveyor top front side is provided with linkage strip.
Preferably, the continuous feeding device comprises a placing box, a U-shaped groove II is arranged on the front side of the inner wall of the placing box, two plywood plates are fixedly connected on the front side of the inner wall of the transverse groove of the U-shaped groove II, opposite sides of the two plywood plates are fixedly connected through a limiting plate, a slide rod is inserted into one side of the limiting plate, one end of the slide rod is fixedly connected with a connecting frame, the other end of the slide rod is fixedly connected with a guide block, two compression springs are fixedly connected with the connecting frame and the opposite side of the limiting plate, opposite sides of the two compression springs are fixedly connected with two sides of the inner wall of the elastic sheet through elastic sheets and are fixedly connected through extrusion springs, one side of the connecting frame is fixedly connected with the U-shaped block through a connecting block, a shaft lever is movably connected in chutes formed in the upper side and the lower side of, a U-shaped frame is inserted into one side of the U-shaped block, an arc-shaped block is fixedly connected to one end of the U-shaped block, the arc-shaped block is fixedly connected with one side of the inner wall of the U-shaped block through an adjusting spring, a discharging cavity is arranged in the middle of the placing box, the left side and the right side of the inner cavity of the discharging cavity are hinged to clamping strips through hinge rods, a rubber plate is fixedly connected to one side of each clamping strip, the roller shaft positioned at the lowest position is in lap joint with one side of the rubber plate, the other roller shafts are spaced from the rubber plate, a vertical rod is inserted into the bottom of the two inner walls of the U-shaped groove in the placing box, a plurality of oval blocks are sleeved on the vertical rod, an inclined groove is formed in the bottom of the vertical rod, two sides of the oval block positioned at the lowest position are positioned below the two L-shaped rods, and arc-shaped grooves matched with two ends of the oval blocks are formed in the oval, the oval blocks positioned on the L-shaped rod are positioned below the two guide blocks and are in contact with each other, and one sides of the other guide blocks are in contact with the inner bulges of the oval blocks.
When etching is prepared, an etching plate is put in from the upper part of a material placing cavity, the etching plate is stacked and enters the material placing cavity, the etching plate at the lowest part is positioned on the inclined planes of the two limit blocks and limited by the inclined planes of the limit blocks, the etching plate at the lowest part of the limit blocks in the material placing cavity is clamped by the two rolling shafts at the lower part, the clamped etching plate is limited by extrusion, so that other etching plates are stacked in the material placing cavity, when the material placing operation is carried out, the bottom of the linkage strip is contacted with the chute, the chute can drive the vertical rod to move upwards, meanwhile, the elliptical block at the lowest part on the vertical rod is contacted with the arc-shaped groove on the L-shaped rod at first, the elliptical block contacted with the arc-shaped groove can extrude two L-shaped rods towards two sides, the etching plate at the limit blocks falls in the placing device, meanwhile, the vertical rod continues to rise, and, other elliptical blocks are simultaneously separated from the lap joint of the two adjacent guide blocks, so that the two guide blocks move towards opposite directions under the elastic action of the compression spring, the elastic sheet and the extrusion spring, and is separated from the contact with the oval block, the roller on the connecting frame is contacted with the rubber plate, at the moment, all the etching plates positioned in the discharging cavity are clamped tightly, when the topmost part of the linkage bar reaches the chute, the vertical bar rises, the bottommost elliptical block is contacted with the two bottommost guide blocks, the guide blocks move in opposite directions, meanwhile, the two L-shaped rods are restored to the original positions, the two roller shafts at the lowest part are separated from the lower part of the rubber plate, the etching plate at the lower part enters the limiting block, and limited by the limiting block, after the series of operations are completed, the vertical rod moves downwards under the elasticity of the spring arranged at the top, and the etching plate further moves to the original position at the moment.
Preferably, the surface cleaning equipment comprises an equipment box body, the top of the inner wall of the equipment box body is fixedly connected with a cleaning head through a bottom fixedly connected with a telescopic belt, the top of the inner wall of the equipment box body is fixedly connected with a vacuumizing device, the top of the cleaning head is fixedly connected with four elastic rods, the elastic rods on eight front and rear sides are fixedly connected with transverse plates, the middle part of the bottom of each transverse plate is fixedly connected with a reciprocating lead screw, a limit sleeve is sleeved on each reciprocating lead screw, gears are arranged on the front and rear sides of the inner wall of a hollow square sleeve respectively, a rack is meshed with the gears, a ball sleeve is sleeved on each gear, the reciprocating lead screw sleeves are sleeved in the ball sleeves, an inner cavity at the bottom of the cleaning head is elastically connected with a fine adjustment block through two fine adjustment springs, a servo motor is embedded in the, the bottom overlap joint of fixed disk has the cleaning plate, cleaning plate with servo motor's output fixed connection, a plurality of sliding trays have been seted up to cleaning plate's bottom, the round hole has been seted up to the sliding tray inner wall, the ejector pin has been run through at the top of sliding tray inner wall, the top fixedly connected with swash plate of ventilating of ejector pin, a plurality of arc chutes have been seted up to the bottom equidistance of fixed disk, ejector pin bottom fixedly connected with closing plate, closing plate with cleaning plate bottom all is provided with the sponge, ventilate the swash plate pass through ejecting spring with cleaning plate's draw-in groove inner wall bottom elastic connection, be provided with the suction hole in the arc chute still be provided with around the cleaning head and rectify bias pole (35), the suction hole passes through the hose intercommunication with evacuating device.
When the etched product is processed and is conveyed to the surface cleaning equipment by the conveying device, because a gear on the surface cleaning equipment is in contact with a rack on the conveying device, the gear can rotate, at the moment, two reciprocating screw rods move downwards under the driving of a ball sleeve, a cleaning head moves to the top of a placing mechanism moving downwards and slowly enters an etching plate in the placing mechanism, a deviation correcting rod (35) is firstly in contact with an inclined plane of the placing mechanism and adjusts a fine adjusting block, the fine adjusting block extrudes a fine adjusting spring, so that the cleaning plate can be stably attached to the top of the etching plate, a servo motor is started, the servo motor drives the cleaning plate to slowly rotate, a sponge can clean the surface of the product, when the ventilation inclined plate is aligned with an arc chute, under the elasticity of an ejection spring, a closing plate moves upwards, and at the moment, the closing plate enters a large cavity of a sliding groove, it is empty through the suction at evacuating device, slide the intracavity and produce the negative pressure this moment, the clearance between slide chamber and the product can be with the reaction liquid suction that the top produced, abluent effect is better like this, moreover more quick.
Preferably, the placing device comprises a mounting disc, an open horn ring is sleeved at the top of the mounting disc, a plurality of arc rotary grooves are formed in the surface of the open horn ring at equal intervals, an arc transmission shaft is movably connected in the arc rotary grooves, soft silica gel is arranged on the surface of the arc transmission shaft, a transmission gear is sleeved at the outer end of the arc transmission shaft, a conical fluted disc is rotatably connected in the mounting disc and is positioned under the conical fluted disc, the conical fluted disc is meshed with the transmission gears, a driving motor is fixedly connected to the right side of the mounting disc through a support plate, a driving wheel is fixedly connected to the output end of the driving motor, the driving wheel is in transmission connection with a fluted disc (57) formed on the side wall of the conical fluted disc through a transmission belt, an annular sleeve is fixedly connected to the bottom of the inner wall of the mounting disc, and, the inner cavity of the annular sleeve is provided with three elastic strips at equal intervals, the elastic strips are provided with limiting sliding ports, positioning rods are inserted into the limiting sliding ports, the positioning rods are fixedly connected to the bottom of the inner wall of the annular sleeve, the inner wall of the annular sleeve is fixedly connected with arc-shaped strips through two back pressure springs, the arc-shaped strips are fixedly connected onto the elastic strips, one ends of the elastic strips penetrate through clamping grooves formed in the outer side of the annular sleeve and extend to the outside of the annular sleeve, one ends of the elastic strips are provided with embedded grooves, the bottom of the mounting disc is fixedly connected with an air suction pump, the air suction pump is provided with a center hole, the inner wall of the annular sleeve is embedded with first suction ports at equal intervals, the top of the placing platform is provided with second suction ports at equal intervals, and the air suction pump is communicated with the second suction;
wherein, suction mouth two includes the adsorption tube, the bottom intercommunication of adsorption tube has the arc tube, the arc tube passes through connecting pipe and connecting pipe intercommunication, arc tube top opposite side intercommunication has suction mouth one, the arc tube inner chamber be with suction mouth department cover is equipped with the sealing ring, the adsorption tube inner chamber cover is equipped with the colored template, the depression bar under the top fixedly connected with of colored template, the bottom fixedly connected with soft pole of colored template, the one end of soft pole extend to in suction mouth one and with sealing plug fixed connection.
