CN112756336A - Automatic monitoring plasma cleaning system - Google Patents
Automatic monitoring plasma cleaning system Download PDFInfo
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- CN112756336A CN112756336A CN202011596280.9A CN202011596280A CN112756336A CN 112756336 A CN112756336 A CN 112756336A CN 202011596280 A CN202011596280 A CN 202011596280A CN 112756336 A CN112756336 A CN 112756336A
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- plasma cleaning
- sensitive resistor
- humidity
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01V—GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
- G01V3/00—Electric or magnetic prospecting or detecting; Measuring magnetic field characteristics of the earth, e.g. declination, deviation
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Abstract
The invention relates to an automatic monitoring plasma cleaning system, comprising: the device comprises a plasma cleaning device, a material box, a humidity sensitive resistor, an output detection device, an impedance conversion device and an impedance conversion device; the plasma cleaning device is used for performing decontamination treatment on the surface of the material; the material box is used for placing an LED bracket to be cleaned; the humidity sensitive resistor is arranged on the material box; the output detection device is used for monitoring the resistance value change of the humidity-sensitive resistor and is electrically connected with the humidity-sensitive resistor; the impedance conversion device is electrically connected between the humidity sensitive resistor and the output detection device for impedance conversion; the interlocking device is used for supplying power or cutting off power to subsequent processing equipment according to the judgment of the resistance value of the output detection device on the humidity sensitive resistor, and is electrically connected between the output detection device and the subsequent processing equipment; the cleaning system can monitor whether plasma cleaning is carried out on the LED support or not, and can effectively control the time from the cleaned LED support to subsequent processing equipment for processing on the next step.
Description
Technical Field
The invention relates to the technical field of plasma cleaning, in particular to an automatic monitoring plasma cleaning system.
Background
Plasma cleaning is a key process in the LED lamp bead packaging process and is vital to product quality; the actual production process of the process is manual operation, the condition of leaking cleaning can often occur, serious quality hidden danger is caused, and because the plasma cleaning utilizes plasma to bombard the surface of the support material, some pollutants are removed, obvious change can not be generated in appearance, whether the cleaning is carried out or not can not be judged in appearance, and the difficulty of process monitoring is increased.
Disclosure of Invention
The invention aims to provide an automatic monitoring plasma cleaning system which can monitor whether plasma cleaning is carried out on an LED bracket effectively or not and can also effectively control the time from the cleaned LED bracket to the next processing of subsequent processing equipment.
In order to achieve the purpose, the technical scheme provided by the invention is as follows: an automatically monitored plasma cleaning system, comprising: the device comprises a plasma cleaning device, a material box, a humidity sensitive resistor, an output detection device, an impedance conversion device and an impedance conversion device;
the plasma cleaning device is used for performing decontamination treatment on the surface of a material;
the material box is used for placing an LED bracket to be cleaned;
the humidity sensitive resistor is arranged on the material box;
the output detection device is used for monitoring the resistance value change of the humidity sensitive resistor, and the output detection device (400) is arranged on subsequent processing equipment and is electrically connected with the subsequent processing equipment;
the impedance conversion device is electrically connected between the humidity sensitive resistor and the output detection device for impedance conversion;
the interlocking device is used for supplying power or cutting off power to subsequent processing equipment according to the judgment of the resistance value of the humidity-sensitive resistor by the output detection device, and is electrically connected between the output detection device and the subsequent processing equipment.
Further, the plasma cleaning apparatus includes: the device comprises a cleaning chamber, a vacuum pump, a gas storage tank and a radio frequency power supply;
the cleaning chamber comprises a positive electrode discharge part and a negative electrode discharge part;
the vacuum pump is connected with the cleaning chamber;
the gas storage tank is used for storing process gas and is connected with the cleaning chamber;
the radio frequency power supply comprises an anode connector and a cathode connector, wherein the anode connector is electrically connected with the anode discharge part, and the cathode connector is electrically connected with the cathode discharge part.
