CN112234424A - 248nm high-power deep ultraviolet laser based on sum frequency generation of Nd-YAG and Er-YAG lasers - Google Patents
248nm high-power deep ultraviolet laser based on sum frequency generation of Nd-YAG and Er-YAG lasers Download PDFInfo
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- CN112234424A CN112234424A CN202011127257.5A CN202011127257A CN112234424A CN 112234424 A CN112234424 A CN 112234424A CN 202011127257 A CN202011127257 A CN 202011127257A CN 112234424 A CN112234424 A CN 112234424A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/109—Frequency multiplication, e.g. harmonic generation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
Abstract
The invention relates to a 248nm high-power deep ultraviolet laser based on sum frequency generation of Nd, YAG and Er, YAG lasers, which comprises a 1064nmNd, YAG laser and a 1645nmEr, YAG laser; YAG laser is provided with a first frequency doubling nonlinear crystal, a first dichroic mirror and a second dichroic mirror in sequence along a light path; 1064nmNd, wherein a second frequency doubling nonlinear crystal, a first sum frequency nonlinear crystal and a third dichroic mirror are sequentially arranged on the YAG laser along the optical path; the second dichroic mirror and the third dichroic mirror respectively introduce laser into the second sum frequency nonlinear crystal to obtain 248nm high-power deep ultraviolet laser output. The invention can greatly reduce the manufacturing cost of the laser, has higher efficiency, greatly simplifies the complexity of equipment and leads the structure of the whole system to be more compact.
Description
Technical Field
The invention relates to a 248nm all-solid-state high-power deep ultraviolet laser based on frequency summation of a 1064nmNd YAG laser and a 1645nmEr YAG laser, and belongs to the technical field of lasers.
Background
Compared with the laser in the infrared band, the deep ultraviolet laser has unique advantages, such as: short wavelength, high resolution, energy concentration, etc. Owing to these advantages, deep ultraviolet laser is becoming more and more important in many application fields such as ultra-precision machining, substance surface modification, biomedical science, spectrum detection, etc. Particularly, for the applications of PMMA plate taper hole processing, fiber grating preparation, carbon quantum dot generation, chip manufacturing and the like, the 248nm deep ultraviolet laser has extremely unique advantages, and draws high attention of researchers at home and abroad.
Currently, obtaining 248nm high-power deep ultraviolet laser output includes the following methods:
1. an excimer laser developed by rare gas KrF is used as a seed source to directly generate 248nm deep ultraviolet laser, and then the output of 248nm high-power deep ultraviolet laser is obtained by adopting a multi-stage amplification mode. However, due to the limitation of the beam quality of the seed source and the adoption of a multi-stage amplification mode to improve the output power, the M of 248nm high-power deep ultraviolet laser is finally output2Can reach more than 50, and seriously limits the application of the nano-particles in the fields of photoetching, medical treatment, ultra-precision machining and the like.
2. A248 nm all-solid-state deep ultraviolet laser with high beam quality is used as a seed source, and then KrF excimer laser is adopted for amplification, so that 248nm high-power deep ultraviolet laser output with high beam quality is obtained. However, the existing method for obtaining a 248nm all-solid-state deep ultraviolet laser with high beam quality has disadvantages, for example, a scheme of obtaining 248nm deep ultraviolet laser output by using a titanium sapphire laser with a wavelength of 745nm by using a nonlinear frequency conversion technology, and due to the serious thermal effect influence of a titanium sapphire crystal and a green light pump source with high price, the whole system is complicated, the device is large, and the price is very expensive.
3. Emerald is used as a gain medium, a flash lamp or a diode pump is adopted to obtain 745nm wavelength output, and then a nonlinear frequency conversion technology is utilized to obtain 248nm deep ultraviolet laser. However, this approach reduces the efficiency of the overall laser system due to the limitations of flash lamp pumping, and the required gain medium is costly.
