CN112557701A - Micro-nano force value standard measuring device based on reference beam method and source tracing method thereof - Google Patents

Micro-nano force value standard measuring device based on reference beam method and source tracing method thereof Download PDF

Info

Publication number
CN112557701A
CN112557701A CN202011545543.3A CN202011545543A CN112557701A CN 112557701 A CN112557701 A CN 112557701A CN 202011545543 A CN202011545543 A CN 202011545543A CN 112557701 A CN112557701 A CN 112557701A
Authority
CN
China
Prior art keywords
cantilever
micro
measured
displacement
force value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202011545543.3A
Other languages
Chinese (zh)
Inventor
蒋继乐
周惠言
张叶
吴实
吴鲲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Metrology
Original Assignee
National Institute of Metrology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Institute of Metrology filed Critical National Institute of Metrology
Priority to CN202011545543.3A priority Critical patent/CN112557701A/en
Publication of CN112557701A publication Critical patent/CN112557701A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q40/00—Calibration, e.g. of probes
    • G01Q40/02—Calibration standards and methods of fabrication thereof
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

The invention provides a micro-nano force value standard device based on a reference beam method and a tracing method thereof, wherein the system comprises the following steps: the system comprises a cantilever to be measured, a known cantilever, a camera, a linear array light source, a nanometer micro-motion platform, a cantilever position coarse adjustment unit to be measured, a known cantilever position coarse adjustment unit and a horizontal observation adjustment unit; the micro-motion platform is used for enabling the tested cantilever and the known cantilever to be in contact with each other; the measured cantilever position coarse adjusting unit is used for realizing the displacement adjustment and the angle adjustment of the nanometer micro-motion stage; the known cantilever position coarse adjustment unit is used for ensuring that the center of a cross reticle of the known cantilever beam is positioned right below the tip of the cantilever to be measured; the camera is used for displaying and recording the position states of the known cantilever and the detected cantilever in real time; in the tracing method, the rigidity of the cantilever can be obtained by comparing the number of the pixel points moved by the two cantilevers. The rigidity value of the known cantilever is measured by utilizing the prior art, and then the measured cantilever is subjected to magnitude tracing.