Furthermore, a vacuum degree sensor is arranged in the cleaning chamber, a vacuum degree display screen is arranged on the outer wall of the cleaning chamber, and the vacuum degree sensor is electrically connected with the vacuum degree display screen.
Further, the cleaning chamber comprises a plurality of positive electrode discharge portions and a plurality of negative electrode discharge portions, the positive electrode discharge portions and the negative electrode discharge portions are arranged in a crossed mode, and a containing cavity for containing the material box is arranged between each positive electrode discharge portion and each negative electrode discharge portion adjacent to the positive electrode discharge portion.
Furthermore, a protective cover used for covering the humidity sensitive resistor is arranged on the material box.
Further, the top of the protective cover is provided with an opening.
Furthermore, a plurality of through holes are formed in the protective cover.
Furthermore, the automatic monitoring plasma cleaning system also comprises an alarm device, and the alarm device is electrically connected with the output detection device.
The invention has the beneficial effects that:
1. the humidity-sensitive resistor is mounted on the material box, the larger the humidity is, the smaller the resistor is, and on the contrary, the smaller the humidity is, the larger the resistor is, when the material box is placed into the plasma cleaning device for cleaning operation, the output detection device detects that the resistance value of the humidity-sensitive resistor is larger and larger, the LED support in the material box is effectively cleaned, the output detection device detects that the resistance value of the humidity-sensitive resistor is not obviously changed or reduced, the LED support in the material box is not effectively cleaned, and therefore the monitoring is convenient and the operation is simple.
2. After the LED support in the material box is effectively cleaned, the material box is taken out, because the external humidity is high, the resistance value of the external humidity-sensitive resistor can be gradually reduced, the cleaned LED support is stored in the outside for more than two hours and is to be cleaned again, the minimum threshold value of the humidity-sensitive resistor is set in the output detection device in advance, if the condition that the material box is placed in the outside for more than two hours appears, the interlocking device carries out power-off operation on subsequent processing equipment, unqualified LED supports cannot enter the subsequent processing equipment for processing, and the unqualified LED supports need to be placed in the plasma cleaning device again for cleaning, so that the interval time of the working procedures is effectively monitored, and the timing work is realized.
Drawings
FIG. 1 is a system diagram of an embodiment of the present invention.
FIG. 2 is an assembly diagram of a plasma cleaning apparatus according to an embodiment of the present invention.
FIG. 3 is a graph of the resistance of a humidity sensitive resistor as a function of humidity in accordance with an embodiment of the present invention.
Fig. 4 is a comparative graph of experiments on the influence of three setting modes of the protection cover of the embodiment of the invention on the resistance value change of the humidity sensitive resistor in the external environment.
In the figure, a plasma cleaning device 100, a cleaning chamber 110, a positive electrode discharge part 111, a negative electrode discharge part 112, a vacuum pump 120, an air storage tank 130, a radio frequency power supply 140, a positive electrode joint 141 and a negative electrode joint 142; a magazine 200; a humidity sensitive resistor 300; an output detection device 400; an impedance conversion device 500; an interlock device 600.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, an automatic monitoring plasma cleaning system according to the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
In the description of the present invention, "a plurality" means two or more unless otherwise specified; the terms "central," "longitudinal," "lateral," "upper," "lower," "left," "right," "inner," "outer," "front," "rear," "head," "tail," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in the indicated orientations and positional relationships based on the orientation shown in the drawings for ease of describing the invention and to simplify the description, but do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be construed as limiting the invention.
In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application will be understood by those of ordinary skill in the art from the specific context.
Referring to fig. 1, an automatic monitoring plasma cleaning system in a specific embodiment of the present invention mainly includes a plasma cleaning apparatus 100 for performing a decontamination process on a surface of a material, a magazine 200 for placing an LED holder to be cleaned, a humidity sensor 300, an output detection apparatus 400 for monitoring a change in resistance of the humidity sensor 300, an impedance conversion apparatus 500, and an interlocking apparatus 600 for performing a power supply or power off operation on a subsequent processing device according to a determination of the resistance of the humidity sensor 300 by the output detection apparatus 400.
