CN112577446A - In-place surface shape splicing measuring device and method for large-caliber planar optical element - Google Patents

In-place surface shape splicing measuring device and method for large-caliber planar optical element Download PDF

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CN112577446A
CN112577446A CN202011537846.0A CN202011537846A CN112577446A CN 112577446 A CN112577446 A CN 112577446A CN 202011537846 A CN202011537846 A CN 202011537846A CN 112577446 A CN112577446 A CN 112577446A
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aperture
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段亚轩
达争尚
陈晓义
袁索超
范尧
李铭
王璞
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XiAn Institute of Optics and Precision Mechanics of CAS
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Abstract

In order to solve the problems that the existing scheme for measuring the surface shape of the large-caliber planar optical element is easily influenced by air flow disturbance and vibration, has small measurement dynamic range and low surface shape measurement resolution ratio and cannot be applied to surface shape measurement of various postures in situ, the invention provides a splicing and measuring device and a splicing and measuring method for the surface shape of a large-aperture plane optical element in place, which utilize a laser, a semi-transparent semi-reflecting mirror, a collimating objective, a diaphragm, a small-aperture diaphragm, a collimating eyepiece, a binary optical device, a detector, an attenuation plate, a far-field detector, a driving controller, an electric control diaphragm, a reflector array, a pyramid prism array and a six-degree-of-freedom motion platform to realize the dynamic high-precision surface shape splicing and measuring of the large-aperture plane optical element to be measured in various postures in place, and the measuring precision is not influenced by the external environment.

Description

In-place surface shape splicing measuring device and method for large-caliber planar optical element
Technical Field
The invention belongs to the field of optics, and relates to a large-caliber plane optical element surface shape measuring device and method. The large-caliber planar optical element provided by the invention is a planar optical element with the caliber larger than 300 mm.
Background
The large-caliber planar optical element is mainly applied to astronomical telescopes, high-power laser inertial confinement fusion and other devices. Because the surface shape of the large-caliber planar optical element is influenced by factors such as gravity, a supporting clamp, an adjusting state and the like to deform under the inclined working posture, the stability of the device and the wavefront quality of an output light beam are seriously influenced. Therefore, the in-place surface shape measurement of the large-caliber planar optical element is realized, and the posture or the support clamp mode is adjusted in real time according to the measurement result, so that the consistency of the in-place surface shape and the processing surface shape of the large-caliber optical element is ensured, and the method has important significance.
The method for measuring the surface shape of the large-caliber planar optical element at present mainly comprises the following steps: direct measurement and indirect measurement.
The direct measurement mainly adopts a large-caliber interference measurement method. The traditional static phase-shifting interferometer driven by piezoelectric ceramics (such as a U.S. Zygo phase-shifting laser interferometer) is susceptible to air flow disturbance and vibration because a measured wavefront phase result is obtained by performing phase shifting on a time domain, and the requirement on the measurement environment is more severe particularly for large-aperture optical elements, so that the interferometer cannot meet the requirement on in-situ measurement of various postures of the large-aperture optical elements. The FizCam dynamic planar interferometer developed by the 4D company in America can realize the dynamic measurement of the surface shape of a planar optical element with the caliber of 300mm at most, but has small dynamic measurement range and high price, and cannot directly measure the surface shape of the planar optical element with the caliber larger than 300mm in place. The surface shape measurement of the ultra-large-diameter planar optical element can be realized based on the large-diameter beam expanding system and the shack-Hartmann wavefront sensor, but is limited by the beam expanding ratio of the beam expanding system and the resolution of the shack-Hartmann wavefront sensor, the surface shape measurement resolution is not high, and the measurement precision is influenced by the transmission wavefront of the large-diameter beam expanding system.
The indirect measurement mainly comprises a Ruiqi-congman method, a sub-aperture splicing measurement method and the like. The Ruiqi-congman method has strict requirements on detection environment, needs a standard spherical mirror with a large caliber which is 20-30% larger than the caliber of a plane mirror to be detected, and has high measurement cost, and meanwhile, the method can not be applied to the measurement of the surface shape of the plane optical element with the large caliber in various postures in place. The sub-aperture splicing measurement method is a commonly used method for measuring the surface shape of a large-aperture plane optical element at present, a small-aperture dynamic interferometer is fixed on a two-dimensional scanning device, a measured surface is divided into a plurality of mutually overlapped small apertures, then the dynamic interferometer is used for scanning measurement, and finally the measurement results of all sub-apertures are spliced together by a splicing algorithm to obtain the full-aperture surface shape of the measured large-aperture plane optical element. Because the sub-aperture splicing measurement needs a scanning motion mechanism, inclination and translation can be introduced in the scanning process, the traditional method uses the overlapping area between adjacent sub-apertures to calculate the relative translation and inclination error and compensate the relative translation and inclination error, however, when Power exists in the surface shape of the large-aperture plane optical element to be measured, the method cannot distinguish the inclination introduced by the Power, so that the in-place surface shape measurement of the plane optical element with larger Power cannot be realized.