Description

Micro-nano force value standard measuring device based on reference beam method and source tracing method thereof
Technical Field
The invention relates to the field of micro-force value measurement and test, in particular to a micro-nano force value standard device based on a reference beam method and a tracing method thereof.
Background
With the continuous development of science and the great change of international system of units, the testing and metering technology is continuously expanded to the nanometer and sub-nanometer directions, the micro-nano processing and micro-nano detection technology becomes the hot content of the current scientific research, and the micro-force value measuring technology is rapidly developed for decades. However, the magnitude traceability system of minute force values has not been fully established. A metering standard device and an effective tracing method for tracing to the range of (nN-mN) of SI units are still lacking in China.
The force value tracing method can be divided into two methods, namely force value tracing based on electrostatic force and force value tracing based on a quality comparator. The force value tracing method based on the mass comparator is mainly realized by means of objects with certain rigidity, such as micro-cantilevers and swinging plates. The tracing system is characterized in that a high-precision quality comparator is compared with a quality standard, and the product of the quality and the local gravity acceleration is a force value. The force value is further transmitted by contacting the rigid bodies such as the micro cantilever beam with the mass comparator, and the force value generated by the mass comparator is expressed by the product of cantilever stiffness and displacement deflection (namely deflection). However, the accuracy of the mass comparator is limited and there is a certain zero drift, so that the accuracy of the force value below 100nN cannot be guaranteed. At this time, a rigid body such as a micro-cantilever beam is needed, so that higher-precision force value tracing is realized.
The micro-cantilever sensor is a mechanical sensing unit of an Atomic Force Microscope (AFM) and is an important tool for connecting macro mechanics and micro mechanics. The micro-cantilever has the advantages of low cost, small volume, high sensitivity and the like, so the micro-cantilever is widely applied to the aspects of production and manufacture, scientific research, biological medical treatment and the like, and is an ideal choice for a sensor with high precision and high sensitivity. Is also one of the important tools for realizing the trace of the tiny force value.
The micro-cantilever is divided into an AFM cantilever and a tiples cantilever. The AFM cantilever is characterized in that the lower end of the AFM cantilever is provided with a needle point, and the AFM cantilever is mainly used for detecting the surface appearance and the like. The rigidity detection method of the micro-cantilever comprises the following steps: precision balance methods, reference beam methods, additional mass methods, indenter methods, thermal noise methods, and the like. In the above methods, only the precision balance method and the reference beam method have the quantity value traceability, and most force value traceability methods based on the micro-cantilever beam rigidity are performed by adopting the precision balance method. However, tracing the force value based on the balance method has the problems of too long calibration time, deviation of loading position and the like, and the micro-cantilevers need to be calibrated one by one, so that the process is complex and the consumed time is too long. The traditional reference beam method also has the problems of over-high uncertainty and over-low precision, and the uncertainty of measurement is as high as 20%.
Disclosure of Invention
In order to solve the problems of the balance method probe loading deviation and the over-high uncertainty caused by the reference beam method in the prior art, the invention provides a micro-nano force value standard device based on the reference beam method and a tracing method thereof. The cantilever position coarse adjusting unit is adopted to adjust the known rigidity and the measured cantilever in the displacement direction of XYZ axes, and the positioning part reduces the straightness accuracy and improves the positioning accuracy. The piezoelectric ceramic micro-motion platform adopted by the fine adjustment part has a guiding function, and the stress directions of the two cantilevers are always consistent with the vertical direction in the whole measurement process; the image processing unit is adopted to capture and process the state of the two cantilevers in real time when the two cantilevers are pressed against each other, and the probe tip of the cantilever to be tested and the center of the cross reticle of the known cantilever are ensured to be in an alignment state in the vertical direction; in the tracing method, the rigidity of the cantilever to be measured is calibrated through the known rigidity of the cantilever, and the cantilever with the known rigidity is calibrated by using the device described in patent CN104266792A, wherein the calibration comprises the steps of correcting the rigidity of the balance by electromagnetic compensation and the installation angle of the micro-cantilever to be measured to correct the elastic constant of the micro-cantilever, correcting the force value sensitivity of the micro-force sensor by using the installation angle of the micro-force sensor, and the like.
