CN112863993B - Large-throughput microwave plasma reaction cavity - Google Patents
Large-throughput microwave plasma reaction cavity Download PDFInfo
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- CN112863993B CN112863993B CN202110064047.4A CN202110064047A CN112863993B CN 112863993 B CN112863993 B CN 112863993B CN 202110064047 A CN202110064047 A CN 202110064047A CN 112863993 B CN112863993 B CN 112863993B
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- cylindrical coupling
- coupling cavity
- quartz tube
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32229—Waveguides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
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Abstract
The invention discloses a large-throughput microwave plasma reaction chamber, which belongs to the technical field of plasma and comprises an upper cylindrical coupling chamber, a lower cylindrical coupling chamber, a waveguide and a quartz tube; the upper cylindrical coupling cavity is fixedly communicated with the upper end of the lower cylindrical coupling cavity; the waveguide is fixedly communicated with the side wall of the lower cylindrical coupling cavity; the quartz tube vertically penetrates through the upper cylindrical coupling cavity and the lower cylindrical coupling cavity; the lower end of the lower cylindrical coupling cavity is fixedly provided with an inlet joint corresponding to the quartz tube, and the inlet joint is provided with an ignition device inlet and an air inlet which are communicated with the quartz tube. When meeting the plasma of cylinder center gathering, vertically increased upper cylinder coupling cavity, lengthened plasma operating distance, increased the volume of microwave effect, improved the disposable tolerance greatly, promoted the tolerance and the stability of plasma work, improved the microwave energy utilization ratio simultaneously.
Description
Technical Field
The invention belongs to the technical field of plasmas, and particularly relates to a large-throughput microwave plasma reaction cavity.
Background
The cause of plasma generation is generally considered to be random thermal motion, and temperature and an external electromagnetic field are two major factors causing such random motion. The plasma generated by the temperature change is similar to the flame in a candle, and the ionization degree is lower; the plasma generated and maintained by the external electromagnetic field has variable structure and strong practicability, and is the main component of the artificial plasma.
When the frequency of the applied electromagnetic field exciting the plasma reaches the microwave band, such plasma is called microwave plasma. Compared with direct current, alternating current and radio frequency plasmas, the microwave plasma does not need electrodes, the electron density, the electron temperature and the gas temperature are higher, and the energy conversion efficiency from the microwave to the plasma is also higher. These advantages make microwave plasma widely used in daily life, energy, chemical and material fields.
The history of microwave plasma research dates back roughly four and fifty years of the last century. Originally, massachusetts found that microwave coaxial structures were capable of generating plasma, but the inner conductor was susceptible to corrosion and did not have a long service life due to the small volume of the plasma. Since then, many laboratories and companies in colleges and universities have been improving microwave plasma devices, and the volume of the cavity is larger, the intensity is higher, and the experiment requirements are lower. However, the volume of gas which can be acted by the cavity of the existing model is not large, the gas quantity which can be processed is not enough, and the energy utilization rate is not high.
Disclosure of Invention
The invention aims to provide a large-throughput microwave plasma reaction chamber to solve the problem that the throughput of the conventional chamber is low.
In order to realize the purpose of the invention, the technical scheme is as follows: a large-throughput microwave plasma reaction chamber comprises an upper cylindrical coupling chamber, a lower cylindrical coupling chamber, a waveguide and a quartz tube; the upper cylindrical coupling cavity is fixedly communicated with the upper end of the lower cylindrical coupling cavity; the waveguide is fixedly communicated with the side wall of the lower cylindrical coupling cavity; the quartz tube vertically penetrates through the upper cylindrical coupling cavity and the lower cylindrical coupling cavity; the lower end of the lower cylindrical coupling cavity is fixedly provided with an inlet joint corresponding to the quartz tube, and the inlet joint is provided with an ignition device inlet and an air inlet which are communicated with the quartz tube.
As a further alternative, the upper cylindrical coupling cavity, the lower cylindrical coupling cavity and the quartz tube are coaxially arranged.
As a further alternative, the air inlet holes are multiple and are symmetrically arranged on two sides of the ignition device inlet.
As a further alternative, the ignitor inlet is coaxial with the quartz tube.
As a further alternative, the waveguide is a rectangular waveguide, and the center line of the waveguide is perpendicular to the center line of the lower cylindrical coupling cavity.
As a further alternative, the height of the waveguide is the same as the height of the lower cylindrical coupling cavity.
As a further alternative, the width of the waveguide in the radial direction of the lower cylindrical coupling cavity is smaller than or equal to the diameter of the lower cylindrical coupling cavity.
As a further alternative, the lower end of the lower cylindrical coupling cavity has a through hole adapted to the quartz tube, and the upper end of the inlet fitting has a boss protruding into the through hole and abutting to the lower end of the quartz tube.
