CN112899638B - Air inlet system of film coating device - Google Patents

Air inlet system of film coating device Download PDF

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Publication number
CN112899638B
CN112899638B CN201911227621.2A CN201911227621A CN112899638B CN 112899638 B CN112899638 B CN 112899638B CN 201911227621 A CN201911227621 A CN 201911227621A CN 112899638 B CN112899638 B CN 112899638B
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air
unit
gas
coated
product
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CN112899638A (en
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宗坚
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Jiangsu Favored Nanotechnology Co Ltd
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Jiangsu Favored Nanotechnology Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52Controlling or regulating the coating process

Abstract

The invention provides an air inlet system of a coating device, which is used for carrying out air distribution coating on at least one product to be coated by a diamond coating device, and comprises at least one air inlet unit and an air distribution unit, wherein the air distribution unit is arranged at the top of the product to be coated, one end of the air inlet unit is communicated with an air source device in the coating device, and the other end of the air inlet unit is communicated with the air distribution unit, so that the gas entering the air distribution unit through the air inlet unit can reach the surface of the product to be coated from the top of the product to be coated.

Description

Air inlet system of coating device
Technical Field
The invention relates to an air inlet system and an air inlet method of a coating device, in particular to an air inlet system capable of improving coating uniformity.
Background
Diamond-like films (DLC films) are amorphous carbon films having properties similar to those of diamond, such as high resistivity, high hardness, thermal stability, high resistance, low dielectric constant, excellent optical properties, and good biocompatibility, and the properties thereof can be imparted to electronic products such as full-screen or full-screen curved mobile phones, flexible-screen mobile phones, and the like, which is desirable.
The diamond-like film coating process usually employs Plasma Enhanced Chemical Vapor Deposition (Plasma Enhanced Chemical Vapor Deposition-PECVD) technology. The basic principle is that after the workpiece is placed in the vacuum chamber, the vacuum chamber is pumped to a lower air pressure, and then the air is filled into the vacuum chamber to make the air pressure reach a preset value. When a pulse negative bias is loaded on the workpiece, the whole vacuum chamber generates pulse glow discharge plasma, and meanwhile, positive ions in the plasma are pulled by the pulse voltage to accelerate deposition to the surface of the workpiece. According to the difference of ion species (gas source and energy), for example, the ion sputtering cleaning can be carried out by using inert gas in a high-energy ionization state, and the DLC film can be deposited and formed on the surface of a workpiece by using hydrocarbon gas as a reaction raw material. Both operations are generally accomplished without breaking vacuum, requiring a simple gas switch.
In recent years, after long-term efforts, great progress has been made in the research of diamond-like carbon films, and the way of preparing diamond-like carbon films by pulsed dc plasma technology has received more and more attention, and pulsed dc plasma enhanced chemical vapor deposition technology has become the mainstream direction of pulsed dc plasma enhanced chemical vapor deposition technology because of its many advantages. Compared with the conventional direct current plasma enhanced chemical vapor deposition technology, the pulse direct current plasma enhanced chemical vapor deposition technology has the following advantages:
1. the prepared film has lower residual stress;
since the film and the substrate have great difference in properties, the film has a large residual stress after being formed, which is one of the important reasons for affecting the bonding strength between the film and the substrate.
2. The production speed of the film can be effectively controlled;
3. uniform films can be obtained on the surfaces of uneven workpieces such as cracks, deep holes and the like;
4. improve the arc extinguishing speed and effectively reduce the surface temperature during film forming.
In the existing diamond-like coating technology, for example, the utility model patent with the name of 201820031773.X is a single-cavity circulation continuous diamond-like coating device. In the technical scheme, the feeding system directly supplies materials to the feeding cavity through the single feeding hole is disclosed, the feeding hole is arranged at the top of the main cavity and communicated with the feeding cavity, and the feeding hole is provided with a closed door plate capable of being opened and a locking mechanism for locking the closed door plate. The existing air intake system and air intake method have the following disadvantages: (1) The thickness of the coating on the surface of the workpiece is not uniform, the coating colors of the products at different positions are not consistent, even the color difference of the coating products in the same batch is obvious, and the process stability is poor. (2) The air input and the air input rate can not be accurately controlled aiming at workpieces with different quantities and types, so that the raw material gas loss is large, and the economic cost is greatly increased. (3) Workpieces of different types in the same batch cannot be classified and coated independently, and the processing flexibility is poor.
Disclosure of Invention
An object of the present invention is to provide a gas inlet system of a coating device, wherein the gas inlet system of the coating device can provide relatively uniform gas supply for a product to be coated, so as to improve the process stability of the product to be coated in the processing process.
The invention aims to provide a gas inlet system of a coating device, wherein the gas inlet system of the coating device can provide stable gas output, so that the gas inlet raw materials can be controlled in the processing process of a product to be coated, and the cost can be controlled stably.
One object of the present invention is to provide an air inlet system of a coating device, wherein the air inlet system of the coating device can determine corresponding air inlet amount and air inlet speed according to products to be coated in different shapes, so as to improve the processing stability of the products to be coated.
One objective of the present invention is to provide an air intake system of a coating device, wherein the air intake system of the coating device is capable of determining different air intake amounts according to different quantities of products to be coated, so as to improve the accuracy of controlling the air intake raw material, and further achieve the accuracy of controlling the cost.