Disclosure of Invention
The invention provides a splicing and measuring device and a splicing and measuring method for a large-aperture plane optical element on-site surface shape, aiming at solving the technical problems that the existing scheme for measuring the surface shape of the large-aperture plane optical element is easily influenced by air flow disturbance and vibration, the dynamic range of measurement is small, the surface shape measurement resolution is not high, the large-aperture plane optical element cannot be applied to on-site surface shape measurement in various postures, and Power cannot be measured when the surface shape of the large-aperture plane optical element exists in the large-aperture plane optical element.
The technical solution of the invention is as follows:
the splicing and measuring device for the in-place surface shape of the large-caliber planar optical element is characterized in that: the device comprises an image data processing unit, a six-degree-of-freedom motion platform, a laser, a first semi-transparent semi-reflecting mirror, a collimating objective lens, a second semi-transparent semi-reflecting mirror, a diaphragm, a third semi-transparent semi-reflecting mirror, a small-hole diaphragm, a collimating eyepiece, a binary optical device, a detector, an attenuation plate, a far-field detector, a driving controller, an electric control diaphragm, a reflector array and a pyramid prism array, wherein the laser, the first semi-transparent semi-reflecting mirror, the collimating objective lens, the second semi-transparent semi;
the first half-transmitting half-reflecting mirror, the collimating objective lens, the second half-transmitting half-reflecting mirror and the diaphragm are sequentially arranged on an output light path of the laser; the third half-mirror, the attenuation plate and the far-field detector are sequentially arranged on a reflection light path of the output light beam of the collimating objective after being reflected by the first half-mirror; the aperture diaphragm, the collimating eyepiece, the binary optical device and the detector are sequentially arranged on a reflection light path of an output light beam of the collimating objective lens after being reflected by the first half-transparent half-reflective mirror and then by the third half-transparent half-reflective mirror; the electric control diaphragm and the reflector array are sequentially arranged on a reflection light path of the output light beam of the collimating objective after being reflected by the second half-mirror; the pyramid prism array is arranged on a reflection light path of the reflector array;
the binary optics is used for modulating an optical field incident on the binary optics;
the far-field detector is used for detecting a far-field focal spot image reflected back by the measured large-caliber planar optical element from the collimation;
the detector is used for detecting the light field image modulated by the binary optical device;
the image data processing unit is used for acquiring the position offset of a far-field focal spot image A reflected back by the large-aperture plane optical element to be detected in a self-alignment manner and a far-field focal spot image B reflected back by the pyramid prism array and feeding back the position offset to the driving controller; the image data processing unit is also used for processing the image acquired by the detector to obtain the surface shape information of the large-aperture plane optical element to be measured;
the driving controller is used for controlling the six-degree-of-freedom platform to perform two-dimensional scanning on the plane where the surface of the large-caliber optical element to be measured is located, and controlling the orientation and the pitching of the six-degree-of-freedom motion platform according to the position offset;
the reflector array and the pyramid prism array are both S rows and 1 column, and S is determined by the caliber size of the large-caliber optical element to be measured and the caliber size of a single reflector/pyramid prism.
Further, the binary optical device is a two-dimensionally arranged micro-lens array; the aperture and focal length of all the lenses in the microlens array are the same.
Further, the binary optical device is a plano-convex lens array which is arranged in two dimensions; the aperture and the focal length of all the plano-convex lenses in the plano-convex lens array are the same.
Further, the specific method for obtaining the surface shape information of the large-aperture planar optical element to be measured by processing the image acquired by the detector by the image data processing unit is as follows:
1) surface shape measurement at initial position
1.1) calculating the deviation delta x and delta y of the centroid of the light spot in each sub-aperture relative to the x and y directions of a reference position; the reference positions x and y are positions where the error of the measuring device is calibrated in advance;
1.2) calculating the average slope of the wavefront in the x and y directions within the sub-aperture range divided by the microlens array:
Figure BDA0002854049620000041
wherein f is the focal length of the plano-convex lens, SxIs the average slope of the wavefront in the x-direction, SyOf wave front in y-directionAveraging the slopes;
1.3) adding SxAnd SySubstituting the measured large-aperture optical element into a finite difference model to calculate the surface shape of the measured large-aperture optical element in the measuring sub-aperture at the initial position
Figure BDA0002854049620000042
Figure BDA0002854049620000043
Wherein N is the number of rows and columns of the microlens array, h is the sub-aperture size of the microlens array,
Figure BDA0002854049620000044
the average slope of the wave front in the x direction in the sub-aperture with the position (i, j) in the micro lens array,
Figure BDA0002854049620000045
is the average slope of the wavefront in the y-direction within the sub-aperture with position (i, j) in the microlens array;
2) surface shape measurement at each scanning position
2.1) obtaining the movement of the six-freedom-degree motion platform to the scanning position Ps,tWhen the device is used, the position offset (delta x, delta y) of a light spot A reflected by the large-aperture plane optical element to be detected and a light spot B reflected by the pyramid prism array is fed back to the driving controller, and the position offset (delta x, delta y) is the basis for the driving controller to adjust the scanning pose; s is 1 … M; t is 1 … M, where M is the number of scanning positions in the x and y directions;
2.2) after the scanning pose is adjusted, obtaining the current scanning position P according to the surface shape measuring process at the initial position in the step 1)s,tLower, the surface shape of the large-aperture plane optical element to be measured in the measuring sub-aperture
Figure BDA0002854049620000046
2.3) repeating the steps 2.1) -2.2) until the surface of the whole large-caliber plane optical element (6) to be measured is traversed, and obtaining the surface shape of the large-caliber plane optical element to be measured in each scanning position in the measuring sub-aperture;
3) surface shaped splice
And splicing the obtained surface shapes in the corresponding measuring sub-apertures according to each scanning position to obtain the surface shape of the large-aperture planar optical element to be measured.
