CN112452945A - High-precision laser cleaning and cleaning quality on-line monitoring device and method - Google Patents
High-precision laser cleaning and cleaning quality on-line monitoring device and method Download PDFInfo
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- CN112452945A CN112452945A CN202010890129.XA CN202010890129A CN112452945A CN 112452945 A CN112452945 A CN 112452945A CN 202010890129 A CN202010890129 A CN 202010890129A CN 112452945 A CN112452945 A CN 112452945A
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
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- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/041—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body
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Abstract
The invention discloses a high-precision laser cleaning and cleaning quality on-line monitoring device which comprises an XY-axis platform, a laser cleaning head, a resistance probe array, a resistance measuring instrument, a probe height self-adaptive adjusting unit and a workstation. The invention detects the cleaning condition of each part on the workpiece to be cleaned, so that the real-time detection result is little influenced by the environment, the measurement accuracy is high, the position with poor cleaning effect is accurately positioned, and the cleaning effect is ensured.
Description
Technical Field
The invention relates to the field of laser cleaning and cleaning quality monitoring, in particular to a device and a method for high-precision laser cleaning and online monitoring of cleaning quality.
Background
The laser cleaning is a process of irradiating the surface of a workpiece by using laser to enable pollutants, rusty matters and the like on the surface to be subjected to changes such as instant peeling or evaporation after absorbing laser energy and finally be effectively removed from a base material, is a green and efficient cleaning mode, is gradually accepted by the public in industrial production and living application, and has been greatly developed in the fields of molds, national defense weaponry, aircraft waste skin paint, building outer walls, precision instruments, electronic industry, pipelines of nuclear reactors, historical relics and the like. Has the advantages of environmental protection, non-contact, accurate control and the like.
In laser cleaning application, the cleaning effect can be measured only after the cleaning is completed, but the influence of cleaning parameters in the cleaning process, such as the laser energy density, the irradiation time and the like, can cause substrate damage or unclean cleaning, so that the online monitoring of the laser cleaning effect is very important.
However, the laser cleaning has various mechanisms for removing the same pollutants, and the cleaning environment is complicated, so that the currently common laser cleaning quality monitoring method such as the acoustic wave method is greatly influenced by the environment and has low precision, real-time monitoring, recording and analysis of the cleaning effect cannot be realized, the requirement on equipment is high, the measurement steps are complicated, and the consumed time is long.
In the patent 201911075973.0 of the prior art, "a laser cleaning real-time monitoring device and method", a conductive wheel is used to test the resistance value change before and after cleaning of a whole workpiece to be cleaned, and the laser cleaning effect is reflected in real time by using the change of a resistance signal, but the cleaning condition of each part on the workpiece to be cleaned cannot be detected, the surface of the workpiece to be cleaned is generally only a concave-convex uneven surface, is greatly influenced by the environment, the measurement accuracy is not high enough, the position with poor cleaning effect cannot be accurately positioned, and the cleaning effect cannot be ensured.
