CN112474462A - 一种半导体晶圆表面清理装置 - Google Patents
一种半导体晶圆表面清理装置 Download PDFInfo
- Publication number
- CN112474462A CN112474462A CN202011391430.2A CN202011391430A CN112474462A CN 112474462 A CN112474462 A CN 112474462A CN 202011391430 A CN202011391430 A CN 202011391430A CN 112474462 A CN112474462 A CN 112474462A
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- groups
- sets
- water
- hollow shaft
- supporting groove
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Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 55
- 239000004065 semiconductor Substances 0.000 title claims abstract description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 184
- 230000005540 biological transmission Effects 0.000 claims description 62
- 238000005507 spraying Methods 0.000 claims description 37
- 230000001681 protective effect Effects 0.000 claims description 7
- 239000003381 stabilizer Substances 0.000 claims description 4
- FPIPGXGPPPQFEQ-OVSJKPMPSA-N all-trans-retinol Chemical compound OC\C=C(/C)\C=C\C=C(/C)\C=C\C1=C(C)CCCC1(C)C FPIPGXGPPPQFEQ-OVSJKPMPSA-N 0.000 claims description 3
- 239000007921 spray Substances 0.000 claims description 3
- 230000009351 contact transmission Effects 0.000 claims description 2
- 239000011717 all-trans-retinol Substances 0.000 claims 1
- 235000019169 all-trans-retinol Nutrition 0.000 claims 1
- 239000012535 impurity Substances 0.000 abstract description 14
- 230000000694 effects Effects 0.000 abstract description 6
- 238000009434 installation Methods 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 5
- 230000003749 cleanliness Effects 0.000 abstract description 3
- 230000000903 blocking effect Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 230000000087 stabilizing effect Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 241000252254 Catostomidae Species 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000010865 sewage Substances 0.000 description 2
- 238000010977 unit operation Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Images
Classifications
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- B08B1/30—
-
- B08B1/32—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/024—Cleaning by means of spray elements moving over the surface to be cleaned
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202011391430.2A CN112474462B (zh) | 2020-12-02 | 2020-12-02 | 一种半导体晶圆表面清理装置 |
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CN202011391430.2A CN112474462B (zh) | 2020-12-02 | 2020-12-02 | 一种半导体晶圆表面清理装置 |
Publications (2)
Publication Number | Publication Date |
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CN112474462A true CN112474462A (zh) | 2021-03-12 |
CN112474462B CN112474462B (zh) | 2022-06-24 |
Family
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CN202011391430.2A Active CN112474462B (zh) | 2020-12-02 | 2020-12-02 | 一种半导体晶圆表面清理装置 |
Country Status (1)
Country | Link |
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CN (1) | CN112474462B (zh) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0547724A (ja) * | 1991-08-13 | 1993-02-26 | Shin Etsu Handotai Co Ltd | ウエーハのブラシ洗浄装置 |
CN101266803A (zh) * | 2007-03-13 | 2008-09-17 | 昭和电工株式会社 | 圆盘状基板的制造方法、清洗装置 |
CN107112263A (zh) * | 2014-12-19 | 2017-08-29 | 应用材料公司 | 用于漂洗与干燥基板的系统和方法 |
CN107799444A (zh) * | 2017-10-10 | 2018-03-13 | 谢斌 | 一种太阳能电池生产用硅片清洗装置 |
CN110379747A (zh) * | 2019-08-14 | 2019-10-25 | 常州科沛达清洗技术股份有限公司 | 全自动晶圆片清洗贴片一体机 |
CN110369352A (zh) * | 2019-07-15 | 2019-10-25 | 深圳市华星光电技术有限公司 | 清洗装置及基板清洗方法 |
CN210449971U (zh) * | 2019-07-09 | 2020-05-05 | 无锡赛默可科技有限公司 | 一种用于晶片刷洗的陶瓷盘刷洗结构 |
CN211163353U (zh) * | 2019-10-21 | 2020-08-04 | 苏州英尔捷微电子股份有限公司 | 一种具有清洗功能的晶圆研磨设备 |
-
2020
- 2020-12-02 CN CN202011391430.2A patent/CN112474462B/zh active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0547724A (ja) * | 1991-08-13 | 1993-02-26 | Shin Etsu Handotai Co Ltd | ウエーハのブラシ洗浄装置 |
CN101266803A (zh) * | 2007-03-13 | 2008-09-17 | 昭和电工株式会社 | 圆盘状基板的制造方法、清洗装置 |
CN107112263A (zh) * | 2014-12-19 | 2017-08-29 | 应用材料公司 | 用于漂洗与干燥基板的系统和方法 |
CN107799444A (zh) * | 2017-10-10 | 2018-03-13 | 谢斌 | 一种太阳能电池生产用硅片清洗装置 |
CN210449971U (zh) * | 2019-07-09 | 2020-05-05 | 无锡赛默可科技有限公司 | 一种用于晶片刷洗的陶瓷盘刷洗结构 |
CN110369352A (zh) * | 2019-07-15 | 2019-10-25 | 深圳市华星光电技术有限公司 | 清洗装置及基板清洗方法 |
CN110379747A (zh) * | 2019-08-14 | 2019-10-25 | 常州科沛达清洗技术股份有限公司 | 全自动晶圆片清洗贴片一体机 |
CN211163353U (zh) * | 2019-10-21 | 2020-08-04 | 苏州英尔捷微电子股份有限公司 | 一种具有清洗功能的晶圆研磨设备 |
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CN112474462B (zh) | 2022-06-24 |
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TA01 | Transfer of patent application right |
Effective date of registration: 20220606 Address after: No. 399, Qiutao North Street, industrial park, Wucheng District, Jinhua City, Zhejiang Province, 321000 Applicant after: Zhejiang Huilong Chip Technology Co.,Ltd. Address before: 061000 1-1001, building 2, Kaiyuan Garden Phase II, Yongji Road, Yunhe District, Cangzhou City, Hebei Province Applicant before: Shike industrial design Cangzhou Co.,Ltd. |
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GR01 | Patent grant | ||
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PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A semiconductor wafer surface cleaning device Effective date of registration: 20231025 Granted publication date: 20220624 Pledgee: China Co. truction Bank Corp Jinhua branch Pledgor: Zhejiang Huilong Chip Technology Co.,Ltd. Registration number: Y2023980062624 |
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