When an etching plate enters the placing device, the etching plate firstly falls on the open horn ring, a driving wheel on a driving motor drives the conical fluted disc to rotate through a conveying belt, the conical fluted disc drives a plurality of transmission gears to rotate in the rotating process of the conical fluted disc, at the moment, the transmission gears can enable the arc-shaped transmission shafts in the arc-shaped rotating grooves to rotate, the arc-shaped transmission shafts can enable the etching plate in surface contact with the arc-shaped transmission shafts to be transmitted to the top of the annular sleeve, negative pressure is generated at a suction port II and a suction port I under the suction of an air pump, so that the etching plate enters the placing platform, meanwhile, after the etching plate is contacted with the embedded groove, under the condition of suction, the three elastic strips move inwards, after the etching plate is tightly attached to the top of the placing platform, the elastic strips can clamp the etching plate under the elasticity of a back pressure spring, and the stability of the transmission and, when the etching board contacts with two suction openings, under the condition of suction force, the etching board pushes down the depression bar downwards, the depression bar drives the soft pole jack-up sealing plug down, the sealing plug breaks away from the contact with the sealing ring this moment, the suction opening is the same outside this moment, can clear away the dust on the etching board, certainly can adsorb the gas of reaction when the etching, the air of having guaranteed the etching intracavity is in the state of purifying, on the etching board takes off, under the gravity of sealing plug, the sealing plug can magnetic adsorption with the sealing ring, two one-way negative pressure openings of suction opening like this, thereby guarantee that the quick stability of etching board is on place the platform.
Preferably, the processing procedure gas device includes that a plurality of gases make the device, the gas is made the device and is provided with a plurality of gas outlets, the gas outlet intercommunication has the conveyer pipe, the radio frequency device inner wall just is located every gas and makes device department and all is provided with two plasma baffles, the bottom fixedly connected with parting bead of plasma baffle, the plasma baffle inner chamber with the conveyer pipe intercommunication, the passageway of giving vent to anger has been seted up to one side of plasma baffle, the passageway endotheca of giving vent to anger is equipped with the gas distribution board and gives vent to anger board one and give vent to anger board two.
The gas generated by the process gas device is conveyed into the plurality of inner cavities of the plasma isolation plates through the conveying pipe, and the two plasma isolation plates are oppositely discharged, so that the gas between the two plasma isolation plates forms a plasma cluster, the number of electron losing can be increased, and the etching quality and efficiency are further increased.
Preferably, the radio frequency device comprises a mounting table, and a plurality of radio frequency machines are arranged at the bottom of the mounting table.
Preferably, the use method of the dry etching machine comprises the following steps:
the first step, when etching is prepared, an etching plate is put in from the upper part of a material placing cavity, the etching plate is stacked and enters the material placing cavity, the etching plate at the lowest part is positioned on the inclined planes of the two limit blocks and limited by the inclined planes of the limit blocks, the etching plate at the lowest part of the limit blocks in the material placing cavity is clamped by the two rolling shafts at the lower part, the clamped etching plate is extruded and limited, so that other etching plates are stacked in the material placing cavity, when the material placing operation is carried out, the bottom of the linkage strip is contacted with the chute, the chute can drive the vertical rod to move upwards, meanwhile, the elliptical block at the lowest part on the vertical rod is firstly contacted with the arc-shaped groove on the L-shaped rod, the elliptical block contacted with the arc-shaped groove can extrude two L-shaped rods towards two sides, the etching plate at the limit blocks drops in the placing device, meanwhile, the vertical rod continues to rise, and, other elliptical blocks are simultaneously separated from the lap joint of the two adjacent guide blocks, so that the two guide blocks move towards opposite directions under the elastic action of the compression spring, the elastic sheet and the extrusion spring, and is separated from the contact with the oval block, the roller on the connecting frame is contacted with the rubber plate, at the moment, all the etching plates positioned in the discharging cavity are clamped tightly, when the topmost part of the linkage bar reaches the chute, the vertical bar rises, the bottommost elliptical block is contacted with the two bottommost guide blocks, the guide blocks move in opposite directions, meanwhile, the two L-shaped rods are restored to the original positions, the two roller shafts at the lowest part are separated from the lower part of the rubber plate, the etching plate at the lower part enters the limiting block, the vertical rod moves downwards under the elasticity of a spring arranged at the top after the series of operations are finished, and the etching plate further moves to the original position at the moment;
secondly, when the etching plate enters the placing device, the etching plate firstly falls on the open horn ring, a driving wheel on a driving motor drives a conical fluted disc to rotate through a conveying belt, the conical fluted disc drives a plurality of transmission gears to rotate in the rotating process of the conical fluted disc, at the moment, the transmission gears can enable an arc-shaped transmission shaft in an arc-shaped rotating groove to rotate, the arc-shaped transmission shafts can enable the etching plate in surface contact with the arc-shaped transmission shaft to transmit the top of the annular sleeve, and negative pressure is generated at a suction port II and a suction port I under the suction of an air pump, so that the etching plate enters the placing platform, meanwhile, after the etching plate is in contact with the embedded groove, under the condition of suction, three elastic strips move inwards, so that after the etching plate is tightly attached to the top of the placing platform, the elastic strips can clamp the etching plate under the elasticity of a back pressure spring, and the stability of the etching plate, when the etching plate is contacted with the second suction port, the etching plate pushes the lower pressure rod downwards under the condition of suction force, the lower pressure rod drives the soft rod to jack up the sealing plug, the sealing plug is separated from the sealing ring, the suction port is connected with the outside and can remove dust on the etching plate, and the reacted gas can be adsorbed during etching, so that the air in the etching cavity is ensured to be in a purified state, when the etching plate is taken down, the sealing plug and the sealing ring can be magnetically adsorbed under the gravity of the sealing plug, and the suction port is a one-way negative pressure port, so that the etching plate is ensured to be rapidly stabilized on the placing platform;
a third step; the gas generated by the process gas device is conveyed into the plurality of inner cavities of the plasma isolation plates through the conveying pipe, and the two plasma isolation plates are oppositely discharged, so that the gas between the two plasma isolation plates forms a plasma cluster, the number of lost electrons can be increased, and the etching quality and efficiency are further increased;
the fourth step; when the etched product is processed and is conveyed to the surface cleaning equipment by the conveying device, because a gear on the surface cleaning equipment is in contact with a rack on the conveying device, the gear can rotate, at the moment, two reciprocating screw rods move downwards under the driving of a ball sleeve, a cleaning head moves to the top of a placing mechanism moving downwards and slowly enters an etching plate inside the placing mechanism, a deviation correcting rod is firstly in contact with an inclined plane of the placing mechanism and adjusts a fine adjusting block, the fine adjusting block extrudes a fine adjusting spring, so that the cleaning plate can be stably attached to the top of the etching plate, a servo motor is started, the servo motor drives the cleaning plate to slowly rotate, a sponge can clean the surface of the product, when the ventilation inclined plate is aligned with the arc chute, under the elasticity of an ejection spring, a closing plate moves upwards, and at the moment, the closing plate enters a large cavity of a sliding groove, it is empty through the suction at evacuating device, slide the intracavity and produce the negative pressure this moment, the clearance between slide chamber and the product can be with the reaction liquid suction that the top produced, abluent effect is better like this, moreover more quick.
