CN113053714A - Vacuum processing system, base station driving device and control method thereof - Google Patents
Vacuum processing system, base station driving device and control method thereof Download PDFInfo
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- CN113053714A CN113053714A CN201911379900.0A CN201911379900A CN113053714A CN 113053714 A CN113053714 A CN 113053714A CN 201911379900 A CN201911379900 A CN 201911379900A CN 113053714 A CN113053714 A CN 113053714A
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- 238000009489 vacuum treatment Methods 0.000 claims 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
Abstract
The invention discloses a vacuum processing system, a driving device of a base station and a control method thereof, wherein the driving device of the base station comprises a supporting part for bearing the base station and at least two driving units, the driving ends of the driving units are connected with the supporting part, and the connecting positions of the driving ends of the driving units and the supporting part are symmetrically arranged relative to the vertical central line of the supporting part so as to drive the supporting part to vertically lift. The driving device has the advantages that the structural design can improve the reliability of the vertical lifting of the wafer in the vacuum chamber of the vacuum processing system, reduce the probability of deflection in the lifting process and accurately control the gap between the wafer and the spray head.
Description
Technical Field
The invention relates to the technical field of semiconductor processing equipment, in particular to a vacuum processing system, a driving device of a base station and a control method of the driving device.
Background
In the manufacture of semiconductor devices, it is often necessary to subject a semiconductor wafer to be processed to a process such as deposition, etching, or oxidation in a vacuum environment.
The wafer to be processed is supported by the supporting component in the vacuum chamber, and in the actual processing process, in order to obtain a better processing effect, the gap between the spray head and the wafer in the vacuum chamber needs to be adjusted. A supporting member for supporting the wafer is provided in the vacuum chamber in a liftable manner so as to adjust a gap between the wafer and the shower head.
In the existing vacuum processing system, due to the structural limitation, a mechanism for driving the supporting component to ascend and descend is often arranged on one side, namely, the driving force direction for driving the supporting component to ascend and descend is eccentric to the central line for driving the supporting component to ascend and descend and is far away from the central line for driving the supporting component to ascend and descend, so that the possibility that a wafer supported by the supporting component is inclined during ascending and descending is high during actual operation, and the processing effect is influenced.
Disclosure of Invention
The invention aims to provide a vacuum processing system, a driving device of a base station and a control method thereof.
In order to solve the technical problem, the invention provides a driving device of a base platform, which comprises a supporting part for bearing the base platform and at least two driving units, wherein the driving ends of the driving units are connected with the supporting part, and the connecting positions of the driving ends of the driving units and the supporting part are symmetrically arranged relative to the vertical central line of the supporting part so as to drive the supporting part to vertically lift.
The driving device of the base station as described above, further comprising a composite damping system for preventing the support member from deflecting during movement; the composite damping system comprises at least two composite damping units, and the composite damping units are arranged between the driving unit and the supporting part.
The driving device of the base platform comprises a driving source and a lifting piece, wherein the driving source is used for driving the lifting piece to vertically lift, the supporting component is connected with the lifting piece through a connecting bridge, and the composite damping unit is specifically arranged between the connecting bridge and the lifting piece.
The driving device of the base station, wherein the driving source is a motor, the driving unit further includes a driving shaft connected to an output end of the motor, a length direction of the driving shaft is parallel to a vertical center line of the supporting member, and the motor is configured to drive the driving shaft to rotate; the lifting piece comprises a lifting block and a transition connecting piece fixedly connected with the lifting block, the lifting block is in threaded connection with the driving shaft, and the connecting bridge is connected with the transition connecting piece.
In the driving apparatus for an abutment, the connecting bridge and the transition piece have connecting holes corresponding in position, and are connected by a connecting pin penetrating through the connecting holes, and the diameter of the connecting hole is larger than the radial dimension of the connecting pin, so that a predetermined movement margin is provided between the connecting pin and the connecting hole.
