CN112230325A - Periodic symmetric structure high-order secondary reflection inhibiting short wave pass film system optical filter - Google Patents

Periodic symmetric structure high-order secondary reflection inhibiting short wave pass film system optical filter Download PDF

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CN112230325A
CN112230325A CN202011183881.7A CN202011183881A CN112230325A CN 112230325 A CN112230325 A CN 112230325A CN 202011183881 A CN202011183881 A CN 202011183881A CN 112230325 A CN112230325 A CN 112230325A
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filter
secondary reflection
order secondary
optical filter
film system
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CN112230325B (en
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班超
金�秀
赵帅锋
任少鹏
高鹏
王忠连
王瑞生
程佳祥
安伟国
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Shenyang Academy of Instrumentation Science Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films

Abstract

The invention belongs to the field of optical filters, and particularly relates to a high-order secondary reflection inhibiting short wave pass film system optical filter with a periodic symmetric structure, wherein the film system structure is as follows:
Figure 100004_DEST_PATH_IMAGE001
or
Figure 28225DEST_PATH_IMAGE002
(ii) a Wherein: h is a high refractive index material; l is a low refractive index material; s is a glass substrate; a is air; a. b and c are fitting coefficients, and the effect of inhibiting high-order secondary reflection is achieved by adjusting the fitting coefficients; m is the total cycle number of the membrane system, and the steepness and the cut-off depth of the membrane system are determined. The optical filter adopts two materials with high and low refractive indexes to realize that the two materials inhibit high-order secondary reflection, and has simple process and high manufacturability.

Description

Periodic symmetric structure high-order secondary reflection inhibiting short wave pass film system optical filter
Technical Field
The invention belongs to the field of optical filters, and particularly relates to a high-order secondary reflection inhibiting short wave pass film system optical filter with a periodically symmetrical structure.
Background
The short-wave pass filter is widely applied to optical systems. The spectrum has the characteristics that the short wave position is a transmission band, the long wave position is a cut-off band, the spectrum has corresponding high-order secondary reflection bands at 1/N (N is 1, 3 and 5 … …) of the central position of the cut-off wavelength, and the passband range is influenced by the high-order secondary reflection bands more along with the increase of the short-wave transmission passband range.
At present, there are two methods for suppressing high-order secondary reflection:
1. the periodic symmetric film system (0.5LH0.5L) ^ m is used as the initial structure, and the secondary reflection is easy to eliminate by matching with the computer optimization method. However, the reflection of more than three levels has long optimization difficulty, the film layer is irregular and has an ultrathin layer, and the process realization difficulty is high.
2. A plurality of dielectric materials are in a periodically symmetrical film system: such as three materials (LMHML) m, can eliminate the reflection band at the second and third order. However, more than three materials are needed, a conventional film coating machine is provided with a double electron gun, so that the coating of various materials is difficult to realize, and in addition, because the selectable film materials are limited, the required refractive index is not easy to match, and the effect of eliminating high-level secondary reflection is not good.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides the high-grade secondary reflection inhibiting short wave pass film filter with a periodically symmetrical structure. The optical filter adopts two materials with high and low refractive indexes to realize that the two materials inhibit high-order secondary reflection, greatly reduces the process difficulty and has higher manufacturability.
Periodic symmetric structure film system filter for suppressing high-order sub-reflection short wave pass and film system thereofThe structure is as follows: s | (aLbHcLHcLbHaL) ^ Sm| A or S | (LaHbLcHbLaHL) ^mI A; wherein: h is a high refractive index material; l is a low refractive index material; s is a glass substrate; a is air; a. b and c are fitting coefficients, and the effect of inhibiting high-order secondary reflection is achieved by adjusting the fitting coefficients; m is the total cycle number of the membrane system, and the steepness and the cut-off depth of the membrane system are determined.
As a preferable scheme, the H and the L adopt TiO2/SiO2、HfO2/SiO2、Ta2O5/SiO2Or Nb2O5/SiO2An optical film material.
Furthermore, the thicknesses of H and L are both optical thicknesses of lambda0A/4 film layer.
Further, the invention relates to S | (aLbHcLHcLbHaL) ^ S | (aLbHcLbHaL) ^ SmIn | A, the fitting coefficients of a, b and c have the following relationship: b is approximately equal to c; a + b + c is approximately equal to 1; b + c<a。
Further, the invention relates to S | (LaHbLcHbLaHL) ^ SmIn | A, the fitting coefficients of a, b and c have the following relationship: c. C>b>a；a+b+c≈3；c>b+a。
The high-order secondary reflection inhibiting short wave pass film system optical filter with the periodic symmetric structure adopts two materials with high and low refractive indexes to realize the high-order secondary reflection inhibition of the two materials, greatly reduces the process difficulty and has higher manufacturability. The basic film system can inhibit secondary, tertiary and quaternary secondary reflection bands of the short-wave pass filter through two materials.
Drawings
The invention is further described with reference to the following figures and detailed description. The scope of the invention is not limited to the following expressions.
FIG. 1 is a schematic view of a membrane system according to the present invention;
FIG. 2 is a design diagram of a short-wave pass filter;
FIG. 3 is a diagram of a film system structure according to an embodiment of the present invention.
Detailed Description
As shown in the figure, the high-order secondary reflection inhibiting short wave pass film system with a periodically symmetrical structureThe filter has a film structure as follows: s | (aLbHcLHcLbHaL) ^ Sm| A or S | (LaHbLcHbLaHL) ^mI A; wherein: h is a high refractive index material; l is a low refractive index material; s is a glass substrate; a is air; a. b and c are fitting coefficients, and the effect of inhibiting high-order secondary reflection is achieved by adjusting the fitting coefficients; m is the total cycle number of the membrane system, and the steepness and the cut-off depth of the membrane system are determined.
The H and L of the invention adopt TiO2/SiO2、HfO2/SiO2、Ta2O5/SiO2Or Nb2O5/SiO2An optical film material. The thicknesses of H and L are both optical thicknesses of lambda0A/4 film layer.
The invention relates to the S | (aLbHcLHcLbHaL) ^ SmIn | A, the fitting coefficients of a, b and c have the following relationship: b is approximately equal to c; a + b + c is approximately equal to 1; b + c<a. The invention relates to the formula of S | (LaHbLcHbLaHL) ^ SmIn | A, the fitting coefficients of a, b and c have the following relationship: c. C>b>a；a+b+c≈3；c>b+a。
The spectrum requires T > 90% @400nm-1500 nm; t < 1% @1600nm-1850nm as an example:
adopts a film system basic structure S | (aLbHcLHcLbHaL) ^m|A；
Selecting high and low materials, H, Ta2O5 L:SiO2；
Giving initial fitting coefficients a, b, c, a being 0.175; b is 0.175; c is 0.65;
and a suitable number of cycles m-15;
the fitting coefficient is finely adjusted through computer software to achieve a better inhibition effect.
And optimizing the set target value by using computer software, and obtaining a final membrane system according to an actual calculation result. The thickness distribution of each layer in the design is shown in a table I, and the design curve is shown in a table III
Watch 1
Figure BDA0002750921430000031
Figure BDA0002750921430000041
Figure BDA0002750921430000051
Figure BDA0002750921430000061
Figure BDA0002750921430000071
Figure BDA0002750921430000081
It should be understood that the detailed description of the present invention is only for illustrating the present invention and is not limited by the technical solutions described in the embodiments of the present invention, and those skilled in the art should understand that the present invention can be modified or substituted equally to achieve the same technical effects; as long as the use requirements are met, the method is within the protection scope of the invention.

