CN112981354A - Rotary table for film coating chamber - Google Patents
Rotary table for film coating chamber Download PDFInfo
- Publication number
- CN112981354A CN112981354A CN201911275823.4A CN201911275823A CN112981354A CN 112981354 A CN112981354 A CN 112981354A CN 201911275823 A CN201911275823 A CN 201911275823A CN 112981354 A CN112981354 A CN 112981354A
- Authority
- CN
- China
- Prior art keywords
- coating
- coating chamber
- rotating shaft
- substrate
- turntable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a rotating platform for a coating chamber, which comprises a plurality of rotating substrate frames positioned in the coating chamber, wherein each rotating substrate frame comprises a substrate body, a rotating shaft and a bearing seat, the rotating shaft penetrates through the central shaft of the substrate body, and the rotating shaft is connected with the bearing seat through a bearing. Compared with the prior art, the rotary table for the film coating chamber provided by the invention is integrally formed with the base frame body through the rotating shaft, so that the rotary substrate frame is not easy to slip off when rotating, and the substrate frame can be efficiently rotated. The rotating shaft is arranged to replace a gear structure to rotate, so that raised dust in a coating chamber can be effectively avoided, and the coating quality is improved.
Description
Technical Field
The invention relates to a rotary table for a coating chamber, and belongs to the field of vacuum coating.
Background
Magnetron sputtering means that electrons collide with argon atoms in the process of flying to a substrate under the action of an electric field, so that the electrons are ionized to generate Ar positive ions and new electrons; new electrons fly to the substrate, Ar ions are accelerated to fly to the cathode target under the action of an electric field and bombard the surface of the target at high energy, so that the target is sputtered, and neutral target atoms or molecules in sputtered particles are deposited on the substrate to form a film.
When twin targets are adopted in the existing magnetron sputtering process, as shown in fig. 1, the magnetic field directions C of the two corresponding sets of magnetic rods are parallel, as shown in fig. 1, the sputtered particles generated thereby fly to the substrate in parallel, and the twin targets of this type are twin parallel twin targets, are suitable for planar substrates, and can enable the sputtered particles to be uniformly deposited on the planar substrates. However, for curved substrates such as curved cell phone screens, the twin parallel twin targets do not allow uniform deposition of sputtered particles on the substrate.
The existing rotary substrate frame is driven by a gear, and dust is easy to appear in the high-vacuum-degree environment of a vacuum coating chamber, so that the coating quality is greatly influenced.
Disclosure of Invention
In view of the above problems in the prior art, an object of the present invention is to provide a turntable for a film coating chamber, which can improve the gradual change effect.
In order to achieve the purpose, the invention adopts the following technical scheme:
a revolving stage for coating film room, including being located the indoor a plurality of rotatory substrate framves of coating film, rotatory substrate frame includes base frame body, axis of rotation and bearing frame, the axis of rotation runs through in base frame body center pin, the axis of rotation passes through the bearing and is connected with the bearing frame.
The rotating shaft is connected with a driving motor, and the driving motor is positioned outside the film coating chamber.
The rotating shaft penetrates through the outer wall of the coating chamber and is connected with a driving motor after penetrating through the outer wall of the coating chamber.
And a sealing element is arranged between the rotating shaft and the outer wall of the coating chamber.
The base frame body is formed by connecting two disks through a plurality of supports, and two ends of each support are respectively and independently connected with the edges of different disks.
The coating chamber is provided with a water cooling device for spraying cold water for cooling after coating.
An ion source is arranged in the coating chamber.
The rotating substrate frame performs autorotation at one side of the ion source so as to uniformly coat the film.
The base frame body and the rotating shaft are integrally formed.
Compared with the prior art, the rotary table for the film coating chamber provided by the invention is integrally formed with the base frame body through the rotating shaft, so that the rotary substrate frame is not easy to slip off when rotating, and the substrate frame can be efficiently rotated. The rotating shaft is arranged to replace a gear structure to rotate, so that raised dust in a coating chamber can be effectively avoided, and the coating quality is improved.
