CN112458423A - Substrate clamp for vertical double-sided coating - Google Patents
Substrate clamp for vertical double-sided coating Download PDFInfo
- Publication number
- CN112458423A CN112458423A CN202011417366.0A CN202011417366A CN112458423A CN 112458423 A CN112458423 A CN 112458423A CN 202011417366 A CN202011417366 A CN 202011417366A CN 112458423 A CN112458423 A CN 112458423A
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- Prior art keywords
- substrate
- upper tray
- lower tray
- tray
- trapezoidal
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- 239000000758 substrate Substances 0.000 title claims abstract description 48
- 238000000576 coating method Methods 0.000 title claims abstract description 39
- 239000011248 coating agent Substances 0.000 title claims abstract description 38
- 240000004282 Grewia occidentalis Species 0.000 claims description 16
- 238000013461 design Methods 0.000 abstract description 12
- 239000007888 film coating Substances 0.000 abstract description 6
- 238000009501 film coating Methods 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 230000009286 beneficial effect Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 description 2
- 101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 description 2
- 102100028961 Peroxisome proliferator-activated receptor gamma coactivator 1-beta Human genes 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000012050 conventional carrier Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention discloses a substrate clamp for vertical double-sided coating, which comprises a lower tray, an upper tray, a substrate, a clamping device and a main body support, wherein the clamping device is locked on the main body support, the substrate is clamped between the lower tray and the upper tray, the lower tray and the upper tray are clamped and attached through the clamping device, the lower tray and the upper tray are provided with hollowed-out piece positions, the edges of the hollowed-out piece positions extend outwards and are provided with edge stop blocks, four corner stop blocks are arranged at four corners of each hollowed-out piece position, the edges of a frame around the upper tray are provided with trapezoidal bosses, the lower tray is provided with trapezoidal grooves matched with the trapezoidal bosses, and the substrate is limited in a narrow space in the middle by the edge stop blocks and the four corner stop blocks. By the mode, the phenomenon of chip falling and chip tilting is not easy to occur; the double-sided film coating of the largest area is facilitated; the shielded area of the coating is reduced, and the ineffective area of the coating of the substrate is reduced; the clamping design of the spring and the baffle is convenient for realizing the automatic operation of mass production.
Description
Technical Field
The invention relates to the technical field of semiconductor device production, in particular to a substrate clamp for vertical double-sided coating.
Background
Solar energy is inexhaustible renewable energy which is also clean energy and does not generate any environmental pollution, among the effective utilization of the solar energy, the solar photoelectric utilization is the fastest developing and most active research field in recent years and is one of the most spotlighted projects, therefore, solar cells are researched and developed, and in recent years, the PERC solar cells enter the bottleneck period of development, and the heterojunction solar cells and TOPCon solar cells are used as novel technologies, so that the efficiency improvement potential is large.
No matter the conventional PERC battery or TOPcon structure or HIT structure, a plasma coating process is needed to prepare a film, the conventional coating equipment is basically of a horizontal structure at present, a carrier plate is driven by a plate-type roller, the carrier plate structure used in the driving mode is usually a groove structure corresponding to the size of a silicon wafer, the silicon wafer is limited by a groove due to self weight, the coating structure has the defects of slag falling, wafer turning and the like, the vertical coating equipment gradually becomes a design scheme considered, the carrier plate required by the scheme is driven in the direction close to the vertical direction, the conventional carrier plate is directly used, the risk of wafer falling and wafer breaking is high, and based on the defects and the defects, the prior art needs to be improved, and the substrate clamp for vertical double-sided coating is designed.
Disclosure of Invention
The invention mainly solves the technical problem of providing a substrate clamp for vertical double-sided coating, which is not easy to have the phenomena of sheet falling and sheet tilting; the double-sided film coating of the largest area is facilitated; the shielded area of the coating is reduced, which is beneficial to reducing the ineffective area of the coating of the substrate; the clamping design of the spring and the baffle is convenient for realizing the automatic operation of mass production.
In order to solve the technical problems, the invention adopts a technical scheme that: the substrate clamp for the vertical double-sided coating comprises a lower tray, an upper tray, a substrate, a clamping device and a main body support, wherein the clamping device is locked on the main body support, the main body support is used for placing the lower tray, the upper tray is matched with the lower tray, the substrate is clamped between the lower tray and the upper tray, the lower tray and the upper tray are clamped and attached through the clamping device, the main body frame is favorable for reinforcing the whole substrate clamp to reduce deformation, hollow sheet positions convenient for coating are arranged on the lower tray and the upper tray, edge stoppers are outwards extended at the edges of the hollow sheet positions, four corner stoppers are arranged at four corners of the hollow sheet positions, trapezoidal bosses are arranged at the edges of the frame around the upper tray, trapezoidal grooves matched with the trapezoidal bosses are arranged on the lower tray, and the design of the trapezoidal bosses and the trapezoidal grooves can ensure the accuracy of folding of the upper tray and the lower tray, meanwhile, the edge stop blocks and the four corner stop blocks can be protected, the substrate is limited in a narrow space in the middle by the edge stop blocks and the four corner stop blocks, and the substrate can be kept stable after being placed on a plate, so that vertical film coating is facilitated.