According to the driving device of the base station, the composite damping unit comprises a vertical damper and a horizontal damper, one end of the vertical damper is abutted to the transition connecting piece, the other end of the vertical damper is abutted to the connecting pin, one end of the horizontal damper is abutted to the connecting bridge, and the other end of the horizontal damper is abutted to the connecting pin.
According to the driving device of the base station, the supporting component comprises a circular cylinder and end plates fixedly connected to two ends of the circular cylinder, and an axial center line of the circular cylinder is a vertical center line of the supporting component.
The driving device of the base station further comprises a controller, wherein the controller is in communication connection with each driving unit, and the controller is used for controlling each driving unit to synchronously act.
A vacuum processing system, comprising a chamber component with a vacuum chamber, a base station positioned in the vacuum chamber and a driving device for driving the base station to vertically lift, characterized in that the driving device is the driving device for the base station, and the vertical central line of the supporting component is coincident with the axial central line of the chamber component.
In the vacuum processing system, the cavity bottom wall of the cavity component is provided with the central through hole, the cavity bottom wall extends upwards along the peripheral wall of the central through hole to form a cylinder part, and the cylinder part is connected with the mounting seat in a sealing way; the upper end of the supporting component penetrates through the barrel part to bear the base station, and an elastic annular sealing element is arranged between the bottom of the base station and the mounting seat.
The invention also provides a control method of the driving device of the base platform, wherein the driving device comprises a supporting part for bearing the base platform and at least two driving units;
the driving unit comprises a driving source, a driving shaft connected with the output end of the driving source and a lifting piece in threaded connection with the driving shaft, the driving shaft is vertically arranged, and the lifting piece is connected with the supporting component;
the connecting positions of the lifting piece and the supporting component of each driving unit are symmetrically arranged relative to the vertical central line of the supporting component;
the control method comprises the following steps: and controlling the driving sources to synchronously rotate forwards or reversely to drive the driving shafts to synchronously rotate forwards or reversely, wherein under the rotation action of the driving shafts, the lifting piece in threaded connection with the driving shafts ascends or descends along the driving shafts to drive the supporting component to vertically ascend or descend.
According to the control method, the driving device comprises a composite damping system, the composite damping system comprises at least two composite damping units, the composite damping units are arranged between the lifting piece and the supporting part, and each composite damping unit comprises a vertical damper and a horizontal damper;
in the lifting process, when the vertical center line of the supporting component inclines, one vertical damper in the at least two composite damping units is stretched to apply a downward resetting force to the corresponding position of the supporting component, and the other vertical damper is compressed to apply an upward resetting force to the corresponding position of the supporting component, so that the vertical center line of the supporting component is kept vertical;
in the lifting process, when the center of the supporting component deviates in a horizontal plane, one horizontal damper in the at least two composite damping units is stretched to apply a reset force pointing to the center to the corresponding position of the supporting component, the other horizontal damper is compressed to apply a reset force back to the center to the corresponding position of the supporting component, and therefore the lifting center of the supporting component does not deviate.
In the control method, the support member is connected to the lifter through a connecting bridge, and the connecting bridge is connected to the lifter through a connecting pin; the composite damping unit is specifically arranged between the connecting bridge and the lifting piece, one end of the vertical damper is abutted to the lifting piece, the other end of the vertical damper is abutted to the connecting pin, one end of the horizontal damper is abutted to the connecting bridge, the other end of the horizontal damper is abutted to the connecting pin, and in the lifting process, the vertical damper applies a reset force in the vertical direction to the connecting bridge so that the vertical central line of the supporting component is kept vertical, and the horizontal damper applies a reset force in the horizontal direction to the connecting bridge so that the lifting center of the supporting component is not deviated.
