CN112759276B - Additive repairing method and device for surface defects of fused quartz optical element - Google Patents

Additive repairing method and device for surface defects of fused quartz optical element Download PDF

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CN112759276B
CN112759276B CN202110006705.4A CN202110006705A CN112759276B CN 112759276 B CN112759276 B CN 112759276B CN 202110006705 A CN202110006705 A CN 202110006705A CN 112759276 B CN112759276 B CN 112759276B
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laser
defect
sio
fused quartz
optical element
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CN112759276A (en
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周丽
姜有恩
任志远
李学春
朱健强
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Shanghai Institute of Optics and Fine Mechanics of CAS
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Shanghai Institute of Optics and Fine Mechanics of CAS
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Abstract

The invention discloses an additive repairing method and device for surface defects of a fused quartz optical element. The method carries out additive repair on the surface defects of the fused quartz component through laser chemical vapor deposition and laser annealing, ensures that the surface is smooth and flat after the defects are repaired, and greatly improves the damage resistance of the fused quartz optical component. In addition, the method has the characteristics of high position precision, controllable deposition amount and high speed, can selectively repair the defect points on the surface without damaging other areas of the element, and is suitable for repairing any defects such as scratches, impurities, cracks, damaged points and the like.

Description

Additive repairing method and device for surface defects of fused quartz optical element
Technical Field
The invention relates to the field of processing of 'zero defect' optical elements with high damage resistance, in particular to a method and a device for additive repair of surface defects of fused quartz optical elements.
Background
"malignant" defects on the surface of fused silica optical components can form "malignant" damage points during high throughput operation. Such damage points are characterized by at least one of the following features: 1) the damage point is unstable and can be continuously increased when the device is operated under high load, and finally the device cannot be used continuously; 2) the damage point can cause severe subsequent light field modulation, causing "chain" damage to subsequent optical elements. There are two main approaches to addressing the "malignant" defect of optical elements: on one hand, the number of the element defect points is reduced from the source through the improvement of the processing technology; and on the other hand, the remaining defect points of the element processing are screened and identified, and effective repair and assessment are completed. The latter is an extremely important supplement to the former, and can be used for filling up short plates with the damage resistance of the optical element, thereby greatly improving the damage threshold of the optical element.
The traditional method for repairing the 'malignant' defect of the fused quartz optical element is a 'cutting-off type' technical route, and comprises carbon dioxide laser repair, ultrashort pulse laser repair, single crystal diamond repair, chemical etching repair, micro-flame welding torch repair, magnetorheological polishing repair and wet etching repair. Although the 'cut-off' method effectively inhibits the damage growth of the defect region, the pit left after the defect region is removed can cause subsequent optical field modulation to a certain extent, so that the subsequent elements are damaged in a 'chain' manner. In patent application CN108455870A, a PE-CVD method is used to deposit large area of silica on the whole surface of the fused quartz optical element after the defect is etched, and then plasma flame or high temperature oxyhydrogen flame is used to melt the deposited silica, which depends on the fluidity of the fused silica to fill and repair the crack. The indiscriminate large-area deposition mode can cause the original defect-free area on the surface of the element to be damaged, crack filling is realized by means of the fluidity of the molten silicon dioxide, the controllability is poor, and the repair speed is slow. Therefore, a material selective deposition additive repair method is required to selectively deposit a new fused quartz material in the pit after the defect area is removed to fill the pit, so that the surface of the repair area is smooth and flat, and the chain damage of the subsequent optical element is avoided.
Disclosure of Invention
In view of the above, the invention provides an additive repair method and device for surface defects of a fused quartz optical element, which comprises the steps of firstly completely removing materials in a surface defect area of the fused quartz optical element, then using carbon dioxide laser as a heat source, depositing new fused quartz materials in pits left after the defects are removed based on laser chemical vapor deposition to fill the pits until the surface of the fused quartz optical element is flat, carrying out in-situ laser annealing, and finally carrying out damage threshold test, examination and repair effects on a typical repair area. According to the technical scheme provided by the invention, the additive repair of the surface defect of the fused quartz element is carried out through Laser Chemical Vapor Deposition (LCVD) and laser annealing, so that the surface is smooth and flat after the defect is repaired, the problem of chain type damage of a subsequent optical element caused by subsequent optical field modulation can be avoided, and the fused quartz optical element with no malignant defect on the surface and high damage threshold is obtained. In addition, the method has the characteristics of high position precision, controllable deposition amount and high speed, and can selectively repair the defect points on the surface without damaging other areas of the element.