The invention has at least the following beneficial effects:
1. the etching plates are put in from the upper part of the material placing cavity, the etching plates are stacked and enter the material placing cavity, the etching plate at the lowest part is positioned on the inclined planes of the two limiting blocks and limited by the inclined planes of the limiting blocks, the etching plate at the lowest part of the limiting blocks in the material placing cavity is clamped by the two rolling shafts at the lower part, and the clamped etching plate is limited by extrusion, so that other etching plates are stacked in the material placing cavity, when the material placing operation is carried out, the bottom of the linkage strip is contacted with the chute, the chute can drive the vertical rod to move upwards, meanwhile, the elliptical block at the lowest part on the vertical rod is firstly contacted with the arc-shaped groove on the L-shaped rod, the elliptical block contacted with the arc-shaped groove can extrude the two L-shaped rods towards two sides, the etching plates at the limiting blocks are limited to fall in the placing device, meanwhile, the vertical rod continues to rise, at the moment, the elliptical blocks at the lowest part in the, thus, under the elastic action of the compression spring, the elastic sheet and the extrusion spring, the two guide blocks move towards opposite directions and are separated from contact with the oval blocks, the rolling shafts on the connecting frame are in contact with the rubber plate, at the moment, all the etching plates positioned in the material discharge cavity are clamped, when the topmost part of the linkage strip reaches the chute, the vertical rod rises, the oval block at the bottommost part is in contact with the two guide blocks at the bottommost part, the guide blocks move in opposite directions, meanwhile, the two L-shaped rods recover to the original positions, at the moment, the two rolling shafts at the bottommost part are separated from contact with the lower part of the rubber plate, the etching plate at the lower part enters the limiting block and is limited by the limiting block, after the series of operations are completed, the vertical rod moves downwards under the elasticity of the spring arranged at the top, at the moment, the etching plate further moves to the original position, and continuous blanking can be realized through the contact of, and then can increase the continuity of unloading, need not artifical the participation, increase the efficiency of processing.
2. When an etching plate enters the placing device, the etching plate firstly falls on the open horn ring, a driving wheel on a driving motor drives the conical fluted disc to rotate through a conveying belt, the conical fluted disc drives a plurality of transmission gears to rotate in the rotating process of the conical fluted disc, at the moment, the transmission gears can enable the arc-shaped transmission shafts in the arc-shaped rotating grooves to rotate, the arc-shaped transmission shafts can enable the etching plate in surface contact with the arc-shaped transmission shafts to be transmitted to the top of the annular sleeve, negative pressure is generated at a suction port II and a suction port I under the suction of an air pump, so that the etching plate enters the placing platform, meanwhile, after the etching plate is contacted with the embedded groove, under the condition of suction, the three elastic strips move inwards, after the etching plate is tightly attached to the top of the placing platform, the elastic strips can clamp the etching plate under the elasticity of a back pressure spring, and the stability of the transmission and, when the etching board contacts with two suction openings, under the condition of suction force, the etching board pushes down the depression bar downwards, the depression bar drives the soft pole jack-up sealing plug down, the sealing plug breaks away from the contact with the sealing ring this moment, the suction opening is the same outside this moment, can clear away the dust on the etching board, certainly can adsorb the gas of reaction when the etching, the air of having guaranteed the etching intracavity is in the state of purifying, on the etching board takes off, under the gravity of sealing plug, the sealing plug can magnetic adsorption with the sealing ring, two one-way negative pressure openings of suction opening like this, thereby guarantee that the quick stability of etching board is on place the platform.
3. The gas generated by the process gas device is conveyed into the plurality of inner cavities of the plasma isolation plates through the conveying pipe, and the two plasma isolation plates are oppositely discharged, so that the gas between the two plasma isolation plates forms a plasma cluster, the number of electron losing can be increased, and the etching quality and efficiency are further increased.
4. When the etched product is processed and is conveyed to the surface cleaning equipment by the conveying device, because a gear on the surface cleaning equipment is in contact with a rack on the conveying device, the gear can rotate, at the moment, two reciprocating screw rods move downwards under the driving of a ball sleeve, a cleaning head moves to the top of a placing mechanism moving downwards and slowly enters an etching plate inside the placing mechanism, a deviation correcting rod is firstly in contact with an inclined plane of the placing mechanism and adjusts a fine adjusting block, the fine adjusting block extrudes a fine adjusting spring, so that the cleaning plate can be stably attached to the top of the etching plate, a servo motor is started, the servo motor drives the cleaning plate to slowly rotate, a sponge can clean the surface of the product, when the ventilation inclined plate is aligned with the arc chute, under the elasticity of an ejection spring, a closing plate moves upwards, and at the moment, the closing plate enters a large cavity of a sliding groove, it is empty through the suction at evacuating device, slide the intracavity and produce the negative pressure this moment, the clearance between slide chamber and the product can be with the reaction liquid suction that the top produced, abluent effect is better like this, moreover more quick.
Drawings
The accompanying drawings, which are included to provide a further understanding of the application and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the application and together with the description serve to explain the application and not to limit the application. In the drawings:
FIG. 1 is an overall front cross-sectional view of the present invention;
FIG. 2 is a cross-sectional view of a top view of the continuous feed apparatus of the present invention as it is clamped;
FIG. 3 is a cross-sectional view of a top view of the continuous feed apparatus of the present invention when it is unclamped;
FIG. 4 is an enlarged view of FIG. 1 at C;
FIG. 5 is a side cross-sectional view of a cleaning plate of the present invention;
FIG. 6 is an enlarged view of the invention at B of FIG. 1;
FIG. 7 is a side view of a vertical post according to the present invention;
FIG. 8 is a top view of the placement device of the present invention;
FIG. 9 is an enlarged view taken at A in FIG. 8;
FIG. 10 is a cross-sectional view of the second pumping port;
FIG. 11 is a side view of the plasma barrier plate of the present invention;
fig. 12 is an enlarged view of fig. 11 at D.
In the figure, 1 sealing channel, 11 hollow square sleeve, 12 return spring, 13L-shaped rod, 14 limited block, 15 mounting plate, 16U-shaped groove I, 17 movable groove, 18 movable rod, 2 continuous feeding device, 21 placing box, 22U-shaped groove II, 23 plywood, 24 limited plate, 25 sliding rod, 26 guide block, 27 connecting frame, 28 elastic sheet, 29 extrusion spring, 210 compression spring, 211 connecting block, 212U-shaped block, 213 clamping strip, 214 hinge rod, 215 rubber plate, 216 rubber plate, 217 sliding chute, 218 shaft rod, 219 rolling shaft, 220U-shaped frame, 221 arc block, 222 adjusting spring, 223 vertical rod, 224 oval block, 225 chute, 3 surface cleaning equipment, 31 equipment box body, 32 telescopic belt, 33 vacuumizing device, 34 transverse plate, 35 deviation rectifying rod, 36 gear, 37 fine adjusting spring, 38 fine adjusting block, 39 fine adjusting spring, 310 servo motor, 311 cleaning head, 312 fixed plate, 313 cleaning plate, 314 suction holes, 315 closing plates, 316 air-permeable inclined plates, 317 ejection springs, 318 ejector rods, 319 clamping grooves, 320 arc-shaped chutes, 4 conveying devices, 41 plate-type conveying belts, 42 racks, 43 linkage bars, 5 placing mechanisms, 51 mounting plates, 52 open-mouthed horn rings, 53 arc-shaped rotating grooves, 54 arc-shaped conveying shafts, 55 transmission gears, 56 conical fluted discs, 57 leather belt grooves, 58 carrier plates, 59 driving motors, 510 driving wheels, 511 conveying belts, 512 annular sleeves, 513 placing platforms, 514 elastic bars, 515 positioning rods, 516 limit sliding ports, 517 arc bars, 518 back-pressure spring elastic bars, 519 suction ports two, 5191 suction pipes, 5192 arc pipes, 5193 pattern plates, 5194 down-pressure bars, 5195, 5196 sealing rings, 5197, 5198 connecting pipes, 520 suction ports one, 521 air suction pumps, 521 groove embedding grooves, 524 central holes, 6 conveying shafts, 7 substrates, 8 process gas devices, 81 gas making devices, 82 gas outlets, 83 conveying pipes, 84 plasma isolation plates, 85 parting strips, 86 gas outlet channels, 87 gas distribution plates, 88 gas outlet plates I, 89 gas outlet plates II, 9 radio frequency devices, 91 mounting tables and 92 radio frequency machines.