The invention has the innovation points that a precision balance method is combined with a reference beam method for the first time, the rigidity of the cantilever of the reference beam is calibrated by using an image processing method for the first time, and the cantilever with known rigidity has a rigidity value with very low uncertainty (the uncertainty is lower than 1.2%), so that the measured cantilever is calibrated by using the high-precision cantilever, the uncertainty can be obviously reduced, and higher accuracy can be obtained.
In order to solve the technical problems, the technical scheme adopted by the invention is as follows:
a micro-nano force value standard device based on a reference beam method comprises an AFM micro-cantilever to be tested (called a tested cantilever (8) for short) which is fixed on a first mounting rod (7). And the nano micro-motion platform (5) is connected with the cantilever (8) to be tested through the adapter (2), (6) and the first mounting rod (7) and is used for enabling the cantilever (8) to be tested to do linear motion along the Z axis so as to be in contact with the cantilever (11) with known rigidity. The measured cantilever position coarse adjustment unit is connected with the nano micro-motion stage (5) and is used for realizing displacement adjustment and angle adjustment of the micro-motion stage in the directions of an X axis, a Y axis and a Z axis; the known cantilever position coarse adjustment unit is opposite to the measured cantilever position coarse adjustment unit and is used for adjusting X-axis, Y-axis and Z-axis displacements of the cantilever (11) with known rigidity, and the center of a cross reticle of a probe of the known cantilever is ensured to be positioned right below the tip of the measured cantilever. And the CCD camera (12) is positioned at the side edge of the coarse adjustment unit of the position of the cantilever to be measured and is used for displaying the position states of the known cantilever and the cantilever to be measured in real time.
The measured cantilever position coarse adjustment unit is composed of a three-dimensional displacement table (3), a manual angular displacement table (2) and a lifting table (1) which are sequentially connected from top to bottom.
The known cantilever position coarse adjustment unit is composed of a two-dimensional displacement table (9) and a lifting table (1), wherein the two-dimensional displacement table (9) is used for changing the position in the XY direction, and the lifting table (1) is used for adjusting the height.
The control calculation unit consists of a control module, an acquisition module and an image processing module, and the control module is used for driving and controlling the displacement of the micropositioner (5); the acquisition module is used for acquiring images captured by the camera lens; the image processing module is used for processing the acquired image through image sharpening, threshold segmentation, edge extraction and edge detection modes, so that pixel point changes in the motion process of the two cantilevers are obtained respectively, and the rigidity value of the detected cantilever is calculated.
The CCD camera (12) and the linear array light source (13) are both arranged on the horizontal observation adjusting unit, and the height, the angle and the horizontal displacement are adjusted by the horizontal observation adjusting unit;
the horizontal observation adjusting unit consists of a lifting platform (1), an angular displacement platform (2) and a two-dimensional displacement platform (9) and is used for adjusting the height, the angle and the horizontal displacement of the CCD camera (12) and the linear array light source (13). And the linear array light source (13) is opposite to the lens of the CCD camera (12), the two cantilevers are positioned between the lens and the light source, and the lens, the cantilevers and the light source are positioned at the same optical axis.
The known arm beam (11) is made of monocrystalline silicon.
And the nanometer micro-motion platform (5) controls displacement through an upper computer interface.
Furthermore, a vibration isolation optical platform is arranged and used for placing the nanometer micro-motion platform, the known cantilever position coarse adjustment unit, the measured cantilever position coarse adjustment unit, the horizontal observation adjustment unit and the linear array light source (13).
