CN112879806A - Ion source gas supply pipeline and installation method thereof - Google Patents
Ion source gas supply pipeline and installation method thereof Download PDFInfo
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- CN112879806A CN112879806A CN202110071546.6A CN202110071546A CN112879806A CN 112879806 A CN112879806 A CN 112879806A CN 202110071546 A CN202110071546 A CN 202110071546A CN 112879806 A CN112879806 A CN 112879806A
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- 238000000034 method Methods 0.000 title claims abstract description 32
- 238000009434 installation Methods 0.000 title claims abstract description 28
- 238000004140 cleaning Methods 0.000 claims abstract description 78
- 238000010407 vacuum cleaning Methods 0.000 claims description 12
- 238000010926 purge Methods 0.000 claims description 8
- 238000011900 installation process Methods 0.000 abstract description 10
- 231100000331 toxic Toxicity 0.000 abstract description 5
- 230000002588 toxic effect Effects 0.000 abstract description 5
- 239000007789 gas Substances 0.000 description 151
- 150000002500 ions Chemical class 0.000 description 54
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- 230000007096 poisonous effect Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17D—PIPE-LINE SYSTEMS; PIPE-LINES
- F17D1/00—Pipe-line systems
- F17D1/02—Pipe-line systems for gases or vapours
- F17D1/04—Pipe-line systems for gases or vapours for distribution of gas
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17D—PIPE-LINE SYSTEMS; PIPE-LINES
- F17D3/00—Arrangements for supervising or controlling working operations
- F17D3/01—Arrangements for supervising or controlling working operations for controlling, signalling, or supervising the conveyance of a product
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17D—PIPE-LINE SYSTEMS; PIPE-LINES
- F17D5/00—Protection or supervision of installations
- F17D5/005—Protection or supervision of installations of gas pipelines, e.g. alarm
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The present application relates to an ion source gas supply line and an installation method thereof, the ion source gas supply line includes: the first pipeline, the gas flowmeter, the second pipeline, the stop valve and the third pipeline are connected in sequence; wherein the first pipeline is connected with a gas source, and the third pipeline is connected with a vacuum chamber; the cleaning valve is connected to the first pipeline, and the fourth pipeline is connected between the cleaning valve and the third pipeline; the cleaning valve is in an open state when the gas source is installed to the gas supply pipeline, and the first pipeline is cleaned by the vacuum chamber; and is in a closed state after cleaning; according to the technical scheme, the influence of air in the first pipeline on the purity of the working gas is avoided; in the installation process, the first pipeline is cleaned through the cleaning valve, then the installation process is completed, the toxic and harmful gas is effectively prevented from being leaked, and the safety of the installation process is ensured.
Description
Technical Field
The application relates to the technical field of ion source equipment, in particular to an ion source gas supply pipeline and an installation method thereof.
Background
The ion source is an application scientific technology which has wide application, multiple types, multiple related sciences, strong technological property and rapid development; the Hall ion source is a very common ion source type, is mostly applied to the field of thin film deposition, is used as a deposition auxiliary component to improve the physical characteristics of a thin film, and is characterized in that an anode is used for plasmatizing process gas under the cooperation of a strong axial magnetic field, and the plasmatized gas is accelerated by the anode to separate gas ions and form ion beams.
The ion source loading end mainly comprises a neutralizer and an ion source, wherein the neutralizer generates electrons, and the ion source generates ions; the general high-performance neutralizer needs to input inert gas (generally argon), works under the argon atmosphere and realizes stable electron current output, has extremely high requirements on the purity of working gas, needs at least 99.999 percent of the working gas, and affects the service life of the neutralizer if the purity is not reached, thus causing frequent maintenance.
At present, industrial gas can generally ensure the gas purity, but pollution is often introduced in the installation process, which seriously affects the use effect of the ion source, for example, fig. 1 is a common gas pipeline installation mode, in the figure, a gas source (a gas station or a gas cylinder) can provide sufficiently pure working gas, the working gas is connected to a pipeline 1, the working gas is controlled by a gas flowmeter and then connected to a stop valve through a pipeline 2, the general gas flowmeter and the stop valve work synchronously, and the working gas with controlled accurate flow flows into a vacuum chamber (vacuum environment) through a pipeline 3; when the stop valve was opened, pipeline 2 and pipeline 3 received vacuum environment's influence simultaneously, can be clean out the air in the pipeline, but pipeline 1 is owing to passed through gas flowmeter, consequently the air in pipeline 1 can't effectively be taken out to vacuum environment, when the valve between gas source and pipeline 1 was opened, the air in pipeline 1 will be sneaked into in the gas source, thereby polluted working gas, and pipeline 1 is usually apart from very long, sneak into high-purity working gas when a large amount of air, seriously influenced working gas's purity.
