CN112639157A

CN112639157A - Vapor deposition mask intermediate, vapor deposition mask, and method for producing vapor deposition mask

Info

Publication number: CN112639157A
Application number: CN201980057322.0A
Authority: CN
Inventors: 西刚广; 山本龙彦; 小林昭彦
Original assignee: Toppan Printing Co Ltd
Current assignee: Toppan Inc
Priority date: 2018-09-07
Filing date: 2019-09-06
Publication date: 2021-04-09
Anticipated expiration: 2039-09-06
Also published as: CN112639157B; TWI784196B; KR102397503B1; TW202024365A; WO2020050398A1; JPWO2020050398A1; CN210711709U; KR20210049115A; JP6930658B2

Abstract

The vapor deposition mask intermediate body includes a belt-shaped portion having a shape that follows an edge of the vapor deposition mask, a frame-shaped portion that includes an inner edge having a shape that follows the edge of the belt-shaped portion and surrounds the belt-shaped portion, and a plurality of bridge portions that connect the edge of the belt-shaped portion and the inner edge of the frame-shaped portion. The band-shaped portions are cut by the respective bridge portions to form vapor deposition masks. The edge of the band-shaped portion is provided with a bent portion having a shape that follows the bottom of the notch, and each bridge portion is connected to a portion of the edge of the band-shaped portion other than the bent portion.

Description

Vapor deposition mask intermediate, vapor deposition mask, and method for producing vapor deposition mask

Technical Field

The present invention relates to a vapor deposition mask intermediate, a vapor deposition mask, and a method for manufacturing a vapor deposition mask.

Background

The vapor deposition mask has a rectangular plate shape having a front surface and a back surface. The vapor deposition mask has a plurality of through holes penetrating from the front surface to the back surface. Each through hole has a1 st opening opened on the front surface and a 2 nd opening opened on the rear surface. Each through hole is a passage for the vapor deposition material. When vapor deposition is performed on an object using a vapor deposition mask, a vapor deposition material enters the through-hole from the 1 st opening, thereby forming a pattern corresponding to the shape and position of the 2 nd opening on the object. In order to prevent the wall surfaces defining the through holes from interfering with the passage of the vapor deposition material, vapor deposition masks having a thickness of 50 μm or less have been proposed (see, for example, patent document 1).

Documents of the prior art

Patent document

Patent document 1: japanese patent No. 6319505

Disclosure of Invention

Problems to be solved by the invention

However, when the vapor deposition mask is used, the vapor deposition mask is fixed to the support frame. At this time, the vapor deposition mask is fixed to the frame in a state where a tension is applied along the longitudinal direction of the vapor deposition mask. Since the vapor deposition mask is very thin, when the vapor deposition mask is fixed to the frame, the vapor deposition mask may be deformed such as wrinkled or twisted by the application of tension. Therefore, when the vapor deposition mask is used, it is required to suppress deformation of the vapor deposition mask.

The invention aims to provide a vapor deposition mask intermediate, a vapor deposition mask and a method for manufacturing the vapor deposition mask, wherein deformation of the vapor deposition mask during use of the vapor deposition mask can be inhibited.

Means for solving the problems

A vapor deposition mask intermediate body for solving the above-described problems includes a metal sheet for manufacturing a vapor deposition mask, wherein the vapor deposition mask has a strip shape surrounded by a pair of 1 st edge portions and a pair of 2 nd edge portions, each 2 nd edge portion is shorter than the 1 st edge portion and includes a notch having a U-shaped portion depressed in a longitudinal direction which is a direction in which the 1 st edge portion extends, a bottom portion of the U-shaped portion is curved, and the vapor deposition mask intermediate body includes: a belt-shaped portion having a shape that follows the edge of the vapor deposition mask; a frame-shaped portion having an inner edge having a shape following an edge of the band-shaped portion and surrounding the band-shaped portion; and a plurality of bridge portions that connect the edges of the band-shaped portions to the inner edges of the frame-shaped portions, wherein the band-shaped portions form the vapor deposition mask by cutting the bridge portions, wherein the edges of the band-shaped portions are provided with bent portions having shapes that follow the bottom portions of the notches, and the bridge portions are connected to portions of the edges of the band-shaped portions other than the bent portions.

The vapor deposition mask for solving the above problems is a belt-shaped portion of a vapor deposition mask intermediate body including a metal sheet, wherein the intermediate vapor deposition mask comprises a belt-like portion surrounded by a pair of 1 st edge portions and a pair of 2 nd edge portions, a frame-like portion surrounding the belt-like portion, and a plurality of bridge portions connected to the belt-like portion and the frame-like portion, the belt-like portions are detached from the intermediate vapor deposition mask body by cutting the bridge portions, and the 2 nd edge portions are shorter than the 1 st edge portion, and a notch having a U-shaped portion depressed in a longitudinal direction which is a direction in which the 1 st edge portion extends, the bottom of the U-shaped portion being curved, a bent portion of the bottom portion as the notch is provided at an edge of the vapor deposition mask, and the bridge portion is cut, a bridging line is formed at a portion of the edge of the vapor deposition mask other than the bent portion.

A method of manufacturing a vapor deposition mask for solving the above-described problems is for manufacturing a vapor deposition mask having a band shape surrounded by a pair of 1 st edge portions and a pair of 2 nd edge portions, each 2 nd edge portion being shorter than the 1 st edge portion and having a notch having a U-shaped portion recessed in a longitudinal direction which is a direction in which the 1 st edge portion extends, and a bottom portion of the U-shaped portion being curved. The method comprises the following steps: a step of forming a vapor deposition mask intermediate body including a metal sheet, the vapor deposition mask intermediate body including: a belt-shaped portion having a shape that follows the edge of the vapor deposition mask; a frame-shaped portion having an inner edge following the shape of the edge of the band-shaped portion and surrounding the band-shaped portion; and a plurality of bridges connecting the edges of the band-shaped portions with the inner side edges of the frame-shaped portions; and forming a vapor deposition mask from the belt-like portion by cutting each bridge portion. In the step of forming a vapor deposition mask from the belt-shaped portion, a bent portion having a shape that follows the bottom portion of the notch is provided at the edge of the belt-shaped portion, and each bridge portion is connected to a portion of the edge of the belt-shaped portion other than the bent portion.

According to the above configuration, the vapor deposition mask formed of the belt-shaped portion includes the notch including the U-shaped portion, and the bottom of the U-shaped portion is curved. Therefore, when tension is applied to the vapor deposition mask by pulling both sides of the notch of each 2 nd edge portion in a direction in which the pair of 2 nd edge portions are separated from each other, the force acting on the notch is dispersed by the shape of the notch. Thus, when the vapor deposition mask is used, the vapor deposition mask can be prevented from being deformed such as wrinkled or twisted.

Further, a bridge portion connecting the band portion and the frame portion is connected to a portion other than the bent portion in the edge of the band portion. Therefore, in the vapor deposition mask formed by cutting the cut portion, it is possible to suppress that a part of the bridge portion remains in the bent portion of the notch or a part of the bent portion is broken. Thereby, the shape of the bent portion is maintained in a shape capable of dispersing the tension applied to the vapor deposition mask. Therefore, when the vapor deposition mask is used, the vapor deposition mask can be prevented from being deformed.

In the intermediate mask body, the edges of the strip-shaped portions may include the pair of 1 st edge portions and the pair of 2 nd edge portions, and each 2 nd edge portion of the strip-shaped portions may have a connecting portion connected to the frame-shaped portion by the plurality of bridge portions.

When the vapor deposition mask intermediate is produced, the vapor deposition mask intermediate is conveyed while tension is applied to the vapor deposition mask intermediate in the longitudinal direction. According to the above configuration, since the 2 nd edge portion of the belt-shaped portion is connected to the frame-shaped portion by the bridge portion, both end portions in the longitudinal direction of the belt-shaped portion are continuously supported by the frame-shaped portion when the vapor deposition mask intermediate is conveyed in the production of the vapor deposition mask intermediate. Thus, even if the magnitude of the tension in the longitudinal direction varies between one end and the other end in the longitudinal direction, the deformation of the belt-shaped portion can be suppressed.

In the intermediate mask body, each 2 nd edge portion of the strip-shaped portion may have a notch having a shape following the notch of the vapor deposition mask, and each notch of the strip-shaped portion may be sandwiched by the connecting portions.

According to the above configuration, both sides of the notch are connected to the frame-shaped portion by the bridge portion. Therefore, compared to the case where only one of the both sides of the notch is connected to the frame-shaped portion via the bridging portion, the belt-shaped portion is continuously supported by the frame-shaped portion when the vapor deposition mask intermediate is conveyed in the longitudinal direction during the production of the vapor deposition mask intermediate. In addition, the strip-shaped portion is less likely to be displaced with respect to the frame-shaped portion than in the case where only one of the both sides of the notch is connected to the frame-shaped portion by the bridge portion. Therefore, when the vapor deposition mask intermediate is conveyed in the longitudinal direction during production of the vapor deposition mask intermediate, the belt-shaped portion is prevented from being partially bent due to contact with, for example, a conveying mechanism.

In the intermediate mask body, each 2 nd edge of the strip-shaped portion may have a notch having a shape following the notch of the vapor deposition mask, an inner edge of the frame-shaped portion may have a protruding edge having a shape following the notch of the strip-shaped portion, each notch of the strip-shaped portion may include the bent portion and a pair of linear portions extending in the longitudinal direction from the bent portion, and each linear portion may be connected to the protruding edge via the bridge portion.

The portion of the strip-shaped portion that sandwiches the notch has a smaller width in a direction orthogonal to the longitudinal direction than other portions of the strip-shaped portion. According to the above configuration, the rigidity of each linear portion and each projecting portion can be improved by connecting each linear portion to the projecting edge. This can suppress deformation of the band-shaped portion. Further, the bending of the projecting edge with respect to the belt-shaped portion can be suppressed. As a result, when the vapor deposition mask intermediate is conveyed, a portion of the belt-like portion or the projecting edge can be prevented from being caught by the conveying mechanism or the like.

In the intermediate vapor deposition mask body, the edges of the belt-like portions may include the pair of 1 st edge portions and the pair of 2 nd edge portions, and each 1 st edge portion of the belt-like portion may be connected to the frame-like portion by the plurality of bridge portions. According to the above configuration, the 1 st edge of the belt-shaped portion is continuously supported by the frame-shaped portion when the vapor deposition mask intermediate is conveyed. Therefore, the 1 st edge portions can be suppressed from being bent, and deformation of the belt-like portions can be suppressed.

In the intermediate vapor deposition mask, each 2 nd edge of the belt-shaped portion may have a notch having a shape following the notch of the vapor deposition mask and including the bent portion, each 1 st edge of the belt-shaped portion may be connected to the frame-shaped portion at a1 st connection portion, each 2 nd edge of the belt-shaped portion may be connected to the frame-shaped portion at a 2 nd connection portion via the plurality of bridge portions, and the 1 st connection portion may be located closer to the 2 nd connection portion in the longitudinal direction than the bent portion.