Furthermore, a sealing cover is arranged on the vibration isolation optical platform and used for covering the nanometer micro-motion platform, the known cantilever position coarse adjustment unit, the measured cantilever position coarse adjustment unit, the horizontal observation adjustment unit and the linear array light source (13).
The linear array light source (13) is connected with an 8-bit light intensity controller and is used for adjusting the illumination intensity.
The invention also provides a micro-nano force value standard device based on a reference beam method, and a method for tracing the elastic constant of the tested micro cantilever or the force value sensitivity of the micro force sensor, which comprises the following steps:
the stiffness of the tipples cantilever (11) is calibrated by a precision balance method and used as a test for a known cantilever, and a balance measuring head is just loaded to the center of the cross reticle of the tipples cantilever in the calibration process.
The height of the CCD camera (12) and the brightness of the linear array light source (13) are adjusted, the CCD camera (12) is subjected to pixel calibration by using a resolution plate USAF1951, and the quantity relation between pixels and displacement is determined.
Adjusting the position coarse adjustment unit of the known cantilever to enable the known cantilever (11) to be positioned on the same optical axis with the camera and the light source, and a clear image of the known cantilever (11) can be observed through the camera;
adjusting the position coarse adjustment unit of the cantilever to be measured to ensure that the image definition of the known cantilever is consistent with that of the cantilever to be measured, the cantilever to be measured is just above the known cantilever, the probe tip of the cantilever to be measured is aligned with the center of the cross reticle of the known cantilever in the vertical direction, the cantilevers are close to but not in contact with each other, and the camera takes the image of the position of the cantilever at the moment;
the control module of the control computing unit drives the nano micro-motion stage (5) connected with the detected cantilever (8) to enable the nano micro-motion stage (5) to drive the detected cantilever (8) to move along the Z-axis direction, so that the two cantilevers are in mutual contact and generate elastic deformation;
the output data of the images of the nanometer micro-motion stage (5) and the CCD camera (12) are collected, the images are processed in the modes of edge detection, corner point detection and the like, and the known cantilever displacement is determined according to the pixel points calibrated in the step S1, so that the conclusion is verified through a formula of a reference beam method, and the force value tracing is realized.
The images before and after the two cantilevers are in contact deformation are collected, the cantilevers can be controlled to move periodically to collect for many times, and the known cantilevers are regular rectangular cantilevers, so that feature extraction is easy to perform. Therefore, the vertical coordinates of the center points of the upper edge and the lower edge can be obtained by extracting and detecting the edge of the cantilever, and the pixel point and the displacement of the cantilever can be obtained by calculating the coordinate difference value of the center points of the known cantilever before and after the displacement occurs. And determining the rigidity value of the cantilever to be measured according to the relation between the displacement and the pixel points in the calibration process. The rigidity value can be expressed by the following relational expression:
kit is known thatxIt is known that＝kIs measured(xIt is known that-xMicro-motion platform)
Wherein k isIs measured、kIt is known thatStiffness values, x, of the measured and known cantilevers, respectivelyIt is known thatFor known displacement deflection of the cantilever, the amount of deflection can be determined by the variation of the pixel and the resolution plateAnd calibrating to calculate. x is the number ofMicro-motion platformThe displacement of the nano micro-motion stage is obtained directly through the nano micro-motion stage.
By calibration, the camera used in the invention has pixels of 6.0064 points which are 1 μm. The nominal rigidity of the cantilever to be measured is 0.11N/m
The experimental test results of the present invention are now disclosed as follows
Figure BDA0002856104860000061
Therefore, the method has a good calibration effect, and the measurement uncertainty can be controlled within 5%.
The features and content of these solutions will be better understood by those skilled in the art from reading the present description.
Advantageous effects
The invention has the beneficial effect of providing the system and the method for calibrating the AFM micro-cantilever probe. The uncertainty of the AFM cantilever probe directly calibrated by a balance method is reduced, and the measurement precision of a reference beam method is improved by CCD images. The deviation caused by the problems that the traditional reference beam method is easy to slide, the contact point is inaccurate and the like is greatly reduced.