Preferably, the clamping device comprises a locking stud, a spring and a baffle, the locking stud is locked on the main body bracket, the spring and the baffle are sequentially sleeved on the locking stud from top to bottom, and the extending part of the baffle is positioned above the lower tray and the upper tray.
Preferably, the edge stop blocks are designed to be rectangular, semicircular, triangular or combined, the vertical dimension of the edges of the hollowed-out piece positions is 0.1 mm-10 mm, the parallel dimension of the edges of the hollowed-out piece positions is 0.1 mm-10 mm, and the number of the edge stop blocks is not limited.
Preferably, the four-corner check blocks are designed to be no check block at the four corners of the straight chamfer, the round chamfer or the hollow sheet position, and the size of the chamfer is 0.1-10 mm.
Preferably, the trapezoidal boss corresponds to the trapezoidal groove, the trapezoidal boss can be completely arranged in the trapezoidal groove and attached, and the gap between the trapezoidal faces after attachment is less than 0.01 mm.
Preferably, the hollow bits are designed as a single bit or as a plurality of bits.
Preferably, the main body bracket is provided with a hollow part opposite to the hollow part on the upper tray.
Compared with the prior art, the invention has the beneficial effects that:
the substrate is designed to be locked and clamped by the upper tray and the lower tray and used for vertical film coating, and the substrate is fixed in the middle by the edge stop blocks and the four corner stop blocks of the upper tray and the lower tray, so that the phenomena of chip falling and chip tilting are not easy to occur;
the upper tray and the lower tray are all in full-open hollow design, so that double-sided coating of the largest area is facilitated;
compared with the conventional narrow continuous edge support, the design of the edge stop blocks and the four-corner stop blocks greatly reduces the coating shielding area, and is beneficial to reducing the coating invalid area of the substrate;
the clamping design of the spring and the baffle is convenient for realizing the automatic operation of mass production.
Drawings
Fig. 1 is a plan view of a substrate holder for vertical double-sided coating.
Fig. 2 is a partial side view of a substrate holder for vertical double-sided coating.
FIG. 3 is a partial enlarged view of a substrate holder for vertical double-sided coating.
FIG. 4 is a top view of a tray on a single stencil station.
FIG. 5 is a top view of a tray in a single stencil position.
FIG. 6 is a top view of a tray with multiple cutout locations.
FIG. 7 is a top view of a tray with multiple cutout locations.
Fig. 8 is a design example of an edge stop.
Fig. 9 shows an example of the design of the four-corner block.
Fig. 10 is a design example of the main body frame.
Detailed Description
The preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings so that the advantages and features of the invention can be more readily understood by those skilled in the art, and the scope of the invention will be more clearly defined.
Referring to fig. 1 to 10, an embodiment of the present invention includes:
a substrate clamp for vertical double-sided coating comprises a lower tray 01, an upper tray 02, a substrate 03, a clamping device 04 and a main body support 05, wherein the clamping device 04 is locked on the main body support 05, the main body support 05 is used for placing the lower tray 01, the lower tray 01 is provided with the upper tray 02 matched with the lower tray 01, the substrate 03 is clamped between the lower tray 01 and the upper tray 02, the lower tray 01 and the upper tray 02 are clamped and attached through the clamping device 04, the main body frame 05 is favorable for reinforcing the whole substrate clamp to reduce deformation, the lower tray 01 and the upper tray 02 are provided with hollowed-out sheet positions convenient for coating, hollows opposite to the hollowed-out sheet positions on the upper tray 02 are arranged on the main body support 05, the edges of the hollowed-out sheet positions extend outwards and are provided with edge stoppers 012 and 021, and four corners of the hollowed-out sheet positions are provided with four corner stoppers, the edge of the frame around the upper tray 02 is provided with a trapezoidal boss 021, the lower tray 01 is provided with a trapezoidal groove 011 matched with the trapezoidal boss 021, the design of the trapezoidal boss 021 and the trapezoidal groove 011 can ensure the accuracy of the upper tray and the lower tray when the upper tray and the lower tray are folded, and meanwhile, the substrate 03 can also play a role in protecting the edge stop blocks and the four corner stop blocks, the substrate is limited by the edge stop blocks and the four corner stop blocks in a narrow space in the middle, and the tray can also be kept stable after standing up and is convenient for vertical film coating.