Disclosure of Invention
The invention solves the problem that the cleaning condition of each part on a workpiece to be cleaned is detected, so that the real-time detection result is little influenced by the environment, the measurement accuracy is high, the position with poor cleaning effect is accurately determined, and the cleaning effect is ensured. The invention provides a high-precision laser cleaning and cleaning quality on-line monitoring device, which is characterized by comprising an XY-axis platform, a laser cleaning head, a resistance probe array, a resistance measuring instrument, a probe height self-adaptive adjusting unit and a workstation,
the laser cleaning head comprises a laser head, a galvanometer and a field lens, and during laser cleaning, a laser beam is emitted from the laser head, irradiates the surface of a cleaning workpiece placed on the XY-axis platform through the galvanometer and the field lens in sequence, and moves the cleaning workpiece through the XY-axis platform to complete the surface cleaning work of the whole cleaning workpiece;
the resistance probe array comprises a probe array with a specific shape formed by arranging a plurality of resistance measuring probes, and is one of a square, rectangular or circular probe array;
each probe in the probe array is used for contacting and cleaning a point on the surface of a workpiece;
the resistance measuring instrument is connected (electrically connected) with the resistance probes of the resistance probe array and is used for measuring the resistance values of all points on the surface of the cleaning workpiece;
the probe height self-adaptive adjusting unit comprises a probe height adjusting driver and a micro guide rail sliding table, the probe array is fixed on the micro guide rail sliding table, and the probe height adjusting driver drives the micro guide rail sliding table to slide so as to drive probes in the probe array to carry out height self-adaptive adjustment; the probe height adjusting driver is a motor or other driving equipment;
the working station comprises a cleaning head control module, an axis control module, a probe height self-adaptive adjustment control module, a resistance measurement and acquisition control module and a signal processing unit;
the cleaning head control module is electrically connected with the laser cleaning head and used for controlling the laser head to emit light to clean the surface of a cleaning workpiece placed on the XY-axis platform;
the axis control module is in communication connection with the XY axis platform and is used for controlling the XY axis platform to move along the X, Y axis direction, so that the surface of the cleaning workpiece placed on the XY axis platform is driven to move along the X, Y axis direction, and the cleaning of the surface of the cleaning workpiece and the measurement of the resistance value of each point on the surface of the cleaning workpiece are completed;
the probe height self-adaptive adjustment control module is in communication connection with the probe height self-adaptive adjustment unit and is used for controlling the sliding of the micro guide rail sliding table so as to drive the probes in the probe array to perform height self-adaptive adjustment;
the resistance measurement and acquisition control module is in communication connection with the resistance measuring instrument and is used for resistance measurement and acquisition; the resistance measurement and acquisition control module is in communication connection with the signal processing unit;
the signal processing unit receives the data of the resistance measurement and acquisition control module, processes the data, interprets the processed data, and feeds the interpreted data back to the cleaning head control module, the axis control module and the probe height self-adaptive adjustment control module respectively, so that laser cleaning and cleaning quality on-line monitoring of laser head light emission, workpiece cleaning surface movement along X and Y axis directions and probe height self-adaptive adjustment are realized.
The resistance probe array and the probe height self-adaptive adjusting unit are arranged on one side of the laser cleaning head.
Furthermore, the resistance probe array can determine the number of the resistance probes of the resistance probe array according to the area of the surface of the workpiece to be cleaned, and the shape of the arrangement mode of the resistance probe array is selected according to the shape of the surface of the workpiece to be cleaned, wherein the arrangement mode is one of square, rectangle or circle.
Further, the specific method for realizing laser cleaning and online monitoring of cleaning quality by feeding back the signal processing unit to the cleaning head control module, the axis control module and the probe height self-adaptive adjustment control module comprises the following steps:
firstly, establishing a standard height distribution value of each position (coordinate) of the surface of a cleaning workpiece obtained by a process test, and a standard resistance value distribution value of each coordinate of the surface of the cleaning workpiece;
when laser cleaning and cleaning quality on-line monitoring are carried out, the height of the probe is timely adjusted through the probe height self-adaptive adjusting control module, the signal processing unit obtains height distribution values of the workpiece surface under each coordinate by using cleaning workpiece surface position information (coordinates) and corresponding resistance values, and simultaneously obtains the resistance value distribution values of the workpiece surface under each coordinate; therefore, the cleaning quality of each part of the surface of the uneven workpiece can be monitored, and the part which is not cleaned can be accurately positioned.
The probe height self-adaptive adjusting unit can adapt to various workpieces to be cleaned with uneven surfaces and can automatically adjust the height of the probe, so that each probe in the resistance probe array can contact the uneven surfaces of the workpieces.
Further, the resistance measurement precision of the resistance meter measurement is 0.001 milliohm. The precision is higher, can greatly reduced laser cleaning laser environment like illumination, noise to monitoring system's influence, and the adaptability to different environment is stronger.