Compared with the prior art, the technical scheme provided by the invention changes the driving structure for driving the base station to lift, and particularly, the base station is carried by the supporting part, the driving device is provided with at least two driving units, the driving end of each driving unit is connected with the supporting part and is used for driving the supporting part to lift vertically so as to adjust the gap between the wafer carried by the supporting part and the spray head in the vacuum chamber, wherein the connecting position of the driving end of each driving unit and the supporting part is symmetrically arranged relative to the vertical central line of the supporting part, so that compared with the existing single-side driving, the driving force direction borne by the supporting part in the scheme is superposed with the vertical central line of the supporting part, namely, the driving force borne by the supporting part is distributed uniformly, the deflection probability can be reduced during vertical lifting, and the reliability along vertical lifting is improved, accordingly, the control precision of the gap between the wafer and the nozzle can be improved, and the treatment effect can be ensured.
Drawings
FIG. 1 is a schematic cross-sectional view of one embodiment of a vacuum processing system according to the present invention.
Description of reference numerals:
a chamber member 100, a vacuum chamber 101, a cylindrical portion 102, a mounting seat 103, and a seal ring 104;
a support member 201, a circular cylinder 211, an upper end plate 212, a lower end plate 213, a base 202, an annular seal member 203, a connecting bridge 204;
a driving unit 300, a driving source 301, a driving shaft 302, a lifting piece 303, a lifting block 331, a transition connecting piece 332, a frame 304, a connecting pin 305, a connecting hole 306 and a guide rod 307;
a vertical damper 401, a horizontal damper 402;
Detailed Description
In order that those skilled in the art will better understand the disclosure, the invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
For ease of understanding and simplicity of description, the following description will be made in conjunction with a vacuum processing system, a driving apparatus of a base, and a control method thereof.
Referring to fig. 1, fig. 1 is a schematic cross-sectional view of an embodiment of a vacuum processing system according to the present invention.
In this embodiment, the vacuum processing system includes a chamber body 100 having a vacuum chamber 101, a base 202 located in the vacuum chamber 101, and a driving device for driving the base 202 to vertically move up and down.
The chamber bottom wall of the chamber body 100 has a central through hole, the chamber bottom wall extends upward along the peripheral wall of the central through hole to form a cylinder portion 102, the cylinder portion 102 is connected with a mounting seat 103 in a sealing manner, and a sealing ring 104 is arranged between the cylinder portion 102 and the mounting seat to realize sealing so as to prevent air under the external atmospheric pressure environment from entering the vacuum chamber 101 from a connecting gap between the cylinder portion 102 and the mounting seat 103.
A showerhead 600 is provided in the vacuum chamber 101 of the chamber body 100 for supplying a reaction gas into the vacuum chamber 101.
The base 202 is used to carry a wafer 500. A plasma processing region is formed between the showerhead 600 and the pedestal 202. An rf power (not shown) is applied to the base 202 to dissociate the reactant gases delivered by the showerhead 600 into a plasma, which etches the wafer 500 into a predetermined pattern. The distance h between the wafer 500 and the showerhead 600 is adjusted by driving the base 202 to move up and down by the driving device.
The driving device comprises a supporting part 201 and at least two driving units 300, the driving ends of the driving units 300 are connected with the supporting part 201, the connecting positions of the driving ends of the driving units 300 and the supporting part 201 are symmetrically arranged relative to the vertical central line of the supporting part 201, so that the supporting part 201 is driven to vertically lift, the base platform 202 and the wafer 500 carried by the base platform 202 are driven to vertically lift together, and the distance h between the wafer 500 and the spray head 600 is further adjusted.
Since the connection positions of the driving ends of the driving units 300 and the supporting member 201 are symmetrically arranged with respect to the vertical center line of the supporting member 201, the driving force distribution received by the supporting member 201 is balanced, and it is considered that the direction of the driving force received by the supporting member 201 coincides with the vertical center line thereof in effect, so that the probability of deflection when the supporting member 201 is vertically lifted can be reduced, the reliability in vertical lifting can be improved, the control accuracy of the gap between the wafer 500 and the showerhead 600 can be correspondingly improved, and the processing effect on the wafer 500 can be ensured.