In order to achieve the purpose, the technical scheme provided by the invention is as follows:
the method for repairing the surface defect of the fused quartz optical element in an additive manner is characterized in that the method adopts laser chemical vapor deposition and laser annealing to repair the defect area in the additive manner, and comprises the following specific steps:
1) screening and positioning the position of a defect point on the surface of the fused quartz optical element, and removing the defect and materials of the affected area around the defect;
2) depositing a new fused quartz material in the pit after the element defect material is removed by adopting a laser chemical vapor deposition method, and specifically comprising the following steps of:
firstly, an element with completely removed materials in a defect area is arranged in a sealed reaction cavity;
vacuumizing the sealed reaction cavity to a set vacuum degree;
focusing laser on a to-be-repaired area where a defect point is located on the surface of the element;
monitoring the deposition state, and controlling the vapor deposition rate and the transverse and longitudinal ranges of deposition;
fifthly, SiO is set 2 Precursor flow and carrier gas flow rates, and delivery of SiO 2 Putting the precursor into a sealed reaction cavity;
sixthly, setting laser power and focal spot diameter and irradiating the area to be repaired on the surface of the element to raise the temperature of the area to the set temperature required by laser chemical vapor deposition, and depositing a specific amount of SiO 2 In the pit left after the surface defect of the element is removed;
seventhly, stopping conveying the SiO after the laser irradiation reaches the set duration 2 Precursor, and flushing away reaction by-product and residual SiO with clean gas 2 A precursor;
setting laser power and focal spot diameter to make the surface of the quartz optical element to be repaired raise to the set temperature required for laser annealing, irradiating the deposited SiO 2 Until the set time is reached, SiO is carried out 2 Annealing to release SiO 2 Stress after deposition and reduced roughness;
ninthly, repeating the fourth to the eighth till the pit where the element defect point is located is completely filled and the surface is smooth and flat;
and c, repeating c to c until all defect points of the element are repaired.
Optionally, the SiO 2 The precursor is tetraethoxysilane or silane.
Optionally, the material for removing the defect and the affected area around the defect specifically adopts ultrashort pulse laser.
Optionally, the carrier gas is nitrogen, argon or helium with a purity of 99.9999%.
Optionally, the clean gas is nitrogen, argon or helium with a purity of 99.9999%.
Optionally, the vacuum degree range of the sealed reaction cavity is 10-10 5 Pa。
Optionally, the laser chemical vapor deposition temperature and the laser annealing temperature are both lower than the evaporation temperature of the fused quartz material, and the range is 500-3000 ℃.
Optionally, the change of the laser heating temperature is changed by changing the laser irradiation power and the focal spot diameter of the surface of the region to be repaired, that is, the temperature change Δ T of the central point of the laser irradiation region when reaching the steady state is approximately equal to
Figure BDA0002883735890000031
Where d is the focal spot diameter of the Gaussian-shaped focal spot, P is the laser irradiation power, k e For equivalent thermal conductivity, R is the reflectivity of the surface of the fused silica optical element to the irradiated laser.
Optionally, the absorption length of the fused silica material at the laser wavelength is short, the laser heat source is approximate to a surface heat source, and the wavelength can be 10.6 μm, 10.2 μm or 9.3 μm.
An apparatus for implementing the method for additive repairing of surface defects of a fused silica optical element, the apparatus comprising:
SiO 2 precursor supply system, the SiO 2 Precursor supply system for providing and delivering deposited SiO 2 The required precursor is put into a sealed reaction chamber, and reaction by-products and residual SiO are washed away 2 Clean gas required by the precursor;
a sealed reaction chamber for providing SiO 2 The precursor reacts under laser heating to generate SiO 2 The desired reaction site;
the laser transmission control assembly is used for transmitting laser and focusing the laser on a to-be-repaired defect area of the fused quartz optical element, and controlling the diameter of a focal spot and the laser irradiation power;
the temperature online monitoring assembly is used for monitoring the surface temperature of the area to be repaired;
the online morphology monitoring assembly is used for monitoring the surface profile of the area to be repaired and judging whether the defects to be repaired are completely filled and the surface is smooth;
and a tail gas processor for processing the tail gas in the laser chemical vapor deposition process.