Furthermore, the workstation collects the surface position information (coordinates) of the cleaning workpiece and corresponding probe height distribution numerical values in real time through the axis control module and the probe height self-adaptive adjustment control module, and adopts a first-order filter for filtering, so that the measurement error is reduced.
The invention also provides a high-precision laser cleaning and cleaning quality on-line monitoring method, which comprises the following steps:
s1, establishing standard height distribution values under each coordinate of the surface of the cleaning workpiece obtained according to a process test, and standard resistance value distribution values under each coordinate of the surface of the cleaning workpiece;
s2, selecting the arrangement mode and the number of the probe arrays according to the area of the surface of the workpiece to be cleaned; the arrangement mode is one of square, rectangle or circle;
s3, adjusting the measurement precision of the resistance measuring instrument according to the requirements of the cleaning process;
s4, driving the resistance probe array to complete the cleaning and resistance measurement of the whole cleaning workpiece surface by the workstation control probe height self-adaptive adjusting unit and the resistance measuring instrument;
in the cleaning process, the probe height self-adaptive adjusting unit automatically adjusts the height of the probe, so that each probe can contact the surface of an uneven workpiece;
acquiring horizontal position (coordinate) information, probe height information and resistance information of each horizontal position point of the resistance measuring probe in real time through the signal processing unit;
the signal processing unit obtains a height value distribution numerical value of each coordinate of the surface of the workpiece by using the position (coordinate) information of the surface of the workpiece to be cleaned and the corresponding height value and resistance value of the probe, and obtains a resistance value distribution numerical value of each coordinate of the surface of the workpiece at the same time; according to the height distribution numerical value and the resistance value distribution numerical value, the cleaning quality of all parts of the surface of the uneven workpiece is monitored, and the parts which are not cleaned are accurately positioned.
Specifically, the standard height distribution value and the standard resistance value distribution value are constructed in step S1, and are obtained by performing process tests according to different cleaned workpiece substrates.
Specifically, the criterion for monitoring the cleaning quality of all parts of the surface of the uneven workpiece in the step S4 is as follows:
when the difference value between the resistance value measured by the resistance meter under a certain coordinate and the resistance value when the workpiece is cleaned is larger than 10%, judging that the workpiece is not cleaned under the coordinate, otherwise, judging that the workpiece is cleaned, and judging all coordinates of the cleaned workpiece.
The invention combines a height-adjustable resistance measuring probe with a shaft control system, combines the surface position information of a cleaning workpiece, the height information of the probe and the resistance value information, firstly constructs a standard height distribution numerical value under each position (coordinate) of the surface of the cleaning workpiece, and cleans the standard resistance value distribution numerical value under each position (coordinate) of the surface of the cleaning workpiece; then, obtaining a height value distribution numerical value of each coordinate on the surface of the workpiece by utilizing the surface position (coordinate) information of the workpiece to be cleaned and the corresponding height value and resistance value of the probe, and simultaneously obtaining a resistance value distribution numerical value of each coordinate on the surface of the workpiece; according to the height distribution numerical value and the resistance value distribution numerical value, the cleaning quality of all parts of the surface of the uneven workpiece is monitored, and the parts which are not cleaned are accurately positioned. The number of the resistance probe arrays is determined according to the area of the surface of the workpiece to be cleaned, and the arrangement mode and the shape of the resistance probe arrays are selected according to the shape of the surface of the workpiece to be cleaned. The probe height self-adaptive adjusting device is suitable for cleaning workpieces with various uneven surfaces, and can automatically adjust the height of the probe, so that each probe in the resistance probe array can contact the uneven surfaces of the workpieces, and the surface of the workpiece to be detected is completely and accurately detected.
