CN112452945B - Device and method for high-precision laser cleaning and cleaning quality on-line monitoring - Google Patents
Device and method for high-precision laser cleaning and cleaning quality on-line monitoring Download PDFInfo
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- CN112452945B CN112452945B CN202010890129.XA CN202010890129A CN112452945B CN 112452945 B CN112452945 B CN 112452945B CN 202010890129 A CN202010890129 A CN 202010890129A CN 112452945 B CN112452945 B CN 112452945B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/041—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body
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Abstract
The invention discloses a high-precision laser cleaning and cleaning quality on-line monitoring device which comprises an XY axis platform, a laser cleaning head, a resistance probe array, a resistance measuring instrument, a probe height self-adaptive adjusting unit and a workstation. According to the invention, the cleaning condition of each part on the workpiece to be cleaned is detected, so that the real-time detection result is less influenced by the environment, the measurement accuracy is high, the position with poor cleaning effect is accurately positioned, and the cleaning effect is ensured.
Description
Technical Field
The invention relates to the field of laser cleaning and cleaning quality monitoring, in particular to a device and a method for high-precision laser cleaning and cleaning quality on-line monitoring.
Background
The laser cleaning is a green and efficient cleaning mode which is gradually accepted by the masses in industrial production and living application, wherein the laser cleaning technology is well developed in the fields of molds, national defense weaponry, aircraft waste skin paint, building outer walls, precision instruments, electronic industry, pipelines of nuclear reactors, historical relics and the like. Has the advantages of environmental protection, non-contact, precise control and the like.
In the laser cleaning application, the cleaning effect can be measured only after the cleaning is completed, but the influence of the cleaning parameters in the cleaning process, such as the laser energy density, the irradiation time and the like, can cause the damage of the substrate or the uncleanness of the cleaning, so that the online monitoring of the laser cleaning effect is very important.
However, since the laser cleaning has various mechanisms for removing the same pollutant, the cleaning environment is complex, the current common laser cleaning quality monitoring method such as an acoustic wave method is greatly affected by the environment, the precision is low, the real-time monitoring, recording and analyzing of the cleaning effect cannot be realized, and the device has higher requirements, complicated measuring steps and longer consumption time.
The patent 201911075973.0 of the prior art discloses a device and a method for monitoring laser cleaning in real time, which are characterized in that resistance value changes before and after cleaning of a whole workpiece to be cleaned are tested through a conductive wheel, and the laser cleaning effect is reflected in real time by utilizing the change of resistance signals, but the cleaning condition of each part on the workpiece to be cleaned cannot be detected, the surface of the workpiece to be cleaned is generally only an uneven surface, the influence of the environment is larger, the measurement accuracy is not high enough, the position with poor cleaning effect cannot be accurately positioned, and the cleaning effect cannot be ensured.
Disclosure of Invention
The invention solves the problems that the cleaning condition of each part on the workpiece to be cleaned is detected, so that the real-time detection result is less influenced by the environment, the measurement accuracy is high, the position with poor cleaning effect is accurately positioned, and the cleaning effect is ensured. The invention provides a high-precision laser cleaning and cleaning quality on-line monitoring device which is characterized by comprising an XY axis platform, a laser cleaning head, a resistance probe array, a resistance measuring instrument, a probe height self-adaptive adjusting unit and a workstation,
the laser cleaning head comprises a laser head, a vibrating mirror and a field lens, when the laser is used for cleaning, laser beams are emitted from the laser head, sequentially irradiate the surface of a cleaning workpiece placed on an XY axis platform through the vibrating mirror and the field lens, and the cleaning workpiece is moved through the XY axis platform to complete the surface cleaning work of the whole cleaning workpiece;
the resistance probe array comprises a probe array with a specific shape formed by arranging a plurality of resistance probes, and the resistance probe array is one of square, rectangular or circular probe arrays;
each probe in the array of probes is for contacting a point on the surface of the cleaning workpiece;
the resistance measuring instrument is connected (electrically connected) with the resistance probes of the resistance probe array and is used for measuring resistance values of points on the surface of the cleaning workpiece;
