CN103838088B - A kind of focusing leveling device and focusing and leveling method - Google Patents
A kind of focusing leveling device and focusing and leveling method Download PDFInfo
- Publication number
- CN103838088B CN103838088B CN201210485158.3A CN201210485158A CN103838088B CN 103838088 B CN103838088 B CN 103838088B CN 201210485158 A CN201210485158 A CN 201210485158A CN 103838088 B CN103838088 B CN 103838088B
- Authority
- CN
- China
- Prior art keywords
- hot spot
- focusing
- substrate
- leveling
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
A kind of focusing leveling device of present invention offer and focusing and leveling method, use spatial light modulator, make it can modulate according to the thickness of substrate and measure hot spot, change the size measuring hot spot, avoid producing the phenomenon of detection hot spot ghost image, thus improve detection accuracy, and then substrate is had stronger adaptability, and modulation is flexibly, convenient and reliable.
Description
Technical field
The present invention relates to the equipment in IC manufacturing field, be applied to projection lithography technology particularly to one
In focusing leveling device and focusing and leveling method.
Background technology
In current projection lithography system, owing to thickness deviation, the face shape of substrate rise and fall and projection objective, Jiao
The uncertainty of plan-position, can cause substrate to produce out of focus or inclination relative to focal plane of lens, and this is by shadow
Ring quality and the yield rate of integrated circuit, therefore, generally include in order to accurately detecting testee surface location
Focusing and leveling system with gradient so that in exposure process, substrate is in preferably position.
It will be apparent that contactless focusing leveling device is first-selected, the most conventional contactless focusing and leveling dress
Being equipped with condenser type, vapour-pressure type and optical profile type, optical profile type focusing leveling device obtains with its preferably precision
Accreditation in the industry.
Refer to Fig. 1, Fig. 1 is optical profile type focusing and leveling systematic schematic diagram, and its optical path is distributed in projection thing
The both sides of the optical axis a-b of mirror 13, including, light source 1, described light source 1 sends measurement hot spot through illuminating mirror
Organize battery of lens 6 after organizing battery of lens the 4, first reflecting mirror group 5 and projection before group 2, projection slit 3, projection to exist
Formed in current exposure region, substrate 7 surface and measure hot spot, after substrate 7 reflects, sequentially pass through group before imaging
Organize after battery of lens 10 after battery of lens the 8, second reflecting mirror group 9 and imaging, measure hot spot as be one rectangular
The detection hot spot of shape, described detection hot spot is received by detector 11, and calculates to adapt to through arithmetic element 12
The pattern skew etc. of substrate 7.
United States Patent (USP) US5834767 discloses a kind of focusing leveling device, includes a light source, a tool
Have collect light source emit beam function projection diaphragm, one have the detection diaphragm of ray-collecting function, one
Individual for diaphragm pattern is along inclined direction imaged on the first optical system of body surface, one be used for thing
The picture of surface is imaged on the second optical system on detection diaphragm, and forms More's bar on detection diaphragm
Stricture of vagina, separately has a photodetector, in order to detect by the position assembling light convergent point produced by Moire fringe
Put, and obtain the positional information of associated body surface according to the positional information of gained convergent point.
Above-mentioned patent is disadvantageous in that, if substrate is the glass substrate of different-thickness, then photodetector
On may detect light beam through glass substrate upper surface and lower surface formed two pictures, i.e. 0 time light respectively
(light of upper surface of base plate reflection) imaging and 1 light (light of base lower surface reflection) imaging, produce
The phenomenon of hot spot ghost image, affects the glass baseplate surface shape characteristic that detector detects, causes certainty of measurement
Can not be ensured.
In order to solve this defect, generally by using various sizes of projection diaphragm, thus reduce detection hot spot
Size, with the measurement of glass substrate of reply coupling different-thickness.But, this method can not be thorough
The end, solves the problems referred to above.
Summary of the invention
It is an object of the invention to provide a kind of focusing leveling device and focusing and leveling method, it is to avoid produce detection
The phenomenon of hot spot ghost image.
For solving above-mentioned technical problem, the present invention provides a kind of focusing leveling device, including lighting unit, throwing
Shadow unit, image-generating unit and probe unit, it is characterised in that described projecting cell includes spatial light modulator；
Wherein, the measurement hot spot of described lighting unit incides projecting cell, modulates through spatial light modulator, outgoing
To substrate, after described substrate reflects, enter described probe unit through described image-generating unit again.
Optionally, for described focusing leveling device, described lighting unit include light source, illuminating mirror group and
Optical fiber, described light source sends light after illuminating mirror group optically focused, optical fiber form measurement hot spot and send.