One objective of the present invention is to provide an air inlet system of a coating device, wherein the air inlet system of the coating device can uniformly spray charged gas on the surface of a product to be coated, so as to improve the uniformity of the film thickness of the product to be coated.
An object of the present invention is to provide an air inlet system of a coating device, wherein the air inlet system of the coating device has a simple structure, and does not affect the space in the coating chamber of the coating device, thereby not reducing the single-time coating efficiency of the coating device.
One objective of the present invention is to provide a gas inlet system of a coating device, wherein the gas inlet system of the coating device can sufficiently mix a coating gas and make the coating gas uniformly reach the surface of a product to be coated, so as to further improve the coating quality of the coating device.
An object of the present invention is to provide an air inlet system of a coating device, wherein the air inlet system of the coating device is arranged in coincidence with a bracket of the coating device, so as to reduce the production cost of the coating device and reduce the occupied space of the air inlet system in a coating chamber of the coating device.
One objective of the present invention is to provide an air inlet system of a coating device, wherein the air inlet system of the coating device can separately control the products to be coated in a classified manner or integrally control all the products to be coated, so as to improve the processing flexibility of the products to be coated.
An object of the present invention is to provide an air inlet system of a coating device, wherein the air inlet system of the coating device can utilize a support unit in a coating chamber of the coating device, thereby reducing the manufacturing cost of the coating device and the space occupancy rate in the coating chamber.
An object of the present invention is to provide an air intake system of a coating apparatus for DLC coating, thereby improving the stability of the coating thickness of DLC coating in the coating process and improving the production efficiency of DLC coating.
In order to achieve at least one of the above objectives, the present invention mainly provides an air inlet system of a coating device, wherein the coating device for diamond-like coating performs air distribution coating on at least one product to be coated, the air inlet system of the coating device includes at least one air inlet unit and one air distribution unit, wherein the air distribution unit is disposed at the top of the product to be coated, one end of the air inlet unit is communicated with an air source device in the coating device, and the other end of the air inlet unit is communicated with the air distribution unit, so that the gas entering the air distribution unit through the air inlet unit can reach the surface of the product to be coated from the top of the product to be coated.
In some embodiments, the air inlet unit comprises a plurality of air inlet assemblies, one end of each air inlet assembly is communicated with the air source device, and the other end of each air inlet assembly is communicated with the air distribution unit.
In some embodiments, the air inlet unit comprises a number of communication elements corresponding to the number of the air inlet assemblies, and the communication elements with which the air inlet assemblies are respectively communicated are communicated with the air source and the air distribution unit.
In some of these embodiments, the air intake assembly is embodied as an air intake tube.
In some embodiments, the air inlet unit comprises an air inlet assembly and at least one communication element, wherein the number of the communication elements is equal to that of the air distribution units, and a plurality of the communication elements are respectively communicated with the air inlet assembly, so that the gas passing through the air inlet assembly can be respectively conveyed to the air distribution units.
In some embodiments, the gas distribution unit comprises at least one gas distribution channel, and the gas distribution channel is communicated with the gas inlet unit and can deliver gas to the surface of the product to be coated.
In some embodiments, each of the gas distribution channels is formed on an electrode unit of the coating device, and the electrode unit is electrically disposed on the coating device and located on the top of the product to be coated.
In some embodiments, the electrode unit includes a first electrode plate and a second electrode plate, where the first electrode plate is disposed above the second electrode plate, and the second electrode plate is located at a side close to the product to be coated, so that the gas distribution channel is located at the top of the product to be coated.
In some embodiments, one or more second air distribution holes are formed in the second electrode plate, so that the gas in the air distribution channel can reach the surface of the product to be coated through the second air distribution holes.
In some embodiments, the electrode unit is electrically connected to the negative pole of a pulse power supply.
In some embodiments, the second air distribution holes are uniformly distributed in the second electrode plate.
In some embodiments, the gas distribution unit further includes at least one baffle, each baffle is fixedly disposed above the electrode unit and forms a transition gas distribution space with the electrode unit, and the transition gas distribution space is respectively communicated with the gas inlet unit and the gas distribution channel.
In some embodiments, one or more first gas distribution holes are formed in the first electrode plate, and the gas enters the gas distribution channel from the transition gas distribution space through the first gas distribution holes.
In some embodiments, the first air distribution holes are uniformly distributed in the first electrode plate.
In some embodiments, the position of each first air distribution hole is arranged to be offset from the position of each second air distribution hole.
In some embodiments, the coating device includes at least one support unit, the support unit is disposed in a coating chamber of the coating device for placing the product to be coated, and the support unit includes multiple layers of supports, and the multiple layers of supports are disposed from top to bottom, so that the product to be coated can be placed on different supports from top to bottom.
In some embodiments, the support frame is implemented as the baffle and is electrically connected to a negative electrode of a pulse power supply.
In some embodiments, a blocking element is fixedly disposed between the supporting frame and the first electrode plate in the electrode unit, so that at least one main channel is further included between the supporting frame and the first electrode plate, wherein the main channel is in communication with the transitional gas distribution space.
In some of these embodiments, the blocking element comprises a plurality of branch channels through which the main channel and the transitional gas distribution space communicate with each other.
