CN112230325B - Periodic symmetric structure optical filter for inhibiting advanced sub-reflection short wave pass filter - Google Patents
Periodic symmetric structure optical filter for inhibiting advanced sub-reflection short wave pass filter Download PDFInfo
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- CN112230325B CN112230325B CN202011183881.7A CN202011183881A CN112230325B CN 112230325 B CN112230325 B CN 112230325B CN 202011183881 A CN202011183881 A CN 202011183881A CN 112230325 B CN112230325 B CN 112230325B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
Abstract
The invention belongs to the field of optical filters, and particularly relates to a high-order secondary reflection inhibiting short wave pass film system optical filter with a periodic symmetric structure, wherein the film system structure is as follows:
or
(ii) a Wherein: h is a high refractive index material; l is a low refractive index material; s is a glass substrate; a is air; a. b and c are fitting coefficients, and the effect of inhibiting high-order secondary reflection is achieved by adjusting the fitting coefficients; m is the total cycle number of the membrane system, and the steepness and the cut-off depth of the membrane system are determined. The optical filter adopts two materials with high and low refractive indexes to realize that the two materials inhibit high-order secondary reflection, and has simple process and high manufacturability.
Description
Technical Field
The invention belongs to the field of optical filters, and particularly relates to a high-order secondary reflection inhibiting short wave pass film system optical filter with a periodically symmetrical structure.
Background
The short-wave pass filter is widely applied to optical systems. The spectrum has the characteristics that the short wave position is a transmission band, the long wave position is a cut-off band, the spectrum has corresponding high-order secondary reflection bands at 1/N (N =1, 3, 5 \8230;) of the center position of the cut-off wavelength, and the passband range is influenced by the high-order secondary reflection bands more along with the increase of the short wave passband range.
Currently, there are two methods for suppressing high-order secondary reflection:
1. the periodic symmetric film system (0.5LH0.5L) ^ m is used as an initial structure, and the secondary reflection is easy to eliminate by matching with a computer optimization method. However, the optimization difficulty is long due to the reflection of more than three levels, the film layer is irregular and has an ultrathin layer, and the process realization difficulty is high.
2. A plurality of dielectric materials are in a periodically symmetrical film system: such as three materials (LMHML) m, can eliminate the reflection band at the second and third order. However, more than three materials are needed, a conventional film plating machine is provided with double electron guns, so that the plating of various materials is difficult to realize, and in addition, because the selectable film materials are limited, the required refractive index is not easy to match, and the effect of eliminating high-order secondary reflection is not good.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides the high-grade secondary reflection inhibiting short wave pass film filter with a periodically symmetrical structure. The optical filter adopts two materials with high and low refractive indexes to realize that the two materials inhibit high-order secondary reflection, greatly reduces the process difficulty and has higher manufacturability.
The periodic symmetric structure of the film filter for inhibiting the high-order secondary reflection short wave pass is as follows: s | (aLbHcLHcLbHaL) ^ S m | A or S | (LaHbLcHbLaHL) ^ m I A; wherein: h is a high refractive index material; l is a low refractive index material; s is a glass substrate; a is air; a. b and c are fitting coefficients, and the effect of inhibiting high-order secondary reflection is achieved by adjusting the fitting coefficients; m is the total cycle number of the membrane system, and the steepness and the cut-off depth of the membrane system are determined.
As a preferable scheme, the H and the L adopt TiO 2 /SiO 2 、HfO 2 /SiO 2 、Ta 2 O 5 /SiO 2 Or Nb 2 O 5 /SiO 2 An optical film material.
Further, the invention is describedH and L are both optical thickness of lambda 0 A/4 film layer.
Further, the invention relates to S | (aLbHcLHcLbHaL) ^ S | (aLbHcLbHaL) ^ S m In | A, the fitting coefficients of a, b and c have the following relationship: b is approximately equal to c; a + b + c is approximately equal to 1; b + c<a。
Further, the invention relates to S | (LaHbLcHbLaHL) ^ S | (LaHbLcHbLaHL) m In | A, the fitting coefficients of a, b and c have the following relationship: c. C>b>a；a+b+c≈3；c>b+a。
The high-order secondary reflection inhibiting short wave pass film system optical filter with the periodic symmetric structure adopts two materials with high and low refractive indexes to realize the high-order secondary reflection inhibition of the two materials, greatly reduces the process difficulty and has higher manufacturability. The basic film system can inhibit secondary, tertiary and quaternary secondary reflection bands of the short-wave pass filter through two materials.