Drawings
FIG. 1 is a schematic view of a measuring device of the present invention
FIG. 2 is a schematic diagram of the cantilever position relationship of the present invention
FIG. 3 is a flowchart of the tracing method and system of the present invention
1: the lifting platform 2: angular displacement table 3: three-dimensional displacement platform
4: the adaptor 15: a nanometer micropositioner 6: adapter 2
7: first mounting rod 8: the tested cantilever 9: two-dimensional displacement table
10: second mounting rod 11: as is known, the cantilever 12: CCD camera
13: linear array light source
Detailed Description
As shown in fig. 1, the invention provides a micro-nano force value standard device based on a reference beam method, which comprises: a cantilever (11) of known stiffness, which is a tipless cantilever, has a cross-hatch at its end for determining the loading position. The cantilever stiffness is measured by means of the device described in patent CN104266792A and is fixed to the second mounting bar (10). A second mounting bar (10) is secured above the coarse tuning unit at a known boom position.
The known cantilever position coarse tuning unit comprises: a lifting platform (1) and a two-dimensional displacement platform (9). The lifting platform (1) is used for adjusting the Z-direction height of the known cantilever (11), and the two-dimensional displacement platform (9) is used for adjusting the X, Y-direction displacement of the known cantilever (11).
And the tested cantilever (8) is fixed on the first mounting rod (7). The nanometer micro-motion platform (5) is connected with the first mounting rod (7) through the adapter pieces (2), (6). The measuring range of the nanometer micro-motion platform (5) is 100 micrometers, and the cantilever (8) to be measured of the beam is controlled to do linear motion along the Z axis through driving software, so that the fine tuning of the position of the cantilever and the micron-level mutual pressing are realized.
The measured cantilever position coarse adjustment unit comprises a three-dimensional displacement table (3), an angle displacement table (2) and a lifting table (1). The three-dimensional displacement platform (3) is connected with the nanometer micromotion platform (5) through an adapter piece 1(4) and is used for realizing displacement adjustment of the nanometer micromotion platform (5) in the directions of an X axis, a Y axis and a Z axis, and the measuring range of the displacement platform is 50 mm; the angle displacement table (2) is arranged right below the three-dimensional displacement table (3) and used for adjusting the angle of the cantilever (8) to be measured, and the measuring range is +/-10 degrees; the lifting platform (1) is arranged right below the angle displacement platform (2) and used for roughly adjusting the height of the nanometer micro-motion platform (5), and the measuring range of the lifting platform is 60 mm. By adjusting this part, it is ensured that the tip of the cantilever under test is located right above the center of the cross-shaped scribe line of the known cantilever, and the schematic diagram is shown in fig. 2.
The CCD camera (12) is positioned at the side edge of the measured cantilever position coarse adjustment unit and is used for displaying the position states of the known cantilever (11) and the measured cantilever (8) in real time;
and the linear array light source (13) is opposite to the CCD camera (12), the tested cantilever (8) and the known cantilever (11) are positioned between the lens and the light source, and the lens, the cantilever and the light source are positioned at the same optical axis.
The horizontal observation adjusting unit consists of a lifting platform (1), an angular displacement platform (2) and a two-dimensional displacement platform (9) and is used for adjusting the height, the angle and the horizontal displacement.
The CCD camera (12) and the linear array light source (13) are both arranged on the horizontal observation adjusting unit, and the height, the angle and the horizontal displacement are adjusted by the horizontal observation adjusting unit;
the devices not shown in the figures are: and the vibration isolation optical platform is used for placing the nano micro-motion platform (5), the known cantilever position coarse adjustment unit, the unknown cantilever position coarse adjustment unit, the horizontal observation adjustment unit, the LED backlight light source and the like. And the sealing cover is positioned on the vibration isolation optical platform and used for covering the nanometer micro-motion platform, the known cantilever position coarse adjustment unit, the unknown cantilever position coarse adjustment unit, the horizontal observation adjustment unit and the LED backlight light source, so that the measuring device is protected from reducing the interference of air flow.