the probe height self-adaptive adjustment unit comprises a probe height adjustment driver and a micro guide rail sliding table, the probe array is fixed on the micro guide rail sliding table, and the probe height adjustment driver drives the micro guide rail sliding table to slide so as to drive probes in the probe array to carry out height self-adaptive adjustment; the probe height adjusting driver is a motor or other driving equipment;
the workstation comprises a cleaning head control module, a shaft control module, a probe height self-adaptive adjustment control module, a resistance measurement and acquisition control module and a signal processing unit;
the cleaning head control module is electrically connected with the laser cleaning head and is used for controlling the laser head to emit light to clean the surface of a cleaning workpiece placed on the XY axis platform;
the axis control module is in communication connection with the XY axis platform and is used for controlling the XY axis platform to move along the X, Y axis direction so as to drive the surface of the cleaning workpiece placed on the XY axis platform to move along the X, Y axis direction, and cleaning the surface of the cleaning workpiece and measuring the resistance value of each point on the surface of the cleaning workpiece are completed;
the probe height self-adaptive adjustment control module is in communication connection with the probe height self-adaptive adjustment unit and is used for controlling the sliding of the miniature guide rail sliding table so as to drive the probes in the probe array to perform height self-adaptive adjustment;
the resistance measurement and acquisition control module is in communication connection with the resistance measuring instrument and is used for resistance measurement and acquisition; the resistance measurement and acquisition control module is in communication connection with the signal processing unit;
the signal processing unit receives data of the resistance measurement and acquisition control module, processes the data, interprets the processed data, and then feeds the interpreted data back to the cleaning head control module, the shaft control module and the probe height self-adaptive adjustment control module respectively, so that laser head light emission, surface movement of a cleaning workpiece along X and Y axis directions, laser cleaning of probe height self-adaptive adjustment and cleaning quality on-line monitoring are realized.
The resistance probe array and the probe height self-adaptive adjusting unit are arranged on one side of the laser cleaning head.
Further, the number of the resistance probes of the resistance probe array can be determined according to the area of the surface of the workpiece to be cleaned, and the arrangement mode of the resistance probe array is selected according to the shape of the surface of the workpiece to be cleaned, wherein the arrangement mode is one of square, rectangle or circle.
Further, the specific method for realizing laser cleaning and cleaning quality on-line monitoring by the signal processing unit which feeds back the laser cleaning and quality on-line monitoring to the cleaning head control module, the shaft control module and the probe height self-adaptive adjustment control module comprises the following steps:
firstly, building standard height distribution values of all positions (coordinates) of the surface of a cleaning workpiece obtained by a process test, and cleaning standard resistance distribution values of all coordinates of the surface of the cleaning workpiece;
when laser cleaning and cleaning quality online monitoring are performed, the probe height is timely adjusted through the probe height self-adaptive adjustment control module, and the signal processing unit obtains the height distribution value of the workpiece surface under each coordinate by utilizing the cleaning workpiece surface position information (coordinates) and the corresponding resistance value, and meanwhile obtains the resistance value distribution value of the workpiece surface under each coordinate; according to the height distribution value and the resistance value distribution value, the cleaning quality of all parts on the surface of the uneven workpiece can be monitored, and the parts which are not cleaned can be accurately positioned.
The probe height self-adaptive adjusting unit can adapt to various workpieces with uneven surfaces to be cleaned, and can automatically adjust the height of the probes, so that each probe in the resistor probe array can contact the uneven surfaces of the workpieces.
Further, the resistance measurement accuracy of the resistance meter measurement was 0.001 milliohm. The precision is higher, can greatly reduced laser cleaning laser environment like illumination, noise to monitoring system's influence, and adaptability to different environment is stronger.
Furthermore, the workstation collects the surface position information (coordinates) of the cleaning workpiece and the corresponding probe height distribution value in real time through the shaft control module and the probe height self-adaptive adjustment control module, and adopts a first-order filter to carry out filtering treatment, so that measurement errors are reduced.