The invention has the beneficial effects that: the reaction cavity provided by the invention has the advantages that the upper cylindrical coupling cavity is longitudinally added while plasma is gathered at the center of the cylinder, the acting distance of the plasma is lengthened, the acting volume of microwave is increased, the gas processing capacity is greatly improved, the gas capacity and stability of the plasma work are improved, and the utilization rate of microwave energy is improved.
Drawings
In order to more clearly illustrate the technical solution of the present invention, the drawings needed to be used in the description of the embodiments are briefly introduced below, it should be understood that the drawings in the following description are some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a schematic diagram of a high throughput microwave plasma reaction chamber provided by an embodiment of the present invention;
FIG. 2 is a cross-sectional view of a high throughput microwave plasma reaction chamber provided by an embodiment of the present invention;
FIG. 3 is a cross-sectional electric field diagram of a high throughput microwave plasma reaction chamber provided by an embodiment of the present invention;
FIG. 4 is a side view electric field diagram of a high throughput microwave plasma reaction chamber provided by an embodiment of the present invention;
reference numerals: 1-upper cylindrical coupling cavity; 2-lower cylindrical coupling cavity; 3-a waveguide; 4-a quartz tube; 5-an inlet connection; 6-ignition device inlet; 7-air inlet hole.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present invention without any inventive step, are within the scope of the present invention. It is to be understood that the drawings are provided solely for the purposes of reference and illustration and are not intended as a definition of the limits of the invention. The connection relationships shown in the drawings are for clarity of description only and do not limit the manner of connection.
It will be understood that when an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.
The invention is further described with reference to the following figures and specific embodiments.
FIGS. 1 and 2 show a high-throughput microwave plasma reaction chamber provided by the invention, which comprises an upper cylindrical coupling chamber, a lower cylindrical coupling chamber, a waveguide and a quartz tube; the upper cylindrical coupling cavity is fixedly communicated with the upper end of the lower cylindrical coupling cavity; the waveguide is fixedly communicated with the side wall of the lower cylindrical coupling cavity; the quartz tube vertically penetrates through the upper cylindrical coupling cavity and the lower cylindrical coupling cavity; the lower end of the lower cylindrical coupling cavity is fixedly provided with an inlet joint corresponding to the quartz tube, and the inlet joint is provided with an ignition device inlet and an air inlet which are communicated with the quartz tube.
And feeding microwaves into one end of the waveguide far away from the lower cylindrical coupling cavity, wherein the waveguide directionally guides the electromagnetic waves, microwave incidence and reflection paths are formed in the waveguide, and the electromagnetic waves form focusing in the center of the lower cylindrical coupling cavity through the rectangular waveguide. The upper cylindrical coupling cavity is positioned above the lower cylindrical coupling cavity, so that the gas acting distance of the cavity is increased, and the gas treatment capacity is increased. The quartz tube is used for introducing gas, the left and right inlet joints can be respectively provided with an air inlet, and compressed air or argon and the like are uniformly fed into the quartz tube through the air tube. During operation, the iron wire can be adopted to enter the cavity through the ignition device inlet, the iron wire is firstly ignited by energy, the spark is then ignited on gas (compressed air or argon gas and the like) in the quartz tube, and then flame rushes out of the upper opening of the quartz tube.
The upper cylindrical coupling cavity, the lower cylindrical coupling cavity and the quartz tube are coaxially arranged. The inlet holes are a plurality of and are symmetrically arranged at two sides of the inlet of the ignition device, and two inlet holes can be specifically arranged and are uniformly fed into the quartz tube. The igniter inlet is coaxial with the quartz tube.
The heights and the radiuses of the upper cylindrical coupling cavity and the lower cylindrical coupling cavity can be set to be relatively large according to the requirements of the conditions. The waveguide is a rectangular waveguide, and the central line of the waveguide is perpendicular to the central line of the lower cylindrical coupling cavity. The height of the waveguide is the same as the height of the lower cylindrical coupling cavity. In the radial direction of the lower cylindrical coupling cavity, the width of the waveguide is smaller than or equal to the diameter of the lower cylindrical coupling cavity.
The lower end of the lower cylindrical coupling cavity is provided with a through hole matched with the quartz tube, and the upper end of the inlet joint is provided with a boss which extends into the through hole and is abutted to the lower end of the quartz tube, so that the positioning and the accurate installation and connection are facilitated. The upper cylindrical coupling cavity can be fixedly connected with the upper end of the lower cylindrical coupling cavity through a flange, and the inlet joint can also be fixedly connected with the lower end of the lower cylindrical coupling cavity through a flange.