The measurement units not shown in the figure are: the control calculation unit consists of a control module, an acquisition module and an image processing module, and the control module is used for driving and controlling the displacement of the micropositioner (5); the acquisition module is used for acquiring the relative position of the nano micro-motion stage (5) and storing the image of the cantilever displayed at the moment; the image processing module is used for processing the acquired image through edge detection, threshold segmentation, angular point detection and other modes, so that pixel point changes in the motion process of the two cantilevers are obtained respectively, and the rigidity value of the detected cantilever is calculated.
Based on the system, the invention also provides a source tracing method of the micro-nano force value standard measuring device based on the reference beam method, which comprises the following steps:
s1: the known cantilever (11) was calibrated for stiffness by the device described in patent CN104266792A, and the experimentally used CCD camera (12) was calibrated for pixels by the resolution board USAF1951, and the quantitative relationship between pixels and displacements was determined.
S2: the method comprises the steps of adjusting a known cantilever position rough adjusting unit and a horizontal observation adjusting unit below a CCD camera (12) respectively, searching an imaging position of the known cantilever (11) on the camera, ensuring that the known cantilever (11) can be imaged on a focal plane of the camera, determining the distance between the known cantilever (11) and the CCD camera (12) in the X direction, and ensuring that the Z-direction height and the Y-direction displacement of the known cantilever (11) are both in the visual field range of the CCD camera (12).
S3: as shown in fig. 2, the coarse adjustment unit adjusts the position of the cantilever to be measured, and ensures that the two cantilevers are located on the focal plane of the CCD camera (12) in the X direction, the probe tip of the cantilever to be measured (8) in the Y direction is aligned with the center of the cross reticle of the known cantilever (11), and the two cantilevers in the Z direction are in a close but non-contact state. And are all imaged within the field of view of the CCD camera (12).
S4: the control module of the control computing unit drives the nanometer micro-motion platform (5) connected with the detected cantilever (8), so that the nanometer micro-motion platform (5) drives the detected cantilever (8) to move up and down along the Z-axis direction, and the detected cantilever is contacted with the known cantilever (11) and generates flexural deformation. And images of different positions of the cantilever in the motion process are recorded by controlling an image acquisition module and a CCD camera of the calculation unit.
S5: acquiring output data of images of the nano micro-motion stage (5) and the CCD camera (12), processing the images in an edge detection mode, and determining the displacement of the known cantilever according to the pixel points calibrated in the step S1, so that the rigidity of the cantilever to be detected is calculated by a formula of a reference beam method;
and S6, tracing the force value according to the obtained cantilever stiffness. The tracing process is common knowledge and will not be described in detail here, and the details are shown in fig. 3.
Note that:
1. because the measuring range of the nano micro-motion platform of the device is 100 mu m, the magnification of the camera has great influence on the experimental measurement result, and the magnification of the camera required to be used reaches more than 5 times to ensure the reliability of the experimental result.
2. In the reference beam method, the displacement of the cantilever movement is proportional to the rigidity thereof, so the larger the rigidity difference is, the larger the displacement difference in the movement process is, which is more unfavorable for force value traceability. In order to ensure that the rigidity values of the two cantilevers used in the experiment should be within 3 times.
3. When the displacement of the cantilever motion is too large, the AFM cantilever to be measured can not only be longitudinally displaced, but also be deflected, and the influence on the measurement result is great. And when the force between the two cantilevers is too large, the cantilevers are also known to be angularly deflected. Therefore, the displacement change of the tested cantilever in the measuring process needs to be kept within 50 μm. Preferably within 30 μm, to ensure that the known cantilever beams used do not deflect more than 1 deg., so that the effect of angular deflection is negligible.
While one embodiment of the present invention has been described in detail, the description is only a preferred embodiment of the present invention and should not be taken as limiting the scope of the invention. All equivalent changes and modifications made within the scope of the present invention shall fall within the scope of the present invention.