The invention also provides a high-precision laser cleaning and cleaning quality on-line monitoring method, which comprises the following steps:
s1, constructing standard height distribution values of the surface of the cleaning workpiece under each coordinate according to a process test, and constructing standard resistance distribution values of the surface of the cleaning workpiece under each coordinate;
s2, selecting the arrangement mode and the number of the probe arrays according to the area of the surface of the workpiece to be cleaned; the arrangement mode is one of square, rectangle or round;
s3, adjusting the measurement precision of the resistance measuring instrument according to the cleaning process requirement;
s4, controlling the probe height self-adaptive adjusting unit and the resistance measuring instrument through the workstation to drive the resistance probe array to finish cleaning and resistance measurement of the surface of the whole cleaning workpiece;
in the cleaning process, the probe height self-adaptive adjusting unit automatically adjusts the probe height so that each probe can contact the uneven workpiece surface;
acquiring horizontal position (coordinate) information of the resistance measuring probe, probe height information and resistance information of each horizontal position point in real time through the signal processing unit;
the signal processing unit obtains the height value distribution value of the workpiece surface under each coordinate by utilizing the position (coordinate) information of the workpiece surface to be cleaned and the corresponding probe height value and resistance value, and obtains the resistance value distribution value of the workpiece surface under each coordinate; according to the height distribution value and the resistance value distribution value, the cleaning quality of the uneven workpiece surface is monitored, and the part which is not cleaned is accurately positioned.
Specifically, in the step S1, standard height distribution values and standard resistance distribution values are constructed, and process tests are performed according to different cleaning workpiece substrates.
Specifically, the criteria for monitoring the cleaning quality of the uneven workpiece surface in the step S4 are as follows:
when the difference between the resistance value measured by the resistance meter under a certain coordinate and the resistance value when the workpiece is cleaned is more than 10%, judging that the workpiece is not cleaned under the coordinate, otherwise, cleaning, and judging all the coordinates of the cleaned workpiece.
According to the invention, by combining the height-adjustable resistance measuring probe with the shaft control system, the surface position information of the cleaning workpiece, the probe height information and the resistance value information are combined, and the standard height distribution value under each position (coordinate) of the surface of the cleaning workpiece is constructed; then, the height value distribution value of the workpiece surface under each coordinate is obtained by utilizing the position (coordinate) information of the workpiece surface to be cleaned and the corresponding probe height value and resistance value, and meanwhile, the resistance value distribution value of the workpiece surface under each coordinate is obtained; according to the height distribution value and the resistance value distribution value, the cleaning quality of the uneven workpiece surface is monitored, and the part which is not cleaned is accurately positioned. The number of the resistor probe arrays is determined according to the area of the surface of the workpiece to be cleaned, and the arrangement mode and the shape of the resistor probe arrays are selected according to the shape of the surface of the workpiece to be cleaned. The probe height self-adaptive adjusting device can adapt to various cleaning workpieces with uneven surfaces, and can automatically adjust the probe height, so that each probe in the resistance probe array can contact the uneven surfaces of the workpieces, and the detection of the surfaces of the workpieces to be detected is complete and accurate.
The workstation inputs the suitable parameter control laser cleaning head scanning straight line and washs the work piece, controls the XY axle platform to move simultaneously, makes laser cleaning head wash to the all pollutant of material surface. The adopted resistance measurement precision can reach 0.001 milliohm, the precision is higher, the influence of laser cleaning laser environment such as illumination and noise on a monitoring system can be greatly reduced, and the adaptability to different environments is stronger. In a word, the invention detects the cleaning condition of each part on the workpiece to be cleaned, so that the real-time detection result is less influenced by the environment, the measurement accuracy is high, the position with poor cleaning effect is accurately positioned, and the cleaning effect is ensured.
Drawings
FIG. 1 is a schematic diagram of an on-line monitoring device for laser cleaning and cleaning quality according to the present invention;
FIG. 2 is a diagram showing the arrangement of resistive probe arrays according to the present invention.
Wherein: the device comprises a 1-laser cleaning head, a 2-resistance probe array, a 3-probe height self-adaptive adjusting device, a 4-workstation, a 5-XY axis platform, a 6-resistance measuring instrument, a 7-laser galvanometer, an 8-first field lens, a 9-motor and micro-guide rail sliding table, a 10-signal processing unit and an 11-resistance probe.
Detailed Description
The present invention will be described in further detail with reference to the drawings and examples, in order to make the objects, technical solutions and advantages of the present invention more apparent. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention. In addition, the technical features of the embodiments of the present invention described below may be combined with each other as long as they do not collide with each other.