The corner formed by the 1 st edge and the 2 nd edge in the belt-shaped portion is more likely to float from the frame-shaped portion than the center of the 2 nd edge and the center of the 1 st edge. In addition, the portion of the strip portion that sandwiches the notch has a lower rigidity than the other portions by an amount corresponding to the presence of the notch. According to the above configuration, the 1 st connecting portion is located closer to the 2 nd connecting portion than the bent portion, and therefore, the corner of the band-shaped portion can be suppressed from floating with respect to the frame-shaped portion. Therefore, when the vapor deposition mask intermediate is conveyed in the longitudinal direction in the production of the vapor deposition mask intermediate, the corner portions can be prevented from being caught by the conveying mechanism or the like.

In the intermediate vapor deposition mask, the strip-like portion may include a mask portion having a plurality of through holes, and each 1 st edge portion of the strip-like portion may be connected to the frame-like portion by the bridge portion at a portion not overlapping with the mask portion in the longitudinal direction.

According to the above configuration, compared to the case where the bridge portions are arranged in the longitudinal direction with the mask portions, when the vapor deposition mask intermediate is conveyed in the longitudinal direction in the production of the vapor deposition mask intermediate, the force acting on the mask portions via the bridge portions is alleviated. Therefore, deformation of the through-hole of the mask portion can be suppressed.

In the vapor deposition mask intermediate, the frame-shaped portion may include a weak portion having a linear shape extending in a direction from the inner edge of the frame-shaped portion toward the outer edge of the frame-shaped portion, and the weak portion may have a mechanical strength lower than that of a portion of the frame-shaped portion other than the weak portion.

According to the above configuration, in the frame-shaped portion, the mechanical strength of the fragile portion is lower than the mechanical strength of the portion other than the fragile portion of the frame-shaped portion, and therefore the frame-shaped portion is easily cut along the fragile portion. Further, since the one end of the weak portion is located at the inner edge of the frame-like portion, the ring formed at the inner edge can be cut when the band-like portion is detached from the frame-like portion. This facilitates the cutting of the bridge portion.

Effects of the invention

According to the present invention, deformation of the vapor deposition mask during use of the vapor deposition mask can be suppressed.

Drawings

Fig. 1 is a plan view showing a structure of a vapor deposition mask intermediate.

Fig. 2 (a) is a plan view showing a1 st example of the notch provided in the belt-shaped portion, and fig. 2 (b) is a plan view showing a 2 nd example of the notch provided in the belt-shaped portion.

Fig. 3 (a), 3 (b), and 3 (c) are enlarged plan views of the bridge portion, the portion of the band portion to which the bridge portion is connected, and the portion of the frame portion to which the bridge portion is connected.

Fig. 4 (a) is a sectional view showing a1 st example of the through-hole provided in the mask portion, and fig. 4 (b) is a sectional view showing a 2 nd example of the through-hole provided in the mask portion.

Fig. 5 is a plan view showing a structure of a vapor deposition mask intermediate 1.

Fig. 6 is a plan view showing a structure of a vapor deposition mask intermediate body according to example 2.

Fig. 7 is a plan view showing a structure of a vapor deposition mask intermediate body according to example 3.

Fig. 8 is a plan view showing a structure of a vapor deposition mask intermediate body according to example 4.

Fig. 9 is a plan view showing a structure of a vapor deposition mask intermediate body according to example 5.

Fig. 10 is a plan view showing a structure of a vapor deposition mask intermediate body according to example 6.

Fig. 11 is a plan view showing a structure of a vapor deposition mask intermediate body according to example 7.

Fig. 12 is a plan view showing a structure of an intermediate vapor deposition mask according to example 8.

Fig. 13 is a plan view showing a structure of a vapor deposition mask intermediate body according to example 9.

Fig. 14 is a plan view showing a structure of a mask device provided with a vapor deposition mask.

Fig. 15 (a), 15 (b), and 15 (c) are enlarged plan views of bridge marks included in the vapor deposition mask.

Fig. 16 is a flowchart for explaining a method of manufacturing a vapor deposition mask.

Fig. 17 is a plan view showing a structure of a modification of the vapor deposition mask intermediate.

Fig. 18 is a partially enlarged plan view showing an enlarged region a in fig. 17.

Fig. 19 is a partially enlarged plan view showing an enlarged region B in fig. 17.

Fig. 20 is a partially enlarged plan view showing an enlarged region C in fig. 17.

Detailed Description

An embodiment of a vapor deposition mask intermediate, a vapor deposition mask, and a method for manufacturing a vapor deposition mask will be described with reference to fig. 1 to 16. The structure of the vapor deposition mask intermediate, the structure of the mask device, and the method for manufacturing the vapor deposition mask will be described in order below.

[ constitution of intermediate vapor deposition mask ]

The structure of the vapor deposition mask intermediate will be described with reference to fig. 1 to 13.

The vapor deposition mask intermediate 10 shown in fig. 1 is a metal sheet that is a metal plate used for manufacturing a vapor deposition mask. As shown in fig. 1, the vapor deposition mask intermediate 10 has a strip shape extending in the longitudinal direction. When the vapor deposition mask is manufactured, the vapor deposition mask intermediate 10 is conveyed in the longitudinal direction by a conveying mechanism such as a conveying roller. The vapor deposition mask has a belt shape surrounded by the pair of 1 st edge portions and the pair of 2 nd edge portions. Each 2 nd edge is shorter than the 1 st edge and has a notch. The notch has a U-shaped portion recessed in the longitudinal direction, which is the direction in which the 1 st edge portion extends, and the bottom of the U-shaped portion is curved. The longitudinal direction in which the 1 st edge portion extends is parallel to the transport direction, which is the longitudinal direction of the vapor deposition mask intermediate 10.

As shown in fig. 1, the vapor deposition mask intermediate 10 includes a belt-like portion 11, a frame-like portion 12, and a plurality of bridge portions 13. The belt-like portion 11 has a shape following the edge of the vapor deposition mask. The edge 11E of the belt-like portion 11 is constituted by a pair of 1 st edge portions 11L and a pair of 2 nd edge portions 11W. The frame portion 12 has an inner edge 12E that follows the edge 11E of the band portion 11 and surrounds the band portion 11. The bridge portion 13 connects the edge 11E of the belt portion 11 and the inner edge 12E of the frame portion 12. The band-shaped portions 11 are cut by the bridges 13 to form vapor deposition masks. Each 2 nd edge portion 11W of the belt-like portion 11 has a notch 11N. The notch 11N has a U-shaped portion that follows the notch of the vapor deposition mask, and the bottom of the U-shaped portion is curved. The edge of the notch 11N is a concave edge having a shape following the notch of the vapor deposition mask. The inner edge 12E has a protruding edge 12E1 having a shape following the notch 11N. The notch 11N includes a bent portion 11N1 that follows the bottom of the notch of the vapor deposition mask. Each bridge portion 13 is connected to a portion of the edge 11E of the band-shaped portion 11 other than the bent portion 11N 1.

According to the vapor deposition mask intermediate 10, the vapor deposition mask formed of the belt-like portion 11 has a U-shaped portion, and the bottom of the U-shaped portion has a notch which is a curved line. Therefore, when tension is applied to the vapor deposition mask by pulling both sides of the notch of each 2 nd edge portion in a direction in which the pair of 2 nd edge portions are separated from each other, the force acting on the notch is dispersed by the shape of the notch. Thus, when the vapor deposition mask is used, the vapor deposition mask can be prevented from being deformed such as wrinkled or twisted.

Further, the bridge portion 13 for connecting the band-shaped portion 11 and the frame-shaped portion 12 is connected to a portion other than the bent portion 11N1 in the edge 11E of the band-shaped portion 11. Therefore, in the vapor deposition mask formed by cutting the bridge portion 13, it is possible to suppress that a part of the bridge portion 13 remains in the bent portion of the notch or a part of the bent portion is broken. Thereby, the shape of the bent portion is maintained in a shape capable of dispersing the tension applied to the vapor deposition mask. Therefore, when the vapor deposition mask is used, the vapor deposition mask can be prevented from being deformed.

The belt portion 11 includes a plurality of mask portions 11M. Each mask portion 11M has a plurality of through holes penetrating the band portion 11. The plurality of mask portions 11M are arranged at intervals along the longitudinal direction DL. The band-shaped portion 11 shown in fig. 1 includes 3 mask portions 11M, but the number of mask portions 11M included in each band-shaped portion 11 can be arbitrarily changed to 1 or more.

The edge 11E of the band-shaped portion 11 is constituted by a bridge region R13 including a connection point to the frame-shaped portion 12 via the bridge portion 13, and a non-bridge region RN not including the connection point. In the belt-shaped portion 11 shown in fig. 1, dot hatching is performed along the bridge region R13 for the purpose of clearly distinguishing the bridge region R13 from the non-bridge region RN.

The bridge region R13 is formed by the pair of 1 st edge portions 11L, the region other than the notch 11N in each 2 nd edge portion 11W, and the region other than the bent portion 11N1 in each notch 11N. Each of the regions included in the cross-over region R13 has a shape extending along the longitudinal direction DL or a shape extending along the width direction DW. The width direction DW is a direction orthogonal to the length direction DL. The non-bridge region RN is constituted by the bent portions 11N 1. Each bent portion 11N1 is a region having no shape extending in the longitudinal direction DL or no shape extending in the width direction DW.

The plurality of bridge portions 13 can be arranged along the bridge region R13. Each bridge portion 13 connects a part of the bridge region R13 to the frame-like portion 12. In addition, in fig. 1, for convenience of listing the positions where the bridge portions 13 are arranged, the bridge portions 13 are indicated by broken lines.

Fig. 2 (a) and 2 (b) show 2 examples of the shape of the notch 11N in the 2 nd edge portion 11W. Fig. 2 (a) shows a1 st example of the notch 11N, and fig. 2 (b) shows a 2 nd example of the notch 11N.

As shown in fig. 2 (a), in example 1 of the notch 11N, the notch 11N is composed of a bent portion 11N1 and a pair of linear portions 11N2 extending in the longitudinal direction DL from the bent portion 11N 1. Each of the linear portions 11N2 extends in the longitudinal direction DL, and a pair of linear portions 11N2 are arranged at intervals in the width direction DW. The bent portion 11N1 has an arc shape recessed in a direction from the notch 11N including the bent portion 11N1 toward the other notches 11N. In example 1 of the notch 11N, the pair of linear portions 11N2 are included in the bridge region R13. In contrast, the bent portion 11N1 is included in the non-bridge region RN.