In some embodiments, the branch channels are uniformly arranged on the blocking element.
In some embodiments, the film deposition device further includes at least one frame unit, and the frame unit is fixedly disposed at the periphery of the gas distribution unit to form a closed structure, so that the gas entering from the gas inlet unit can only enter the main channel and enter the transition gas distribution space through the branch channel, and then sequentially passes through the first gas distribution hole and the second gas distribution hole to reach the surface of the product to be coated.
In some embodiments, the frame unit comprises at least a first frame and a second frame, wherein the first frame is fixedly connected to the support frame and the periphery of the electrode unit to form an integral structure, and the second frame is fixedly arranged on the periphery of the electrode unit to form an integral structure.
In some of these embodiments, the surface of the first frame and/or the second frame is provided with a polytetrafluoroethylene coating.
Drawings
Fig. 1 is a schematic perspective view of an air intake system of a coating device according to a first embodiment of the present invention.
FIG. 2 is a schematic cross-sectional view of an air intake system of the coating device shown in FIG. 1.
Fig. 3 is an enlarged schematic view of a portion a in fig. 2.
FIG. 4 is another sectional view schematically illustrating the air intake system of the coating device of FIG. 1 according to the first embodiment.
Fig. 5 is an enlarged schematic view of B in fig. 4.
Fig. 6 is a schematic view of an application scenario of an air intake system of the coating device of the present invention.
Fig. 7 is a schematic perspective view illustrating a modified embodiment of the air intake system of the coating device according to the present invention.
Fig. 8 is a schematic perspective view of another modified embodiment of the air intake system of the coating device according to the present invention.
Detailed Description
The following description is presented to disclose the invention so as to enable any person skilled in the art to practice the invention. The preferred embodiments in the following description are given by way of example only, and other obvious variations will occur to those skilled in the art. The basic principles of the invention, as defined in the following description, may be applied to other embodiments, variations, modifications, equivalents, and other technical solutions without departing from the spirit and scope of the invention.
It will be understood by those skilled in the art that in the present disclosure, the terms "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in an orientation or positional relationship indicated in the drawings for convenience in describing the invention and simplicity in description, but do not indicate or imply that the device or component being referred to must have a particular orientation, be constructed in a particular orientation, and be constructed in a particular manner of operation, and thus, the terms are not to be construed as limiting the invention.
It is understood that the terms "a" and "an" should be interpreted as meaning "at least one" or "one or more," i.e., that a quantity of one element may be one in one embodiment, while a quantity of another element may be plural in other embodiments, and the terms "a" and "an" should not be interpreted as limiting the quantity.
The invention mainly provides an air inlet system 10 of a coating device, which is used for providing coating gas for the surface of at least a product to be coated with a film in the working process of the coating device A so as to coat the film on the product to be coated, wherein the coating device A is a coating device A with a diamond-like coating.
Fig. 1 to 6 are schematic structural views of an air intake system 10 of a coating device according to a first embodiment of the present invention. The air intake system 10 of the coating device comprises at least one air intake unit 11 and at least one air distribution unit 12, wherein the air intake unit 11 is connected to an air source device, a control unit (such as a mass flow meter and the like, not shown in the figure) quantitatively delivers a required air source to the air intake unit 11, then the air enters the air distribution unit 12 through the air intake unit 11, and the air is sprayed onto the top surface of the product to be coated through the air distribution unit 12.
In detail, in the first embodiment of the present invention, the air intake unit 11 includes one or more air intake assemblies 111, one end of each air intake assembly 111 is connected to the air supply device, and the other end of each air intake assembly 111 is connected to the air distribution unit 12 and is communicated with the air distribution unit 12, so that the air output by the air supply device can enter the air distribution unit 12 through the air intake assemblies 111 in the air intake unit 11 and finally reaches the surface of the product to be coated from the top surface of the product to be coated.
Preferably, in the first embodiment of the present invention, the air intake assembly 111 is implemented as an air intake pipe 1111, one end of the air intake pipe 1111 is communicated with the air supply device, and the other end of the air intake pipe 1111 is communicated with the air distribution unit 12. Still further, the air inlet 1111 may include, but is not limited to, being made of plastic or metal, etc. Besides, those skilled in the art can set the air intake component 111 to be any flexible or rigid pipe according to actual situations or customer requirements, and the technical problem that is the same as or similar to the present invention is solved and the technical effect that is the same as or similar to the present invention is achieved as long as the technical solution that is the same as or similar to the present invention is adopted, which all fall within the protection scope of the present invention, and the specific embodiment of the present invention is not limited thereto.
Accordingly, in the first embodiment of the present invention, the gas distribution unit 12 includes at least one gas distribution channel 120, and after the gas enters the gas inlet unit 11 through the gas source device, the gas reaches the gas distribution channel 120 of the gas distribution unit 12, and is then conveyed to the surface of the product to be coated through the gas distribution channel 120.
Preferably, in the first embodiment of the present invention, each of the gas distribution channels 120 is formed in an electrode unit 30 of the coating device a, and the electrode unit 30 is electrically disposed on the coating device a and located on the top of the product to be coated and communicated with the gas inlet unit 11, so that the gas enters the gas distribution channels 120 through the gas inlet unit 11 after being delivered by the gas source device. The electrode unit 30 may be connected to the positive pole of a power source, such as a pulsed power source, and may further be grounded, while the product to be coated may be supported by another supporting electrode unit, and the electrode unit is connected to the negative pole of the pulsed power source, thereby achieving a discharging action.