Or the binary optical device is a mixed modulation grating and is used for carrying out amplitude and phase modulation on the light field incident to the surface of the binary optical device, the size of a light-transmitting part of the binary optical device is 2 times that of a light-proof part, and the light-transmitting part carries out phase modulation on the light field incident to the surface of the binary optical device according to phases 0 and pi; the phases 0 and pi are alternately distributed in a checkerboard manner.
Further, the specific method for obtaining the surface shape information of the large-aperture planar optical element to be measured by processing the image acquired by the detector by the image data processing unit is as follows:
1) surface shape measurement at initial position
1.1) carrying out Fast Fourier Transform (FFT) on the obtained interference image to obtain a spectrogram;
1.2) extracting two positive first-level frequency spectrums in the orthogonal direction by using frequency domain filtering window functions respectively, wherein the frequency domain filtering window functions adopt Hamming window functions which meet the following requirements:
Figure BDA0002854049620000051
in the formula: (x)0,y0) The coordinate of the center position of the primary spectrum is shown, and (x, y) are the coordinates of the primary spectrum in the x and y directions;
1.3) calculating the extracted positive first-level frequency spectrum by utilizing Inverse Fast Fourier Transform (iFFT) to obtain differential wave fronts in x and y directions
Figure BDA0002854049620000052
And
Figure BDA0002854049620000053
1.4) coupling the x, y directionsDifferential wavefront
Figure BDA0002854049620000054
And
Figure BDA0002854049620000055
substituting the measured large-aperture optical element into a finite difference model to calculate the surface shape of the measured large-aperture optical element in the measuring sub-aperture at the initial position
Figure BDA0002854049620000056
Figure BDA0002854049620000061
In the formula, sh is the transverse shearing amount;
2) surface shape measurement at each scanning position
2.1) obtaining the movement of the six-freedom-degree motion platform to the scanning position Ps,tWhen the device is used, the position offset (delta x, delta y) of a light spot A reflected by the large-aperture plane optical element to be detected and a light spot B reflected by the pyramid prism array is fed back to the driving controller, and the position offset (delta x, delta y) is the basis for the driving controller to adjust the scanning pose; s is 1 … M; t is 1 … M, where M is the number of scanning positions in the x and y directions;
2.2) after the scanning pose is adjusted, obtaining the current scanning position P according to the surface shape measuring process at the initial position in the step 1)s,tLower, the surface shape of the large-aperture plane optical element to be measured in the measuring sub-aperture
Figure BDA0002854049620000062
2.3) repeating the steps 2.1) -2.2) until the surface of the whole large-caliber planar optical element to be measured is traversed, and obtaining the surface shape of the large-caliber planar optical element to be measured in each scanning position in the measuring sub-aperture;
3) surface shaped splice
And splicing the obtained surface shapes in the corresponding measuring sub-apertures according to each scanning position to obtain the surface shape of the large-aperture planar optical element to be measured.
The invention also provides a method for measuring the surface shape of the large-caliber planar optical element based on the device for splicing and measuring the surface shape of the large-caliber planar optical element in place, which is characterized by comprising the following steps:
the first step is as follows: pose adjustment at initial position
Opening the electric control diaphragm, and acquiring the position (x) of a light spot A reflected by the large-aperture plane optical element to be detected by using a far-field detectorm,ym) And the position of the spot B reflected by the corner cube array is (x)B,yB) The position of the spot A is recorded by the image data processing unit as (x)m,ym) And spot B is located at (x)B,yB) Adjusting the reflector array to enable the positions of the light spots B and A to coincide, and finishing the pose adjustment of the initial measurement position;
the second step is that: surface shape measurement at initial position
Closing the electric control diaphragm, and processing the image acquired by the detector by the image data processing unit to obtain the surface shape of the large-aperture optical element to be measured in the measuring sub-aperture under the initial position;
the third step: pose adjustment and surface shape measurement at each scanning position
3.1) opening the electric control diaphragm, controlling the six-freedom-degree motion platform by using the driving controller to perform two-dimensional scanning in the surface coordinate system of the large-aperture optical element to be detected, and acquiring the motion of the six-freedom-degree motion platform to a scanning position P by using the image data processing units,tWhen the device is used, the position offset (delta x, delta y) of a light spot A reflected by the large-aperture plane optical element to be detected and a light spot B reflected by the pyramid prism array is fed back to the driving controller; s is 1 … M; t is 1 … N, wherein M, N is the number of scanning positions in the x direction and the y direction respectively, and the values of M and N are determined according to the caliber size of the large-caliber optical element to be measured and the overlapping rate of adjacent measuring areas in the scanning process;
3.2) the driving controller controls the position and the pitching of the six-freedom-degree motion platform according to the position offset (delta x, delta y) to enable the position of the light spot A to coincide with the position of the light spot B, and at the moment, the scanning pose adjustment is finished;
3.3) closing the electric control diaphragm, and processing the image acquired by the detector by the image data processing unit to obtain the current scanning position Ps,tThe surface shape of the large-aperture plane optical element to be measured in the measuring sub-aperture is measured;
3.4) repeating 3.1) -3.3) until the surface of the whole large-caliber plane optical element to be measured is traversed, and obtaining the surface shape of the large-caliber plane optical element to be measured in each scanning position in the measuring sub-aperture;
the fourth step: surface shaped splice
And splicing the obtained surface shapes in the corresponding measuring sub-apertures according to each scanning position to obtain the surface shape of the large-aperture planar optical element to be measured.
The invention has the advantages that:
1. the invention realizes the surface shape splicing measurement of the large-caliber planar optical element to be measured under various postures by utilizing a laser, a semi-transparent semi-reflecting mirror, a collimating objective, a diaphragm, an aperture diaphragm, a collimating eyepiece, a binary optical device, a detector, an attenuation plate, a far-field detector, a drive controller, an electric control diaphragm, a reflecting mirror array, a pyramid prism array and a six-freedom-degree motion platform.
2. The invention realizes the high-precision alignment between the measured large-caliber plane optical element and the measuring device of the invention by the initial pose adjusting method.
3. According to the invention, through the scanning pose adjusting method, the inclination deduction generated by the motion of the six-freedom-degree motion platform is realized, the inclination introduced when the measured large-caliber plane optical element surface shape contains large Power is reserved, and the high-precision measurement of the large-caliber plane optical element surface shape is realized.
4. The binary optical device adopted by the invention is a micro-lens array or a mixed modulation grating, the corresponding measurement principles are respectively a Hartmann-shack principle and a transverse shearing interference principle, and the dynamic range of the device is larger than that of a splicing measurement device based on a dynamic interferometer.
5. The invention has less manual links, no artificial subjective error and high-precision quantitative measurement.
6. Experiments prove that the method has high stability, good repeatability and high confidence of the measurement result.
Drawings
Fig. 1 is a schematic diagram of the principle of the present invention.
Fig. 2 is a schematic diagram of a binary optical device according to the present invention, (a) is a schematic diagram of a binary optical device being a microlens array, and (b) is a schematic diagram of a binary optical device being a hybrid modulation grating.
Fig. 3 is a diagram of the transmission function of a hybrid modulation grating, white for 0-phase modulation, black for pi-phase modulation, and gray for opaque parts.
Description of reference numerals:
1-a laser; 2-a first half mirror; 3-a collimating objective lens; 4-a second half mirror; 5-a diaphragm; 6-measured large-caliber planar optical element; 7-a third half mirror; 8-a small aperture diaphragm; 9-collimating eyepiece; 10-binary optics; 11-a detector; 12-an attenuation plate; 13-a far-field detector; 14-a drive controller; 15-an electrically controlled diaphragm; 16-a mirror array; a 17-cube corner prism array; 18-six degree of freedom motion platform; 101-a microlens array; 102-hybrid modulation grating.
Detailed Description
The invention is further described below with reference to the accompanying drawings.
As shown in fig. 1, the device for splicing and measuring the in-place surface shape of a large-aperture planar optical element provided by the present invention includes an image data processing unit (not shown in the figure), a six-degree-of-freedom motion platform 18, a laser 1 disposed on the six-degree-of-freedom motion platform 18, a first half mirror 2, a collimator objective 3, a second half mirror 4, a diaphragm 5, a third half mirror 7, an aperture diaphragm 8 with an aperture smaller than 1mm, a collimator eyepiece 9, a binary optical device 10, a detector 11, an attenuation plate 12, a far-field detector 13, a driving controller 14, an electronic control diaphragm 15, a reflector array 16, and a pyramid prism array 17.
The first half-transmitting half-reflecting mirror 2, the collimating objective 3, the second half-transmitting half-reflecting mirror 4, the diaphragm 5 and the measured large-caliber plane optical element 6 are arranged on the output light path of the laser 1 in sequence; the third half mirror 7, the attenuation plate 12 and the far field detector 13 are sequentially arranged on a reflection light path of the output light beam of the collimating objective lens 3 reflected by the first half mirror 2; the aperture diaphragm 8, the collimating eyepiece 9, the binary optical device 10 and the detector 11 are sequentially arranged on a reflected light path of an output light beam of the collimating objective lens 3 after being reflected by the first half-mirror 2 and then reflected by the third half-mirror 7; the electric control diaphragm 15 and the reflector array 16 are sequentially arranged on a reflection light path of the output light beam of the collimating objective lens 3 after being reflected by the second half-mirror 4; the corner cube array 17 is arranged on the reflection light path of the reflector array 16;
the laser 1 is output by a single-mode fiber, the required power is stable in a short period, and the wavelength can be customized according to actual requirements.
The binary optic 10 is used to modulate the light field incident thereon; the binary optic 10 may employ a microlens array 101 or a hybrid modulation grating 102.
As shown in fig. 2 (a), the microlens array 101 is a two-dimensionally arranged plano-convex lens array in which parameters (aperture and focal length) of all the plano-convex lenses are the same.
As shown in fig. 2 (b), the hybrid modulation grating 102 performs amplitude and phase modulation on the light field incident on the surface thereof, in which the size (total area) of the light-transmitting portion is 2 times that of the light-non-transmitting portion, and the light-transmitting portion performs phase modulation on the light field incident on the surface thereof in phases 0 and pi (checkerboard alternate distribution), as shown in fig. 3. The hybrid modulation grating 102 transmittance function is:
Figure BDA0002854049620000091
in the formula, d is grating pitch; a is the size (namely the light transmission area) of the light transmission part of the mixed modulation grating; rect is a rectangular function; comb is a Comb sampling function, (x, y) is a spatial coordinate, j2＝-1。
The far-field detector 13 is used for detecting a far-field focal spot image reflected back from the measured large-caliber planar optical element 6 in a self-alignment manner;
the detector 11 is used for detecting the light field image modulated by the binary optical device 10;
the image data processing unit is used for acquiring the position offset (Δ x, Δ y) of the far-field focal spot image a reflected by the measured large-aperture planar optical element 6 from collimation and the far-field focal spot image B reflected by the pyramid prism array 17, and feeding back the position offset (Δ x, Δ y) to the driving controller 14; the image data processing unit is also used for processing the image acquired by the detector 11 to obtain the surface shape information of the large-aperture plane optical element 6 to be measured;
the driving controller 14 is used for controlling the six-degree-of-freedom platform 18 to perform two-dimensional scanning on the plane where the surface of the large-aperture optical element 6 to be measured is located, and controlling the orientation and the pitching of the six-degree-of-freedom motion platform 18 according to the position offset (Δ x, Δ y).
The mirror array 16 and the corner cube array 17 are arranged in a manner of S × 1(S rows and 1 columns), and S represents the number of mirrors/corner cubes, which is determined by the aperture size of the optical element to be measured and the aperture size of the individual mirrors/corner cubes.
The working process of the measuring device is divided into four stages: 1) adjusting the pose at the initial position; 2) measuring the surface shape at the initial position; 3) adjusting the pose at each scanning position and measuring the surface shape; 4) and (5) surface-shaped splicing.
The specific working process and principle are as follows:
1) pose adjustment at initial position
Laser beams output by the single-mode fiber of the laser 1 are transmitted by the first half mirror 2, collimated by the collimating objective lens 3, incident on the second half mirror 4 and divided into transmitted beams and reflected beams by the second half mirror 4.
The transmitted light beam enters the measured large-aperture plane optical element 6 through the diaphragm 5 and is reflected, the reflected light reflected by the measured large-aperture plane optical element 6 is transmitted through the diaphragm 5 and the second half mirror 4 in sequence, is reflected by the collimating objective lens 3 and the first half mirror 2, is transmitted by the third half mirror 7, is attenuated by the attenuation plate 12 and then is converged on the target surface of the far-field detector 13, and the position of the light spot A at the moment is recorded by the image data processing unit as (x) the position of the light spot A ism,ym)。
The reflected beam is reflected by the electric control diaphragm 15 and the reflector array 16, then enters the pyramid prism array 17 and returns along the original path, the returned beam is reflected by the reflector array 16, the electric control diaphragm 15 and the second half-mirror 4, reflected by the collimating objective 3 and the first half-mirror 2, transmitted by the third half-mirror 7 and attenuated by the attenuation plate 12, and then converges on the target surface of the far-field detector 13, and the image data processing unit records the position of the light spot B (x is the position of the light spot B at the time) (x is the position of the light spot B)B,yB)。
And adjusting the reflector array 16 to enable the positions of the light spots B and A to coincide, and finishing the pose adjustment of the initial measurement position.
2) Surface shape measurement at initial position
And after the pose adjustment of the initial position is measured, closing the electric control diaphragm 15. The laser 1 single-mode fiber output laser beam transmits through the first half mirror 2, and is collimated through the collimating objective 3, then transmits through the second half mirror 4, passes through the diaphragm 5, enters the large-caliber planar optical element 6 and is reflected, the light field carrying the surface shape information of the large-caliber planar optical element 6 is transmitted through the second half mirror 4, the collimating objective 3, reflects through the first half mirror 2, reflects through the third half mirror 7, collimates through the small aperture diaphragm 8 and the collimating eyepiece 9 in sequence, enters the binary optical device 10, is modulated through the binary optical device 10, and is received by the detector 11.
There are two modes of operation for initial position measurement depending on the form of binary optics used.
Working mode 1: the binary optic 10 employs a microlens array 101
In this mode, the light beam incident on the surface of the microlens array 101 is modulated into a two-dimensional spot lattice, and a spot lattice image is acquired by the detector 11. The data processing method comprises the following steps:
step 1: calculating the deviation delta x and delta y of the light spot centroid in each sub-aperture relative to the x and y directions of the reference position; the reference positions x and y are positions where the error of the measuring device is calibrated in advance, and the calibration method is a method known in the field;
step 2: the average slopes of the wave fronts in the x and y directions within the sub-aperture range divided by the microlens array 101 are calculated:
Figure BDA0002854049620000121
wherein f is the focal length of the plano-convex lens, SxIs the average slope of the wavefront in the x-direction, SyIs the average slope of the wavefront in the y-direction.
Step3 reaction of SxAnd SySubstituting into finite difference model (formula 3), calculating to obtain the surface shape of the large-aperture optical element 6 at the initial position in the measuring sub-aperture
Figure BDA0002854049620000122
Figure BDA0002854049620000123
Wherein N is the number of rows and columns of the microlens array, h is the sub-aperture size of the microlens array,
Figure BDA0002854049620000124
the average slope of the wave front in the x direction in the sub-aperture with the position (i, j) in the micro lens array,
Figure BDA0002854049620000125
is the average slope of the wavefront in the y-direction within the sub-aperture with position (i, j) in the microlens array.
The working mode 2 is as follows: the binary optical device 10 employs a hybrid modulation grating 102
In this mode, light beams incident on the surface of the hybrid modulation grating 102 generate ± 1 st order diffracted lights in two orthogonal directions, and these four diffracted lights are displaced from each other and interfere with each other, and an interference image is acquired by the detector 11. The data processing method comprises the following steps:
step 1: performing Fast Fourier Transform (FFT) on the obtained interference image to obtain a spectrogram;
step 2: two positive first-level frequency spectrums in the orthogonal direction are extracted by using frequency domain filtering window functions respectively, and the frequency domain filtering window functions adopt Hamming window functions which meet the following requirements:
Figure BDA0002854049620000126
in the formula: (x)0,y0) Is the coordinate of the center position of the primary spectrum, and (x, y) is the coordinate of the x direction and the y direction of the primary spectrum.
Step3, calculating the extracted positive-level frequency spectrum by using Inverse Fast Fourier Transform (iFFT) to obtain differential wave fronts in the x and y directions
Figure BDA0002854049620000131
And
Figure BDA0002854049620000132
step4 differentiating the wavefront in the x, y directions
Figure BDA0002854049620000133
And
Figure BDA0002854049620000134
substituting into finite difference model (formula 5), calculating to obtain the surface shape of the large-aperture optical element 6 at the initial position in the measuring sub-aperture
Figure BDA0002854049620000135
Figure BDA0002854049620000136
Wherein sh is the transverse shearing amount.
3) Pose adjustment and surface shape measurement at each scanning position
Opening the electric control diaphragm 15, controlling the six-freedom-degree motion platform 18 by using the driving controller 14 to perform two-dimensional scanning in the x-y coordinate system of the surface of the large-aperture optical element 6 to be measured, and moving to the position Ps,tS is 1 … M; t is 1 … N, wherein M, N is the number of scanning positions in the x and y directions, respectively, and the values of M and N are determined according to the caliber size of the large-caliber optical element to be measured and the overlapping rate of adjacent measuring areas in the scanning process, and the overlapping rate is required to be more than 80%.
The light spot A reflected by the large-aperture plane optical element 6 to be detected and the light spot B reflected by the corner cube array 17 are acquired by the far-field detector 13.
The position offset values (delta x, delta y) of the light spots A and B are obtained through the image data processing unit and fed back to the driving controller 14, and the driving controller 14 controls the direction and the pitching of the six-freedom-degree motion platform 18 to enable the light spots A and B to coincide. At this time, the scanning pose adjustment is completed.
Closing the electric control diaphragm 15, measuring the working process according to the initial position in the step 2), and obtaining the current scanning position Ps,tThe surface shape of the lower large-aperture plane optical element 6 to be measured in the measuring sub-aperture
Figure BDA0002854049620000137
Repeating the working process, traversing the surface of the whole large-aperture planar optical element, and obtaining the surface shape of the measured large-aperture planar optical element 6 in the measuring sub-aperture at each scanning position;
4) surface shaped splice
And directly splicing the obtained surface shapes in the corresponding measuring sub-apertures according to each scanning position to obtain the surface shape of the measured large-aperture planar optical element 6.

Claims (7)

1. The on-site surface splicing measuring device for the large-caliber planar optical element is characterized in that: the device comprises an image data processing unit, a six-degree-of-freedom motion platform (18), a laser (1), a first half-mirror (2), a collimating objective (3), a second half-mirror (4), a diaphragm (5), a third half-mirror (7), an aperture diaphragm (8), a collimating eyepiece (9), a binary optical device (10), a detector (11), an attenuation plate (12), a far-field detector (13), a driving controller (14), an electric control diaphragm (15), a reflector array (16) and a pyramid prism array (17), wherein the laser (1), the first half-mirror (2), the collimating objective (3), the second half-mirror (4), the diaphragm (5), the third half-mirror (7) are arranged on;
the first half-mirror (2), the collimating objective (3), the second half-mirror (4) and the diaphragm (5) are sequentially arranged on an output light path of the laser (1); the third half mirror (7), the attenuation plate (12) and the far-field detector (13) are sequentially arranged on a reflection light path of the output light beam of the collimating objective lens (3) after being reflected by the first half mirror (2); an aperture diaphragm (8), a collimating eyepiece (9), a binary optical device (10) and a detector (11) are sequentially arranged on a reflection light path of an output light beam of the collimating objective lens (3) after being reflected by the first half-mirror (2) and then reflected by the third half-mirror (7); the electric control diaphragm (15) and the reflector array (16) are sequentially arranged on a reflection light path of an output light beam of the collimating objective lens (3) after being reflected by the second half-transmitting and half-reflecting mirror (4); the pyramid prism array (17) is arranged on a reflection light path of the reflector array (16);
a binary optical device (10) for modulating a light field incident thereon;
the far-field detector (13) is used for detecting a far-field focal spot image which is reflected by the large-caliber planar optical element (6) to be detected from the self-alignment;
the detector (11) is used for detecting the light field image modulated by the binary optical device (10);
the image data processing unit is used for acquiring the position offset of a far-field focal spot image A reflected back by the measured large-caliber planar optical element (6) in a self-alignment manner and a far-field focal spot image B reflected back by the pyramid prism array (17), and feeding back the position offset to the driving controller (14); the image data processing unit is also used for processing the image acquired by the detector (11) to obtain the surface shape information of the large-caliber planar optical element (6) to be detected;
the driving controller (14) is used for controlling the six-degree-of-freedom platform (18) to perform two-dimensional scanning on the plane where the surface of the large-aperture optical element (6) to be measured is located, and controlling the orientation and the pitching of the six-degree-of-freedom motion platform (18) according to the position offset;
the reflector array (16) and the pyramid prism array (17) are both S rows and 1 column, and S is determined by the caliber size of the large-caliber optical element to be measured and the caliber size of a single reflector/pyramid prism.
2. The splicing measuring device for the in-place surface shape of the large-caliber planar optical element according to claim 1, wherein: the binary optical device (10) is a micro-lens array which is arranged in two dimensions; the aperture and focal length of all the lenses in the microlens array are the same.
3. The splicing measuring device for the in-place surface shape of the large-caliber planar optical element according to claim 2, wherein: the binary optical device (10) is a plano-convex lens array which is arranged in two dimensions; the aperture and the focal length of all the plano-convex lenses in the plano-convex lens array are the same.
4. The splicing measuring device of the large-caliber planar optical element on the in-place surface shape according to claim 3, wherein: the specific method for processing the image acquired by the detector (11) by the image data processing unit to obtain the surface shape information of the large-aperture plane optical element (6) to be detected comprises the following steps:
1) surface shape measurement at initial position
1.1) calculating the deviation delta x and delta y of the centroid of the light spot in each sub-aperture relative to the x and y directions of a reference position; the reference positions x and y are positions where the error of the measuring device is calibrated in advance;
1.2) calculating the average slope of the wavefront in the x and y directions within the sub-aperture range divided by the microlens array (101):
Figure FDA0002854049610000021
wherein f is the focal length of the plano-convex lens, SxIs the average slope of the wavefront in the x-direction, SyThe average slope of the wavefront in the y-direction;
1.3) adding SxAnd SySubstituting the measured surface shape of the large-aperture optical element (6) at the initial position in the measuring sub-aperture into a finite difference model
Figure FDA0002854049610000023
Figure FDA0002854049610000022
Wherein N is the number of rows and columns of the microlens array, h is the sub-aperture size of the microlens array,
Figure FDA0002854049610000031
the average slope of the wave front in the x direction in the sub-aperture with the position (i, j) in the micro lens array,
Figure FDA0002854049610000032
is the average slope of the wavefront in the y-direction within the sub-aperture with position (i, j) in the microlens array;
2) surface shape measurement at each scanning position
2.1) obtaining the movement of the six-freedom-degree motion platform (18) to the scanning position Ps,tWhen the device is used, the position offset (delta x, delta y) of a light spot A reflected by the large-aperture plane optical element (6) to be detected and a light spot B reflected by the pyramid prism array (17) is fed back to the driving controller (14), and the position offset (delta x, delta y) is the basis for the driving controller (14) to adjust the scanning pose; s is 1 … M; t is 1 … M, where M is the number of scanning positions in the x and y directions;
2.2) after the scanning pose is adjusted, obtaining the current scanning position P according to the surface shape measuring process at the initial position in the step 1)s,tThe surface shape of the large-aperture plane optical element (6) to be measured in the measuring sub-aperture
Figure FDA0002854049610000033
2.3) repeating the steps 2.1) -2.2) until the surface of the whole large-caliber planar optical element (6) to be measured is traversed, and obtaining the surface shape of the large-caliber planar optical element (6) to be measured in each scanning position in the measuring sub-aperture;
3) surface shaped splice
And splicing the obtained surface shapes in the corresponding measuring sub-apertures according to each scanning position to obtain the surface shape of the large-aperture planar optical element (6).
5. The splicing measuring device for the in-place surface shape of the large-caliber planar optical element according to claim 1, wherein: the binary optical device (10) is a mixed modulation grating and is used for carrying out amplitude and phase modulation on an optical field incident to the surface of the binary optical device, the size of a light transmission part of the binary optical device is 2 times that of a light-tight part, and the light transmission part carries out phase modulation on the optical field incident to the surface of the binary optical device according to phases 0 and pi; the phases 0 and pi are alternately distributed in a checkerboard manner.
6. The splicing measuring device for the in-place surface shape of the large-caliber planar optical element according to claim 5, wherein: the specific method for processing the image acquired by the detector (11) by the image data processing unit to obtain the surface shape information of the large-aperture plane optical element (6) to be detected comprises the following steps:
1) surface shape measurement at initial position
1.1) carrying out Fast Fourier Transform (FFT) on the obtained interference image to obtain a spectrogram;
1.2) extracting two positive first-level frequency spectrums in the orthogonal direction by using frequency domain filtering window functions respectively, wherein the frequency domain filtering window functions adopt Hamming window functions which meet the following requirements:
Figure FDA0002854049610000041
in the formula: (x)0,y0) The coordinate of the center position of the primary spectrum is shown, and (x, y) are the coordinates of the primary spectrum in the x and y directions;
1.3) calculating the extracted positive first-level frequency spectrum by utilizing Inverse Fast Fourier Transform (iFFT) to obtain differential wave fronts in x and y directions
Figure FDA0002854049610000043
And
Figure FDA0002854049610000044
1.4) differentiating the wavefront in the x, y directions
Figure FDA0002854049610000045
And
Figure FDA0002854049610000046
substituting the measured surface shape of the large-aperture optical element (6) at the initial position in the measuring sub-aperture into a finite difference model
Figure FDA0002854049610000047
Figure FDA0002854049610000042
In the formula, sh is the transverse shearing amount;
2) surface shape measurement at each scanning position
2.1) obtaining the movement of the six-freedom-degree motion platform (18) to the scanning position Ps,tWhen the device is used, the position offset (delta x, delta y) of a light spot A reflected by the large-aperture plane optical element (6) to be detected and a light spot B reflected by the pyramid prism array (17) is fed back to the driving controller (14), and the position offset (delta x, delta y) is the basis for the driving controller (14) to adjust the scanning pose; s is 1 … M; t is 1 … M, where M is the number of scanning positions in the x and y directions;
2.2) after the scanning pose is adjusted, obtaining the current scanning position P according to the surface shape measuring process at the initial position in the step 1)s,tThe surface shape of the large-aperture plane optical element (6) to be measured in the measuring sub-aperture
Figure FDA0002854049610000051
2.3) repeating the steps 2.1) -2.2) until the surface of the whole large-caliber planar optical element (6) to be measured is traversed, and obtaining the surface shape of the large-caliber planar optical element (6) to be measured in each scanning position in the measuring sub-aperture;
3) surface shaped splice
And splicing the obtained surface shapes in the corresponding measuring sub-apertures according to each scanning position to obtain the surface shape of the large-aperture planar optical element (6).
7. The method for measuring the surface shape of the large-caliber planar optical element based on the splicing measuring device for the surface shape in place of the large-caliber planar optical element as claimed in any one of claims 1 to 6, is characterized by comprising the following steps:
the first step is as follows: pose adjustment at initial position
Opening an electric control diaphragm (15), and acquiring the position (x) of a light spot A reflected by the large-aperture plane optical element (6) to be detected by using a far-field detector (13)m,ym) And the position of the spot B reflected by the corner cube array (17) is (x)B,yB) The position of the spot A is recorded by the image data processing unit as (x)m,ym) And spot B is located at (x)B,yB) Adjusting the reflector array (16) to enable the position of the light spot B to coincide with the position of the light spot A, and finishing the pose adjustment of the initial measurement position;
the second step is that: surface shape measurement at initial position
Closing the electric control diaphragm (15), and processing the image acquired by the detector (11) by the image data processing unit to obtain the surface shape of the large-aperture optical element (6) to be measured in the measuring sub-aperture at the initial position;
the third step: pose adjustment and surface shape measurement at each scanning position
3.1) opening an electric control diaphragm (15), controlling a six-freedom-degree motion platform (18) by using a driving controller (14) to perform two-dimensional scanning in a surface coordinate system of the measured large-aperture optical element (6), and acquiring the motion of the six-freedom-degree motion platform (18) to a scanning position P through an image data processing units,tWhen the device is used, the position offset (delta x, delta y) of a light spot A reflected by the large-aperture plane optical element (6) to be detected and a light spot B reflected by the pyramid prism array (17) is fed back to the driving controller (14); s is 1 … M; t is 1 … N, wherein M, N is the number of scanning positions in x and y directions, and the values of M and N are determined according to the measured valuesDetermining the aperture size of the large-aperture optical element and the overlapping rate of adjacent measurement areas in the scanning process;
3.2) the driving controller (14) controls the position and the pitching of the six-freedom-degree motion platform (18) according to the position offset (delta x, delta y) to enable the position of the light spot A to coincide with the position of the light spot B, and at the moment, the scanning pose adjustment is completed;
3.3) closing the electric control diaphragm (15), and processing the image acquired by the detector (11) by the image data processing unit to obtain the current scanning position Ps,tThe surface shape of the large-aperture plane optical element (6) to be measured in the sub-aperture is measured;
3.4) repeating 3.1) -3.3) until the surface of the whole large-caliber planar optical element (6) to be measured is traversed, and obtaining the surface shape of the large-caliber planar optical element (6) to be measured in each scanning position in the measuring sub-aperture;
the fourth step: surface shaped splice
And splicing the obtained surface shapes in the corresponding measuring sub-apertures according to each scanning position to obtain the surface shape of the large-aperture planar optical element (6).
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