And the workstation inputs proper parameters to control the scanning straight line of the laser cleaning head to clean the cleaning workpiece, and simultaneously controls the XY-axis platform to move, so that the laser cleaning head cleans all pollutants on the surface of the material. The adopted resistance measurement precision can reach 0.001 milliohm, the precision is higher, the influence of laser cleaning laser environment such as illumination and noise on a monitoring system can be greatly reduced, and the adaptability to different environments is stronger. In a word, the invention detects the cleaning condition of each part on the workpiece to be cleaned, so that the real-time detection result is slightly influenced by the environment, the measurement accuracy is high, the position with poor cleaning effect is accurately positioned, and the cleaning effect is ensured.
Drawings
FIG. 1 is a schematic diagram of a laser cleaning and cleaning quality on-line monitoring device according to the present invention;
FIG. 2 is a diagram showing the arrangement of the resistive probe array according to the present invention.
Wherein: the device comprises a laser cleaning head 1, a resistance probe array 2, a probe height self-adaptive adjusting device 3, a work station 4, an XY axis platform 5, a resistance measuring instrument 6, a laser galvanometer 7, a first field lens 8, a motor and a miniature guide rail sliding table 9, a signal processing unit 10 and a resistance probe 11.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
Example one:
referring to fig. 1, the invention provides a high-precision laser cleaning and cleaning quality on-line monitoring device, which is characterized by comprising an XY-axis platform, a laser cleaning head, a resistance probe array, a resistance measuring instrument, a probe height self-adaptive adjusting unit and a workstation,
the laser cleaning head comprises a laser head, a galvanometer and a field lens, and during laser cleaning, a laser beam is emitted from the laser head, irradiates the surface of a cleaning workpiece placed on the XY-axis platform through the galvanometer and the field lens in sequence, and finishes the surface cleaning work of the whole cleaning workpiece by moving the surface of the cleaning workpiece through the XY-axis platform;
the resistance probe array comprises a probe array with a specific shape formed by arranging a plurality of resistance measuring probes, and is one of a square, rectangular or circular probe array; the resistance probe array can determine the number of the resistance probes of the resistance probe array according to the area of the surface of a workpiece to be cleaned, and the shape of the arrangement mode of the resistance probe array is selected according to the shape of the surface of the workpiece to be cleaned. The probe array of this embodiment is square, and has three types of 2cm by 2cm, 5cm by 5cm and 10cm by 10cm, if the area of the surface of the workpiece to be cleaned is less than 25cm2Selecting a square resistance probe array of 2cm by 2 cm; if the area of the surface of the workpiece to be cleaned is more than or equal to 25cm2And less than 100cm2Selecting a 5 cm-5 cm square resistance probe array; if the area of the surface of the workpiece to be cleaned is more than or equal to 100cm2Selecting a square probe array of 10cm by 10 cm; 2cm by 2cm were chosen for this example.
Each probe in the probe array is used for contacting and cleaning a point on the surface of a workpiece;
the resistance measuring instrument is connected (electrically connected) with the resistance probes of the resistance probe array and is used for measuring the resistance values of all points on the surface of the cleaning workpiece;
the probe height self-adaptive adjusting unit comprises a probe height adjusting driver and a micro guide rail sliding table, the probe array is fixed on the micro guide rail sliding table, and the probe height adjusting driver drives the micro guide rail sliding table to slide so as to drive probes in the probe array to carry out height self-adaptive adjustment; the probe height adjusting driver is a servo motor or other driving equipment; in the embodiment, the servo motor is arranged in the guide rail sliding table to control the sliding table to move, and the motor driver controls the movement of the servo motor.
The resistance probe array and the probe height self-adaptive adjusting unit are arranged on one side of the laser cleaning head.