The reaction chamber takes the following parameters as examples: the port size of the microwave feed was 109.22mm in width and 54.61mm in height. The frequency of the electromagnetic field can adopt 2.45 GHz. The waveguide has a width of 109.22mm, a height of 54.61mm and a length of 200 mm. The height of the lower cylindrical coupling cavity is 54.61mm, and the radius is 80 mm. The height of the upper cylindrical coupling cavity is 150mm, and the radius of the upper cylindrical coupling cavity is 40 mm. The height of the quartz tube is 204.61mm, the outer diameter is 30mm, and the inner diameter is 28 mm. As can be seen from fig. 3 and 4:
1. with a large throughput. It can be seen that the centrally focused plasma can achieve an electric field strength of 8 x 10 x 4V/m when the port feeds 1000w of electromagnetic waves. The cavity with the large volume can achieve the result, and the effect is very good.
2. The energy utilization rate is high. The value is-10.5 db under 2.45Hz electromagnetic wave, which means 0.1 reflection/incidence, 90% absorption rate of the cavity, and good focusing effect.
The two points show that the reaction cavity perfectly meets the industrialized requirement and makes a certain breakthrough.
The invention is not limited to the above alternative embodiments, and any other various forms of products can be obtained by anyone in the light of the present invention, but any changes in shape or structure thereof, which fall within the scope of the present invention as defined in the claims, fall within the scope of the present invention.
Claims (5)
1. A large-throughput microwave plasma reaction chamber is characterized by comprising an upper cylindrical coupling chamber, a lower cylindrical coupling chamber, a waveguide and a quartz tube; the upper cylindrical coupling cavity is fixedly communicated with the upper end of the lower cylindrical coupling cavity; the waveguide is fixedly communicated with the side wall of the lower cylindrical coupling cavity; the quartz tube vertically penetrates through the upper cylindrical coupling cavity and the lower cylindrical coupling cavity; the lower end of the lower cylindrical coupling cavity is fixedly provided with an inlet joint corresponding to the quartz tube, and the inlet joint is provided with an ignition device inlet and an air inlet which are communicated with the quartz tube; the height of the waveguide is the same as that of the lower cylindrical coupling cavity; in the radial direction of the lower cylindrical coupling cavity, the width of the waveguide is smaller than or equal to the diameter of the lower cylindrical coupling cavity; the lower end of the lower cylindrical coupling cavity is provided with a through hole matched with the quartz tube, and the upper end of the inlet joint is provided with a boss extending into the through hole and abutted to the lower end of the quartz tube.
2. The high throughput microwave plasma reaction chamber of claim 1 wherein the upper cylindrical coupling chamber, the lower cylindrical coupling chamber and the quartz tube are coaxially disposed.
3. The high throughput microwave plasma reaction chamber of claim 1, wherein the gas inlet holes are plural and symmetrically disposed at both sides of the ignition device inlet.
4. The high throughput microwave plasma reaction chamber of claim 1 or 3 wherein the ignition device inlet is coaxial with the quartz tube.
5. The high throughput microwave plasma reaction chamber of claim 1 wherein the waveguide is a rectangular waveguide having a centerline perpendicular to a centerline of the lower cylindrical coupling chamber.
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| CN202110064047.4A CN112863993B (en) | 2021-01-18 | 2021-01-18 | Large-throughput microwave plasma reaction cavity |
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| CN112863993B true CN112863993B (en) | 2022-02-08 |
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Citations (2)
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| CN201230400Y (en) * | 2008-04-24 | 2009-04-29 | 大连海事大学 | Atmosphere pressure microwave plasma producing device |
| WO2019194467A1 (en) * | 2018-04-05 | 2019-10-10 | (주)그린사이언스 | Microwave plasma torch for manufacturing metal powder or metal alloy, and method for treating metal compound or metal compound-containing material and metal powder by using same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006324551A (en) * | 2005-05-20 | 2006-11-30 | Shibaura Mechatronics Corp | Plasma generator and plasma processing apparatus |
| CN101123844B (en) * | 2007-09-12 | 2011-09-14 | 清华大学 | Microwave plasm reaction cavity |
| CN101346032A (en) * | 2008-04-24 | 2009-01-14 | 大连海事大学 | Barometric pressure microwave plasma generation device |
| CN101378616A (en) * | 2008-10-13 | 2009-03-04 | 电子科技大学 | Atmosphere plasma cylindrical microwave excitation cavity |
| CN111755308B (en) * | 2019-03-27 | 2022-07-22 | 北京北方华创微电子装备有限公司 | Process chamber and semiconductor processing equipment |
| CN112074071A (en) * | 2020-10-05 | 2020-12-11 | 四川大学 | High-power plasma generating device of multichannel microwave source |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201230400Y (en) * | 2008-04-24 | 2009-04-29 | 大连海事大学 | Atmosphere pressure microwave plasma producing device |
| WO2019194467A1 (en) * | 2018-04-05 | 2019-10-10 | (주)그린사이언스 | Microwave plasma torch for manufacturing metal powder or metal alloy, and method for treating metal compound or metal compound-containing material and metal powder by using same |
Non-Patent Citations (1)
| Title |
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| 《一种大气微波环形波导等离子体设备》;刘亮，等;《强激光与粒子束》;20070930;第19卷(第9期);1501-1506 * |
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