The upper end of the supporting member 201 passes through the central through hole of the chamber body 100 to support the base 202. In particular, the vertical center line of the support member 201 coincides with the axial center line of the chamber body member 100.
An elastic annular sealing piece 203 is arranged between the bottom of the base 202 and the mounting seat 103, and referring to fig. 1, after the arrangement, the supporting component 201 is sealed and isolated from the vacuum chamber 101, so that the influence on the vacuum chamber 101 is avoided, and meanwhile, the base 202 is supported on the mounting seat 103 through the elastic annular sealing piece 203, so that the overall stability of the supporting component 201 during vertical movement can be ensured.
In practice, the ring seal 203 may be of a bellows configuration.
In this embodiment, the supporting member 201 includes a circular cylinder 211, an upper end plate 212 fixed to the upper end of the circular cylinder 211, and a lower end plate 213 fixed to the lower end of the circular cylinder 211, and it is understood that in practice, the base 202 is placed on the upper end plate 212 and supported by the upper end plate 212. Specifically, the diameter of the circular cylinder 211 is smaller than that of the central through hole of the chamber body part 100 to facilitate the vertical movement of the support part 201; the upper end plate 212 and the lower end plate 213 may be sized according to actual use requirements, and the support member 201 may be specifically configured to be symmetrical with respect to a vertical center line thereof.
In this embodiment, the supporting member 201 is specifically connected to the driving end of the driving unit 300 through the connecting bridge 204, and the supporting member 201 is fixedly connected to the connecting bridge 204 through the lower end plate 213 thereof, so as to facilitate the arrangement of each driving unit 300, the connecting bridge 204 may be specifically configured as a circular structure, and the center of the circular structure is overlapped with the center of the circular cylinder 211 of the supporting member 201.
The driving units 300 comprise driving sources 301 and lifting pieces 303, the driving sources 301 are used for driving the lifting pieces 303 to vertically lift, the lifting pieces 303 are connected with the connecting bridges 204, on the basis that the centers of the connecting bridges 204 and the supporting parts 201 coincide, the connecting positions of the lifting pieces 303 and the connecting bridges 204 of each driving unit 300 are symmetrically arranged relative to the centers of the connecting bridges 204, for example, the connecting positions can be uniformly distributed along the circumferential direction of the connecting bridges 204.
In the illustrated scheme, the driving device is specifically provided with two driving units 300, the two driving units 300 are uniformly arranged along the circumferential direction of the connecting bridge 204, and a connecting line of the lifting member 303 of the two driving units 300 and two connecting points of the connecting bridge 204 passes through the center of the connecting bridge 204.
In this embodiment, a driving source 301 of the driving unit 300 specifically selects a motor, an output end of the motor is connected with a driving shaft 302, a length direction of the driving shaft 302 is parallel to a vertical center line of the supporting member 201, the lifting member 303 includes a lifting block 331 and a transition connecting member 332, the lifting block 331 is sleeved on the driving shaft 302 and is in threaded connection with the driving shaft 302, and the transition connecting member 332 is fixedly connected with the lifting block 331 and is fixedly connected with the connecting bridge 204; the transition piece 332 may be specifically fixed to the lifting block 331.
The driving unit 300 may further include a frame 304, the frame 304 may be fixedly connected to the bottom of the chamber body 100 to provide support for the driving shaft 302, and specifically, the frame 304 includes a bottom plate and a top plate which are vertically arranged opposite to each other, the driving shaft 302 passes through the bottom plate and the top plate of the frame 304, a bearing is disposed between one end of the driving shaft and the bottom plate of the frame 304, and a bearing is disposed between the other end of the driving shaft and the top plate of the frame 304, so that the driving shaft 302 can stably rotate under the driving of the motor.
When the motor rotates, the driving shaft 302 is driven to rotate, the axial position of the driving shaft 302 is fixed, the circumferential rotation can be achieved only, the lifting block 331 is in threaded connection with the driving shaft 302, the lifting block 331 can lift along the driving shaft 302, the transition connecting piece 332 lifts along with the lifting block 331 and drives the connecting bridge 204 to lift, and therefore the supporting component 201 is driven to lift together.