Detailed Description
Embodiments of the present application will be described in detail with reference to the drawings and examples, so that how to implement technical means to solve technical problems and achieve technical effects of the present application can be fully understood and implemented.
As shown in fig. 1 to 12, the present invention provides a dry etcher comprising:
sealed passageway 1, the right side at sealed passageway 1 top is run through and is provided with continuous feedway 2, the left side of sealed passageway 1 is provided with surface cleaning equipment 3, conveyer belt top equidistance fixedly connected with conveyer 4 of sealed passageway 1, the top equidistance fixedly connected with placing mechanism 5 of conveyer 4, the impartial distance fixedly connected with conveying axle 6 in both sides around the 4 inner walls of conveyer, conveying axle 6 and conveyer 4's bottom overlap joint, square mouth has been seted up at sealed passageway 1 top, square mouth endotheca is equipped with radio frequency device 9, the front side fixedly connected with processing procedure gas device 8 of radio frequency device 9 inner wall, 8 bottoms of processing procedure gas device are provided with base plate 7.
Sealing channel 1 includes the square cover of cavity 11, the square cover of cavity 11 top right side fixedly connected with mounting panel 15, the whereabouts mouth has been seted up at mounting panel 15's top, movable groove 17 and U-shaped groove 16 have all been seted up to the left and right sides of whereabouts mouth inner wall, movable groove 17 and the 16 inner chambers of U-shaped groove communicate, movable groove 17 has movable rod 18 through 12 elastic connection of return spring, the outside fixedly connected with L shape pole 13 of movable rod 18, the inboard fixedly connected with stopper 14 of movable rod 18.
The conveying device 4 comprises a plate-type conveying belt 41, racks 42 are fixedly connected to the front side and the rear side of the plate-type conveying belt 41, and a linkage strip 43 is arranged on the front side of the top of the plate-type conveying belt 41.
The continuous feeding device 2 comprises a placing box 21, a U-shaped groove II 22 is arranged on the front side of the inner wall of the placing box 21, two plywood plates 23 are fixedly connected on the front side of the inner wall of the transverse groove of the U-shaped groove II 22, the opposite sides of the two plywood plates 23 are fixedly connected through a limiting plate 24, a slide bar 25 is inserted into one side of the limiting plate 24, a connecting frame 27 is fixedly connected with one end of the slide bar 25, a guide block 26 is fixedly connected with the other end of the slide bar 25, two compression springs 28 are fixedly connected with the connecting frame 27 and the opposite side of the limiting plate 24, the opposite sides of the two compression springs 210 are fixedly connected with the two sides of the inner wall of the elastic sheet 28 through the elastic sheet 28 and are fixedly connected through an extrusion spring 29, one side of the connecting frame 27 is fixedly connected with the U-shaped block 212 through a connecting block 211, a shaft lever 218 is movably connected in sliding grooves 217 formed in the upper, an arc-shaped block 221 is fixedly connected to one end of the U-shaped block 212 of the U-shaped frame 220, the arc-shaped block 221 is fixedly connected to one side of the inner wall of the U-shaped block 212 through an adjusting spring 222, a material placing cavity 215 is arranged in the middle of the placing box 21, the left side and the right side of the inner cavity of the material placing cavity 215 are hinged to clamping strips 213 through hinge rods 214, a rubber plate 216 is fixedly connected to one side of the clamping strips 213, which is positioned on a roller 219, which is positioned on the lowest side, is lapped on one side of the rubber plate 216, a distance is reserved between other rollers 219 and the rubber plate 216, vertical rods 223 are inserted into the bottom of the inner wall of the U-shaped groove two 22 in the placing box 21, a plurality of elliptical blocks 224 are sleeved on the vertical rods 223, inclined grooves 225 are formed in the bottoms of the vertical rods 223, two sides of the elliptical blocks 224, which are positioned on the lowest side, are positioned below the two L-shaped rods 13, arc-shaped grooves matched with two ends of the, one side of the other guide block 26 contacts a protrusion in the oval block 224.
When preparing for etching, an etching plate is put in from the upper part of the material placing cavity 215, the etching plate is stacked in the material placing cavity 215, the etching plate at the lowest part is positioned on the inclined planes of the two limit blocks 14 and limited by the inclined planes of the limit blocks 14, the etching plate at the lowest part of the limit blocks 14 in the material placing cavity 215 is clamped by the two rolling shafts 219 at the lower part, the clamped etching plate is extruded and limited, so that other etching plates are stacked in the material placing cavity 215, when the material placing operation is carried out, the bottom of the linkage strip 43 is contacted with the inclined groove 225, the inclined groove 225 can drive the vertical rod 223 to move upwards, meanwhile, the elliptical block 224 at the lowest part on the vertical rod 223 is firstly contacted with the arc-shaped groove on the L-shaped rod 13, the elliptical block 224 contacted with the arc-shaped groove can extrude the two L-shaped rods 13 towards the two sides, the etching plate at the limit blocks 14 is limited to fall in the placing device, at this time, except for the lowermost elliptical block 224 in the U-shaped groove 22, the other elliptical blocks 224 are simultaneously separated from the two adjacent guide blocks 26, so that under the elastic action of the compression spring 210, the elastic sheet 28 and the pressing spring 29, the two guide blocks 26 move towards opposite directions and are separated from contact with the elliptical blocks 224, the rollers 219 on the connecting frame 27 are in contact with the rubber plate 216, at this time, all the etching plates located in the material discharge chamber 215 are clamped, when the uppermost portion of the linkage bar 43 reaches the inclined groove 225, the vertical bar 223 ascends, the lowermost elliptical block 224 is in contact with the two lowermost guide blocks 26, the guide blocks 26 move in opposite directions, at the same time, the two L-shaped rods 13 are restored to the original positions, at this time, the two lowermost rollers 219 are separated from contact with the lower portion of the rubber plate 216, at this time, the etching plate below enters the stopper 14 and is limited by the stopper 14, after the above series of operations are completed, the vertical rod 223 moves downward under the elasticity of the spring provided at the top, and at this time, the etching plate further moves to the original position.