As shown in fig. 2 (b), the 2 nd example of the notch 11N has a substantially parabolic shape. The 2 nd example of the notch 11N is constituted by a pair of curved portions 11N 3. The pair of curved portions 11N3 have shapes symmetrical to each other with respect to a straight line passing through the bottom of the notch 11N and extending in the longitudinal direction DL. Each curved portion 11N3 extends in a direction intersecting the longitudinal direction DL. In example 2 of the notch 11N, the entire notch 11N is a bent portion. Therefore, the entire gap 11N is included in the non-bridge region RN.

In fig. 3 (a), 3 (b), and 3 (c), the vapor deposition mask intermediate 10 is shown in an enlarged manner with 1 bridging portion 13 and a part of the strip portion 11 and a part of the frame portion 12 connected by the bridging portion 13. Fig. 3 (a), 3 (b), and 3 (c) show the bridge portion 13 connecting a part of the region extending in the width direction DW at the edge 11E of the strip portion 11 to the frame portion 12.

As shown in fig. 3 (a), the bridge portion 13 has a shape extending from the frame-shaped portion 12 to the belt-shaped portion 11. In the present embodiment, the bridge portion 13 has a rectangular shape. The shape of the bridge portion 13 may be any shape other than a rectangular shape as long as it extends from the frame-shaped portion 12 to the band-shaped portion 11. The edge 11E of the band-shaped portion 11 has a bridging recess 11 ED. 1 jumper section 13 is connected to 1 jumper recess 11 ED. In the bridging recess 11ED, gaps are formed between the bridging portion 13 and the belt-like portion 11 on both sides of the bridging portion 13 in the width direction DW. The bridging recess 11ED is a rectangular recess. The shape of the bridging depressions 11ED is not limited to a rectangular shape, and may be, for example, an arc shape.

In the bridge portion 13, an end portion connected to the belt portion 11 is a base end portion, and an end portion connected to the frame portion 12 is a tip end portion. The proximal end portion has a fragile portion 13A having a lower mechanical strength than the distal end portion. The fragile portion 13A is, for example, a portion of the base end portion in the width direction DW that has been subjected to half-etching. The fragile portion 13A may be a plurality of portions after half-etching arranged at intervals along the proximal end portion. The bridge portion 13 may not have the fragile portion 13A.

The width of the bridging depressions 11ED in the width direction DW is, for example, 1mm to 3 mm. The width of the bridging depressions 11ED in the longitudinal direction DL is, for example, 0.1mm to 0.3 mm. The thickness of the bridge portion 13 is the metal sheet before processing, and is equal to the thickness of the metal sheet for forming the intermediate vapor deposition mask. The width of the bridge portion 13 in the width direction DW is set to be, for example, 70% to 80% with respect to the width of the bridge recess 11ED in the width direction DW.

In the example shown in fig. 3 (a), the fragile portion 13A of the bridge portion 13 is formed by 1 half-etched portion. The half-etched portion is a portion of the bridge portion 13 that has been half-etched. In this case, the width of the weak portion 13A in the width direction DW is set to be, for example, 50% to 80% with respect to the width of the bridge portion 13 in the width direction DW. The width of the weak portion 13A in the longitudinal direction DL is set to 25% to 50% with respect to the width of the bridging recess 11ED in the longitudinal direction DL, for example.

By providing the bridge portion 13 with the weak portion 13A, when the bridge portion 13 is cut by bending the bridge portion 13, the bridge portion 13 can be cut more easily than when the bridge portion 13 does not have the weak portion 13A. Further, since the bridge portion 13 is easily cut, the shape of a cut mark, which is a mark of the bridge portion 13 after cutting, is not likely to be varied. Further, by providing the bridge portion 13 with the weak portion 13A at the base end portion, a part of the bridge portion 13 is less likely to remain on the vapor deposition mask. Therefore, when a tensile force is applied to the vapor deposition mask along the longitudinal direction of the vapor deposition mask, deformation such as wrinkles or twists is less likely to occur in the vapor deposition mask with the remaining portion of the bridge portion 13 in the vapor deposition mask as a base point.

Further, by positioning the fragile portion 13A in the bridging recess 11ED, when the bridging portion 13 is cut by bending the bridging portion 13, the remaining portion of the bridging portion 13 can be suppressed from protruding outward beyond the other portion of the edge of the vapor deposition mask except the remaining portion. Further, by positioning the fragile portion 13A in the bridging recess 11ED, the fragile portion 13A is protected from the outside by a region that divides the bridging recess 11ED in the edge 11E when the vapor deposition mask intermediate 10 is transported. This can prevent the bridge portion 13 from being cut off from the belt-shaped portion 11 when the vapor deposition mask intermediate 10 is conveyed.

As shown in fig. 3 (b), the edge 11E of the band-shaped portion 11 may not have the bridging recess 11 ED. In this case, the bridge portion 13 is connected to the edge 11E of the strip portion 11 and has a shape extending in the width direction DW. The fragile portion 13B may have a plurality of through holes arranged along the width direction DW.

As shown in fig. 3 (C), the fragile portion 13C may have a plurality of through holes 13C1 and a plurality of half-etched portions 13C 2. In this case, in the fragile portion 13C, the through holes 13C1 and the half-etched portions 13C2 are alternately arranged in the width direction DW.

Even when the edge 11E of the band-shaped portion 11 has the bridging depressions 11ED, the fragile portion may have a plurality of through holes, or the through holes and the half-etched portions may be alternately arranged in the fragile portion. Even when the edge 11E of the band-shaped portion 11 does not have the bridging recess 11ED, the fragile portion may be formed of 1 half-etched portion. The fragile portion may include a plurality of half-etched portions arranged at intervals along an extending direction of the fragile portion.

Fig. 4 (a) and 4 (b) show a cross-sectional structure of the mask portion 11M along a plane perpendicular to the surface of the vapor deposition mask intermediate 10 and extending in the longitudinal direction DL. Fig. 4 (a) shows a sectional structure of a mask portion 11M according to example 1. Fig. 4 (b) shows a sectional structure of a mask portion 11M of example 2.

As shown in fig. 4 (a), the vapor deposition mask intermediate 10 includes a front surface 10F and a back surface 10R which is the surface opposite to the front surface 10F. The surface 10F faces a vapor deposition source of the vapor deposition device in a state where the vapor deposition mask is attached to the vapor deposition device. The rear surface 10R faces a vapor deposition target such as a glass substrate in a state where the vapor deposition mask is attached to the vapor deposition device. The mask portion 11M has a plurality of through holes 11H penetrating the vapor deposition mask intermediate 10. The wall surface of the through hole 11H has an inclination in a cross section with respect to the thickness direction of the vapor deposition mask intermediate 10. The wall surface of the through hole 11H is shaped like a semicircular arc spreading outward of the through hole 11H in cross section. The wall surface of the through hole 11H may have a complex curved shape having a plurality of folding points in cross section.

The thickness of the mask portion 11M is, for example, 15 μ M or less. Since the thickness of the mask portion 11M is 15 μ M or less, the depth of the through hole 11H formed in the mask portion 11M can be 15 μ M or less. In this way, if the vapor deposition mask intermediate 10 is thin, the area itself of the wall surface of the through hole 11H can be reduced, and the distance that the vapor deposition substance flies inside the through hole 11H is short because the thickness of the vapor deposition mask intermediate 10 is thin. This can reduce the amount of the vapor deposition material adhering to the wall surface of the through hole 11H. In the vapor deposition mask intermediate 10, the thickness of the portions other than the mask portion 11M is, for example, 25 μ M or less. In the vapor deposition mask intermediate 10, the thickness of the portions other than the mask portion 11M is equal to the thickness of the metal sheet before processing, that is, the metal sheet before the band-shaped portion 11 and the frame-shaped portion 12 are formed so as to bridge the connection portion 13.

The surface 10F includes a1 st opening H1 as an opening of the through hole 11H. The rear surface 10R includes a 2 nd opening H2 as an opening of the through hole 11H. The 1 st opening H1 is larger than the 2 nd opening H2 in a plan view opposed to the front surface 10F. Each through hole 11H is a passage through which the vapor deposition material sublimated from the vapor deposition source passes. The vapor deposition material sublimated from the vapor deposition source advances from the 1 st opening H1 to the 2 nd opening H2. In the through hole 11H, the 1 st opening H1 is larger than the 2 nd opening H2, and therefore the amount of the vapor deposition substance entering the through hole 11H from the 1 st opening H1 can be increased. The area of the through hole 11H in the cross section along the front surface 10F may monotonically increase from the 2 nd opening H2 to the 1 st opening H1 from the 2 nd opening H2 toward the 1 st opening H1, or may have a substantially constant portion in the middle of the section from the 2 nd opening H2 to the 1 st opening H1.

As shown in fig. 4 (b), the 1 st opening H1 is larger than the 2 nd opening H2 in a plan view facing the front surface 10F. The through hole 11H is composed of a large hole 11LH having a1 st opening H1 and a small hole 11SH having a 2 nd opening H2. The cross-sectional area of the large hole 11LH monotonically decreases from the 1 st opening H1 toward the back face 10R. The sectional area of the orifice 11SH decreases monotonously from the 2 nd opening H2 toward the surface 10F. The wall surface of the through hole 11H has a shape protruding toward the inside of the through hole 11H at a portion where the large hole 11LH and the small hole 11SH are connected, that is, at the middle in the thickness direction of the deposition mask intermediate 10 in cross section. The distance between the portion protruding from the wall surface of the through hole 11H and the rear surface 10R is the step height SH.

In example 1 of the mask portion 11M, the step height SH is zero. From the viewpoint of securing the amount of the vapor deposition substance reaching the 2 nd opening H2, the step height SH is preferably zero. In example 1 in which the band-shaped portion 11 includes the mask portion 11M, the thickness of the metal sheet before processing is so thin that the through-hole 11H can be formed by wet etching the metal sheet from one side. As described above, the thickness of the metal sheet before processing is, for example, 25 μm or less. In example 2 in which the belt portion 11 includes the mask portion 11M, the thickness of the mask portion 11M is, for example, 25 μ M or less. In this case, the thickness of the metal sheet before processing is, for example, 50 μm or less.

[ example of intermediate vapor deposition mask ]

Hereinafter, 9 examples of the vapor deposition mask intermediate 10 will be described with reference to fig. 5 to 13. In 9 examples of the vapor deposition mask intermediate 10, regions of the edge 11E of the belt-shaped portion 11, which are connected to the frame-shaped portion 12 by the bridge portions 13, are different from each other. In the vapor deposition mask intermediate 10 of each example, the strip-shaped portion 11 includes the notch 11N in example 1. However, in example 1 (see fig. 5), example 2 (see fig. 6), and examples 4 to 6 (see fig. 8 to 10) and example 9 (see fig. 13) of the vapor deposition mask intermediate 10 described below, the strip-shaped portion 11 may include the notch 11N of example 2.