Optionally, for described focusing leveling device, described projecting cell also includes controlling device, projection
Organizing battery of lens after front group of battery of lens, the first reflecting mirror group and projection, described control device drives described spatial light
Modulators modulate measures hot spot.
Optionally, for described focusing leveling device, described image-generating unit include organizing before imaging battery of lens,
Organizing battery of lens after second reflecting mirror group and imaging, described measurement hot spot sequentially passes through described one-tenth after substrate reflects
As organizing battery of lens after front group of battery of lens, the second reflecting mirror group and imaging, form detection hot spot.
Optionally, for described focusing leveling device, described probe unit includes detector and arithmetic element,
Described detector receives described detection hot spot, forms light intensity signal, and described arithmetic element is believed according to described light intensity
Number calculate described substrate pattern.
Optionally, for described focusing leveling device, described detector also transmits signal and controls dress to described
Put, control whether described control device drives the modulation of described spatial light modulator to measure hot spot.
Optionally, for described focusing leveling device, described substrate is glass substrate.
The present invention provides a kind of method using focusing leveling device as above to carry out focusing and leveling, including
Following steps,
Substrate is provided,
Described lighting unit sends measurement hot spot and sequentially passes through described projecting cell, substrate and image-generating unit formation
Detection hot spot is detected unit and receives, if being judged to there is ghost image by described detector, the most described spatial light modulation
Hot spot is measured in device modulation, until ghost image disappears.
Optionally, for the method for described focusing and leveling, described spatial light modulator according to the thickness of substrate,
The size modulations of shadow surface measures hot spot.
Optionally, for the method for described focusing and leveling, after described spatial light modulator is modulated, described
Size Lp measuring hot spot is less than or equal to the one 0 light and the one 1 light distance Lw on substrate, then
Ghost image disappears；
DescribedWherein, d is the thickness of described substrate, and α is for measuring hot spot on substrate
Angle of incidence, n is the relative index of refraction of substrate.
Optionally, for the method for described focusing and leveling, the thickness d of described substrate in the range of
0.2mm~2mm。
Compared with prior art, in the focusing leveling device of present invention offer and focusing and leveling method, sky is used
Between photomodulator so that it is measurement hot spot can be modulated according to the thickness etc. of substrate, change the chi measuring hot spot
Very little, it is to avoid to produce the phenomenon of detection hot spot ghost image, thus improve detection accuracy, and then substrate is had relatively
Strong adaptability, and modulation is flexibly, convenient and reliable.
Accompanying drawing explanation
Fig. 1 is the optical profile type focusing leveling device schematic diagram of prior art；
Fig. 2 is the structural representation of the focusing leveling device of one embodiment of the invention；
Fig. 3 is that the measurement hot spot of one embodiment of the invention is at the distribution schematic diagram after substrate；
Fig. 4 is the one 0 light of one embodiment of the invention and the one 1 light distance on substrate and substrate
The function relation figure of thickness；
Fig. 5 is the schematic diagram that one embodiment of the invention solves detection hot spot ghost image；
Fig. 6 is the curve chart that 6 kinds of substrates are measured by the focusing leveling device of prior art；
Fig. 7 is that 6 kinds of identical substrates are measured by the focusing leveling device using one embodiment of the invention
Curve chart.
Detailed description of the invention
The focusing leveling device provided the present invention below in conjunction with the drawings and specific embodiments and method are made further
Describe in detail.According to following explanation and claims, advantages and features of the invention will be apparent from.Need
Bright, accompanying drawing all uses the form simplified very much, only real in order to aid in illustrating the present invention conveniently, lucidly
Execute the purpose of example.
The present invention provides a kind of focusing leveling device, refer to Fig. 2, including:
By the lighting unit including that light source 101, illuminating mirror group 102 and optical fiber are constituted, described light source 101 sends
Light, after illuminating mirror group 102 optically focused, is formed measurement hot spot by optical fiber and sends, be used for measuring use；
Projecting cell, before described projecting cell includes spatial light modulator 103a, control device 103b, projection
Battery of lens 106, described control device 103b is organized after group battery of lens the 104, first reflecting mirror group 105 and projection
Produce control signal and drive described spatial light modulator 103a so that measure hot spot and send corresponding change with the need
Dynamic, to adapt to measure needs；Before described measurement hot spot sequentially passes through described spatial light modulator 103a, projection
Organize battery of lens 106 after group battery of lens the 104, first reflecting mirror group 105 and projection and reach on substrate 107, specifically
, described substrate 107 is positioned on plummer 114, measures the current of incident described substrate 107 surface of hot spot
Exposure area (i.e. the underface of the optical axis A-A of projection objective 113) is formed measures hot spot, through substrate 107
After reflection, also pass through:
Image-generating unit, described image-generating unit includes multiple transflector mirror, concrete, including: according to measuring light
Speckle direction of transfer, organizes lens after organizing battery of lens the 108, second reflecting mirror group 109 and imaging before being arranged in order imaging
Group 110, arrives the detector 111 of probe unit afterwards, forms detection hot spot, and described detector 111 will be visited
Light-metering speckle is changed into light intensity signal (such as periodically variable light intensity signal) and is received by arithmetic element 112, from
And the pattern of substrate 107 is calculated by described light intensity signal, skew etc..Meanwhile, described detector also transmits letter
Number to described control device 103b, control whether described control device 103b drives spatial light modulator 103a
Hot spot is measured in modulation.
Here, described substrate 107 can be glass substrate, then can preferably show advantages of the present invention.
Provide below a kind of method that focusing leveling device as above carries out focusing and leveling, including:
Substrate is provided,
Lighting unit sends measurement hot spot and sequentially passes through described projecting cell, substrate and image-generating unit formation detection
Hot spot is detected unit and receives, if being judged to there is ghost image (i.e. measuring hot spot ghost image), then spatial light by detector
Modulators modulate measures hot spot, until ghost image disappears.Wherein, described spatial light modulator is according to the thickness of substrate
Degree, the size modulations of shadow surface (i.e. measuring hot spot) measure hot spot.
Make a concrete analysis of as follows: substrate has thickness d, enter with α angle after a series of optics when measuring hot spot
It is incident upon on substrate, when for glass substrate, it is easy to become and have 0 light and 1 light generation, refer to Fig. 3,
Spacing between described one 0 light 31 and the one 1 light 33 is Lp⊥, it is clear that, in order to avoid detection
Hot spot ghost image occurs, effective dimensions L of detection hot spot⊥(shape of described detection hot spot does not limits, effective at this
Size should be understood to produce length or the greatest length that the direction of ghost image is had, and shows in figure 3
Distance between one 0 light 31 and the 2nd 0 light 32) L should be less thanp⊥, i.e. should have measurement hot spot
Length Lp less than or equal to the one 0 light 31 and the one 1 light 33 distance Lw on substrate 107,
DescribedWherein, d is the thickness of substrate, and α is to measure hot spot angle of incidence on substrate,
N is the relative index of refraction of substrate.
Fig. 4 gives the function relation figure of Lp and d, and in the present embodiment, using relative index of refraction n is 1.5
Glass substrate, incident angle α is 75 °, the most finally Lw=1.6834d, then as Lp≤1.6834d,
Detection hot spot is without ghost image, the glass substrate that generally thickness can be used to be 0.2mm ~ 2mm, and measures the length of hot spot
Degree Lp is then generally higher than 10um.
Below in conjunction with Fig. 5, the focusing and leveling method of the present invention is elaborated: known when situation 51,
The i.e. thickness of substrate 107 is d1, and detection hot spot does not has ghost image (to omit light path in Fig. 5 through image-generating unit
Process), then when not modulating focusing leveling device, using thickness instead is d2(d2 < d1) substrate, then go out
Now as shown in situation 52, expose to have on the substrate 107 that thickness is d2 when measuring hot spot, measure hot spot
Length Lp=Lp1, and the one 0 light 31 and the one 1 light 32 distance Lw=Lw1 on substrate 107,
Now Lp > Lw, then the detection hot spot on detector 111 has ghost image.Now spatial light modulator is in control
The control modulated of device processed measures hot spot, until obtaining as shown in situation 53 so that measures hot spot and exposes to
Measure length Lp=Lp2 of hot spot during substrate 107, meet Lp2 < Lp1, and Lp2≤Lw1, then in detection
There is not ghost image in the detection hot spot received on device 111.Just the thick substrate surface shape at different-thickness has been reached
The measurement purpose of looks feature and position, improves detection accuracy.
Meanwhile, the present invention have chosen 6 kinds of different substrates targetedly, is respectively adopted in prior art and adopts
Measured with the focusing leveling device of projection diaphragm and the focusing leveling device of the present invention.Refer to Fig. 6
And Fig. 7, be can be seen that by Fig. 6, to SiN2Substrate and glass substrate occur in that detection hot spot weight in measuring
Shadow phenomenon, uses the focusing leveling device of the present invention then to obtain the result shown in Fig. 7: various substrates are the most not
Detection hot spot ghost phenomena occurs.As can be seen here, the present invention has more preferably reliability, it is possible to greatly carry
High measurement accuracy.