Further, the electrode unit 30 includes at least a first electrode plate 31 and a second electrode plate 32, and the first electrode plate 31 and the second electrode plate 32 are overlapped on the top surface of the product to be coated and form the gas distribution channel 120. The first electrode plate 31 is disposed above the second electrode plate 32, and the second electrode plate 32 is located at a side close to the product to be coated, so that the gas distribution channel 120 is located above the product to be coated. One or more second air distribution holes 320 are formed in the surface of the second electrode plate 32, so that the coating gas can pass through the second air distribution holes 320 from the air distribution channel 120 to the surface of the product to be coated from the top surface of the product to be coated.
Preferably, the second electrode plate 32 is provided with a plurality of second air distribution holes 320, and the plurality of second air distribution holes 320 are respectively and uniformly distributed on the surface of the second electrode plate 32, so that the gas can uniformly reach the surface of the product to be coated through the plurality of second air distribution holes 320, thereby ensuring that the surface of one or more products to be coated below the electrode unit 30 can be uniformly coated.
Preferably, the gas distribution unit 12 further includes at least one baffle 40, each baffle 40 is fixedly disposed above the electrode unit 30, and a transition gas distribution space 1203 is formed between the baffle 40 and the electrode unit 30, and gas can enter the transition gas distribution space 1203 through the gas inlet unit 11, then enter the gas feed channel 120 through the transition gas feed space 1203, and finally reach the surface of the product to be coated through the second gas distribution holes 320.
Accordingly, in the first embodiment of the present invention, one or more first gas distribution holes 310 are formed in the surface of the first electrode plate 31 in the electrode unit 30, so that the gas enters the transition gas distribution space 1203 and then enters the gas distribution channel 120 through the first gas supply hole 310.
It should be noted that, in the first embodiment of the present invention, the positions of the first air distribution holes 310 and the second air distribution holes 320 are staggered, that is, the positions of all the first air distribution holes 310 on the first electrode plate 31 are not opposite to the positions of the second air distribution holes 320 on the second electrode plate 32, so that the coating gas in the transitional air distribution space 1203 reaches the air distribution passage 120 through the first air distribution holes 310 on the first electrode plate 31, and then does not directly reach the surface of the product to be coated through the second air distribution holes 320 on the second electrode plate 32 corresponding to the first air distribution holes 310 under the action of the gas flow.
In other words, by staggering the positions of the first air distribution holes 310 on the first electrode plate 31 and the second air distribution holes 320 on the second electrode plate 32, the coating gas can sequentially pass through the transition air distribution space 1203 and the air distribution channel 120 for uniform mixing and reaction before reaching the surface of the product to be coated, so as to further improve the uniformity and the coverage of the coating gas for supplying the product to be coated.
As a variation of the first embodiment of the present invention, a person skilled in the art may also set only one electrode plate in the electrode unit 30, for example, only the first electrode plate 31 or the second electrode plate 32, so that the gas from the gas inlet unit 11 can reach the surface of the product to be coated through a gas transition and a reaction only once to complete the coating of the diamond-like coating on the product to be coated. Such a configuration is also within the scope of the present invention, and the embodiments of the present invention are not limited thereto.
Besides, those skilled in the art can determine parameters such as specific positions, numbers, and apertures of the first air distribution holes 310 and the second air distribution holes 320 according to actual situations or objective needs, and even change the number of the electrode plates in the electrode unit 30, for example, setting the shapes of the first air distribution holes 310 and/or the second air distribution holes 320 to be irregular, setting the apertures of the first air distribution holes 310 to be different from the apertures of the second air distribution holes 320, or further increasing or decreasing the number of the electrode plates in the electrode unit 30, and the like, all of which fall within the protection scope of the present invention. That is, as long as the technical solutions identical or similar to the present invention are adopted, the technical problems identical or similar to the present invention are solved, and the technical effects identical or similar to the present invention are achieved, all of which are within the protection scope of the present invention, and the specific embodiments of the present invention are not limited thereto.
Preferably, the first electrode plate 31 is provided with a plurality of the first air distribution holes 310, and the plurality of the first air distribution holes 310 are respectively and uniformly distributed on the surface of the first electrode plate 31, so that the gas in the transition air distribution space 1203 can uniformly enter the air distribution channel 120 through the plurality of the first air distribution holes 310.
In the first embodiment of the present invention, the film coating device a includes at least one support unit 50, the support unit 50 is disposed in a film coating cavity 100 of the film coating device a, the support unit 50 includes multiple layers of support frames 51, the multiple layers of support frames are disposed in parallel from top to bottom, and the products to be coated are respectively placed on different support frames 51.
It is noted that, in the first embodiment of the present invention, the supporting bracket 51 is implemented as the barrier 40. That is to say, in the first embodiment of the present invention, the product to be coated is placed on each layer of the support frame 51 except the top layer, and the electrode unit 30 is disposed above each layer of the support frame 51, so that the gas distribution unit 12 is located above the product to be coated, when the gas enters the gas inlet channel through the gas source device, the gas enters the gas distribution channel 120 through the gas inlet channel, and finally exits through the plurality of second gas distribution holes 320 in the gas distribution channel 120, and since the gas distribution unit 12 is located above the product to be coated, the gas exits from the second gas distribution holes 320 and then reaches the surface of the product to be coated in a spraying manner under the action of gravity.