Claims (9)

1. A micro-nano force value standard measuring device based on a reference beam method is characterized by comprising the following steps: the device comprises a tested cantilever (8), a known cantilever (11), a CCD camera (12), a linear array light source (13), a nanometer micro-motion platform (5), an adapter piece 1(4), an adapter piece 2(6), a first mounting rod (7), a second mounting rod (10), a tested cantilever position rough adjusting unit, a known cantilever position rough adjusting unit and a horizontal observation adjusting unit;
the nanometer micro-motion platform (5) is connected with the detected cantilever (8) sequentially through the adaptor (2), (6) and the first mounting rod (7) and is used for enabling the detected cantilever (8) to do linear motion along the Z axis so as to be contacted with the known cantilever (11);
the measured cantilever position coarse adjustment unit is connected with the nano micro-motion stage (5) and is used for realizing displacement adjustment and angle adjustment of the nano micro-motion stage (5) in the directions of an X axis, a Y axis and a Z axis;
the known cantilever position coarse adjustment unit is opposite to the measured cantilever position coarse adjustment unit and is used for adjusting the displacement of the known-stiffness cantilever (11) in the X-axis, Y-axis and Z-axis directions and ensuring that the center of a cross reticle of a probe of the known cantilever (11) is positioned right below the needle point of the measured cantilever (8);
the CCD camera (12) is positioned on the side edge of the measured cantilever position coarse adjustment unit and used for displaying and recording the position states of the known cantilever and the measured cantilever in real time;
the CCD camera (12) and the linear array light source (13) are both arranged on the horizontal observation adjusting unit, the height, the angle and the horizontal displacement are adjusted by the horizontal observation adjusting unit, the linear array light source (13) is opposite to a lens of the CCD camera (12), the two cantilevers are positioned between the lens and the light source, and the lens, the cantilevers and the light source are positioned at the same optical axis.
2. The micro-nano force value standard measuring device based on the reference beam method according to claim 1, characterized in that: the measured cantilever position coarse adjustment unit comprises a three-dimensional displacement table (3), an angular displacement table (2) and a lifting table (1) which are sequentially connected from top to bottom, and a nanometer micro-motion table (5) is connected with the three-dimensional displacement table (3) through a connector (1) (4).
3. The micro-nano force value standard measuring device based on the reference beam method according to claim 1, characterized in that: the known cantilever position coarse adjustment unit is composed of a two-dimensional displacement table (9) and a lifting table (1) which are sequentially connected from top to bottom, the two-dimensional displacement table (9) is used for changing the position in the XY direction, and the lifting table (1) is used for adjusting the height.
4. The micro-nano force value standard measuring device based on the reference beam method according to claim 1, characterized in that: the horizontal observation and adjustment unit consists of a lifting platform (1), an angular displacement platform (2) and a two-dimensional displacement platform (9) which are sequentially connected from bottom to top; the cantilever (11) is connected to the two-dimensional displacement table (9) by means of a second mounting bar (10).
5. The micro-nano force value standard measuring device based on the reference beam method according to claim 1, characterized in that: a control calculation unit is further arranged and comprises a control module, an acquisition module and an image processing module; the control module is used for driving and controlling the displacement of the micropositioner (5); the acquisition module is used for acquiring images captured by the camera lens; and the image processing module is used for processing the acquired image through edge sharpening, threshold segmentation, edge extraction and edge detection modes, so that pixel point changes in the motion process of the two cantilevers are respectively obtained, and the rigidity value of the detected cantilever is calculated.
6. The micro-nano force value standard measuring device based on the reference beam method according to claim 1, characterized in that:
further, a vibration isolation optical platform is arranged and used for placing the nanometer micro-motion platform, the known cantilever position coarse adjustment unit, the measured cantilever position coarse adjustment unit, the horizontal observation adjustment unit and the linear array light source (13);
further, a sealed cover is arranged and positioned on the vibration isolation optical platform.
7. The micro-nano force value standard measuring device based on the reference beam method according to claim 1, characterized in that: the known arm beam (11) is made of monocrystalline silicon and is in a rectangular cantilever shape; one end of the cantilever (8) to be detected is provided with a probe, and the probe is contacted with the known cantilever beam (11) to generate elastic deformation; and the nanometer micro-motion platform (5) controls displacement through an upper computer interface.
8. The micro-nano force value standard measuring device based on the reference beam method according to claim 1, characterized in that: the linear array light source (13) is connected with an 8-bit light intensity controller to adjust the illumination intensity.
9. A micro-nano force value tracing method based on a reference beam method is characterized by comprising the following steps:
s1, calibrating the rigidity of the known cantilever (11) by a precision balance method, and using the rigidity as a test of the known cantilever, wherein in the calibration process, a balance measuring head is just loaded to the center of a cross reticle of the known cantilever (11); adjusting the height of the CCD camera (12) and the brightness of the linear array light source (13), performing pixel calibration on the CCD camera (12) by using a resolution board, and determining the quantity relation between pixels and displacement;
s2, adjusting the position of the known cantilever to a coarse adjusting unit, so that the known cantilever (11) and the camera and the light source are positioned on the same optical axis, and the camera can observe a clear image of the known cantilever (11);
s3, adjusting the coarse adjusting unit of the position of the cantilever to be measured to ensure that the image definition of the known cantilever is consistent with that of the cantilever to be measured, the cantilever to be measured is just above the known cantilever, the probe tip of the cantilever to be measured is aligned with the center of the cross reticle of the known cantilever in the vertical direction, the cantilevers are close to but not in contact with each other, and the camera takes the image of the position of the cantilever at the moment;
s4, driving the nanometer micro-motion stage (5) connected with the detected cantilever (8) through a control module of the control calculation unit, so that the nanometer micro-motion stage (5) drives the detected cantilever (8) to move along the Z-axis direction, and the two cantilevers are in mutual contact and generate elastic deformation;
s5, acquiring output data of images of the nano micro-motion stage (5) and the CCD camera (12), processing the images in the modes of edge sharpening, threshold segmentation edge extraction and detection, and determining the displacement of the known cantilever and the displacement of the cantilever to be detected according to the relationship between the camera pixel point and the displacement calibrated in the step S1, so that the rigidity of the cantilever to be detected is calculated by a formula of a reference beam method;
and S6, tracing the force value according to the obtained rigidity.
CN202011545543.3A 2020-12-24 2020-12-24 Micro-nano force value standard measuring device based on reference beam method and source tracing method thereof Pending CN112557701A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202011545543.3A CN112557701A (en) 2020-12-24 2020-12-24 Micro-nano force value standard measuring device based on reference beam method and source tracing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202011545543.3A CN112557701A (en) 2020-12-24 2020-12-24 Micro-nano force value standard measuring device based on reference beam method and source tracing method thereof