The working station comprises a cleaning head control module, an axis control module, a probe height self-adaptive adjustment control module, a resistance measurement and acquisition control module and a signal processing unit;
the cleaning head control module is electrically connected with the laser cleaning head and used for controlling the laser head to emit light to clean the surface of a cleaning workpiece placed on the XY-axis platform;
the axis control module is in communication (electrical) connection with the XY axis platform and is used for controlling the XY axis platform to move along the X, Y axis direction, so that the surface of the cleaning workpiece placed on the XY axis platform is driven to move along the X, Y axis direction, and the cleaning of the surface of the cleaning workpiece and the measurement of the resistance value of each point on the surface of the cleaning workpiece are completed;
the probe height self-adaptive adjustment control module is in communication connection with the probe height self-adaptive adjustment unit and is used for controlling the sliding of the micro guide rail sliding table so as to drive the probes in the probe array to perform height self-adaptive adjustment;
the resistance measurement and acquisition control module is in communication connection with the resistance measuring instrument and is used for resistance measurement and acquisition; the resistance measurement and acquisition control module is in communication connection with the signal processing unit;
the signal processing unit receives the data of the resistance measurement and acquisition control module, processes the data, interprets the processed data, and feeds the interpreted data back to the cleaning head control module, the axis control module and the probe height self-adaptive adjustment control module respectively, so that laser cleaning and cleaning quality on-line monitoring of laser head light emission, workpiece cleaning surface movement along X and Y axis directions and probe height self-adaptive adjustment are realized.
Specifically, after the surface of the cleaning workpiece is preliminarily cleaned, the signal processing unit receives data of the resistance measurement and acquisition control module, the axis control module and the probe height self-adaptive adjustment control module, processes the data, interprets the processed data, finds out the place where the surface of the cleaning workpiece is not cleaned, and realizes the online monitoring of the cleaning quality;
when the surface of the workpiece which is not cleaned is to be cleaned again, the signal processing unit feeds back a data processing result obtained after the surface of the workpiece is cleaned preliminarily to the cleaning head control module, the axis control module and the probe height self-adaptive adjustment control module, so that the surface of the workpiece which is not cleaned is cleaned again and the cleaning quality is monitored on line.
The specific method for realizing laser cleaning and online monitoring of cleaning quality by feeding back the signal processing unit to the cleaning head control module, the shaft control module and the probe height self-adaptive adjustment control module comprises the following steps:
firstly, establishing a standard height distribution value of each position (coordinate) of the surface of a cleaning workpiece obtained by a process test, and a standard resistance value distribution value of each coordinate of the surface of the cleaning workpiece;
when laser cleaning and cleaning quality on-line monitoring are carried out, the height of the probe is timely adjusted through the probe height self-adaptive adjusting control module, the signal processing unit obtains height distribution values of the workpiece surface under each coordinate by using cleaning workpiece surface position information (coordinates) and corresponding resistance values, and simultaneously obtains the resistance value distribution values of the workpiece surface under each coordinate; therefore, the cleaning quality of each part of the surface of the uneven workpiece can be monitored, and the part which is not cleaned can be accurately positioned.
The probe height self-adaptive adjusting unit can adapt to various workpieces to be cleaned with uneven surfaces and can automatically adjust the height of the probe, so that each probe in the resistance probe array can contact the uneven surfaces of the workpieces.
Example two:
the difference between the embodiment and the embodiment I is that the resistance measurement precision measured by the resistance meter is 0.001 milliohm, the precision is high, the influence of laser cleaning laser environment such as illumination and noise on a monitoring system can be greatly reduced, and the adaptability to different environments is stronger.
This example selects a 5cm by 5cm square array of resistive probes.
The rest is the same as the example one.
Example three:
the difference between the embodiment and the first embodiment is that the workstation collects the surface position information (coordinates) of the cleaned workpiece and the corresponding probe height distribution numerical value in real time through the axis control module and the probe height adaptive adjustment control module, and the probe height distribution numerical value is filtered by adopting a first-order filter, so that the measurement error is reduced.
This example selects a 10cm by 10cm square array of resistive probes. The resistance measuring precision measured by the resistance meter is specifically 0.001 milliohm.
The rest is the same as the example one.