[ 1 st example ]

As shown in fig. 5, each 2 nd edge portion 11W of the belt-like portion 11 is connected to the frame-like portion 12 by a plurality of bridge portions 13. When the vapor deposition mask intermediate 10 is produced, the vapor deposition mask intermediate 10 is conveyed while tension is applied to the vapor deposition mask intermediate 10 along the longitudinal direction DL. In this example, the 2 nd edge portion 11W of the band-shaped portion 11 is connected to the frame-shaped portion 12 via the bridge portion 13. Therefore, when the vapor deposition mask intermediate 10 is transported while the vapor deposition mask intermediate 10 is being manufactured, both end portions in the longitudinal direction DL of the belt-shaped portion 11 are continuously supported by the frame-shaped portion 12. Thus, even if the magnitude of the tension along the longitudinal direction DL varies between one end and the other end in the longitudinal direction DL, the deformation of the band-shaped portion 11 can be suppressed.

In particular, if the 2 nd edge portion 11W of the belt-shaped portion 11 is continuously supported by the frame-shaped portion 12, the 2 nd edge portion 11W can be prevented from being bent or curled when the vapor deposition mask intermediate 10 is conveyed, and deformation of the belt-shaped portion 11 can be prevented.

Each notch 11N of the strip portion 11 is sandwiched by connecting portions connected by the bridge portion 13 in the direction in which the 2 nd edge portion 11W extends. Thus, both sides of the notch 11N in the width direction DW are connected to the frame-shaped portion 12 by the bridge portions 13. Therefore, compared to the case where only one of both sides of the notch 11N in the width direction DW is connected to the frame-shaped portion 12 by the bridge portion 13, the belt-shaped portion 11 is continuously supported by the frame-shaped portion 12 when the vapor deposition mask intermediate 10 is conveyed. In addition, the band-shaped portion 11 is less likely to be displaced with respect to the frame-shaped portion 12, as compared with a case where only one of both sides of the notch 11N in the width direction DW is connected to the frame-shaped portion 12 by the bridge portion 13. Therefore, when the vapor deposition mask intermediate 10 is conveyed, it is possible to suppress a portion of the belt-shaped portion 11 from being bent due to the belt-shaped portion 11 coming into contact with, for example, a conveying mechanism.

In the width direction DW, the notch 11N is sandwiched by the pair of 2 nd edge elements. Each 2 nd edge element extends in the width direction DW. In each 2 nd edge portion 11W, the connecting portion is located at each 2 nd edge element, and is not located at the linear portion 11N2 of the notch 11N.

Preferably, a plurality of connecting portions are disposed on both sides of the notch 11N in the width direction DW. Compared with the case where the number of the connecting portions is 1, the effect of suppressing the bending of the 2 nd edge portion 11W is easily obtained in the entire 2 nd edge portion 11W. Preferably, a plurality of connection portions are arranged on both sides of the notch 11N in the width direction DW, and the number of connection portions is the same. Thus, compared to the case where the number of portions of the band-shaped portion 11 supported by the frame-shaped portion 12 is different on both sides of the notch 11N in the width direction DW, it is possible to suppress the occurrence of variations in the load supported by 1 connecting portion. Therefore, it is possible to suppress the occurrence of different deformations in both sides of the notch 11N in the width direction DW due to the load variation.

Preferably, the plurality of connection portions are disposed at equal intervals on both sides of the notch 11N in the width direction DW. This can suppress the 2 nd edge portion 11W from being bent at a portion where the density of the connection portion is low compared to other portions.

The plurality of bridge portions 13 connected to the 2 nd edge portion 11W of one of the pair of 2 nd edge portions 11W constitute a1 st bridge portion group, and the plurality of bridge portions 13 connected to the 2 nd edge portion 11W of the other pair constitute a 2 nd bridge portion group. Preferably, the position of each bridge 13 belonging to the 1 st bridge group is equal to the position of 1 bridge 13 belonging to the 2 nd bridge group in the width direction DW. Thus, compared to the case where the number and positions of the connecting portions in the width direction DW are different from each other in the pair of 2 nd edge portions 11W, it is possible to suppress the occurrence of variations in the load supported by 1 connecting portion. Therefore, the pair of 2 nd edge portions 11W can be prevented from being deformed differently from each other due to the variation in load.

[ 2 nd example ]

As shown in fig. 6, in example 2 of the vapor deposition mask intermediate 10, the 1 st edge portions 11L are connected to the frame-like portions 12 through the plurality of bridge portions 13 in addition to the 2 nd edge portions 11W. Therefore, when the vapor deposition mask intermediate 10 is conveyed, the first edge portions 11L are prevented from being bent, and deformation of the belt-like portions 11 can be prevented. Preferably, the plurality of bridge portions 13 connected to the 1 st edge portion 11L include bridge portions 13 disposed at equal intervals in the longitudinal direction DL. This can suppress the degree of deflection of the 1 st edge portion 11L from varying in each region between the bridge portions 13 adjacent to each other. As a result, when a constant tension is applied to the vapor deposition mask intermediate 10 along the longitudinal direction DL while the vapor deposition mask intermediate 10 is being transported, it is possible to suppress the occurrence of variations in the shape of the vapor deposition mask intermediate 10 in the longitudinal direction DL.

Preferably, the pair of 1 st edge portions 11L are connected to the frame-like portion 12 by the same number of bridging portions 13. The plurality of bridge portions 13 connected to the 1 st edge portion 11L of one of the pair of 1 st edge portions 11L constitute a1 st bridge portion group, and the plurality of bridge portions 13 connected to the 1 st edge portion 11L of the other pair constitute a 2 nd bridge portion group. Preferably, the position of each bridge 13 belonging to the 1 st bridge group is equal to the position of 1 bridge 13 belonging to the 2 nd bridge group in the longitudinal direction DL. Thus, compared to the case where the number and positions of the connecting portions in the longitudinal direction DL are different from each other in the pair of 1 st edge portions 11L, it is possible to suppress the occurrence of variations in the load supported by 1 connecting portion. Therefore, the occurrence of the deformation different from each other in the pair of first edge portions 11L due to the variation in the load can be suppressed.

Preferably, each of the 1 st bridge portion group and the 2 nd bridge portion group includes a bridge portion 13 located closer to an end portion including the 2 nd edge portion 11W of each notch 11N in the longitudinal direction DL than a bottom portion of the notch 11N is connected. That is, the 1 st edge 11L of the band-shaped portion 11 is connected to the frame-shaped portion 12 at the 1 st connection point, and the 2 nd edge 11W of the band-shaped portion 11 is connected to the frame-shaped portion at the 2 nd connection point. Preferably, the 1 st connecting portion is located closer to the 2 nd connecting portion than the bent portion 11N1 in the longitudinal direction DL. In other words, the 1 st connecting portion is preferably located outside the bent portion 11N1 in the longitudinal direction DL.

In the belt-like portion 11, the corner portion formed by the 2 nd edge portion 11W and the 1 st edge portion 11L is more likely to float from the frame-like portion 12 than the center of the 2 nd edge portion 11W and the center of the 1 st edge portion 11L. In addition, the portion of the band-shaped portion 11 that sandwiches the notch 11N has a lower rigidity than the other portions by an amount corresponding to the presence of the notch 11N. If the 1 st edge 11L is connected to the frame-shaped portion 12 at a position closer to the end than the bottom of the notch 11N, the corner formed by the 2 nd edge 11W and the 1 st edge 11L can be prevented from being bent with respect to the frame-shaped portion 12. Therefore, the corners can be prevented from being caught by the conveying mechanism or the like when the vapor deposition mask intermediate 10 is conveyed.

In other words, since the 1 st connecting portion is located closer to the 2 nd connecting portion than the bent portion 11N1, the corner of the band-shaped portion 11 can be suppressed from floating with respect to the frame-shaped portion 12. Therefore, when the vapor deposition mask intermediate 10 is conveyed in the longitudinal direction DL in the production of the vapor deposition mask intermediate 10, the corner portions can be prevented from being caught by the conveying mechanism or the like.

Each 1 st edge portion 11L is connected to the frame portion 12 in the longitudinal direction DL at a portion not overlapping the mask portion 11M by a bridge portion 13. In the longitudinal direction DL, the regions between the mutually adjacent mask portions 11M are non-vapor deposition regions. The connection portion included in the 1 st edge portion 11L is included in a region extending in the width direction DW from the non-deposition region. Therefore, compared to the case where the bridge portions 13 are aligned with the mask portions 11M in the longitudinal direction DL, the force acting on the mask portions 11M via the bridge portions 13 is relaxed when the vapor deposition mask intermediate 10 is conveyed. Therefore, deformation of the through-hole 11H of the mask portion 11M can be suppressed.

[ 3 rd example ]

As shown in fig. 7, in example 3 of the vapor deposition mask intermediate 10, each notch 11N is connected to the frame-shaped portion 12 by the bridge portion 13 in addition to the pair of 2 nd edge portions 11W and the pair of 1 st edge portions 11L. In each notch 11N, each linear portion 11N2 is connected to the projecting edge 12E1 of the frame-shaped portion 12 that enters the notch 11N by the bridge portion 13. The portion of the strip-shaped portion 11 that sandwiches the notch 11N has a smaller width in the direction orthogonal to the longitudinal direction DL than the other portions of the strip-shaped portion 11. By connecting each linear portion 11N2 to frame-shaped portion 12, the rigidity of each linear portion 11N2 and projecting edge 12E1 can be increased, and each linear portion 11N2 can be suppressed from being bent with respect to frame-shaped portion 12. This can suppress deformation of the band-shaped portion 11. Further, the projecting edge 12E1 of the inner edge 12E of the frame-like portion 12 can be prevented from being bent with respect to the belt-like portion 11. This can prevent a part of the frame-like portion 12 from being caught by a conveying mechanism or the like when conveying the vapor deposition mask intermediate 10.

Preferably, each linear portion 11N2 includes a plurality of connecting portions. The region in which the effect of suppressing the bending of each linear portion 11N2 can be obtained is enlarged in the linear portion 11N2 as compared with the case where the number of connecting portions is 1. Preferably, the plurality of connecting portions in each linear portion 11N2 are arranged at equal intervals in the longitudinal direction DL. Thereby, it is possible to suppress the degree of deflection in the straight portion 11N2 from being different in each region between the connecting portions adjacent to each other.

Preferably, the pair of linear portions 11N2 are connected to the frame-like portion 12 by the same number of bridging portions 13. The plurality of bridge portions 13 connected to one of the linear portions 11N2 of the pair of linear portions 11N2 constitute a1 st bridge portion group, and the plurality of bridge portions 13 connected to the other linear portion 11N2 constitute a 2 nd bridge portion group. Preferably, the position of each bridge 13 belonging to the 1 st bridge group is equal to the position of 1 bridge 13 belonging to the 2 nd bridge group in the width direction DW. Thus, compared to the case where the number and positions of the portions supported by the frame-shaped portion 12 of the linear portions 11N2 in the longitudinal direction DL are different from each other in the pair of linear portions 11N2, it is possible to suppress the occurrence of variations in the load supported by 1 connecting portion. Therefore, the pair of linear portions 11N2 can be prevented from being deformed differently from each other.