The surface cleaning equipment 3 comprises an equipment box body 31, the top of the inner wall of the equipment box body 31 is fixedly connected with a cleaning head 311 through a telescopic belt 32, the top of the inner wall of the equipment box body 31 is fixedly connected with a vacuumizing device 33, the top of the cleaning head 311 is fixedly connected with four elastic rods, eight elastic rods on the front side and the rear side are fixedly connected with transverse plates 34, the middle part of the bottom of each transverse plate 34 is fixedly connected with a reciprocating lead screw, each reciprocating lead screw is sleeved with a limiting sleeve 37, gears 36 are arranged on the front side and the rear side of the inner wall of a hollow square sleeve 11, a rack 42 is meshed with the gear 36, a ball sleeve is sleeved on the gear 36, the reciprocating lead screw is sleeved in the ball sleeve, an inner cavity at the bottom of the cleaning head 311 is elastically connected with a fine adjustment block 38 through two fine adjustment springs 39, a servo motor 310 is embedded in the bottom, output fixed connection of cleaning plate 313 and servo motor 310, a plurality of sliding trays have been seted up to cleaning plate 313's bottom, the round hole has been seted up to the sliding tray inner wall, ejector pin 318 has been run through at the top of sliding tray inner wall, ejector pin 318's top fixedly connected with swash plate 316 of ventilating, a plurality of arc chute 320 have been seted up to the bottom equidistance of fixed disk 312, ejector pin 318 bottom fixedly connected with closure plate 315, closure plate 315 all is provided with the sponge with cleaning plate 313 bottom, the swash plate 316 of ventilating is through ejecting spring 317 and the draw-in groove 319 inner wall bottom elastic connection who cleans plate 313, still be provided with around the suction hole 314 cleaning head 311 in the arc chute 320 and rectify pole 35, suction hole 314 passes through the hose intercommunication with evacuating device 33.
When the etched product is processed and is conveyed to the surface cleaning equipment 3 by the conveying device 4, because the gear 36 on the surface cleaning equipment 3 is in contact with the rack 42 on the conveying device 4, the gear 36 can rotate, at the moment, the two reciprocating screw rods move downwards under the driving of the ball sleeve, the cleaning head 311 moves to the top of the placing mechanism 5 moving towards the lower part of the cleaning head and slowly enters the etching plate in the placing mechanism 5, the deviation correcting rod 35 is firstly in contact with the inclined plane of the placing mechanism 5 and adjusts the fine adjusting block 38, the fine adjusting block 38 extrudes the fine adjusting spring 39, so that the cleaning plate 313 can be stably attached to the top of the etching plate, the servo motor 310 is started, the servo motor 310 drives the cleaning plate 313 to rotate slowly, the sponge can clean the surface of the product, when the ventilation inclined plate 316 is aligned with the arc chute 320, under the elasticity of the ejection spring 317, the closing plate 315 moves upwards, and the closing plate 315 enters the big cavity of the sliding groove, and the vacuumizing device 33 sucks the cavity 314 through the suction, so that negative pressure is generated in the sliding cavity, and the gap between the sliding cavity and the product can suck the reaction liquid generated above, so that the cleaning effect is better, and the cleaning is quicker.
The placing device 5 comprises a mounting disc 51, an open horn ring 52 is sleeved at the top of the mounting disc 51, a plurality of arc rotating grooves 53 are formed in the surface of the open horn ring 52 at equal intervals, arc transmission shafts 54 are movably connected in the arc rotating grooves 53, soft silica gel is arranged on the surfaces of the arc transmission shafts 54, transmission gears 55 are sleeved at the outer ends of the arc transmission shafts 54, a conical fluted disc 56 is rotatably connected in the mounting disc 51 and is positioned right below the conical fluted disc 56, the conical fluted disc 56 is meshed with the transmission gears 55, a driving motor 59 is fixedly connected to the right side of the mounting disc 51 through a support plate 58, a driving wheel 510 is fixedly connected to the output end of the driving motor 59, the driving wheel 510 is in transmission connection with a belt groove 57 formed in the side wall of the conical fluted disc 56 through a transmission belt 511, an annular sleeve 512 is fixedly connected to the bottom of the inner wall of the mounting disc 51 at, a limiting sliding opening 516 is formed in the elastic strip 514, a positioning rod 515 is inserted into the limiting sliding opening 516, the positioning rod 515 is fixedly connected to the bottom of the inner wall of the annular sleeve 512, the inner wall of the annular sleeve 512 is fixedly connected with an arc-shaped strip 517 through two back pressure springs 518, the arc-shaped strip 517 is fixedly connected to the elastic strip 514, one end of the elastic strip 514 penetrates through a clamping groove formed in the outer side of the annular sleeve 512 and extends to the outside of the elastic strip, an embedded groove 523 is formed in one end of the elastic strip 514, an air suction pump 521 is fixedly connected to the bottom of the mounting disc 51, the air suction pump 521 is provided with a central hole 522, suction openings one 520 are embedded in the inner wall of the annular sleeve 512 at equal intervals, suction openings two 519 are formed in the top of the placing platform 513 at equal intervals;
wherein, the second suction port 519 includes an adsorption tube 5191, the bottom of the adsorption tube 5191 is communicated with an arc tube 5192, the arc tube 5192 is communicated with a connection air tube 522 through a connection tube 5198, the other side of the top of the arc tube 5192 is communicated with a first suction port 520, the inner cavity of the arc tube 5192 is sleeved with a sealing ring 5196 for the position with the suction port 520, the inner cavity of the adsorption tube 5191 is sleeved with a pattern plate 5193, the top of the pattern plate 5193 is fixedly connected with a lower compression rod 5194, the bottom of the pattern plate 5193 is fixedly connected with a soft rod 5197, and one end of the soft rod 5197 is extended into the first suction port 520 and is fixedly connected with the first.
When an etching plate enters the placing device 5 and firstly falls on the open horn ring 52, the driving wheel 510 on the driving motor 59 drives the conical fluted disc 56 to rotate through the conveying belt 511, in the rotating process of the conical fluted disc 56, the conical fluted disc 56 drives the plurality of transmission gears 55 to rotate, at the moment, the transmission gears 55 can enable the arc-shaped transmission shafts 54 in the arc-shaped rotating grooves 53 to rotate, the plurality of arc-shaped transmission shafts 54 can enable the etching plate contacted with the surface of the arc-shaped transmission shafts 54 to be transmitted to the top of the annular sleeve 513, and under the suction of the suction pump 521, negative pressure is generated at the suction ports 519 and the suction ports 520, so that the etching plate enters the placing platform 513, meanwhile, after the etching plate is contacted with the embedded groove 523, under the condition of the suction, the three elastic strips 514 move inwards, so that after the etching plate is tightly attached to the top of the placing platform 513, the elastic strips 514 can clamp the etching plate under the, can guarantee the stability of etching board conveying and sculpture like this, when the etching board contacts with two 519 the suction openings, under the circumstances of suction force, the etching board promotes down to push down pole 5194, it drives soft pole 5197 jack-up sealing plug 5195 to push down pole 5194, sealing plug 5195 breaks away from the contact with sealing ring 5196 this moment, this moment suction opening 520 is together with the outside, can clear away the dust on the etching board, can adsorb the gas of reaction when the etching of course, the air of having guaranteed in the etching chamber is in the state of purifying, take off when the etching board, under sealing plug 5195's gravity, 5195 and sealing ring 5196 can magnetic adsorption, two 519 the suction openings become one-way negative pressure mouth like this, thereby guarantee the quick stability of etching board on placing platform 513.
The process gas device 8 comprises a plurality of gas making devices 81, the gas making devices 81 are provided with a plurality of gas outlets 82, the gas outlets 82 are communicated with a conveying pipe 83, two plasma isolation plates 84 are arranged on the inner wall of the radio frequency device 9 and located at the positions of the gas making devices 81, partition bars 85 are fixedly connected to the bottoms of the plasma isolation plates 84, inner cavities of the plasma isolation plates 84 are communicated with the conveying pipe 83, a gas outlet channel 86 is formed in one side of each plasma isolation plate 84, and a gas distribution plate 87, a gas outlet plate I88 and a gas outlet plate II 89 are sleeved in the gas outlet channel 86.
The gas generated by the process gas device 8 is delivered into the plurality of cavities of the plasma isolation plate 84 through the delivery pipe 83, and the gas is discharged from the opposite surfaces of the two plasma isolation plates 84, so that the gas between the two plasma isolation plates 84 forms plasma clusters, the number of electron losing can be increased, and the etching quality and efficiency are further increased.
The radio frequency device 9 comprises a mounting table 91, and a plurality of radio frequency machines 92 are arranged at the bottom of the mounting table 91.
