CN111487441A - Measuring device based on atomic force microscope and step surface measuring method - Google Patents
Measuring device based on atomic force microscope and step surface measuring method Download PDFInfo
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- CN111487441A CN111487441A CN202010451028.2A CN202010451028A CN111487441A CN 111487441 A CN111487441 A CN 111487441A CN 202010451028 A CN202010451028 A CN 202010451028A CN 111487441 A CN111487441 A CN 111487441A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
Abstract
The invention relates to a measuring device based on an atomic force microscope and a step surface measuring method.A scanning head of the atomic force microscope is fixedly arranged and is still in the measuring process, the scanning head of the atomic force microscope scans and measures the surface profile parameters of a measured object and generates a detection signal, a signal conditioning device of the atomic force microscope conditions the detection signal and transmits the conditioned detection signal to a platform controller, the platform controller controls a positioning platform to move relative to the scanning head of the atomic force microscope according to the detection signal so as to enable the scanning head of the atomic force microscope to scan and detect along the surface of the measured object, and a computer processes the detection signal to obtain the surface profile parameters of the measured object. Therefore, the measuring device based on the atomic force microscope and the step surface measuring method can conveniently carry out measurement, and the scanning head of the atomic force microscope is kept static in the measuring process, so that the measuring error caused by vibration is avoided, and the measuring accuracy is improved.
Description
Technical Field
The invention relates to a measuring device based on an atomic force microscope and a step surface measuring method.
Background
The nanometer measurement technology is the basis and guarantee of the development of nanometer technology, even the key of the nanometer technology, and is directly related to the development of the national semiconductor processing industry and the national defense industry. In recent years, with the rapid development of micro-nano processing technology, the characteristic size of a device and the tolerance associated with the characteristic size are continuously reduced, and the complexity of the shape structure is continuously increased, so that higher requirements are provided for the geometric quantity detection of the micro-nano scale. The step structure is a common structure in micro-nano manufacturing and is also a standard structure for calibrating a longitudinal amplitude response function of an instrument. For example, micro-nano step standard templates used for calibration of surface appearance measuring equipment such as scanning probe microscopes, step meters, optical profilers and the like, wires in semiconductor processes, grooves in MEMS processing and the like are all step structures, and the structures are used as keys for realizing device functions and have extremely high requirements on parameter accuracy.
Currently, methods for step structure measurement can be generally classified into optical measurement methods and non-optical measurement methods. The optical measurement method includes a microscopic vision method, an interferometry method, a laser scanning method (including self-focusing and confocal), and the like, and the non-optical measurement method mainly includes a scanning probe microscope, a mechanical stylus method, a coordinate measurement method, and the like. In the measurement of the step structure, the instruments commonly used in the market mainly include a confocal microscope, an atomic force microscope, a step instrument and the like. These devices typically measure over a range not exceeding the order of hundreds of microns and are difficult to meet both large range and high accuracy requirements. In addition, for the step larger than 2 μm, the ordinary atomic force microscope cannot realize measurement due to the limitation of the size of the needle point and the stroke of the scanner; for ultrahigh step structures with the magnitude of hundreds of microns and above, most instruments cannot realize measurement due to the limitation of the stroke of a moving mechanism. Therefore, the device and the method for measuring and representing the ultra-high step are developed, the high-precision and traceable measurement of the ultra-high step structure is realized, and the device and the method have important significance for the precise control of the dimension parameters in micro-nano manufacturing and semiconductor processing.
Disclosure of Invention
In view of the above-described drawbacks of the prior art, an object of the present invention is to provide a measuring apparatus and a step surface measuring method using an atomic force microscope, which can perform measurement easily.