Example one:
referring to fig. 1, the invention provides a high-precision laser cleaning and cleaning quality on-line monitoring device, which is characterized by comprising an XY axis platform, a laser cleaning head, a resistance probe array, a resistance measuring instrument, a probe height self-adaptive adjusting unit and a workstation,
the laser cleaning head comprises a laser head, a vibrating mirror and a field lens, when the laser is used for cleaning, laser beams are emitted from the laser head, sequentially irradiate the surface of a cleaning workpiece placed on an XY axis platform through the vibrating mirror and the field lens, and move the surface of the cleaning workpiece through the XY axis platform to complete the surface cleaning work of the whole cleaning workpiece;
the resistance probe array comprises a probe array with a specific shape formed by arranging a plurality of resistance probes, and the resistance probe array is one of square, rectangular or circular probe arrays; the resistance probe array can determine the number of resistance probes of the resistance probe array according to the size of the surface of the workpiece to be cleaned, and the shape of the arrangement mode of the resistance probe array is selected according to the shape of the surface of the workpiece to be cleaned. The probe array of this embodiment is square, and there are three types of probe arrays, namely, 2cm by 2cm, 5cm by 5cm and 10cm by 10cm, if the surface area of the workpiece to be cleaned is smaller than 25cm 2 Selecting a square resistance probe array with the length of 2cm and the length of 2 cm; if the surface area of the workpiece to be cleaned is more than or equal to 25cm 2 And less than 100cm 2 Selecting a square resistance probe array with the length of 5cm x 5 cm; if the surface area of the workpiece to be cleaned is more than or equal to 100cm 2 Then selecting a square probe array of 10cm x 10 cm; in this example, 2cm by 2cm are selected.
Each probe in the array of probes is for contacting a point on the surface of the cleaning workpiece;
the resistance measuring instrument is connected (electrically connected) with the resistance probes of the resistance probe array and is used for measuring resistance values of points on the surface of the cleaning workpiece;
the probe height self-adaptive adjustment unit comprises a probe height adjustment driver and a micro guide rail sliding table, the probe array is fixed on the micro guide rail sliding table, and the probe height adjustment driver drives the micro guide rail sliding table to slide so as to drive probes in the probe array to carry out height self-adaptive adjustment; the probe height adjusting driver is a servo motor or other driving equipment; in this embodiment, the servo motor is mounted in the guide rail sliding table to control the movement of the sliding table, and the motor driver controls the movement of the servo motor.
The resistance probe array and the probe height self-adaptive adjusting unit are arranged on one side of the laser cleaning head.
The workstation comprises a cleaning head control module, a shaft control module, a probe height self-adaptive adjustment control module, a resistance measurement and acquisition control module and a signal processing unit;
the cleaning head control module is electrically connected with the laser cleaning head and is used for controlling the laser head to emit light to clean the surface of a cleaning workpiece placed on the XY axis platform;
the axis control module is in communication (electric) connection with the XY axis platform and is used for controlling the XY axis platform to move along the X, Y axis direction so as to drive the surface of the cleaning workpiece placed on the XY axis platform to move along the X, Y axis direction, and cleaning the surface of the cleaning workpiece and measuring the resistance value of each point on the surface of the cleaning workpiece are completed;
the probe height self-adaptive adjustment control module is in communication connection with the probe height self-adaptive adjustment unit and is used for controlling the sliding of the miniature guide rail sliding table so as to drive the probes in the probe array to perform height self-adaptive adjustment;
the resistance measurement and acquisition control module is in communication connection with the resistance measuring instrument and is used for resistance measurement and acquisition; the resistance measurement and acquisition control module is in communication connection with the signal processing unit;
the signal processing unit receives data of the resistance measurement and acquisition control module, processes the data, interprets the processed data, and then feeds the interpreted data back to the cleaning head control module, the shaft control module and the probe height self-adaptive adjustment control module respectively, so that laser head light emission, surface movement of a cleaning workpiece along X and Y axis directions, laser cleaning of probe height self-adaptive adjustment and cleaning quality on-line monitoring are realized.
Specifically, after the surface of the cleaning workpiece is subjected to preliminary cleaning, the signal processing unit receives data of the resistance measurement and acquisition control module, the shaft control module and the probe height self-adaptive adjustment control module, performs data processing, interprets the processed data, finds out a place where the surface of the cleaning workpiece is not cleaned, and realizes online monitoring of cleaning quality;
when the surface of the cleaning workpiece which is not cleaned is ready to be cleaned again, the signal processing unit feeds back the data processing result obtained after the surface of the cleaning workpiece is subjected to preliminary cleaning to the cleaning head control module, the shaft control module and the probe height self-adaptive adjustment control module, so that the re-cleaning and the online monitoring of the cleaning quality of the surface of the cleaning workpiece which is not cleaned are realized.