The driving unit 300 may further be provided with a guide structure to guide the lifting of the lifting member 303, so as to further ensure the vertical lifting of the connecting bridge 204 and the supporting member 201.
Specifically, the guiding structure includes two guiding rods 307 disposed on both sides of the driving shaft 302, and the transition piece 332 is slidably engaged with the two guiding rods 307.
The specific number and arrangement of the guide rods 307 can be determined as required, as long as the reliability and stability of the vertical lifting of the lifting piece 303 can be improved.
The driving device can also be provided with a composite damping system for preventing the supporting component 201 from deflecting in the vertical lifting process, wherein the composite damping system comprises at least two composite damping units, and the composite damping units are arranged between the driving unit 300 and the supporting component 201.
Specifically, the composite damping unit comprises a vertical damper 401 and a horizontal damper 402, wherein the vertical damper 401 is used for adjusting the position of the supporting component 201 in the vertical direction, and the horizontal damper 402 is used for adjusting the position of the supporting component 201 in the horizontal direction.
In practical applications, the number of the composite damping units may be the same as the number of the driving units 300, that is, the composite damping units are disposed between each driving unit 300 and the supporting member 201, and certainly, when the driving units 300 are disposed to be three or more, only two composite damping units may be disposed, and the composite damping units may be disposed between two driving units 300 and the supporting member 201.
On the basis of the specific structure of the support member 201 and the drive unit 300 described above, the composite damping unit is specifically provided between the connecting bridge 204 and the transition piece 332.
It will be appreciated that since the composite damping system is capable of adjusting the support member 201 during movement to ensure that it does not deflect during vertical movement, the connection of the bridge 204 to the transition piece 332 is clearly free of adjustment space and is not a snap-fit connection.
In this embodiment, the transition connection member 332 and the connection bridge 204 have connection holes 306 corresponding to each other in position, and the transition connection member 332 and the connection bridge 204 are connected by a connection pin 305 penetrating through the connection holes 306, wherein the aperture of the connection hole 306 is larger than the radial dimension of the connection pin 305, so that a set movement margin is provided between the connection pin 305 and the connection hole 306, and thus, when the vacuum processing system is deformed by heat during processing, the connection bridge 204 and the lifting member 303 are not locked, and the composite damping system can be adjusted normally.
On the basis of the connection, the composite damping unit can be specifically arranged as follows: as shown in fig. 1, one end of the vertical damper 401 abuts against the transition piece 332, the other end abuts against the connecting pin 305, the vertical damper 401 extends in the vertical direction, one end of the horizontal damper 402 abuts against the connecting bridge 204, the other end abuts against the connecting pin 305, and the horizontal damper 402 extends in the vertical direction.
In order to limit the positions of the vertical damper 401 and the horizontal damper 402 and prevent dislocation, a limiting groove structure can be arranged at the corresponding positions of the connecting bridge 204 and the transition connecting piece 332.
The vertical damper 401 and the horizontal damper 402 may be springs, or may be other elastic members.
In this embodiment, the driving apparatus further includes a controller, which is connected in communication with the driving sources 301 of the driving units, and is configured to control the driving sources 301 to operate synchronously, so as to ensure that the driving forces applied to the connecting positions of the connecting bridge 204 are the same, and the lifting is synchronous. Thus, the structure of the driving device can be simplified, and the occupation of excessive space below the chamber body part 100 can be avoided.
Of course, it is understood that if the actual application is allowed, the driving units 300 may be operated in synchronization by providing a mechanical structure.