In order to achieve the aim, the invention provides a measuring device based on an atomic force microscope, which comprises an atomic force microscope scanning head, an atomic force microscope signal conditioning device, a positioning platform, a platform controller and a computer, wherein the atomic force microscope signal conditioning device is used for conditioning signals of the atomic force microscope;
the atomic force microscope scanning head is fixedly arranged;
the positioning platform is used for mounting a measured object, the positioning platform is controlled by the platform controller to move, and the atomic force microscope scanning head is used for scanning and detecting the surface of the measured object and generating a detection signal;
the atomic force microscope signal conditioning device is used for receiving and conditioning a detection signal generated by the atomic force microscope scanning head and feeding back the detection signal to the platform controller;
the platform controller controls the positioning platform to move relative to the atomic force microscope scanning head according to a detection signal fed back by the atomic force microscope scanning head so that the atomic force microscope scanning head scans and detects along the surface of the object to be detected;
the computer is used for receiving and processing the detection signal transmitted by the platform controller, and is also used for sending a control instruction to the platform controller.
Preferably, atomic force microscope scanning head includes laser diode, four-quadrant detector, probe and linking arm, the probe is installed at the tip of linking arm, be equipped with the plane of reflection on the probe, laser that laser diode sent by the plane of reflection reflects to four-quadrant detector, and four-quadrant detector receives the light that the plane of reflection reflects and produces detection signal.
Preferably, the positioning platform comprises a movable stage and a fixedly arranged positioning detector, the stage is provided with an X-direction reflecting surface, a Y-direction reflecting surface and a Z-direction reflecting surface which are orthogonal to each other, the positioning detector comprises an X-axis laser interferometer, a Y-axis laser interferometer and a Z-axis laser interferometer, and the X-axis laser interferometer, the Y-axis laser interferometer and the Z-axis laser interferometer respectively detect coordinate position information of the stage through the X-direction reflecting surface, the Y-direction reflecting surface and the Z-direction reflecting surface and feed the coordinate position information back to the platform controller.
More preferably, the stage is machined from zero expansion glass.
More preferably, the X-direction reflecting surface, the Y-direction reflecting surface, and the Z-direction reflecting surface are formed by plating a reflecting material on a surface of the stage.
More preferably, the stage is driven to move by a drive mechanism.
Further, the driving mechanism is driven by a linear motor, a voice coil motor or an ultrasonic motor.
Further, the positioning detector is arranged separately from the driving mechanism.
In accordance with one aspect of the present invention, there is provided an atomic force microscope-based measuring device, which is operable by the atomic force microscope-based measuring device according to the above or any one of the preferred embodiments, including:
1) dividing and determining a measuring area of the step surface: determining a measuring area A on the low level surface of the step, wherein a distance is reserved between the measuring area A and the vertical wall of the step, determining a measuring area B on the high level surface of the step, and a distance is reserved between the measuring area B and the vertical wall of the step;
2) and scanning and measuring the surface profile parameters of the measuring region A and the measuring region B by an atomic force microscope scanning head, and fitting the surface profile of the step surface.
Preferably, the width of the measuring area A is three to two thirds of the width of the low level surface of the step, and the distance between the measuring area A and the vertical wall of the step is three to one third of the width of the low level surface of the step; the width of the measuring area B is three to one third of the width of the high-level surface of the step, and the distance between the measuring area B and the vertical wall of the step is three to one third of the width of the low-level surface of the step.
As described above, the measuring apparatus and the step surface measuring method according to the present invention have the following advantageous effects: in the measuring device based on the atomic force microscope, an atomic force microscope scanning head is fixedly arranged and is still in the measuring process, the atomic force microscope scanning head scans and measures the profile surface parameters of the surface of a measured object and generates a detection signal, an atomic force microscope signal conditioning device conditions the detection signal and transmits the conditioned detection signal to a platform controller, the platform controller controls a positioning platform to move relative to the atomic force microscope scanning head according to the detection signal so that the atomic force microscope scanning head scans and detects along the surface of the measured object, and a computer processes the detection signal to obtain the parameters of the surface profile of the measured object. Therefore, the measuring device based on the atomic force microscope and the step surface measuring method can conveniently carry out measurement, and the scanning head of the atomic force microscope is kept static in the measuring process, so that the measuring error caused by vibration is avoided, and the measuring accuracy is improved. The step surface measuring method based on the atomic force microscope also has the beneficial effects, and the description is omitted here.