The specific method for realizing laser cleaning and cleaning quality on-line monitoring by feeding back the signal processing unit to the cleaning head control module, the shaft control module and the probe height self-adaptive adjustment control module comprises the following steps:
firstly, building standard height distribution values of all positions (coordinates) of the surface of a cleaning workpiece obtained by a process test, and cleaning standard resistance distribution values of all coordinates of the surface of the cleaning workpiece;
when laser cleaning and cleaning quality online monitoring are performed, the probe height is timely adjusted through the probe height self-adaptive adjustment control module, and the signal processing unit obtains the height distribution value of the workpiece surface under each coordinate by utilizing the cleaning workpiece surface position information (coordinates) and the corresponding resistance value, and meanwhile obtains the resistance value distribution value of the workpiece surface under each coordinate; according to the height distribution value and the resistance value distribution value, the cleaning quality of all parts on the surface of the uneven workpiece can be monitored, and the parts which are not cleaned can be accurately positioned.
The probe height self-adaptive adjusting unit can adapt to various workpieces with uneven surfaces to be cleaned, and can automatically adjust the height of the probes, so that each probe in the resistor probe array can contact the uneven surfaces of the workpieces.
Example two:
the difference between the embodiment and the first embodiment is that the resistance measurement precision of the resistance meter is 0.001 milliohm, the precision is higher, the influence of laser cleaning laser environment such as illumination and noise on a monitoring system can be greatly reduced, and the adaptability to different environments is stronger.
In this example, a square resistance probe array of 5cm×5cm was selected.
The remainder is the same as example one.
Example three:
the difference between the embodiment and the first embodiment is that the workstation collects the position information (coordinates) of the surface of the cleaning workpiece and the corresponding probe height distribution value in real time through the shaft control module and the probe height self-adaptive adjustment control module, and the probe height distribution value is filtered by a first-order filter, so that the measurement error is reduced.
In this example, a 10cm×10cm square resistive probe array was selected. The resistance measurement accuracy of the resistance meter is specifically selected to be 0.001 milliohm.
The remainder is the same as example one.
Example four:
the invention also provides a high-precision laser cleaning and cleaning quality on-line monitoring method, which comprises the following steps:
s1, constructing standard height distribution values of the surface of the cleaning workpiece under each coordinate according to a process test, and constructing standard resistance distribution values of the surface of the cleaning workpiece under each coordinate;
s2, selecting the arrangement mode and the number of the probe arrays according to the area of the surface of the workpiece to be cleaned; the arrangement mode is one of square, rectangle or round;
s3, adjusting the measurement precision of the resistance measuring instrument according to the cleaning process requirement;
s4, controlling the probe height self-adaptive adjusting unit and the resistance measuring instrument through the workstation to drive the resistance probe array to finish cleaning and resistance measurement of the surface of the whole cleaning workpiece;
specifically, a cleaning head control module is controlled by a workstation to control a laser head to emit light to clean the surface of a cleaning workpiece placed on an XY axis platform; the control shaft control module controls the XY shaft platform to move along the X, Y shaft direction, so as to drive the cleaning workpiece placed on the XY shaft platform to move along the X, Y shaft direction, and the cleaning and resistance measurement of the surface of the whole cleaning workpiece are completed by matching with the laser head and the resistance probe array probe, and the horizontal position information (coordinates) of the resistance probe is transmitted to the signal processing unit; the control resistance measurement and acquisition control module is used for acquiring the resistance value of each resistance probe measured by the resistance measuring instrument and transmitting the resistance value to the signal processing unit;
in the cleaning process, the probe height self-adaptive adjustment control module controls the probe height self-adaptive adjustment unit to automatically adjust the probe height, so that each probe can contact the surface of the uneven workpiece and convey probe height information to the signal processing unit;
acquiring horizontal position (coordinate) information of the resistance measuring probe, probe height information and resistance information of each horizontal position point in real time through the signal processing unit;
the signal processing unit obtains the height value distribution value of the workpiece surface under each coordinate by utilizing the position (coordinate) information of the workpiece surface to be cleaned and the corresponding probe height value and resistance value, and obtains the resistance value distribution value of the workpiece surface under each coordinate; according to the height distribution value and the resistance value distribution value, the cleaning quality of the uneven workpiece surface is monitored, and the part which is not cleaned is accurately positioned.