The clamping device 04 comprises a locking stud 041, a spring 042 and a baffle 043, the locking stud 041 is locked and attached to the main body bracket 05, the locking stud 041 is sleeved with the spring 042 and the baffle 043 from top to bottom in sequence, and the extending part of the baffle 043 is positioned above the lower tray 01 and the upper tray 02.
The edge stoppers 012 and 021 are designed to be rectangular, semicircular, triangular or combined, the vertical dimension of the edge of the hollowed-out piece is 0.1 mm-10 mm, the parallel dimension of the edge of the hollowed-out piece is 0.1 mm-10 mm, and the number of the edge stoppers is not limited.
The four-corner stop blocks are designed to be not arranged at the four corners of the straight chamfer, the round chamfer or the hollow sheet position, and the size of the chamfer is 0.1-10 mm.
The trapezoidal boss corresponds to the trapezoidal groove, the trapezoidal boss can be completely arranged in the trapezoidal groove and attached, and the gap between the trapezoidal faces after attachment is smaller than 0.01 mm.
The first embodiment is as follows:
a single hollow-out piece position is designed on the upper tray 02, as shown in fig. 3, the hollow-out piece position is full-open hollow, so that double-sided coating is facilitated, the corresponding lower tray 01 is designed as shown in fig. 4, and the middle of the lower tray 01 is designed to be full-open hollow.
The second embodiment is as follows:
the upper tray 02 is provided with a plurality of hollow positions which are all-open hollow regularly arranged, as shown in fig. 5, the corresponding lower tray 01 is designed as shown in fig. 6, and the middle of the lower tray 01 is designed with all-open hollow regularly arranged.
The invention relates to a substrate clamp for vertical double-sided coating, which works, after a substrate 03 is placed on a lower tray 01, force is applied to a baffle 043 of a clamping device 04, an upper compression spring 042 leaves a vacancy, the upper tray 02 can move in parallel to a corresponding position, a trapezoid boss 021 is attached to a trapezoid groove 011 for placement, the upper tray 02 is attached to the lower tray 01, the substrate 03 is fixed at the middle position by edge stoppers and four corner stoppers of two trays, the force applied on the baffle 043 is removed, the baffle 043 clamps the upper tray 02 and the lower tray 01 under the elastic force of the spring 042, the substrate 03 is limited in a narrow space in the middle by the edge stoppers and the four corner stoppers, the tray can be kept stable after standing, the vertical coating is convenient, when the substrate 03 takes out of the substrate clamp, the force is also applied to the baffle 043 of the clamping device 0, the vacancy is left by the upper compression spring 042, the upper tray 02 moves in parallel along a locking stud 041, the substrate 03 is exposed to allow removal of the wafer.
The substrate clamp for vertical double-sided coating is not easy to drop and skew; the double-sided film coating of the largest area is facilitated; the shielded area of the coating is reduced, which is beneficial to reducing the ineffective area of the coating of the substrate; the clamping design of the spring and the baffle is convenient for realizing the automatic operation of mass production.
The above description is only an embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications of equivalent structures and equivalent processes performed by the present specification and drawings, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.
Claims (7)
1. The utility model provides a base plate anchor clamps for vertical two-sided coating film which characterized in that: the substrate clamp for the vertical double-sided coating comprises a lower tray, an upper tray, a substrate, a clamping device and a main body support, wherein the clamping device is locked on the main body support, the substrate is clamped between the lower tray and the upper tray, the lower tray and the upper tray are tightly clamped and attached through the clamping device, hollow-out piece positions convenient for coating are arranged on the lower tray and the upper tray, edge stops are arranged at the edges of the hollow-out piece positions in an outward extending mode, four corner stops are arranged at four corners of the hollow-out piece positions, trapezoidal bosses are arranged at the frame edges around the upper tray, trapezoidal grooves matched with the trapezoidal bosses are arranged on the lower tray, and the substrate is limited by the edge stops and the four corner stops in the middle of narrow space.
2. The substrate holder for vertical double-sided coating according to claim 1, wherein: the clamping device comprises a locking stud, a spring and a baffle, the locking stud is locked on the main body support, the spring and the baffle are sequentially sleeved on the locking stud from top to bottom, and the extending part of the baffle is positioned above the lower tray and the upper tray.