Drawings
Fig. 1 is a schematic structural diagram of an atomic force microscope-based measuring device according to the present invention.
Fig. 2 is a schematic structural diagram of an atomic force microscope scanning head.
Fig. 3 is a schematic structural diagram of the positioning platform.
Fig. 4 shows a schematic view of the step surface and its measurement area division.
Fig. 5 shows a schematic view of the division of the measuring area on the step surface.
FIG. 6 shows a single contour line structure schematic of a fitted step face.
Description of the element reference numerals
1 atomic force microscope scanning head
2 atomic force microscope signal conditioning device
3 positioning platform
4 platform controller
5 computer
6 laser diode
7 four-quadrant detector
8 Probe
9 connecting arm
10 objective table
11 positioning detector
12X-axis laser interferometer
13Y-axis laser interferometer
14Z-axis laser interferometer
Detailed Description
The following description of the embodiments of the present invention is provided for illustrative purposes, and other advantages and effects of the present invention will become apparent to those skilled in the art from the present disclosure.
It should be understood that the structures, ratios, sizes, and the like shown in the drawings and described in the specification are only used for matching with the disclosure of the specification, so as to be understood and read by those skilled in the art, and are not used to limit the conditions under which the present invention can be implemented, so that the present invention has no technical significance, and any structural modification, ratio relationship change, or size adjustment should still fall within the scope of the present invention without affecting the efficacy and the achievable purpose of the present invention. In addition, the terms "upper", "lower", "left", "right", "middle" and "one" used in the present specification are for clarity of description, and are not intended to limit the scope of the present invention, and the relative relationship between the terms and the terms is not to be construed as a scope of the present invention.
As shown in fig. 1, the present invention provides a measuring apparatus based on an atomic force microscope, which includes an atomic force microscope scanning head 1, an atomic force microscope signal conditioning apparatus 2, a positioning platform 3, a platform controller 4 and a computer 5;
the atomic force microscope scanning head 1 is fixedly arranged;
the positioning platform 3 is used for mounting a measured object, the positioning platform 3 is controlled by the platform controller 4 to move, and the atomic force microscope scanning head 1 is used for scanning and detecting the surface of the measured object and generating a detection signal;
the atomic force microscope signal conditioning device 2 is used for receiving and conditioning a detection signal generated by the atomic force microscope scanning head 1 and feeding back the detection signal to the platform controller 4;
the platform controller 4 controls the positioning platform 3 to move relative to the atomic force microscope scanning head 1 according to a detection signal fed back by the atomic force microscope scanning head 1 so as to enable the atomic force microscope scanning head 1 to scan and detect along the surface of a detected object;
the computer 5 is used for receiving and processing the detection signal transmitted by the platform controller 4, and the computer 5 is also used for sending a control instruction to the platform controller 4.
In the measuring device based on the atomic force microscope, an atomic force microscope scanning head 1 is fixedly arranged and is still in the measuring process, the atomic force microscope scanning head 1 scans and measures the profile surface parameters of the surface of a measured object and generates a detection signal, an atomic force microscope signal conditioning device 2 conditions the detection signal and transmits the conditioned detection signal to a platform controller 4, the platform controller 4 controls a positioning platform 3 to move relative to the atomic force microscope scanning head 1 according to the detection signal so that the atomic force microscope scanning head 1 scans and detects the surface of the measured object, and a computer 5 processes the detection signal to obtain the parameters of the surface profile of the measured object. Therefore, the measuring device based on the atomic force microscope and the step surface measuring method can conveniently carry out measurement, and in the measuring process, the scanning head 1 of the atomic force microscope is kept static, so that the measuring error caused by vibration is avoided, and the measuring accuracy is improved.