Claims (5)

1. A periodic symmetric structure of the film filter for inhibiting the high-order secondary reflection short wave pass is characterized in that the film structure is:
Figure DEST_PATH_IMAGE001
or
Figure 704488DEST_PATH_IMAGE002
(ii) a Wherein: h is a high refractive index material; l is a low refractive index material; s is a glass substrate; a is air; a. b and c are fitting coefficients, and the effect of inhibiting high-order secondary reflection is achieved by adjusting the fitting coefficients; m is the total cycle number of the membrane system, and the gradient and the cut-off depth of the membrane system are determined。
2. The filter of claim 1, wherein the filter is characterized in that: the H and the L adopt TiO2/SiO2、HfO2/SiO2、Ta2O5/SiO2Or Nb2O5/SiO2An optical film material.
3. The filter of claim 2, wherein the filter is characterized in that: the thicknesses of H and L are both optical thicknesses of lambda0A/4 film layer.
4. The filter of claim 3, wherein the filter is characterized in that: the above-mentioned
Figure 834118DEST_PATH_IMAGE001
In (3), the fitting coefficients of a, b and c have the following relationship: b is approximately equal to c; a + b + c is approximately equal to 1; b + c<a。
5. The filter of claim 3, wherein the filter is characterized in that: the above-mentioned
Figure 382911DEST_PATH_IMAGE002
In (3), the fitting coefficients of a, b and c have the following relationship: c. C>b>a；a+b+c≈3；c>b+a。
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Cited By (2)

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Publication number Priority date Publication date Assignee Title
CN113249699A (en) * 2021-05-13 2021-08-13 沈阳仪表科学研究院有限公司 Method for preparing high-precision wavelength gradient optical filter based on magnetron sputtering technology and device adopted by method
CN113917587A (en) * 2021-10-21 2022-01-11 沈阳仪表科学研究院有限公司 Multi-passband depolarizing dichroic color filter for multi-color fluorescence detection

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JP2003098340A (en) * 2001-09-21 2003-04-03 Asahi Glass Co Ltd Optical multilayer interference film, method for manufacturing the same and filter using optical multilayer interference film
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CN200947125Y (en) * 2005-08-23 2007-09-12 中山大学 Single-frequency sharp angle spatial filter
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Publication number Priority date Publication date Assignee Title
CN113249699A (en) * 2021-05-13 2021-08-13 沈阳仪表科学研究院有限公司 Method for preparing high-precision wavelength gradient optical filter based on magnetron sputtering technology and device adopted by method
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CN113917587A (en) * 2021-10-21 2022-01-11 沈阳仪表科学研究院有限公司 Multi-passband depolarizing dichroic color filter for multi-color fluorescence detection

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