It is emphasized that the number of the support frames 51 in the rack unit 50 corresponds to the number of the electrode units 30 and the number of the air inlet units 11, so that the air inlet units 11 communicating with the respective support frames 51 in the respective rack units 50 can be separately supplied with air. And the parameters in the electrode units 30 connected with the support frames 51 to form the corresponding gas distribution units 12 can also be individually set so as to control the gas distribution parameters of the gas distribution units 12. The coating of the product to be coated on the different support frames 51 is realized by setting different air inlet parameters of the air inlet unit 11 and different air distribution parameters of the air distribution unit 12, so that the working efficiency and the application range of the coating device A are improved.
For example, since the gas finally reaches the surface of the product to be coated through the second gas distribution holes 320 on the second electrode plate 32, the coating thickness and the coating position of the product to be coated can be determined by controlling the gas inflow and the shape, size, number and position of the second gas distribution holes 320, so that the coating device a can coat the products to be coated with different numbers, types and requirements.
Due to the fact that the supporting plate is implemented as the baffle plate 40, not only can raw materials of the air inlet system 10 of the coating device be saved, and therefore, the production cost of the air inlet system 10 of the coating device be reduced, but also the occupancy rate of the inner space of the coating device A can be saved, and therefore more placing space is provided for the product to be coated, and the production efficiency of the product to be coated is improved. In addition, the baffle 40 is insulated from the electrode unit 30 below, and may be electrically connected to a negative electrode of the pulse power source.
More specifically, in the first embodiment of the present invention, a blocking element 41 is further included between the supporting frame 51 and the first electrode plate 31 in the electrode unit 30, the blocking element 41 is disposed in the transitional gas distribution space 1203, so that a main channel 1201 is formed between the first electrode plate 31 and the supporting frame 51, and the main channel 1201 is located between the gas inlet channel and the transitional gas distribution space 1203, so that the gas entering from the gas inlet unit 11 firstly enters the main channel 1201 in the gas distribution unit 12. The blocking element 41 is provided with one or more branch channels 1202, so that gas entering from the gas inlet unit 11 can enter the branch channels 1202 through the main channel 1201 and then enter the transition gas distribution space 1203 from the branch channels 1202.
Preferably, the branch channels 1202 are uniformly arranged in the blocking element 41, so that the gas in the main channel 1201 can uniformly enter the transition gas distribution space 1203 through the branch channels 1202 on the blocking element 41.
In the first embodiment of the present invention, the air intake unit 11 further includes at least one communication element 112, the communication element 112 has a pipe 1120, and each of the communication elements 112 is connected to the air intake assembly 111 and is communicated with the air intake assembly 111 and the air distribution unit 12 through the pipe 1120. Specifically, one end of the communication element 112 is communicated with the gas inlet assembly 111, and the other end of the communication element 112 is communicated with the main channel 1201 in the gas distribution unit 12, so that the gas reaches the surface of the product to be coated through the gas distribution unit 12.
It should be noted that, in the first embodiment of the present invention, the air intake system of the coating product further includes at least one frame unit 60, the frame unit 60 is disposed at the periphery of the air distribution unit 12 to make the air distribution unit 12 form a closed structure, and the air entering from the air intake unit 11 can only enter the branch channels 1202 through the main channel 1201, and then enters the transition air distribution space 1203 through each branch channel 1202, and reaches the surface of the product to be coated through the first air distribution hole 310 and the second air distribution hole 320 in sequence. In addition, the frame unit 60 also has an insulation property, so that the support frame 51, the first electrode plate 31, and the second electrode plate 32 are insulated from each other.
Further, the frame unit 60 includes at least one first frame 61 and at least one second frame 62, wherein the first frame 61 is fixedly disposed between the supporting frame 51 and the electrode unit 30, so that the supporting frame 51 and the electrode unit 30 form an integral sealed structure, and therefore, when the gas entering from the gas inlet unit 11 enters the main channel 1201, the gas can only enter the transitional gas distribution space 1203 through the branch channel 1202, and then enters the gas distribution channel 120 through the first gas distribution hole 310. The second frame 62 is fixedly disposed around the electrode unit 30 to make the gas supply channel 120 a closed space, so that the gas entering the gas distribution channel 120 through the first gas distribution holes 310 can only reach the surface of the product to be coated through the second gas distribution holes 320.
The surface of the first frame 61 and/or the second frame 62 in the frame unit 60 is preferably provided with a teflon coating, so that the frame unit 60 or the first frame 61 or the second frame 62 has the characteristics of insulation, high temperature resistance, easy cleaning, difficult chemical reaction generation and the like. Besides, those skilled in the art can set the structures and coatings of the first frame 61 and the second frame 62 in the frame unit 60 according to practical situations, and as long as the technical features same as or similar to those of the present invention are adopted, the technical problems same as or similar to those of the present invention are solved, and the technical effects same as or similar to those of the present invention are achieved, all of which fall within the protection scope of the present invention, and the specific embodiments of the present invention are not limited thereto.