In practical application, the control method of the driving device of the vacuum processing system is as follows:
after the wafer 500 is placed on the base 202, if the distance h between the wafer 500 and the spray head 600 needs to be reduced, a controller sends a forward rotation instruction to the driving sources 301 of the driving units 300, the driving sources 301 are controlled to synchronously and forwardly rotate so as to drive the driving shafts 302 to synchronously and forwardly rotate, and the lifting piece 303 in threaded connection with the driving shafts 302 moves upwards along the driving shafts 302 to drive the supporting component 201 to vertically move upwards so as to reduce the distance h between the wafer 500 and the spray head 600; if the distance h between the wafer 500 and the showerhead 600 needs to be increased, the controller sends a reverse rotation command to the driving sources 301 of the driving units 300, controls the driving sources 301 to synchronously rotate in reverse directions to drive the driving shafts 302 to synchronously rotate in reverse directions, and the lifting member 303 screwed with the driving shafts 302 moves downwards along the driving shafts 302 to drive the supporting member 201 to move downwards vertically so as to increase the distance h between the wafer 500 and the showerhead 600.
In the above description, the driving source 301 rotates forward to drive the lifting member 303 to move upward, and rotates backward to drive the lifting member 303 to move downward, it can be understood that, in practical applications, the driving source 301 may rotate backward to drive the lifting member 303 to move downward, and rotate forward to drive the lifting member 303 to move upward.
In the lifting process, if the upward moving speed of the left lifting piece 303 is higher than that of the right lifting piece 303 in the drawing, the left side of the connecting bridge 204 is higher than the right side, so that the vertical center line of the supporting component 201 is inclined, at the moment, the vertical damper 401 on the left side is stretched, the vertical damper 401 on the right side is compressed, and the connecting bridge 204 can return to a balanced state under the action of each self-resetting force, so that the vertical center line of the supporting component 201 returns to a vertical state, and the lifting center of the supporting component 201 is ensured not to be deviated; if the bridge 204 is shifted in the horizontal direction, similarly, one of the horizontal dampers 402 on both sides is stretched and the other is compressed, and the bridge 204 is returned to the balanced state by the respective self-restoring forces, so as to ensure that the lifting center of the support member 201 is not shifted.
In practice, the driving source 301 of the driving unit 300 may be an air cylinder, and the lifting member 303 may be directly mounted on the telescopic end of the air cylinder.
The vacuum processing system, the base station driving apparatus and the control method thereof according to the present invention have been described in detail. The principles and embodiments of the present invention are explained herein using specific examples, which are presented only to assist in understanding the method and its core concepts. It should be noted that, for those skilled in the art, it is possible to make various improvements and modifications to the present invention without departing from the principle of the present invention, and those improvements and modifications also fall within the scope of the claims of the present invention.
Claims (13)
1. The driving device of the base station is characterized by comprising a supporting part and at least two driving units, wherein the supporting part is used for bearing the base station, the driving end of each driving unit is connected with the supporting part, and the connecting position of the driving end of each driving unit and the supporting part is symmetrically arranged relative to the vertical central line of the supporting part so as to drive the supporting part to vertically lift.
2. The drive apparatus for a base platform as set forth in claim 1, further comprising a composite damping system for preventing deflection of the support member during movement; the composite damping system comprises at least two composite damping units, and the composite damping units are arranged between the driving unit and the supporting part.
3. The driving apparatus for the abutment according to claim 2, wherein the driving unit includes a driving source for driving the elevating member to vertically ascend and descend, and an elevating member, the supporting member is connected to the elevating member through a connecting bridge, and the composite damping unit is provided between the connecting bridge and the elevating member.
4. The driving apparatus for the base platform as claimed in claim 3, wherein the driving source is a motor, the driving unit further includes a driving shaft connected to an output end of the motor, a length direction of the driving shaft is parallel to a vertical center line of the supporting member, and the motor is configured to rotate the driving shaft; the lifting piece comprises a lifting block and a transition connecting piece fixedly connected with the lifting block, the lifting block is in threaded connection with the driving shaft, and the connecting bridge is connected with the transition connecting piece.
5. The driving apparatus for an abutment according to claim 4, wherein the connecting bridge and the transition piece have connecting holes corresponding in position, and are connected by a connecting pin passing through the connecting holes, and the diameter of the connecting hole is larger than the radial dimension of the connecting pin, so that a predetermined play is provided between the connecting pin and the connecting hole.