In the measuring device based on the atomic force microscope, the platform controller 4 controls the positioning platform 3 according to the detection signal fed back by the signal conditioning circuit of the atomic force microscope, thereby realizing the following scanning of the measured object. During the measurement, atomic force microscope scanning head 1 is motionless, and all displacement drive and data record all accomplish through location platform 3 and platform controller 4, and this kind of mode is structural more stable to can avoid increasing the degree of freedom and introduce new error because of the gauge head motion, atomic force microscope scanning head 1 can directly adopt commercial atomic force microscope scanning head 1, also can build similar sensing structure by oneself.
In the measuring device based on the atomic force microscope, the positioning platform 3 has large motion range, high positioning precision and high resolution of the atomic force microscope, and can realize nano-scale precision measurement. Because the atomic force microscope scanning head 1 in the device is equivalent to a zero point positioning sensor, and the data recording and scanning control of the measuring system are realized by the movement of the positioning platform 3, the limitation that the moving scanning range of the traditional atomic force microscope is small can be broken through, when the atomic force microscope scanning head 1 works, the atomic force microscope scanning head 1 is still, the atomic force microscope scanning head 1 is used as the zero point positioning sensor to provide a feedback signal for the movement of the positioning platform 3, the positioning platform 3 provides X, Y, Z triaxial displacement, the following scanning is realized according to the signal fed back by the atomic force microscope scanning head 1, and the measured data is recorded. The atomic force microscope scanning head 1 is combined with the movable positioning platform 3, so that the measuring range of the measuring device reaches the movement range of the positioning platform 3, and the millimeter-scale measuring range is realized. Therefore, the measuring device based on the atomic force microscope can effectively improve the measuring range and achieve the nanometer-level measuring precision in the millimeter-level measuring range.
As a preferred embodiment, as shown in fig. 1 and 2, the atomic force microscope scanning head 1 includes a laser diode 6, a four-quadrant detector 7, a probe 8 and a connecting arm 9, the probe 8 is mounted at an end of the connecting arm 9, a reflecting surface is disposed on the probe 8, laser light emitted by the laser diode 6 is reflected by the reflecting surface to the four-quadrant detector 7, and the four-quadrant detector 7 receives light reflected by the reflecting surface to generate the detection signal. When the positioning platform 3 moves, the surface of the object to be measured on the positioning platform 3 contacts with the probe 8 and causes the probe 8 to generate micro displacement, the connecting arm 9 can generate deformation due to the fluctuation change of the surface of the object to be measured, the deformation is captured by a detection system consisting of the laser diode 6 and the four-quadrant detector 7, in the detection system, a light beam emitted by the laser diode 6 strikes on a reflecting surface of the connecting arm 9, the light beam enters the four-quadrant detector 7 after being reflected, when the connecting arm 9 deforms, the position of a laser spot on the surface of the four-quadrant detector 7 is changed, the four-quadrant detector 7 converts the position change into a detection signal and outputs the detection signal to the atomic force microscope signal conditioning device 2, the atomic force microscope signal conditioning device 2 conditions the detection signal and then transmits the detection signal to the platform controller 4, the platform controller 4 transmits the detection signal to the computer 5, the computer 5 obtains the contour information of the surface of the measured object according to the detection signal and sends a control instruction to the platform controller 4, and the platform controller 4 controls the positioning platform 3 to move according to the control instruction. The platform controller 4 is mainly used for receiving the detection signal, transmitting the detection signal to the computer 5, receiving the control instruction sent by the computer 5 and sending the control instruction to the positioning platform 3, and the platform controller 4 and the computer 5 can also be integrated into an integral module.