Each 1 st edge 11L has no connecting portion in the longitudinal direction DL at a position closer to the end where the 2 nd edge 11W including the notch 11N is connected than the bottom of each notch 11N. In this example, since the pair of linear portions 11N2 are connected to the frame-shaped portion 12 in each notch 11N, a connecting portion closer to the 1 st edge portion 11L than the bottom portion of each notch 11N to the end portion including the 2 nd edge portion 11W of the notch 11N can be omitted. In this way, according to the connection points included in the linear portion 11N2, the bending of the region that follows the notch 11N and the support of the end of the belt-shaped portion 11 can be suppressed at 1 connection point on the inner edge 12E of the frame-shaped portion 12.

The 2 nd edge 11W includes a pair of 2 nd edge elements sandwiching the notch 11N in the width direction DW. Preferably, the number of connecting portions per unit length, i.e., the density of the connecting portions in each linear portion 11N2 is higher than the density of the connecting portions in each 2 nd edge element.

[ 4 th example ]

As shown in fig. 8, in example 4 of the vapor deposition mask intermediate 10, in addition to the pair of 2 nd edge portions 11W, the pair of 1 st edge portions 11L are connected to the frame-like portion 12 by the bridge portions 13. Each 1 st edge portion 11L is connected to the frame-like portion 12 via the bridge portion 13 at a position closer to the end portion including the 2 nd edge portion 11W to which the bent portion 11N1 is connected than the bent portion 11N1 in the longitudinal direction DL.

Preferably, each of the 1 st edge portions 11L is connected to the frame-like portion 12 by a plurality of bridge portions 13, and the plurality of bridge portions 13 are located closer to the end portion including the 2 nd edge portion 11W of the bent portion 11N1 in the longitudinal direction DL than the bent portion 11N1 is. Thus, the load of the belt-like portion 11 in the longitudinal direction DL can be supported by the plurality of bridge portions 13 located closer to the end portion of each 1 st edge portion 11L. Therefore, the bridge portion 13 located in the region sandwiched by the pair of notches 11N in the longitudinal direction DL can be omitted. Therefore, when the vapor deposition mask intermediate 10 is conveyed, external force can be suppressed from acting on the mask portion 11M via the bridge portion 13. As a result, deformation of the through-hole 11H of the mask portion 11M can be suppressed.

Further, the 1 st edge 11L is connected to the frame-shaped portion 12 at a position closer to the end portion including the 2 nd edge 11W to which the 2 nd edge 11W of the bent portion 11N1 is connected than the bent portion 11N1 in the longitudinal direction DL, whereby the corner portion formed by the 2 nd edge 11W and the 1 st edge 11L can be suppressed from floating with respect to the frame-shaped portion 12, as in the 2 nd example of the vapor deposition mask intermediate 10.

Preferably, each 1 st edge portion 11L is connected to the frame-like portion 12 by the same number of bridge portions 13. In the pair of 1 st edge portions 11L, the plurality of bridge portions 13 connecting one 1 st edge portion 11L constitute a1 st bridge portion group, and the plurality of bridge portions 13 connecting the other 1 st edge portion 11L constitute a 2 nd bridge portion group. Preferably, the position of each bridge 13 belonging to the 1 st bridge group is equal to the position of 1 bridge 13 belonging to the 2 nd bridge group in the longitudinal direction DL. Thus, compared to the case where the number and positions of the portions supported by the frame-like portion 12 in the longitudinal direction DL are different from each other in the pair of 1 st edge portions 11L, it is possible to suppress the occurrence of variations in the load supported by 1 connecting portion. Therefore, the occurrence of the deformation different from each other in the pair of first edge portions 11L due to the variation in the load can be suppressed.

[ example 5 ]

As shown in fig. 9, in example 5 of the vapor deposition mask intermediate 10, the belt-like portion 11 is connected to the frame-like portion 12 only at the pair of first edge portions 11L by the bridge portion 13. Each 1 st edge portion 11L includes a connecting portion closer to an end portion where the 2 nd edge portion 11W including the bent portion 11N1 is connected than the bent portion 11N1 in the longitudinal direction DL. Each 1 st edge portion 11L also includes a connecting portion at a position overlapping the bent portion 11N1 in the longitudinal direction DL.

In this way, each 1 st edge portion 11L is connected to the frame-like portion 12 through the plurality of bridge portions 13 from the bottom of the notch 11N to the end portion where the 2 nd edge portion 11W including the notch 11N is connected. Thus, the load of the belt-like portion 11 in the longitudinal direction DL and the width direction DW can be supported by the plurality of bridge portions 13 located closer to the end of each 1 st edge portion 11L. Therefore, in this example, the bridge portion 13 located in the region sandwiched by the pair of notches 11N in the longitudinal direction DL can be omitted. Therefore, when the vapor deposition mask intermediate 10 is conveyed, external force can be suppressed from acting on the mask portion 11M via the bridge portion 13. As a result, deformation of the through-hole 11H of the mask portion 11M can be suppressed.

The plurality of bridge portions 13 connected to the 1 st edge portion 11L of one of the pair of 1 st edge portions 11L constitute a1 st bridge portion group, and the plurality of bridge portions 13 connected to the 1 st edge portion 11L of the other pair constitute a 2 nd bridge portion group. Preferably, the position of each bridge 13 belonging to the 1 st bridge group is equal to the position of 1 bridge 13 belonging to the 2 nd bridge group in the longitudinal direction DL. Thus, compared to the case where the number and positions of the portions supported by the frame-like portion 12 in the longitudinal direction DL are different from each other in the pair of 1 st edge portions 11L, it is possible to suppress the occurrence of variations in the load supported by 1 connecting portion. Therefore, the occurrence of the deformation different from each other in the pair of first edge portions 11L due to the variation in the load can be suppressed.

[ 6 th example ]

As shown in fig. 10, in example 6 of the vapor deposition mask intermediate 10, the belt-like portion 11 is connected to the frame-like portion 12 at the pair of 1 st edge portions 11L and the pair of 2 nd edge portions 11W via the bridge portions 13. Each 2 nd edge portion 11W includes 1 connecting portion at a corner portion formed by the 2 nd edge element and the straight portion 11N 2.

Thus, in the belt-shaped portion 11, the corner portion formed by the 2 nd edge element and the straight portion 11N2 is supported by the frame-shaped portion 12. Therefore, the corner formed by the 2 nd edge element and the straight portion 11N2 can be suppressed from floating with respect to the frame-shaped portion 12. Therefore, when the vapor deposition mask intermediate 10 is conveyed, the vapor deposition mask intermediate 10 is further suppressed from being deformed.

[ 7 th example ]

As shown in fig. 11, in example 7 of the vapor deposition mask intermediate 10, the belt-like portion 11 is connected to the frame-like portion 12 at the pair of linear portions 11N2 in addition to the pair of first edge portions 11L. Each of the linear portions 11N2 includes 1 connecting portion located closer to the 2 nd edge element including the 2 nd edge portion 11W of the notch 11N including the linear portion 11N2 than the central portion of the linear portion 11N2 in the longitudinal direction DL.

Thus, in the belt-shaped portion 11, the vicinity of the corner formed by the 2 nd edge element and the straight portion 11N2 is supported by the frame-shaped portion 12. Therefore, the corner formed by the 2 nd edge element and the straight portion 11N2 can be suppressed from floating with respect to the frame-shaped portion 12. Therefore, when the vapor deposition mask intermediate 10 is conveyed, the vapor deposition mask intermediate 10 is further suppressed from being deformed.

[ 8 th example ]

As shown in fig. 12, in example 8 of the vapor deposition mask intermediate 10, the belt-like portion 11 is connected to the frame-like portion 12 at the pair of linear portions 11N2 in addition to the pair of first edge portions 11L. Each linear portion 11N2 includes a plurality of connection portions. The plurality of connecting portions include a connecting portion located closer to the 2 nd edge element including the 2 nd edge portion 11W of the notch 11N including the linear portion 11N2 than the central portion of the linear portion 11N2 in the longitudinal direction DL.

Thus, in the belt-shaped portion 11, the vicinity of the corner formed by the 2 nd edge element and the straight portion 11N2 is supported by the frame-shaped portion 12. Therefore, the corner formed by the 2 nd edge element and the straight portion 11N2 can be suppressed from floating with respect to the frame-shaped portion 12.

In this example, a connection portion is also provided in the linear portion 11N2 at a position closer to the bent portion 11N1 than in example 7. Thereby, the projecting edge 12E1 of the frame-like portion 12 is supported by the belt-like portion 11. Therefore, the projecting edge 12E1 can be suppressed from floating with respect to the belt-like portion 11.

[ 9 th example ]

As shown in fig. 13, in example 9 of the vapor deposition mask intermediate 10, each 2 nd edge portion 11W includes a plurality of notches 11N. In each 2 nd edge portion 11W, a plurality of notches 11N are arranged at equal intervals. Therefore, in the case where the tension in the longitudinal direction is applied by pulling the vapor deposition mask formed of the belt-shaped portion 11 so that the pair of 2 nd edge portions 11W are separated from each other, it is possible to suppress the occurrence of variation in the tension applied to the vapor deposition mask in the width direction of the vapor deposition mask, as compared with the case where the plurality of notches 11N are arranged irregularly. Therefore, the vapor deposition mask can be prevented from being deformed such as wrinkled or twisted.

In the 2 nd edge 11W, a region extending in the width direction DW is the 2 nd edge element. The band-shaped portion 11 is connected to the frame-shaped portion 12 at the 2 nd edge element by a bridge portion 13. Preferably, each 2 nd edge element has 1 or more connecting portions in the 2 nd edge portion 11W. Preferably, each 2 nd edge element has a plurality of connecting portions of the same number. This can suppress the 2 nd edge portion 11W from being bent in the width direction DW.

The plurality of bridge portions 13 connected to the 2 nd edge portion 11W of one of the pair of 2 nd edge portions 11W constitute a1 st bridge portion group, and the plurality of bridge portions 13 connected to the 2 nd edge portion 11W of the other pair constitute a 2 nd bridge portion group. Preferably, the position of each bridge 13 belonging to the 1 st bridge group is equal to the position of 1 bridge 13 belonging to the 2 nd bridge group in the width direction DW. Thus, compared to the case where the number of portions supported by the frame-like portion 12 in the width direction DW differs from each other in the pair of 2 nd edge portions 11W, it is possible to suppress the occurrence of variations in the load supported by 1 connecting portion. Therefore, the pair of 2 nd edge portions 11W can be prevented from being deformed differently from each other due to the variation in load.

