CN211488896U - Novel surface cleaning and drying equipment for photoetching film processing - Google Patents

Novel surface cleaning and drying equipment for photoetching film processing Download PDF

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Publication number
CN211488896U
CN211488896U CN201921752793.7U CN201921752793U CN211488896U CN 211488896 U CN211488896 U CN 211488896U CN 201921752793 U CN201921752793 U CN 201921752793U CN 211488896 U CN211488896 U CN 211488896U
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CN
China
Prior art keywords
supply system
reaction chamber
door
connecting pipe
surface cleaning
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Expired - Fee Related
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CN201921752793.7U
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Chinese (zh)
Inventor
高凡
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Kunshan Bailihe Electronic Materials Co ltd
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Kunshan Bailihe Electronic Materials Co ltd
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Priority to CN201921752793.7U priority Critical patent/CN211488896U/en
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Abstract

The utility model discloses a novel surface cleaning and drying device for photoetching film processing, which comprises a vacuum air supply system and a foot pad, the left side and the right side of the lower end of the vacuum air supply system are respectively provided with a foot pad, the vacuum air supply system is fixedly connected with the foot pads through bolts, the upper end of the vacuum gas supply system is provided with a reaction chamber, the traditional single-layer box door is changed into the existing double-layer box door structure in the utility model, the double-layer box door structure can effectively block the action of radioactive sources emitted during working, the dehumidification mechanism is arranged at the inner sides of the first and second box doors, therefore, the dehumidifying mechanism can dehumidify the environment in the reaction chamber during the work of cleaning and drying the workpiece, thereby avoiding the problem of damage to the workpiece caused by the fact that moisture cannot be discharged in time.