Specifically, in the step S1, standard height distribution values and standard resistance distribution values are constructed, and process tests are performed according to different cleaning workpiece substrates.
Specifically, the criteria for monitoring the cleaning quality of the uneven workpiece surface in the step S4 are as follows:
when the difference between the resistance value measured by the resistance meter under a certain coordinate and the resistance value when the workpiece is cleaned is more than 10%, judging that the workpiece is not cleaned under the coordinate, otherwise, cleaning, and judging all the coordinates of the cleaned workpiece.
In this embodiment, according to the process experimental data, the corresponding relationship between the cleaning effect and the resistance value of the substrate of the different cleaning workpieces is established, in this embodiment, the cleaning workpiece made of aluminum plate is taken as an example, and in another embodiment, the cleaning workpiece made of copper plate is taken as an example, as shown in table 1;
table 1 process test standard resistance data
| Material for cleaning work piece | Average value of resistance measured under coordinates of each point when workpiece is cleaned |
| Aluminum (Al) | 155.2472Ω |
| Copper (Cu) | 1.5847Ω |
Claims (8)
1. A high-precision laser cleaning and cleaning quality on-line monitoring device is characterized by comprising an XY axis platform, a laser cleaning head, a resistance probe array, a resistance measuring instrument, a probe height self-adaptive adjusting unit and a workstation,
the laser cleaning head comprises a laser head, a vibrating mirror and a field lens, when the laser is used for cleaning, laser beams are emitted from the laser head, sequentially irradiate the surface of a cleaning workpiece placed on an XY axis platform through the vibrating mirror and the field lens, and move the surface of the cleaning workpiece through the XY axis platform to complete the surface cleaning work of the whole cleaning workpiece;
the resistance probe array comprises a probe array with a specific shape formed by arranging a plurality of resistance probes, and the resistance probe array is one of square, rectangular or circular probe arrays;
each probe in the array of probes is for contacting a point on the surface of the cleaning workpiece;
the resistance measuring instrument is connected with the resistance probes of the resistance probe array and is used for measuring resistance values of all points on the surface of the cleaning workpiece;
the probe height self-adaptive adjustment unit comprises a probe height adjustment driver and a micro guide rail sliding table, the probe array is fixed on the micro guide rail sliding table, and the probe height adjustment driver drives the micro guide rail sliding table to slide so as to drive probes in the probe array to carry out height self-adaptive adjustment;
the workstation comprises a cleaning head control module, a shaft control module, a probe height self-adaptive adjustment control module, a resistance measurement and acquisition control module and a signal processing unit;
the cleaning head control module is electrically connected with the laser cleaning head and is used for controlling the laser head to emit light to clean the surface of a cleaning workpiece placed on the XY axis platform;
the axis control module is in communication connection with the XY axis platform and is used for controlling the XY axis platform to move along the X, Y axis direction so as to drive the surface of the cleaning workpiece placed on the XY axis platform to move along the X, Y axis direction, and cleaning the surface of the cleaning workpiece and measuring the resistance value of each point on the surface of the cleaning workpiece are completed;
the probe height self-adaptive adjustment control module is in communication connection with the probe height self-adaptive adjustment unit and is used for controlling the sliding of the miniature guide rail sliding table so as to drive the probes in the probe array to perform height self-adaptive adjustment;
the resistance measurement and acquisition control module is in communication connection with the resistance measuring instrument and is used for resistance measurement and acquisition; the resistance measurement and acquisition control module is also in communication connection with the signal processing unit;
the signal processing unit receives data of the resistance measurement and acquisition control module, processes the data, interprets the processed data, and then feeds the interpreted data back to the cleaning head control module, the shaft control module and the probe height self-adaptive adjustment control module respectively, so that laser head light emission, surface movement of a cleaning workpiece along X and Y axis directions, laser cleaning of probe height self-adaptive adjustment and cleaning quality on-line monitoring are realized.
2. The apparatus of claim 1, wherein the resistive probe array is configured to determine the number of resistive probes of the resistive probe array according to the size of the surface of the workpiece to be cleaned, and select the shape of the resistive probe array according to the shape of the surface of the workpiece to be cleaned, the arrangement being one of square, rectangular, or circular.