Traditional gaseous source is when the access pipeline, generally through take the pressure installation, opens all installation pipelines promptly, utilizes the working gas of continuous output to help cleaing away the air in the pipeline, but to poisonous and harmful working gas, takes the pressure installation to cause poisonous and harmful gas to reveal, very easily produces serious safety problem.
Disclosure of Invention
In view of the above, it is necessary to provide an ion source gas supply pipeline and a method for installing the same, which solve the above technical problems that the pipeline air affects the purity of the working gas and the leakage of the toxic and harmful gases.
An ion source gas supply line comprising: the first pipeline, the gas flowmeter, the second pipeline, the stop valve and the third pipeline are connected in sequence; wherein the first pipeline is connected with a gas source, and the third pipeline is connected with a vacuum chamber; the cleaning valve is connected to the first pipeline, and the fourth pipeline is connected between the cleaning valve and the third pipeline;
the cleaning valve is in an open state when the gas source is installed to the gas supply pipeline, and the first pipeline is cleaned by the vacuum chamber; and is in a closed state after cleaning.
In one embodiment, the third conduit connects to a neutralizer or ion source at the ion source load end of the vacuum chamber.
In one embodiment, the purge valve is a remotely controlled electrically operated valve.
An installation method of an ion source gas supply pipeline is used for installing a gas source and the ion source gas supply pipeline, and the method comprises the following steps:
connecting a gas source to the first pipeline;
maintaining a valve of a gas source in a closed state;
opening a cleaning valve to enable the first pipeline to be communicated to a vacuum chamber, and performing vacuum cleaning on the first pipeline;
closing the cleaning valve after the vacuum chamber is pumped for a set time period;
and opening the valve to complete the installation of the gas source and the gas supply pipeline.
In one embodiment, after the line cleaning of the first line and the gas flow meter is completed and before the valve is opened, the method further comprises:
opening the stop valve to enable the second pipeline to be communicated to the vacuum chamber, and performing vacuum cleaning on the second pipeline;
and after the vacuum chamber is pumped for a set time period, closing the stop valve.
In one embodiment, after evacuating the vacuum chamber for a set period of time, the method further comprises:
and detecting whether the vacuum environment of the vacuum chamber is recovered to a vacuum state, and if not, judging that the air leakage condition exists in the current clean pipeline.
An ion source gas supply line comprising: a first line a, a gas flow meter a1, a gas flow meter a2, a second line a1, a second line a2, a shut-off valve a1, a shut-off valve a2, and a third line a; the system comprises a first pipeline b, a gas flowmeter b, a second pipeline b, a stop valve b and a third pipeline b;
the first pipeline a is respectively connected with a gas flowmeter a1 and a gas flowmeter a2, and the gas flowmeter a1 is connected to the third pipeline a through a second pipeline a1 and a stop valve a 1; the gas flow meter a2 is connected to the third line b by a second line a2 and a shut-off valve a 2; the first pipeline b is connected to the third pipeline b sequentially through a gas flowmeter b, a second pipeline b and a stop valve b;
the first pipeline a is connected with a gas source a, and the third pipeline a is connected with a neutralizer at the ion source loading end of the vacuum chamber; the first pipeline b is connected with a gas source b, and the third pipeline b is connected with an ion source at an ion source load end of the vacuum chamber; further comprising: a cleaning valve a connected to the first pipeline a, and a fourth pipeline a connected between the cleaning valve a and the third pipeline a; a cleaning valve b connected to the first pipeline b, and a fourth pipeline b connected between the cleaning valve b and the third pipeline b;
the cleaning valve a and the cleaning valve b are in an open state when the gas source a and the gas source b are installed on the gas supply pipeline, and the first pipeline a and the first pipeline b are cleaned by the vacuum chamber; and is in a closed state after cleaning.
In one embodiment, the purge valve a or the purge valve b is a remotely controlled electrically operated valve.