Description

Novel surface cleaning and drying equipment for photoetching film processing
Technical Field
The utility model belongs to the technical field of the photoetching membrane technique is relevant, concretely relates to novel surface cleaning drying equipment is used in photoetching membrane processing.
Background
A plasma cleaning machine, also called a plasma cleaner, or a plasma surface treatment instrument, is a brand new high-tech technology, and achieves an effect that cannot be achieved by a conventional cleaning method by using plasma. Plasma is a state of matter and is not common solid, liquid, and gas states. Sufficient energy is applied to the gas to ionize it into a plasma state. The active components of the plasma include: ions, electrons, atoms, reactive groups, excited-state nuclide photons, and the like. The plasma cleaning machine is used for treating the surface of a sample by utilizing the properties of active components, so as to achieve the purposes of cleaning, coating and the like.
The prior art of surface cleaning and drying equipment for processing a photoetching film has the following problems: present photoetching membrane processing is with surface cleaning drying equipment is when using because the inside work that carries out the radiation source of reaction chamber, need make giving off of effectual separation radiation source like this, but can be owing to appear becoming flexible and lead to the leakproofness can not reach the requirement under long-time trial, can lead to the problem that the during operation radiation source can give off like this, and generally all adopt when drying to dehumidify through adopting dehumidification mechanism in one side of this equipment, can not better work to the dehumidification of this equipment like this and lead to the not thorough problem of dehumidification.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a novel surface cleaning drying equipment is used in photoetching membrane processing to the current surface cleaning drying equipment is used in photoetching membrane processing who proposes in solving above-mentioned background art can appear the radiation source under long-time use and give off and lead to endangering the user healthy and the dehumidification does not thoroughly lead to the problem that the work piece table terminal appears the damage.
In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a novel photoetching membrane processing is with surface cleaning drying equipment, includes vacuum gas supply system and pad foot, the left and right sides of vacuum gas supply system's lower extreme respectively is provided with a pad foot, vacuum gas supply system passes through bolt fixed connection with the pad foot, vacuum gas supply system's upper end is provided with reaction chamber, reaction chamber's right-hand member is provided with the electric cabinet, electric cabinet and switch electric connection, the table side of electric cabinet front end is provided with the display screen, the lower extreme of display screen is provided with controls the button, the table side of the upper end of electric cabinet is provided with the alarm, alarm and switch electric connection, the table side of reaction chamber front end is provided with the chamber door, the axle center department of the inside of chamber door is provided with the observation window, the observation window passes through bolt fixed connection with the chamber door.
Preferably, the vacuum air supply system comprises an exhaust pipe, a vacuum pump, a first box and a power mechanism, the exhaust pipe is arranged on the left side of the inside of the first box, the power mechanism is arranged at the lower end of the exhaust pipe, the vacuum pump is arranged at the upper end of the power mechanism, the vacuum pump is electrically connected with a power switch, the power mechanism is electrically connected with the power switch, and the vacuum air supply system is fixedly sleeved with the reaction chamber through the first box.
Preferably, the reaction chamber comprises a shielding plate, a plasma generator, an object bearing plate, a first connecting pipe, a second box and a second connecting pipe, the second connecting pipe is arranged on the left side of the lower end of the second box, the first connecting pipe is arranged on the right side of the lower end of the second box, the shielding plate is arranged at each of the left end and the right end of the inside of the second box, the plasma generator is electrically connected with a power switch, the plasma generator is arranged at each of the upper end and the lower end of the inside of the second box, the object bearing plate is arranged on the inner side of the shielding plate, and the reaction chamber is fixedly sleeved with the vacuum air supply system through the second box.
Preferably, the box door comprises a first box door, a side plate, a pin shaft, a second box door and a dehumidifying mechanism, the side plate is arranged on the left side of the upper end of the first box door, the pin shaft is arranged at the front end of the surface side of the upper end of the side plate, the second box door is arranged on the right side of the upper end of the side plate, the dehumidifying mechanism is arranged on the surface side of the lower end of the second box door, the dehumidifying mechanism is electrically connected with the power switch, and the box door is fixedly connected with the reaction chamber through the pin shaft and a bolt.