3. The device according to claim 1 or 2, wherein the specific method for feeding back the signal processing unit to the cleaning head control module, the shaft control module and the probe height self-adaptive adjustment control module to realize laser cleaning and online monitoring of cleaning quality is as follows:
firstly, building standard height distribution values of the surface of a cleaning workpiece under each coordinate of a process test, and cleaning standard resistance distribution values of the surface of the workpiece under each coordinate;
when laser cleaning and cleaning quality online monitoring are performed, the probe height is timely adjusted through the probe height self-adaptive adjustment control module, and the signal processing unit obtains the height distribution value of each coordinate on the surface of the workpiece by utilizing the cleaning workpiece surface position information and the corresponding resistance value, and meanwhile obtains the resistance value distribution value of each coordinate on the surface of the workpiece; according to the height distribution value and the resistance value distribution value, the cleaning quality of all parts on the surface of the uneven workpiece can be monitored, and the parts which are not cleaned can be accurately positioned.
4. The apparatus of claim 3 wherein the resistance measurement by the resistance meter is 0.001 milliohms.
5. The device of claim 1, wherein the workstation collects the surface position information of the cleaning workpiece and the corresponding probe height distribution value in real time through the shaft control module and the probe height self-adaptive adjustment control module, and adopts a first-order filter to carry out filtering treatment, so as to reduce measurement errors.
6. The high-precision laser cleaning and cleaning quality on-line monitoring method is characterized by comprising the following steps of:
s1, constructing standard height distribution values of the surface of the cleaning workpiece under each coordinate according to a process test, and constructing standard resistance distribution values of the surface of the cleaning workpiece under each coordinate;
s2, selecting the number of arrangement modes of the probe arrays according to the area of the surface of the workpiece to be cleaned;
s3, adjusting the measurement precision of the resistance measuring instrument according to the cleaning process requirement;
s4, controlling the probe height self-adaptive adjusting unit and the resistance measuring instrument through the workstation to drive the resistance probe array to finish cleaning and resistance measurement of the surface of the whole cleaning workpiece;
in the cleaning process, the probe height self-adaptive adjusting unit automatically adjusts the probe height so that each probe can contact the uneven workpiece surface;
acquiring horizontal position information of a resistance measuring probe, probe height information and resistance information of each horizontal position point in real time through a signal processing unit;
the signal processing unit obtains the height value distribution value of the workpiece surface under each coordinate by utilizing the position information of the workpiece surface to be cleaned and the corresponding probe height value and resistance value, and obtains the resistance value distribution value of the workpiece surface under each coordinate; according to the height distribution value and the resistance value distribution value, the cleaning quality of the uneven workpiece surface is monitored, and the part which is not cleaned is accurately positioned.
7. The method of claim 6, wherein the step S1 is performed by constructing a standard height profile and a standard resistance profile, and performing a process test based on different cleaning workpiece substrates.
8. The method according to any one of claims 6-7, wherein the criteria for monitoring the cleaning quality of the uneven workpiece surface throughout step S4 are:
when the difference between the resistance value measured by the resistance meter under a certain coordinate and the resistance value when the workpiece is cleaned is more than 10%, judging that the workpiece is not cleaned under the coordinate, otherwise, cleaning, and judging all the coordinates of the cleaned workpiece.
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| CN103060187A (en) * | 2012-12-31 | 2013-04-24 | 中山大学达安基因股份有限公司 | Detecting device for detecting electrochemical genes |
| WO2019016224A1 (en) * | 2017-07-21 | 2019-01-24 | Carl Zeiss Smt Gmbh | Method and apparatuses for disposing of excess material of a photolithographic mask |
| CN110773518A (en) * | 2019-11-06 | 2020-02-11 | 哈尔滨工业大学 | Laser cleaning real-time monitoring device and method |
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| CN103060187A (en) * | 2012-12-31 | 2013-04-24 | 中山大学达安基因股份有限公司 | Detecting device for detecting electrochemical genes |
| WO2019016224A1 (en) * | 2017-07-21 | 2019-01-24 | Carl Zeiss Smt Gmbh | Method and apparatuses for disposing of excess material of a photolithographic mask |
| CN110773518A (en) * | 2019-11-06 | 2020-02-11 | 哈尔滨工业大学 | Laser cleaning real-time monitoring device and method |
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