An installation method of an ion source gas supply pipeline is used for respectively installing a gas source a and a gas source b and the ion source gas supply pipeline, and the method comprises the following steps:
connecting a gas source a to a first pipeline a, and connecting a gas source b to a first pipeline b;
maintaining valve a of gas source a and valve b of gas source b in a closed state;
opening a cleaning valve a and a cleaning valve b, so that the first pipeline a and the first pipeline b are communicated to a vacuum chamber, and performing vacuum cleaning on the first pipeline a and the first pipeline b;
after the vacuum chamber is pumped for a set time period, closing the cleaning valve a and the cleaning valve b;
and opening the valve a and the valve b to complete the installation of the gas source a and the gas source b and the gas supply pipeline.
In one embodiment, after the cleaning of the first pipeline a and the first pipeline b is completed, before the opening of the valve a and the valve b, the method further comprises:
opening the stop valve a1, the stop valve a1 and the stop valve b, so that the second pipeline a1, the second pipeline a2 and the second pipeline b are communicated to a vacuum chamber, and performing vacuum cleaning on the second pipeline a1, the second pipeline a2 and the second pipeline b;
after the vacuum chamber is evacuated for a set period of time, the cutoff valve a1, the cutoff valve a1, and the cutoff valve b are closed.
The technical scheme of this application has following beneficial effect:
the cleaning valve is arranged on the ion source gas supply pipeline, the gas source is in an open state when being arranged on the gas supply pipeline, and the first pipeline is cleaned by the vacuum chamber, so that the influence of air in the first pipeline on the purity of the working gas is avoided; in the installation process, the first pipeline is cleaned through the cleaning valve, then the installation process is completed, the toxic and harmful gas is effectively prevented from being leaked, and the safety of the installation process is ensured.
Furthermore, when the pipeline is cleaned, whether the vacuum environment of the vacuum chamber is recovered to a vacuum state is detected after the vacuum chamber is used for exhausting air for a set time period, so that the air leakage condition of the currently cleaned pipeline is detected, and the air supply safety of the ion source air supply pipeline is ensured.
Drawings
FIG. 1 is a conventional gas line installation;
FIG. 2 is a schematic view of an exemplary embodiment of an ion source gas supply line;
FIG. 3 is a flow chart of a method for installing an ion source gas supply line according to an embodiment;
FIG. 4 is a schematic view of an ion source gas supply line according to another embodiment;
fig. 5 is a flow chart of a method for installing an ion source gas supply line according to another embodiment.
Detailed Description
In order to make the objects, technical solutions and advantages of the present application more apparent, the present application is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.
The term "comprises" and any other variations of the embodiments of the present application are intended to cover non-exclusive inclusions. For example, a process, method, system, article, or apparatus that comprises a list of steps is not limited to only those steps or modules recited, but may alternatively include other steps or modules not recited, or that are inherent to such process, method, article, or apparatus.
Referring to fig. 2, fig. 2 is a schematic view of an ion source gas supply pipeline according to an embodiment, the ion source gas supply pipeline includes: the first pipeline, the gas flowmeter, the second pipeline, the stop valve and the third pipeline are connected in sequence; the cleaning valve is connected to the first pipeline, and the fourth pipeline is connected between the cleaning valve and the third pipeline; the first pipeline is connected with a gas source (a gas station or a gas cylinder), and the third pipeline is connected with the vacuum chamber; the cleaning valve is in an open state when the gas source is installed on the gas supply pipeline, and the first pipeline is cleaned by the vacuum chamber; and is in a closed state after cleaning.
In the ion source gas supply pipeline of the embodiment, the gas source is in an open state when being installed in the gas supply pipeline through the cleaning valve, and the first pipeline is cleaned by the vacuum chamber, so that the influence of air in the first pipeline on the purity of the working gas is avoided; for the third line, a neutralizer or an ion source which can be connected to the ion source load end of the vacuum chamber can be used for cleaning the line during installation by utilizing the vacuum chamber, for the cleaning valve, the cleaning valve can be generally used only when the gas source is changed, a manual valve can be adopted, and an electric valve which can be controlled remotely can be adopted, and the first line is usually longer in length, so that the operation can be facilitated through remote control.
An embodiment of an installation method of an ion source gas supply pipeline according to the present application is described below, and the present embodiment is a technical solution for installing a gas source and an ion source gas supply pipeline based on the ion source gas supply pipeline provided above.
Referring to fig. 3, fig. 3 is a flow chart illustrating a method for installing an ion source gas supply line according to an embodiment; in this embodiment, taking the installation of the gas cylinder as an example, the method includes the following steps:
(1) connecting a gas source to the first pipeline; specifically, for example, a gas cylinder is connected to the first line.
(2) Maintaining a valve of a gas source in a closed state; wherein, can keep the gas cylinder closed state when the installation, need not to press the area installation.