Optionally, a laser input window for inputting output light of the laser transmission control assembly and a morphology monitoring window for passing output light and received light of the morphology on-line monitoring assembly are arranged on the side wall of the sealed reaction cavity.
Optionally, the seal cavity is provided with a connection SiO 2 Precursor supply system, seal chamber, pipeline port of vacuum pump.
Optionally, the arrangement of the pipeline ports of the seal cavity is matched with the shape and structure of the seal cavity to make SiO 2 The precursor can be distributed on the surface of the fused quartz optical element at the area to be repaired.
Compared with the prior art, the technical scheme provided by the invention at least has the following advantages:
1) the laser chemical vapor deposition is utilized to perform additive repair on the surface defect area of the fused quartz optical element, the defect area can be selectively heated locally, and the high-precision deposition of quantitative fused quartz materials in the defect area is realized without influencing other areas.
2) The newly deposited fused quartz material is annealed by utilizing the laser heat source, the heat affected zone is small, the annealing resolution is high, the temperature is high, and the speed is high.
3) The laser transmission control assembly can be used for quickly adjusting and controlling the laser irradiation power, the focal spot size and the laser irradiation time required by laser-exchange chemical vapor deposition and laser annealing with high precision.
4) SiO can be ensured by the sealed reaction cavity with optimized design 2 The precursor is uniformly distributed on the surface of the fused quartz optical element to be repaired.
5) The temperature of the surface of a repair area of the fused quartz optical element in the additive repair process can be monitored through the temperature online monitoring assembly, and the feedback control of laser irradiation power is realized.
6) The surface topography of the repair area of the fused quartz optical element can be monitored with high precision through the topography on-line monitoring component, and the feedback control of the deposition amount of the fused quartz material is realized.
7) Due to the application of the technology and the structure, the high-precision additive repair of the surface defect area of the fused quartz optical element is selectively ensured, so that the area is free of defects and has a smooth and flat surface, the damage resistance of the fused quartz optical element is greatly improved, and the problem of chain type damage of the subsequent optical element caused by optical field modulation is avoided.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative efforts.
Fig. 1 is a flowchart of additive repair of a surface defect of a fused silica optical element according to an embodiment of the present invention.
Fig. 2 is a schematic structural diagram of an additive repair device for surface defects of a fused quartz optical element according to an embodiment of the present invention.
Fig. 3 is a comparison diagram of three-dimensional features before and after filling of pits at a defect position on a surface of a fused silica optical element according to an embodiment of the present invention, where a is the three-dimensional feature of the defect pit, and b is the three-dimensional feature of a defect area after depositing a fused silica material.
Fig. 4 is a comparison graph of two-dimensional shapes of fused quartz before and after annealing when the deposited thickness of the fused quartz is different, where a is the two-dimensional shape of the fused quartz before annealing with a deposited thickness of 0.5 μm, b is the two-dimensional shape of the fused quartz after annealing with a deposited thickness of 0.5 μm, c is the two-dimensional shape of the fused quartz before annealing with a deposited thickness of 2.5 μm, and d is the two-dimensional shape of the fused quartz after annealing with a deposited thickness of 2.5 μm.
Fig. 5 is a three-dimensional topography of a fused quartz optical element after surface defect additive repair according to an embodiment of the present invention, where a is a three-dimensional topography of a defect point with a width of 200 μm after repair, and b is a three-dimensional topography of a defect point with a width of 600 μm after repair.
Fig. 6 is a graph of a damage threshold test result after the surface defect additive repair of the fused silica optical element according to the embodiment of the invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As described in the background, a "malignant" defect on the surface of a fused silica optical component is a bottleneck that limits the high-throughput operation of the component in high-power laser devices. And the remaining defect points of the element are screened and repaired, so that short plates with the damage resistance of the optical element can be supplemented, and the damage threshold of the optical element is greatly improved. Compared with other repairing technologies, the method has the advantages that a new fused quartz material is deposited in the pits after the defect areas are removed in an additive repairing mode, the surface of the repaired areas can be smooth and flat, the damage threshold of the repaired fused quartz optical element is improved, and chain damage of the subsequent optical element is avoided.