In the measuring device based on the atomic force microscope, the positioning platform 3 needs to provide nanometer-level positioning precision, and a laser interferometer is used as feedback to ensure positioning precision and traceability of a measuring result. According to the measuring device based on the atomic force microscope, the requirement on the positioning platform 3 is high except that the detection precision requirement reaches a nanometer level or even a sub-nanometer level, the positioning platform 3 needs to meet the requirements on a large range and high precision at the same time, the precision of the positioning platform 3 directly influences the precision of the whole measuring system, a common stepping motor is matched with a driving structure of a roller screw, the requirements on positioning resolution and positioning precision cannot be met, and piezoelectric ceramics carried by a common atomic force microscope cannot meet the requirements on linearity and a motion range. In order to meet the requirements of the motion range and the positioning precision, a linear motor can be used as a drive, a laser interferometer is used as a feedback to build the positioning platform 3, and other schemes meeting the requirements can be adopted. The invention introduces a scheme of adopting a laser interferometer as displacement feedback, as shown in fig. 3, the positioning platform 3 comprises a movable stage 10 and a fixedly arranged positioning detector 11, the stage 10 is provided with an X-direction reflecting surface, a Y-direction reflecting surface and a Z-direction reflecting surface which are mutually orthogonal, the positioning detector 11 comprises an X-axis laser interferometer 12, a Y-axis laser interferometer 13 and a Z-axis laser interferometer 14, light beams emitted by the X-axis laser interferometer 12, the Y-axis laser interferometer 13 and the Z-axis laser interferometer 14 are in orthogonal distribution, and extension lines of the light beams are intersected at one point. The X-axis laser interferometer 12, the Y-axis laser interferometer 13 and the Z-axis laser interferometer 14 respectively detect coordinate position information of the object stage 10 through an X-direction reflecting surface, a Y-direction reflecting surface and a Z-direction reflecting surface and feed the coordinate position information back to the platform controller 4, the platform controller 4 feeds the coordinate position information of the object stage 10 back to the computer 5, the computer 5 sends a control instruction to the platform controller 4 according to the coordinate position information of the object stage 10 and a detection signal transmitted by the atomic force microscope signal conditioning device 2, and the platform controller 4 controls the movement of the positioning platform 3 according to the control instruction. In a preferred embodiment, the stage 10 is fabricated from zero expansion glass, which avoids systematic errors caused by thermal expansion and contraction effects. Preferably, the X-direction reflecting surface, the Y-direction reflecting surface, and the Z-direction reflecting surface may be formed by plating a reflecting material on the surface of the stage 10.
In the measuring device based on the atomic force microscope, the movement of the positioning platform 3 is realized by the object stage 10, and the object stage 10 is driven by the driving mechanism to move. In a preferred embodiment, the drive mechanism is a linear motor, a voice coil motor or an ultrasonic motor drive. In order to avoid that the vibration generated by the driving mechanism affects the measurement accuracy of the positioning detector 11, the positioning detector 11 is disposed separately from the driving mechanism.
In accordance with one aspect of the present invention, there is provided an atomic force microscope-based measuring device, which is operable by the atomic force microscope-based measuring device according to the above or any one of the preferred embodiments, including:
1) dividing and determining a measuring area of the step surface: referring to fig. 4 and 5, a measuring area a is determined on the step lower surface (the plane where the measuring area a is located in fig. 4), a distance is provided between the measuring area a and the step vertical wall, a measuring area B is determined on the step upper surface (the plane where the measuring area B is located in fig. 4), and a distance is also provided between the measuring area B and the step vertical wall;
2) and (3) scanning and measuring the surface profile parameters of the measuring region A and the measuring region B by using the atomic force microscope scanning head 1, and fitting the surface profile of the step surface, wherein the fitted profile is shown in FIG. 6, a represents a low level surface of the step, and B represents a high level surface of the step.
Preferably, as shown in fig. 5, the width of the measurement area a is three to two times of the width of the lower surface of the step, and the distance between the measurement area a and the standing wall of the step is three to one time of the width of the lower surface of the step; the width of the measuring area B is three to one third of the width of the high-level surface of the step, and the distance between the measuring area B and the vertical wall of the step is three to one third of the width of the low-level surface of the step.