In the focusing leveling device of present invention offer and focusing and leveling method, use spatial light modulator so that it is
Measurement hot spot can be modulated according to the thickness etc. of substrate, change the size measuring hot spot, it is to avoid produce detection
The phenomenon of hot spot ghost image, thus improve detection accuracy, and then substrate is had stronger adaptability, and adjust
System is flexibly, convenient and reliable.
Obviously, those skilled in the art can carry out various change and modification without deviating from the present invention to invention
Spirit and scope.So, if the present invention these amendment and modification belong to the claims in the present invention and
Within the scope of equivalent technologies, then the present invention is also intended to change and including modification include these.
Claims (10)
1. use the method that focusing leveling device carries out focusing and leveling, described focusing leveling device to include shining
Bright unit, projecting cell, image-generating unit and probe unit, described projecting cell includes spatial light modulator；
Wherein, the measurement hot spot of described lighting unit incides projecting cell, modulates through spatial light modulator, outgoing
To substrate, after described substrate reflects, enter described probe unit through described image-generating unit again；Its feature
Being, the method for described focusing and leveling comprises the following steps:
Described substrate is provided,
Described lighting unit sends measurement hot spot and sequentially passes through described projecting cell, substrate and image-generating unit formation
Detection hot spot is detected unit and receives, if described detector judges to there is ghost image, and the most described spatial light modulator
Hot spot is measured in modulation, until ghost image disappears.
2. the method for focusing and leveling as claimed in claim 1, it is characterised in that described lighting unit includes
Light source, illuminating mirror group and optical fiber, described light source sends light after illuminating mirror group optically focused, optical fiber forms survey
Amount hot spot sends.
3. the method for focusing and leveling as claimed in claim 1, it is characterised in that described projecting cell also wraps
Battery of lens, wherein said control is organized after group battery of lens, the first reflecting mirror group and projection before including control device, projection
Device processed drives the modulation of described spatial light modulator to measure hot spot.
4. the method for focusing and leveling as claimed in claim 1, it is characterised in that described image-generating unit includes
Organizing battery of lens after organizing battery of lens, the second reflecting mirror group and imaging before imaging, described measurement hot spot reflects through substrate
After sequentially pass through organize battery of lens, the second reflecting mirror group and imaging before described imaging after organize battery of lens, form detection
Hot spot.
5. the method for focusing and leveling as claimed in claim 4, it is characterised in that described probe unit includes
Detector and arithmetic element, described detector receives described detection hot spot, forms light intensity signal；Described computing
Unit calculates the pattern of described substrate according to described light intensity signal.
6. the method for focusing and leveling as claimed in claim 3, it is characterised in that described detector transmission letter
Number to described control device, control whether described control device drives the modulation of described spatial light modulator to measure light
Speckle.
7. the method for focusing and leveling as claimed in claim 1, it is characterised in that described substrate is glass base
Plate.
8. the method for focusing and leveling as claimed in claim 1, it is characterised in that described spatial light modulator
Thickness, the size modulations of shadow surface according to substrate measure hot spot.
9. the method for focusing and leveling as claimed in claim 8, it is characterised in that through described spatial light modulation
After device modulation, length Lp of described measurement hot spot is the distance on substrate less than or equal to 0 light and 1 light
Lw, then ghost image disappears；
DescribedWherein, d is the thickness of described substrate, and α is for measuring hot spot on substrate
Angle of incidence, n is the relative index of refraction of substrate.