Drawings
FIG. 1 is a schematic view of a coating chamber provided by the present invention;
FIG. 2 is a schematic view of a turntable for a coating chamber according to the present invention;
wherein, 1, rotating the substrate frame; 11. a base frame body; 12. a rotating shaft; 13. and a bearing seat.
Detailed Description
The present invention will be described more fully with reference to the following examples and comparative examples.
As shown in fig. 1 and fig. 2, in this embodiment, the rotating platform for the film coating chamber includes a plurality of rotating substrate holders 1 located in the film coating chamber, each rotating substrate holder 1 includes a base frame 11, a rotating shaft 12 and a bearing seat 13, the rotating shaft 12 penetrates through a central axis of the base frame 11, and the rotating shaft 12 is connected to the bearing seat 13 through a bearing.
In this embodiment, the rotating shaft 12 is connected to a driving motor, and the driving motor is located outside the coating chamber.
In this embodiment, the rotating shaft 12 penetrates through the outer wall of the coating chamber, and the rotating shaft 12 penetrates through the outer wall of the coating chamber and is connected to the driving motor.
In this embodiment, a sealing member is disposed between the rotating shaft 12 and the outer wall of the coating chamber.
In this embodiment, the base frame 11 is formed by connecting two disks with a plurality of supports, and the two ends of each support are respectively and independently connected with the edges of different disks.
In this embodiment, the coating chamber is provided with a water cooling device for spraying cold water to cool after coating.
In this embodiment, an ion source is disposed in the coating chamber.
In this embodiment, the substrate holder 1 is rotated on the ion source side to perform uniform coating.
In this embodiment, the base frame body 11 and the rotating shaft 12 are integrally formed.
Finally, it must be said here that: the above embodiments are only used for further detailed description of the technical solutions of the present invention, and should not be understood as limiting the scope of the present invention, and the insubstantial modifications and adaptations made by those skilled in the art according to the above descriptions of the present invention are within the scope of the present invention.
Claims (9)
1. A revolving stage for coating film room, its characterized in that, including being located a plurality of rotatory substrate frame (1) in the coating film room, rotatory substrate frame (1) is including base frame body (11), axis of rotation (12) and bearing frame (13), axis of rotation (12) run through in base frame body (11) center pin, axis of rotation (12) are connected with bearing frame (13) through the bearing.
2. The turntable for coating chambers of claim 1, wherein the rotary shaft (12) is connected to a drive motor, which is located outside the coating chamber.
3. The rotary table for coating chambers as claimed in claim 2, wherein the rotary shaft (12) penetrates through the outer wall of the coating chamber, and the rotary shaft (12) penetrates through the outer wall of the coating chamber and is connected with a driving motor.
4. A turntable for a coating chamber according to claim 2, wherein a seal is provided between the rotary shaft (12) and the outer wall of the coating chamber.
5. The turntable for coating chambers of claim 1, wherein the base frame (11) is formed by connecting two disks by a plurality of supports, and the two ends of each support are independently connected with the edges of different disks.
6. The rotary table for coating chambers as claimed in claim 1, wherein the coating chamber is provided with a water cooling device for cooling by spraying cold water after coating.
7. The turntable for a coating chamber of claim 1 wherein an ion source is provided in the coating chamber.
8. The turntable for a coating chamber according to claim 7, wherein the rotating substrate holder (1) is rotated on the ion source side for uniform coating.
9. The turntable for coating chambers of claim 1, characterized in that the base body (11) and the rotation shaft (12) are integrally formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911275823.4A CN112981354A (en) | 2019-12-12 | 2019-12-12 | Rotary table for film coating chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911275823.4A CN112981354A (en) | 2019-12-12 | 2019-12-12 | Rotary table for film coating chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112981354A true CN112981354A (en) | 2021-06-18 |
Family
ID=76331663
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911275823.4A Withdrawn CN112981354A (en) | 2019-12-12 | 2019-12-12 | Rotary table for film coating chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112981354A (en) |
-
2019
- 2019-12-12 CN CN201911275823.4A patent/CN112981354A/en not_active Withdrawn
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20210618 |
|
| WW01 | Invention patent application withdrawn after publication |