The step surface measuring method based on the atomic force microscope can realize the measurement of the ultra-high step in the micro-nano measurement, and when the ultra-high step is measured, different from the traditional micro-nano step measuring method, the step height is higher, so that the whole step profile can not be directly obtained through scanning, and the scanning needs to be carried out in different areas. The step surface measuring method based on the atomic force microscope can realize the nanometer-level precision measurement of the height of the ultrahigh step by means of the large-range and high-precision positioning capability of the positioning platform 3 and the high-resolution characteristic of the scanning head 1 of the atomic force microscope and combining with a specific partition combination measuring method.
For the bilateral steps shown in fig. 4 and 5, the measuring method can be directly obtained according to the atomic force microscope-based step surface measuring method of the present invention, the atomic force microscope-based step surface measuring method of the present invention divides the measuring area of the step into a measuring area a, a measuring area B, and a measuring area C, independently measures the three areas, respectively, obtains the measuring data of the three areas, after the measurement is completed, the measuring data of the measuring area a, the measuring area B, and the measuring area C need to be spliced, a new step structure is combined, a single contour line is intercepted to evaluate, and finally the contour shown in fig. 6 is fitted, and a, B, and C respectively represent the contours of the measuring area a, the measuring area B, and the measuring area C. The measurement areas A, B and C are selected by referring to contour line evaluation positions defined in ISO 5436. The scanning length of the measuring area A is about two thirds of the width of the upper surface of the step, and the scanning starting point and the scanning end point of the corresponding area respectively correspond to the starting point and the end point of the evaluation line of the step surface of the corresponding area; the scan length of the measurement region B is about one third of the width of the upper surface of the step, and the scan length of the measurement region C is about two thirds of the width of the upper surface of the step. The single contour lines taken from the combination of measurement areas are shown in fig. 6, and the height evaluation thereof is calculated using the least squares fit method defined in ISO 5436.
The step surface measuring method based on the atomic force microscope adopts the large-range and high-precision positioning platform 3 and the high-resolution atomic force microscope, and the measuring device can realize the nano-scale precision measurement of the ultra-high step structure in the millimeter-scale measuring range. The height of the super-high step structure can range from several micrometers to tens of millimeters. In addition, the device can also measure the step structure with the height as low as a few nanometers, and for the low step structure, the scanning of the complete step profile can be directly carried out without adopting the ultrahigh step measuring method introduced in the invention. Because the positioning platform 3 adopts the laser interferometer as positioning feedback, the measurement result has traceability. In conclusion, the step surface measuring method based on the atomic force microscope can realize step height measurement from a few nanometers to dozens of millimeters, the measuring precision can reach the nanometer level, and the measuring result is traceable.
It should be noted that, the technical solutions of the atomic force microscope-based apparatus and the step surface measuring method of the present invention relate to a hardware system and a measuring method, and a control program and a data processing program related to the hardware system are prior art, and need not be described in detail here.
In conclusion, the present invention effectively overcomes various disadvantages of the prior art and has high industrial utilization value.
The foregoing embodiments are merely illustrative of the principles and utilities of the present invention and are not intended to limit the invention. Any person skilled in the art can modify or change the above-mentioned embodiments without departing from the spirit and scope of the present invention. Accordingly, it is intended that all equivalent modifications or changes which can be made by those skilled in the art without departing from the spirit and technical spirit of the present invention be covered by the claims of the present invention.
Claims (10)
1. A measuring device based on an atomic force microscope is characterized by comprising an atomic force microscope scanning head, an atomic force microscope signal conditioning device, a positioning platform, a platform controller and a computer;
the atomic force microscope scanning head is fixedly arranged;
the positioning platform is used for mounting a measured object, the positioning platform is controlled by the platform controller to move, and the atomic force microscope scanning head is used for scanning and detecting the surface of the measured object and generating a detection signal;
the atomic force microscope signal conditioning device is used for receiving and conditioning a detection signal generated by the atomic force microscope scanning head and feeding back the detection signal to the platform controller;
the platform controller controls the positioning platform to move relative to the atomic force microscope scanning head according to a detection signal fed back by the atomic force microscope scanning head so that the atomic force microscope scanning head scans and detects along the surface of the object to be detected;
the computer is used for receiving and processing the detection signal transmitted by the platform controller, and is also used for sending a control instruction to the platform controller.