The use method of the dry etching machine is characterized in that: the method comprises the following steps:
firstly, when etching is prepared, an etching plate is put in from the upper part of the material placing cavity 215, the etching plate is stacked in the material placing cavity 215, the lowermost etching plate is positioned on the inclined planes of the two limit blocks 14 and limited by the inclined planes of the limit blocks 14, the lowermost etching plate of the limit blocks 14 in the material placing cavity 215 is clamped by the two lower rolling shafts 219, the clamped etching plate is pressed and limited, so that other etching plates are stacked in the material placing cavity 215, when the material placing operation is carried out, the bottom of the linkage strip 43 is contacted with the chute 225, the chute 225 can drive the vertical rod 223 to move upwards, meanwhile, the lowermost elliptical block 224 on the vertical rod 223 is firstly contacted with the arc-shaped grooves on the L-shaped rods 13, the elliptical block 224 contacted with the arc-shaped grooves can press the two L-shaped rods 13 towards two sides, the etching plate at the limit blocks 14 is limited to fall in the placing device 5, and meanwhile, the vertical rod 223 continues to rise, at this time, except for the lowermost elliptical block 224 in the U-shaped groove 22, the other elliptical blocks 224 are simultaneously separated from the two adjacent guide blocks 26, so that under the elastic action of the compression spring 210, the elastic sheet 28 and the pressing spring 29, the two guide blocks 26 move towards opposite directions and are separated from contact with the elliptical blocks 224, the rollers 219 on the connecting frame 27 are in contact with the rubber plate 216, at this time, all the etching plates located in the material discharge chamber 215 are clamped, when the uppermost portion of the linkage bar 43 reaches the inclined groove 225, the vertical bar 223 ascends, the lowermost elliptical block 224 is in contact with the two lowermost guide blocks 26, the guide blocks 26 move in opposite directions, at the same time, the two L-shaped rods 13 are restored to the original positions, at this time, the two lowermost rollers 219 are separated from contact with the lower portion of the rubber plate 216, at this time, the etching plate below enters the stopper 14 and is limited by the stopper 14, after the series of operations are completed, the vertical rod 223 moves downwards under the elasticity of the spring arranged at the top, and at the moment, the etching plate further moves to the original position;
secondly, when the etching plate enters the placing device 5 and firstly falls on the open horn ring 52, the driving wheel 510 on the driving motor 59 drives the conical fluted disc 56 to rotate through the conveying belt 511, in the rotating process of the conical fluted disc 56, the conical fluted disc 56 drives the plurality of transmission gears 55 to rotate, at the moment, the transmission gears 55 can enable the arc-shaped transmission shafts 54 in the arc-shaped rotating grooves 53 to rotate, the plurality of arc-shaped transmission shafts 54 can enable the etching plate contacted with the surface of the arc-shaped transmission shafts 54 to be transmitted to the top of the annular sleeve 513, and under the suction of the suction pump 521, negative pressure is generated at the suction ports 519 and the suction ports 520, so that the etching plate enters the placing platform 513, meanwhile, after the etching plate is contacted with the embedded groove 523, under the condition of suction, the three elastic strips 514 move inwards, so that after the etching plate is tightly attached to the top of the placing platform 513, the elastic strips 514 can clamp the etching plate under the elasticity of, when the etching plate is contacted with the second suction port 519, under the condition of suction force, the etching plate pushes the downward pressing rod 5194 downwards, the downward pressing rod 5194 drives the soft rod 5197 to jack the sealing plug 5195, the sealing plug 5195 is separated from the sealing ring 5196, dust on the etching plate can be removed through the first suction port 520 and the outside, the reacted gas can be adsorbed during etching, the air in the etching cavity is ensured to be in a purified state, when the etching plate is taken down, the sealing plug 5195 and the sealing ring 5196 can be magnetically adsorbed under the gravity of the sealing plug 5195, and the second suction port 519 becomes a one-way negative pressure port, so that the etching plate is rapidly stabilized on the placing platform 513;
a third step; the gas generated by the process gas device 8 is delivered into a plurality of inner cavities of the plasma isolation plates 84 through the delivery pipe 83, and the opposite surfaces of the two plasma isolation plates 84 are exhausted, so that the gas between the two plasma isolation plates 84 forms plasma clusters, the number of electron losing can be increased, and the etching quality and efficiency are further increased;
the fourth step; when the etched product is processed and is conveyed to the surface cleaning equipment 3 by the conveying device 4, because the gear 36 on the surface cleaning equipment 3 is in contact with the rack 42 on the conveying device 4, the gear 36 can rotate, at the moment, the two reciprocating screw rods move downwards under the driving of the ball sleeve, the cleaning head 311 moves to the top of the placing mechanism 5 moving towards the lower part of the cleaning head and slowly enters the etching plate in the placing mechanism 5, the deviation correcting rod 35 is firstly in contact with the inclined plane of the placing mechanism 5 and adjusts the fine adjusting block 38, the fine adjusting block 38 extrudes the fine adjusting spring 39, so that the cleaning plate 313 can be stably attached to the top of the etching plate, the servo motor 310 is started, the servo motor 310 drives the cleaning plate 313 to rotate slowly, the sponge can clean the surface of the product, when the ventilation inclined plate 316 is aligned with the arc chute 320, under the elasticity of the ejection spring 317, the closing plate 315 moves upwards, and the closing plate 315 enters the big cavity of the sliding groove, and the vacuumizing device 33 sucks the cavity 314 through the suction, so that negative pressure is generated in the sliding cavity, and the gap between the sliding cavity and the product can suck the reaction liquid generated above, so that the cleaning effect is better, and the cleaning is quicker.
As used in the specification and in the claims, certain terms are used to refer to particular components. As one skilled in the art will appreciate, manufacturers may refer to a component by different names. This specification and claims do not intend to distinguish between components that differ in name but not function. In the following description and in the claims, the terms "include" and "comprise" are used in an open-ended fashion, and thus should be interpreted to mean "include, but not limited to. "substantially" means within an acceptable error range, and a person skilled in the art can solve the technical problem within a certain error range to achieve the technical effect basically.
It is noted that the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a good or system that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such good or system. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of additional like elements in the article or system in which the element is included.
The foregoing description shows and describes several preferred embodiments of the invention, but as before, it is to be understood that the invention is not limited to the forms disclosed herein, but is not to be construed as excluding other embodiments and is capable of use in various other combinations, modifications, and environments and is capable of changes within the scope of the inventive concept as expressed herein, commensurate with the above teachings, or the skill or knowledge of the relevant art. And that modifications and variations may be effected by those skilled in the art without departing from the spirit and scope of the invention as defined by the appended claims.

Claims (9)

1. A dry etcher, comprising: a sealing channel (1), a continuous feeding device (2) is arranged on the right side of the top of the sealing channel (1) in a penetrating way, the left side of the sealing channel (1) is provided with a surface cleaning device (3), the top of a conveyor belt of the sealing channel (1) is fixedly connected with a conveying device (4) at equal intervals, the top of the conveying device (4) is fixedly connected with placing mechanisms (5) at equal intervals, the front side and the rear side of the inner wall of the conveying device (4) are fixedly connected with conveying shafts (6) at equal distances, the conveying shaft (6) is lapped with the bottom of the conveying device (4), a square opening is formed in the top of the sealing channel (1), the square port is internally sleeved with a radio frequency device (9), the front side of the inner wall of the radio frequency device (9) is fixedly connected with a process gas device (8), and the bottom of the process gas device (8) is provided with a substrate (7).
2. The dry etching machine according to claim 1, wherein: sealing channel (1) is including the square cover of cavity (11), the square cover of cavity (11) top right side fixedly connected with mounting panel (15), the whereabouts mouth has been seted up at the top of mounting panel (15), movable groove (17) and U-shaped groove (16) have all been seted up to the left and right sides of whereabouts mouthful inner wall, movable groove (17) and U-shaped groove (16) inner chamber intercommunication, movable groove (17) have movable rod (18) through return spring (12) elastic connection, the outside fixedly connected with L shape pole (13) of movable rod (18), inboard fixedly connected with stopper (14) of movable rod (18).