Therefore, the three methods have the problems of low system efficiency, large volume, high manufacturing cost and the like, and the existing 248nm high-power deep ultraviolet laser is mainly a gas laser, does not have high-power expandability compared with a solid laser, and limits the development of the 248nm high-power deep ultraviolet laser.
The research shows that both Nd: YAG and Er: YAG lasers are relatively mature laser sources which can operate at high power at present, and the design, various performance parameters and the manufacture and research of gain media of the lasers reach a quite mature stage, and especially the Nd: YAG lasers in the common wave band are almost completely commercialized and reach the practical level. Although the Er: YAG laser has not reached the maturity of the Nd: YAG laser at present, some common wave bands are relatively mature, and the Er: YAG (1645nm) laser used can adopt a 1532nm fiber laser for resonant pumping, so that the Er: YAG laser has high power expandability for the laser itself. Along with the development of semiconductor laser technology and LD side pumping pump modularization, the pumping of the pump to the laser working substance is more uniform, the utilization rate of the laser working substance is improved, and therefore the high-power Nd: YAG laser has higher efficiency and stability. In addition, due to the rapid development of the fiber laser in recent years, the laser becomes very compact, and the complexity of the system is greatly reduced. Both Nd and Er YAG lasers have mature high-power products on the market. For frequency doubling crystals, nonlinear optical borate crystals generally have wide optical transparency, excellent nonlinear optical properties, good physicochemical stability and a high damage threshold, and these advantages make borate crystals the best choice for nonlinear frequency conversion to generate high-power ultraviolet laser. In the commonly used sum frequency crystal at present, BBO and CLBO are preferably selected as the sum frequency crystal in the invention by combining the maturation, practicability and performance stability of the crystal growth. Particularly, the CLBO nonlinear optical crystal has a small walk-off angle, better beam quality can be obtained by using the CLBO nonlinear optical crystal, and meanwhile, the relatively mature Nd-YAG laser and Er-YAG laser are used for promoting the development of high beam quality, high efficiency, miniaturization and practicability of the high-power deep ultraviolet laser.
Disclosure of Invention
Aiming at the defects of the prior art, the invention provides a new scheme of a 248nm all-solid-state high-power deep ultraviolet laser based on a 1064nmNd, YAG laser of diode pumping and a 1645nmEr, YAG laser of fiber laser resonant pumping, wherein the target parameters are as follows: wavelength of 248nm, repetition frequency of 10kHz, pulse width of 10ns and average power of 10-20W.
The technical scheme of the invention is as follows:
a248 nm all-solid-state high-power deep ultraviolet laser based on 1064nmNd, YAG laser and 1645nmEr, YAG laser sum frequency generation comprises 1064nmNd, YAG laser and 1645nmEr, YAG laser;
YAG laser is provided with a first frequency doubling nonlinear crystal, a first dichroic mirror and a second dichroic mirror in sequence along a light path; 1064nmNd, wherein a second frequency doubling nonlinear crystal, a first sum frequency nonlinear crystal and a third dichroic mirror are sequentially arranged on the YAG laser along the optical path;
the second dichroic mirror and the third dichroic mirror respectively introduce laser into the second sum frequency nonlinear crystal to obtain 248nm high-power deep ultraviolet laser output, and the 248nm high-power deep ultraviolet laser is output through the fourth dichroic mirror and the fifth dichroic mirror in sequence.
Preferably, the 1064 nNd: YAG laser is diode pumped to convert 1064nm into 355nm laser.
Preferably, the 1645nm Er YAG laser is subjected to resonant pumping by a fiber laser, and the 1645nm is converted into 822.5nm laser by adopting resonant pumping of a 1532nm fiber laser.
Preferably, the first frequency doubling nonlinear crystal is an LBO nonlinear optical crystal with angle phase matching or temperature phase matching, and two end faces of the LBO nonlinear optical crystal are both plated with anti-reflection dielectric films of 1645nm and 822.5 nm. The benefit of this design is that the 1645nm laser is converted to 822.5nm laser output by nonlinear frequency conversion technology using the frequency doubling nonlinear crystal.