Preferably, the first connecting pipe and the second connecting pipe are both of a cylindrical structure with a hollow interior, the first connecting pipe and the second connecting pipe are respectively arranged on the left side and the right side of the lower end of the second box body, and the first connecting pipe and the second connecting pipe have different functions.
Preferably, the upper end and the lower end of the front end surface side of the box door are respectively provided with an observation window, the two observation windows are respectively fixedly connected to the front end surface side of the box door through screws, and the two observation windows can effectively observe the processing process of the interior of the reaction chamber.
Preferably, the control keys are electrically connected with the power switch, and the number of the control keys is four, and the four control keys are a start key, a stop key, a timing key and a system key from left to right in sequence.
Preferably, the alarm is the cylinder structure, alarm and switch electric connection, the inside of alarm is provided with three display lamp altogether, the inside display lamp of alarm is red light, green light and yellow light from top to bottom in proper order.
Compared with the prior art, the utility model provides a novel photoetching membrane processing is with surface cleaning drying equipment possesses following beneficial effect:
(1) the utility model changes the traditional single-layer box door into the existing double-layer box door structure, and the double-layer box door structure can effectively block the effect of the radioactive source emitted during working, thereby solving the problem that the radiation source is emitted to harm the health of a user when the existing surface cleaning and drying equipment for processing the photoetching film is used for a long time;
(2) the utility model discloses in be provided with dehumidification mechanism in the inboard of first cabinet door and second cabinet door, can carry out the effect of dehumidification through this dehumidification mechanism to the environment of reaction cavity inside carrying out the washing of work piece and the work of drying like this to avoided because the unable timely discharge of moisture leads to causing the problem of the phenomenon of damage to the work piece.
Drawings
FIG. 1 is a schematic structural view of a surface cleaning and drying apparatus for processing a photolithographic film of the present invention;
FIG. 2 is a schematic view of the vacuum gas supply system of the present invention;
FIG. 3 is a schematic structural view of a reaction chamber according to the present invention;
FIG. 4 is a schematic view of the structure of the door of the present invention;
in the figure: 1. a foot pad; 2. a vacuum gas supply system; 21. an air exhaust pipe; 22. a vacuum pump; 23. A first case; 24. a power mechanism; 3. an electric cabinet; 4. operating a key; 5. a display screen; 6. an alarm; 7. a reaction chamber; 71. a shielding plate; 72. a plasma generator; 73. an object bearing plate; 74. a first connecting pipe; 75. a second case; 76. a second connecting pipe; 8. an observation window; 9. a box door; 91. a first cabinet door; 92. a side plate; 93. a pin shaft; 94. a second cabinet door; 95. a dehumidification mechanism.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-4, the present invention provides a technical solution: a novel surface cleaning and drying device for photoetching film processing comprises a vacuum air supply system 2 and a pad 1, wherein the vacuum air supply system 2 comprises an exhaust pipe 21, a vacuum pump 22, a first box 23 and a power mechanism 24, the exhaust pipe 21 is arranged on the left side in the first box 23, the power mechanism 24 is arranged at the lower end of the exhaust pipe 21, the vacuum pump 22 can work through the arrangement of the power mechanism 24, the vacuum pump 22 is arranged at the upper end of the power mechanism 24, the vacuum pump 22 is electrically connected with a power switch, the power mechanism 24 is electrically connected with the power switch, the vacuum air supply system 2 is fixedly sleeved with a reaction chamber 7 through the first box 23, the pad 1 is respectively arranged on the left side and the right side of the lower end of the vacuum air supply system 2, the vacuum air supply system 2 is fixedly connected with the pad 1 through a bolt, the reaction chamber 7 is arranged at the upper end of, the reaction chamber 7 comprises a shielding plate 71, a plasma generator 72, an object bearing plate 73, a first connecting pipe 74, a second tank 75 and a second connecting pipe 76, the left side of the lower end of the second tank 75 is provided with the second connecting pipe 76, the right side of the lower end of the second tank 75 is provided with the first connecting pipe 74, the first connecting pipe 74 and the second connecting pipe 76 are both of hollow cylinder structures, the first connecting pipe 74 and the second connecting pipe 76 are respectively arranged on the left side and the right side of the lower end of the second tank 75, so that the internal substances can be extracted through the first connecting pipe 74, the first connecting pipe 74 and the second connecting pipe 76 have different functions, the left end and the right end of the inside of the second tank 75 are respectively provided with one shielding plate 71, and better shielding can be realized through the arrangement of the shielding plates 71,