6. The driving device for the base platform as claimed in claim 5, wherein the composite damping unit includes a vertical damper and a horizontal damper, one end of the vertical damper abuts against the transition piece, the other end of the vertical damper abuts against the connecting pin, one end of the horizontal damper abuts against the connecting bridge, and the other end of the horizontal damper abuts against the connecting pin.
7. The driving device for the base platform as claimed in claim 1, wherein the supporting member comprises a circular cylinder and end plates fixedly connected to two ends of the circular cylinder, and an axial center line of the circular cylinder is a vertical center line of the supporting member.
8. The drive arrangement of a base station of any of claims 1-7, further comprising a controller communicatively coupled to each of said drive units, said controller configured to control the synchronized operation of each of said drive units.
9. A vacuum treatment system comprising a chamber member having a vacuum chamber, a base located in the vacuum chamber, and a driving device for driving the base to vertically move up and down, wherein the driving device is the driving device for the base according to any one of claims 1 to 8, and the vertical center line of the support member coincides with the axial center line of the chamber member.
10. The vacuum processing system according to claim 9, wherein the chamber bottom wall of the chamber body member has a central through hole, the chamber bottom wall extends upward along a peripheral wall of the central through hole to form a cylindrical portion, and the cylindrical portion is hermetically connected with a mounting seat; the upper end of the supporting component penetrates through the barrel part to bear the base platform, and an elastic annular sealing element is arranged between the bottom of the base platform and the mounting seat.
11. A control method of a driving device of a base, characterized in that the driving device comprises a supporting member for carrying the base and at least two driving units;
the driving unit comprises a driving source, a driving shaft connected with the output end of the driving source and a lifting piece in threaded connection with the driving shaft, the driving shaft is vertically arranged, and the lifting piece is connected with the supporting component;
the connecting positions of the lifting piece and the supporting component of each driving unit are symmetrically arranged relative to the vertical central line of the supporting component;
the control method comprises the following steps: and controlling the driving sources to synchronously rotate forwards or reversely to drive the driving shafts to synchronously rotate forwards or reversely, wherein under the rotation action of the driving shafts, the lifting piece in threaded connection with the driving shafts ascends or descends along the driving shafts to drive the supporting component to vertically ascend or descend.
12. The control method of claim 11, wherein the drive device comprises a compound damping system comprising at least two compound damping units disposed between the lift member and the support member, the compound damping units comprising a vertical damper and a horizontal damper;
in the lifting process, when the vertical center line of the supporting component inclines, one vertical damper in the at least two composite damping units is stretched to apply a downward resetting force to the corresponding position of the supporting component, and the other vertical damper is compressed to apply an upward resetting force to the corresponding position of the supporting component, so that the vertical center line of the supporting component is kept vertical;
in the lifting process, when the center of the supporting component deviates in a horizontal plane, one horizontal damper in the at least two composite damping units is stretched to apply a reset force pointing to the center to the corresponding position of the supporting component, the other horizontal damper is compressed to apply a reset force back to the center to the corresponding position of the supporting component, and therefore the lifting center of the supporting component does not deviate.
13. The control method according to claim 12, wherein the support member is connected to the elevating member by a connecting bridge, and the connecting bridge is connected to the elevating member by a connecting pin; the composite damping unit is specifically arranged between the connecting bridge and the lifting piece, one end of the vertical damper is abutted to the lifting piece, the other end of the vertical damper is abutted to the connecting pin, one end of the horizontal damper is abutted to the connecting bridge, the other end of the horizontal damper is abutted to the connecting pin, and in the lifting process, the vertical damper applies a reset force in the vertical direction to the connecting bridge so that the vertical central line of the supporting component is kept vertical, and the horizontal damper applies a reset force in the horizontal direction to the connecting bridge so that the lifting center of the supporting component is not deviated.
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