As in example 3 of the vapor deposition mask intermediate 10, each of the 1 st edge portions 11L is connected to the frame-like portion 12 at a portion not overlapping the mask portion 11M in the longitudinal direction DL by a bridge portion 13.

[ constitution of mask device ]

The configuration of the mask device will be described with reference to fig. 14, 15 (a), 15 (b), and 15 (c).

As shown in fig. 14, the mask device 20 includes a main frame 21 and a plurality of vapor deposition masks 31. The main frame 21 has a rectangular frame shape supporting the plurality of vapor deposition masks 31, and is attached to a vapor deposition device for performing vapor deposition. The main frame 21 has main frame holes 21H penetrating the main frame 21 substantially over the entire range where each vapor deposition mask 31 is located.

Each vapor deposition mask 31 is a belt-shaped portion 11 that is detached by cutting a bridge portion 13 from a vapor deposition mask intermediate 10, and the vapor deposition mask intermediate 10 includes the belt-shaped portion 11 surrounded by a pair of 1 st edge portions 11L and a pair of 2 nd edge portions 11W, a frame-shaped portion 12 surrounding the belt-shaped portion 11, and a plurality of bridge portions 13 connected to the belt-shaped portion 11 and the frame-shaped portion 12. The vapor deposition mask 31 has a belt shape surrounded by the pair of 1 st edge portions 31L and the pair of 2 nd edge portions 31W. Each 2 nd edge 31W is shorter than the 1 st edge 31L, and includes a U-shaped notch 31N recessed in the longitudinal direction of the 1 st edge 31L, and the bottom of the U-shaped portion is curved. The edge 31E of the vapor deposition mask 31 includes a bent portion 31N1 serving as a bottom of the notch 31N. The portion of the edge 31E of the vapor deposition mask 31 where the bridge mark, which is a cut trace of the bridge portion 13, exists is a portion other than the bent portion 31N 1. The vapor deposition mask 31 includes a plurality of mask portions 31M arranged along the longitudinal direction of the vapor deposition mask 31. The 2 nd edge portions 31W of each vapor deposition mask 31 are attached to the main frame 21 in a state where tension is applied in a direction in which the pair of 2 nd edge portions 31W are separated from each other. The notch 31N of the vapor deposition mask 31 may be located outside the main frame 21 in a plan view facing the vapor deposition mask 31.

Further, the pair of 1 st edge portions 31L of the vapor deposition mask 31 correspond to the pair of 1 st edge portions 11L of the belt-like portions 11. The pair of 2 nd edge portions 31W of the vapor deposition mask 31 correspond to the pair of 2 nd edge portions 11W of the belt-like portion 11. The edge 31E of the vapor deposition mask 31 corresponds to the edge 11E of the belt-shaped portion 11. The notches 31N in the vapor deposition mask 31 correspond to the notches 11N in the belt-shaped portion 11. The bent portion 31N1 in the vapor deposition mask 31 corresponds to the bent portion 11N1 in the belt-like portion 11. The mask portion 31M of the vapor deposition mask 31 corresponds to the mask portion 11M of the belt-shaped portion 11.

Fig. 15 (a), 15 (b), and 15 (c) show 1 of the plurality of crossover marks of the vapor deposition mask 31 in an enlarged manner. Fig. 15 (a) shows a bridge trace in the case where the bridge portion 13 described earlier with reference to fig. 3 (a) is provided. In contrast, fig. 15 (b) shows a bridge trace in the case where the bridge portion 13 described earlier using fig. 3 (b) is provided. Fig. 15 (c) shows a bridge trace in the case where the bridge portion 13 described earlier using fig. 3 (c) is provided. In the following, a case where the vapor deposition mask 31 is obtained from example 1 of the vapor deposition mask intermediate 10 will be described. In addition, when the vapor deposition mask 31 is obtained from any one of examples 2 to 9 of the vapor deposition mask intermediate 10, the vapor deposition mask 31 may include a crossover mark described below.

As shown in fig. 15 (a), the 2 nd edge portion 31W includes a recess 31ED recessed in the same direction as the recess of the notch 31N. The recess 31ED is a rectangular recess. The recess 31ED corresponds to the 1 bridging recess 11ED included in the 2 nd edge portion 11W of the band-shaped portion 11. The 1 cross-over mark 31A is located in the recess 31 ED. The bridging score 31A corresponds to the fragile portion 13A described above. The bridging mark 31A is a bent portion in which a part of the fragile portion 13A is bent toward the surface of the vapor deposition mask 31. The bent portion is formed by rolling up the connection portion of the band-shaped portion 11 toward the surface of the band-shaped portion 11 when the bridge portion 13 is cut from the band-shaped portion 11.

As shown in fig. 15 (B), each of the bridging traces 31B of the 2 nd edge portion 31W of the vapor deposition mask 31 is formed of a plurality of arcuate depressions and a plurality of bent portions. In each bridging trace 31B, the recesses and the bent portions are alternately arranged. The bent portion is a portion where a part of the edge 31E of the vapor deposition mask 31 is bent toward the surface of the vapor deposition mask 31. The bent portion is formed by rolling up the connection portion of the band-shaped portion 11 toward the surface of the band-shaped portion 11 when the bridge portion 13 is cut from the band-shaped portion 11. The depression of the bridging trace 31B corresponds to the through hole of the fragile portion 13B. On the other hand, the bent portion of the bridge trace 31B corresponds to a portion other than the through hole of the proximal end portion of the bridge portion 13.

As shown in fig. 15 (C), each bridging mark 31C of the 2 nd edge portion 31W of the vapor deposition mask 31 is formed of a plurality of arcuate recesses and a plurality of bent portions, similarly to the bridging mark 31B. However, the amount of bending of the bent portion of bridging trace 31C is smaller than the amount of bending of the bent portion of bridging trace 31B.

When the bridging

scratches

31A, 31B, and 31C have the bent portions, as in the bridging scratches 31A, 31B, and 31C, the bent portions are preferably bent toward the surface including the 1 st opening H1 in the vapor deposition mask 31. Thus, even if the bridging scratches 31A, 31B, and 31C have bent portions, the vapor deposition mask 31 can be prevented from floating from the main frame 21 by the amount corresponding to the bent portions.

The vapor deposition mask 31 may have a bridging mark that protrudes outward of the edge 31E and extends along a plane in which the vapor deposition mask 31 extends. Alternatively, vapor deposition mask 31 may have a bridging line recessed inward of edge 31E.

[ method for producing vapor deposition mask ]

The method for manufacturing the vapor deposition mask 31 includes the steps of: preparing a metal sheet; forming a belt-shaped portion 11, a frame-shaped portion 12, and a bridge portion 13 in the vapor deposition mask intermediate 10; and forming vapor deposition mask 31. The preparation of the metal sheet is, for example, a preparation of a metal sheet made of an iron-nickel alloy. The metal sheet is preferably a metal sheet made of invar alloy among iron-nickel alloys.

The formation of the belt-shaped portion 11, the frame-shaped portion 12, and the bridge portion 13 in the vapor deposition mask intermediate 10 means the formation of: a belt-like portion 11 having a shape following the edge 31E of the vapor deposition mask 31; a frame-shaped portion 12 having an inner edge 12E following the edge 31E of the vapor deposition mask 31 and surrounding the belt-shaped portion 11; and a plurality of bridge portions 13 connecting the edge 11E of the band portion 11 and the inner edge 12E of the frame portion 12. Forming the vapor deposition mask 31 means forming the vapor deposition mask 31 from the belt-like portion 11 by cutting each bridge portion 13.

Forming the belt-shaped portion 11 in the vapor deposition mask intermediate 10 means forming the belt-shaped portion 11 having the edge 11E of the bent portion 11N1 that follows the bottom of the notch 31N. The formation of the bridges 13 in the vapor deposition mask intermediate 10 means that the bridges 13 are formed at the edges 11E of the strip-shaped portions 11 at positions other than the bent portions 11N 1. The method for manufacturing the vapor deposition mask 31 will be described in more detail with reference to fig. 16. A method for manufacturing the vapor deposition mask 31 in the case of example 1 in which the mask portion 11M is provided in the belt-like portion 11 will be described below.

As shown in fig. 16, in the method of manufacturing the vapor deposition mask 31, first, a metal sheet is prepared (step S11). In the step of preparing the metal sheet, the metal sheet may be prepared by electrolysis, or by rolling, grinding, or the like. The metal sheet prepared in the step of preparing a metal sheet has a roll shape around which a metal sheet having a belt shape is wound. Next, a resist layer is formed on one of the surfaces of the metal sheet to be processed (step S12), and a resist mask is formed on the surface by exposure and development of the resist layer (step S13).

Next, a plurality of through holes 11H are formed in the metal sheet by wet etching of the target surface using the resist mask (step S14). At this time, the strip-shaped portion 11, the frame-shaped portion 12, and the plurality of bridge portions 13 are formed simultaneously with the formation of the plurality of through holes 11H. In addition, when the plurality of bridge portions 13 include the weak portions 13A, the weak portions 13A are also formed simultaneously with the through holes 11H. Thereby, the vapor deposition mask intermediate 10 was obtained. That is, the belt-shaped portion 11, the frame-shaped portion 12, and the plurality of bridge portions 13 can be formed in the vapor deposition mask intermediate 10. In the vapor deposition mask intermediate 10, a plurality of belt-shaped portions 11 are formed in a spaced-apart arrangement.

Next, the resist mask is removed from the target surface, whereby the mask portion 11M is formed (step S15). Next, the roll-shaped vapor deposition mask intermediate 10 is cut in the width direction. Thereby, an intermediate sheet having a plurality of belt-like portions 11 is obtained (step S16). Then, the vapor deposition mask 31 described above can be obtained by cutting the plurality of bridges 13 connected to the belt-shaped portions 11 (step S17). When the bridge portion 13 is cut, the frame portion 12 is bent with respect to the band portion 11, whereby the fragile portion 13A can be cut.

In example 2 in which the belt-shaped portion 11 includes the mask portion 11M, the small holes 11SH are formed by performing the steps from step S12 to step S15 on the rear surface 10R. Next, a protective layer for protecting the small holes 11SH is filled to the small holes 11 SH. Next, the steps from step S12 to step S15 described above are performed on the surface 10F, thereby forming the large holes 11 LH. Thus, example 2 of the mask portion 11M can be obtained. The resist mask used for forming the macropores 11LH may be removed simultaneously with the resist mask used for forming the micropores 11 SH.

In addition, in the case of example 2 in which the strap portion 11 includes the mask portion 11M and the fragile portion 13A is formed by half etching, the fragile portion 13A may be formed when the steps from step S12 to step S15 are performed with respect to the rear surface 10R. Alternatively, the fragile portion 13A may be formed when the steps from step S12 to step S15 are performed with respect to the front surface 10F.