(3) Opening a cleaning valve to enable the first pipeline to be communicated to a vacuum chamber, and performing vacuum cleaning on the first pipeline; specifically, the cleaning valve is communicated with the first pipeline and the third pipeline, and after the cleaning valve is communicated with the vacuum chamber, the first pipeline part from the gas cylinder to the gas flow meter and the third pipeline part from the stop valve to the vacuum chamber can be cleaned in vacuum, so that no air exists on the two pipelines.
(4) Closing the cleaning valve after the vacuum chamber is pumped for a set time period; specifically, the cleaning of the first pipeline and the third pipeline can be completed by utilizing the vacuum chamber to exhaust air for a certain time, then the cleaning valve is closed, the air exhaust time can be set according to actual requirements, and generally, air is exhausted.
(5) Opening the stop valve to enable the second pipeline to be communicated to the vacuum chamber, and performing vacuum cleaning on the second pipeline; in particular, there is a second pipe section between the gas meter and the shut-off valve, which section may have a control, so that after the above-mentioned cleaning step is completed, this section may also be further cleaned
(6) After the vacuum chamber is pumped for a set time period, closing the stop valve; in particular, after cleaning of the second pipeline section is completed, the shut-off valve is closed.
It should be noted that, since the second pipeline portion is in a sealed state in most cases, whether the portion needs to be cleaned is selected as needed, and whether the second pipeline needs to be cleaned by opening the shutoff valve is determined, and therefore, steps (5) and (6) are steps that can be selectively performed.
(7) Opening the valve to complete the installation of the gas source and the gas supply pipeline; specifically, after all management is ensured to be clean and connection is not problematic, the valve of the gas cylinder can be opened, and the installation of the gas cylinder is completed.
In the embodiment, in the installation process, the first pipeline and the third pipeline are cleaned through the cleaning valve, then the installation process is completed, the toxic and harmful gas leakage of the installation mode with pressure is effectively avoided, the technical scheme is convenient to operate, safe and reliable, the high-purity gas can be prevented from being polluted, and meanwhile, the safety of the installation process is ensured.
In one embodiment, according to the technical scheme of the application, in the step (4), after the vacuum chamber is pumped for a set time period, whether the vacuum environment of the vacuum chamber is recovered to a vacuum state is detected, and if not, the air leakage condition of the currently-cleaned pipeline is determined; specifically, the vacuum chamber can be restored to the vacuum environment state after the air in the pipeline is pumped out, and if the pipeline has a leakage condition, the vacuum chamber cannot be restored to the vacuum environment state all the time, so that the pipeline leakage condition detection function can be realized.
According to the scheme of the embodiment, when the pipeline is cleaned, whether the vacuum environment of the vacuum chamber is recovered to the vacuum state or not is detected after the vacuum chamber is exhausted for a set time period, so that the air leakage condition of the currently cleaned pipeline is detected, and the air supply safety of the ion source air supply pipeline is ensured.
Referring to fig. 4, a schematic view of an ion source gas supply line according to another embodiment of fig. 4; generally, the ion source needs more than one path of working gas, in this embodiment, a commonly used ion source needing two paths of working gas is taken as an example, one path to the neutralizer and the other path to the ion source are both connected to the vacuum chamber, and the structure of connecting two gas sources is combined below.
The ion source gas supply pipeline provided by the embodiment comprises: a first line a, a gas flow meter a1, a gas flow meter a2, a second line a1, a second line a2, a shut-off valve a1, a shut-off valve a2, and a third line a; the system comprises a first pipeline b, a gas flowmeter b, a second pipeline b, a stop valve b and a third pipeline b; the first pipeline a is respectively connected with a gas flowmeter a1 and a gas flowmeter a2, and the gas flowmeter a1 is connected to the third pipeline a through a second pipeline a1 and a stop valve a 1; the gas flow meter a2 is connected to the third line b by a second line a2 and a shut-off valve a 2; the first pipeline b is connected to the third pipeline b sequentially through a gas flowmeter b, a second pipeline b and a stop valve b; the first pipeline a is connected with a gas source a, and the third pipeline a is connected with a neutralizer at the ion source loading end of the vacuum chamber; the first pipeline b is connected with a gas source b, and the third pipeline b is connected with an ion source at the ion source loading end of the vacuum chamber.