a novel surface cleaning and drying device for processing a photoetching film comprises a plasma generator 72 electrically connected with a power switch, two plasma generators 72 are respectively arranged at the upper end and the lower end of the inside of a second box body 75, an object bearing plate 73 is arranged at the inner side of a left shielding plate 71 and a right shielding plate 71, a reaction chamber 7 is fixedly sleeved with a vacuum air supply system 2 through the second box body 75, an electric cabinet 3 is arranged at the right end of the reaction chamber 7, the electric cabinet 3 is electrically connected with the power switch, a display screen 5 is arranged at the front end of the electric cabinet 3, an operation button 4 is arranged at the lower end of the display screen 5, the operation buttons 4 are electrically connected with the power switch, the operation buttons 4 are totally four, through the arrangement of the operation buttons 4, better work can be realized, the operation buttons 4 are a start button, a stop button, a timing button and a system button in turn from left to right, the alarm 6 is arranged on the surface side of the upper end of the electric cabinet 3, the alarm 6 is of a cylindrical structure, the alarm 6 is electrically connected with a power switch, three display lamps are arranged inside the alarm 6, so that the alarm can better perform the alarm function, the display lamps inside the alarm 6 are a red lamp, a green lamp and a yellow lamp from top to bottom in sequence, the alarm 6 is electrically connected with the power switch, a cabinet door 9 is arranged on the surface side of the front end of the reaction chamber 7, the cabinet door 9 comprises a first cabinet door 91, a side plate 92, a pin shaft 93, a second cabinet door 94 and a dehumidifying mechanism 95, the left side of the upper end of the first cabinet door 91 is provided with the side plate 92, the front end of the surface side of the upper end of the side plate 92 is provided with the pin shaft 93, the right side of the upper end of the side plate 92 is provided with the second cabinet door 94, the surface side of the, chamber door 9 passes through bolt fixed connection through round pin axle 93 and reaction chamber 7, the axle center department of the inside of chamber door 9 is provided with observation window 8, observation window 8 passes through bolt fixed connection with chamber door 9, the upper and lower both ends of chamber door 9 front end table side respectively are provided with an observation window 8, through the setting of observation window 8, can make better observing like this, two observation windows 8 are respectively through screw fixed connection in the front end table side of chamber door 9, the process of the processing of the inside of reaction chamber 7 can effectually be observed to two observation windows 8.
The utility model discloses a theory of operation and use flow: the utility model discloses install the back well, at first whether this kind of machine of inspection can normally work, whether plug on the inspection electric wire is connected with the socket and finishes, if unusual noise appears, this kind of machine should be closed immediately, wait for professional's maintenance, when carrying out the use of this equipment, at this moment take out at first and wait to wash and the photoetching membrane product of drying, later open chamber door 9, then will wait to wash and place the photoetching membrane product of drying at the table end that holds thing board 73, then close chamber door 9, and be provided with dehumidification mechanism 95 in first cabinet door 91 and second cabinet door 94's inboard, by the fan with humid air suction built-in, through heat exchanger, the hydrone condensation in the air becomes the drop of water at this moment, handle after dry air discharge outside, so circulate and make indoor humidity keep at suitable relative humidity, can advance the environment of reaction chamber 7 inside through this dehumidification mechanism 95 like this in the work of carrying out the washing to the work piece and drying The dehumidification function is performed, thereby avoiding the problem of damage to the workpiece caused by the fact that moisture cannot be discharged in time, and then the power switch is turned on, under the action of the operating button 4, the plasma generator 72 inside the reaction chamber 7 is thus operated, at the same time, the air inside the reaction chamber 7 can be extracted by the vacuum pump 22 under the action of the vacuum air supply system 2, thereby better working can be performed, the model of the electric cabinet 3 is YH8018K, and the plasma generator 72 generates high-voltage high-frequency energy to generate low-temperature plasma in glow discharge activated and controlled in a nozzle steel pipe, the model of the plasma generator 72 is TCB-62, plasma is sprayed to the surface of a workpiece by means of compressed air, when the plasma meets the surface of the object to be treated, object changes and chemical reactions occur. The surface is cleaned, and simultaneously, the cleaning work is finished, the drying function is finished in the process of removing hydrocarbon dirt such as grease, auxiliary additives and the like, or generating etching rough, or forming compact cross-linked layers, or introducing oxygen-containing polar groups such as hydroxyl and carboxyl, wherein the genes have the function of promoting the adhesion of various coating materials, the adhesion and paint application are optimized, under the same effect, the surface can be treated by plasma to obtain a very thin high-tension coating surface, the adhesion, coating and printing are facilitated, strong action components such as other machines and chemical treatment are not needed to increase the adhesion, and then the box door 9 is opened, and the product is taken out.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (8)