Example four:
the invention also provides a high-precision laser cleaning and cleaning quality on-line monitoring method, which comprises the following steps:
s1, establishing standard height distribution values under each coordinate of the surface of the cleaning workpiece obtained according to a process test, and standard resistance value distribution values under each coordinate of the surface of the cleaning workpiece;
s2, selecting the arrangement mode and the number of the probe arrays according to the area of the surface of the workpiece to be cleaned; the arrangement mode is one of square, rectangle or circle;
s3, adjusting the measurement precision of the resistance measuring instrument according to the requirements of the cleaning process;
s4, driving the resistance probe array to complete the cleaning and resistance measurement of the whole cleaning workpiece surface by the workstation control probe height self-adaptive adjusting unit and the resistance measuring instrument;
specifically, a cleaning head control module is controlled through a workstation, and the laser head is controlled to emit light to clean the surface of a cleaning workpiece placed on an XY-axis platform; the control shaft control module controls the XY shaft platform to move along the X, Y shaft direction, further drives the cleaning workpiece placed on the XY shaft platform to move along the X, Y shaft direction, and is matched with the laser head and the resistance probe array probe to complete the cleaning and resistance measurement of the whole surface of the cleaning workpiece and transmit the horizontal position information (coordinates) of the resistance probe to the signal processing unit; the control resistance measuring and collecting control module is used for collecting the resistance value of each resistance probe measured by the resistance measuring instrument and transmitting the resistance value to the signal processing unit;
in the cleaning process, the probe height self-adaptive adjustment control module controls the probe height self-adaptive adjustment unit to automatically adjust the height of the probe, so that each probe can contact the surface of the rugged workpiece and transmit the height information of the probe to the signal processing unit;
acquiring horizontal position (coordinate) information, probe height information and resistance information of each horizontal position point of the resistance measuring probe in real time through the signal processing unit;
the signal processing unit obtains a height value distribution numerical value of each coordinate of the surface of the workpiece by using the position (coordinate) information of the surface of the workpiece to be cleaned and the corresponding height value and resistance value of the probe, and obtains a resistance value distribution numerical value of each coordinate of the surface of the workpiece at the same time; according to the height distribution numerical value and the resistance value distribution numerical value, the cleaning quality of all parts of the surface of the uneven workpiece is monitored, and the parts which are not cleaned are accurately positioned.
Specifically, the standard height distribution value and the standard resistance value distribution value are constructed in step S1, and are obtained by performing process tests according to different cleaned workpiece substrates.
Specifically, the criterion for monitoring the cleaning quality of all parts of the surface of the uneven workpiece in the step S4 is as follows:
when the difference value between the resistance value measured by the resistance meter under a certain coordinate and the resistance value when the workpiece is cleaned is larger than 10%, judging that the workpiece is not cleaned under the coordinate, otherwise, judging that the workpiece is cleaned, and judging all coordinates of the cleaned workpiece.