Preferably, the first dichroic mirror is plated with a dielectric film with 1645nm high reflection and 822.5nm high transmission, and the incident angle is 45 degrees.
Preferably, the second dichroic mirror is plated with a dielectric film with 355nm high reflection and 822.5nm high transmission, and the incident angle is 45 degrees.
Preferably, the third dichroic mirror is plated with a dielectric film with high reflectivity at 248nm, high transmissivity at 1064nm and high transmissivity at 532nm, and the incident angle is 45 degrees.
Preferably, the second frequency doubling nonlinear crystal is an LBO nonlinear optical crystal, and both end faces of the LBO nonlinear optical crystal are coated with anti-reflection films of 1064nm and 532 nm. The design has the advantage that the 1064nm laser is converted into 532nm laser output by the nonlinear frequency conversion technology by using the frequency doubling nonlinear crystal.
Preferably, the first sum frequency nonlinear crystal is an LBO nonlinear optical crystal, and both end faces of the LBO nonlinear optical crystal are plated with antireflection films for 1064nm, 532nm and 355 nm. The sum frequency nonlinear crystal is used for generating 355nm laser by nonlinear frequency conversion of 532nm laser and 1064nm laser left after frequency doubling.
Preferably, the second sum frequency nonlinear crystal is a BBO or CLBO nonlinear optical crystal with angle phase matching, two end faces of the BBO nonlinear optical crystal are plated with antireflection films at 822.5nm, 355nm and 248nm, and the cutting angle is 47.6 degrees or 58.2 degrees; the CLBO nonlinear optical crystal is free of coating, and the cutting angle is 61.9 degrees. The benefit of this design is that the CLBO nonlinear optical crystal itself does not need to be coated in order to reduce damage. Meanwhile, the CLBO nonlinear optical crystal has a small walk-off angle, so that better beam quality can be obtained. The high-power 248nm deep ultraviolet laser can be obtained by 822.5nm and 355nm lasers through a nonlinear frequency conversion technology by using BBO or CLBO nonlinear optical crystals.
Preferably, the fourth dichroic mirror is plated with a dielectric film with high reflectivity at 248nm, high transmissivity at 822.5nm and high transmissivity at 355nm, and the incident angle is 45 degrees.
Preferably, the fifth dichroic mirror is plated with a dielectric film with high reflectivity at 248nm, high transmissivity at 822.5nm and high transmissivity at 355nm, and the incident angle is 45 degrees.
The invention has the beneficial effects that:
1. the invention adopts a relatively mature Nd: YAG (1064nm) laser and Er: YAG (1645nm) laser which can run at high power, can greatly reduce the manufacturing cost of the laser, has higher efficiency, greatly simplifies the complexity of equipment and leads the structure of the whole system to be more compact.
2. The invention adopts two relatively mature high-power lasers, and can directly generate high-power 248nm deep ultraviolet laser with the repetition frequency of 10kHz, the pulse width of 10ns and the average power of 10-20W by utilizing the nonlinear frequency conversion technology. Therefore, the design scheme based on the Nd: YAG (1064nm) laser and the Er: YAG (1645nm) laser 248nm high-power all-solid-state deep ultraviolet laser is more beneficial to the development of the 248nm deep ultraviolet laser towards practicability, miniaturization and performance stabilization.
Drawings
FIG. 1 is a schematic diagram of the structure of a 248nm all-solid-state high-power deep ultraviolet laser based on 1064nm Nd, YAG laser and 1645nm Er, YAG laser sum frequency generation;
wherein: 1. 1645nmEr is YAG laser; 2. a first frequency doubling nonlinear crystal; 3. a first dichroic mirror; 4. a second dichroic mirror; 5. 1064nmNd, YAG laser; 6. a second frequency doubling nonlinear crystal; 7. a first sum frequency nonlinear crystal; 8. a third dichroic mirror; 9. a second sum frequency nonlinear crystal; 10. a fourth dichroic mirror; 11. a fifth dichroic mirror.
Detailed Description
The present invention will be further described by way of examples, but not limited thereto, with reference to the accompanying drawings. The invention has not been described in detail, but is in accordance with conventional techniques in the art.
The anti-reflection and high reflection film has the advantages of transmittance and reflectivity of more than 99.9 percent. The invention is not described in detail, and can be carried out by adopting the prior art.
Example 1:
as shown in fig. 1, the present embodiment provides a 248nm all-solid-state high-power deep ultraviolet laser based on 1064nmNd YAG laser and 1645nmEr YAG laser sum frequency generation, which includes 1645nmEr YAG laser 1, first frequency doubling nonlinear crystal 2, first dichroic mirror 3, second dichroic mirror 4, 1064nmNd YAG laser 5, second frequency doubling nonlinear crystal 6, first frequency doubling nonlinear crystal 7, third dichroic mirror 8, second frequency doubling nonlinear crystal 9, fourth dichroic mirror 10 and fifth dichroic mirror 11;
YAG laser 1 is provided with a first frequency doubling nonlinear crystal 2, a first dichroic mirror 3 and a second dichroic mirror 4 in sequence along a light path; 1064nmNd, wherein a second frequency doubling nonlinear crystal 6, a first sum frequency nonlinear crystal 7 and a third dichroic mirror 8 are sequentially arranged on the YAG laser 5 along the optical path;
the second dichroic mirror 4 and the third dichroic mirror 8 respectively introduce laser into the second sum frequency nonlinear crystal 9 to obtain 248nm high-power deep ultraviolet laser output, and the 248nm high-power deep ultraviolet laser is output through the fourth dichroic mirror 10 and the fifth dichroic mirror 11 in sequence.
Specifically, the 1645nm Er YAG laser 1 adopts a 1532nm fiber laser resonant pump, has high power expandability, and converts 1645nm into 822.5nm laser through a nonlinear frequency conversion technology.
The first frequency doubling nonlinear crystal 2 is an LBO nonlinear optical crystal with angle phase matching or temperature phase matching, and two end faces of the LBO nonlinear optical crystal are respectively coated with antireflection films with the wavelength of 1645nm and the wavelength of 822.5 nm. The 1645nm laser is converted into 822.5nm laser to be output by using the frequency doubling nonlinear crystal through a nonlinear frequency conversion technology.
The first dichroic mirror 3 is coated with a dielectric film with 1645nm high reflection and 822.5nm high transmission, and the incident angle is 45 °.
The second dichroic mirror 4 is coated with a dielectric film with 355nm high reflection and 822.5nm high transmission, and the incident angle is 45 degrees.
The second frequency doubling nonlinear crystal 6 is an LBO (lithium triborate) nonlinear optical crystal, and two end faces of the LBO nonlinear optical crystal are coated with anti-reflection films of 1064nm and 532 nm. By using the frequency doubling nonlinear crystal, 1064nm laser is converted into 532nm laser by a nonlinear frequency conversion technology and output.
The first sum frequency nonlinear crystal 7 is an LBO (lithium triborate) nonlinear optical crystal, and two end faces of the LBO nonlinear optical crystal are plated with antireflection films for 1064nm, 532nm and 355 nm. The sum frequency nonlinear crystal is used for generating 355nm laser by nonlinear frequency conversion of 532nm laser and 1064nm laser left after frequency doubling, and belongs to the prior art.
The third dichroic mirror 8 is plated with a dielectric film with high reflectivity at 248nm and high transmissivity at 1064nm and 532nm, and the incident angle is 45 degrees.