1. The utility model provides a novel photoetching membrane processing is with surface cleaning drying equipment, includes vacuum gas supply system (2) and pad foot (1), its characterized in that: the left side and the right side of the lower end of the vacuum air supply system (2) are respectively provided with a foot pad (1), the vacuum air supply system (2) is fixedly connected with the foot pad (1) through a bolt, the upper end of the vacuum air supply system (2) is provided with a reaction chamber (7), the right end of the reaction chamber (7) is provided with an electric cabinet (3), the electric cabinet (3) is electrically connected with a power switch, a display screen (5) is arranged on the surface side of the front end of the electric cabinet (3), a control key (4) is arranged at the lower end of the display screen (5), an alarm (6) is arranged on the surface side of the upper end of the electric cabinet (3), the alarm (6) is electrically connected with a power switch, the device is characterized in that a box door (9) is arranged on the surface side of the front end of the reaction chamber (7), an observation window (8) is arranged at the axis of the interior of the box door (9), and the observation window (8) is fixedly connected with the box door (9) through bolts.
2. The novel surface cleaning and drying device for processing the photolithographic film as claimed in claim 1, wherein: the vacuum gas supply system (2) is composed of an exhaust pipe (21), a vacuum pump (22), a first box body (23) and a power mechanism (24), the exhaust pipe (21) is arranged on the left side of the inside of the first box body (23), the power mechanism (24) is arranged at the lower end of the exhaust pipe (21), the vacuum pump (22) is arranged at the upper end of the power mechanism (24), the vacuum pump (22) is electrically connected with a power switch, the power mechanism (24) is electrically connected with the power switch, and the vacuum gas supply system (2) is fixedly sleeved with the reaction chamber (7) through the first box body (23).
3. The novel surface cleaning and drying device for processing the photolithographic film as claimed in claim 1, wherein: the reaction chamber (7) comprises a shielding plate (71), a plasma generator (72), an object bearing plate (73), a first connecting pipe (74), a second box body (75) and a second connecting pipe (76), a second connecting pipe (76) is arranged on the left side of the lower end of the second box body (75), a first connecting pipe (74) is arranged at the right side of the lower end of the second box body (75), the left end and the right end of the inside of the second box body (75) are respectively provided with a shielding plate (71), the plasma generator (72) is electrically connected with a power switch, the upper end and the lower end of the interior of the second box body (75) are respectively provided with one plasma generator (72), the inner sides of the left shielding plate and the right shielding plate (71) are provided with an object bearing plate (73), the reaction chamber (7) is fixedly sleeved with the vacuum air supply system (2) through a second box body (75).
4. The novel surface cleaning and drying device for processing the photolithographic film as claimed in claim 1, wherein: the refrigerator door is characterized in that the refrigerator door (9) comprises a first cabinet door (91), a side plate (92), a pin shaft (93), a second cabinet door (94) and a dehumidifying mechanism (95), the side plate (92) is arranged on the left side of the upper end of the first cabinet door (91), the pin shaft (93) is arranged at the front end of the surface side of the upper end of the side plate (92), the second cabinet door (94) is arranged on the right side of the upper end of the side plate (92), the dehumidifying mechanism (95) is arranged on the surface side of the lower end of the second cabinet door (94), the dehumidifying mechanism (95) is electrically connected with a power switch, and the refrigerator door (9) is fixedly connected with the reaction chamber (7) through the pin shaft (93) through bolts.
5. The novel surface cleaning and drying device for processing the photolithographic film as claimed in claim 3, wherein: the first connecting pipe (74) and the second connecting pipe (76) are both of a cylindrical structure with a hollow interior, and the first connecting pipe (74) and the second connecting pipe (76) are respectively arranged on the left side and the right side of the lower end of the second box body (75).
6. The novel surface cleaning and drying device for processing the photolithographic film as claimed in claim 1, wherein: the upper end and the lower end of the front end surface side of the box door (9) are respectively provided with an observation window (8), and the two observation windows (8) are fixedly connected to the front end surface side of the box door (9) through screws.
7. The novel surface cleaning and drying device for processing the photolithographic film as claimed in claim 1, wherein: the control keys (4) are electrically connected with the power switch, and the number of the control keys (4) is four.
8. The novel surface cleaning and drying device for processing the photolithographic film as claimed in claim 1, wherein: the alarm (6) is of a cylindrical structure, and three display lamps are arranged inside the alarm (6).
CN201921752793.7U 2019-10-18 2019-10-18 Novel surface cleaning and drying equipment for photoetching film processing Expired - Fee Related CN211488896U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201921752793.7U CN211488896U (en) 2019-10-18 2019-10-18 Novel surface cleaning and drying equipment for photoetching film processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201921752793.7U CN211488896U (en) 2019-10-18 2019-10-18 Novel surface cleaning and drying equipment for photoetching film processing

Publications (1)

Publication Number Publication Date
CN211488896U true CN211488896U (en) 2020-09-15

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Application Number Title Priority Date Filing Date
CN201921752793.7U Expired - Fee Related CN211488896U (en) 2019-10-18 2019-10-18 Novel surface cleaning and drying equipment for photoetching film processing

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112756336A (en) * 2020-12-29 2021-05-07 深圳群芯微电子有限责任公司 Automatic monitoring plasma cleaning system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112756336A (en) * 2020-12-29 2021-05-07 深圳群芯微电子有限责任公司 Automatic monitoring plasma cleaning system

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CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20200915

Termination date: 20211018