In the embodiment, according to the process experiment data, the corresponding relationship between the cleaning effect of the different cleaning workpiece base materials and the resistance value is established, the cleaning workpiece made of an aluminum plate is taken as an example in the embodiment, and the cleaning workpiece made of a copper plate is taken as an example in the other embodiment, as shown in table 1;
table 1 process test standard resistance data
| Material for cleaning workpiece | Average value of resistance measured under coordinates of each point when workpiece is cleaned |
| Aluminium | 155.2472Ω |
| Copper (Cu) | 1.5847Ω |
Claims (8)
1. A high-precision laser cleaning and cleaning quality on-line monitoring device is characterized by comprising an XY-axis platform, a laser cleaning head, a resistance probe array, a resistance measuring instrument, a probe height self-adaptive adjusting unit and a workstation,
the laser cleaning head comprises a laser head, a galvanometer and a field lens, and during laser cleaning, a laser beam is emitted from the laser head, irradiates the surface of a cleaning workpiece placed on the XY-axis platform through the galvanometer and the field lens in sequence, and finishes the surface cleaning work of the whole cleaning workpiece by moving the surface of the cleaning workpiece through the XY-axis platform;
the resistance probe array comprises a probe array with a specific shape formed by arranging a plurality of resistance measuring probes, and is one of a square, rectangular or circular probe array;
each probe in the probe array is used for contacting and cleaning a point on the surface of a workpiece;
the resistance measuring instrument is connected with the resistance probes of the resistance probe array and is used for measuring the resistance values of all points on the surface of the cleaning workpiece;
the probe height self-adaptive adjusting unit comprises a probe height adjusting driver and a micro guide rail sliding table, the probe array is fixed on the micro guide rail sliding table, and the probe height adjusting driver drives the micro guide rail sliding table to slide so as to drive probes in the probe array to carry out height self-adaptive adjustment;
the working station comprises a cleaning head control module, an axis control module, a probe height self-adaptive adjustment control module, a resistance measurement and acquisition control module and a signal processing unit;
the cleaning head control module is electrically connected with the laser cleaning head and used for controlling the laser head to emit light to clean the surface of a cleaning workpiece placed on the XY-axis platform;
the axis control module is in communication connection with the XY axis platform and is used for controlling the XY axis platform to move along the X, Y axis direction, so that the surface of the cleaning workpiece placed on the XY axis platform is driven to move along the X, Y axis direction, and the cleaning of the surface of the cleaning workpiece and the measurement of the resistance value of each point on the surface of the cleaning workpiece are completed;
the probe height self-adaptive adjustment control module is in communication connection with the probe height self-adaptive adjustment unit and is used for controlling the sliding of the micro guide rail sliding table so as to drive the probes in the probe array to carry out height self-adaptive adjustment;
the resistance measurement and acquisition control module is in communication connection with the resistance measuring instrument and is used for measuring and acquiring resistance; the resistance measurement and acquisition control module is also in communication connection with the signal processing unit;
the signal processing unit receives the data of the resistance measurement and acquisition control module, processes the data, judges and reads the processed data, and feeds the data back to the cleaning head control module, the axis control module and the probe height self-adaptive adjustment control module respectively, so that laser cleaning and cleaning quality on-line monitoring of laser head light emission, workpiece cleaning surface movement along X and Y axis directions and probe height self-adaptive adjustment are realized.
2. The apparatus of claim 1, wherein the resistive probe array is capable of determining the number of resistive probes of the resistive probe array according to the area of the surface of the workpiece to be cleaned, and the shape of the resistive probe array is selected according to the shape of the surface of the workpiece to be cleaned, and the array is one of square, rectangular or circular.
3. The device according to claim 1 or 2, wherein the specific method for realizing laser cleaning and online monitoring of cleaning quality by feeding back the signal processing unit to the cleaning head control module, the axis control module and the probe height adaptive adjustment control module is as follows:
firstly, establishing a standard height distribution value of the surface of a cleaning workpiece under each coordinate and a standard resistance value distribution value of the surface of the cleaning workpiece under each coordinate, wherein the standard height distribution values are obtained by a process test;
when laser cleaning and cleaning quality on-line monitoring are carried out, the height of the probe is timely adjusted through the probe height self-adaptive adjusting control module, the signal processing unit obtains height distribution values of the workpiece surface under each coordinate by using the cleaning workpiece surface position information (coordinate) and the corresponding resistance value, and simultaneously obtains the resistance value distribution values of the workpiece surface under each coordinate; therefore, the cleaning quality of each part of the surface of the uneven workpiece can be monitored, and the part which is not cleaned can be accurately positioned.
4. The apparatus of claim 3 wherein the resistance meter measures the resistance with an accuracy of 0.001 milli-ohms.
5. The device of claim 1, wherein the workstation collects the surface position information of the workpiece to be cleaned and the corresponding height distribution value of the probe in real time through the axis control module and the height adaptive adjustment control module of the probe, and adopts a first-order filter for filtering processing to reduce the measurement error.