3. The substrate holder for vertical double-sided coating according to claim 1, wherein: the edge stop blocks are designed to be rectangular, semicircular, triangular or combined, the vertical size of the edges of the hollowed-out piece positions is 0.1-10 mm, the parallel size of the edges of the hollowed-out piece positions is 0.1-10 mm, and the number of the edge stop blocks is not limited.
4. The substrate holder for vertical double-sided coating according to claim 1, wherein: the four-corner stop blocks are designed to be not arranged at the four corners of the straight chamfer, the round chamfer or the hollow sheet position, and the size of the chamfer is 0.1-10 mm.
5. The substrate holder for vertical double-sided coating according to claim 1, wherein: the trapezoidal boss corresponds to the trapezoidal groove, the trapezoidal boss can be completely arranged in the trapezoidal groove and attached, and the gap between the trapezoidal faces after attachment is smaller than 0.01 mm.
6. The substrate holder for vertical double-sided coating according to claim 1, wherein: the hollow bit is designed to be a single bit or a plurality of bits.
7. The substrate holder for vertical double-sided coating according to claim 1, wherein: the main body bracket is provided with a hollow part opposite to the hollow part on the upper tray.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011417366.0A CN112458423B (en) | 2020-12-07 | 2020-12-07 | Substrate clamp for vertical double-sided coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011417366.0A CN112458423B (en) | 2020-12-07 | 2020-12-07 | Substrate clamp for vertical double-sided coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112458423A true CN112458423A (en) | 2021-03-09 |
| CN112458423B CN112458423B (en) | 2024-08-13 |
Family
ID=74801503
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011417366.0A Active CN112458423B (en) | 2020-12-07 | 2020-12-07 | Substrate clamp for vertical double-sided coating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112458423B (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202430282U (en) * | 2012-01-13 | 2012-09-12 | 广东志成冠军集团有限公司 | Novel fixture for magnetron sputtering coating substrate |
| DE102012203404A1 (en) * | 2012-03-05 | 2013-09-05 | Von Ardenne Anlagentechnik Gmbh | Substrate- and matrix holding device useful for masked substrate vapor deposition, comprises a substrate support having e.g. substrate receiving opening, and a matrix support having e.g. matrix receiving opening, which have contact device |
| CN103668054A (en) * | 2013-11-26 | 2014-03-26 | 北京遥测技术研究所 | Masking tool for evaporation of electrodes of micro-mechanical quartz sensor |
| CN203530421U (en) * | 2013-10-25 | 2014-04-09 | 精曜(苏州)新能源科技有限公司 | Shielding tray for solar cell |
| CN106191798A (en) * | 2016-08-11 | 2016-12-07 | 深圳市微纳科学技术有限公司 | Vertical magnetic control sputtering vacuum coating lap guard electroplating method and substrate fixture |
| CN208562511U (en) * | 2018-08-16 | 2019-03-01 | 青岛韬谱光学科技有限公司 | A kind of adjustable ultrasonic cleaning of thickness and plated film unitary clip |
| CN214881804U (en) * | 2020-12-07 | 2021-11-26 | 苏州晟成光伏设备有限公司 | Substrate clamp for vertical double-sided coating |
-
2020
- 2020-12-07 CN CN202011417366.0A patent/CN112458423B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202430282U (en) * | 2012-01-13 | 2012-09-12 | 广东志成冠军集团有限公司 | Novel fixture for magnetron sputtering coating substrate |
| DE102012203404A1 (en) * | 2012-03-05 | 2013-09-05 | Von Ardenne Anlagentechnik Gmbh | Substrate- and matrix holding device useful for masked substrate vapor deposition, comprises a substrate support having e.g. substrate receiving opening, and a matrix support having e.g. matrix receiving opening, which have contact device |
| CN203530421U (en) * | 2013-10-25 | 2014-04-09 | 精曜(苏州)新能源科技有限公司 | Shielding tray for solar cell |
| CN103668054A (en) * | 2013-11-26 | 2014-03-26 | 北京遥测技术研究所 | Masking tool for evaporation of electrodes of micro-mechanical quartz sensor |
| CN106191798A (en) * | 2016-08-11 | 2016-12-07 | 深圳市微纳科学技术有限公司 | Vertical magnetic control sputtering vacuum coating lap guard electroplating method and substrate fixture |
| CN208562511U (en) * | 2018-08-16 | 2019-03-01 | 青岛韬谱光学科技有限公司 | A kind of adjustable ultrasonic cleaning of thickness and plated film unitary clip |
| CN214881804U (en) * | 2020-12-07 | 2021-11-26 | 苏州晟成光伏设备有限公司 | Substrate clamp for vertical double-sided coating |
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| Publication number | Publication date |
|---|---|
| CN112458423B (en) | 2024-08-13 |
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