Publications (1)

Publication Number Publication Date
CN112557701A true CN112557701A (en) 2021-03-26

Family

ID=75031966

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202011545543.3A Pending CN112557701A (en) 2020-12-24 2020-12-24 Micro-nano force value standard measuring device based on reference beam method and source tracing method thereof

Country Status (1)

Country Link
CN (1) CN112557701A (en)

Similar Documents

Publication Publication Date Title
KR101078995B1 (en) Probe card inclination adjusting method, inclination detecting method and storage medium storing a program for perfroming the inclination detecting method
KR101053014B1 (en) Alignment method, needle position detection device and probe device
Weckenmann et al. Probing systems for dimensional micro-and nano-metrology
CN108225213A (en) The non-contact dimensionality reduction error separate detection method of free form surface and device
EP2090861A1 (en) Method of measuring front and back surfaces of target object
CN108362221A (en) A kind of free form surface pattern nano-precision detection method and device
CN104266792B (en) A kind of micro-nano force value standard set-up based on electromagnetic compensation balance and source tracing method thereof
KR20070100373A (en) Scanning probe microscope and its measuring method
JP2005069972A (en) Method for controlling travel in probe in scanning probe microscope
EP2085739A1 (en) Probe straightness measuring method
US9689892B2 (en) Scanning probe microscope
CN110514138A (en) A kind of shape measurement system and method based on probe self gravity
US20100031402A1 (en) Probe aligning method for probe microscope and probe microscope operated by the same
JP4033468B2 (en) Nozzle tip position measuring device and spotting device using the same
CN215297436U (en) Micro-nano force value standard measuring device based on reference beam method
CN110954019B (en) Large-inclination-angle free-form surface measuring method and device based on reference plane comparison measurement
Dai et al. Measurement of micro-roughness using a metrological large range scanning force microscope
CN102707094B (en) Method and device for detecting atomic force microscopic scanning of tri-scanner atomic
CN112557701A (en) Micro-nano force value standard measuring device based on reference beam method and source tracing method thereof
JPH08233836A (en) Scanning probe microscope, standard device for calibrating height direction thereof and calibration method
CN111487441A (en) Measuring device based on atomic force microscope and step surface measuring method
CN110108904A (en) The real-time drift compensating system of atomic force microscope and method of view-based access control model sensing
CN110470442B (en) Normal elastic constant needle point nondestructive calibration device of atomic force microscope probe and use method
CN106767384A (en) Static broach MEMS gauge head constant force mode of operation implementation methods
CN1232987C (en) Liquid phase atom mechanics microscope probe

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination