CN112245346A

CN112245346A - Moisture mask and preparation method thereof

Info

Publication number: CN112245346A
Application number: CN202011060650.7A
Authority: CN
Inventors: 冯新光; 班文溥; 王珏; 王雅然; 逄婧; 杨效东
Original assignee: Huaren Health Industry Qingdao Co ltd; Huaren Pharmaceutical Co Ltd
Current assignee: Huaren Health Industry Qingdao Co ltd; Huaren Pharmaceutical Co Ltd
Priority date: 2020-09-30
Filing date: 2020-09-30
Publication date: 2021-01-22

Abstract

The invention provides a moisture mask and a preparation method thereof, the moisture mask comprises moisture skin care lotion and a mask substrate, and is characterized in that: the moisturizing skin care lotion comprises the following components in percentage by mass: 0.01 to 5 percent of icodextrin, 0.1 to 15 percent of humectant, 0.01 to 10 percent of skin conditioner, 0.01 to 0.1 percent of triethanolamine, 0.01 to 0.5 percent of thickening agent, 0.1 to 0.5 percent of preservative, 0.001 to 0.1 percent of daily essence and the balance of deionized water. The preparation method of the moisturizing facial mask comprises the preparation of a facial mask base material and a moisturizing skin care lotion, and the raw materials are prepared according to the raw material proportion of the moisturizing skin care lotion to prepare the moisturizing skin care lotion. The produced moisturizing mask has a good moisturizing effect, and can provide a layer of barrier for resisting foundation make-up, color makeup, external environmental pollution, dust and the like for the skin and maintain the clean and healthy state of the skin; the preparation method is simple and the preparation cost is low.

Description

Moisture mask and preparation method thereof

Technical Field

The invention belongs to the technical field of cosmetics, and particularly relates to a moisture mask and a preparation method thereof.

Background

The glucan is homotypic polysaccharide composed of glucose as monosaccharide, and is divided into alpha-glucan and beta-glucan, and each glucan is combined by multiple bond positions. Dextran has a long history in the western world as an active ingredient in skin care products. Families in many European and American countries are used to bath the infants with water soaked with oat to relieve and prevent eczema; the elderly are also used to wash their face with oat water in winter to relieve dry skin. This is mainly due to the fact that the substances extracted from oats contain vitamin E and glucan components, both of which have a certain repairing and protecting effect on the skin. Glucose and the like can cause rapid rise of blood sugar and blood pressure as energy supply, and glucan such as modified starch, resistant dextrin, fructo-oligosaccharide and the like can be used as a continuous energy supply raw material, but the structure is uncertain, and the quality stability cannot be ensured.

At present, the glucan applied to the moisturizing facial masks in the market is mainly beta-glucan, the water solubility is poor, and the glucan is viscous when the addition amount is about 1%. The alpha-glucan oligosaccharide is a product obtained by acting glucose transferase on maltose, has the polymerization degree of 4-6 glucose units, mainly serves as a skin conditioner and enhances the natural barrier of skin, and is reduced by increasing healthy bacteria on the skin, namely the principle of the alpha-glucan oligosaccharide is similar to the effect of yoghourt on intestinal tracts. The alpha-glucan oligosaccharide has a small molecular weight, cannot form an effective protective film on the surface of skin, and has a weak moisturizing effect.

Icodextrin is dextran prepared by hydrolyzing starch, has molecular weight of 19000-25000 dalton, and has good water solubility, safety and biocompatibility. The pharmaceutical preparation taking the icodextrin as the raw material is approved to be on the market in more than 30 countries and regions, and has good safety, biocompatibility and stability; the colloidal solution prepared from the icodextrin has good ultrafiltration effect and hydration floating effect, can be used as peritoneal dialysis solution and surgical anti-adhesion flushing solution, and Cooker shows that the icodextrin has good biocompatibility in a paper published in 2002; the paper published by Mistry in 1994 shows that icodextrin solutions proved safe and effective for long-term use as peritoneal dialysis solutions in a randomized multicenter clinical trial; the patent paper published by Catena in 2012 indicated that in a single-center, prospective randomized trial, the use of 4% icodextrin was safe in patients with small intestinal obstruction, reducing the risk of intra-abdominal adhesions forming and reoccluding.

How to utilize icodextrin as the raw materials for producing the facial mask to be reasonably matched with other raw materials to produce the moisturizing facial mask, the moisturizing facial mask has good moisturizing effect, and can provide a layer of barrier for resisting foundation make-up, color cosmetics, external environment pollution, dust and the like for skin to maintain the clean and healthy state of the skin. This is a technical problem which is currently awaited to be solved in the art.

Disclosure of Invention

In order to solve the problems in the prior art, the invention provides the moisturizing mask and the preparation method thereof, the produced mask has a good moisturizing effect, and can provide a layer of barrier for resisting foundation make-up, color makeup, external environmental pollution, dust and the like for the skin and maintain the clean and healthy state of the skin; the preparation method is simple, the preparation cost is low, and the method is suitable for large-scale industrial production.

In order to solve the above problems, the object of the present invention is achieved by the following technical solutions:

the moisturizing mask comprises a moisturizing skin care lotion and a mask base material, and is characterized in that the moisturizing skin care lotion comprises the following components in percentage by mass: 0.01 to 5 percent of icodextrin, 0.1 to 15 percent of humectant, 0.01 to 10 percent of skin conditioner, 0.01 to 0.1 percent of triethanolamine, 0.01 to 0.5 percent of thickening agent, 0.1 to 0.5 percent of preservative, 0.001 to 0.1 percent of daily essence and the balance of deionized water.

The improvement of the technical scheme is as follows: the humectant is one or more of beta-glucan, sclerotium rolfsii, oat glucan, glycerol, 1, 3-butanediol, 1, 3-propylene glycol, hexanediol, 1, 2-hexanediol, 1, 6-hexanediol sodium hyaluronate, trehalose, sorbitol, amides, betaine, glycerol polyethers and D-panthenol.

The technical scheme is further improved as follows: the skin conditioner is one or more of herba Portulacae extract, herba Centellae extract, flos Matricariae Chamomillae extract, fructus Vitics Simplicifoliae extract, tocopherol acetate, hydrolyzed collagen, squalane, yeast fermentation product and lysate, dipotassium glycyrrhizinate, and allantoin.

The technical scheme is further improved as follows: the thickening agent is one or more of carbomer, acrylate copolymer and xanthan gum.

The technical scheme is further improved as follows: the antiseptic is one or more of chlorphenesin, phenoxyethanol, ethylhexyl glycerol, methyl hydroxybenzoate, propyl hydroxybenzoate and p-hydroxyacetophenone.

The invention also provides a preparation method of the moisturizing facial mask, which comprises the preparation of a facial mask base material and a moisturizing skin care lotion, and is characterized in that the preparation method of the moisturizing skin care lotion comprises the following steps:

s1: preparing raw materials according to the raw material proportion of the moisturizing skin care lotion, and dispersing a thickening agent, hyaluronic acid and sclerotium rolfsii gum by using polyalcohol and glycerol for later use;

s2: adding a part of humectant, dipotassium glycyrrhizinate, allantoin, methylparaben, p-hydroxyacetophenone and deionized water into a main pot, adding the mixture into the raw material prepared in the step S1 while stirring, heating to 75-95 ℃ while stirring until the mixture is uniformly dissolved, stirring at the speed of 100-;

s3: the temperature in the main pot is reduced to 50-60 ℃, D-panthenol, glycerol polyethers and triethanolamine are added and stirred evenly with the stirring speed of 100-1500 r/min.

S4: cooling to 38-45 deg.C, adding the rest humectant, skin conditioner, essence and antiseptic, stirring uniformly at stirring speed of 100-.

S5: cooling to below 32 ℃, stopping stirring, and discharging to obtain the moisturizing skin care lotion.

The improvement of the technical scheme is as follows: and (3) soaking the mask base material in the moisturizing skin care solution to obtain the moisturizing mask, and then bagging and sealing the moisturizing mask.

Compared with the prior art, the invention has the following advantages and positive effects:

the moisturizing facial mask disclosed by the invention can form a hydrated film on the skin, prevent the water loss of the skin, keep the skin moist and help the skin to resist external pollution. The raw materials of the moisturizing facial mask comprise the icodextrin which is alpha-glucan and has smaller molecular weight than common glucan, so that the moisturizing facial mask has good water solubility, can be added with more amount, exerts a larger moisturizing effect and keeps the fresh texture of the skin moisturizer. The moisturizing mask disclosed by the invention is simple in preparation method, low in preparation cost and suitable for large-scale industrial production.

Detailed Description

The present invention will be described in further detail with reference to specific examples.

The specific implementation mode of the moisturizing mask comprises moisturizing skin care lotion and a mask substrate, wherein the moisturizing skin care lotion comprises the following components in percentage by mass: 0.01 to 5 percent of icodextrin, 0.1 to 15 percent of humectant, 0.01 to 10 percent of skin conditioner, 0.01 to 0.1 percent of triethanolamine, 0.01 to 0.5 percent of thickening agent, 0.1 to 0.5 percent of preservative, 0.001 to 0.1 percent of daily essence and the balance of deionized water.

Further, the humectant is one or more of beta-glucan, scleroglucan, oat glucan, glycerin, 1, 3-butanediol, 1, 3-propanediol, propylene glycol, hexanediol, 1, 2-hexanediol, 1, 6-hexanediol sodium hyaluronate, trehalose, sorbitol, amides, betaine, glycerol polyethers, and D-panthenol.

Still further, the skin conditioner is one or more of purslane extract, centella asiatica extract, chamomile extract, fructus viticis extract, tocopheryl acetate, hydrolyzed collagen, squalane, yeast fermentation products and lysates, dipotassium glycyrrhizinate and allantoin.

Still further, the thickening agent is one or more of carbomer, acrylic acid (ester)/C10-C30 alkanol acrylate copolymer and xanthan gum.

Still further, the preservative is one or more of chlorphenesin, phenoxyethanol, ethylhexyl glycerol, methylparaben, propylparaben and p-hydroxyacetophenone.

The invention also provides a preparation method of the moisturizing facial mask, which comprises the preparation of a facial mask base material and moisturizing skin care lotion, and is characterized in that the preparation method of the moisturizing facial mask comprises the preparation of the facial mask base material and the moisturizing skin care lotion, and is characterized in that the preparation method of the moisturizing skin care lotion comprises the following steps:

Soaking the facial mask base material in the moisturizing skin care solution to obtain the moisturizing facial mask, and bagging and sealing the moisturizing facial mask.

The following are specific examples of the moisturizing mask of the present invention:

example 1:

the moisturizing mask comprises a moisturizing skin care lotion and a mask substrate, wherein the moisturizing skin care lotion comprises the following components in percentage by mass: 0.01% of icodextrin, 0.5% of allantoin, 5% of propylene glycol, 2% of glycerol, 0.05% of sodium hyaluronate, 0.05% of carbomer, 0.05% of triethanolamine, 0.05% of purslane extract, 0.1% of dipotassium glycyrrhizinate, 0.05% of trehalose, 0.5% of 1, 2-hexanediol, 0.1% of ethylhexyl glycerol, 0.5% of fructus viticis extract, 0.7% of phenoxyethanol, 0.1% of water-soluble ceramide, 0.01% of essence and the balance of deionized water.

The preparation method of the moisturizing skin care lotion comprises the following steps:

s1: preparing raw materials according to the raw material proportion of the moisturizing skin care lotion, and dispersing carbomer and sodium hyaluronate with propylene glycol and glycerin for later use;

s2: adding allantoin, dipotassium glycyrrhizinate, trehalose and deionized water into a main pot, adding into the raw material prepared in the step S1 while stirring, heating to 80 ℃ while stirring until the raw material is dissolved uniformly, stirring at the speed of 1000r/min, and preserving heat and sterilizing for at least 30 min;

s3: reducing the temperature in the main pot to 55 ℃, adding triethanolamine and 1, 2-hexanediol, and uniformly stirring at the stirring speed of 1000 r/min;

s4: cooling to 40 deg.C, and adding icodextrin, herba Portulacae extract, fructus Vitics Simplicifoliae extract, phenoxyethanol, ethylhexyl glycerol, water soluble ceramide, and essence. Stirring uniformly at a stirring speed of 500 r/min;

s5: cooling to 30 ℃, stopping stirring, and discharging to obtain the moisturizing skin care lotion.

Example 2:

the moisturizing mask comprises a moisturizing skin care lotion and a mask substrate, wherein the moisturizing skin care lotion comprises the following components in percentage by mass: 0.1% of icodextrin, 0.5% of allantoin, 5% of propylene glycol, 2% of glycerol, 0.05% of sodium hyaluronate, 0.05% of carbomer, 0.05% of triethanolamine, 0.05% of purslane extract, 0.1% of dipotassium glycyrrhizinate, 0.05% of trehalose, 0.5% of 1, 2-hexanediol, 0.1% of ethylhexyl glycerol, 0.5% of fructus viticis extract, 0.7% of phenoxyethanol, 0.1% of water-soluble ceramide, 0.01% of essence and the balance of deionized water.

Example 3:

the moisturizing mask comprises a moisturizing skin care lotion and a mask substrate, wherein the moisturizing skin care lotion comprises the following components in percentage by mass: 1% of icodextrin, 0.5% of allantoin, 5% of propylene glycol, 2% of glycerol, 0.05% of sodium hyaluronate, 0.05% of carbomer, 0.05% of triethanolamine, 0.05% of purslane extract, 0.1% of dipotassium glycyrrhizinate, 0.05% of trehalose, 0.5% of 1, 2-hexanediol, 0.1% of ethylhexyl glycerol, 0.5% of fructus viticis extract, 0.7% of phenoxyethanol, 0.1% of water-soluble ceramide, 0.01% of essence and the balance of deionized water.

The mask base material in the above embodiments is generally processed from non-woven fabric, and the prepared moisturizing mask is applied to the face of a person.

The following are comparative examples of moisturizing masks without icodextrin:

comparative example 1:

the moisturizing mask comprises a moisturizing skin care lotion and a mask substrate, wherein the moisturizing skin care lotion comprises the following components in percentage by mass: 1% of alpha-glucan oligosaccharide, 0.5% of allantoin, 5% of propylene glycol, 2% of glycerol, 0.05% of sodium hyaluronate, 0.05% of carbomer, 0.05% of triethanolamine, 0.05% of purslane extract, 0.1% of dipotassium glycyrrhizinate, 0.05% of trehalose, 0.5% of 1, 2-hexanediol, 0.1% of ethylhexyl glycerol, 0.5% of fructus viticis extract, 0.7% of phenoxyethanol, 0.1% of water-soluble ceramide, 0.01% of essence and the balance of deionized water.

(1) dispersing carbomer and sodium hyaluronate with propylene glycol and glycerol;

(2) adding allantoin, dipotassium glycyrrhizinate, trehalose and deionized water into a main pot, adding the mixture into the raw materials prepared in the step (1) while stirring, heating to 80 ℃ while stirring until the mixture is dissolved uniformly, stirring at the speed of 1000r/min, and preserving heat and sterilizing for 30 min;

(3) and (3) reducing the temperature in the main boiler to 55 ℃, adding triethanolamine and 1, 2-hexanediol, and uniformly stirring at the stirring speed of 1000 r/min.

(4) Cooling to 40 deg.C, and adding alpha-glucan oligosaccharide, herba Portulacae extract, fructus Vitics Simplicifoliae extract, phenoxyethanol, ethylhexyl glycerol, water soluble ceramide, and essence. Stirring evenly with the stirring speed of 500r/min.

(5) Cooling to 30 deg.C, stopping stirring, and discharging to obtain the final product.

Comparative example 2:

the moisturizing mask comprises a moisturizing skin care lotion and a mask substrate, wherein the moisturizing skin care lotion comprises the following components in percentage by mass: 1% of beta-glucan, 0.5% of allantoin, 5% of propylene glycol, 2% of glycerol, 0.05% of sodium hyaluronate, 0.05% of carbomer, 0.05% of triethanolamine, 0.05% of purslane extract, 0.1% of dipotassium glycyrrhizinate, 0.05% of trehalose, 0.5% of 1, 2-hexanediol, 0.1% of ethylhexyl glycerol, 0.5% of fructus viticis extract, 0.7% of phenoxyethanol, 0.1% of water-soluble ceramide, 0.01% of essence and the balance of deionized water.

(4) Cooling to 40 deg.C, and adding beta-dextran, herba Portulacae extract, fructus Vitics Simplicifoliae extract, phenoxyethanol, ethylhexyl glycerol, water soluble ceramide, and essence. Stirring evenly with the stirring speed of 500r/min.

Comparative example 3:

the moisturizing mask comprises a moisturizing skin care lotion and a mask substrate, wherein the moisturizing skin care lotion comprises the following components in percentage by mass: 0.01% of beta-glucan, 0.5% of allantoin, 5% of propylene glycol, 2% of glycerol, 0.05% of sodium hyaluronate, 0.05% of carbomer, 0.05% of triethanolamine, 0.05% of purslane extract, 0.1% of dipotassium glycyrrhizinate, 0.05% of trehalose, 7, 1, 2-hexanediol, 0.5% of ethylhexyl glycerol, 0.5% of fructus viticis extract, 0.7% of phenoxyethanol, 0.1% of water-soluble ceramide, 0.01% of essence and the balance of deionized water.

The results of the skin moisture test tests performed on the examples of the present invention and the comparative examples are as follows:

the subjects required a uniform rinsing of the inner forearm of both hands before the test using a German Comeometer CM 825 skin moisture tester at a temperature of 20 ℃ and a relative humidity of 50%. Five test areas were marked on each of the left and right forearms of the subject after washing, at 1cm intervals, and each test area was 5X 5cm 2. The moisturizing skin care lotions prepared in example 1, example 2, example 3, comparative example 1, comparative example 2 and comparative example 3 were applied to the skin care lotion, respectively, and the amount of the test sample was 0.2 g. After the subject was rested in a constant environment for 30 minutes, the test site blank value was measured using a Corneometer, and 5 points were fixedly measured for each area in a certain order to obtain an average value thereof. The application of the sample was then handled by the specialist and the timing was started, measuring a total of 2 hours. Subtracting the blank value from the average value of each detection to obtain the change of the MMV value in the time period, and obtaining the increase rate of the MMV value after removing the blank value

The skin moisture content increase rate calculation formula is as follows:

skin moisture content increase rate% = (MMVt-MMV 0)/MMV 0 × 100%

In the formula: MMV 0-MMV on skin before application

MMVt-time period t after application skin MMV

The results of the moisturizing liquid tests of the examples and comparative examples of the invention are shown in table 1:

table 1 test results of moisturizing lotions according to examples and comparative examples of the present invention