It should be noted that, in the first embodiment of the present invention, the support frame 51 is connected to a negative electrode of a pulse power supply, the product to be coated is placed on the support frame 51 as the negative electrode, and the first electrode plate 31 and the second electrode plate 32 are connected to a positive electrode of the pulse power supply, so as to form a complete electric field shape in the holder unit 50, so that the product to be coated is coated with the diamond-like coating in the electric field.
As a variation of the present invention, a person skilled in the art may also set the first electrode plate 31 and the second electrode plate 32 as a common perforated plate without electricity, and set the support frame 51 as a negative electrode after being powered on, set the cavity wall of the coating cavity 100 as a positive electrode after being powered on, sequentially form a complete electric field in the coating cavity 100, and place the product to be coated on the support frame 51 as a negative electrode, thereby completing the coating of the diamond-like coating, and the like, which all fall within the protection scope of the present invention. In other words, as long as the technical solution same as or similar to the present invention is adopted, the technical problem same as or similar to the present invention is solved, and the technical effect same as or similar to the present invention is achieved, all of which belong to the protection scope of the present invention, and the specific embodiment of the present invention is not limited thereto. Next, the operation principle of the air intake system 10 of the coating device in the first embodiment of the present invention will be briefly explained.
The air pressure in the coating cavity 100 in the coating device a is pumped to a suitable air pressure close to vacuum by using an air pumping device, then the air inlet system 10 of the coating device is inflated by the air source device, and after the working air pressure is reached, the support unit 50 where the product to be coated is placed is electrified to form negative pressure. At this time, the gas enters the gas inlet assembly 111 in the gas inlet unit 11 through the gas source device, then enters the main channel 1201 in the gas distribution unit 12 through the communication element 112 in the gas inlet unit 11, and then enters the branch channel 1202 through the main channel 1201 to reach the transitional gas distribution space 1203, then the gas uniformly enters the gas distribution channel 120 through the plurality of first gas distribution holes 310 on the first electrode plate 31, and is uniformly sprayed out through the plurality of second gas distribution holes 320 on the second electrode plate 32, and under the action of the electrode and the gravity, the gas reaches the surface of the product to be coated to form a diamond-like film, so that the coating of the product to be coated is completed.
Fig. 7 is a schematic perspective view of a coating device a according to a modified embodiment of the present invention.
Different from the first embodiment, in the modified embodiment of the present invention, the air inlet unit 11 'includes one air inlet assembly 111' and a plurality of communication elements 112', wherein the number of the communication elements 112' is equal to the number of the air distribution units 12 'and one end of the communication element 112' is communicated with the main channel 1201 'of the air distribution unit 12', and the other end of the communication element 112 'is respectively communicated with the air inlet assembly 111', so that the gas in the air inlet assembly 111 'is delivered to different main channels 1201' through different communication elements 112', thereby realizing that all the air distribution units 12' can deliver the coating gas to the product to be coated.
Preferably, in the modified embodiment of the air intake system 10' of the coating device according to the present invention, the air intake assembly 111' is implemented as a hollow steel tube 52', as shown in the figure, the hollow steel tube 52' is fixedly connected to the side of the support unit 50' close to the communicating member 112', wherein the communicating members 112' communicating with the main channel 1201' in each air distribution unit 12' are respectively communicated with the hollow steel tube 52', and after receiving the coating gas, the hollow steel tube 52' communicating with the gas source device sequentially passes through the communicating members 112' communicating therewith to respectively transmit the gas to the air distribution unit 12', so as to coat all the products to be coated.
In the preferred embodiment, since the hollow steel tube 52' is fixedly connected to the bracket unit 50', it is also possible to further support all the air distribution units 12' on the bracket unit 50', thereby preventing the support frame 51' in the bracket unit 50' from deforming after being subjected to an excessively heavy product or used for a long time, and in turn, improving the service life of the bracket unit 50 '.
In addition, in this modified embodiment of the present invention, the tube diameter of the hollow steel tube may be determined according to the number of the supporting frames 51 'in the supporting frame unit 50', or the thickness of the coating layer of the product to be coated on the supporting frames 51 'and the number of the product to be coated on the supporting frames 51', or the volume of the coating cavity 100 of the coating device a, which falls within the protection scope of the present invention, and the specific embodiment of the present invention is not limited thereto.
As a further modification of this modified embodiment of the present invention, a person skilled in the art may also change the shape or structure of the air intake assembly 111 'according to actual situations, for example, the air intake assembly 111' is configured as a single pipe 1120 'and is connected to the air distribution unit through a plurality of communication elements 112', or the material of the hollow steel pipe 52 'is changed, for example, other metal structures are adopted, so that the air intake assembly 111' not only can support the bracket unit 50', but also can serve as an air intake pipe to supply air to the air distribution unit 12'. In other words, as long as the technical solution same as or similar to the present invention is adopted, the technical problem same as or similar to the present invention is solved, and the technical effect same as or similar to the present invention is achieved, all of which belong to the protection scope of the present invention, and the specific embodiment of the present invention is not limited thereto.
Fig. 8 is a schematic perspective view of another modified embodiment of a coating device a according to the present invention.