Based on this, the embodiment of the application provides a method and a device for repairing the surface defect of a fused quartz optical element by additive method, firstly, the defect point on the surface of the fused quartz optical element is screened and positioned, and the material in the surface defect area of the fused quartz optical element is completely removed by using the precision processing means such as ultrashort pulse laser processing, and then, the carbon dioxide laser is used as the heat source, and the new fused quartz material is deposited in the pit left after the defect is removed by using the laser chemical vapor deposition method to fill the pit until the surface of the fused quartz optical element is flat and the laser annealing is carried out in situ. According to the technical scheme provided by the invention, the material increase repair is carried out on the defect area on the surface of the fused quartz optical element through Laser Chemical Vapor Deposition (LCVD) and laser annealing, the surface of the area is ensured to be smooth and flat after the defect is repaired, and the damage resistance of the fused quartz optical element is improved without causing subsequent optical field modulation. In addition, the method has the characteristics of high position precision, controllable deposition amount and high speed, and can selectively repair the defect points on the surface without damaging other areas of the element. In order to achieve the above object, the technical solutions provided in the embodiments of the present application are described in detail below, specifically with reference to fig. 1 to 6.
Referring to fig. 1, there are shown flowcharts of additive repair of surface defects of a fused silica optical element according to embodiments of the present application. As can be seen from the figure, the fused quartz additive repair process mainly comprises three aspects of defect screening and positioning, defect area material removal and new material deposition. In the embodiment of the application, the surface defect of the optical element is screened by scanning low-flux ultraviolet laser, the defect material is removed by an ultrashort pulse laser processing method, and Tetraethoxysilane (TEOS) is used as SiO 2 The method comprises the following steps of depositing a new fused quartz material by using a precursor:
1) providing a fused silica optical element, wherein the surface of the element is provided with a defect point to be repaired;
2) screening the surface of the optical element by using low-flux-density ultraviolet laser scanning to ensure that all defect points on the surface of the element are exposed to small-size damage points;
3) after the position of the defect point on the surface of the element is screened and positioned, the defect and the material of the surrounding affected area are completely eliminated with high precision by adopting an ultrashort pulse laser processing method;
4) depositing a new fused quartz material in the pit after the element defect material is removed by adopting a laser chemical vapor deposition method, and specifically comprising the following steps of:
firstly, an element with completely removed materials in a defect area is arranged in a sealed reaction cavity;
secondly, vacuumizing the sealed reaction cavity until the vacuum degree is 2000 Pa;
monitoring the deposition state, and controlling the vapor deposition rate and the transverse and longitudinal ranges of deposition;
fourthly, mixing CO with the wavelength of 10.6 mu m 2 Focusing laser on a to-be-repaired defect area on the surface of the element;
fifthly, setting the TEOS flow to be 0.01g/min, setting the flow rate of carrier gas (nitrogen with the purity of 99.9999%) to be 0.6L/min, and conveying the TEOS to the sealed reaction cavity;
sixthly, controlling the laser power and irradiating the area to be repaired on the surface of the element to ensure that the central temperature of the facula on the surface of the area is 1200 ℃, and starting to deposit new fused quartz material in the defect pit on the surface of the element;
seventhly, stopping conveying TEOS after laser irradiation is carried out for 2min, and flushing reaction byproducts and residual TEOS by using clean gas (nitrogen with the purity of 99.9999%);
controlling laser power to make the central temperature of light spot on the surface of the element be 1800 deg.C, irradiating the newly deposited fused quartz material for 20 seconds to make annealing and release SiO 2 Stress and roughness reduction after deposition;
ninthly, repeating the fourth to the eighth steps until the pits where the defect points of the element are located are completely filled and the surface is smooth;
and c, repeating c to c until all defect points of the element are repaired.
Referring to fig. 2, a schematic structural diagram of an additive repair device for a surface defect of a fused silica optical element provided in an embodiment of the present application is shown, where the additive repair device includes:
the device comprises a sealed reaction cavity 200 with a laser input window and a morphology monitoring window, wherein a fused quartz optical element to be repaired is arranged in the sealed reaction cavity 200, TEOS vapor conveyed by a TEOS supply system 100 is diluted by carrier gas and uniformly distributed on the surface of the element, and is deposited in a defect pit to be repaired on the surface of the element under the irradiation of laser output by a laser transmission control assembly 300. After the deposition process is suspended, the reaction by-products and residual TEOS vapor are flushed away by the clean nitrogen delivered by TEOS supply system 100. The tail gas in the process is pumped to the tail gas processor 600 by the vacuum pump connected with the sealed reaction cavity 200 and then discharged.