As can be seen from Table 1, compared with the moisturizing skin care lotion containing alpha-glucan oligosaccharide, the moisturizing skin care lotion containing icodextrin of the invention has better moisturizing effect than the moisturizing skin care lotion containing alpha-glucan oligosaccharide. Compared with the moisturizing skin care lotion containing beta-glucan, the moisturizing skin care lotion containing the icodextrin has a better moisturizing effect than that of the skin care lotion containing the beta-glucan, and the skin care lotion containing the icodextrin is fresh and cool in texture and good in use body feeling. The moisture retention effect was greatly impaired although the texture was kept fresh at a β -glucan content of 0.01%. Therefore, the moisturizing skin care lotion containing the icodextrin can keep fresh texture and also can exert good moisturizing capability.

The above embodiments are only used for illustrating the technical solution of the present invention, and not for limiting the same; although the invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that various changes may be made and equivalents may be substituted for elements thereof; such modifications and substitutions do not depart from the spirit and scope of the present invention as set forth in the appended claims.

Claims

1. The moisturizing mask comprises a moisturizing skin care lotion and a mask base material, and is characterized in that the moisturizing skin care lotion comprises the following components in percentage by mass: 0.01 to 5 percent of icodextrin, 0.1 to 15 percent of humectant, 0.01 to 10 percent of skin conditioner, 0.01 to 0.1 percent of triethanolamine, 0.01 to 0.5 percent of thickening agent, 0.1 to 0.5 percent of preservative, 0.001 to 0.1 percent of daily essence and the balance of deionized water.

2. The moisture mask as claimed in claim 1, wherein the humectant is one or more selected from β -glucan, scleroglucan, oat glucan, glycerin, 1, 3-butylene glycol, 1, 3-propylene glycol, hexylene glycol, 1, 2-hexylene glycol, 1, 6-hexylene glycol sodium hyaluronate, trehalose, sorbitol, amides, betaine, glyceryl polyethers, and D-panthenol.

3. The moisture mask as claimed in claim 1 or 2, wherein the skin conditioning agent is one or more selected from the group consisting of purslane extract, centella asiatica extract, chamomile extract, vitex rotundifolia extract, tocopherol acetate, hydrolyzed collagen, squalane, yeast fermentation products and lysates, dipotassium glycyrrhizinate, and allantoin.

4. The moisture mask as set forth in claim 1 or 2, wherein the thickener is one or more of carbomer, acrylate copolymer, xanthan gum.

5. The moisture mask as set forth in claim 3, wherein said thickener is one or more of carbomer, acrylate copolymer, xanthan gum.

6. The moisture mask as claimed in claim 1 or 2, wherein the preservative is one or more of chlorphenesin, phenoxyethanol, ethylhexylglycerin, methylparaben, propylparaben, and p-hydroxyacetophenone.

7. The moisture mask as claimed in claim 3, wherein the preservative is one or more of chlorphenesin, phenoxyethanol, ethylhexylglycerin, methylparaben, propylparaben, and p-hydroxyacetophenone.

8. The moisture mask as claimed in claim 5, wherein the preservative is one or more of chlorphenesin, phenoxyethanol, ethylhexylglycerin, methylparaben, propylparaben, and p-hydroxyacetophenone.

9. A method for preparing a moisturizing mask according to any one of claims 1 to 8, comprising the preparation of a mask substrate and a moisturizing lotion, wherein the method for preparing the moisturizing lotion comprises the following steps:

s3: reducing the temperature in the main pot to 50-60 ℃, adding D-panthenol, glycerol polyethers and triethanolamine, and stirring uniformly at the stirring speed of 100-;

s4: cooling to 38-45 deg.C, adding the rest humectant, skin conditioner, essence and antiseptic, stirring uniformly at stirring rate of 100-;

10. The preparation method of the moisturizing facial mask as claimed in claim 9, wherein the facial mask base material is taken and soaked in the moisturizing skin care solution to obtain the moisturizing facial mask, and the moisturizing facial mask is packaged and sealed.