Unlike the first embodiment, in the other modified embodiment of the present invention, the supporting frame 51 "is a general plate without being electrified, and the supporting frame unit 50" further includes at least one conductive film 53", the conductive film 53" is fixedly disposed above the supporting frame 51 "so that the product to be coated is placed on the conductive film 53", wherein the conductive film 53 "is communicated with a power source through a conductive wire 531" so as to electrify the conductive film 53 ".
In detail, the conductive film 53 "is connected to the negative electrode of a pulse power source through the conductive wire 531", and the product to be coated is placed above the conductive film, and both the product to be coated and the conductive film 53 "are supported by the support frame 51". On the contrary, since the first electrode plate 31 "and the second electrode plate 32" in the electrode unit 30 "are respectively connected to a positive electrode of a pulse power supply, the first electrode plate 31" and the second electrode plate 32 "are also respectively used as positive electrodes, so that a complete electric field is formed in the coating chamber 100, so as to facilitate the coating of the product to be coated with the diamond-like coating.
In addition, in the other modified embodiment, the shape of the conductive film 53 "is consistent with the shape of the support frame 51" and covers the surface of the support frame 51", so that the placing amount of the product to be plated on the conductive film 53" can be maximized.
Besides, a person skilled in the art may also change the shape of the conductive film 53 "according to practical situations, for example, the conductive film 53" is set to be hollow for saving materials, or the shape of the conductive film 53 "is set to be consistent with the shape of the product to be coated because a certain type of product to be coated is fixed and processed for a long time, and the invention is not limited thereto. In other words, it is within the scope of the present invention to adopt the same or similar technical solutions as the present invention, to solve the same or similar technical problems as the present invention, and to achieve the same or similar technical effects as the present invention.
In the description of the specification, reference to the description of "one embodiment," "some embodiments," "an example," "a specific example," or "some examples" or the like means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
It will be appreciated by persons skilled in the art that the embodiments of the invention described above and shown in the drawings are given by way of example only and are not limiting of the invention. The objects of the invention have been fully and effectively accomplished. The functional and structural principles of the present invention have been shown and described in the examples, and any variations or modifications of the embodiments of the present invention may be made without departing from the principles.

Claims (18)

1. An air inlet system of a coating device, which is used for a coating device of a diamond coating to perform air distribution coating on at least a product to be coated, is characterized in that the air inlet system of the coating device comprises at least one air inlet unit and one air distribution unit, wherein the air distribution unit is arranged at the top of the product to be coated, one end of the air inlet unit is communicated with an air source device in the coating device, and the other end of the air inlet unit is communicated with the air distribution unit, so that gas entering the air distribution unit through the air inlet unit can be sprayed onto the surface of the product to be coated from the top of the product to be coated;
the gas distribution unit comprises at least one gas distribution channel and at least one baffle plate, the gas distribution channel is communicated with the gas inlet unit and can convey gas to the surface of the product to be coated,
each gas distribution channel is formed on an electrode unit of the coating device, and the electrode unit is positioned at the top of the product to be coated;
each baffle is fixedly arranged above the electrode unit, a transition gas distribution space is formed between each baffle and the electrode unit, and the transition gas distribution space is respectively communicated with the gas inlet unit and the gas distribution channel;
the electrode unit comprises a first electrode plate and a second electrode plate, wherein the first electrode plate is arranged above the second electrode plate, and the second electrode plate is positioned at one side close to the product to be coated, so that the gas distribution channel is positioned at the top of the product to be coated;
the film coating device comprises at least one support unit, the support unit is arranged in a film coating cavity of the film coating device and used for placing a product to be coated, the support unit comprises a plurality of layers of support frames, and the plurality of layers of support frames are arranged from top to bottom so that the product to be coated can be placed on different support frames from top to bottom;
a blocking element is fixedly arranged between the support frame and the first electrode plate in the electrode unit, so that at least one main channel is further arranged between the support frame and the first electrode plate, and the main channel is communicated with the transitional gas distribution space;
the blocking element comprises a plurality of branch channels, and the main channel and the transition gas distribution space are communicated with each other through the branch channels.
2. The air intake system of a plating device according to claim 1, wherein the air intake unit comprises a plurality of air intake assemblies, one end of each of the air intake assemblies being in communication with the air supply device, and the other end of each of the air intake assemblies being in communication with the air distribution unit.
3. The air intake system of a plating device according to claim 2, wherein the air intake unit includes communication members in number corresponding to the number of the air intake assemblies, and the communication members with which each of the air intake assemblies communicates are communicated with the air supply and the air distribution unit.
4. The intake system of a plating device according to claim 3, wherein the intake assembly is implemented as an intake pipe.
5. The gas inlet system of a plating device according to claim 1, wherein the gas inlet unit comprises a gas inlet block and at least one communicating member, wherein the number of the communicating members corresponds to the number of the gas distribution units, and a plurality of the communicating members communicate with the gas inlet block, respectively, so that the gas passing through the gas inlet block can be delivered to the gas distribution units, respectively.
6. The gas inlet system of the coating device according to claim 1, wherein one or more second gas distribution holes are formed in the second electrode plate, so that the gas in the gas distribution channel can reach the surface of the product to be coated through the second gas distribution holes.
7. The air intake system of a plating device according to claim 1, wherein the electrode unit is electrically connected to a negative electrode of a pulse power supply.
8. The gas inlet system of the coating device according to claim 1, wherein one or more first gas distribution holes are formed in the first electrode plate, and the gas enters the gas distribution channel from the transitional gas distribution space through the first gas distribution holes.