3. The dry etching machine according to claim 2, wherein: conveyer (4) are including board-like conveyer belt (41), equal fixedly connected with rack (42) in both sides around board-like conveyer belt (41), board-like conveyer belt (41) top front side is provided with linkage strip (43).
4. A dry etcher as claimed in claim 3, characterized in that: the continuous feeding device (2) comprises a placing box (21), wherein a U-shaped groove two (22) is formed in the front side of the inner wall of the placing box (21), two plywood (23) fixedly connected to the front side of the inner wall of a transverse groove of the U-shaped groove two (22) are fixedly connected to the front side of the inner wall of the transverse groove, two opposite sides of the plywood (23) are fixedly connected to a limiting plate (24), a sliding rod (25) is inserted into one side of the limiting plate (24), a connecting frame (27) is fixedly connected to one end of the sliding rod (25), a guide block (26) is fixedly connected to the other end of the sliding rod (25), two compression springs (28) are fixedly connected to the opposite sides of the limiting plate (24), two opposite sides of the compression springs (210) are fixedly connected to the two sides of the inner wall of the elastic sheet (28) through elastic sheets (28), one side of the connecting frame (27) is fixedly connected with the U-shaped block (212) through a connecting block (211), a shaft lever (218) is movably connected in a sliding groove (217) formed in the upper side and the lower side of the inner wall of the U-shaped block (212), a rolling shaft (219) is sleeved on the shaft lever (218), a U-shaped frame (220) is inserted into one side of the U-shaped block (212), an arc-shaped block (221) is fixedly connected to one end, located on the U-shaped block (212), of the U-shaped frame (220), the arc-shaped block (221) is fixedly connected with one side of the inner wall of the U-shaped block (212) through an adjusting spring (222), a discharging cavity (215) is arranged in the middle of the placing box (21), clamping strips (213) are hinged to the left side and the right side of the inner cavity of the discharging cavity (215) through hinge rods (214), and rubber plates (216) are fixedly connected to one side, located, be located roller bearing (219) of below with one side overlap joint of rubber slab (216), other roller bearing (219) with interval is reserved to rubber slab (216), place in case (21) and be located the bottom interlude of U-shaped groove two (22) inner wall has montant (223), the cover is equipped with a plurality of oval pieces (224) on montant (223), chute (225) have been seted up to montant (223) bottom, the below oval piece (224) both sides are located the below of two L shape poles (13), and L shape pole (13) are located oval piece (224) department seted up with the arc wall of oval piece (224) both ends adaptation is located oval piece (13) on oval piece (224) below and the mutual contact that oval piece (224) are located two guide position blocks (26), other one side of guide position block (26) with protruding department contact in oval piece (224).
5. The dry etching machine according to claim 4, wherein: the surface cleaning equipment (3) comprises an equipment box body (31), the top of the inner wall of the equipment box body (31) is fixedly connected with a cleaning head (311) through a bottom end fixedly connected with a telescopic belt (32), the top of the inner wall of the equipment box body (31) is fixedly connected with a vacuumizing device (33), four elastic rods are fixedly connected with the top of the cleaning head (311), a transverse plate (34) is fixedly connected on the elastic rods on eight front and back sides, a reciprocating lead screw is fixedly connected with the middle part of the bottom of the transverse plate (34), a limiting sleeve (37) is sleeved on the reciprocating lead screw, gears (36) are arranged on the front side and the back side of the inner wall of a hollow square sleeve (11), racks (42) are meshed with the gears (36), a ball sleeve is sleeved on the gears (36), the reciprocating lead screw sleeve is sleeved in the ball sleeve, and an inner cavity at the bottom of the cleaning head (311) is elastically connected with a, the bottom of fine-tuning piece (38) is embedded with servo motor (310), the bottom cover of servo motor (310) is equipped with fixed disk (312), the bottom overlap joint of fixed disk (312) has wash board (313), wash board (313) with servo motor (310)'s output fixed connection, a plurality of sliding chutes have been seted up to the bottom of washing board (313), the round hole has been seted up to the sliding chute inner wall, ejector pin (318) has been run through at the top of sliding chute inner wall, the top fixedly connected with swash plate (316) of ejector pin (318), a plurality of arc chute (320) have been seted up to the bottom equidistance of fixed disk (312), ejector pin (318) bottom fixedly connected with closed plate (315), closed plate (315) with wash board (313) bottom all is provided with the sponge, the swash plate (316) of ventilating through ejecting spring (317) with wash draw-in groove (319) inner wall bottom elastic connection of board (313), be provided with suction hole (314) in arc chute (320) still be provided with around cleaning head (311) and rectify pole (35), suction hole (314) pass through the hose intercommunication with evacuating device (33).
6. The dry etching machine according to claim 5, wherein: placer (5) are including mounting disc (51), uncovered loudspeaker ring (52) have been cup jointed at the top of mounting disc (51), a plurality of arc rotating grooves (53) have been seted up to the surperficial equidistance of uncovered loudspeaker ring (52), swing joint has arc conveying axle (54) in arc rotating groove (53), and arc conveying axle (54) surface is provided with soft silica gel, the outer pot head of arc conveying axle (54) is equipped with drive gear (55), mounting disc (51) internal rotation is connected with toper fluted disc (56), toper fluted disc (56) are located under, toper fluted disc (56) and a plurality of drive gear (55) mesh, mounting disc (51) right side is through support plate (58) fixedly connected with driving motor (59), the output fixedly connected with drive wheel (510) of driving motor (59), drive wheel (510) pass through conveyer belt (511) with belt groove (57) that toper fluted disc (56) lateral wall was seted up The bottom of the inner wall of the mounting disc (51) is fixedly connected with an annular sleeve (512), a placing platform (513) is sleeved in the annular sleeve (512), three elastic strips (514) are arranged in the inner cavity of the annular sleeve (512) at equal intervals, a limiting sliding opening (516) is formed in each elastic strip (514), a positioning rod (515) is inserted in each limiting sliding opening (516), each positioning rod (515) is fixedly connected to the bottom of the inner wall of the annular sleeve (512), the inner wall of the annular sleeve (512) is fixedly connected with an arc strip (517) through two back pressure springs (518), each arc strip (517) is fixedly connected to each elastic strip (514), one end of each elastic strip (514) penetrates through a clamping groove formed in the outer side of the annular sleeve (512) and extends to the outer side of the annular sleeve, one end of each elastic strip (514) is provided with an embedded groove (523), and the bottom of the mounting disc (51) is fixedly connected with an air extracting pump (521), the air suction pump (521) is provided with a central hole (522), a first suction port (520) is embedded in the inner wall of the annular sleeve (512) at equal intervals, a second suction port (519) is arranged at the top of the placing platform (513) at equal intervals, and the air suction pump (521) is communicated with the second suction port (519) and the first suction port (520) through a plurality of connecting air pipes (522);
wherein, the second suction port (519) includes an adsorption pipe (5191), the bottom intercommunication of adsorption pipe (5191) has arc pipe (5192), arc pipe (5192) through connecting pipe (5198) with be connected trachea (522) intercommunication, arc pipe (5192) top opposite side intercommunication has suction port (520), arc pipe (5192) inner chamber for with suction port (520) department cover is equipped with sealing ring (5196), adsorption pipe (5191) inner chamber cover is equipped with flower type board (5193), the top fixedly connected with depression bar (5194) down of flower type board (5193), the bottom fixedly connected with soft pole (5197) of flower type board (5193), the one end of soft pole (5197) extends to in suction port (520) and with sealing plug (5195) fixed connection.