Drawings
The invention is further described with reference to the following figures and detailed description. The scope of the invention is not limited to the following expressions.
FIG. 1 is a schematic view of a membrane system according to the present invention;
FIG. 2 is a graph of short-wave pass filter transmittance;
FIG. 3 is a graph of transmittance of an optical filter according to an embodiment of the present invention.
Detailed Description
As shown in the figure, the periodic symmetric film filter for inhibiting the high-order secondary reflection short wave pass has a film structure as follows: s | (aLbHcLHcLbHaL) ^ S m | A or S | (LaHbLcHbLaHL) ^ m I A; wherein: h is a high refractive index material; l is a low refractive index material; s is a glass substrate; a is air; a. b and c are fitting coefficients, and the effect of inhibiting the high-order secondary reflection is achieved by adjusting the fitting coefficients; m is the total cycle number of the membrane system, and the steepness and the cut-off depth of the membrane system are determined.
The H and L of the invention adopt TiO 2 /SiO 2 、HfO 2 /SiO 2 、Ta 2 O 5 /SiO 2 Or Nb 2 O 5 /SiO 2 An optical film material. The thicknesses of H and L are both optical thicknesses of lambda 0 A film layer of/4.
The invention relates to the S | (aLbHcLHcLbHaL) ^ S m In | A, the fitting coefficients of a, b and c have the following relation: b is approximately equal to c; a + b + c is approximately equal to 1; b + c<a. The invention relates to the formula of S | (LaHbLcHbLaHL) ^ S m In | A, the fitting coefficients of a, b and c have the following relation: c. C>b>a；a+b+c≈3；c>b+a。
The spectrum requires T >90% @400nm-1500nm; t <1% @1600nm-1850nm as an example:
adopts a film system basic structure S | (aLbHcLHcLbHaL) ^ m |A；
Selecting high and low materials H and Ta according to requirements 2 O 5 L:SiO 2 ；
Giving the initial fitting coefficient a 0 、b 0 、c 0 ，a 0 ＝0.175；b 0 ＝0.175；c 0 ＝0.65；
And a suitable number of cycles m =15;
the fitting coefficient is finely adjusted through computer software to achieve a better suppression effect.
And optimizing the set target value by using computer software, and obtaining a final membrane system according to an actual calculation result. The thickness distribution of each layer in the design is shown in table I, and the design curve is shown in table I
It should be understood that the detailed description and specific examples, while indicating preferred embodiments of the invention, are given by way of illustration only, not limitation, and it will be understood by those skilled in the art that various changes and modifications may be made therein without departing from the spirit and scope of the invention; and are within the scope of the present invention as long as the requirements of use are met.
Claims (1)
1. A periodic symmetric structure of the film filter for inhibiting the high-order secondary reflection short wave pass is characterized in that the film structure is: s | (aLbHcLHcLbHaL) ^ S m I A; wherein: h is high refractive index material Ta 2 O 5 (ii) a L is a low refractive index material SiO 2 (ii) a S is a glass substrate; a is air; a. b and c are fitting coefficients, and the effect of inhibiting high-order secondary reflection is achieved by adjusting the fitting coefficients; m is the total cycle number of the membrane system, and the steepness and the cut-off depth of the membrane system are determined; initial fitting coefficient a 0 ＝0.175；b 0 ＝0.175；c 0 =0.65; the cycle number m =15; h and L are both optical thickness of lambda 0 A film layer of/4; the thickness distribution of each layer is as follows:
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| CN113249699B (en) * | 2021-05-13 | 2022-11-04 | 沈阳仪表科学研究院有限公司 | Method for preparing high-precision wavelength gradient optical filter based on magnetron sputtering technology and device adopted by method |
| CN113917587B (en) * | 2021-10-21 | 2023-03-28 | 沈阳仪表科学研究院有限公司 | Multi-pass band depolarization dichroic filter for multicolor fluorescence detection |
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