9. The air intake system of a plating device according to claim 8, wherein the first air distribution holes are uniformly distributed in the first electrode plate.
10. The gas inlet system of the coating device according to claim 7, wherein the first electrode plate is provided with one or more first gas distribution holes, and the gas enters the gas distribution channel from the transitional gas distribution space through the first gas distribution holes; one or more second air distribution holes are formed in the second electrode plate, so that air in the air distribution channel can reach the surface of the product to be coated through the second air distribution holes; the positions of the first air distribution holes and the positions of the second air distribution holes are arranged in a staggered manner.
11. The intake system of a plating device according to claim 1, wherein the support frame is implemented as the baffle plate and is electrically connected to a negative electrode of a pulse power supply, and the first electrode plate and the second electrode plate are respectively electrically connected to a positive electrode of a pulse power supply.
12. The air intake system of the plating device according to claim 1, wherein the branch passages are uniformly arranged in the blocking member.
13. The gas inlet system of the coating device according to claim 12, wherein one or more first gas distribution holes are formed in the first electrode plate, and the gas enters the gas distribution channel from the transitional gas distribution space through the first gas distribution holes; one or more second air distribution holes are formed in the second electrode plate, so that air in the air distribution channel can reach the surface of the product to be coated through the second air distribution holes; the air inlet system of the coating device further comprises at least one frame unit, wherein the frame unit is fixedly arranged on the periphery of the air distribution unit so as to enable the air distribution unit to form a closed structure, and air entering the air inlet unit can only enter the main channel and enter the transitional air distribution space through the branch channel, and then sequentially passes through the first air distribution hole and the second air distribution hole to reach the surface of a product to be coated.
14. The air intake system of a plating device according to claim 13, wherein the frame unit comprises at least a first frame and a second frame, wherein the first frame is fixedly attached to the support frame and the periphery of the electrode unit so that the support frame and the electrode unit form an integral structure, and the second frame is fixedly attached to the periphery of the electrode unit so that the first electrode plate and the second electrode plate form an integral structure.
15. The air intake system of a coating device according to claim 1, wherein the support frame further comprises at least one conductive film disposed on the upper surface of the support frame for placing the product to be coated, and the conductive film is electrically connected to the negative electrode of a pulse power supply.
16. The air intake system of a plating device according to claim 15, wherein the first electrode plate and the second electrode plate are each electrically connected to a positive electrode of a pulse power supply.
17. The air intake system of a coating device according to claim 15, wherein the wall of the coating chamber is electrically connected to a positive electrode of a pulse power supply.
18. The air intake system of a plating device according to claim 14, wherein a surface of the first frame and/or the second frame is provided with a polytetrafluoroethylene coating.
CN201911227621.2A 2019-12-04 2019-12-04 Air inlet system of film coating device Active CN112899638B (en)

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201525884U (en) * 2009-04-30 2010-07-14 上海大学 Plate type gas distributing device
CN102234791A (en) * 2010-05-05 2011-11-09 财团法人工业技术研究院 Gas distribution shower module and coating equipment
CN102286730A (en) * 2010-06-21 2011-12-21 细美事有限公司 Thin film deposition apparatus
CN203049035U (en) * 2012-12-06 2013-07-10 山东力诺太阳能电力股份有限公司 Device for improving PECVD (plasma enhanced chemical vapor deposition) coating uniformity
CN103305812A (en) * 2013-06-08 2013-09-18 上海和辉光电有限公司 Top electrode device
CN203333750U (en) * 2013-05-27 2013-12-11 深圳市生波尔机电设备有限公司 Gas distribution device and vacuum magnetron sputtering coating equipment of gas distribution device
CN104099584A (en) * 2013-04-10 2014-10-15 北京北方微电子基地设备工艺研究中心有限责任公司 Reaction chamber and plasma processing equipment
KR101959242B1 (en) * 2018-10-02 2019-03-19 한국진공주식회사 Nano-diamond coating apparatus of cutting tools for carbon fiber composite material used in the automotive and aeronautics fields

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201525884U (en) * 2009-04-30 2010-07-14 上海大学 Plate type gas distributing device
CN102234791A (en) * 2010-05-05 2011-11-09 财团法人工业技术研究院 Gas distribution shower module and coating equipment
CN102286730A (en) * 2010-06-21 2011-12-21 细美事有限公司 Thin film deposition apparatus
CN203049035U (en) * 2012-12-06 2013-07-10 山东力诺太阳能电力股份有限公司 Device for improving PECVD (plasma enhanced chemical vapor deposition) coating uniformity
CN104099584A (en) * 2013-04-10 2014-10-15 北京北方微电子基地设备工艺研究中心有限责任公司 Reaction chamber and plasma processing equipment
CN203333750U (en) * 2013-05-27 2013-12-11 深圳市生波尔机电设备有限公司 Gas distribution device and vacuum magnetron sputtering coating equipment of gas distribution device
CN103305812A (en) * 2013-06-08 2013-09-18 上海和辉光电有限公司 Top electrode device
KR101959242B1 (en) * 2018-10-02 2019-03-19 한국진공주식회사 Nano-diamond coating apparatus of cutting tools for carbon fiber composite material used in the automotive and aeronautics fields

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