And the second sum frequency nonlinear crystal 9 adopts an angle phase-matched BBO or CLBO nonlinear optical crystal. When a BBO nonlinear optical crystal is adopted, two end faces of the crystal are respectively plated with antireflection films at 822.5nm, 355nm and 248nm, and the cutting angle is 47.6 degrees or 58.2 degrees; when the CLBO nonlinear optical crystal is adopted, the crystal works under the temperature condition of 150 degrees, so the cutting angle is 61.9 degrees, and the crystal does not need to be coated to reduce damage. Meanwhile, the CLBO nonlinear optical crystal has a small walk-off angle, so that better beam quality can be obtained. The high-power 248nm deep ultraviolet laser can be obtained by 822.5nm and 355nm lasers through a nonlinear frequency conversion technology by using BBO or CLBO nonlinear optical crystals.
The fourth dichroic mirror 10 is plated with a dielectric film with high reflectivity at 248nm and high transmissivity at 822.5nm and 355nm, and is used for filtering laser beams at 822.5nm and 355nm, and the incident angle is 45 degrees.
The fifth dichroic mirror 11 is plated with a dielectric film with high reflectivity at 248nm, high transmissivity at 822.5nm and high transmissivity at 355nm, and is used for improving the output purity of the 248nm deep ultraviolet laser, and the incident angle is 45 degrees.
The fourth and fifth dichroic mirrors are mainly used for the light-splitting purification of 248nm high-power deep ultraviolet laser, so that the same purpose can be realized by adopting corresponding light-splitting prisms, and the method belongs to the prior art.
The working principle of outputting 248nm deep ultraviolet laser according to the scheme of the embodiment is as follows: 1645nm laser emitted by a YAG laser enters a first frequency doubling nonlinear crystal, and 822.5nm wavelength laser is obtained through nonlinear conversion; 1064nm laser emitted by a YAG laser enters a second frequency doubling nonlinear crystal, 532nm wavelength laser can be obtained through a nonlinear frequency conversion technology, and then the residual 1064nm fundamental frequency light and 532nm frequency doubling light are subjected to nonlinear conversion through a first frequency doubling nonlinear crystal to obtain 355nm wavelength laser; the first dichroic mirror filters 1645nm laser, then the second dichroic mirror and the third dichroic mirror respectively introduce 822.5nm laser and 355nm laser into the second sum frequency nonlinear crystal, and 248nm high-power deep ultraviolet laser output can be obtained through a nonlinear frequency conversion technology; the fourth dichroic mirror filters 355nm and 822.5nm laser, reflects 248nm deep ultraviolet laser, and then further improves the output purity of the 248nm deep ultraviolet laser through the fifth dichroic mirror.
While the foregoing is directed to the preferred embodiment of the present invention, it will be understood by those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (10)
1. A248 nm all-solid-state high-power deep ultraviolet laser based on 1064nmNd, YAG laser and 1645nmEr, YAG laser sum frequency generation is characterized by comprising 1064nmNd, YAG laser and 1645nmEr, YAG laser;
YAG laser is provided with a first frequency doubling nonlinear crystal, a first dichroic mirror and a second dichroic mirror in sequence along a light path; 1064nmNd, wherein a second frequency doubling nonlinear crystal, a first sum frequency nonlinear crystal and a third dichroic mirror are sequentially arranged on the YAG laser along the optical path;
the second dichroic mirror and the third dichroic mirror respectively introduce laser into the second sum frequency nonlinear crystal to obtain 248nm high-power deep ultraviolet laser output, and the 248nm high-power deep ultraviolet laser is output through the fourth dichroic mirror and the fifth dichroic mirror in sequence.
2. The 248nm all-solid-state high-power deep ultraviolet laser of claim 1, wherein the 1064nm Nd-YAG laser is diode pumped to convert 1064nm into 355nm laser light.
3. The 248nm all-solid-state high-power deep ultraviolet laser as claimed in claim 1, wherein the 1645nm Er YAG laser is resonant pumped by a fiber laser, and the 1532nm fiber laser is adopted for resonant pumping to convert 1645nm into 822.5nm laser.