The laser delivery control assembly 300 includes a CO 2 Laser, CO 2 Laser output by the laser is focused on a to-be-repaired defect area of the fused quartz optical element by a lens after beam expansion and collimation, and CO is adjusted 2 The output power of the laser controls the laser irradiation power, and the beam expansion ratio of the beam expander is adjusted to control the diameter of the focal spot. Subjecting the surface of a fused silica component to CO 2 The infrared radiation emitted from the laser irradiation region is received by the temperature on-line monitoring assembly 400 after penetrating through the laser input window of the sealed reaction cavity 200, in this embodiment, the thermal infrared imager is adopted to measure that the surface of the element is subjected to CO 2 The temperature of the laser irradiation region.
The output light of the online morphology monitoring assembly 500 is transmitted to the area to be repaired on the surface of the fused quartz optical element after passing through the morphology monitoring window on the sealed reaction cavity 200, and is received by the online morphology monitoring assembly 500 after being reflected again through the morphology monitoring window.
Referring to FIG. 4, the same annealing conditions are used to anneal different thicknesses of deposited fused silica material, wherein a) and b) are compared before and after annealing of fused silica having a thickness of 0.5 μm, and c) and d) are compared before and after annealing of fused silica having a thickness of 2.5 μm. It can be seen that the stress of the fused silica material is relieved at both deposition thicknesses, but the fused silica material deposited at a thickness of 0.5 μm has a lower retrogradation roughness. Therefore, the deposition and annealing of the fused quartz material should be carried out a small number of times during the additive repair of the fused quartz material, so that the surface of the area is smooth after the defect is repaired. Referring to FIG. 3, after laser pyrolysis TEOS deposits new fused silica material in the defect area on the surface of the fused silica optical element, the defect pits are completely filled. And then laser annealing is carried out, so that the stress caused by the growth of a new material can be effectively released, the roughness is reduced, and the surface is smooth and flat, as shown in the right diagram of fig. 5.
For an ultraviolet laser with a pulse width of a few nanoseconds, the initial damage threshold of a fused silica surface defect area is generally lower than 8J/cm 2 . Referring to FIG. 6, the damage test of the fused quartz component after the additive repair is performed by using the damage test method of R-on-1, and the result shows that the initial damage threshold of the repaired defect region is equivalent to the initial damage threshold of the defect-free region on the fused quartz optical component.
According to the technical scheme provided by the embodiment of the application, firstly, the positioning defects are screened and the materials in the defect area are removed, then, the material addition repair is carried out on the defect area on the surface of the fused quartz optical element through Laser Chemical Vapor Deposition (LCVD) and laser annealing, the surface of the defect area is ensured to be smooth and flat after the defect repair, the initial damage threshold of the repaired defect area is obviously improved to be equivalent to the level of the defect-free area on the fused quartz optical element, and the problem that the subsequent elements are subjected to chain damage due to the subsequent optical field modulation is avoided. In addition, the method has the characteristics of high position precision, controllable deposition amount and high speed, and can selectively repair the defect points on the surface without damaging other areas of the element.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims (13)

1. An additive repairing method for surface defects of a fused quartz optical element is characterized by comprising the following specific steps:
1) screening and positioning the position of a defect point on the surface of the fused quartz optical element, and removing the defect and materials of the affected area around the defect;
2) depositing a new fused quartz material in the pit after the element defect material is removed by adopting a laser chemical vapor deposition method, and specifically comprising the following steps of:
firstly, an element with completely removed materials in a defect area is arranged in a sealed reaction cavity;
vacuumizing the sealed reaction cavity to a set vacuum degree;
focusing laser on a to-be-repaired area where a defect point is located on the surface of the element;
monitoring the deposition state, and controlling the vapor deposition rate and the transverse and longitudinal ranges of deposition;
fifthly, SiO is set 2 Flow rate of precursor and carrier gas, and delivery of SiO 2 Putting the precursor into a sealed reaction cavity;
sixthly, setting laser power and focal spot diameter and irradiating the area to be repaired on the surface of the element to raise the temperature of the area to the set temperature required by laser chemical vapor deposition, and depositing a specific amount of SiO 2 In the pit left after the surface defect of the element is removed;
seventhly, stopping conveying the SiO after the laser irradiation reaches the set duration 2 Precursor, and flushing away reaction by-product and residual SiO with clean gas 2 A precursor;
setting laser power and focal spot diameter to make the surface of the fused quartz optical element to be repaired raise to the set temperature required for laser annealing, and irradiating
Figure DEST_PATH_IMAGE002
SiO deposited in 2 Until the set time is reached, SiO is carried out 2 Annealing to release SiO 2 Stress after deposition and reduced roughness;
ninthly
Figure DEST_PATH_IMAGE004
To (a)
Figure DEST_PATH_IMAGE006
Until the pit where the defect point is completely filled and the surface is flat and smooth;
repetition of the wave
Figure DEST_PATH_IMAGE008
To ninthly
Figure DEST_PATH_IMAGE010
Until all the defect points of the element are repaired.
2. The method of claim 1, wherein the SiO is deposited on the surface of the fused silica optical component by an additive process 2 The precursor is tetraethoxysilane or silane.
3. The method for additive repair of surface defects of a fused silica optical element according to claim 1, wherein the material for removing the defects and the affected area around the defects is ultrashort pulse laser.
4. The method of claim 1, wherein the carrier gas is nitrogen, argon or helium with a purity of 99.9999%.
5. The method of claim 1, wherein the cleaning gas is nitrogen, argon, or helium with a purity of 99.9999%.
6. The method for repairing surface defects of a fused quartz optical element by additive manufacturing according to claim 1, wherein the vacuum degree of the sealed reaction chamber is 10-10% 5 Pa。
7. The method for additive repair of surface defects in fused silica optical elements according to claim 1, wherein the laser chemical vapor deposition temperature and the laser annealing temperature are both lower than the evaporation temperature of the fused silica material and range from 500 ℃ to 3000 ℃.
8. The additive repair method according to claim 7, wherein the change of the laser chemical vapor deposition temperature and the laser annealing temperature is changed by changing the laser irradiation power and the focal spot diameter of the surface of the region to be repaired, that is, the temperature change Δ T of the central point of the laser irradiation region at the steady state is approximately equal to
Figure DEST_PATH_IMAGE014
，
WhereindThe focal spot diameter for a gaussian shaped focal spot,Pis the power of the laser irradiation,k e in order to be of equivalent thermal conductivity,Ris the reflectivity of the surface of the fused quartz optical element to the irradiated laser.
9. The additive repairing method according to claim 8, wherein the laser wavelength is 10.6 μm, 10.2 μm or 9.3 μm, the absorption length of the fused quartz material at the laser wavelength is short, and the laser heat source is approximately a surface heat source.
10. An apparatus for performing a method of additive repair of a surface defect of a fused silica optical component according to any one of claims 1 to 9, the apparatus comprising:
SiO 2 precursor supply system for supplying and delivering deposited SiO 2 The required precursor is put into a sealed reaction chamber, and reaction by-products and residual SiO are washed away 2 Precursor body placeThe required clean gas;
sealing the reaction chamber to provide SiO 2 The precursor reacts under laser heating to generate SiO 2 The desired reaction site;
the laser transmission control assembly is used for transmitting laser and focusing the laser on a to-be-repaired defect area of the fused quartz optical element, and controlling the diameter of a focal spot and the laser irradiation power;
the temperature on-line monitoring assembly is used for monitoring the surface temperature of the area to be repaired;
the appearance on-line monitoring assembly is used for monitoring the surface profile of the area to be repaired and judging whether the defects to be repaired are completely filled and the surface is smooth;
and the tail gas processor is used for processing the tail gas in the laser chemical vapor deposition process.
11. The apparatus according to claim 10, wherein a laser input window for inputting the output light of the laser transmission control module and a profile monitoring window for passing the output light and the received light of the profile on-line monitoring module are disposed on the side wall of the sealed reaction chamber.
12. The apparatus of claim 10, wherein the sealed chamber is provided with a connecting SiO 2 Precursor supply system, seal chamber, pipeline port of vacuum pump.
13. The apparatus of claim 12, wherein the arrangement of the pipe ports of the sealed chamber is matched with the shape structure of the sealed chamber, so that SiO is generated 2 The precursor can be distributed on the surface of the fused quartz optical element at the area to be repaired.
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