10. the method for focusing and leveling as claimed in claim 9, it is characterised in that the thickness d of described substrate
In the range of 0.2mm～2mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210485158.3A CN103838088B (en) | 2012-11-23 | 2012-11-23 | A kind of focusing leveling device and focusing and leveling method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210485158.3A CN103838088B (en) | 2012-11-23 | 2012-11-23 | A kind of focusing leveling device and focusing and leveling method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103838088A CN103838088A (en) | 2014-06-04 |
| CN103838088B true CN103838088B (en) | 2016-12-07 |
Family
ID=50801750
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210485158.3A Active CN103838088B (en) | 2012-11-23 | 2012-11-23 | A kind of focusing leveling device and focusing and leveling method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103838088B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106292197B (en) * | 2015-05-24 | 2018-03-30 | 上海微电子装备（集团）股份有限公司 | A kind of focusing leveling device and method based on image processing techniques |
| CN106933071B (en) * | 2015-12-30 | 2019-01-29 | 上海微电子装备（集团）股份有限公司 | Focusing leveling device and method |
| CN106933044B (en) * | 2015-12-30 | 2019-03-12 | 上海微电子装备（集团）股份有限公司 | The defocus slope compensating device and method of focusing and leveling |
| CN109443210A (en) * | 2018-12-13 | 2019-03-08 | 苏州亿拓光电科技有限公司 | Optical position detection device and method |
| CN112731773B (en) * | 2020-12-31 | 2024-04-16 | 中国科学院微电子研究所 | Electron beam exposure machine, focusing method and device |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5633721A (en) * | 1991-10-30 | 1997-05-27 | Nikon Corporation | Surface position detection apparatus |
| JP2002196222A (en) * | 2000-12-25 | 2002-07-12 | Nikon Corp | Plane position detector and aligner |
| CN101201549A (en) * | 2007-11-30 | 2008-06-18 | 北京理工大学 | Device and method for focusing and leveling based on microlens array |
| CN101344734A (en) * | 2007-12-28 | 2009-01-14 | 上海微电子装备有限公司 | Silicon slice focusing and leveling measurement device |
| CN102033438A (en) * | 2009-09-29 | 2011-04-27 | 上海微电子装备有限公司 | Focusing and levelling device with expandable measuring range and focusing and levelling method |
| CN102768469A (en) * | 2011-05-03 | 2012-11-07 | 上海微电子装备有限公司 | Focusing and bisecting system and adjustment method thereof |
-
2012
- 2012-11-23 CN CN201210485158.3A patent/CN103838088B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5633721A (en) * | 1991-10-30 | 1997-05-27 | Nikon Corporation | Surface position detection apparatus |
| JP2002196222A (en) * | 2000-12-25 | 2002-07-12 | Nikon Corp | Plane position detector and aligner |
| CN101201549A (en) * | 2007-11-30 | 2008-06-18 | 北京理工大学 | Device and method for focusing and leveling based on microlens array |
| CN101344734A (en) * | 2007-12-28 | 2009-01-14 | 上海微电子装备有限公司 | Silicon slice focusing and leveling measurement device |
| CN102033438A (en) * | 2009-09-29 | 2011-04-27 | 上海微电子装备有限公司 | Focusing and levelling device with expandable measuring range and focusing and levelling method |
| CN102768469A (en) * | 2011-05-03 | 2012-11-07 | 上海微电子装备有限公司 | Focusing and bisecting system and adjustment method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103838088A (en) | 2014-06-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6862097B2 (en) | Three-dimensional shape measuring method, and three-dimensional shape measuring apparatus | |
| CN103838088B (en) | A kind of focusing leveling device and focusing and leveling method | |
| CN101210806B (en) | measuring method of angle deviation along azimuth axis direction and pitching angle deviation of laser emission axis and mechanical base level normal based on secondary light source | |
| CN101446775B (en) | Alignment light source apparatus | |
| CN104749901B (en) | A kind of focusing leveling device | |
| US20140160267A1 (en) | Image Pickup Apparatus | |
| CN110207588A (en) | A kind of prism of corner cube optical apex sighting device and its Method of Adjustment | |
| CN103676487B (en) | A kind of workpiece height measurement mechanism and bearing calibration thereof | |
| CN112577446A (en) | In-place surface shape splicing measuring device and method for large-caliber planar optical element | |
| KR20200109360A (en) | Projection of structured light for mirror surfaces | |
| CN108646396A (en) | Auto-focusing microscopic system | |
| CN101581580B (en) | Spatial digitalized method and spatial digitalized device for land measurement | |
| CN106248353B (en) | Larger Dynamic laser far field focal spot measuring system and measurement method based on digital micro-mirror | |
| CN107450287B (en) | Focusing and leveling measurement apparatus and method | |
| CN105807570A (en) | Self-adaptive trench focusing and leveling device and method thereof | |
| JP2015108582A (en) | Three-dimensional measurement method and device | |
| CN103278179B (en) | Space camera field curvature pick-up unit and detection method | |
| CN104280851B (en) | A kind of focusing and leveling itself zero plane adjusting apparatus and method | |
| CN102096337B (en) | Device for detecting eccentricity and focal surface position of spherical surface or curved surface in projection photoetching | |
| CN102207694A (en) | Imaging adjustment unit and focusing and leveling control system using the unit | |
| CN104880913A (en) | Focusing-leveling system for increasing process adaptability | |
| CN103969961A (en) | Focusing and leveling system | |
| CN106814547B (en) | A kind of detecting and correcting device and survey calibration method | |
| CN108827595A (en) | Detection device based on adaptation theory optical system mismachining tolerance | |
| CN105807571B (en) | A kind of litho machine focusing and leveling system and its focusing and leveling method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |
|
| CP01 | Change in the name or title of a patent holder |