4. The 248nm all-solid-state high-power deep ultraviolet laser as claimed in claim 1, wherein the first frequency doubling nonlinear crystal is an LBO nonlinear optical crystal with angle phase matching or temperature phase matching, and both end faces of the LBO nonlinear optical crystal are coated with anti-reflection dielectric films at 1645nm and 822.5 nm.
5. The 248nm all-solid-state high-power deep ultraviolet laser as claimed in claim 1, wherein the first dichroic mirror is coated with a dielectric film highly reflective at 1645nm and highly transparent at 822.5nm, and the incident angle is 45 °.
6. The 248nm all-solid-state high power deep ultraviolet laser as claimed in claim 1, wherein the second dichroic mirror is coated with a dielectric film that is highly reflective at 355nm and highly transparent at 822.5nm, and has an incident angle of 45 °.
7. The 248nm all-solid-state high-power deep ultraviolet laser as claimed in claim 1, wherein the third dichroic mirror is coated with a dielectric film with high reflectivity to 248nm, high transmissivity to 1064nm and 532nm, and an incident angle is 45 °.
8. The 248nm all-solid-state high-power deep ultraviolet laser as claimed in claim 1, wherein the second frequency doubling nonlinear crystal is an LBO nonlinear optical crystal, and both end faces of the LBO nonlinear optical crystal are coated with anti-reflection films of 1064nm and 532 nm.
9. The 248nm all-solid-state high-power deep ultraviolet laser as claimed in claim 1, wherein the first sum frequency nonlinear crystal is an LBO nonlinear optical crystal, and both end faces of the LBO nonlinear optical crystal are coated with anti-reflection films for 1064nm, 532nm and 355 nm.
10. The 248nm all-solid-state high-power deep ultraviolet laser as claimed in claim 1, wherein the second sum frequency nonlinear crystal is an angle phase-matched BBO or CLBO nonlinear optical crystal, both end faces of the BBO nonlinear optical crystal are coated with antireflection films at 822.5nm, 355nm and 248nm, and the cutting angle is 47.6 ° or 58.2 °; the CLBO nonlinear optical crystal is free of coating, and the cutting angle is 61.9 degrees.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101764348A (en) * | 2010-01-07 | 2010-06-30 | 武汉华工激光工程有限责任公司 | Semiconductor pump ultraviolet laser |
| CN103022870A (en) * | 2012-12-27 | 2013-04-03 | 苏州镭创光电技术有限公司 | Slat structure based high-power 355nm ultraviolet laser device |
| US20140362880A1 (en) * | 2013-06-11 | 2014-12-11 | Kla-Tencor Corporation | CW DUV Laser With Improved Stability |
| CN111725695A (en) * | 2020-07-17 | 2020-09-29 | 山东大学 | All-solid-state ultraviolet laser capable of simultaneously generating 289nm laser and 299nm laser |
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2020
- 2020-10-20 CN CN202011127257.5A patent/CN112234424A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101764348A (en) * | 2010-01-07 | 2010-06-30 | 武汉华工激光工程有限责任公司 | Semiconductor pump ultraviolet laser |
| CN103022870A (en) * | 2012-12-27 | 2013-04-03 | 苏州镭创光电技术有限公司 | Slat structure based high-power 355nm ultraviolet laser device |
| US20140362880A1 (en) * | 2013-06-11 | 2014-12-11 | Kla-Tencor Corporation | CW DUV Laser With Improved Stability |
| CN111725695A (en) * | 2020-07-17 | 2020-09-29 | 山东大学 | All-solid-state ultraviolet laser capable of simultaneously generating 289nm laser and 299nm laser |
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| YORK E. YOUNG ET AL.: "Efficient 1645-nm Er:YAG laser", 《OPTICS LETTERS》 * |
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Application publication date: 20210115 |