2. The atomic force microscope-based measurement device of claim 1, wherein: atomic force microscope scanning head includes laser diode, four-quadrant detector, probe and linking arm, the tip at the linking arm is installed to the probe, be equipped with the plane of reflection on the probe, laser that laser diode sent by the plane of reflection reflects to four-quadrant detector, and four-quadrant detector receives the light that the plane of reflection reflects and produces detection signal.
3. The atomic force microscope-based measurement device of claim 1, wherein: the positioning platform comprises a movable object stage and a fixedly arranged positioning detector, an X-direction reflecting surface, a Y-direction reflecting surface and a Z-direction reflecting surface which are orthogonal to each other are arranged on the object stage, the positioning detector comprises an X-axis laser interferometer, a Y-axis laser interferometer and a Z-axis laser interferometer, and the X-axis laser interferometer, the Y-axis laser interferometer and the Z-axis laser interferometer respectively detect coordinate position information of the object stage through the X-direction reflecting surface, the Y-direction reflecting surface and the Z-direction reflecting surface and feed the coordinate position information back to the platform controller.
4. The atomic force microscope-based measurement device of claim 3, wherein: the objective table is made of zero-expansion glass.
5. The atomic force microscope-based measurement device of claim 3, wherein: and coating a reflecting material on the surface of the objective table to form the X-direction reflecting surface, the Y-direction reflecting surface and the Z-direction reflecting surface.
6. The atomic force microscope-based measurement device of claim 3, wherein: the object stage is driven to move by a driving mechanism.
7. The atomic force microscope-based measurement device of claim 6, wherein: the driving mechanism is driven by a linear motor, a voice coil motor or an ultrasonic motor.
8. The atomic force microscope-based measurement device of claim 6, wherein: the positioning detector is separated from the driving mechanism.
9. A step surface measuring method by an atomic force microscope, which is performed by the atomic force microscope-based measuring apparatus according to any one of claims 1 to 8, comprising:
1) dividing and determining a measuring area of the step surface: determining a measuring area A on the low level surface of the step, wherein a distance is reserved between the measuring area A and the vertical wall of the step, determining a measuring area B on the high level surface of the step, and a distance is reserved between the measuring area B and the vertical wall of the step;
2) and scanning and measuring the surface profile parameters of the measuring region A and the measuring region B by an atomic force microscope scanning head, and fitting the surface profile of the step surface.
10. The atomic force microscope-based step surface measuring method according to claim 9, wherein: the width of the measuring area A is three to two times of the width of the low-level surface of the step, and the distance between the measuring area A and the vertical wall of the step is three to one time of the width of the low-level surface of the step; the width of the measuring area B is three to one third of the width of the high-level surface of the step, and the distance between the measuring area B and the vertical wall of the step is three to one third of the width of the low-level surface of the step.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113594057A (en) * | 2021-08-05 | 2021-11-02 | 上海天岳半导体材料有限公司 | Device, method, equipment and medium for calculating width of atomic step of wafer |
| CN113592937A (en) * | 2021-08-05 | 2021-11-02 | 上海天岳半导体材料有限公司 | Atomic step width calculation device, method, apparatus and medium for semiconductor substrate |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113594057A (en) * | 2021-08-05 | 2021-11-02 | 上海天岳半导体材料有限公司 | Device, method, equipment and medium for calculating width of atomic step of wafer |
| CN113592937A (en) * | 2021-08-05 | 2021-11-02 | 上海天岳半导体材料有限公司 | Atomic step width calculation device, method, apparatus and medium for semiconductor substrate |
| CN113594057B (en) * | 2021-08-05 | 2024-02-02 | 上海天岳半导体材料有限公司 | Device, method, equipment and medium for calculating width of atomic step of wafer |
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