Specifically, the wet sensitive resistor 300 is arranged on the material box 200, the wet sensitive resistor 300 is electrically connected with the output detection device 400, preferably, a contact probe is arranged on the wet sensitive resistor 300, the output detection device 400 is arranged on subsequent processing equipment and is electrically connected with the subsequent processing equipment, the output detection device 400 is contacted with the contact probe to form an electric loop to achieve a detection effect, the wet sensitive resistor 300 can be detected only by applying alternating voltage, the impedance conversion device 400 is required to be added, the impedance conversion device 400 is electrically connected between the wet sensitive resistor 300 and the output detection device 400 to perform impedance conversion, and the material box 200 is placed in a common purification environment (22 degrees +/-3 degrees and 40% -60% of humidity) before cleaning; when the plasma cleaning device 100 is used for cleaning, the chamber is pumped into low vacuum (mTorr magnitude) and water is pumped out, so that the humidity after cleaning becomes very low (within 10%), the humidity sensitive resistor 300 is arranged on the material box 200, and the change of the resistance value is detected through the output detection device 400, so that the judgment on whether the cleaning is normal or not can be realized.
It should be noted that the preferred type of the humidity-sensitive resistor 300 of the present invention is HR202 humidity-sensitive resistor, which is a humidity-sensitive element made of organic polymer material, and has the characteristics of wide humidity-sensitive range, fast response, strong anti-fouling capability, no need of heating and cleaning, and stable and reliable long-term use, etc., and please refer to fig. 3 for a function relationship between HR202 humidity-sensitive resistor and humidity.
After plasma cleaning, the cleaning effect of a support placed in a cleaning environment is deteriorated along with the time lengthening (two hours are used as a critical point), so that the processing time from cleaning to a post-process needs to be controlled, the humidity sensitive resistor 300 is installed on the material box 300, the resistance value of the humidity sensitive resistor is reduced along with the humidity increase, the output detection device 400 is used for carrying out logic judgment, the resistance value detected in real time is compared with the preset minimum threshold value of the humidity sensitive resistor, and if the resistance value is larger than the minimum threshold value, the subsequent equipment is allowed to continue to operate; if the resistance value is less than or equal to the minimum threshold value, an interlocking signal is output, and the next procedure production is forbidden.
In conclusion, the automatic monitoring plasma cleaning system realizes real-time automatic detection control of the plasma cleaning process, can monitor the placing time of the cleaned LED support in the outside world in real time, and prevents the LED support from being unqualified due to overtime.
Referring to fig. 2, in an embodiment of the present invention, a plasma cleaning apparatus includes: a cleaning chamber 110, a vacuum pump 120, a gas storage tank 130 and a radio frequency power supply 140; the cleaning chamber 110 is internally provided with an anode discharge part 111 and a cathode discharge part 112, the anode discharge part 111 is connected with an anode joint 141 of a radio frequency power supply 140, the cathode discharge part 112 is connected with a cathode joint 142 of the radio frequency power supply 140, a vacuum pump 120 and a gas storage tank 130 are directly communicated with the cleaning chamber 110, process gas is stored in the gas storage tank 130, a material box 200 to be cleaned is placed in the sealed cleaning chamber 110, the vacuum pump 120 firstly pumps the air in the cleaning chamber 110 to a lower vacuum state and fills the process gas with proper flow, radio frequency voltage is applied between electrodes after vacuum is stabilized, the gas is ionized to form plasma, glow is generated, the plasma bombards the surface of a material, and the cleaning effect is achieved.
It should be noted that the vacuum pump 120 pumps the air in the chamber to a vacuum degree of 190 and 210mTorr, preferably 200 mTorr; in addition, the process gas may be filled with argon gas, argon-hydrogen mixture gas, oxygen gas, or the like, and the gas storage tank may store a single gas or a mixture of these gases.
In order to facilitate real-time control of the pumping rate of the vacuum pump 120 and the ventilation rate of the air storage tank 130, a display for displaying the rate parameters may be installed on the vacuum pump 120 and the air storage tank 130, respectively, and rate sensors may be installed inside the vacuum pump 120 and the air storage tank 130.
In a preferred embodiment, a vacuum degree sensor is arranged in the cleaning chamber 110, a vacuum degree display screen is arranged on the outer wall of the cleaning chamber 110, the vacuum degree sensor is electrically connected with the vacuum degree display screen, the vacuum degree of the cleaning chamber 110 is displayed on the vacuum degree display screen in real time through the vacuum degree sensor, corresponding operations can be rapidly performed on the vacuum pump 120 and the gas storage tank 130, if the vacuum degree is low, the working state of the vacuum pump 120 and the gas storage tank 130 is kept, and if the vacuum degree reaches the standard or exceeds the standard, valves of the vacuum pump 120 and the gas storage tank 130 are closed.
In another embodiment of the present invention, the cleaning chamber 110 includes a plurality of positive discharge portions 111 and a plurality of negative discharge portions 112, the plurality of positive discharge portions 111 and the plurality of negative discharge portions 112 are arranged in an intersecting manner, i.e. from top to bottom, the positive discharge portions 111 and the negative discharge portions 112 are arranged in sequence, and an accommodating cavity 113 for accommodating the magazine 200 is arranged between each positive discharge portion 111 and each negative discharge portion 112 adjacent thereto, so that the magazine 200 is accommodated in the accommodating cavity 113, and the distance between the positive discharge portions and the negative discharge portions is shortened, so that ionization is more sufficient, and ionization effect is better; the present invention preferably has one positive electrode discharge portion 111 and two negative electrode discharge portions 112, and the positive electrode discharge portion 111 is disposed between the two negative electrode discharge portions 112, so that the present invention has low cost and high production efficiency.
In another embodiment of the invention, a protective cover for covering the humidity-sensitive resistor 300 is arranged on the material box 200, the protective cover is detachably connected with the material box 200, the protective cover is detached when plasma cleaning is performed, the protective cover is installed when the cleaning is completed, the arrangement of the protective cover can prevent the humidity-sensitive resistor 300 from rapidly reducing the resistance value in the outside, if the resistance value is rapidly reduced, the threshold value preset in advance by the output detection device 400 is very small, the smaller the threshold value is, the lower the sensitivity of the detection device is, the detection precision is reduced, and the protective cover can be arranged in a semi-open manner, namely the top opening of the protective cover is arranged; or the opening is arranged, namely a plurality of through holes are arranged on the protective cover, and the setting of the minimum threshold value can be controlled by adjusting the size of the through holes.
Referring to fig. 4, a linear graph is shown, wherein the resistance of the protective cover with openings to the humidity sensor 300 changes with time in an external environment; a linear graph represents the trend of the resistance value of the semi-open protective cover to the humidity sensitive resistor 300 changing along with time in an external environment; the linear graph represents the trend of the resistance value of the non-arranged protective cover to the humidity sensitive resistor 300 along with time change in the external environment; through comparison, the trend of a linear graph is the most gentle, and the trend of a linear graph is in a steep descending trend; the trend of the linear graph is between the linear graph and the protection cover, so that the resistance value reduction rate of the humidity-sensitive resistor 300 in the external environment is effectively slowed down through the protection cover, the detection precision of the detection device is improved, and the effectiveness of time monitoring is guaranteed.
Resistance value time-varying table
| Linear graph | |
Linear graph c | |
| Resistance value after 1h (omega) | 4 | 4.2 | 3.8 |
| Resistance value after 2h (omega) | 15 | 15 | 15 |
| Resistance value after 3h (omega) | 14.3 | 11.25 | 10 |
| Resistance value after 4h (omega) | 13.6 | 7.5 | 5 |
| Resistance value after 5h (omega) | 13.3 | 5 | 4.8 |
| Resistance value after 6h (omega) | 12.8 | 5 | 4.8 |
| Resistance after 7h (omega) | 12 | 4.9 | 4.7 |
| Resistance value after 8h (omega) | 11.4 | 4.9 | 4.7 |
| Resistance after 9h (omega) | 11 | 4.9 | 4.6 |
In another embodiment of the invention, the output detection device 400 can be electrically connected with an alarm device, when the material box 200 is put into the plasma cleaning device 100 for cleaning, if the resistance value of the wet resistor in the cleaning chamber 110 has no obvious change or becomes small, it is indicated that the LED bracket in the material box is not effectively cleaned, and the alarm device gives an alarm; when the material box 200 is cleaned and taken out and placed in the external environment, if the resistance value detected by the output detection device is smaller than the preset minimum threshold value of the output detection device 400, the alarm device gives an alarm, and the alarm device can prompt staff quickly.
Although the present invention has been described with reference to a preferred embodiment, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (8)
1. An automatic monitoring plasma cleaning system, comprising:
a plasma cleaning device (100) for performing decontamination treatment on the surface of a material;
the magazine (200) is used for placing the LED bracket to be cleaned;
a humidity-sensitive resistor (300) provided on the cartridge (200);
the output detection device (400) is used for monitoring the resistance value change of the humidity-sensitive resistor (300), and the output detection device (400) is arranged on subsequent processing equipment and is electrically connected with the subsequent processing equipment;
the impedance conversion device (500) is electrically connected between the humidity sensitive resistor (300) and the output detection device (400) for impedance conversion;
the interlocking device (600) is used for supplying power or cutting off power to subsequent processing equipment according to the judgment of the resistance value of the humidity-sensitive resistor (300) by the output detection device (400), and the interlocking device (600) is electrically connected between the output detection device (400) and the subsequent processing equipment.
2. An automatically monitored plasma cleaning system according to claim 1, wherein said plasma cleaning apparatus comprises:
a cleaning chamber (110) including a positive electrode discharge section (111) and a negative electrode discharge section (112);
a vacuum pump (120) connected to the cleaning chamber (110);
a gas tank (130) for storing a process gas, the gas tank (130) being connected to the cleaning chamber (110);
the radio frequency power supply (140) comprises a positive electrode connector (141) and a negative electrode connector (142), wherein the positive electrode connector (141) is electrically connected with the positive electrode discharge part (111), and the negative electrode connector (142) is electrically connected with the negative electrode discharge part (112).
3. The automatic monitoring plasma cleaning system according to claim 2, wherein a vacuum degree sensor is arranged in the cleaning chamber (110), a vacuum degree display screen is arranged on the outer wall of the cleaning chamber (110), and the vacuum degree sensor is electrically connected with the vacuum degree display screen.
4. An automatic monitoring plasma cleaning system according to claim 2, characterized in that the cleaning chamber (110) comprises a plurality of positive discharge portions (111) and a plurality of negative discharge portions (112), the plurality of positive discharge portions (111) and the plurality of negative discharge portions (112) are arranged in a crossing manner, and a containing cavity for placing the material box (200) is arranged between each positive discharge portion (111) and each negative discharge portion (112) adjacent to the positive discharge portion.
5. An automatic monitoring plasma cleaning system according to claim 1, characterized in that the magazine (200) is provided with a protective cover for covering the moisture sensitive resistor (300).
6. The auto-monitoring plasma cleaning system of claim 5, wherein the protective shield is open-topped.
7. The auto-monitoring plasma cleaning system of claim 5, wherein the protective shield has a plurality of through holes.
8. An automated monitored plasma cleaning system as claimed in claim 1 further comprising an alarm device electrically connected to said output detection device (400).
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Cited By (1)
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| CN114360997A (en) * | 2021-12-09 | 2022-04-15 | 北京北方华创微电子装备有限公司 | Multi-chamber cleaning method and semiconductor processing equipment |
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