In this embodiment, the gas supply line further includes: a cleaning valve a connected to the first pipeline a, and a fourth pipeline a connected between the cleaning valve a and the third pipeline a; a purge valve b connected to the first pipeline b, and a fourth pipeline b connected between the purge valve b and the third pipeline b; the cleaning valve a and the cleaning valve b are in an open state when the gas source a and the gas source b are installed on the gas supply pipeline, and the first pipeline a and the first pipeline b are cleaned by the vacuum chamber; and is in a closed state after cleaning.
Similar to the technical solution of the above embodiment, the ion source gas supply pipe of this embodiment is in an open state when the gas source is installed in the gas supply pipe through the cleaning valve a and the cleaning valve b, and the first pipe a and the first pipe b are cleaned by the vacuum chamber, so that the air in the first pipe is prevented from affecting the purity of the working gas. Similarly, for the cleaning valve a or the cleaning valve b, a manual valve or a remote-controlled electric valve can be adopted.
An embodiment of another installation method of an ion source gas supply pipeline according to the present application is described below, and the present application is based on the above-mentioned ion source gas supply pipeline and is used for installing a gas source a, a gas source b and an ion source gas supply pipeline.
Referring to fig. 5, fig. 5 is a flow chart illustrating a method for installing an ion source gas supply line according to another embodiment; the method comprises the following steps:
(1) connecting a gas source a to a first pipeline a, and connecting a gas source b to a first pipeline b; specifically, two gas sources are respectively connected to the two first pipelines.
(2) Maintaining valve a of gas source a and valve b of gas source b in a closed state; specifically, the valves for all gas sources are closed.
(3) Opening a cleaning valve a and a cleaning valve b, so that the first pipeline a and the first pipeline b are communicated to a vacuum chamber, and performing vacuum cleaning on the first pipeline a and the first pipeline b; in this case, the two first lines are each vacuum-cleaned by means of a cleaning valve.
(4) After the vacuum chamber is pumped for a set time period, closing the cleaning valve a and the cleaning valve b; thereby completing the line cleaning of the first line a and the first line b.
(5) Opening the stop valve a1, the stop valve a1 and the stop valve b, so that the second pipeline a1, the second pipeline a2 and the second pipeline b are communicated to a vacuum chamber, and performing vacuum cleaning on the second pipeline a1, the second pipeline a2 and the second pipeline b; in particular, three second line sections, which are selected execution steps, can be further cleaned here.
(6) After the vacuum chamber is pumped down for a set period of time, closing the stop valve a1, the stop valve a1 and the stop valve b; accordingly, the cleaning of the second line a1, the second line a2, and the second line b is completed.
(7) And opening the valve a and the valve b to complete the installation of the gas source a and the gas source b and the gas supply pipeline.
Similarly, the technical scheme of this embodiment, in the installation, clean first pipeline and third pipeline part through clean valve earlier, then accomplish the installation procedure again, avoided taking the pressure toxic and harmful gas of mounting means to reveal effectively, this technical scheme is convenient for operate, and safe and reliable can guarantee that high-purity gas does not receive the pollution, has also guaranteed the safety of installation simultaneously.
Similarly, in an embodiment, in step (4), after the vacuum chamber is evacuated for a set period of time, whether the vacuum environment of the vacuum chamber is restored to a vacuum state is detected, and if not, it is determined that an air leakage condition exists in the currently cleaned pipeline; therefore, the air leakage condition of the currently cleaned pipeline is detected, and the air supply safety of the ion source air supply pipeline is ensured.
The above-mentioned embodiments only express several embodiments of the present application, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the concept of the present application, which falls within the scope of protection of the present application. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. An ion source gas supply line comprising: the first pipeline, the gas flowmeter, the second pipeline, the stop valve and the third pipeline are connected in sequence; wherein the first pipeline is connected with a gas source, and the third pipeline is connected with a vacuum chamber; the device is characterized by also comprising a cleaning valve connected to the first pipeline and a fourth pipeline connected between the cleaning valve and the third pipeline;
the cleaning valve is in an open state when the gas source is installed to the gas supply pipeline, and the first pipeline is cleaned by the vacuum chamber; and is in a closed state after cleaning.
2. The ion source gas supply line of claim 1, wherein the third line connects a neutralizer of an ion source load end of the vacuum chamber or an ion source.
3. The ion source gas supply line of claim 1, wherein the purge valve is a remotely controlled electrically operated valve.