As described above, according to the embodiments of the vapor deposition mask intermediate, the vapor deposition mask, and the method for manufacturing the vapor deposition mask, the following effects can be obtained.

(1) The vapor deposition mask 31 formed of the belt-shaped portion 11 includes a notch 31N including a U-shaped portion, and a bottom portion of the U-shaped portion is curved. Therefore, when tension is applied to the vapor deposition mask 31 by pulling both sides of the notch 31N in each 2 nd edge portion 31W in a direction in which the pair of 2 nd edge portions 31W are separated from each other, the force acting on the notch 31N is dispersed by the shape of the notch 31N. This can suppress the occurrence of deformation such as wrinkles or distortion in the vapor deposition mask 31 when the vapor deposition mask 31 is used.

(2) The bridge portion 13 connecting the band portion 11 and the frame portion 12 is connected to a portion other than the bent portion 11N1 at the edge 11E of the band portion 11. Therefore, in the vapor deposition mask 31 formed by cutting the bridge portions 13, it is possible to suppress the bridge portions 13 from remaining partially in the bent portions 31N1 of the notches 31N or to suppress the bent portions 31N1 from being partially broken. Thus, the shape of the bent portion 31N1 is maintained in a shape that can disperse the tension applied to the vapor deposition mask 31. Therefore, when the vapor deposition mask 31 is used, the vapor deposition mask 31 can be prevented from being deformed.

(3) While the vapor deposition mask intermediate 10 is being conveyed, the 2 nd edge portion 11W of the belt-like portion 11 is continuously supported by the frame-like portion 12. Therefore, the 2 nd edge portions 11W are prevented from floating from the frame portion 12, and deformation of the band portion 11 is prevented.

(4) Both sides of the notch 11N are connected to the frame-shaped portion 12 via bridge portions 13. Therefore, compared to the case where only one of the both sides of the notch 11N is connected to the frame-shaped portion 12 via the bridge portion 13, the belt-shaped portion 11 is continuously supported by the frame-shaped portion 12 when the vapor deposition mask intermediate 10 is conveyed. In addition, the band-shaped portion 11 is less likely to be displaced relative to the frame-shaped portion 12, as compared with a case where only one of both sides of the notch 11N is connected to the frame-shaped portion 12 via the bridge portion 13. Therefore, when the vapor deposition mask intermediate 10 is conveyed, it is possible to suppress a portion of the belt-shaped portion 11 from being bent due to the belt-shaped portion 11 coming into contact with, for example, a conveying mechanism.

(5) By connecting each linear portion 11N2 to the projecting edge 12E1, the rigidity of each linear portion 11N2 and the projecting edge 12E1 can be increased. This can suppress deformation of the band-shaped portion 11. Further, the bending of the tab edge 12E1 with respect to the belt-like portion 11 can be suppressed. As a result, when the vapor deposition mask intermediate 10 is conveyed, the portion of the belt-like portion 11 or the projecting edge 12E1 can be prevented from being caught by a conveying mechanism or the like.

(6) When the vapor deposition mask intermediate 10 is conveyed, the 1 st edge portion 11L of the belt-like portion 11 is continuously supported by the frame-like portion 12. Therefore, the 1 st edge portion 11L is prevented from being bent, and deformation of the band-shaped portion 11 can be prevented.

(7) Since the 1 st edge portion 11L is connected to the frame-shaped portion 12 at a position closer to the end than the bent portion 11N1, the corner of the band-shaped portion 11 can be prevented from floating relative to the frame-shaped portion 12. Therefore, the corners can be prevented from being caught by the conveying mechanism or the like when the vapor deposition mask intermediate 10 is conveyed.

(8) Compared to the case where the bridges 13 and the mask portions 11M are arranged in the longitudinal direction DL, when the vapor deposition mask intermediate 10 is conveyed, the force acting on the mask portions 11M via the bridges 13 is reduced. Therefore, deformation of the through-hole 11H of the mask portion 11M can be suppressed.

The above-described embodiment can be implemented with appropriate modifications as described below.

[ position of connecting site ]

The 2 bridge portion groups corresponding to the pair of 1 st edge portions 11L or the pair of 2 nd edge portions 11W may be changed as follows. That is, the position of each of the bridges belonging to the 1 st bridge group may not be equal to the position of each of the bridges belonging to the 2 nd bridge group in the direction in which the plurality of bridges belonging to the 1 st bridge group are arranged.

The connecting portion may be located at only one 1 st edge 11L of the pair of 1 st edges 11L, or may be located at only one 2 nd edge 11W of the pair of 2 nd edges 11W, as long as the band-shaped portion 11 can be supported by the frame-shaped portion 12.

[ bridging trace ]

The plurality of bridging marks included in the vapor deposition mask 31 may include a bridging mark having a1 st shape and a bridging mark having a 2 nd shape different from the 1 st shape.

[ bridge part ]

The above-described weak portion may be located between the band-shaped portion 11 and the frame-shaped portion 12, so that the band-shaped portion 11 and the frame-shaped portion 12 may be connected to each other by the weak portion. In this case, a part of the metal sheet included in the fragile portion is a bridge portion. In other words, the portion of the weak portion other than the through hole is the bridge portion.

For example, when the fragile portion 13A is formed of 1 half-etched portion as described with reference to fig. 3 (a), the whole fragile portion 13A is a bridge portion. When the fragile portion 13B has a plurality of through holes as described with reference to fig. 3 (B), a portion of the fragile portion 13B located between the through holes is a bridge portion. As described with reference to fig. 3 (C), when fragile portion 13C includes a plurality of through holes 13C1 and a plurality of half-etched portions 13C2, and through holes 13C1 and half-etched portions 13C2 are alternately arranged, half-etched portion 13C2 is a bridge portion. In the case where the plurality of half-etched portions are arranged at intervals, the entire fragile portion is a bridge portion.

[ Linear weak part ]

As shown in fig. 16, the frame-shaped portion 12 may include a linear weak portion 12A extending in a direction from the inner edge 12E of the frame-shaped portion 12 toward the outer edge 12F of the frame-shaped portion 12. In the example shown in fig. 16, the linear fragile portion 12A extends in a direction intersecting the longitudinal direction DL. One end of the linear fragile portion 12A is located at a portion of the inner edge 12E extending in the longitudinal direction DL, and the other end of the linear fragile portion 12A is located inside the frame-shaped portion 12.

The vapor deposition mask intermediate 10 includes a plurality of linear fragile portions 12A. The plurality of linear fragile portions 12A include an upstream fragile portion 12AU located upstream of the mask portion 11M in the transport direction of the vapor deposition mask intermediate 10 and a downstream fragile portion 12AD located downstream of the mask portion 11M. In the upstream fragile portion 12AU, one end of the upstream fragile portion 12AU is connected to a portion of the inner edge 12E extending in the longitudinal direction DL and located upstream of the mask portion 11M. On the other hand, in the downstream weak portion 12AD, one end portion of the downstream weak portion 12AD is connected to a portion of the inner edge 12E that extends in the longitudinal direction DL and is located downstream of the mask portion 11M.

The vapor deposition mask intermediate 10 has 2 upstream fragile portions 12AU and 2 downstream fragile portions 12AD between 2 strip portions 11 in the width direction DW. The 2 upstream fragile portions 12AU are arranged in the width direction DW and extend toward portions of the inner edge 12E surrounding the different strip portions 11. The 2 downstream fragile portions 12AD are arranged in the width direction DW, and extend to portions of the inner edge 12E surrounding the different strip portions 11.

The vapor deposition mask intermediate 10 has a pair of upstream fragile portions 12AU that sandwich the 2 belt-shaped portions 11 in the width direction DW, and a pair of downstream fragile portions 12AD that sandwich the 2 belt-shaped portions 11 in the width direction DW. The vapor deposition mask intermediate 10 may include at least 1 of the linear fragile portions 12A.

The linear fragile portion 12A has a lower mechanical strength than the portions of the frame-shaped portion 12 other than the linear fragile portion 12A. Therefore, the frame-shaped portion 12 is easily cut along the linear fragile portion 12A. Further, since one end of the linear fragile portion 12A is positioned at the inner edge 12E of the frame-shaped portion 12, the ring formed by the inner edge 12E can be cut when the band-shaped portion 11 is detached from the frame-shaped portion 12. This facilitates cutting of the bridge portion 13.

When forming the vapor deposition mask from the belt-like portion 11, first, the vapor deposition mask intermediate 10 is cut at a predetermined position in the longitudinal direction DL along the width direction DW. This yields a vapor deposition mask intermediate 10 having only 2 belt-shaped portions 11 arranged along the width direction DW. Next, the frame-shaped portion 12 is cut along the linear fragile portion 12A, thereby cutting the ring surrounding the inner edge 12E of the band-shaped portion 11. Then, the bridge portion 13 is bent to cut the bridge portion 13 from the band portion 11. This enables the vapor deposition mask to be formed from the belt-shaped portion 11.

Fig. 18 shows an enlarged view of the region a shown in fig. 17, and fig. 19 shows an enlarged view of the region B shown in fig. 17. Fig. 20 shows an enlarged view of the region C shown in fig. 17. The region a includes the upstream end portions of the 2 upstream fragile portions 12AU, and the region B includes the downstream end portions of the 2 downstream fragile portions 12 AD. The region C includes the upstream end of the downstream fragile portion 12AD and a portion of the inner edge 12E connected to the upstream end.

As shown in fig. 18, the upstream end of each upstream fragile portion 12AU is connected to an upstream through portion 12BU penetrating the frame-shaped portion 12. The 2 upstream side through portions 12BU are arranged at predetermined intervals in the width direction DW. When forming the vapor deposition mask 31 from the belt-like portion 11, for example, a device capable of cutting the frame-like portion 12 is used to cut a portion of the frame-like portion 12 sandwiched by the 2 upstream side through portions 12BU in the width direction DW, thereby forming a cut piece. Then, by pulling the cut piece in a direction intersecting the plane in which the vapor deposition mask intermediate 10 extends, a force that cuts the 2 upstream fragile portions 12AU can be simultaneously applied to the 2 upstream fragile portions 12 AU.

In each of the pair of upstream weak portions 12AU that sandwich the 2 strip portions 11 in the width direction DW, the upstream end portion is also connected to the upstream through portion 12 BU.

As shown in fig. 19, the frame portion 12 includes a gripped piece 12C connected to the downstream end of the downstream fragile portion 12AD, and a downstream penetrating portion 12BD surrounding the gripped piece 12C. Accordingly, the downstream end of the downstream fragile portion 12AD can be gripped by an instrument or by a human finger, and therefore a force for cutting the downstream fragile portion 12AD can be easily applied to the downstream fragile portion 12 AD. By pulling up the grip piece 12C in a direction intersecting the plane in which the vapor deposition mask intermediate 10 extends, the force that cuts the 2 downstream fragile portions 12AD can be simultaneously applied to the 2 downstream fragile portions 12 AD.