6. A high-precision laser cleaning and cleaning quality on-line monitoring method is characterized by comprising the following steps:
s1, establishing standard height distribution values of the surface of the cleaning workpiece under each coordinate obtained according to a process test, and standard resistance value distribution values of the surface of the cleaning workpiece under each coordinate;
s2, selecting the number of the arrangement modes of the probe arrays according to the area of the surface of the workpiece to be cleaned;
s3, adjusting the measurement precision of the resistance measuring instrument according to the requirements of the cleaning process;
s4, driving the resistance probe array to complete the cleaning and resistance measurement of the whole cleaning workpiece surface by the workstation control probe height self-adaptive adjusting unit and the resistance measuring instrument;
in the cleaning process, the probe height self-adaptive adjusting unit automatically adjusts the height of the probe, so that each probe can contact the surface of an uneven workpiece;
acquiring horizontal position information, probe height information and resistance information of each horizontal position point of the resistance measuring probe in real time through the signal processing unit;
the signal processing unit obtains a height value distribution numerical value of each coordinate of the surface of the workpiece by using the surface position information of the workpiece to be cleaned and the corresponding height value and resistance value of the probe, and also obtains a resistance value distribution numerical value of each coordinate of the surface of the workpiece; according to the height distribution numerical value and the resistance value distribution numerical value, the cleaning quality of all parts of the surface of the uneven workpiece is monitored, and the parts which are not cleaned are accurately positioned.
7. The method of claim 6, wherein the step S1 is performed by constructing a standard height distribution value and a standard resistance value distribution value, and performing process tests according to different cleaned workpiece substrates.
8. The method according to any one of claims 6 to 7, wherein the criterion for monitoring the cleaning quality of the uneven workpiece surface in step S4 is:
when the difference value between the resistance value measured by the resistance meter under a certain coordinate and the resistance value when the workpiece is cleaned is larger than 10%, judging that the workpiece is not cleaned under the coordinate, otherwise, judging that the workpiece is cleaned, and judging all coordinates of the cleaned workpiece.
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| CN202010890129.XA CN112452945B (en) | 2020-08-28 | 2020-08-28 | Device and method for high-precision laser cleaning and cleaning quality on-line monitoring |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115932342A (en) * | 2023-02-20 | 2023-04-07 | 天津伍嘉联创科技发展股份有限公司 | Adjustable testboard for detecting electronic components |
| CN117159142A (en) * | 2023-08-07 | 2023-12-05 | 北京铸正机器人有限公司 | Multi-point navigation probe positioning device and positioning method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103060187A (en) * | 2012-12-31 | 2013-04-24 | 中山大学达安基因股份有限公司 | Detecting device for detecting electrochemical genes |
| WO2019016224A1 (en) * | 2017-07-21 | 2019-01-24 | Carl Zeiss Smt Gmbh | Method and apparatuses for disposing of excess material of a photolithographic mask |
| CN110773518A (en) * | 2019-11-06 | 2020-02-11 | 哈尔滨工业大学 | Laser cleaning real-time monitoring device and method |
-
2020
- 2020-08-28 CN CN202010890129.XA patent/CN112452945B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103060187A (en) * | 2012-12-31 | 2013-04-24 | 中山大学达安基因股份有限公司 | Detecting device for detecting electrochemical genes |
| WO2019016224A1 (en) * | 2017-07-21 | 2019-01-24 | Carl Zeiss Smt Gmbh | Method and apparatuses for disposing of excess material of a photolithographic mask |
| CN110773518A (en) * | 2019-11-06 | 2020-02-11 | 哈尔滨工业大学 | Laser cleaning real-time monitoring device and method |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115932342A (en) * | 2023-02-20 | 2023-04-07 | 天津伍嘉联创科技发展股份有限公司 | Adjustable testboard for detecting electronic components |
| CN117159142A (en) * | 2023-08-07 | 2023-12-05 | 北京铸正机器人有限公司 | Multi-point navigation probe positioning device and positioning method |
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