4. A method of installing an ion source gas supply line, for installing a gas source and the ion source gas supply line according to any one of claims 1 to 3, the method comprising:
connecting a gas source to the first pipeline;
maintaining a valve of a gas source in a closed state;
opening a cleaning valve to enable the first pipeline to be communicated to a vacuum chamber, and performing vacuum cleaning on the first pipeline;
closing the cleaning valve after the vacuum chamber is pumped for a set time period;
and opening the valve to complete the installation of the gas source and the gas supply pipeline.
5. The method of claim 4, further comprising, after the cleaning of the first conduit and the conduit of the gas flow meter is completed and before the opening of the valve:
opening the stop valve to enable the second pipeline to be communicated to the vacuum chamber, and performing vacuum cleaning on the second pipeline;
and after the vacuum chamber is pumped for a set time period, closing the stop valve.
6. The method of claim 5, further comprising, after evacuating the vacuum chamber for a predetermined period of time:
and detecting whether the vacuum environment of the vacuum chamber is recovered to a vacuum state, and if not, judging that the air leakage condition exists in the current clean pipeline.
7. An ion source gas supply line comprising: a first line a, a gas flow meter a1, a gas flow meter a2, a second line a1, a second line a2, a shut-off valve a1, a shut-off valve a2, and a third line a; the system comprises a first pipeline b, a gas flowmeter b, a second pipeline b, a stop valve b and a third pipeline b;
the first pipeline a is respectively connected with a gas flowmeter a1 and a gas flowmeter a2, and the gas flowmeter a1 is connected to the third pipeline a through a second pipeline a1 and a stop valve a 1; the gas flow meter a2 is connected to the third line b by a second line a2 and a shut-off valve a 2; the first pipeline b is connected to the third pipeline b sequentially through a gas flowmeter b, a second pipeline b and a stop valve b;
the first pipeline a is connected with a gas source a, and the third pipeline a is connected with a neutralizer at the ion source loading end of the vacuum chamber; the first pipeline b is connected with a gas source b, and the third pipeline b is connected with an ion source at an ion source load end of the vacuum chamber; it is characterized by also comprising: a cleaning valve a connected to the first pipeline a, and a fourth pipeline a connected between the cleaning valve a and the third pipeline a; a cleaning valve b connected to the first pipeline b, and a fourth pipeline b connected between the cleaning valve b and the third pipeline b;
the cleaning valve a and the cleaning valve b are in an open state when the gas source a and the gas source b are installed on the gas supply pipeline, and the first pipeline a and the first pipeline b are cleaned by the vacuum chamber; and is in a closed state after cleaning.
8. The ion source gas supply line of claim 7, wherein the purge valve a or the purge valve b is a remotely controlled electrically operated valve.
9. A method for installing an ion source gas supply line, wherein a gas source a and a gas source b are installed separately from the ion source gas supply line of claim 7 or 8, the method comprising:
connecting a gas source a to a first pipeline a, and connecting a gas source b to a first pipeline b;
maintaining valve a of gas source a and valve b of gas source b in a closed state;
opening a cleaning valve a and a cleaning valve b, so that the first pipeline a and the first pipeline b are communicated to a vacuum chamber, and performing vacuum cleaning on the first pipeline a and the first pipeline b;
after the vacuum chamber is pumped for a set time period, closing the cleaning valve a and the cleaning valve b;
and opening the valve a and the valve b to complete the installation of the gas source a and the gas source b and the gas supply pipeline.
10. The method of claim 9, further comprising, after the cleaning of the first pipe a and the first pipe b and before the opening of the valve a and the valve b, the steps of:
opening the stop valve a1, the stop valve a1 and the stop valve b, so that the second pipeline a1, the second pipeline a2 and the second pipeline b are communicated to a vacuum chamber, and performing vacuum cleaning on the second pipeline a1, the second pipeline a2 and the second pipeline b;
after the vacuum chamber is evacuated for a set period of time, the cutoff valve a1, the cutoff valve a1, and the cutoff valve b are closed.
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| CN101113803A (en) * | 2006-07-27 | 2008-01-30 | 上海宏力半导体制造有限公司 | Gas piping device used for connecting with process cavity of high-density plasma machine |
| CN102129949A (en) * | 2010-01-19 | 2011-07-20 | 安捷伦科技有限公司 | System and method for replacing an ion source in a mass spectrometer |
| KR20140003028A (en) * | 2012-06-29 | 2014-01-09 | (주)휴티스 | Ion supply device, ion supply and clean method in using same |
| CN111769024A (en) * | 2020-07-30 | 2020-10-13 | 中山市博顿光电科技有限公司 | Ion source device |
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Application publication date: 20210601 |