Further, in each of the pair of downstream fragile portions 12AD which sandwich the 2 band-shaped portions 11 in the width direction DW, the downstream end portion is also connected to the gripped piece 12C, and the gripped piece 12C is also surrounded by the downstream through portion 12 BD.

As shown in fig. 20, the inner edge 12E of the frame-shaped portion 12 may have a recess 12EA recessed in a direction away from the 1 st edge 11L of the frame-shaped portion 12 surrounded by the inner edge 12E. The recesses 12EA have a rectangular shape when viewed from a direction facing the surface 10F of the vapor deposition mask intermediate 10. The upstream end of the downstream fragile portion 12AD is connected to the recess 12EA of the inner edge 12E. The upstream end of the downstream fragile portion 12AD can be connected to the recess 12EA at a position midway from one end to the other end of the side located on the most downstream side.

Since the inner edge 12E has the recess 12EA and the downstream weak portion 12AD is connected to the recess 12EA, when the frame-shaped portion 12 is cut along the downstream weak portion 12AD, an external force for cutting the frame-shaped portion 12 can be suppressed from acting on the belt-shaped portion 11. This suppresses the external force from acting on the mask portion 11M of the belt portion 11. Further, the upstream end portion is positioned at a portion other than one end and the other end of the side of the recess 12EA positioned on the most downstream side, and thus the downstream fragile portion 12AD is easily cut.

Further, the inner edge 12E may have the recess 12EA not only at the portion connected to each downstream fragile portion 12AD but also at the portion connected to each upstream fragile portion 12AU, and thereby, the same effect as the effect by the recess 12EA can be obtained.

In the example shown in fig. 18 to 20, the linear fragile portion 12A includes a plurality of through portions 12A1 arranged at intervals. The linear fragile portion 12A may be formed by 1 half-etched portion, or may have a plurality of half-etched portions arranged at intervals. Alternatively, the linear fragile portion 12A may have a plurality of half-etched portions and a plurality of through holes, and the half-etched portions and the through holes may be alternately arranged in the linear fragile portion 12A.

The upstream through portion 12BU connected to the upstream end of the upstream fragile portion 12AU may be changed to a grip piece 12C connected to the downstream fragile portion 12AD and a downstream through portion 12BD surrounding the grip piece 12C. Alternatively, the gripped piece 12C connected to the downstream end of the downstream fragile portion 12AD and the downstream through-portion 12BD surrounding the gripped piece 12C may be changed to the upstream through-portion 12BU connected to the upstream end of the upstream fragile portion 12 AU.

[ intermediate vapor deposition mask ]

The vapor deposition mask intermediate may further include a resin layer laminated on the metal sheet in addition to the metal sheet. In this case, the vapor deposition mask formed of the vapor deposition mask intermediate is also formed of a metal sheet and a resin layer. Alternatively, the vapor deposition mask intermediate may include 2 metal sheets and a resin layer sandwiched between the 2 metal sheets in the thickness direction of the vapor deposition mask intermediate. In this case, the vapor deposition mask formed of the vapor deposition mask intermediate is also formed of 2 metal sheets and a resin layer sandwiched between the 2 metal sheets. In any of these cases, the synthetic resin forming the resin layer may be, for example, a polyimide resin. Further, the through holes provided in these vapor deposition mask intermediates can be formed by irradiating the resin layer with a laser beam.

[ method for producing vapor deposition mask ]

The band-shaped portion 11, the frame-shaped portion 12, and the plurality of bridge portions 13 may be formed in a step different from the step of forming the through holes 11H of the mask portion 11M. In this case, the fragile portion 13A of each bridge portion 13 may be formed in the step of forming the through hole 11H of the mask portion 11M, or may be formed in the step of forming the band portion 11, the frame portion 12, and the plurality of bridge portions 13.

In these cases, the band-shaped portion 11, the frame-shaped portion 12, the bridge portion 13, and the fragile portion 13A may be formed by wet etching in the same manner as the through hole 11H of the mask portion 11M. When the step of forming the band-shaped portion 11, the frame-shaped portion 12, and the plurality of bridge portions 13 is different from the step of forming the weak portion 13A, the band-shaped portion 11, the frame-shaped portion 12, and the plurality of bridge portions 13 may be formed by laser processing, and the weak portion 13A may be formed by wet etching. Alternatively, the band-shaped portion 11, the frame-shaped portion 12, the bridge portion 13, and the fragile portion 13A may be formed by laser processing. Alternatively, the band-shaped portion 11, the frame-shaped portion 12, and the plurality of bridges 13 may be formed by press working, and the weak portion 13 may be formed by wet etching or laser working.

When the band-shaped portion 11, the frame-shaped portion 12, the bridge portion 13, and the weak portion 13A are formed in the same step, they may be formed by laser processing.

Description of the symbols

10 … vapor deposition mask intermediate, front surface of 10F …, back surface of 10R …, 11 … strip, edge of 11E, 31E …, 11ED … bridging recess, 11H, 13C … through hole, first edge of 11L, 31L …, large hole of 11LH …, 11M, 31M … mask, notch of 11N, 31N …, bent portion of 11N …, straight portion of 11N …, curved portion of 11N …, small hole of 11SH …, second edge of 11W, 31W …, frame portion of 12 …, linear weak portion of 12a …, penetrating portion of 12a …, downstream weak portion of 12AD …, upstream weak portion of 12AU …, downstream penetrating portion of 12BD …, upstream penetrating portion of 12BU …, inner side edge of 12E …, 12EA …, 31F …, outer edge of 12F …, half B … B3613C …, and half B … C … etching recess 3613C …, 12a … B, and half … B, 20 … mask device, 21 … main frame, 21H … main frame hole, 31 … vapor deposition mask, 31A, 31B, 31C … bridging trace, H1 … 1 st opening, H2 … 2 nd opening, R13 … bridging region, RN … non-bridging region, SH … step height.

Claims

1. An intermediate body for a vapor deposition mask, comprising a metal sheet for producing a vapor deposition mask,

the vapor deposition mask has a belt shape surrounded by a pair of 1 st edge portions and a pair of 2 nd edge portions,

each 2 nd edge portion is shorter than the 1 st edge portion, and has a notch having a U-shaped portion depressed in a longitudinal direction which is a direction in which the 1 st edge portion extends, a bottom portion of the U-shaped portion being curved,

the vapor deposition mask intermediate comprises:

a belt-shaped portion having a shape that follows the edge of the vapor deposition mask;

a frame-shaped portion having an inner edge having a shape following an edge of the band-shaped portion and surrounding the band-shaped portion; and

a plurality of bridge portions connecting the edges of the band-shaped portion and the inner side edges of the frame-shaped portion,

the band-shaped portions form the vapor deposition mask by cutting the bridge portions,

a bent portion having a shape following the bottom of the notch is provided at the edge of the band-shaped portion,

each bridge portion is connected to a portion of the edge of the band portion other than the bent portion.

2. The vapor deposition mask intermediate according to claim 1,

the edges of the band include the pair of 1 st edge portions and the pair of 2 nd edge portions,

each 2 nd edge of the band-shaped portion has a connection portion connected to the frame-shaped portion by the plurality of bridge portions.

3. The vapor deposition mask intermediate according to claim 2,

each 2 nd edge portion of the belt-shaped portion has a notch having a shape following the notch of the vapor deposition mask,

the notches of the band-shaped portion are sandwiched by the connecting portions.

4. The vapor deposition mask intermediate according to claim 2,

the inner edge of the frame-shaped part is provided with a convex edge having a shape following the notch of the belt-shaped part,

each notch of the band-shaped portion includes the bent portion and a pair of linear portions extending from the bent portion in the longitudinal direction,

each linear portion is connected to the projecting edge by the bridge portion.

5. The vapor deposition mask intermediate according to claim 1,

each 1 st edge of the belt-shaped portion is connected to the frame-shaped portion by the plurality of bridge portions.

6. The vapor deposition mask intermediate according to claim 5,

each 2 nd edge portion of the belt-shaped portion has a notch having a shape following the notch of the vapor deposition mask and including the bent portion,

each 1 st edge portion of the strip-shaped portion is connected to the frame-shaped portion at a1 st connection portion,

each 2 nd edge portion of the band-shaped portion is connected to the frame-shaped portion at a 2 nd connection portion by the plurality of bridge portions,

the 1 st connecting portion is located closer to the 2 nd connecting portion in the longitudinal direction than the bent portion.

7. The vapor deposition mask intermediate according to claim 5 or 6, wherein,

the band portion includes a mask portion having a plurality of through holes,

each 1 st edge of the strip-shaped portion is connected to the frame-shaped portion by the bridge portion at a portion not overlapping the mask portion in the longitudinal direction.

8. The vapor deposition mask intermediate according to any one of claims 1 to 7,

the frame-shaped portion includes a weak portion having a linear shape extending in a direction from the inner edge of the frame-shaped portion toward the outer edge of the frame-shaped portion,

the weak portion has a lower mechanical strength than a portion of the frame-like portion other than the weak portion.

9. A vapor deposition mask which is a belt-shaped part of a vapor deposition mask intermediate body comprising a metal sheet,

the intermediate vapor deposition mask body includes a belt-like portion surrounded by a pair of 1 st edge portions and a pair of 2 nd edge portions, a frame-like portion surrounding the belt-like portion, and a plurality of bridge portions connected to the belt-like portion and the frame-like portion, the belt-like portion being detached from the intermediate vapor deposition mask body by cutting the bridge portions,

a bent portion as the bottom of the notch is provided at an edge of the vapor deposition mask,

by cutting the bridge portion, a bridge mark is formed in a portion of the edge of the vapor deposition mask other than the bent portion.

10. A method for manufacturing a vapor deposition mask having a band shape surrounded by a pair of 1 st edge portions and a pair of 2 nd edge portions, each 2 nd edge portion being shorter than the 1 st edge portion and having a notch having a U-shaped portion depressed in a longitudinal direction which is a direction in which the 1 st edge portion extends, a bottom portion of the U-shaped portion being curved, the method comprising:

a step of forming a vapor deposition mask intermediate body including a metal sheet, the vapor deposition mask intermediate body including: a belt-shaped portion having a shape that follows the edge of the vapor deposition mask; a frame-shaped portion having an inner edge following the shape of the edge of the band-shaped portion and surrounding the band-shaped portion; and a plurality of bridges connecting the edges of the band-shaped portions with the inner side edges of the frame-shaped portions; and

a step of forming a vapor deposition mask from the belt-like portion by cutting each bridge portion,

in the step of forming a vapor deposition mask from the belt-shaped portion, a bent portion having a shape that follows the bottom portion of the notch is provided at the edge of the belt-shaped portion, and each bridge portion is connected to a portion of the edge of the belt-shaped portion other than the bent portion.