7. The dry etching machine according to claim 6, wherein: process gas device (8) include that a plurality of gases make device (81), gas is made device (81) and is provided with a plurality of gas outlets (82), gas outlet (82) intercommunication has conveyer pipe (83), radio frequency device (9) inner wall just is located every gas and is made device (81) department and all is provided with two electric thick liquid division boards (84), the bottom fixedly connected with parting bead (85) of electric thick liquid division board (84), electric thick liquid division board (84) inner chamber with conveyer pipe (83) intercommunication, outlet channel (86) have been seted up to one side of electric thick liquid division board (84), outlet channel (86) endotheca is equipped with and is divided gas board (87) and outlet plate one (88) and outlet plate two (89).
8. The dry etching machine according to claim 7, wherein: the radio frequency device (9) comprises a mounting table (91), and a plurality of radio frequency machines (92) are arranged at the bottom of the mounting table (91).
9. The use method of the dry etching machine according to the claims 1 to 8, characterized in that: the method comprises the following steps:
firstly, when etching is prepared, an etching plate is put in from the upper part of a material placing cavity (215), the etching plate is stacked in the material placing cavity (215), the etching plate at the lowest part is positioned on the inclined planes of two limiting blocks (14) and limited by the inclined planes of the limiting blocks (14), the etching plate at the lowest part of the limiting blocks (14) in the material placing cavity (215) is clamped by two rolling shafts (219) at the lower part, the clamped etching plate is limited by extrusion, other etching plates are stacked in the material placing cavity (215), when the material placing operation is carried out, the bottom of a linkage bar (43) is contacted with a chute (225), the chute (225) can drive a vertical bar (223) to move upwards, meanwhile, the elliptical block (224) at the lowest part on the vertical bar (223) is firstly contacted with an arc-shaped groove on an L-shaped bar (13), and the elliptical block (224) contacted with the arc-shaped groove can extrude two L-shaped bars (13) towards two sides, the etching plates are limited to fall in the placing device (5) by the limiting blocks (14), meanwhile, the vertical rods (223) continue to rise, at the moment, other elliptical blocks (224) are separated from the two adjacent guide blocks (26) in the U-shaped groove II (22) in an overlapping mode except for the lowermost elliptical block (224), so that under the elastic action of the compression spring (210), the elastic piece (28) and the extrusion spring (29), the two guide blocks (26) move towards opposite directions and are separated from contact with the elliptical block (224), the roller (219) on the connecting frame (27) is in contact with the rubber plate (216), at the moment, all the etching plates in the discharging cavity (215) are clamped, when the topmost part of the linkage strip (43) reaches the inclined groove (225), at the moment, the vertical rods (223) rise, the lowermost elliptical block (224) is in contact with the lowermost two guide blocks (26), and the guide blocks (26) move in opposite directions, meanwhile, the two L-shaped rods (13) restore to the original positions, the two roller shafts (219) at the lowest part are separated from the lower part of the rubber plate (216), the etching plate at the lower part enters the limiting block (14) and is limited by the limiting block (14), after the series of operations are completed, the vertical rod (223) moves downwards under the elasticity of the spring arranged at the top, and the etching plate further moves to the original position;
secondly, when the etching plate enters the placing device (5), the etching plate firstly falls on the open horn ring (52), a driving wheel (510) on a driving motor (59) drives a conical fluted disc (56) to rotate through a conveying belt (511), the conical fluted disc (56) drives a plurality of transmission gears (55) to rotate in the rotating process of the conical fluted disc (56), at the moment, the transmission gears (55) can enable an arc-shaped transmission shaft (54) in an arc-shaped rotating groove (53) to rotate, the arc-shaped transmission shafts (54) can enable the etching plate in surface contact with the arc-shaped transmission shaft (54) to transmit the top of an annular sleeve (513), and under the suction of an air suction pump (521), negative pressure is generated at a suction port II (519) and a suction port I (520), so that the etching plate enters the placing platform (513), meanwhile, the etching plate is in contact with an embedded groove (523), and under the condition of suction, three elastic strips (514) move inwards, thus, after the etching plate is tightly attached to the top of the placing platform (513), the elastic strip (514) can clamp the etching plate under the elasticity of the back pressure spring (518), so that the conveying and etching stability of the etching plate can be ensured, when the etching plate is contacted with the second suction port (519), under the condition of suction force, the etching plate downwards pushes the lower pressure rod (5194), the lower pressure rod (5194) drives the soft rod (5197) to jack up the sealing plug (5195), at the moment, the sealing plug (5195) is separated from the sealing ring (5196) to be contacted, at the moment, the first suction port (520) and the outer part can remove dust on the etching plate, certainly, the reacted gas can be adsorbed when the etching plate is etched, the air in the etching cavity is in a purified state, when the etching plate is taken down, under the gravity of the sealing plug (5195), the sealing plug (5196) and the sealing ring (5196) can be magnetically adsorbed, so that the second suction port (519) becomes a one-way negative pressure port, thereby ensuring that the etching plate is quickly and stably arranged on the placing platform (513);
a third step; gas generated by the process gas device (8) is conveyed into a plurality of inner cavities of the plasma isolation plates (84) through the conveying pipe (83), and the opposite surfaces of the two plasma isolation plates (84) are exhausted, so that the gas between the two plasma isolation plates (84) forms plasma clusters, the number of electron losing can be increased, and the etching quality and efficiency are further increased;
the fourth step; when the etched product is processed and is conveyed to the surface cleaning equipment (3) by the conveying device (4), because the gear (36) on the surface cleaning equipment (3) is contacted with the rack (42) on the conveying device (4), the gear (36) can rotate, at the moment, two reciprocating screw rods are driven by the ball sleeve to move downwards, the cleaning head (311) moves to the top of the placing mechanism (5) moving towards the lower part of the cleaning head and slowly enters the etching plate in the placing mechanism (5), the deviation correcting rod (35) is firstly contacted with the inclined surface of the placing mechanism (5) and adjusts the fine adjusting block (38), the fine adjusting block (38) extrudes the fine adjusting spring (39), so that the cleaning plate (313) can be stably attached to the top of the etching plate, the servo motor (310) is started, the servo motor (310) drives the cleaning plate (313) to slowly rotate, the sponge can wash the surface of product, and during the rotation, when ventilating swash plate (316) and arc chute (320) counterpoint, under ejection spring (317) elasticity, closing plate (315) rebound, closing plate (315) get into the big intracavity of sliding tray this moment, it is empty (314) through the suction at evacuating device (33), the sliding tray intracavity produces the negative pressure this moment, the clearance between sliding tray and the product can be with the reaction liquid suction that the top produced, abluent effect is better like this, and is more quick moreover.
CN202110328670.6A 2021-03-26 2021-03-26 Dry etching machine and using method thereof Active CN113053719B (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105826222A (en) * 2016-03-25 2016-08-03 苏州晶洲装备科技有限公司 Wafer etching device
CN206541817U (en) * 2017-03-28 2017-10-03 通威太阳能(合肥)有限公司 One kind etching blanking machine lowering or hoisting gear
CN208352277U (en) * 2018-07-17 2019-01-08 锐捷光电科技(江苏)有限公司 A kind of sapphire chip IC P charging equipment
CN111672808A (en) * 2020-06-18 2020-09-18 上海广奕电子科技股份有限公司 Cleaning mechanism for ICP plasma etching

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105826222A (en) * 2016-03-25 2016-08-03 苏州晶洲装备科技有限公司 Wafer etching device
CN206541817U (en) * 2017-03-28 2017-10-03 通威太阳能(合肥)有限公司 One kind etching blanking machine lowering or hoisting gear
CN208352277U (en) * 2018-07-17 2019-01-08 锐捷光电科技(江苏)有限公司 A kind of sapphire chip IC P charging equipment
CN111672808A (en) * 2020-06-18 2020-09-18 上海广奕电子科技股份有限公司 Cleaning mechanism for ICP plasma etching

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